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HK1115671A - 曝光装置，曝光方法，及装置制造方法 - Google Patents

曝光装置，曝光方法，及装置制造方法 Download PDF

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Publication number
HK1115671A
HK1115671A HK08111550.1A HK08111550A HK1115671A HK 1115671 A HK1115671 A HK 1115671A HK 08111550 A HK08111550 A HK 08111550A HK 1115671 A HK1115671 A HK 1115671A
Authority
HK
Hong Kong
Prior art keywords
exposure
light beam
area
exposure light
pattern
Prior art date
Application number
HK08111550.1A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1115671A publication Critical patent/HK1115671A/zh

Links

HK08111550.1A 2005-12-28 2006-12-27 曝光装置，曝光方法，及装置制造方法 HK1115671A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005378633 2005-12-28

Publications (1)

Publication Number Publication Date
HK1115671A true HK1115671A (zh) 2008-12-05

Family

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