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NO814046L - Fremgangsmaate til fremstilling av reliefkopier - Google Patents

Fremgangsmaate til fremstilling av reliefkopier

Info

Publication number
NO814046L
NO814046L NO814046A NO814046A NO814046L NO 814046 L NO814046 L NO 814046L NO 814046 A NO814046 A NO 814046A NO 814046 A NO814046 A NO 814046A NO 814046 L NO814046 L NO 814046L
Authority
NO
Norway
Prior art keywords
layer
exposure
plate
light
exposed
Prior art date
Application number
NO814046A
Other languages
English (en)
Norwegian (no)
Inventor
Klaus Horn
Hartmut Steppan
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of NO814046L publication Critical patent/NO814046L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Bakery Products And Manufacturing Methods Therefor (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Materials For Photolithography (AREA)
  • Secondary Cells (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Amplifiers (AREA)
NO814046A 1980-11-29 1981-11-27 Fremgangsmaate til fremstilling av reliefkopier NO814046L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803045149 DE3045149A1 (de) 1980-11-29 1980-11-29 Verfahren zur herstellung von reliefkopien

Publications (1)

Publication Number Publication Date
NO814046L true NO814046L (no) 1982-06-01

Family

ID=6117970

Family Applications (1)

Application Number Title Priority Date Filing Date
NO814046A NO814046L (no) 1980-11-29 1981-11-27 Fremgangsmaate til fremstilling av reliefkopier

Country Status (12)

Country Link
EP (1) EP0053708B1 (es)
JP (1) JPS57119343A (es)
AT (1) ATE15951T1 (es)
AU (1) AU7768081A (es)
BR (1) BR8107750A (es)
DE (2) DE3045149A1 (es)
DK (1) DK526781A (es)
ES (1) ES8301036A1 (es)
FI (1) FI813800L (es)
IL (1) IL64395A0 (es)
NO (1) NO814046L (es)
ZA (1) ZA818106B (es)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3279843D1 (en) * 1982-08-25 1989-08-31 Fujitsu Ltd Method for forming patterned resist layer on semiconductor body
DE3534414A1 (de) * 1985-09-27 1987-04-02 Standard Elektrik Lorenz Ag Verfahren und vorrichtung zur erzeugung einer schwarzmatrixschicht
JPS6291938A (ja) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd 製版方法
EP0226741B1 (de) * 1985-10-25 1989-08-02 Hoechst Celanese Corporation Verfahren zur Herstellung eines positiv arbeitenden Photoresists
JP2551425B2 (ja) * 1987-02-17 1996-11-06 三洋電機株式会社 透過型液晶表示装置の製造方法
JP2886254B2 (ja) * 1990-04-25 1999-04-26 旭化成工業株式会社 感光性樹脂版の製造方法及びそれに用いる製版装置
DE4033294A1 (de) * 1990-10-19 1992-04-23 Siemens Ag Verfahren zur fotolithographischen herstellung von strukturen auf einem traeger
EP0885410B1 (en) * 1996-03-07 2000-09-13 Clariant Finance (BVI) Limited Thermal treatment process of positive photoresist composition
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447913C3 (de) * 1964-10-15 1979-08-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
DE1522503C3 (de) * 1967-01-24 1978-11-09 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung von Druckformen
US3623869A (en) * 1969-10-27 1971-11-30 Plastic Coating Corp Method for imaging diazosulfonate photoreproduction materials
DD103740A1 (es) * 1973-04-24 1974-02-05

Also Published As

Publication number Publication date
ES507538A0 (es) 1982-11-01
JPS57119343A (en) 1982-07-24
DE3172541D1 (en) 1985-11-07
EP0053708B1 (de) 1985-10-02
ES8301036A1 (es) 1982-11-01
ZA818106B (en) 1982-10-27
FI813800A7 (fi) 1982-05-30
EP0053708A2 (de) 1982-06-16
DK526781A (da) 1982-05-30
IL64395A0 (en) 1982-02-28
AU7768081A (en) 1982-06-10
ATE15951T1 (de) 1985-10-15
FI813800L (fi) 1982-05-30
BR8107750A (pt) 1982-08-31
EP0053708A3 (en) 1982-08-04
DE3045149A1 (de) 1982-07-01

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