WO2023211110A1 - Composition for cleaning metal mask and cleaning method using same - Google Patents

Abstract

The present invention relates to a composition for cleaning a metal mask and a cleaning method using same. Particularly, disclosed are: a composition for cleaning a metal mask, comprising 70 to 90 wt% of a phosphonic acid metal chelating agent based on the total weight of the composition, and the residual amount of water; and a method for cleaning a metal mask using the composition for cleaning.

Description

Composition for cleaning metal masks and cleaning method using the same

Examples relate to a composition for cleaning a metal mask and a cleaning method using the same.

Organic light emitting diodes (OLED) are electrical devices made by stacking organic compounds in the form of a film that emit light by receiving electrical energy, and have various advantages for use as next-generation lighting and display materials. An OLED display is composed of several layers, including a TFT (Thin Film Transistor) element, organic materials, an encapsulation layer, and a cover window, and this multilayer structure can be formed by a deposition method using a mask. Masks used in the deposition process when manufacturing OLED displays include open masks (OM) and fine metal masks (FMM), and metal materials are generally used. The open mask is used in the process of depositing an organic film on an OLED substrate to form a light emitting layer during the display manufacturing process, and the fine metal mask is a thin metal plate with ultra-fine holes in red, green, and blue. It serves to guide the (Blue) organic luminescent material to pass through the hole and be deposited at the desired location on the substrate. Since the accuracy of deposition performed through such a mask is directly related to production yield, accurate processing of the mask is important.

Representative methods of manufacturing metal masks include the etching method, which involves rolling a metal plate thinly and then cutting off unnecessary parts, or the electro-forming method, which involves plating a patterned substrate using the principles of electroplating. . However, there are other limitations such as selective etching, so in order to achieve high resolution 1000 ppi suitable for implementing virtual reality (VR) and augmented reality (AR) in addition to ultra-high definition (UHD) level 800 ppi, patterns are manufactured by drilling holes using a laser. Laser patterning methods are gaining prominence.

When processing a metal mask using a laser, numerous metal impurities and metal oxides are generated due to the high temperature reaction of the laser. These metal oxides may become stuck on the processing surface of the metal mask and exist as defective pixels, and may contaminate the area around the processing pixels, making it difficult to secure a uniform processing area.

Removal of these metal impurities and metal oxides has been conventionally performed using the RCA-2 cleaning process and other cleaning processes using cleaning solutions containing inorganic acids. However, this process causes strong corrosion of the metal mask material itself due to the hydrochloric acid and other inorganic acids used. It can have an impact, and in particular, it is a problem because it can also corrode the cleaning equipment used in the cleaning process. In addition, since most inorganic acids are environmentally regulated substances, there are many limitations in their application. Accordingly, a new cleaning composition and cleaning method that can solve the above-mentioned problems are required.

In order to achieve the above-described technical problem, embodiments provide a cleaning composition that can selectively clean the base material of a metal mask processed by a laser without damaging it, and does not contain environmentally regulated substances. The purpose is to provide a composition and cleaning method.

In order to achieve the above technical problem, examples include 70 to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and a remaining amount of water. It provides a composition for cleaning a metal mask comprising:

In addition, as one embodiment, a composition for cleaning a metal mask is provided, which additionally includes 0.001 to 1% by weight of a corrosion inhibitor based on the total weight of the composition.

As another embodiment, a composition for cleaning a metal mask is provided, which additionally includes 0.01 to 0.1% by weight of a corrosion inhibitor based on the total weight of the composition.

In the metal mask cleaning composition, the phosphonic acid metal chelating agent includes DTPMPA (Diethylenetriamine penta(Methylene phosphonic acid)), ATMP (Aminotri(methylene phosphonic acid)), HEDP (1-Hydroxyethylidene-1,1-diphosphonic acid), Characterized by comprising at least one selected from the group consisting of HMDTMPA (Hexamethylenediamine tetra(methylene phosphonic acid)), PBTCA (2-Phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)) do.

In addition, in the metal mask cleaning composition, the corrosion inhibitor is benzotriazole, 1-Amino-benzotriazole, and 1-Hydroxy-benzotriazole. ), 5-Methyl-1H-benzotriazole, and benzotriazole-5-carboxylic acid. Do it as

In a composition for cleaning a metal mask, the cleaning may be performed to remove oxide formed when laser irradiation is applied to the metal mask.

In the metal mask cleaning composition, the oxides include iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and SUS (Steel Use). It may be an oxide of at least one metal selected from the group consisting of Stainless alloy, Inconel alloy, Kovar alloy, and Invar alloy.

In the metal mask cleaning composition, the base material of the metal mask is iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum ( It may contain at least one metal selected from Mo), SUS (Steel Use Stainless) alloy, Inconel alloy, Kovar alloy, and Invar alloy.

Additionally, a method for cleaning a metal mask is provided, including the step of bringing the above-described cleaning composition into contact with the metal mask.

The cleaning method according to one embodiment may be performed by bringing the cleaning composition into contact with the metal mask using at least one of a spray method, a dipping method, and an ultrasonic method.

The cleaning method according to one embodiment may include a first step performed for 5 to 30 minutes at a temperature of 10 to 50° C. using the dipping method.

The cleaning method according to one embodiment may include, after the first step, a second step performed by applying ultrasonic waves using distilled water at a temperature of 10 to 50° C. for 5 to 30 minutes.

According to the metal mask cleaning composition and cleaning method of the embodiment, it is possible to provide a cleaning composition and cleaning method that can selectively clean the base material of a metal mask processed by a laser without damaging it. In particular, the cleaning composition of the present invention and the cleaning method using the same can remove metal oxides with higher cleaning power without damaging the base material of the fine metal mask processed by a laser.

Additionally, the examples can provide a cleaning composition and cleaning method that do not contain environmentally regulated substances.

Figure 1 is a photograph of an ultrasonic bath to check corrosiveness after cleaning using a conventional cleaning composition.

Figures 2a to 2e are photographs taken to confirm the apparent cleanability of a metal mask after cleaning using a cleaning composition according to an experimental example.

Figures 3a and 3b are SEM images before and after cleaning the metal mask using the composition of Comparative Example 1, respectively (before cleaning: Figure 3a, after cleaning: Figure 3b).

Figure 4a is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 1. Figure 4b is an SEM photograph after cleaning the metal mask using the composition of Example 2.

Figures 5a and 5b are SEM images before and after cleaning the metal mask using the composition according to Example 5, respectively.

Additionally, Figures 5c and 5d are SEM images before and after cleaning the metal mask using the composition according to Example 5, respectively.

Figure 6a is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 4. Figure 6b is an SEM photograph after cleaning the metal mask using the composition of Comparative Example 5.

Hereinafter, with reference to the drawings, the present embodiments will be described in detail so that those skilled in the art can easily perform them. In describing the embodiments, if it is determined that a detailed description of a related known configuration or function may obscure the gist of the embodiments, the detailed description will be omitted.

In addition, in the present application, terms such as "comprise" or "have" are intended to designate the presence of features, numbers, steps, operations, components, parts, or combinations thereof described in the specification, but are not intended to indicate the presence of one or more other It should be understood that this does not exclude in advance the presence or addition of features, numbers, steps, operations, components, parts, or combinations thereof. In this application, singular expressions may include plural expressions, unless the context clearly dictates otherwise.

Hereinafter, a composition for cleaning a metal mask according to embodiments and a cleaning method using the same will be described in detail.

The metal mask cleaning composition according to one embodiment includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and the remaining amount of water.

The phosphonic acid metal chelating agent can exhibit improved metal mask cleaning ability by being included in a relatively high content, that is, 70 to 90% by weight based on the total weight of the cleaning composition. Strong acids such as sulfuric acid, phosphoric acid, and hydrochloric acid included _in conventional cleaning compositions are problematic because they generate harmful substances such as _SO Although it is a problem because it has a negative effect on corrosion, the metal mask cleaning composition of the example can exhibit excellent cleaning ability without damaging the base material of the metal mask, and is not an environmentally regulated substance. Additionally, the cleaning composition of the example has the advantage of being non-corrosive to stainless steel (SUS)-based ultrasonic bath materials.

In particular, the metal mask cleaning composition of the example contains a phosphonic acid metal chelating agent and can exhibit very effective cleaning power while exhibiting strong acidity of pH 1.0 or less. In particular, it has high cleaning power without damaging the metal mask of the Invar base material. represents.

The phosphonic acid metal chelating agent according to one embodiment includes Diethylenetriamine penta(methylene phosphonic acid) (DTPMPA), Aminotri(methylene phosphonic acid) (ATMP), 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP), and HMDTMPA ( It is characterized in that it contains one or more selected from the group consisting of Hexamethylenediamine tetra(methylene phosphonic acid)), PBTCA (2-phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)) .

As described above, a phosphonic acid metal chelating agent contained in an amount of 70% to 90% by weight based on the total weight of the composition; and a remaining amount of water; in the metal mask cleaning composition according to one embodiment including a remaining amount of water, the remaining amount of water refers to the remaining weight% excluding the metal chelating agent when the cleaning composition is 100% by weight.

The metal mask cleaning composition according to one embodiment may additionally include 0.001 to 1% by weight of a corrosion inhibitor based on the total weight of the composition, and more preferably 0.01 to 0.1% by weight based on the total weight of the composition. can do.

That is, a phosphonic acid metal chelating agent contained in an amount of 70% to 90% by weight based on the total weight of the composition; 0.001 to 1% by weight of corrosion inhibitor; and a remaining amount of water. More preferably, the phosphonic acid metal chelating agent is included in an amount of 70% to 90% by weight based on the total weight of the composition; 0.01 to 0.1% by weight of corrosion inhibitor; and a remaining amount of water.

The remaining amount of water refers to the remaining weight% excluding the content of the phosphonic acid metal chelating agent and corrosion inhibitor, based on 100% by weight of the cleaning composition.

The composition for cleaning a metal mask according to one embodiment has the advantage of showing little corrosiveness to the base material of the metal mask as it contains a corrosion inhibitor in the above content range.

The corrosion inhibitor is characterized in that it includes at least one of an azole-based corrosion inhibitor and an ethanolamine-based corrosion inhibitor, but is not limited thereto.

The azole-based corrosion inhibitor may include at least one selected from the group consisting of triazole compounds, benzotriazole compounds, imidazole compounds, tetrazole compounds, thiazole compounds, oxazole compounds, and pyrazole compounds.

The ethanolamine-based corrosion inhibitor may include at least one selected from the group consisting of monoethanolamine, diethanolamine, and triethanolamine.

It is more preferable that the corrosion inhibitor includes a benzotriazole compound. Specifically, benzotriazole, 1-Amino-benzotriazole, 1-Hydroxy-benzotriazole, 5-methyl-1H-benzotriazole It is characterized in that it contains at least one selected from the group consisting of (5-Methyl-1H-benzotriazole) and benzotriazole-5-carboxylic acid.

In particular, the metal mask cleaning composition of the example preferably contains 0.01 to 0.1% by weight of the benzotriazole compound based on the total weight of the composition, and the metal mask cleaning composition of this composition is particularly suitable for use on metals made of Invar. It does not cause etching or pit corrosion to the mask itself and does not show corrosion to cleaning equipment.

As an example, the cleaning equipment may be SUS 304 or SUS 316, which are commonly used as materials for ultrasonic baths, but is not limited thereto.

The purpose of a composition for cleaning a metal mask according to an embodiment of the present invention is to remove oxide formed when a laser is irradiated to a metal mask during metal mask processing. That is, when a laser is irradiated to a metal mask, the base material of the metal mask is oxidized due to a high-temperature reaction of the laser to generate metal oxide, and the cleaning composition of the example removes such oxide. Accordingly, the oxides include iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), SUS (Steel Use Stainless) alloy, Inconel ( It may be an oxide of at least one metal selected from Inconel alloy, Kovar alloy, and Invar alloy.

In addition, the base material of the metal mask is iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and SUS (Steel). It may contain at least one metal selected from Use Stainless alloy, Inconel alloy, Kovar alloy, and Invar alloy.

For example, the base material of the metal mask may be Invar alloy. Invar alloy's main ingredients are iron (Fe) and nickel (Ni), and it has the advantage of having less thermal expansion than SUS alloy and not significantly reducing tension even at high temperatures, making it more desirable for use as a base material for metal masks. In addition, when the cleaning composition of the example is used on a metal mask whose base material is an Invar alloy, it is more preferable because it is less corrosive and has higher cleaning properties.

Meanwhile, a method for cleaning a metal mask according to an embodiment can be provided. As an example, the cleaning method of the present invention includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; and the step of contacting the metal mask with a cleaning composition containing a residual amount of water.

A metal mask cleaning method according to one embodiment may be performed by bringing the cleaning composition into contact with the metal mask using at least one of a spray method, a dipping method, and an ultrasonic method, but is limited to the above-described method. It doesn't work. The spray method is a method of spraying the cleaning composition on a metal mask base material, the dipping method is a method of filling a cleaning tank with the cleaning composition and immersing the metal mask base material, and the ultrasonic method is a method of spraying the cleaning composition onto the metal mask base material. This can be performed by immersing the metal mask base material and applying ultrasonic waves.

In a metal mask cleaning method according to one embodiment, the step of contacting the cleaning composition with a metal mask may be performed at a temperature of 10 to 50 ° C. for 5 to 30 minutes using a dipping method. It is not limited to this.

In addition, after performing the first step using the dipping method, the second step is additionally performed using distilled water and applying ultrasonic waves at a temperature of 10 to 50 ° C for 5 to 30 minutes to create a metal mask. can be cleaned.

A method of cleaning a metal mask according to one embodiment includes 70% to 90% by weight of a phosphonic acid metal chelating agent based on the total weight of the composition; 0.01 to 0.1% by weight of corrosion inhibitor; and the step of contacting the metal mask with a cleaning composition containing a residual amount of water. Of course, all of the above-described cleaning methods can be used.

Hereinafter, it will be described in more detail through examples. However, the following examples are only intended to specifically illustrate the present invention and do not limit the scope of the rights. That is, simple modifications or changes to the embodiments can be easily implemented by a person skilled in the art to which the present embodiments belong, and all such modifications or changes can be considered to be included in the scope of the embodiments.

<Example>

As will be described later, a composition for cleaning a metal mask is prepared according to the composition in the table, and then the metal mask is cleaned. i) the corrosion of the ultrasonic bath (material SUS 304, 316) cleaning equipment, ii) the corrosion (etching) of the metal mask, iii) metal mask corrosion (pit corrosion), and iv) apparent cleanability were evaluated.

1. Evaluation method

i) Evaluation of the corrosion of ultrasonic bath (material SUS 304, 316) cleaning equipment is to test whether corrosion occurs in the ultrasonic cleaning equipment due to the cleaning composition. After fixing each cleaning composition at 50°C, scrap SUS 304 and 316 were dipped, and after 1 hour, corrosiveness was observed and evaluated as follows.

◎ No corrosion ○ No change in appearance of scrap, hydrogen gas occurs after 30 minutes △ Change in appearance of scrap occurs after 10 minutes of some oil and hydrogen gases × Change in appearance of scrap Oil and hydrogen gases are generated immediately

ii) Metal mask corrosion (etchability) evaluation is to evaluate whether the metal mask base material itself is etched. A fine metal mask (FMM) made of laser-processed Invar was dipped into each cleaning composition, heated to 50° C. with an ultrasonic device, and cleaned for 10 minutes. The etching rate was observed using SEM (cross-section) and evaluated as follows.

◎ No etching material ○ Material etch (<0.3μm) △ Material etch (<1.0μm) × Material etch (>1.0μm)

iii) Metal mask pit corrosion evaluation is to evaluate whether pits, that is, small holes, are formed in the metal mask base material. A fine metal mask (FMM) made of laser-processed Invar was dipped into each cleaning composition, heated to 50° C. with an ultrasonic device, and cleaned for 10 minutes. The etching rate was observed using SEM (cross-section) and evaluated as follows.

◎ No corrosion ○ Pit corrosion (<3μm) △ Pit corrosion (<5μm) × Pit corrosion (>5μm)

iv) The apparent cleanability was evaluated as follows by putting each cleaning composition and metal mask into an ultrasonic device, cleaning at 50°C for 10 minutes, and observing the apparent cleanability.

LV1 Good exterior gloss and cleaning power LV2 Appearance slightly dark, some debris present LV3 Appearance is dark, lots of debris present LV4 No change in appearance, no cleaning effect

2. Cleaning test with and without phosphoric acid-based metal chelating agent

A cleaning composition was prepared according to the composition in Table 5 below, and then a cleaning test was performed. #1-1 to #1-8 are phosphoric acid-based metal chelating agents such as DTPMPA (Diethylenetriamine penta(methylene phosphonic acid)), ATMP (Aminotri(methylene phosphonic acid)), and HEDP (1-hydroxyethylidene-1,1-diphosphonic acid). , HMDTMPA (Hexamethylenediamine tetra(methylene phosphonic acid)), PBTCA (2-phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)) are included in that order, #2- #1 to #2-6 are cases where strong acids (phosphoric acid, hydrochloric acid) commonly used in the cleaning composition are included, and #2-7 are cases where EDTA (Ethylenediaminetetraacetic acid), a different type of chelating agent, is used. Additionally, BTA (Benzotriazole) or TEA (Triethanolamine) was used as a corrosion inhibitor.

_{No. active ingredient water Corrosion inhibitor Total(weight%) Corrosive to cleaning equipment Metal mask corrosive (etching) Metal mask corrosiveness (pit corrosiveness) Cleanability
(Exterior) type Content (% by weight) Content (% by weight) Content (% by weight) #1-1 DTPMPA 50 50 - 100 ◎ Δ Δ LV1 #1-2 ATMP 50 50 - 100 ◎ Δ Δ LV1 #1-3 HEDP 50 50 - 100 ◎ Δ Δ LV1 #1-4 HMDTMPA 50 50 - 100 ◎ Δ Δ LV1 #1-5 PBTCA 50 50 - 100 ◎ Δ Δ LV1 #1-6 EDTMP 50 50 - 100 ◎ Δ Δ LV1 #1-7 ATMP 50 49 BTA, 1 100 ◎ ◎ ◎ LV2 #1-8 ATMP 50 49 TEAs, 1 100 ◎ ○ ◎ LV3 #2-1 phosphoric acid 10 90 - 100 ○ X ○ LV1 #2-2 phosphoric acid 10 89 BTA, 1 100 ○ X ○ LV2 #2-3 phosphoric acid 10 89 TEAs, 1 100 ○ X ○ LV2 #2-4 Hydrochloric acid 10 90 - 100 X X X LV1 #2-5 Hydrochloric acid 10 89 BTA, 1 100 X X X LV1 #2-6 Hydrochloric acid 10 89 TEAs, 1 100 X X X LV1 #2-7 EDTA 50 50 - 100 ◎ ◎ ◎ LV4}

Through the above results, it was confirmed that compositions #1-1 to #1-8 containing a phosphoric acid-based metal chelating agent showed better effects in terms of cleaning and corrosiveness. In particular, when strong acids such as phosphoric acid or hydrochloric acid were used, severe corrosion occurred in metal masks and cleaning equipment even if a relatively small amount (10% by weight) was included. Figure 1 is a photograph of ultrasonic cleaning equipment after cleaning according to #2-4 above. Through Figure 1, it can be confirmed that corrosion of the ultrasonic bath occurred after cleaning.

Figures 2a to 2e are photographs of a metal mask before and after cleaning to confirm its apparent cleanability.

Figure 2a is a photo of a metal mask after laser processing and before cleaning. Figure 2b shows the apparent cleanability of LV1 (good external gloss and good cleaning power) according to Example 5, which will be described later, and Figure 2c corresponds to #1-7 of Table 5, and shows LV2 (slightly dark appearance, some This indicates the apparent cleanability of the level of debris present. Figure 2d corresponds to #1-8 of Table 5, LV3 (dark appearance, presence of many debris), Figure 2e corresponds to #2-7 of Table 5, LV4 (no change in appearance, no cleaning effect) It indicates the degree.

2A to 2E, it can be seen that the cleaning composition containing a phosphonic acid-based metal chelating agent apparently exhibits better cleaning properties.

According to the above results, cleaning compositions with various compositions including ATMP were prepared and tested.

3. Experimental Example 1: Cleaning test according to the content of phosphoric acid metal chelate

According to the composition in Table 6 below, a cleaning composition was prepared by adjusting the content of phosphoric acid metal chelate, and then a cleaning test was performed.

_{No. active ingredient water Corrosion inhibitor Total
(weight%) Corrosive to cleaning equipment metal mask corrosive
(etchability) metal mask corrosive
(Pit corrosiveness) Cleanability
(Exterior) type content
(weight%) content
(weight%) Content (% by weight) Comparative Example 1 ATMP 30 70 - 100 ◎ X Δ LV1 Comparative Example 2 ATMP 50 50 - 100 ◎ Δ Δ LV1 Example 1 ATMP 70 30 - 100 ◎ ○ ○ LV1 Example 2 ATMP 80 20 - 100 ◎ ○ ◎ LV1 Example 3 ATMP 90 10 - 100 ◎ ○ ◎ LV1}

In Examples 1 to 3 containing 70% by weight or more of a phosphonic acid metal chelating agent, the corrosion, meta mask corrosion (etching), and meta mask corrosion (pit corrosion) of ultrasonic bath cleaning equipment compared to Comparative Examples 1 and 2 It was confirmed that it showed excellent effects in terms of both appearance and cleanability.

Figure 3 is an SEM photograph before and after cleaning the metal mask using the composition according to Comparative Example 1. Figure 3a is a photograph of a metal mask before cleaning after laser processing. Figure 3b is a photograph of a metal mask cleaned using the composition according to Example 1.

Figure 4 is an SEM photograph after cleaning the metal mask using the composition according to Comparative Example 1 and Example 2. Figure 4a is a photograph of a metal mask cleaned using the composition according to Comparative Example 1, and Figure 4b is a photograph of a metal mask cleaned using the composition according to Example 2. Looking at Figure 4a, it can be seen that pit corrosion appears when cleaning is performed using the composition according to Comparative Example 1.

4. Experimental Example 2: Cleaning test according to the content of phosphoric acid-based metal chelate

According to the composition in Table 7 below, a cleaning composition was prepared by including 0.01% by weight of BTA, a corrosion inhibitor, and adjusting the content of phosphoric acid metal chelate, and then a cleaning test was performed.

_{No. active ingredient water Corrosion inhibitor Total
(weight%) Corrosive to cleaning equipment metal mask corrosive
(etchability) metal mask corrosive
(Pit corrosiveness) Cleanability
(Exterior) type content
(weight%) content
(weight%) Content (% by weight) Comparative Example 3 ATMP 60 39.99 BTA, 0.01 100 ◎ ◎ ◎ LV2 Example 4 ATMP 70 29.99 BTA, 0.01 100 ◎ ◎ ◎ LV1~LV2 Example 5 ATMP 80 19.99 BTA, 0.01 100 ◎ ◎ ◎ LV1 Comparative Example 4 ATMP 95 4.99 BTA, 0.01 100 ◎ ◎ ◎ LV2 Comparative Example 5 ATMP 99.99 0 BTA, 0.01 100 ◎ ◎ ◎ LV2~LV3}

As in Experimental Example 1, it was confirmed that the apparent cleanability of Comparative Example 3 containing less than 70% by weight of the phosphonic acid metal chelating agent was poor, and Comparative Example 4 containing more than 90% by weight of the phosphonic acid metal chelating agent. And in the case of Comparative Example 5, it was confirmed that the apparent cleanability was not good.

Figure 5 is an SEM photograph before and after cleaning the metal mask using the composition according to Example 5. Figure 5a is a photograph of a metal mask before cleaning after laser processing, and Figure 5b is a photograph of a metal mask cleaned using the composition according to Example 5. Additionally, Figure 5C is a photograph of a metal mask before cleaning after laser processing, and Figure 5D is a photograph of a metal mask cleaned using the composition according to Example 5. Compared to Figure 3, the observed values confirm that the degree of corrosion of the metal mask itself is more severe.

Figure 6 is an SEM photograph taken after cleaning using the cleaning compositions of Comparative Examples 4 and 5. Figure 6a is a picture taken of Comparative Example 4, and Figure 6b is a picture taken of Comparative Example 5 after cleaning. Through Figure 6, it can be seen that when more than 90% by weight of ATMP is included in the cleaning composition, there is a cleaning defect in the fine area. This means that as the viscosity increases, there is a limit to penetrating the fine area, and the cleaning power actually decreases. It is judged.

5. Experimental Example 3: Cleaning test according to the content of corrosion inhibitor

According to the composition in Table 8 below, a cleaning composition was prepared by generally containing 80% by weight of phosphoric acid metal chelate and adjusting the content of BTA, a corrosion inhibitor, and then a cleaning test was performed.

_{No. active ingredient water Corrosion inhibitor Total
(weight%) Corrosive to cleaning equipment metal mask corrosive
(etchability) metal mask corrosive
(Pit corrosiveness) Cleanability
(Exterior) type content
(weight%) content
(weight%) Content (% by weight) Example 2 ATMP 80 20 - 100 ◎ ○ ◎ LV1 Example 5 ATMP 80 19.99 BTA, 0.01 100 ◎ ◎ ◎ LV1 Example 6 ATMP 80 19.95 BTA, 0.05 100 ◎ ◎ ◎ LV1 Example 7 ATMP 80 19.9 BTA, 0.1 100 ◎ ◎ ◎ LV1 Example 8 ATMP 80 19.8 BTA, 0.2 100 ◎ ◎ ◎ LV2 Example 9 ATMP 80 19.5 BTA, 0.5 100 ◎ ◎ ◎ LV2}

Through this, it was confirmed that the inclusion of a corrosion inhibitor is more desirable in terms of corrosion, but if the content is too high, the apparent cleanability is poor.

The above description is merely an illustrative explanation of the technical idea of the present invention, and various modifications and variations will be possible to those skilled in the art without departing from the essential characteristics of the present invention. Accordingly, the embodiments described in the present invention are for illustrating the technical idea of the present invention, and the technical idea of the present invention is not limited by these examples. The scope of protection of the present invention should be interpreted in accordance with the claims below, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of rights of the present invention.

Claims (12)

Based on the total weight of the composition, 70 to 90% by weight of a phosphonic acid metal chelating agent; and A composition for cleaning a metal mask comprising a residual amount of water. According to paragraph 1, The composition is a metal mask cleaning composition that additionally includes 0.001 to 1% by weight of a corrosion inhibitor based on the total weight of the composition. According to paragraph 1, The composition is a metal mask cleaning composition that additionally includes 0.01 to 0.1% by weight of a corrosion inhibitor based on the total weight of the composition. According to paragraph 1, The phosphonic acid metal chelating agent is DTPMPA (Diethylenetriamine penta(methylene phosphonic acid)), ATMP (Aminotri(methylene phosphonic acid)), HEDP (1-hydroxyethylidene-1,1-diphosphonic acid), HMDTMPA (Hexamethylenediamine tetra(methylene phosphonic acid) )), PBTCA (2-phosphonobutane-1,2,4-tricarboxylic acid), and EDTMP (Ethylenediamine tetra(methylene phosphonic acid)). A composition for cleaning a metal mask containing at least one selected from the group consisting of. According to paragraph 2, The corrosion inhibitors include benzotriazole, 1-Amino-benzotriazole, 1-Hydroxy-benzotriazole, and 5-methyl-1H-benzotriazole. A composition for cleaning a metal mask, comprising at least one selected from the group consisting of sol (5-Methyl-1H-benzotriazole) and benzotriazole-5-carboxylic acid. According to paragraph 1, A composition for cleaning a metal mask, wherein the cleaning removes oxide formed upon laser irradiation on the metal mask. According to clause 6, The oxides include iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), SUS (Steel Use Stainless) alloy, and Inconel. A composition for cleaning a metal mask, which is an oxide of at least one metal selected from the group consisting of alloy, Kovar alloy, and Invar alloy. According to paragraph 1, The base material of the metal mask is iron (Fe), cobalt (Co), chromium (Cr), manganese (Mn), nickel (Ni), titanium (Ti), molybdenum (Mo), and SUS (Steel Use Stainless Steel). ) A composition for cleaning a metal mask, comprising at least one metal selected from an alloy, Inconel alloy, Kovar alloy, and Invar alloy. Based on the total weight of the composition, 70% by weight to 90% by weight of a phosphonic acid metal chelating agent; A method of cleaning a metal mask, comprising contacting the metal mask with a cleaning composition containing a residual amount of water. According to clause 9, A cleaning method wherein the composition additionally includes 0.01 to 0.1% by weight of a corrosion inhibitor based on the total weight of the composition. According to clause 9, The cleaning method is performed by bringing the cleaning composition into contact with the metal mask using at least one of a spray method, a dipping method, and an ultrasonic method. According to clause 11, The cleaning method includes a first step performed for 5 to 30 minutes at a temperature of 10 to 50 ° C. using the dipping method.

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