[go: up one dir, main page]

BR9611816A - Processo e aparelho para fabricação de silício policristalino e processo para fabricação de pastilhas de silício para baterias solares - Google Patents

Processo e aparelho para fabricação de silício policristalino e processo para fabricação de pastilhas de silício para baterias solares

Info

Publication number
BR9611816A
BR9611816A BR9611816A BR9611816A BR9611816A BR 9611816 A BR9611816 A BR 9611816A BR 9611816 A BR9611816 A BR 9611816A BR 9611816 A BR9611816 A BR 9611816A BR 9611816 A BR9611816 A BR 9611816A
Authority
BR
Brazil
Prior art keywords
making
solar batteries
silicon
polycrystalline silicon
silicon wafers
Prior art date
Application number
BR9611816A
Other languages
English (en)
Inventor
Fukuo Aratani
Yoshiei Kato
Yasuhiko Sakaguchi
Noriyoshi Yuge
Hiroyuki Baba
Naomichi Nakamura
Kazuhiro Hanazawa
Original Assignee
Kawasaki Steel Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Co filed Critical Kawasaki Steel Co
Priority claimed from PCT/JP1996/002965 external-priority patent/WO1998016466A1/ja
Publication of BR9611816A publication Critical patent/BR9611816A/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • H10F71/1221The active layers comprising only Group IV materials comprising polycrystalline silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
BR9611816A 1996-10-14 1996-10-14 Processo e aparelho para fabricação de silício policristalino e processo para fabricação de pastilhas de silício para baterias solares BR9611816A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1996/002965 WO1998016466A1 (fr) 1996-10-14 1996-10-14 Procede et appareil de preparation de silicium polycristallin et procede de preparation d'un substrat en silicium pour cellule solaire

Publications (1)

Publication Number Publication Date
BR9611816A true BR9611816A (pt) 1999-07-13

Family

ID=14153957

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9611816A BR9611816A (pt) 1996-10-14 1996-10-14 Processo e aparelho para fabricação de silício policristalino e processo para fabricação de pastilhas de silício para baterias solares

Country Status (6)

Country Link
US (1) US5961944A (pt)
JP (1) JP3325900B2 (pt)
KR (1) KR100263220B1 (pt)
BR (1) BR9611816A (pt)
DE (1) DE69621348T2 (pt)
TW (1) TW335539B (pt)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6125529A (en) * 1996-06-17 2000-10-03 Thermometrics, Inc. Method of making wafer based sensors and wafer chip sensors
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JPH11310496A (ja) * 1998-02-25 1999-11-09 Mitsubishi Materials Corp 一方向凝固組織を有するシリコンインゴットの製造方法およびその製造装置
DE10019601B4 (de) * 2000-04-20 2006-09-14 Wacker Chemie Ag Verfahren zur Herstellung eines polykristallinen Siliciumstabes
WO2002016265A1 (en) 2000-08-21 2002-02-28 Astropower, Inc. Method and apparatus for purifying silicon
KR20030035152A (ko) 2001-10-30 2003-05-09 주식회사 하이닉스반도체 반도체웨이퍼 제조방법
US8021483B2 (en) * 2002-02-20 2011-09-20 Hemlock Semiconductor Corporation Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods
KR100445976B1 (ko) * 2002-05-28 2004-08-25 길종원 단결정 실리콘 인곳의 스크랩부분을 이용한 태양전지용웨이퍼의 제조방법
JP4357810B2 (ja) * 2002-07-25 2009-11-04 三菱マテリアル株式会社 鋳造装置及び鋳造方法
AU2003277041A1 (en) * 2002-09-27 2004-04-19 Astropower, Inc. Methods and systems for purifying elements
CN100457615C (zh) * 2003-12-04 2009-02-04 陶氏康宁公司 从冶金级硅中去除杂质以制得太阳能级硅的方法
NO333319B1 (no) * 2003-12-29 2013-05-06 Elkem As Silisiummateriale for fremstilling av solceller
JP2005343780A (ja) * 2004-06-03 2005-12-15 Iis Materials:Kk スクラップシリコンのリサイクル方法
US7141114B2 (en) * 2004-06-30 2006-11-28 Rec Silicon Inc Process for producing a crystalline silicon ingot
US20060105105A1 (en) * 2004-11-12 2006-05-18 Memc Electronic Materials, Inc. High purity granular silicon and method of manufacturing the same
JP4689373B2 (ja) * 2005-07-04 2011-05-25 シャープ株式会社 シリコンの再利用方法
US7790129B2 (en) * 2005-07-29 2010-09-07 Lord Ltd., Lp Set of processes for removing impurities from a silcon production facility
US8105434B2 (en) * 2005-08-05 2012-01-31 Faris Sadeg M Si ribbon, SiO2 ribbon and ultra pure ribbons of other substances
JP4947455B2 (ja) * 2005-08-16 2012-06-06 則近 山内 電子ビームを用いたシリコンの精錬方法及び装置
GEP20115178B (en) * 2006-09-14 2011-03-10 Silicium Becancour Inc Process and apparatus for purifying low-grade silicon material
KR100828254B1 (ko) * 2006-10-27 2008-05-07 미리넷솔라 주식회사 태양전지용 실리콘 기판의 제조 공정
KR20100015652A (ko) 2007-03-19 2010-02-12 엠엔케이-에스오지 실리콘 인코포레이티드 실리콘 잉곳의 제조방법 및 제조장치
CN101307487B (zh) * 2007-05-16 2010-05-19 佳科太阳能硅(厦门)有限公司 一种连续生产多晶硅锭的定向凝固方法及其装置
US7955433B2 (en) * 2007-07-26 2011-06-07 Calisolar, Inc. Method and system for forming a silicon ingot using a low-grade silicon feedstock
DE102007038281B4 (de) * 2007-08-03 2009-06-18 Forschungszentrum Dresden - Rossendorf E.V. Verfahren und Einrichtung zum elektromagnetischen Rühren von elektrisch leitenden Flüssigkeiten
CN101868422B (zh) * 2007-09-13 2013-10-09 费罗索勒硅业公司 用于从冶金级硅制备中等和高纯度硅的方法
CN101219789B (zh) * 2007-09-29 2010-06-16 北京航空航天大学 高能束流多晶硅提纯装置
KR100981134B1 (ko) * 2008-03-25 2010-09-10 한국생산기술연구원 저순도 실리콘 스크랩을 정련하여 태양 전지급 고순도실리콘 주괴를 제조하기 위한 시스템, 방법 및 그에 의해제조된 태양 전지급 고순도 실리콘 주괴
US20090288591A1 (en) * 2008-05-13 2009-11-26 Ravi Kramadhati V Crystal Growth Apparatus for Solar Cell Manufacturing
US20100047148A1 (en) * 2008-05-23 2010-02-25 Rec Silicon, Inc. Skull reactor
US20090289390A1 (en) * 2008-05-23 2009-11-26 Rec Silicon, Inc. Direct silicon or reactive metal casting
WO2010013484A1 (ja) * 2008-08-01 2010-02-04 株式会社アルバック 金属の精製方法
CN101328606B (zh) * 2008-08-01 2011-06-08 山西中电科新能源技术有限公司 多晶硅铸锭炉同步提升装置
KR101318239B1 (ko) 2008-08-12 2013-10-15 가부시키가이샤 아루박 실리콘의 정제 방법
CN102123945B (zh) * 2008-08-15 2013-08-07 株式会社爱发科 硅精制方法
KR100892108B1 (ko) * 2008-11-22 2009-04-08 박인순 곡선형상의 태양전지용 실리콘웨이퍼 및 그 제조방법
DE102009014562A1 (de) * 2009-03-16 2010-09-23 Schmid Silicon Technology Gmbh Aufreinigung von metallurgischem Silizium
KR101101989B1 (ko) * 2009-03-27 2012-01-02 최종오 폴리 실리콘의 제조방법 및 제조장치
KR20120090030A (ko) * 2009-07-16 2012-08-16 엠이엠씨 싱가포르 피티이. 엘티디. 코팅된 도가니 및 그의 제조 방법 및 용도
TWI393805B (zh) * 2009-11-16 2013-04-21 Masahiro Hoshino Purification method of metallurgical silicon
CN101708850B (zh) * 2009-11-19 2011-09-14 大连理工大学 连续熔炼去除多晶硅中磷和硼的方法及装置
TWI397617B (zh) * 2010-02-12 2013-06-01 Masahiro Hoshino Metal silicon purification device
WO2011128292A1 (de) * 2010-04-13 2011-10-20 Schmid Silicon Technology Gmbh Herstellung von monokristallinen halbleiterwerkstoffen
CN102275929A (zh) * 2010-06-10 2011-12-14 上海华巨硅材料有限公司 一种提高冶金硅纯度的方法及实现该方法的装置
TWI403461B (zh) 2010-07-21 2013-08-01 Masahiro Hoshino Method and apparatus for improving yield and yield of metallurgical silicon
CN102742034B (zh) * 2010-08-16 2015-10-14 星野政宏 冶金硅的提纯方法
WO2012073876A1 (ja) * 2010-11-29 2012-06-07 株式会社アルバック シリコン精錬装置及びシリコン精錬方法
CN102120578B (zh) * 2011-01-29 2012-10-03 大连隆田科技有限公司 一种电子束除磷、除金属的耦合提纯多晶硅的方法及设备
US9352389B2 (en) * 2011-09-16 2016-05-31 Silicor Materials, Inc. Directional solidification system and method
US8960657B2 (en) 2011-10-05 2015-02-24 Sunedison, Inc. Systems and methods for connecting an ingot to a wire saw
TWI477667B (zh) 2011-10-24 2015-03-21 Wen Pin Sun 真空循環精煉太陽能級多晶矽設備及太陽能級多晶矽提煉方法
KR101382176B1 (ko) * 2011-12-14 2014-04-10 주식회사 글로실 윙 타입 도어 개폐장치를 구비한 다결정 실리콘 주괴 제조장치
PL2824070T3 (pl) * 2012-03-08 2019-09-30 Silicio Ferrosolar S.L. Sposób wytwarzania krzemu o wysokiej czystości
US8794035B2 (en) * 2012-05-04 2014-08-05 Korea Institute Of Energy Research Apparatus for manufacturing high purity polysilicon using electron-beam melting and method of manufacturing high purity polysilicon using the same
US8997524B2 (en) * 2012-05-04 2015-04-07 Korea Institute Of Energy Research Apparatus for manufacturing polysilicon based electron-beam melting using dummy bar and method of manufacturing polysilicon using the same
TWI532890B (zh) * 2012-06-25 2016-05-11 希利柯爾材料股份有限公司 矽之控制定向固化
JP5737265B2 (ja) * 2012-10-23 2015-06-17 信越化学工業株式会社 珪素酸化物及びその製造方法、負極、ならびにリチウムイオン二次電池及び電気化学キャパシタ
TWI643983B (zh) 2013-03-14 2018-12-11 美商希利柯爾材料股份有限公司 定向凝固系統及方法
US11784276B2 (en) 2017-04-19 2023-10-10 Sunpower Corporation Methods of recycling silicon swarf into electronic grade polysilicon or metallurgical-grade silicon
TWI640473B (zh) * 2017-12-07 2018-11-11 財團法人工業技術研究院 除硼方法與除硼裝置
CN111777070A (zh) * 2020-07-21 2020-10-16 昆明理工大学 一种金刚石线硅片切割废料高值化再生利用的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3012865A (en) * 1957-11-25 1961-12-12 Du Pont Silicon purification process
US3658119A (en) * 1968-04-03 1972-04-25 Airco Inc Apparatus for processing molten metal in a vacuum
DE2623413C2 (de) * 1976-05-25 1985-01-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Herstellen von für Halbleiterbauelemente verwendbarem Silicium
US4193974A (en) * 1977-11-21 1980-03-18 Union Carbide Corporation Process for producing refined metallurgical silicon ribbon
US4312847A (en) * 1979-05-24 1982-01-26 Aluminum Company Of America Silicon purification system
DE2924584A1 (de) * 1979-06-19 1981-01-15 Straemke Siegfried Verfahren zur herstellung von silicium fuer solarzellen
DE3220285A1 (de) * 1982-05-28 1983-12-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen polykristalliner, fuer nachfolgendes zonenschmelzen geeigneter siliciumstaebe
JPS61141612A (ja) * 1984-12-11 1986-06-28 Osaka Titanium Seizo Kk シリコン多結晶の造塊方法
JPH075288B2 (ja) * 1985-07-31 1995-01-25 フォトワット・インタナショナル・ソシエテ・アノニム 分割されたけい素をプラズマの下で精製する方法
FR2594856A1 (fr) * 1986-02-27 1987-08-28 Photowatt Int Procede d'obtention de cristaux de silicium pour applications photovoltaiques
JP3205352B2 (ja) * 1990-05-30 2001-09-04 川崎製鉄株式会社 シリコン精製方法及び装置
DE4018967A1 (de) * 1990-06-13 1991-12-19 Wacker Chemitronic Verfahren und vorrichtung zum giessen von siliciumbloecken mit kolumnarstruktur als grundmaterial fuer solarzellen
JP3000109B2 (ja) * 1990-09-20 2000-01-17 株式会社住友シチックス尼崎 高純度シリコン鋳塊の製造方法
JPH04193706A (ja) * 1990-11-28 1992-07-13 Kawasaki Steel Corp シリコンの精製方法
JP3005633B2 (ja) * 1991-05-16 2000-01-31 株式会社住友シチックス尼崎 太陽電池用多結晶シリコン鋳塊の製造方法
JPH05139713A (ja) * 1991-11-21 1993-06-08 Kawasaki Steel Corp シリコンの精製方法及びその装置
JP2905353B2 (ja) * 1993-02-04 1999-06-14 川崎製鉄株式会社 金属シリコンの精製方法
JPH0717704A (ja) * 1993-06-24 1995-01-20 Kawasaki Steel Corp 電子ビーム溶解によるシリコンの精錬方法
JPH08217436A (ja) * 1995-02-17 1996-08-27 Kawasaki Steel Corp 金属シリコンの凝固精製方法、その装置及びその装置に用いる鋳型

Also Published As

Publication number Publication date
DE69621348D1 (de) 2002-06-27
KR100263220B1 (ko) 2000-09-01
TW335539B (en) 1998-07-01
KR19980703521A (ko) 1998-11-05
US5961944A (en) 1999-10-05
JP3325900B2 (ja) 2002-09-17
DE69621348T2 (de) 2002-09-05

Similar Documents

Publication Publication Date Title
BR9611816A (pt) Processo e aparelho para fabricação de silício policristalino e processo para fabricação de pastilhas de silício para baterias solares
GB2347268B (en) Method of semiconductor device fabrication
KR970700933A (ko) Besoi 웨이퍼와 그 외부 에지를 스트립하는 방법(besoi wafer and process for stripping outer edge thereof)
AU3308699A (en) Apparatus and method for cleaning semiconductor wafers
AU4293399A (en) Method and device for transferring wafers
NO981311D0 (no) Fremgangsmåte for fremstilling av silisium for bruk i solceller
GB0027292D0 (en) Method and apparatus for document indexing and searching
DE69734183T8 (de) Sonnenzelle und Herstellungsverfahren
AU4432899A (en) Semiconductor wafer evaluating apparatus and method
DE19983188T1 (de) Siliziumhalbleitersubstrat und Verfahren zu dessen Herstellung
EP1117854A4 (en) Method and apparatus for forming polycrystalline and amorphous silicon films
BR9701330A (pt) Processo e aparelho para refinamento de silício
EP0926718A3 (en) Heat treatment method for monocrystalline silicon wafers
AU8354691A (en) Amorphous silicon solar cell and method for manufacturing the same
EP1087040A4 (en) APPARATUS AND METHOD FOR PRODUCING A SINGLE CRYSTAL OF SILICON, SINGLE CRYSTAL, AND WAFER OBTAINED BY THIS METHOD
SG74007A1 (en) Apparatus and method for dicing semiconductor wafers
GB9710204D0 (en) Semiconductor wafer thermal processing apparatus
BR8505301A (pt) Processo e aparelho para producao de silicone policristalino
EP1074643A4 (en) CRYSTAL SILICON WAFERS WITH LITTLE CRYSTAL DEFECTS AND METHOD FOR THE PRODUCTION THEREOF
GB9914083D0 (en) Method and apparatus for improved semiconductor wafer polishing
GB2317052B (en) Thermal processing apparatus for semiconductor wafers
IL122937A0 (en) Semiconductor etching process and apparatus
GB2316805B (en) method for dry-etching of silicon substrate
EP0990718A4 (en) METHOD FOR PRODUCING A SILICONE SINGLE CRYSTAL AND WAFER FROM SILICON SINGLE CRYSTAL
GB2313708B (en) Method of fabricating semiconductor device

Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements