GB808104A - Electrodeposition of copper from aqueous alkaline cyanide solutions - Google Patents
Electrodeposition of copper from aqueous alkaline cyanide solutionsInfo
- Publication number
- GB808104A GB808104A GB229/56A GB22956A GB808104A GB 808104 A GB808104 A GB 808104A GB 229/56 A GB229/56 A GB 229/56A GB 22956 A GB22956 A GB 22956A GB 808104 A GB808104 A GB 808104A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cyanide
- grams
- copper
- sodium
- alkali metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 title abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title 1
- 229910052802 copper Inorganic materials 0.000 title 1
- 239000010949 copper Substances 0.000 title 1
- 238000004070 electrodeposition Methods 0.000 title 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
- -1 alkali metal cyanide Chemical class 0.000 abstract 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 2
- 229910052783 alkali metal Inorganic materials 0.000 abstract 2
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 abstract 2
- 229910052708 sodium Inorganic materials 0.000 abstract 2
- 239000011734 sodium Substances 0.000 abstract 2
- 229910052714 tellurium Inorganic materials 0.000 abstract 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract 2
- WMCMCZTWKQMHBE-UHFFFAOYSA-N 1-decoxydecane;sulfuric acid Chemical compound OS(O)(=O)=O.CCCCCCCCCCOCCCCCCCCCC WMCMCZTWKQMHBE-UHFFFAOYSA-N 0.000 abstract 1
- JMFZAPCKTUGUNU-UHFFFAOYSA-N 2-methylidene-1h-naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)C(=C)C=CC2=C1 JMFZAPCKTUGUNU-UHFFFAOYSA-N 0.000 abstract 1
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 abstract 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 abstract 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 abstract 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 abstract 1
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 abstract 1
- 239000004793 Polystyrene Substances 0.000 abstract 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 abstract 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 abstract 1
- 239000004141 Sodium laurylsulphate Substances 0.000 abstract 1
- 238000007792 addition Methods 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 abstract 1
- 150000003863 ammonium salts Chemical class 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 abstract 1
- 229940001468 citrate Drugs 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- LEKPFOXEZRZPGW-UHFFFAOYSA-N copper;dicyanide Chemical compound [Cu+2].N#[C-].N#[C-] LEKPFOXEZRZPGW-UHFFFAOYSA-N 0.000 abstract 1
- 239000002270 dispersing agent Substances 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 229940050410 gluconate Drugs 0.000 abstract 1
- 229940049920 malate Drugs 0.000 abstract 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 abstract 1
- 229920002223 polystyrene Polymers 0.000 abstract 1
- 229910052700 potassium Inorganic materials 0.000 abstract 1
- 239000011591 potassium Substances 0.000 abstract 1
- PTLRDCMBXHILCL-UHFFFAOYSA-M sodium arsenite Chemical compound [Na+].[O-][As]=O PTLRDCMBXHILCL-UHFFFAOYSA-M 0.000 abstract 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 abstract 1
- 229940095064 tartrate Drugs 0.000 abstract 1
- XHGGEBRKUWZHEK-UHFFFAOYSA-L tellurate Chemical compound [O-][Te]([O-])(=O)=O XHGGEBRKUWZHEK-UHFFFAOYSA-L 0.000 abstract 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 abstract 1
- SITVSCPRJNYAGV-UHFFFAOYSA-L tellurite Chemical compound [O-][Te]([O-])=O SITVSCPRJNYAGV-UHFFFAOYSA-L 0.000 abstract 1
- 239000000080 wetting agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
- C25D3/40—Electroplating: Baths therefor from solutions of copper from cyanide baths, e.g. with Cu+
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
808,104. Electrodepositing bright cyanide copper. UDYLITE RESEARCH CORPORATION. Jan. 3, 1956 [Jan. 4, 1955], No. 229/56. Class 41. An aqueous alkaline copper cyanide electroplating bath contains 0.0002 to 0.006 g./l. of tellurium, preferably added as a telluride, tellurite, tellurate or telluric compound, e.g. as tellurium oxide dissolved in an alkali. The bath may also contain a wetting agent such as sodium lauryl sulphate or sodium decyl ether sulphate and/or a dispersing agent such as the sodium, potassium, or ammonium salt of a polymeric methylene naphthalene sulphonic acid produced by condensing formaldehyde with α- or #-naphthalene sulphonic acid, or of a nuclear sulphonated polystyrene. The bath may also contain 0.01 to 1 g./l. of arsenic, preferably added as sodium arsenite or arsenious acid. Typical cyanide baths to which the additions are made contain per litre 22.5 to 90 grams copper cyanide, 33.5 to 150 grams of alkali metal cyanide, 3.7 to 30 grams alkali metal hydroxide, and 30 to 160 grams alkali metal salt of an hydroxy organic acid, e.g. tartrate, glycolate, gluconate, citrate, malate, and may be used at temperatures up to 90‹ C.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US808104XA | 1955-01-04 | 1955-01-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB808104A true GB808104A (en) | 1959-01-28 |
Family
ID=22159762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB229/56A Expired GB808104A (en) | 1955-01-04 | 1956-01-03 | Electrodeposition of copper from aqueous alkaline cyanide solutions |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE1062079B (en) |
| FR (1) | FR1144712A (en) |
| GB (1) | GB808104A (en) |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1081734B (en) | 1955-07-16 | 1960-05-12 | Hubert Offermanns Dipl Chem Dr | Alkaline reacting complex baths for the electrolytic deposition of smooth metal deposits |
| DE1175521B (en) | 1960-07-28 | 1964-08-06 | Udylite Res Corp | Cyanide electroplating copper bath |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE750185C (en) * | 1939-07-08 | 1944-12-27 | Baeder for the electrolytic deposition of shiny metal deposits | |
| DE879048C (en) * | 1939-07-08 | 1953-06-08 | Degussa | Baeder for the electrolytic deposition of shiny metal deposits |
-
1956
- 1956-01-03 GB GB229/56A patent/GB808104A/en not_active Expired
- 1956-01-04 FR FR1144712D patent/FR1144712A/en not_active Expired
- 1956-01-04 DE DEU3684A patent/DE1062079B/en active Pending
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| US8945516B2 (en) | 2009-10-02 | 2015-02-03 | Foamix Pharmaceuticals Ltd. | Surfactant-free water-free foamable compositions, breakable foams and gels and their uses |
| US8871184B2 (en) | 2009-10-02 | 2014-10-28 | Foamix Ltd. | Topical tetracycline compositions |
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Also Published As
| Publication number | Publication date |
|---|---|
| DE1062079B (en) | 1959-07-23 |
| FR1144712A (en) | 1957-10-17 |
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