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HK1118380A - 曝光装置，曝光方法，及装置制造方法 - Google Patents

曝光装置，曝光方法，及装置制造方法 Download PDF

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Publication number
HK1118380A
HK1118380A HK08112379.8A HK08112379A HK1118380A HK 1118380 A HK1118380 A HK 1118380A HK 08112379 A HK08112379 A HK 08112379A HK 1118380 A HK1118380 A HK 1118380A
Authority
HK
Hong Kong
Prior art keywords
substrate
exposure
pattern
image
image plane
Prior art date
Application number
HK08112379.8A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1118380A publication Critical patent/HK1118380A/zh

Links

HK08112379.8A 2006-02-16 2007-02-15 曝光装置，曝光方法，及装置制造方法 HK1118380A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006039227 2006-02-16

Publications (1)

Publication Number Publication Date
HK1118380A true HK1118380A (zh) 2009-02-06

Family

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