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DE60320201D1 - Verfahren zur Herstellung von optischen Polyimid-Wellenleitern. - Google Patents

Verfahren zur Herstellung von optischen Polyimid-Wellenleitern.

Info

Publication number
DE60320201D1
DE60320201D1 DE60320201T DE60320201T DE60320201D1 DE 60320201 D1 DE60320201 D1 DE 60320201D1 DE 60320201 T DE60320201 T DE 60320201T DE 60320201 T DE60320201 T DE 60320201T DE 60320201 D1 DE60320201 D1 DE 60320201D1
Authority
DE
Germany
Prior art keywords
optical waveguides
producing polyimide
polyimide optical
producing
waveguides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60320201T
Other languages
English (en)
Other versions
DE60320201T2 (de
Inventor
Kazunori Mune
Ryuusuke Naitou
Amane Mochizuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of DE60320201D1 publication Critical patent/DE60320201D1/de
Application granted granted Critical
Publication of DE60320201T2 publication Critical patent/DE60320201T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035—Materials
    • G02B2006/12069—Organic material
    • G02B2006/12076—Polyamide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12083—Constructional arrangements
    • G02B2006/121—Channel; buried or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12173—Masking
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/32—Optical coupling means having lens focusing means positioned between opposed fibre ends

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Integrated Circuits (AREA)
DE60320201T 2002-11-29 2003-11-24 Verfahren zur Herstellung von optischen Polyimid-Wellenleitern. Expired - Lifetime DE60320201T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002346996 2002-11-29
JP2002346996A JP3947457B2 (ja) 2002-11-29 2002-11-29 ポリイミド光導波路の製造方法

Publications (2)

Publication Number Publication Date
DE60320201D1 true DE60320201D1 (de) 2008-05-21
DE60320201T2 DE60320201T2 (de) 2009-05-14

Family

ID=32290481

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60320201T Expired - Lifetime DE60320201T2 (de) 2002-11-29 2003-11-24 Verfahren zur Herstellung von optischen Polyimid-Wellenleitern.

Country Status (6)

Country Link
US (1) US7035516B2 (de)
EP (1) EP1424577B1 (de)
JP (1) JP3947457B2 (de)
KR (1) KR100837024B1 (de)
CN (1) CN1300612C (de)
DE (1) DE60320201T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7037637B2 (en) * 2002-07-17 2006-05-02 Nitto Denko Corporation Photosensitive polyimide resin precursor composition, optical polyimide obtained from the composition, optical waveguide using the polyimide, and process for producing the optical waveguide
JP2005165139A (ja) * 2003-12-04 2005-06-23 Nitto Denko Corp 光導波路の製造方法
JP2005173039A (ja) * 2003-12-09 2005-06-30 Nitto Denko Corp 光導波路の製法
JP2006030294A (ja) * 2004-07-12 2006-02-02 Nitto Denko Corp フレキシブル光導波路の製法
JP2006030919A (ja) 2004-07-22 2006-02-02 Kansai Paint Co Ltd 光導波路の作成方法
KR100705758B1 (ko) * 2005-04-19 2007-04-10 한국과학기술원 유기―무기 혼성물질을 이용한 플렉서블 필름 광도파로 및그 제조방법
JP2009157353A (ja) 2007-12-26 2009-07-16 Nitto Denko Corp 感知用導波路センサー
JP5106332B2 (ja) * 2008-09-18 2012-12-26 日東電工株式会社 光導波路装置の製造方法およびそれによって得られた光導波路装置
JP2010266475A (ja) * 2009-05-12 2010-11-25 Nitto Denko Corp 光導波路の製造方法
TWI472578B (zh) * 2012-12-11 2015-02-11 Chi Mei Corp Liquid crystal aligning agent and its application
WO2015056487A1 (ja) * 2013-10-18 2015-04-23 独立行政法人産業技術総合研究所 インプリント法によるポリイミドの微細パターン形成方法
CN111279804B (zh) * 2017-12-20 2023-10-24 住友电气工业株式会社 制造印刷电路板和层压结构的方法
CN108627915B (zh) * 2018-05-16 2024-03-19 德州尧鼎光电科技有限公司 一种深紫外多量子阱波导
JP7325250B2 (ja) * 2019-07-09 2023-08-14 日東電工株式会社 配線回路基板および配線回路基板の製造方法
CN114911003B (zh) * 2022-05-31 2023-09-22 上海大学 一种基于包层紫外光刻的光波导制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0646348A (ja) 1992-07-21 1994-02-18 Mitsubishi Electric Corp テレビジョン受像機
US5317082A (en) * 1992-12-22 1994-05-31 Amoco Corporation Photodefinable optical waveguides
EP0884610B1 (de) * 1993-03-18 2005-11-16 Nippon Telegraph And Telephone Corporation Herstellungsverfahren eines polyimiden optischen wellenleiters
JP3332278B2 (ja) 1993-12-24 2002-10-07 日東電工株式会社 ポリイミド前駆体およびネガ型感光性材料、並びに感光性基材およびネガ型パターン形成方法
JPH07234525A (ja) 1994-02-22 1995-09-05 Nitto Denko Corp ポリイミドパタ―ン形成用積層体とパタ―ン形成方法
JP3709997B2 (ja) 1994-03-29 2005-10-26 日東電工株式会社 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法
US5649045A (en) * 1995-12-13 1997-07-15 Amoco Corporation Polymide optical waveguide structures
DE19746075C2 (de) * 1997-10-17 1999-12-23 Heyl Analysentechnik Gmbh & Co Meßwertaufnehmer zur Erfassung der elektrischen Leitfähigkeit eines flüssigen Mediums
JP2000199827A (ja) 1998-10-27 2000-07-18 Sony Corp 光導波装置およびその製造方法
US6389215B1 (en) * 1999-10-28 2002-05-14 The United States Of America As Represented By The Secretary Of The Navy Low birefringent polyimides for optical waveguides statement regarding federally sponsored research or development
JP3943827B2 (ja) 1999-11-11 2007-07-11 三井化学株式会社 高分子光導波路の製造方法
JP2002148804A (ja) * 2000-11-08 2002-05-22 Nitto Denko Corp 感光性樹脂組成物および回路基板
JP3943862B2 (ja) 2001-05-25 2007-07-11 三井化学株式会社 光導波路素子およびその製造方法
JP4799764B2 (ja) * 2001-05-31 2011-10-26 日東電工株式会社 光導波路用感光性ポリイミド前駆体組成物およびその光導波路用感光性ポリイミド組成物ならびにそれを用いた光導波路
JP3841288B2 (ja) * 2001-12-21 2006-11-01 日東電工株式会社 感光性ポリイミド樹脂前駆体組成物とそれより得られる光学用ポリイミドと光導波路
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US7037637B2 (en) * 2002-07-17 2006-05-02 Nitto Denko Corporation Photosensitive polyimide resin precursor composition, optical polyimide obtained from the composition, optical waveguide using the polyimide, and process for producing the optical waveguide

Also Published As

Publication number Publication date
US7035516B2 (en) 2006-04-25
CN1300612C (zh) 2007-02-14
EP1424577B1 (de) 2008-04-09
DE60320201T2 (de) 2009-05-14
KR20040048328A (ko) 2004-06-09
US20040146263A1 (en) 2004-07-29
JP3947457B2 (ja) 2007-07-18
CN1504780A (zh) 2004-06-16
EP1424577A3 (de) 2004-07-07
JP2004177864A (ja) 2004-06-24
EP1424577A2 (de) 2004-06-02
KR100837024B1 (ko) 2008-06-10

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