GB1344972A - Vacuum deposition of chromium - Google Patents
Vacuum deposition of chromiumInfo
- Publication number
- GB1344972A GB1344972A GB4343172A GB4343172A GB1344972A GB 1344972 A GB1344972 A GB 1344972A GB 4343172 A GB4343172 A GB 4343172A GB 4343172 A GB4343172 A GB 4343172A GB 1344972 A GB1344972 A GB 1344972A
- Authority
- GB
- United Kingdom
- Prior art keywords
- chromium
- vacuum deposition
- vapour
- headings
- sept
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011651 chromium Substances 0.000 title abstract 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 4
- 229910052804 chromium Inorganic materials 0.000 title abstract 4
- 238000001771 vacuum deposition Methods 0.000 title 1
- 229910000599 Cr alloy Inorganic materials 0.000 abstract 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
- 229910001093 Zr alloy Inorganic materials 0.000 abstract 1
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000155 melt Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000008188 pellet Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1344972 Vapour depositing chromium; Zr/Cr alloys INTERNATIONAL BUSINESS MACHINES CORP 20 Sept 1972 [7 Oct 1971] 43431/72 Headings C7A and C7F Chromium is vapour deposited using an additive which is Si, C, or Zr to provide a composition which melts at a temperature lower than Cr. The substrate may be glass and a shutter may be used until the source material, which may be heated by an electron beam is at the correct temperature. Exemplified evaporation sources include pellets of zirconium alloyed with 15 to 25% chromium.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18747871A | 1971-10-07 | 1971-10-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1344972A true GB1344972A (en) | 1974-01-23 |
Family
ID=22689163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4343172A Expired GB1344972A (en) | 1971-10-07 | 1972-09-20 | Vacuum deposition of chromium |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS4848334A (en) |
| DE (1) | DE2248840A1 (en) |
| FR (1) | FR2156005A1 (en) |
| GB (1) | GB1344972A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1686635A1 (en) * | 2005-01-31 | 2006-08-02 | Samsung SDI Co., Ltd. | Method of forming thin film and method of fabricating OLED |
| US7329436B2 (en) | 2004-11-17 | 2008-02-12 | United Technologies Corporation | Vapor deposition of dissimilar materials |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2496703A1 (en) * | 1980-12-24 | 1982-06-25 | Labo Electronique Physique | MANGANESE EVAPORATION SOURCE ON SUBSTRATE IN THE VACUUM, IN PARTICULAR ON A PHOTOSENSITIVE LAYER SUBSTRATE IN A PHOTOELECTRIC TUBE AND METHOD OF MANUFACTURING THE SAME |
-
1972
- 1972-09-13 JP JP9135272A patent/JPS4848334A/ja active Pending
- 1972-09-20 GB GB4343172A patent/GB1344972A/en not_active Expired
- 1972-09-27 FR FR7235072A patent/FR2156005A1/fr not_active Withdrawn
- 1972-10-05 DE DE19722248840 patent/DE2248840A1/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7329436B2 (en) | 2004-11-17 | 2008-02-12 | United Technologies Corporation | Vapor deposition of dissimilar materials |
| US8286582B2 (en) | 2004-11-17 | 2012-10-16 | United Technologies Corporation | Vapor deposition of dissimilar materials |
| EP1686635A1 (en) * | 2005-01-31 | 2006-08-02 | Samsung SDI Co., Ltd. | Method of forming thin film and method of fabricating OLED |
| CN100440459C (en) * | 2005-01-31 | 2008-12-03 | 三星Sdi株式会社 | Method for forming thin film and method for manufacturing organic light-emitting display device |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2156005A1 (en) | 1973-05-25 |
| JPS4848334A (en) | 1973-07-09 |
| DE2248840A1 (en) | 1973-04-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CSNS | Application of which complete specification have been accepted and published, but patent is not sealed |