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FI20045495L - Flerskiktsstruktur och förfarande för dess framställning - Google Patents

Flerskiktsstruktur och förfarande för dess framställning Download PDF

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Publication number
FI20045495L
FI20045495L FI20045495A FI20045495A FI20045495L FI 20045495 L FI20045495 L FI 20045495L FI 20045495 A FI20045495 A FI 20045495A FI 20045495 A FI20045495 A FI 20045495A FI 20045495 L FI20045495 L FI 20045495L
Authority
FI
Finland
Prior art keywords
manufacture
multilayer structure
multilayer
Prior art date
Application number
FI20045495A
Other languages
English (en)
Finnish (fi)
Other versions
FI20045495A0 (sv
FI117728B (sv
Inventor
Jarmo Maula
Kari Haerkoenen
Anguel Nikolov
Original Assignee
Planar Systems Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Planar Systems Oy filed Critical Planar Systems Oy
Priority to FI20045495A priority Critical patent/FI117728B/sv
Publication of FI20045495A0 publication Critical patent/FI20045495A0/sv
Priority to EP05397024.0A priority patent/EP1674890B1/en
Priority to US11/305,024 priority patent/US7901736B2/en
Priority to CNB2005101361262A priority patent/CN100526915C/zh
Publication of FI20045495L publication Critical patent/FI20045495L/sv
Application granted granted Critical
Publication of FI117728B publication Critical patent/FI117728B/sv

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3694—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer having a composition gradient through its thickness
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
    • H10P14/6339—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
FI20045495A 2004-12-21 2004-12-21 Flerskiktsstruktur och förfarande för dess framställning FI117728B (sv)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FI20045495A FI117728B (sv) 2004-12-21 2004-12-21 Flerskiktsstruktur och förfarande för dess framställning
EP05397024.0A EP1674890B1 (en) 2004-12-21 2005-12-16 Multilayer material and method of preparing the same
US11/305,024 US7901736B2 (en) 2004-12-21 2005-12-19 Multilayer material and method of preparing same
CNB2005101361262A CN100526915C (zh) 2004-12-21 2005-12-21 多层材料及其制备方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20045495 2004-12-21
FI20045495A FI117728B (sv) 2004-12-21 2004-12-21 Flerskiktsstruktur och förfarande för dess framställning

Publications (3)

Publication Number Publication Date
FI20045495A0 FI20045495A0 (sv) 2004-12-21
FI20045495L true FI20045495L (sv) 2006-06-22
FI117728B FI117728B (sv) 2007-01-31

Family

ID=33548091

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20045495A FI117728B (sv) 2004-12-21 2004-12-21 Flerskiktsstruktur och förfarande för dess framställning

Country Status (4)

Country Link
US (1) US7901736B2 (sv)
EP (1) EP1674890B1 (sv)
CN (1) CN100526915C (sv)
FI (1) FI117728B (sv)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100867520B1 (ko) * 2007-04-23 2008-11-07 삼성전기주식회사 결상 렌즈 및 그 제조 방법
US20090081360A1 (en) 2007-09-26 2009-03-26 Fedorovskaya Elena A Oled display encapsulation with the optical property
GB0718841D0 (en) * 2007-09-26 2007-11-07 Eastman Kodak Co Method of making a colour filter array
FI120832B (sv) * 2007-12-03 2010-03-31 Beneq Oy Förfarande för att förbättra hållfastheten hos en tunn glas
US9279120B2 (en) * 2008-05-14 2016-03-08 The Regents Of The University Of Colorado, A Body Corporate Implantable devices having ceramic coating applied via an atomic layer deposition method
WO2010044922A1 (en) 2008-06-12 2010-04-22 Anguel Nikolov Thin film and optical interference filter incorporating high-index titanium dioxide and method for making them
US7888195B2 (en) * 2008-08-26 2011-02-15 United Microelectronics Corp. Metal gate transistor and method for fabricating the same
EP2471105A2 (en) * 2009-08-24 2012-07-04 E. I. du Pont de Nemours and Company Barrier films for thin-film photovoltaic cells
FI20095947A0 (sv) * 2009-09-14 2009-09-14 Beneq Oy Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma
DE102010010937A1 (de) 2009-10-26 2011-04-28 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtung zur Herstellung einer Fresnel-Zonenplatte
FI20096153A0 (sv) * 2009-11-06 2009-11-06 Beneq Oy Förfarande för bildning av en dekorativ beläggning, dekorativ beläggning och användningar därav
FI20096154A0 (sv) 2009-11-06 2009-11-06 Beneq Oy Förfarande för bildning av en film, film och användningar därav
FI20096262A0 (sv) * 2009-11-30 2009-11-30 Beneq Oy Förfarande för bildning av en dekorativ beläggning på en ädelsten, dekorativ beläggning på en ädelsten, och användningar av densamma
FI20105498A0 (sv) * 2010-05-10 2010-05-10 Beneq Oy Förfarande för framställning av ett lager och lager på ytan av ett silikonsubstrat
US8609553B2 (en) 2011-02-07 2013-12-17 Micron Technology, Inc. Methods of forming rutile titanium dioxide and associated methods of forming semiconductor structures
US8564095B2 (en) 2011-02-07 2013-10-22 Micron Technology, Inc. Capacitors including a rutile titanium dioxide material and semiconductor devices incorporating same
US9859028B2 (en) * 2012-03-08 2018-01-02 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V. Method of producing a Fresnel Zone Plate for applications in high energy radiation
CN102703880B (zh) * 2012-06-12 2014-01-15 浙江大学 利用原子层沉积制备高精度光学宽带抗反射多层膜的方法
CN103804963B (zh) * 2012-11-14 2015-09-09 上海纳米技术及应用国家工程研究中心有限公司 一种具备较高饱和度的光学干涉变色颜料的制备方法
TW201615882A (zh) * 2014-10-23 2016-05-01 國立臺灣大學 氧化鈦薄膜以及包含其之複合薄膜之製備方法
JP5906507B1 (ja) * 2015-02-27 2016-04-20 株式会社昭和真空 多層膜被覆樹脂基板およびその製造方法
JP6536105B2 (ja) * 2015-03-17 2019-07-03 凸版印刷株式会社 積層体及びその製造方法、並びにガスバリアフィルム及びその製造方法
MX2017016241A (es) * 2015-07-30 2018-04-20 Halliburton Energy Services Inc Elementos informaticos integrados que incorporan una capa de liberacion de tension.
US20170178899A1 (en) * 2015-12-18 2017-06-22 Lam Research Corporation Directional deposition on patterned structures
US11320568B2 (en) 2018-05-11 2022-05-03 Corning Incorporated Curved surface films and methods of manufacturing the same
KR102904323B1 (ko) 2019-02-27 2025-12-24 램 리써치 코포레이션 희생 층을 사용한 반도체 마스크 재성형
CN110767668B (zh) * 2019-12-30 2020-03-27 杭州美迪凯光电科技股份有限公司 含纳米级表面的clcc封装体盖板、封装体和摄像模组
CN115244664A (zh) 2020-02-28 2022-10-25 朗姆研究公司 用于减少euv图案化缺陷的多层硬掩模
US11542597B2 (en) 2020-04-08 2023-01-03 Applied Materials, Inc. Selective deposition of metal oxide by pulsed chemical vapor deposition
CN112526663A (zh) * 2020-11-04 2021-03-19 浙江大学 一种基于原子层沉积的吸收膜及其制作方法
US12235409B2 (en) 2020-12-23 2025-02-25 Largan Precision Co., Ltd. Optical lens assembly, imaging apparatus and electronic device
US12411307B2 (en) 2020-12-23 2025-09-09 Largan Precision Co., Ltd. Optical lens assembly, imaging apparatus and electronic device
FI130280B (sv) * 2021-03-19 2023-05-31 Beneq Oy Förfarande och användning som avser en film samt film
US12379524B2 (en) 2021-09-01 2025-08-05 Largan Precision Co., Ltd. Optical imaging lens assembly comprising a gradient refractive coating having a plurality of holes, imaging apparatus and electronic device
CN115086845B (zh) * 2022-08-19 2022-12-20 江苏光微半导体有限公司 一种高灵敏度的mems光纤麦克风传感器
CN120366733B (zh) * 2025-04-29 2025-11-21 盐城市振弘电子材料厂 用于铌酸锂晶圆的复合改性材料

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3432225A (en) 1964-05-04 1969-03-11 Optical Coating Laboratory Inc Antireflection coating and assembly having synthesized layer of index of refraction
US3675619A (en) * 1969-02-25 1972-07-11 Monsanto Co Apparatus for production of epitaxial films
US4010710A (en) * 1974-09-20 1977-03-08 Rockwell International Corporation Apparatus for coating substrates
US4235650A (en) * 1978-09-05 1980-11-25 General Electric Company Open tube aluminum diffusion
FI64878C (fi) * 1982-05-10 1984-01-10 Lohja Ab Oy Kombinationsfilm foer isynnerhet tunnfilmelektroluminensstrukturer
FI84960C (sv) 1990-07-18 1992-02-10 Planar Int Oy Lysämnesskikt för elektroluminescensdisplay
FR2670199B1 (fr) * 1990-12-06 1993-01-29 Saint Gobain Vitrage Int Procede de formation d'une couche a base d'oxyde d'aluminium sur du verre, produit obtenu et son utilisation dans des vitrages a couche conductrice.
US5508091A (en) 1992-12-04 1996-04-16 Photran Corporation Transparent electrodes for liquid cells and liquid crystal displays
DE4407909C3 (de) * 1994-03-09 2003-05-15 Unaxis Deutschland Holding Verfahren und Vorrichtung zum kontinuierlichen oder quasi-kontinuierlichen Beschichten von Brillengläsern
CN1269196C (zh) * 1994-06-15 2006-08-09 精工爱普生株式会社 薄膜半导体器件的制造方法
DE69633631T2 (de) * 1995-08-23 2005-10-20 Asahi Glass Ceramics Co., Ltd. Target, verfahren zu dessen herstellung und herstellung hochrefraktiver filme
US5719891A (en) * 1995-12-18 1998-02-17 Picolight Incorporated Conductive element with lateral oxidation barrier
JP4076028B2 (ja) * 1997-02-18 2008-04-16 大日本印刷株式会社 偏光分離フィルム、バックライト及び液晶表示装置
US6266193B1 (en) 1997-07-24 2001-07-24 Cpfilms Inc. Anti-reflective composite
DE19809409A1 (de) 1998-03-05 1999-09-09 Leybold Systems Gmbh Messingfarbige Beschichtung mit einer farbgebenden nitridischen Schicht
JP3735461B2 (ja) * 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
FI108355B (sv) 1998-07-28 2002-01-15 Planar Systems Oy Isoleringsfilm f÷r tunnfilmsstrukturer i bildskõrmar samt tunnfilmselektroluminescens-display
US6165598A (en) 1998-08-14 2000-12-26 Libbey-Owens-Ford Co. Color suppressed anti-reflective glass
JP2000171607A (ja) 1998-12-02 2000-06-23 Canon Inc 高緻密な多層薄膜およびその成膜方法
US6576053B1 (en) * 1999-10-06 2003-06-10 Samsung Electronics Co., Ltd. Method of forming thin film using atomic layer deposition method
KR100363084B1 (ko) * 1999-10-19 2002-11-30 삼성전자 주식회사 박막 구조를 위한 다중막을 포함하는 커패시터 및 그 제조 방법
US6780704B1 (en) * 1999-12-03 2004-08-24 Asm International Nv Conformal thin films over textured capacitor electrodes
FI118474B (sv) * 1999-12-28 2007-11-30 Asm Int Anordning för framställning av tunnfilmer
CA2355021C (en) 2000-08-29 2004-11-02 Hoya Corporation Optical element having antireflection film
FR2814094B1 (fr) * 2000-09-20 2003-08-15 Saint Gobain Substrat a revetement photocatalytique et son procede de fabrication
US6660660B2 (en) * 2000-10-10 2003-12-09 Asm International, Nv. Methods for making a dielectric stack in an integrated circuit
TW556004B (en) 2001-01-31 2003-10-01 Planar Systems Inc Methods and apparatus for the production of optical filters
DE10296448T5 (de) * 2001-03-20 2004-04-15 Mattson Technology Inc., Fremont Verfahren zum Abscheiden einer Schicht mit einer verhältnismässig hohen Dielektrizitätskonstante auf ein Substrat
US20020160194A1 (en) * 2001-04-27 2002-10-31 Flex Products, Inc. Multi-layered magnetic pigments and foils
DE10316671A1 (de) * 2002-07-12 2004-01-22 Röhm GmbH & Co. KG Verfahren zur Herstellung transparenter Kunststoffe für optische Materialien
JP2005538255A (ja) * 2002-09-14 2005-12-15 ショット アクチエンゲゼルシャフト 保護層ならびに保護層を生成するプロセスおよび構成
JP2004176081A (ja) * 2002-11-25 2004-06-24 Matsushita Electric Works Ltd 原子層堆積法による光学多層膜の製造方法
US6890656B2 (en) * 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US7294360B2 (en) * 2003-03-31 2007-11-13 Planar Systems, Inc. Conformal coatings for micro-optical elements, and method for making the same
US7405880B2 (en) * 2004-02-12 2008-07-29 Api Nanofabrication And Research Corporation Multilayer optical filter

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US7901736B2 (en) 2011-03-08
US20060134433A1 (en) 2006-06-22
FI20045495A0 (sv) 2004-12-21
CN1794014A (zh) 2006-06-28
CN100526915C (zh) 2009-08-12
FI117728B (sv) 2007-01-31
EP1674890A2 (en) 2006-06-28
EP1674890A3 (en) 2010-06-09
EP1674890B1 (en) 2018-05-30

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