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BR9900610A - Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação. - Google Patents

Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação.

Info

Publication number
BR9900610A
BR9900610A BR9900610-3A BR9900610A BR9900610A BR 9900610 A BR9900610 A BR 9900610A BR 9900610 A BR9900610 A BR 9900610A BR 9900610 A BR9900610 A BR 9900610A
Authority
BR
Brazil
Prior art keywords
radiation
polymers
sensitive
substituted maleimide
application
Prior art date
Application number
BR9900610-3A
Other languages
English (en)
Inventor
Steffen Dr Denzinger
Andreas Dr Elsaesser
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of BR9900610A publication Critical patent/BR9900610A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F126/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36—Amides or imides
    • C08F22/40—Imides, e.g. cyclic imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Patente de Invenção: <B>"POLìMEROS COM UNIDADES DE MALEIMIDA N-SUBSTITUìDA E SUA APLICAçãO EM MISTURAS SENSìVEIS à RADIAçãO"<D>. A invenção refere-se a polímeros com unidades a partir de maleimida N-substituída, uma mistura sensível à radiação que trabalha de maneira positiva ou negativa, que contém a) um aglutinante de polímero insolúvel em água, solúvel em solução aquosa e alcalina e b) pelo menos um composto sensível à radiação, sendo que o aglutinante engloba um polímero com unidade a partir de maleimida N-substituída da fórmula (I) Além disso, a invenção refere-se a um material de desenho com um suporte e uma camada sensível à radiação, sendo que a camada consiste na mistura mencionada. O material de desenho é especialmente adequado para a preparação de desenhos em relevo resistentes a produtos químicos. As placas de impressão planas preparadas a partir do material de desenho permitem uma elevada tiragem de impressão e são resistentes face e produtos químicos de processamento.
BR9900610-3A 1998-01-30 1999-01-29 Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação. BR9900610A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803564A DE19803564A1 (de) 1998-01-30 1998-01-30 Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen

Publications (1)

Publication Number Publication Date
BR9900610A true BR9900610A (pt) 2000-04-11

Family

ID=7856113

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9900610-3A BR9900610A (pt) 1998-01-30 1999-01-29 Polìmeros com unidades de maleimida n-substituìda e sua aplicação em misturas sensìveis à radiação.

Country Status (6)

Country Link
US (1) US6190825B1 (pt)
EP (1) EP0933682B1 (pt)
JP (1) JPH11269229A (pt)
KR (1) KR19990068178A (pt)
BR (1) BR9900610A (pt)
DE (2) DE19803564A1 (pt)

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US6645689B2 (en) * 2002-03-13 2003-11-11 Kodak Polychrome Graphics Llc Solvent resistant polymers with improved bakeability features
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US20070003875A1 (en) * 2005-06-30 2007-01-04 Agfa-Gevaert Method for preparing a lithographic printing plate precursor
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Also Published As

Publication number Publication date
DE19803564A1 (de) 1999-08-05
EP0933682A3 (de) 2000-06-07
DE59913745D1 (de) 2006-09-21
US6190825B1 (en) 2001-02-20
EP0933682B1 (de) 2006-08-09
EP0933682A2 (de) 1999-08-04
JPH11269229A (ja) 1999-10-05
KR19990068178A (ko) 1999-08-25

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Legal Events

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FA10 Dismissal: dismissal - article 33 of industrial property law
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]