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GB1321640A - Vacuum metallising or vacuum coating - Google Patents

Vacuum metallising or vacuum coating

Info

Publication number
GB1321640A
GB1321640A GB1321640DA GB1321640A GB 1321640 A GB1321640 A GB 1321640A GB 1321640D A GB1321640D A GB 1321640DA GB 1321640 A GB1321640 A GB 1321640A
Authority
GB
United Kingdom
Prior art keywords
valve
vacuum
opened
chamber
metallising
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hunt C J L
Original Assignee
Hunt C J L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hunt C J L filed Critical Hunt C J L
Publication of GB1321640A publication Critical patent/GB1321640A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

1321640 Vapour deposition apparatus C J L HUNT 24 Feb 1972 [5 Dec 1970] 57886/70 Heading C7F [Also in Division F1] In a vapour deposition apparatus which may be e.g. of the type described in Specification 1321486 or a horizontal chamber type, air is exhausted from the deposition chamber through orifice 24 by the main rotary pumps 45, at about 0À5 mm. mercury, a valve 27 is closed, valve 48 opened and a valve 41 is opened to another orifice in the chamber, Fig. 1 (not shown) to connect it to a vacuum reservoir 38 kept under vacuum by oildiffusion pumps 39, 40. After deposition, the valve 41 is closed and valve 26 is opened to the atmosphere. The valve 41 is arranged to close, if there is any failure in the electrical, hydraulic or pneumatic systems. Aluminium may be deposited
GB1321640D 1970-12-05 1970-12-05 Vacuum metallising or vacuum coating Expired GB1321640A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5788670 1970-12-05

Publications (1)

Publication Number Publication Date
GB1321640A true GB1321640A (en) 1973-06-27

Family

ID=10480281

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1321640D Expired GB1321640A (en) 1970-12-05 1970-12-05 Vacuum metallising or vacuum coating

Country Status (1)

Country Link
GB (1) GB1321640A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0018690A1 (en) * 1979-04-30 1980-11-12 S.A. Glaceries de Saint-Roch Vacuum deposition system and method
EP0095369A3 (en) * 1982-05-24 1985-12-04 Varian Associates, Inc. Air lock vacuum pumping methods and apparatus
DE4401718C1 (en) * 1994-01-21 1995-08-17 Anke Gmbh & Co Kg Method and appts. for treatment of workpieces in a vacuum atmosphere
DE10245537A1 (en) * 2002-09-30 2004-04-08 Infineon Technologies Ag Process and process reactor for sequential gas phase separation using a process and an auxiliary chamber
DE202006007937U1 (en) * 2006-05-18 2007-09-20 Strämke, Siegfried, Dr.-Ing. Plasma treatment plant

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0018690A1 (en) * 1979-04-30 1980-11-12 S.A. Glaceries de Saint-Roch Vacuum deposition system and method
US4274936A (en) 1979-04-30 1981-06-23 Advanced Coating Technology, Inc. Vacuum deposition system and method
EP0095369A3 (en) * 1982-05-24 1985-12-04 Varian Associates, Inc. Air lock vacuum pumping methods and apparatus
DE4401718C1 (en) * 1994-01-21 1995-08-17 Anke Gmbh & Co Kg Method and appts. for treatment of workpieces in a vacuum atmosphere
DE10245537A1 (en) * 2002-09-30 2004-04-08 Infineon Technologies Ag Process and process reactor for sequential gas phase separation using a process and an auxiliary chamber
WO2004031439A3 (en) * 2002-09-30 2004-11-04 Infineon Technologies Ag Method and process reactor for sequential gas phase deposition by means of a process and an auxiliary chamber
DE10245537B4 (en) * 2002-09-30 2007-04-19 Infineon Technologies Ag Process and process reactor for sequential vapor deposition by means of a process chamber and an auxiliary chamber
DE202006007937U1 (en) * 2006-05-18 2007-09-20 Strämke, Siegfried, Dr.-Ing. Plasma treatment plant
US8969753B2 (en) 2006-05-18 2015-03-03 Siegfried Straemke Plasma treatment installation

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee