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FI20095947A0 - Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma - Google Patents

Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma

Info

Publication number
FI20095947A0
FI20095947A0 FI20095947A FI20095947A FI20095947A0 FI 20095947 A0 FI20095947 A0 FI 20095947A0 FI 20095947 A FI20095947 A FI 20095947A FI 20095947 A FI20095947 A FI 20095947A FI 20095947 A0 FI20095947 A0 FI 20095947A0
Authority
FI
Finland
Prior art keywords
multilayer coating
manufacturing
same
multilayer
coating
Prior art date
Application number
FI20095947A
Other languages
English (en)
Finnish (fi)
Inventor
Sami Sneck
Nora Isomaeki
Jarmo Maula
Olli Jylhae
Matti Putkonen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095947A priority Critical patent/FI20095947A0/sv
Publication of FI20095947A0 publication Critical patent/FI20095947A0/sv
Priority to PCT/FI2010/050700 priority patent/WO2011030004A1/en
Priority to EP10815048.3A priority patent/EP2478127A4/en
Priority to KR1020127009458A priority patent/KR20120085259A/ko
Priority to TW099130793A priority patent/TWI507559B/zh
Priority to US13/395,942 priority patent/US20120177903A1/en
Priority to CN201080040851.9A priority patent/CN102575345B/zh
Priority to EA201290148A priority patent/EA022723B1/ru
Priority to JP2012528401A priority patent/JP2013504866A/ja
Priority to JP2015101530A priority patent/JP2015212419A/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
    • C23C16/45529—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making a layer stack of alternating different compositions or gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
FI20095947A 2009-09-14 2009-09-14 Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma FI20095947A0 (sv)

Priority Applications (10)

Application Number Priority Date Filing Date Title
FI20095947A FI20095947A0 (sv) 2009-09-14 2009-09-14 Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma
PCT/FI2010/050700 WO2011030004A1 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
EP10815048.3A EP2478127A4 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
KR1020127009458A KR20120085259A (ko) 2009-09-14 2010-09-13 다층 코팅, 다층 코팅 제조 방법 및 이의 용도
TW099130793A TWI507559B (zh) 2009-09-14 2010-09-13 多層被覆層、其製法及用途
US13/395,942 US20120177903A1 (en) 2009-09-14 2010-09-13 Multilayer coating, method for fabricating a multilayer coating, and uses for the same
CN201080040851.9A CN102575345B (zh) 2009-09-14 2010-09-13 多层涂层、制作多层涂层的方法及其应用
EA201290148A EA022723B1 (ru) 2009-09-14 2010-09-13 Многослойное покрытие, способ изготовления многослойного покрытия
JP2012528401A JP2013504866A (ja) 2009-09-14 2010-09-13 多層コーティング、多層コーティングの製造方法及び多層コーティングの使用
JP2015101530A JP2015212419A (ja) 2009-09-14 2015-05-19 多層コーティング、多層コーティングの製造方法及び多層コーティングの使用

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20095947A FI20095947A0 (sv) 2009-09-14 2009-09-14 Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma

Publications (1)

Publication Number Publication Date
FI20095947A0 true FI20095947A0 (sv) 2009-09-14

Family

ID=41136409

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095947A FI20095947A0 (sv) 2009-09-14 2009-09-14 Flerskiktsbeläggning, förfarande för tillverkning av en flerskiktsbeläggning, och användningar för densamma

Country Status (9)

Country Link
US (1) US20120177903A1 (sv)
EP (1) EP2478127A4 (sv)
JP (2) JP2013504866A (sv)
KR (1) KR20120085259A (sv)
CN (1) CN102575345B (sv)
EA (1) EA022723B1 (sv)
FI (1) FI20095947A0 (sv)
TW (1) TWI507559B (sv)
WO (1) WO2011030004A1 (sv)

Cited By (1)

* Cited by examiner, † Cited by third party
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CN119300519A (zh) * 2024-09-30 2025-01-10 晶科能源(上饶)有限公司 光伏电池片及制备方法

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US20130177760A1 (en) * 2011-07-11 2013-07-11 Lotus Applied Technology, Llc Mixed metal oxide barrier films and atomic layer deposition method for making mixed metal oxide barrier films
WO2013015412A1 (ja) * 2011-07-28 2013-01-31 凸版印刷株式会社 積層体、ガスバリアフィルム、及びこれらの製造方法
TWI473316B (zh) * 2011-08-17 2015-02-11 Nat Applied Res Laboratories 具透明導電特性及水氣阻絕功能之奈米疊層膜及其製造方法
KR20130117510A (ko) * 2012-04-18 2013-10-28 가부시키가이샤 가네카 무기막을 이용한 수분 투과 방지막의 제조 방법, 무기막을 이용한 수분 투과 방지막 및 전기, 전자 봉지 소자
KR101528407B1 (ko) * 2012-11-29 2015-06-11 주식회사 엘지화학 차단층의 손상을 감소시키는 코팅방법
KR20150109984A (ko) * 2014-03-21 2015-10-02 삼성전자주식회사 기체 차단 필름, 이를 포함하는 냉장고 및 기체 차단 필름의 제조방법
MX390409B (es) * 2014-06-12 2025-03-20 Basf Coatings Gmbh Proceso para producir laminados orgánicos-inorgánicos flexibles.
FI126894B (sv) * 2014-12-22 2017-07-31 Beneq Oy Munstyckshuvud, apparatur och förfarande för beläggning av substratyta
US9893239B2 (en) 2015-12-08 2018-02-13 Nichia Corporation Method of manufacturing light emitting device
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
EP3382060A1 (en) * 2017-03-31 2018-10-03 Linde Aktiengesellschaft Method of coating a component and fluid handling component apparatus
EP3728692A4 (en) 2017-12-18 2021-09-15 Entegris, Inc. CHEMICAL-RESISTANT MULTI-LAYER PAINTING APPLIED BY ATOMIC DEPOSITION
KR102172190B1 (ko) * 2017-12-21 2020-10-30 인천대학교 산학협력단 컬러 전자섬유 및 이의 제조방법
US11769692B2 (en) 2018-10-31 2023-09-26 Taiwan Semiconductor Manufacturing Co., Ltd. High breakdown voltage inter-metal dielectric layer
CN112481602B (zh) * 2019-09-11 2023-12-15 艾特材料有限公司 一种在陶瓷背板上沉积金属氧化物薄膜的方法及设备
JP2023170572A (ja) * 2022-05-19 2023-12-01 株式会社デンソー ガスバリア膜およびその製造方法
US20240209503A1 (en) * 2022-12-23 2024-06-27 Uchicago Argonne, Llc Selective hydration by site selective atomic layer deposition

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JP5912228B2 (ja) * 2010-05-17 2016-04-27 凸版印刷株式会社 ガスバリア性積層体の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119300519A (zh) * 2024-09-30 2025-01-10 晶科能源(上饶)有限公司 光伏电池片及制备方法
CN119300519B (zh) * 2024-09-30 2025-12-12 晶科能源(上饶)有限公司 光伏电池片及制备方法

Also Published As

Publication number Publication date
TWI507559B (zh) 2015-11-11
EP2478127A1 (en) 2012-07-25
EP2478127A4 (en) 2017-07-05
US20120177903A1 (en) 2012-07-12
EA022723B1 (ru) 2016-02-29
KR20120085259A (ko) 2012-07-31
JP2013504866A (ja) 2013-02-07
JP2015212419A (ja) 2015-11-26
EA201290148A1 (ru) 2012-08-30
CN102575345B (zh) 2014-11-05
TW201109460A (en) 2011-03-16
CN102575345A (zh) 2012-07-11
WO2011030004A1 (en) 2011-03-17

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