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WO2021065600A1 - Procédé d'alimentation en milieu caloporteur d'un dispositif d'utilisation de milieu caloporteur, et équipement d'utilisation de milieu caloporteur - Google Patents

Procédé d'alimentation en milieu caloporteur d'un dispositif d'utilisation de milieu caloporteur, et équipement d'utilisation de milieu caloporteur Download PDF

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Publication number
WO2021065600A1
WO2021065600A1 PCT/JP2020/035731 JP2020035731W WO2021065600A1 WO 2021065600 A1 WO2021065600 A1 WO 2021065600A1 JP 2020035731 W JP2020035731 W JP 2020035731W WO 2021065600 A1 WO2021065600 A1 WO 2021065600A1
Authority
WO
WIPO (PCT)
Prior art keywords
refrigerant
heat medium
circulation system
distribution section
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2020/035731
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English (en)
Japanese (ja)
Inventor
石井　究
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tsukishima Kikai Co Ltd
Original Assignee
Tsukishima Kikai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsukishima Kikai Co Ltd filed Critical Tsukishima Kikai Co Ltd
Priority to KR1020227003873A priority Critical patent/KR20220068981A/ko
Publication of WO2021065600A1 publication Critical patent/WO2021065600A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D9/00—Crystallisation
    • B01D9/02—Crystallisation from solutions
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B1/00—Compression machines, plants or systems with non-reversible cycle

Definitions

  • the present invention relates to a heat medium supply method to a heat medium utilization device and a heat medium utilization facility.
  • a refrigerant is also supplied to the jacket or element of the crystallizer, and the internal liquid is passed through the cooling surface.
  • the crystal is precipitated by cooling.
  • the liquid refrigerant is supplied from the refrigerant hold tank 4 to the jacket 2 and the element 3 of the crystallization apparatus 1 through the supply path 6 by the refrigerant supply pump 5.
  • the returned refrigerant is returned to the refrigerant hold tank 4 through the return path 7, then supplied to the refrigerator 9 by the refrigerator supply pump 8, cooled by the refrigerator 9, and returned to the refrigerant hold tank 4 through the return path 9A. ..
  • the refrigerant supply sources such as the refrigerator 9 and the refrigerant hold tank 4 are crystallized. It is difficult to install it in the vicinity of the device 1 from the viewpoint of equipment layout in the factory, and since the flow velocity to the cooling surface must be high in order to suppress scaling, a large capacity refrigerant is supplied. It is necessary to make the refrigerant circulation line large in diameter and lay it over a long distance (for example, 50 to 100 m).
  • a main object of the present invention is to provide a heat medium supply method and a heat medium utilization facility for a heat medium utilization device capable of suppressing equipment cost and operation cost.
  • the present invention relates to a method of circulating a heat medium between a heat medium distribution unit and a heat medium supply means in a heat medium utilization device, and is locally located in the vicinity of the distribution unit.
  • the first circulatory system is formed, the second circulatory system of the heat medium that flows out from the heat medium supply means and then returns is formed, and the first circulatory system and the second circulatory system are connected to form the first circulatory system. This is an attempt to reduce the load on each of the circulatory system and the second circulatory system.
  • the first aspect of the present invention is a method of circulating a heat medium between a heat medium distribution unit and a heat medium supply means in a heat medium utilization device.
  • the heat medium constitutes a first circulatory system that flows into the distribution section and flows out of the distribution section.
  • a second circulation system is configured in which the heat medium from the heat medium supply means is supplied to the inlet side of the distribution section in the first circulation system and returned to the heat medium supply means from the exit side of the distribution section.
  • This is a method of supplying a heat medium to a device using a heat medium.
  • a second aspect of the present invention is equipment in which a heat medium circulates between a heat medium distribution unit and a heat medium supply means in a heat medium utilization device.
  • a first circulatory system in which the heat medium flows into the distribution section and flows out of the distribution section.
  • the heat medium from the heat medium supply means is supplied to the inlet side of the distribution section in the first circulation system and returned to the heat medium supply means from the exit side of the distribution section.
  • It is a heat medium utilization equipment characterized by having.
  • the heat medium utilization device and the heat medium of the present invention have the meaning of including both the heating medium and the refrigerant (cooling medium).
  • the equipment to be used is not limited as long as it uses a heat medium, and in the sense that it includes various chemical equipment including, for example, a reaction device, a crystallization device, an evaporation device, a drying device, and a heat device. is there. Further, the equipment to be used is not limited to a single equipment, and includes a mode in which the heat is used by a plurality of equipments.
  • the refrigerant is supplied from the refrigerant hold tank 14 to the jacket 2 and the element 3 of the indirect cooling type crystallization device 1 through the supply path 16 by the refrigerant supply pump 15.
  • the refrigerant to be returned is returned to the refrigerant hold tank 14 through the return path 17, and then supplied to the refrigerator 19 by the refrigerator supply pump 18, and the one cooled by the refrigerator 19 is returned to the refrigerant hold tank 14 through the return path 19A.
  • the refrigerant is circulated to the crystallization apparatus 1 provided with the distribution unit.
  • at least the refrigerant is supplied to the cooling jacket 2, and the element 3 may not be installed and may not be supplied to the element 3.
  • a circulation pump 21 is provided for circulating the refrigerant.
  • the refrigerant flows from the circulation pump 21 into the cooling jacket 2 and the element 3 as a flow unit via the outward path 22, flows out from the cooling jacket 2 and the element 3, and returns to the circulation pump 21 via the return path 23.
  • Circulation system 20 is configured.
  • a refrigerant supply means including a refrigerant hold tank 14 and a refrigerator 19 is provided, and liquid refrigerant is supplied from the refrigerant hold tank 14 to the first circulation system 20 through the supply path 16 by the refrigerant supply pump 15.
  • a second circulatory system 30 is configured in which the surplus of the first circulatory system 20 is returned to the refrigerant hold tank 14 through the return passage 17.
  • a vertical vent 24 for siphon break is provided in the first circulatory system 20 as necessary, and is pulled out from the upper part to the second circulatory system 30 by overflow. According to this form, it is possible to stably extract the surplus without an incidental control mechanism.
  • the refrigerant supplied to the distribution section It is necessary to remove the heat of cooling and crystallization by the refrigerant supplied to the distribution section, which can be achieved by circulating the refrigerant in the first circulation system 20 according to the above aspect. Then, it is sufficient to supply the refrigerant from the second circulatory system 30 mainly only for the temperature fluctuation. Since the components of the first circulation system 20 are mainly the circulation pump 21 and the circulation pipeline, the first circulation system 20 can be configured in the immediate vicinity surrounding the crystallization apparatus 1.
  • the length of the first circulatory system 20 excluding the height of the distribution section is, for example, about 10 to 20 m, which is sufficient with respect to the length of the conventional example of 50 to 100 m.
  • the circulation flow velocity in the first circulation system 20 may be maintained at the required speed, and the liquid refrigerant may be discharged from the second circulation system 30 in a small flow rate so as to compensate mainly for the temperature fluctuation.
  • the path of the second circulatory system 30 may be small in diameter because it may be supplied by.
  • the circulation equipment for example, a pump having a large capacity and a high lift
  • the refrigerator-related equipment, and the like can be miniaturized, and the equipment cost can be reduced.
  • energy loss is reduced and operating costs are also reduced.
  • the required flow velocity is secured by the first circulatory system, and the second circulatory system mainly needs to compensate only for the temperature fluctuation in the first circulatory system. Good operation is possible with the circulation amount in the circulatory system being 1/5 to 1/20 of the circulation amount in the first circulation system.
  • a constant amount of the refrigerant may be supplied to the distribution section at a predetermined valve opening degree, or the supply amount may be controlled by controlling the flow rate or the like.
  • a method is adopted in which the supply amount of the refrigerant is controlled by the temperature of the refrigerant locally circulating in the first circulation system 20 with respect to the jacket 2 or the element 3 of the crystallizer.
  • a temperature detector 25 shown in the form of an indicator controller
  • the temperature by the temperature detector 25 is provided.
  • the flow rate adjusting valve (not shown) provided in the first circulation system 20, or more preferably, the inlet side of the circulation pump 21, and the supply amount of the refrigerant in the second circulation system 30.
  • the temperature is controlled by the flow rate adjusting valve 31 to be adjusted.
  • the flow rate is adjusted in the first circulation system 20, or the supply is supplied from the second circulation system 30 to the first circulation system 20. Since the temperature can be compensated by adjusting the flow rate of the liquid refrigerant, highly accurate temperature control is possible.
  • the refrigerant supply point from the second circulation system 30 to the first circulation system 20 may be supplied to either the suction side or the discharge side of the circulation pump 21, but the mixing with the circulating refrigerant and the supply pressure may be applied. Considering this, the suction side is preferable. On the suction side, mixing can be performed well in the circulation pump 21.
  • a fixed amount may be extracted at a predetermined valve opening degree, or the extraction amount may be controlled by flow rate control or the like. good.
  • Crystallized material may adhere to the cooling surface of the crystallization apparatus 1, reduce the heat transfer effect, and grow scaling.
  • the prior art Japanese Patent Laid-Open No. 2010-131522 discloses a form in which a heated medium is supplied to a jacket to melt the crystallized product. It should be noted that this prior art does not constitute the first circulatory system and the second circulatory system in the present invention.
  • melting can be achieved by the following forms. That is, for example, at a stage where crystallized crystals adhere to the inner surface of the crystallization device 1 and continuous operation becomes difficult, the heat exchanger 40 is installed in the first circulation system 20 as shown in FIG. Then, in the melting and cleaning work of the crystallization apparatus 1, the temperature can be raised for the melting and cleaning work by heating only the refrigerant inside the first circulation system 20. Further, it is also possible to use a part of the circulation line as a heating jacket pipe instead of or in combination with the heat exchanger 40. As the heat exchanger, an appropriate type such as a shell and tube, a plate, and a double tube can be used.
  • Whether or not the crystal needs to be melted is determined by, for example, the operating time of the crystallization apparatus 1, an image or moving image inside the crystallization apparatus 1, the temperature of the refrigerant discharged from the jacket 2 of the crystallization apparatus 1, or the like. be able to.
  • a refrigerant system constituting a circulation line is constructed between the refrigerant supply means and the crystallization device 1 as in the conventional example, heating is performed with respect to the hold amount of the entire refrigerant system. Since the operation needs to be performed, the melting (melting) operation takes time and requires a lot of energy for heating.
  • a refrigerant heating means for example, a heat exchanger 40
  • the refrigerant is heated by the heating means to heat the flow unit. In the form of melting the crystal through the medium, the melting (melting) operation does not require a long time, and a small amount of energy for heating is sufficient.
  • the refrigerant whose temperature is adjusted in the second circulation system 30 can be supplied to the first circulation system 20.
  • the refrigerant is cooled particularly in a system using a low temperature refrigerant. Since it is necessary to change the temperature of the entire refrigerant system including the refrigerator for cooling, there is a problem that the followability of the temperature control is deteriorated.
  • the temperature is adjusted by adjusting the flow rate in the first circulation system 20 or adjusting the flow rate of the liquid refrigerant supplied from the second circulation system 30 to the first circulation system 20. Since it can be compensated, highly accurate temperature control is possible, and the flow rate of the liquid refrigerant supplied mainly to the first circulation system 20 is adjusted without changing the temperature of the entire refrigerant system including the refrigerator, or the refrigerant. The temperature can be adjusted while suppressing the temperature change of the entire system.
  • a vertical vent 24 for siphon break is provided.
  • a large amount of refrigerant contained in the jacket 2 of the crystallization apparatus 1 returns to the refrigerator 19 side as it is on the return line, and no vent is used.
  • the control of the return amount in the conventional form is performed by controlling the rotation speed of the pump that supplies the refrigerant to the crystallization apparatus 1.
  • a large amount of refrigerant contained in the jacket 2 of the crystallization apparatus 1 returns to the refrigerator 19 side as it is on the return line.
  • the refrigerant circulation system according to the present invention since the amount of return from the first circulation system 20 to the refrigerator 19 side is small, a vent 24 is installed and the surplus in the first circulation system 20 is overflowed to the refrigerator.
  • the refrigerant hold tank 14 is provided.
  • a weir plate 14a is provided in the refrigerant hold tank 14.
  • the return amount of the refrigerant returned from the first circulation system 20 is sent to one side of the weir plate 14a, and the refrigerant cooled by the refrigerator 19 is sent to the other side of the weir plate 14a of the refrigerant hold tank 14 through the return path 19A. Returned.
  • it is desirable that the distribution of the supply to the refrigerant hold tank 14 is performed as follows.
  • the amount of supply from the refrigerator 19 side to the refrigerant hold tank 14 through the return path 19A is increased, the inside of the refrigerant hold tank 14 is partitioned by the weir plate 14a, and as shown in FIG. 2, from the other side of the weir plate 14a.
  • Overflow to the supply side to the refrigerator 19 by the refrigerator supply pump 18 that is, to one side of the weir plate 14a where the return portion of the refrigerant is returned from the first crystallization circulation system 20 through the return path 17). The form to make it is desirable.
  • the heat medium utilization device and the heat medium have the meaning of including both the heating medium and the refrigerant (cooling medium), and are not limited to the above-mentioned crystallization device and the refrigerant. ..

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Heat-Exchange Devices With Radiators And Conduit Assemblies (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Le problème décrit par la présente invention est de réduire au minimum les coûts d'équipement et les coûts de fonctionnement. La solution selon l'invention porte sur un procédé dans lequel un milieu caloporteur est amené à circuler entre des sections d'écoulement pour le milieu caloporteur et un moyen d'alimentation de milieu caloporteur dans un dispositif d'utilisation de milieu caloporteur 1, un premier système de circulation 20 est configuré de telle sorte que le milieu caloporteur s'écoule dans les sections d'écoulement 2, 3 et s'écoule hors des sections d'écoulement 2, 3, et un second système de circulation est configuré de telle sorte que le milieu caloporteur provenant du moyen d'alimentation en milieu caloporteur est fourni au côté d'entrée des sections d'écoulement 2, 3 dans le premier système de circulation 20 et renvoyés vers le moyen d'alimentation en milieu caloporteur depuis le côté de sortie des sections d'écoulement 2, 3.
PCT/JP2020/035731 2019-09-30 2020-09-23 Procédé d'alimentation en milieu caloporteur d'un dispositif d'utilisation de milieu caloporteur, et équipement d'utilisation de milieu caloporteur Ceased WO2021065600A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020227003873A KR20220068981A (ko) 2019-09-30 2020-09-23 열 매체 이용 기기에 대한 열 매체 공급 방법 및 열 매체 이용 설비

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-180908 2019-09-30
JP2019180908A JP6869306B2 (ja) 2019-09-30 2019-09-30 熱媒体利用機器への熱媒体供給方法及び熱媒体利用設備

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Publication Number Publication Date
WO2021065600A1 true WO2021065600A1 (fr) 2021-04-08

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PCT/JP2020/035731 Ceased WO2021065600A1 (fr) 2019-09-30 2020-09-23 Procédé d'alimentation en milieu caloporteur d'un dispositif d'utilisation de milieu caloporteur, et équipement d'utilisation de milieu caloporteur

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JP (1) JP6869306B2 (fr)
KR (1) KR20220068981A (fr)
WO (1) WO2021065600A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7438172B2 (ja) * 2021-09-13 2024-02-26 芝浦メカトロニクス株式会社 供給装置、供給システム

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10318647A (ja) * 1997-05-19 1998-12-04 Orion Mach Co Ltd 液体冷却装置
JPH1137623A (ja) * 1997-07-17 1999-02-12 Nippon Sanso Kk 冷媒冷却装置
JP2009072706A (ja) * 2007-09-21 2009-04-09 Taiyo Nippon Sanso Corp 熱媒加熱冷却装置及び熱媒温度制御方法
JP2009287822A (ja) * 2008-05-28 2009-12-10 Taiyo Nippon Sanso Corp 冷媒冷却装置
JP2010131522A (ja) * 2008-12-04 2010-06-17 Mitsubishi Rayon Co Ltd 晶析装置および晶析物除去方法
JP2011006354A (ja) * 2009-06-25 2011-01-13 Nippon Shokubai Co Ltd （メタ）アクリル酸の製造方法
JP2013113509A (ja) * 2011-11-29 2013-06-10 Taiyo Nippon Sanso Corp 熱媒冷却装置及び熱媒冷却装置の運転方法
JP2015087781A (ja) * 2013-10-28 2015-05-07 アズビル株式会社 制御方法および制御装置
JP2017020687A (ja) * 2015-07-09 2017-01-26 パナソニックＩｐマネジメント株式会社 冷凍サイクル装置
JP2017142026A (ja) * 2016-02-10 2017-08-17 野村マイクロ・サイエンス株式会社 加熱水の製造方法及び製造システム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10296075A (ja) * 1997-04-23 1998-11-10 Lion Corp バッチ式反応器の温度制御装置、制御方法及び制御プログラムを記録した記録媒体
JP4602140B2 (ja) * 2005-03-30 2010-12-22 日揮株式会社 温度制御装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10318647A (ja) * 1997-05-19 1998-12-04 Orion Mach Co Ltd 液体冷却装置
JPH1137623A (ja) * 1997-07-17 1999-02-12 Nippon Sanso Kk 冷媒冷却装置
JP2009072706A (ja) * 2007-09-21 2009-04-09 Taiyo Nippon Sanso Corp 熱媒加熱冷却装置及び熱媒温度制御方法
JP2009287822A (ja) * 2008-05-28 2009-12-10 Taiyo Nippon Sanso Corp 冷媒冷却装置
JP2010131522A (ja) * 2008-12-04 2010-06-17 Mitsubishi Rayon Co Ltd 晶析装置および晶析物除去方法
JP2011006354A (ja) * 2009-06-25 2011-01-13 Nippon Shokubai Co Ltd （メタ）アクリル酸の製造方法
JP2013113509A (ja) * 2011-11-29 2013-06-10 Taiyo Nippon Sanso Corp 熱媒冷却装置及び熱媒冷却装置の運転方法
JP2015087781A (ja) * 2013-10-28 2015-05-07 アズビル株式会社 制御方法および制御装置
JP2017020687A (ja) * 2015-07-09 2017-01-26 パナソニックＩｐマネジメント株式会社 冷凍サイクル装置
JP2017142026A (ja) * 2016-02-10 2017-08-17 野村マイクロ・サイエンス株式会社 加熱水の製造方法及び製造システム

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KR20220068981A (ko) 2022-05-26
JP2021053597A (ja) 2021-04-08
JP6869306B2 (ja) 2021-05-12

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