GB1321861A - Vacuum deposition - Google Patents
Vacuum depositionInfo
- Publication number
- GB1321861A GB1321861A GB1321861DA GB1321861A GB 1321861 A GB1321861 A GB 1321861A GB 1321861D A GB1321861D A GB 1321861DA GB 1321861 A GB1321861 A GB 1321861A
- Authority
- GB
- United Kingdom
- Prior art keywords
- canister
- chamber
- disc
- substrates
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001771 vacuum deposition Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 8
- 238000004544 sputter deposition Methods 0.000 abstract 3
- 101100328887 Caenorhabditis elegans col-34 gene Proteins 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1321861 Coating by vapour deposition or sputtering ULTRA ELECTRONICS Ltd 14 Dec 1970 [13 Jan 1970] 1495/70 Heading C7F A vapour deposition, e.g. sputtering apparatus has two vacuum chambers 1, 2 each connected (at 6, 7) to separate vacuum producing pumps. A gate valve 3 inter-connects the chambers 1, 2. A batch of substrates 15 to be coated in a transport canister 5 is placed in chamber 1 and the chamber pumped down. With the valve 3 open a ram 4 raises the canister 5 of substrates into the chamber 2 which is at a harder vacuum than chamber 1. In the chamber 1, a disc 20 rotates to position the canister 5 at 19 which is 120 degrees rotationally spaced from the incoming position (L) above the valve. 120 degrees rotationally spaced from the incoming position (L) and the position 19 is a further position (U) where a canister of coated substrates is situated. After the rotation has taken place the canister of coated substrates lies above the ram 4 and is removed from the chamber. From position 19 individual substrates 15 are removed from the canister 5 by a transfer mechanism (not shown) through an aperture (not shown) in a stationary disc 12 and lodged within an aperture 17 of a rotating disc 11. The disc 11 then rotates 120 degrees to bring the substrate beneath a sputtering cathode comprising an aluminium ring encircling a disc of tantalum. The disc 11 further rotates 120 degrees to bring the coated substrate above the position (U) where the coated substrate is deposited.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB149570 | 1970-01-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1321861A true GB1321861A (en) | 1973-07-04 |
Family
ID=9722987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1321861D Expired GB1321861A (en) | 1970-01-13 | 1970-01-13 | Vacuum deposition |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE2100725A1 (en) |
| GB (1) | GB1321861A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2193731A (en) * | 1986-07-23 | 1988-02-17 | Boc Group Inc | Wafer processing apparatus having wafer transporting and storage means |
| GB2239346A (en) * | 1989-12-14 | 1991-06-26 | Jersey Nuclear Avco Isotopes | Modular processing system |
| US5185757A (en) * | 1989-12-14 | 1993-02-09 | Jersey Nuclear-Avco Isotopes, Inc. | Modularized replaceable vaporizer and extractor apparatus |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3981791A (en) * | 1975-03-10 | 1976-09-21 | Signetics Corporation | Vacuum sputtering apparatus |
| DE2653736A1 (en) * | 1976-11-26 | 1978-06-01 | Bosch Gmbh Robert | METHOD AND DEVICE FOR CONTINUOUS COATING OF GLASS OR CERAMIC SUBSTRATES USING CATHODE SPRAYING |
| JPS61291032A (en) * | 1985-06-17 | 1986-12-20 | Fujitsu Ltd | Vacuum apparatus |
| US4733631B1 (en) * | 1986-09-30 | 1993-03-09 | Apparatus for coating substrate devices | |
| US5660693A (en) * | 1991-01-18 | 1997-08-26 | Applied Vision Limited | Ion vapour deposition apparatus and method |
| GB9101106D0 (en) * | 1991-01-18 | 1991-02-27 | Cray Microcoat Ltd | Ion vapour deposition apparatus and method |
| DE4407909C3 (en) * | 1994-03-09 | 2003-05-15 | Unaxis Deutschland Holding | Method and device for the continuous or quasi-continuous coating of spectacle lenses |
-
1970
- 1970-01-13 GB GB1321861D patent/GB1321861A/en not_active Expired
-
1971
- 1971-01-08 DE DE19712100725 patent/DE2100725A1/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2193731A (en) * | 1986-07-23 | 1988-02-17 | Boc Group Inc | Wafer processing apparatus having wafer transporting and storage means |
| GB2239346A (en) * | 1989-12-14 | 1991-06-26 | Jersey Nuclear Avco Isotopes | Modular processing system |
| US5085410A (en) * | 1989-12-14 | 1992-02-04 | Jersey Nuclear-Avco Isotopes, Inc. | Modular processing system |
| US5185757A (en) * | 1989-12-14 | 1993-02-09 | Jersey Nuclear-Avco Isotopes, Inc. | Modularized replaceable vaporizer and extractor apparatus |
| GB2239346B (en) * | 1989-12-14 | 1994-08-31 | Jersey Nuclear Avco Isotopes | Modular processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2100725A1 (en) | 1971-07-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| 732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
| 732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
| PCNP | Patent ceased through non-payment of renewal fee |