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WO2023211110A1 - Composition pour le nettoyage d'un masque métallique et procédé de nettoyage l'utilisant - Google Patents

Composition pour le nettoyage d'un masque métallique et procédé de nettoyage l'utilisant Download PDF

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Publication number
WO2023211110A1
WO2023211110A1 PCT/KR2023/005599 KR2023005599W WO2023211110A1 WO 2023211110 A1 WO2023211110 A1 WO 2023211110A1 KR 2023005599 W KR2023005599 W KR 2023005599W WO 2023211110 A1 WO2023211110 A1 WO 2023211110A1
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WIPO (PCT)
Prior art keywords
cleaning
composition
metal mask
metal
weight
Prior art date
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Ceased
Application number
PCT/KR2023/005599
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English (en)
Korean (ko)
Inventor
심현호
김창규
조준휘
박은지
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mti Co ltd
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Mti Co ltd
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Filing date
Publication date
Priority claimed from KR1020220069543A external-priority patent/KR102719037B1/ko
Application filed by Mti Co ltd filed Critical Mti Co ltd
Publication of WO2023211110A1 publication Critical patent/WO2023211110A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/36—Organic compounds containing phosphorus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • H10P95/00—

Definitions

  • Examples relate to a composition for cleaning a metal mask and a cleaning method using the same.
  • OLED Organic light emitting diodes
  • An OLED display is composed of several layers, including a TFT (Thin Film Transistor) element, organic materials, an encapsulation layer, and a cover window, and this multilayer structure can be formed by a deposition method using a mask.
  • Masks used in the deposition process when manufacturing OLED displays include open masks (OM) and fine metal masks (FMM), and metal materials are generally used.
  • the open mask is used in the process of depositing an organic film on an OLED substrate to form a light emitting layer during the display manufacturing process
  • the fine metal mask is a thin metal plate with ultra-fine holes in red, green, and blue. It serves to guide the (Blue) organic luminescent material to pass through the hole and be deposited at the desired location on the substrate. Since the accuracy of deposition performed through such a mask is directly related to production yield, accurate processing of the mask is important.
  • Representative methods of manufacturing metal masks include the etching method, which involves rolling a metal plate thinly and then cutting off unnecessary parts, or the electro-forming method, which involves plating a patterned substrate using the principles of electroplating.
  • the etching method which involves rolling a metal plate thinly and then cutting off unnecessary parts
  • the electro-forming method which involves plating a patterned substrate using the principles of electroplating.
  • there are other limitations such as selective etching, so in order to achieve high resolution 1000 ppi suitable for implementing virtual reality (VR) and augmented reality (AR) in addition to ultra-high definition (UHD) level 800 ppi, patterns are manufactured by drilling holes using a laser. Laser patterning methods are gaining prominence.
  • embodiments provide a cleaning composition that can selectively clean the base material of a metal mask processed by a laser without damaging it, and does not contain environmentally regulated substances.
  • the purpose is to provide a composition and cleaning method.
  • examples include 70 to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and a remaining amount of water. It provides a composition for cleaning a metal mask comprising:
  • a composition for cleaning a metal mask which additionally includes 0.001 to 1% by weight of a corrosion inhibitor based on the total weight of the composition.
  • a composition for cleaning a metal mask which additionally includes 0.01 to 0.1% by weight of a corrosion inhibitor based on the total weight of the composition.
  • the phosphonic acid metal chelating agent includes DTPMPA (Diethylenetriamine penta(Methylene phosphonic acid)), ATMP (Aminotri(methylene phosphonic acid)), HEDP (1-Hydroxyethylidene-1,1-diphosphonic acid), Characterized by comprising at least one selected from the group consisting of HMDTMPA (Hexamethylenediamine tetra(methylene phosphonic acid)), PBTCA (2-Phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)) do.
  • DTPMPA Diethylenetriamine penta(Methylene phosphonic acid)
  • ATMP Aminotri(methylene phosphonic acid)
  • HEDP 1-Hydroxyethylidene-1,1-diphosphonic acid
  • the corrosion inhibitor is benzotriazole, 1-Amino-benzotriazole, and 1-Hydroxy-benzotriazole. ), 5-Methyl-1H-benzotriazole, and benzotriazole-5-carboxylic acid. Do it as
  • the cleaning may be performed to remove oxide formed when laser irradiation is applied to the metal mask.
  • the oxides include iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and SUS (Steel Use). It may be an oxide of at least one metal selected from the group consisting of Stainless alloy, Inconel alloy, Kovar alloy, and Invar alloy.
  • the base material of the metal mask is iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum ( It may contain at least one metal selected from Mo), SUS (Steel Use Stainless) alloy, Inconel alloy, Kovar alloy, and Invar alloy.
  • a method for cleaning a metal mask including the step of bringing the above-described cleaning composition into contact with the metal mask.
  • the cleaning method according to one embodiment may be performed by bringing the cleaning composition into contact with the metal mask using at least one of a spray method, a dipping method, and an ultrasonic method.
  • the cleaning method according to one embodiment may include a first step performed for 5 to 30 minutes at a temperature of 10 to 50° C. using the dipping method.
  • the cleaning method according to one embodiment may include, after the first step, a second step performed by applying ultrasonic waves using distilled water at a temperature of 10 to 50° C. for 5 to 30 minutes.
  • the metal mask cleaning composition and cleaning method of the embodiment it is possible to provide a cleaning composition and cleaning method that can selectively clean the base material of a metal mask processed by a laser without damaging it.
  • the cleaning composition of the present invention and the cleaning method using the same can remove metal oxides with higher cleaning power without damaging the base material of the fine metal mask processed by a laser.
  • the examples can provide a cleaning composition and cleaning method that do not contain environmentally regulated substances.
  • Figure 1 is a photograph of an ultrasonic bath to check corrosiveness after cleaning using a conventional cleaning composition.
  • Figures 2a to 2e are photographs taken to confirm the apparent cleanability of a metal mask after cleaning using a cleaning composition according to an experimental example.
  • Figures 3a and 3b are SEM images before and after cleaning the metal mask using the composition of Comparative Example 1, respectively (before cleaning: Figure 3a, after cleaning: Figure 3b).
  • Figure 4a is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 1.
  • Figure 4b is an SEM photograph after cleaning the metal mask using the composition of Example 2.
  • Figures 5a and 5b are SEM images before and after cleaning the metal mask using the composition according to Example 5, respectively.
  • Figures 5c and 5d are SEM images before and after cleaning the metal mask using the composition according to Example 5, respectively.
  • Figure 6a is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 4.
  • Figure 6b is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 5.
  • the metal mask cleaning composition includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and the remaining amount of water.
  • the phosphonic acid metal chelating agent can exhibit improved metal mask cleaning ability by being included in a relatively high content, that is, 70 to 90% by weight based on the total weight of the cleaning composition.
  • Strong acids such as sulfuric acid, phosphoric acid, and hydrochloric acid included in conventional cleaning compositions are problematic because they generate harmful substances such as SO
  • the metal mask cleaning composition of the example can exhibit excellent cleaning ability without damaging the base material of the metal mask, and is not an environmentally regulated substance.
  • the cleaning composition of the example has the advantage of being non-corrosive to stainless steel (SUS)-based ultrasonic bath materials.
  • the metal mask cleaning composition of the example contains a phosphonic acid metal chelating agent and can exhibit very effective cleaning power while exhibiting strong acidity of pH 1.0 or less. In particular, it has high cleaning power without damaging the metal mask of the Invar base material. represents.
  • the phosphonic acid metal chelating agent includes Diethylenetriamine penta(methylene phosphonic acid) (DTPMPA), Aminotri(methylene phosphonic acid) (ATMP), 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP), and HMDTMPA ( It is characterized in that it contains one or more selected from the group consisting of Hexamethylenediamine tetra(methylene phosphonic acid)), PBTCA (2-phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)) .
  • DTPMPA Diethylenetriamine penta(methylene phosphonic acid)
  • ATMP Aminotri(methylene phosphonic acid)
  • HEDP 1-hydroxyethylidene-1,1-diphosphonic acid
  • HMDTMPA HMDTMPA
  • a phosphonic acid metal chelating agent contained in an amount of 70% to 90% by weight based on the total weight of the composition; and a remaining amount of water; in the metal mask cleaning composition according to one embodiment including a remaining amount of water, the remaining amount of water refers to the remaining weight% excluding the metal chelating agent when the cleaning composition is 100% by weight.
  • the metal mask cleaning composition according to one embodiment may additionally include 0.001 to 1% by weight of a corrosion inhibitor based on the total weight of the composition, and more preferably 0.01 to 0.1% by weight based on the total weight of the composition. can do.
  • a phosphonic acid metal chelating agent contained in an amount of 70% to 90% by weight based on the total weight of the composition; 0.001 to 1% by weight of corrosion inhibitor; and a remaining amount of water. More preferably, the phosphonic acid metal chelating agent is included in an amount of 70% to 90% by weight based on the total weight of the composition; 0.01 to 0.1% by weight of corrosion inhibitor; and a remaining amount of water.
  • the remaining amount of water refers to the remaining weight% excluding the content of the phosphonic acid metal chelating agent and corrosion inhibitor, based on 100% by weight of the cleaning composition.
  • composition for cleaning a metal mask according to one embodiment has the advantage of showing little corrosiveness to the base material of the metal mask as it contains a corrosion inhibitor in the above content range.
  • the corrosion inhibitor is characterized in that it includes at least one of an azole-based corrosion inhibitor and an ethanolamine-based corrosion inhibitor, but is not limited thereto.
  • the azole-based corrosion inhibitor may include at least one selected from the group consisting of triazole compounds, benzotriazole compounds, imidazole compounds, tetrazole compounds, thiazole compounds, oxazole compounds, and pyrazole compounds.
  • the ethanolamine-based corrosion inhibitor may include at least one selected from the group consisting of monoethanolamine, diethanolamine, and triethanolamine.
  • the corrosion inhibitor includes a benzotriazole compound.
  • benzotriazole 1-Amino-benzotriazole, 1-Hydroxy-benzotriazole, 5-methyl-1H-benzotriazole It is characterized in that it contains at least one selected from the group consisting of (5-Methyl-1H-benzotriazole) and benzotriazole-5-carboxylic acid.
  • the metal mask cleaning composition of the example preferably contains 0.01 to 0.1% by weight of the benzotriazole compound based on the total weight of the composition, and the metal mask cleaning composition of this composition is particularly suitable for use on metals made of Invar. It does not cause etching or pit corrosion to the mask itself and does not show corrosion to cleaning equipment.
  • the cleaning equipment may be SUS 304 or SUS 316, which are commonly used as materials for ultrasonic baths, but is not limited thereto.
  • composition for cleaning a metal mask is to remove oxide formed when a laser is irradiated to a metal mask during metal mask processing. That is, when a laser is irradiated to a metal mask, the base material of the metal mask is oxidized due to a high-temperature reaction of the laser to generate metal oxide, and the cleaning composition of the example removes such oxide.
  • the oxides include iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), SUS (Steel Use Stainless) alloy, Inconel ( It may be an oxide of at least one metal selected from Inconel alloy, Kovar alloy, and Invar alloy.
  • the base material of the metal mask is iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and SUS (Steel). It may contain at least one metal selected from Use Stainless alloy, Inconel alloy, Kovar alloy, and Invar alloy.
  • the base material of the metal mask may be Invar alloy.
  • Invar alloy's main ingredients are iron (Fe) and nickel (Ni), and it has the advantage of having less thermal expansion than SUS alloy and not significantly reducing tension even at high temperatures, making it more desirable for use as a base material for metal masks.
  • the cleaning composition of the example is used on a metal mask whose base material is an Invar alloy, it is more preferable because it is less corrosive and has higher cleaning properties.
  • the cleaning method of the present invention includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and the step of contacting the metal mask with a cleaning composition containing a residual amount of water.
  • a metal mask cleaning method may be performed by bringing the cleaning composition into contact with the metal mask using at least one of a spray method, a dipping method, and an ultrasonic method, but is limited to the above-described method. It doesn't work.
  • the spray method is a method of spraying the cleaning composition on a metal mask base material
  • the dipping method is a method of filling a cleaning tank with the cleaning composition and immersing the metal mask base material
  • the ultrasonic method is a method of spraying the cleaning composition onto the metal mask base material. This can be performed by immersing the metal mask base material and applying ultrasonic waves.
  • the step of contacting the cleaning composition with a metal mask may be performed at a temperature of 10 to 50 ° C. for 5 to 30 minutes using a dipping method. It is not limited to this.
  • the second step is additionally performed using distilled water and applying ultrasonic waves at a temperature of 10 to 50 ° C for 5 to 30 minutes to create a metal mask. can be cleaned.
  • a method of cleaning a metal mask includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; 0.01 to 0.1% by weight of corrosion inhibitor; and the step of contacting the metal mask with a cleaning composition containing a residual amount of water.
  • a cleaning composition containing a residual amount of water.
  • a composition for cleaning a metal mask is prepared according to the composition in the table, and then the metal mask is cleaned. i) the corrosion of the ultrasonic bath (material SUS 304, 316) cleaning equipment, ii) the corrosion (etching) of the metal mask, iii) metal mask corrosion (pit corrosion), and iv) apparent cleanability were evaluated.
  • Metal mask corrosion (etchability) evaluation is to evaluate whether the metal mask base material itself is etched.
  • a fine metal mask (FMM) made of laser-processed Invar was dipped into each cleaning composition, heated to 50° C. with an ultrasonic device, and cleaned for 10 minutes. The etching rate was observed using SEM (cross-section) and evaluated as follows.
  • Metal mask pit corrosion evaluation is to evaluate whether pits, that is, small holes, are formed in the metal mask base material.
  • a fine metal mask (FMM) made of laser-processed Invar was dipped into each cleaning composition, heated to 50° C. with an ultrasonic device, and cleaned for 10 minutes. The etching rate was observed using SEM (cross-section) and evaluated as follows.
  • a cleaning composition was prepared according to the composition in Table 5 below, and then a cleaning test was performed.
  • #1-1 to #1-8 are phosphoric acid-based metal chelating agents such as DTPMPA (Diethylenetriamine penta(methylene phosphonic acid)), ATMP (Aminotri(methylene phosphonic acid)), and HEDP (1-hydroxyethylidene-1,1-diphosphonic acid).
  • HMDTMPA Hydromethyldiamine tetra(methylene phosphonic acid)
  • PBTCA 2-phosphonobutane-1,2,4-tricarboxylic acid
  • EDTMP Ethylenediamine tetra(methylene phosphonic acid)
  • #2- #1 to #2-6 are cases where strong acids (phosphoric acid, hydrochloric acid) commonly used in the cleaning composition are included
  • #2-7 are cases where EDTA (Ethylenediaminetetraacetic acid), a different type of chelating agent, is used.
  • BTA Benzotriazole
  • TEA Triethanolamine
  • compositions #1-1 to #1-8 containing a phosphoric acid-based metal chelating agent showed better effects in terms of cleaning and corrosiveness.
  • strong acids such as phosphoric acid or hydrochloric acid were used, severe corrosion occurred in metal masks and cleaning equipment even if a relatively small amount (10% by weight) was included.
  • Figure 1 is a photograph of ultrasonic cleaning equipment after cleaning according to #2-4 above. Through Figure 1, it can be confirmed that corrosion of the ultrasonic bath occurred after cleaning.
  • Figures 2a to 2e are photographs of a metal mask before and after cleaning to confirm its apparent cleanability.
  • Figure 2a is a photo of a metal mask after laser processing and before cleaning.
  • Figure 2b shows the apparent cleanability of LV1 (good external gloss and good cleaning power) according to Example 5, which will be described later, and
  • Figure 2c corresponds to #1-7 of Table 5, and shows LV2 (slightly dark appearance, some This indicates the apparent cleanability of the level of debris present.
  • Figure 2d corresponds to #1-8 of Table 5, LV3 (dark appearance, presence of many debris),
  • Figure 2e corresponds to #2-7 of Table 5, LV4 (no change in appearance, no cleaning effect) It indicates the degree.
  • the cleaning composition containing a phosphonic acid-based metal chelating agent apparently exhibits better cleaning properties.
  • a cleaning composition was prepared by adjusting the content of phosphoric acid metal chelate, and then a cleaning test was performed.
  • Figure 3 is an SEM photograph before and after cleaning the metal mask using the composition according to Comparative Example 1.
  • Figure 3a is a photograph of a metal mask before cleaning after laser processing.
  • Figure 3b is a photograph of a metal mask cleaned using the composition according to Example 1.
  • Figure 4 is an SEM photograph after cleaning the metal mask using the composition according to Comparative Example 1 and Example 2.
  • Figure 4a is a photograph of a metal mask cleaned using the composition according to Comparative Example 1
  • Figure 4b is a photograph of a metal mask cleaned using the composition according to Example 2. Looking at Figure 4a, it can be seen that pit corrosion appears when cleaning is performed using the composition according to Comparative Example 1.
  • a cleaning composition was prepared by including 0.01% by weight of BTA, a corrosion inhibitor, and adjusting the content of phosphoric acid metal chelate, and then a cleaning test was performed.
  • Comparative Example 3 As in Experimental Example 1, it was confirmed that the apparent cleanability of Comparative Example 3 containing less than 70% by weight of the phosphonic acid metal chelating agent was poor, and Comparative Example 4 containing more than 90% by weight of the phosphonic acid metal chelating agent. And in the case of Comparative Example 5, it was confirmed that the apparent cleanability was not good.
  • Figure 5 is an SEM photograph before and after cleaning the metal mask using the composition according to Example 5.
  • Figure 5a is a photograph of a metal mask before cleaning after laser processing
  • Figure 5b is a photograph of a metal mask cleaned using the composition according to Example 5.
  • Figure 5C is a photograph of a metal mask before cleaning after laser processing
  • Figure 5D is a photograph of a metal mask cleaned using the composition according to Example 5.
  • the observed values confirm that the degree of corrosion of the metal mask itself is more severe.
  • Figure 6 is an SEM photograph taken after cleaning using the cleaning compositions of Comparative Examples 4 and 5.
  • Figure 6a is a picture taken of Comparative Example 4
  • Figure 6b is a picture taken of Comparative Example 5 after cleaning.
  • Figure 6 it can be seen that when more than 90% by weight of ATMP is included in the cleaning composition, there is a cleaning defect in the fine area. This means that as the viscosity increases, there is a limit to penetrating the fine area, and the cleaning power actually decreases. It is judged.
  • a cleaning composition was prepared by generally containing 80% by weight of phosphoric acid metal chelate and adjusting the content of BTA, a corrosion inhibitor, and then a cleaning test was performed.

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Abstract

La présente invention concerne une composition pour le nettoyage d'un masque métallique et un procédé de nettoyage l'utilisant. En particulier, l'invention divulgue : une composition pour nettoyer un masque métallique, comprenant de 70 à 90 % en poids d'un agent chélatant métallique d'acide phosphonique sur la base du poids total de la composition, et la quantité résiduelle d'eau; et un procédé de nettoyage d'un masque métallique à l'aide de la composition pour le nettoyage.
PCT/KR2023/005599 2022-04-27 2023-04-25 Composition pour le nettoyage d'un masque métallique et procédé de nettoyage l'utilisant Ceased WO2023211110A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20220052144 2022-04-27
KR10-2022-0052144 2022-04-27
KR1020220069543A KR102719037B1 (ko) 2022-04-27 2022-06-08 메탈 마스크 세정용 조성물 및 이를 이용한 세정 방법
KR10-2022-0069543 2022-06-08

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WO2021039137A1 (fr) * 2019-08-23 2021-03-04 富士フイルム株式会社 Composition d'agent nettoyant

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KR20080011243A (ko) * 2000-06-16 2008-01-31 카오카부시키가이샤 세정제 조성물
WO2007010679A1 (fr) * 2005-07-21 2007-01-25 Kao Corporation Compositions décapantes
KR20100051839A (ko) * 2007-08-02 2010-05-18 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 마이크로전자 장치로부터 잔사를 제거하기 위한 플루오라이드 비-함유 조성물
KR20120029526A (ko) * 2010-09-17 2012-03-27 동우 화인켐 주식회사 평판표시장치 제조용 금속 세정 조성물
KR20180009021A (ko) * 2016-07-15 2018-01-25 삼성디스플레이 주식회사 산화물 제거용 세정 조성물 및 이를 이용한 세정 방법

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