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ZA818106B - Process for producing relief copies - Google Patents

Process for producing relief copies

Info

Publication number
ZA818106B
ZA818106B ZA818106A ZA818106A ZA818106B ZA 818106 B ZA818106 B ZA 818106B ZA 818106 A ZA818106 A ZA 818106A ZA 818106 A ZA818106 A ZA 818106A ZA 818106 B ZA818106 B ZA 818106B
Authority
ZA
South Africa
Prior art keywords
layer
exposure
relief copies
producing relief
copies
Prior art date
Application number
ZA818106A
Other languages
English (en)
Inventor
Klaus Horn
Hartmut Steppan
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA818106B publication Critical patent/ZA818106B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Secondary Cells (AREA)
  • Materials For Photolithography (AREA)
  • Bakery Products And Manufacturing Methods Therefor (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Amplifiers (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
ZA818106A 1980-11-29 1981-11-23 Process for producing relief copies ZA818106B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803045149 DE3045149A1 (de) 1980-11-29 1980-11-29 Verfahren zur herstellung von reliefkopien

Publications (1)

Publication Number Publication Date
ZA818106B true ZA818106B (en) 1982-10-27

Family

ID=6117970

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA818106A ZA818106B (en) 1980-11-29 1981-11-23 Process for producing relief copies

Country Status (12)

Country Link
EP (1) EP0053708B1 (es)
JP (1) JPS57119343A (es)
AT (1) ATE15951T1 (es)
AU (1) AU7768081A (es)
BR (1) BR8107750A (es)
DE (2) DE3045149A1 (es)
DK (1) DK526781A (es)
ES (1) ES8301036A1 (es)
FI (1) FI813800L (es)
IL (1) IL64395A0 (es)
NO (1) NO814046L (es)
ZA (1) ZA818106B (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3279843D1 (en) * 1982-08-25 1989-08-31 Fujitsu Ltd Method for forming patterned resist layer on semiconductor body
DE3534414A1 (de) * 1985-09-27 1987-04-02 Standard Elektrik Lorenz Ag Verfahren und vorrichtung zur erzeugung einer schwarzmatrixschicht
JPS6291938A (ja) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd 製版方法
ATE45228T1 (de) * 1985-10-25 1989-08-15 Hoechst Celanese Corp Verfahren zur herstellung eines positiv arbeitenden photoresists.
JP2551425B2 (ja) * 1987-02-17 1996-11-06 三洋電機株式会社 透過型液晶表示装置の製造方法
JP2886254B2 (ja) * 1990-04-25 1999-04-26 旭化成工業株式会社 感光性樹脂版の製造方法及びそれに用いる製版装置
DE4033294A1 (de) * 1990-10-19 1992-04-23 Siemens Ag Verfahren zur fotolithographischen herstellung von strukturen auf einem traeger
KR100454011B1 (ko) * 1996-03-07 2005-04-28 클라리언트 인터내셔널 리미티드 포지티브포토레지스트조성물의열처리법
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447913C3 (de) * 1964-10-15 1979-08-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
DE1522503C3 (de) * 1967-01-24 1978-11-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
US3623869A (en) * 1969-10-27 1971-11-30 Plastic Coating Corp Method for imaging diazosulfonate photoreproduction materials
DD103740A1 (es) * 1973-04-24 1974-02-05

Also Published As

Publication number Publication date
ES507538A0 (es) 1982-11-01
EP0053708B1 (de) 1985-10-02
FI813800A7 (fi) 1982-05-30
ATE15951T1 (de) 1985-10-15
BR8107750A (pt) 1982-08-31
IL64395A0 (en) 1982-02-28
FI813800L (fi) 1982-05-30
JPS57119343A (en) 1982-07-24
EP0053708A3 (en) 1982-08-04
DE3045149A1 (de) 1982-07-01
DE3172541D1 (en) 1985-11-07
DK526781A (da) 1982-05-30
ES8301036A1 (es) 1982-11-01
NO814046L (no) 1982-06-01
EP0053708A2 (de) 1982-06-16
AU7768081A (en) 1982-06-10

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