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DE60310807D1 - Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-uIltraviolett-Lichtquelle mit hoher Pulsrate - Google Patents

Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-uIltraviolett-Lichtquelle mit hoher Pulsrate

Info

Publication number
DE60310807D1
DE60310807D1 DE60310807T DE60310807T DE60310807D1 DE 60310807 D1 DE60310807 D1 DE 60310807D1 DE 60310807 T DE60310807 T DE 60310807T DE 60310807 T DE60310807 T DE 60310807T DE 60310807 D1 DE60310807 D1 DE 60310807D1
Authority
DE
Germany
Prior art keywords
pulse
production
light source
ultraviolet light
laser plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60310807T
Other languages
English (en)
Other versions
DE60310807T2 (de
Inventor
Shields San Pedro Henry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Central Florida Research Foundation Inc
Original Assignee
University of Central Florida Research Foundation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Central Florida Research Foundation Inc filed Critical University of Central Florida Research Foundation Inc
Application granted granted Critical
Publication of DE60310807D1 publication Critical patent/DE60310807D1/de
Publication of DE60310807T2 publication Critical patent/DE60310807T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0084—Control of the laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma Technology (AREA)
DE60310807T 2002-05-28 2003-05-20 Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-ultraviolett-Lichtquelle mit hoher Pulsrate Expired - Lifetime DE60310807T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US157540 2002-05-28
US10/157,540 US6855943B2 (en) 2002-05-28 2002-05-28 Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
DE60310807D1 true DE60310807D1 (de) 2007-02-15
DE60310807T2 DE60310807T2 (de) 2007-10-25

Family

ID=29419648

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60310807T Expired - Lifetime DE60310807T2 (de) 2002-05-28 2003-05-20 Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-ultraviolett-Lichtquelle mit hoher Pulsrate

Country Status (4)

Country Link
US (1) US6855943B2 (de)
EP (1) EP1367866B1 (de)
JP (2) JP2004031342A (de)
DE (1) DE60310807T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7916388B2 (en) * 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7928416B2 (en) * 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
DE102004005241B4 (de) * 2004-01-30 2006-03-02 Xtreme Technologies Gmbh Verfahren und Einrichtung zur plasmabasierten Erzeugung weicher Röntgenstrahlung
DE102004036441B4 (de) * 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP4564369B2 (ja) * 2005-02-04 2010-10-20 株式会社小松製作所 極端紫外光源装置
US7718985B1 (en) 2005-11-01 2010-05-18 University Of Central Florida Research Foundation, Inc. Advanced droplet and plasma targeting system
US20070168275A1 (en) * 2006-01-13 2007-07-19 Andrew Busby Method for trading using volume submissions
JP5156192B2 (ja) 2006-01-24 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
WO2007121142A2 (en) * 2006-04-12 2007-10-25 The Regents Of The University Of California Improved light source employing laser-produced plasma
CN101111118B (zh) * 2006-07-20 2011-03-02 中国科学院长春光学精密机械与物理研究所 一种稳定的液体靶激光等离子体光源
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
ITTO20070683A1 (it) * 2007-09-28 2009-03-29 Ohg Pejrani S R L Procedimento e apparecchiatura per la disinfezione di ambienti.
JP5280066B2 (ja) * 2008-02-28 2013-09-04 ギガフォトン株式会社 極端紫外光源装置
US20110122387A1 (en) * 2008-05-13 2011-05-26 The Regents Of The University Of California System and method for light source employing laser-produced plasma
WO2011013779A1 (ja) 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
US20110088627A1 (en) * 2009-10-20 2011-04-21 All Seasons Feeders, Inc. Integral control box, spinner and funnel unit with adjustable legs
JP5075951B2 (ja) * 2010-07-16 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びドライバレーザシステム
CN104488362B (zh) * 2012-05-21 2017-05-10 Asml荷兰有限公司 辐射源
NL2011533A (en) * 2012-10-31 2014-05-06 Asml Netherlands Bv Method and apparatus for generating radiation.
WO2014120985A1 (en) 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
JP6195474B2 (ja) 2013-05-31 2017-09-13 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成システムにおけるレーザシステムの制御方法
US9301381B1 (en) * 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
US9678431B2 (en) 2015-03-16 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system and method with optimized throughput and stability
NL2016538A (en) * 2015-05-04 2016-11-07 Asml Netherlands Bv Radiation Source, Lithographic Apparatus and Device Manufacturing Method.
EP3291650B1 (de) * 2016-09-02 2019-06-05 ETH Zürich Vorrichtung und verfahren zur erzeugung von uv- oder röntgenstrahlung mittels eines plasmas
US9832852B1 (en) * 2016-11-04 2017-11-28 Asml Netherlands B.V. EUV LPP source with dose control and laser stabilization using variable width laser pulses
JP7225224B2 (ja) 2017-10-26 2023-02-20 エーエスエムエル ネザーランズ ビー．ブイ． プラズマをモニタするためのシステム
WO2019092831A1 (ja) 2017-11-09 2019-05-16 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3586244T2 (de) 1984-12-26 2000-04-20 Kabushiki Kaisha Toshiba Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel.
JPS61153935A (ja) * 1984-12-26 1986-07-12 Toshiba Corp プラズマｘ線発生装置
US4732262A (en) * 1986-09-25 1988-03-22 International Paper Box Machine Co., Inc. Apparatus for segregating counted slugs of flats
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
JP2001108799A (ja) * 1999-10-08 2001-04-20 Nikon Corp Ｘ線発生装置、ｘ線露光装置及び半導体デバイスの製造方法
TW502559B (en) 1999-12-24 2002-09-11 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit

Also Published As

Publication number Publication date
DE60310807T2 (de) 2007-10-25
US6855943B2 (en) 2005-02-15
JP2010183103A (ja) 2010-08-19
US20030223542A1 (en) 2003-12-04
EP1367866B1 (de) 2007-01-03
JP4874409B2 (ja) 2012-02-15
EP1367866A1 (de) 2003-12-03
JP2004031342A (ja) 2004-01-29

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