TWI867509B - 金屬掩膜清洗用組合物以及使用其的清洗方法 - Google Patents
金屬掩膜清洗用組合物以及使用其的清洗方法 Download PDFInfo
- Publication number
- TWI867509B TWI867509B TW112115614A TW112115614A TWI867509B TW I867509 B TWI867509 B TW I867509B TW 112115614 A TW112115614 A TW 112115614A TW 112115614 A TW112115614 A TW 112115614A TW I867509 B TWI867509 B TW I867509B
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning
- metal mask
- composition
- metal
- cleaning composition
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D11/00—Special methods for preparing compositions containing mixtures of detergents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/36—Organic compounds containing phosphorus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H10P95/00—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20220052144 | 2022-04-27 | ||
| KR10-2022-0052144 | 2022-04-27 | ||
| KR1020220069543A KR102719037B1 (ko) | 2022-04-27 | 2022-06-08 | 메탈 마스크 세정용 조성물 및 이를 이용한 세정 방법 |
| KR10-2022-0069543 | 2022-06-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202342713A TW202342713A (zh) | 2023-11-01 |
| TWI867509B true TWI867509B (zh) | 2024-12-21 |
Family
ID=88519096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112115614A TWI867509B (zh) | 2022-04-27 | 2023-04-26 | 金屬掩膜清洗用組合物以及使用其的清洗方法 |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TWI867509B (fr) |
| WO (1) | WO2023211110A1 (fr) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114341328A (zh) * | 2019-08-23 | 2022-04-12 | 富士胶片株式会社 | 清洗剂组合物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030007969A (ko) * | 2000-06-16 | 2003-01-23 | 카오카부시키가이샤 | 세정제 조성물 |
| JP4628209B2 (ja) * | 2004-11-18 | 2011-02-09 | 花王株式会社 | 剥離剤組成物 |
| JP2010535422A (ja) * | 2007-08-02 | 2010-11-18 | アドバンスド テクノロジー マテリアルズ,インコーポレイテッド | マイクロ電子デバイスから残渣を除去するための非フッ化物含有組成物 |
| KR20120029526A (ko) * | 2010-09-17 | 2012-03-27 | 동우 화인켐 주식회사 | 평판표시장치 제조용 금속 세정 조성물 |
| KR102536249B1 (ko) * | 2016-07-15 | 2023-05-25 | 삼성디스플레이 주식회사 | 산화물 제거용 세정 조성물 및 이를 이용한 세정 방법 |
-
2023
- 2023-04-25 WO PCT/KR2023/005599 patent/WO2023211110A1/fr not_active Ceased
- 2023-04-26 TW TW112115614A patent/TWI867509B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114341328A (zh) * | 2019-08-23 | 2022-04-12 | 富士胶片株式会社 | 清洗剂组合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202342713A (zh) | 2023-11-01 |
| WO2023211110A1 (fr) | 2023-11-02 |
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