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DE60314484D1 - Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE60314484D1
DE60314484D1 DE60314484T DE60314484T DE60314484D1 DE 60314484 D1 DE60314484 D1 DE 60314484D1 DE 60314484 T DE60314484 T DE 60314484T DE 60314484 T DE60314484 T DE 60314484T DE 60314484 D1 DE60314484 D1 DE 60314484D1
Authority
DE
Germany
Prior art keywords
producing
examination
examination method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60314484T
Other languages
English (en)
Other versions
DE60314484T2 (de
Inventor
Boef Arie Jeffrey Den
Mircea Dusa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60314484D1 publication Critical patent/DE60314484D1/de
Application granted granted Critical
Publication of DE60314484T2 publication Critical patent/DE60314484T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • H10P76/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60314484T 2002-11-01 2003-10-30 Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE60314484T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02257610 2002-11-01
EP02257610 2002-11-01

Publications (2)

Publication Number Publication Date
DE60314484D1 true DE60314484D1 (de) 2007-08-02
DE60314484T2 DE60314484T2 (de) 2008-02-21

Family

ID=32524092

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60314484T Expired - Lifetime DE60314484T2 (de) 2002-11-01 2003-10-30 Untersuchungsverfahren und Verfahren zur Herstellung einer Vorrichtung

Country Status (7)

Country Link
US (1) US7148959B2 (de)
JP (1) JP3972035B2 (de)
KR (1) KR100543534B1 (de)
CN (1) CN100568100C (de)
DE (1) DE60314484T2 (de)
SG (1) SG120958A1 (de)
TW (1) TWI227382B (de)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
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SG120958A1 (en) * 2002-11-01 2006-04-26 Asml Netherlands Bv Inspection method and device manufacturing method
US7778721B2 (en) 2003-01-27 2010-08-17 Applied Materials, Inc. Small lot size lithography bays
US7221993B2 (en) 2003-01-27 2007-05-22 Applied Materials, Inc. Systems and methods for transferring small lot size substrate carriers between processing tools
CN100594430C (zh) * 2004-06-04 2010-03-17 卡尔蔡司Smt股份公司 用于测量光学成像系统的图像质量的系统
JP5183861B2 (ja) * 2004-06-10 2013-04-17 アプライド マテリアルズ インコーポレイテッド 小ロットサイズ基板キャリアを使用する方法および半導体デバイス製造施設
KR101152751B1 (ko) * 2004-06-21 2012-06-18 어플라이드 머티리얼즈 이스라엘 리미티드 스캐닝 빔들의 어레이를 이용하여 다수의 관심 영역을 포함하는 물체를 스캐닝하는 방법
US7573574B2 (en) * 2004-07-13 2009-08-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US20080144036A1 (en) * 2006-12-19 2008-06-19 Asml Netherlands B.V. Method of measurement, an inspection apparatus and a lithographic apparatus
US7642037B2 (en) * 2004-08-27 2010-01-05 Searete, Llc Integrated circuit lithography
US7208331B2 (en) * 2004-09-24 2007-04-24 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and structures for critical dimension and profile measurement
US20060109463A1 (en) * 2004-11-22 2006-05-25 Asml Netherlands B.V. Latent overlay metrology
US7453577B2 (en) * 2004-12-14 2008-11-18 Asml Netherlands B.V. Apparatus and method for inspecting a patterned part of a sample
US7443486B2 (en) * 2005-02-25 2008-10-28 Asml Netherlands B.V. Method for predicting a critical dimension of a feature imaged by a lithographic apparatus
US7315384B2 (en) * 2005-05-10 2008-01-01 Asml Netherlands B.V. Inspection apparatus and method of inspection
US7532307B2 (en) * 2005-06-30 2009-05-12 Asml Netherlands B.V. Focus determination method, device manufacturing method, and mask
US20070002336A1 (en) * 2005-06-30 2007-01-04 Asml Netherlands B.V. Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method
US20070093044A1 (en) * 2005-10-25 2007-04-26 Asml Netherlands B.V. Method of depositing a metal layer onto a substrate and a method for measuring in three dimensions the topographical features of a substrate
US20070153274A1 (en) * 2005-12-30 2007-07-05 Asml Netherlands B.V. Optical metrology system and metrology mark characterization device
US7480050B2 (en) * 2006-02-09 2009-01-20 Asml Netherlands B.V. Lithographic system, sensor, and method of measuring properties of a substrate
US7821650B2 (en) * 2006-03-21 2010-10-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement
US7486408B2 (en) * 2006-03-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement
US7532305B2 (en) * 2006-03-28 2009-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using overlay measurement
US7391513B2 (en) * 2006-03-29 2008-06-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using overlay measurement quality indication
US7502103B2 (en) * 2006-05-31 2009-03-10 Asml Netherlands B.V. Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
US7791724B2 (en) 2006-06-13 2010-09-07 Asml Netherlands B.V. Characterization of transmission losses in an optical system
US7898662B2 (en) * 2006-06-20 2011-03-01 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7692792B2 (en) * 2006-06-22 2010-04-06 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7659988B2 (en) * 2006-06-30 2010-02-09 Asml Netherlands B.V. Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method
US7999940B2 (en) 2006-06-30 2011-08-16 Asml Netherlands B.V. Apparatus for angular-resolved spectroscopic lithography characterization
US7916284B2 (en) * 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7808613B2 (en) * 2006-08-03 2010-10-05 Asml Netherlands B.V. Individual wafer history storage for overlay corrections
US20080036984A1 (en) * 2006-08-08 2008-02-14 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7643666B2 (en) 2006-08-08 2010-01-05 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7589832B2 (en) * 2006-08-10 2009-09-15 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method
US7564555B2 (en) * 2006-08-15 2009-07-21 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7532331B2 (en) 2006-09-14 2009-05-12 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7969577B2 (en) * 2006-09-14 2011-06-28 Asml Netherlands B.V. Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate
US7573584B2 (en) * 2006-09-25 2009-08-11 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US8294907B2 (en) 2006-10-13 2012-10-23 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US8233155B2 (en) * 2006-10-13 2012-07-31 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7630087B2 (en) * 2006-11-22 2009-12-08 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7710572B2 (en) * 2006-11-30 2010-05-04 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7557934B2 (en) * 2006-12-07 2009-07-07 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US20080135774A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Scatterometer, a lithographic apparatus and a focus analysis method
US20080148875A1 (en) * 2006-12-20 2008-06-26 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7916927B2 (en) * 2007-01-16 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7619737B2 (en) * 2007-01-22 2009-11-17 Asml Netherlands B.V Method of measurement, an inspection apparatus and a lithographic apparatus
US7852459B2 (en) 2007-02-02 2010-12-14 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7701577B2 (en) * 2007-02-21 2010-04-20 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7724370B2 (en) * 2007-03-01 2010-05-25 Asml Netherlands B.V. Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell
US7599064B2 (en) 2007-03-07 2009-10-06 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
US7605907B2 (en) * 2007-03-27 2009-10-20 Asml Netherlands B.V. Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method
US7570358B2 (en) * 2007-03-30 2009-08-04 Asml Netherlands Bv Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor
US7656518B2 (en) * 2007-03-30 2010-02-02 Asml Netherlands B.V. Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus
US7580131B2 (en) * 2007-04-17 2009-08-25 Asml Netherlands B.V. Angularly resolved scatterometer and inspection method
US8189195B2 (en) * 2007-05-09 2012-05-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US7911612B2 (en) 2007-06-13 2011-03-22 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
US8004678B2 (en) * 2007-06-26 2011-08-23 Intel Corporation Wafer level alignment structures using subwavelength grating polarizers
US7460237B1 (en) 2007-08-02 2008-12-02 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
NL1036098A1 (nl) * 2007-11-08 2009-05-11 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus lithographic, processing cell and device manufacturing method.
NL2004946A (en) * 2009-07-06 2011-01-10 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US9588439B1 (en) * 2010-12-21 2017-03-07 Asml Netherlands B.V. Information matrix creation and calibration test pattern selection based on computational lithography model parameters
JP6408610B2 (ja) * 2014-06-02 2018-10-17 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジターゲットの設計方法、メトロロジターゲットを有する基板、オーバーレイの測定方法、およびデバイス製造方法
SG11201804232QA (en) 2015-12-21 2018-06-28 Asml Netherlands Bv Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
US10474040B2 (en) * 2017-12-07 2019-11-12 Kla-Tencor Corporation Systems and methods for device-correlated overlay metrology
EP3605230A1 (de) * 2018-08-01 2020-02-05 Stichting VU Metrologievorrichtung und verfahren zur bestimmung einer eigenschaft einer oder mehrerer strukturen auf einem substrat
NL2021852A (en) 2018-08-01 2018-11-09 Asml Netherlands Bv Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
US11360398B2 (en) * 2019-11-14 2022-06-14 Kla Corporation System and method for tilt calculation based on overlay metrology measurements
EP3945133A1 (de) 2020-07-29 2022-02-02 Georg-August-Universität Göttingen Massenproduktion von aus humanen pluripotenten stammzellen gewonnenen kardialen stromazellen

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US6429930B1 (en) * 2000-09-06 2002-08-06 Accent Optical Technologies, Inc. Determination of center of focus by diffraction signature analysis
IL139368A (en) * 2000-10-30 2006-12-10 Nova Measuring Instr Ltd Process control for microlithography
WO2002065545A2 (en) 2001-02-12 2002-08-22 Sensys Instruments Corporation Overlay alignment metrology using diffraction gratings
US6458605B1 (en) * 2001-06-28 2002-10-01 Advanced Micro Devices, Inc. Method and apparatus for controlling photolithography overlay registration
SG152898A1 (en) * 2002-09-20 2009-06-29 Asml Netherlands Bv Alignment systems and methods for lithographic systems
SG120958A1 (en) * 2002-11-01 2006-04-26 Asml Netherlands Bv Inspection method and device manufacturing method
US7791727B2 (en) * 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization

Also Published As

Publication number Publication date
KR100543534B1 (ko) 2006-01-20
JP3972035B2 (ja) 2007-09-05
JP2004287400A (ja) 2004-10-14
CN100568100C (zh) 2009-12-09
US7148959B2 (en) 2006-12-12
DE60314484T2 (de) 2008-02-21
SG120958A1 (en) 2006-04-26
TW200424787A (en) 2004-11-16
US20040119970A1 (en) 2004-06-24
CN1499293A (zh) 2004-05-26
TWI227382B (en) 2005-02-01
KR20040038885A (ko) 2004-05-08

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