WO2020031871A1 - 旋削工具 - Google Patents
旋削工具 Download PDFInfo
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- WO2020031871A1 WO2020031871A1 PCT/JP2019/030411 JP2019030411W WO2020031871A1 WO 2020031871 A1 WO2020031871 A1 WO 2020031871A1 JP 2019030411 W JP2019030411 W JP 2019030411W WO 2020031871 A1 WO2020031871 A1 WO 2020031871A1
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- WIPO (PCT)
- Prior art keywords
- single crystal
- cutting edge
- crystal diamond
- turning
- turning tool
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/141—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness
- B23B27/145—Specially shaped plate-like cutting inserts, i.e. length greater or equal to width, width greater than or equal to thickness characterised by having a special shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/18—Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing
- B23B27/20—Cutting tools of which the bits or tips or cutting inserts are of special material with cutting bits or tips or cutting inserts rigidly mounted, e.g. by brazing with diamond bits or cutting inserts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/186—Epitaxial-layer growth characterised by the substrate being specially pre-treated by, e.g. chemical or physical means
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/04—Overall shape
- B23B2200/0447—Parallelogram
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/20—Top or side views of the cutting edge
- B23B2200/201—Details of the nose radius and immediately surrounding area
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2200/00—Details of cutting inserts
- B23B2200/24—Cross section of the cutting edge
- B23B2200/242—Cross section of the cutting edge bevelled or chamfered
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/31—Diamond
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
Definitions
- the present disclosure relates to a turning tool.
- This application claims priority based on Japanese Patent Application No. 2018-147806 filed on Aug. 6, 2018. The entire contents described in the Japanese patent application are incorporated herein by reference.
- a cutting tool using a single crystal diamond for at least a cutting edge (hereinafter also referred to as a “single crystal diamond cutting tool”) has been used for processing non-ferrous metals, mirror processing of plastics and the like, and precision processing.
- a single crystal diamond is used for the cutting edge of a cutting tool
- the properties of the cutting tool such as wear resistance and fracture resistance, are disclosed in, for example, International Publication WO 2014/003110 (Patent Document 1). It greatly differs depending on which crystal plane and crystal orientation of the single crystal diamond are used for the rake face and flank face of the cutting tool.
- a single crystal diamond cutting tool is manufactured after selecting a more appropriate crystal plane and crystal orientation of the single crystal diamond according to a user's request, use conditions, and the like.
- the single crystal diamond cutting tool disclosed in Patent Literature 1 is manufactured such that the rake face of the cutting edge is constituted by the (100) plane of single crystal diamond and the tip of the cutting edge is oriented in the ⁇ 100> direction.
- a turning tool is a turning tool used for turning, wherein the turning tool includes a holder portion and a cutting edge portion fixed to the holder portion, and the cutting edge portion is
- the cutting edge portion includes a rake face, a flank face, and a cutting edge arranged at an intersection where the rake face and the flank face intersect, and has a radius of curvature of 0.1. It has a nose R of 1 mm or more and 1.2 mm or less, and the nose R is such that the direction of intersection between the bisecting section of the apex angle and the rake face is ⁇ 10 degrees from the ⁇ 110> direction of the synthetic single crystal diamond. At least one of conditions within 10 ° and within ⁇ 10 ° from the ⁇ 100> direction is satisfied.
- FIG. 1 is a diagram illustrating a “nose R” and a cutting edge in a turning tool according to an embodiment of the present disclosure for explaining the terms “radius of curvature”, “vertex angle”, and “vertical bisector”. It is a top view explanatory view of a cutting edge part demonstrated by planarizing a blade part.
- FIG. 2 is an enlarged plan view showing the cutting edge portion and the holder portion in plan view in the turning tool according to the embodiment of the present disclosure.
- FIG. 3 is an enlarged perspective view showing an enlarged cutting edge portion of the turning tool according to the embodiment of the present disclosure.
- FIG. 4 is an explanatory diagram illustrating a use state of the turning tool according to an embodiment of the present disclosure.
- the single crystal diamond cutting tools described above are rarely used for machining automotive parts in the non-ferrous metal machining market. This is because, when processing under severe conditions such as high-speed cutting, high feed, and deep cutting, which are widely used in automobile parts, is performed using a single-crystal diamond cutting tool, the chip frequently occurs and wears easily. Therefore, it is required to provide a single crystal diamond cutting tool with excellent wear resistance so that machining under severe conditions becomes possible. Further, there is a strong demand for smooth finishing of the surface of processed products such as automobile parts.
- an object of the present disclosure is to provide a turning tool having wear resistance and capable of finishing a machined surface of a workpiece smoothly.
- a turning tool is a turning tool used for turning, wherein the turning tool includes a holder, and a cutting edge fixed to the holder.
- the blade portion is made of a synthetic single crystal diamond, and the cutting edge portion includes a rake face, a flank face, and a cutting edge arranged at an intersection where the rake face and the flank face intersect, and has a radius of curvature.
- a turning tool having such characteristics has abrasion resistance and can finish a machined surface of a workpiece smoothly.
- the direction of the intersection is preferably within ⁇ 5 ° from the ⁇ 110> direction of the synthetic single crystal diamond.
- the direction of the intersection is preferably within ⁇ 5 ° from the ⁇ 100> direction of the synthetic single crystal diamond.
- the synthetic single crystal diamond preferably contains 1 to 100 ppm of nitrogen atoms. As a result, the turning tool can have excellent fracture resistance.
- the apex angle is preferably 55 ° or more and 90 ° or less.
- the turning is performed under the condition that the clearance angle is 7 ° or more and 15 ° or less. As a result, the turning tool can finish the work surface of the work material more smoothly.
- the turning is performed under the condition that the feed f is not less than 0.01 mm / rev and less than 0.7 mm / rev. As a result, the turning tool can finish the work surface of the work material more smoothly.
- the synthetic single crystal diamond is preferably a CVD single crystal diamond.
- the turning tool has more sufficient wear resistance and can finish the machined surface of the workpiece smoothly.
- the notation in the form of “A to B” means the upper and lower limits of the range (that is, A or more and B or less), and no unit is described in A, and the unit is described only in B. In this case, the unit of A and the unit of B are the same.
- the atomic ratio when a compound or the like is represented by a chemical formula, when the atomic ratio is not particularly limited, it includes all conventionally known atomic ratios, and is not necessarily limited to only the stoichiometric range.
- “mechanical strength” refers to mechanical strength including various properties such as wear resistance, fracture resistance, and bending strength.
- the “nose R” refers to a portion of the cutting edge portion that comes into contact with the chips of the work material by directly participating in cutting. Specifically, it refers to the portion of the cutting edge portion 3 included in the virtual semicircle (solid line) shown in FIG.
- This imaginary semicircle has, as its radius, an intersection point o where a virtual line (dashed line) extending two opposing ridge lines forming an intersection where the rake face and the flank of the cutting edge portion 3 intersects, It has a predetermined distance d toward the ridge.
- ⁇ The“ radius of curvature ”of the nose R refers to the reciprocal of the“ curvature ”of the curved surface of the nose R.
- the curved surface of the nose R is given, for example, as an arc included in a dashed virtual circle shown in FIG.
- the radius r of the dashed imaginary circle is referred to as the “radius of curvature” of the nose R
- its reciprocal (1 / r) is referred to as “curvature” of the curved surface of the nose R.
- ⁇ The“ vertex angle ”of the nose R refers to the angle ⁇ formed by the two virtual lines (broken lines) described above in FIG.
- An imaginary cross section that bisects the angle “ ⁇ ” of the “vertex angle” is referred to as “a bisecting section” of the vertex angle of the nose R.
- the “relief angle” refers to an angle formed between the work material and the flank at the cutting edge portion.
- the "intersecting direction" between the bisected cross section of the apex angle of the nose R and the rake face is defined as the surface of the cutting edge 3 on the base metal side or the base metal when the rake face has a curved surface. Is simulated as a rake face, and means the direction of intersection of the simulated rake face with a bisecting section of the apex angle of the nose R.
- “synthetic single-crystal diamond” is different from natural diamond, and is a single-crystal diamond manufactured by a high-pressure high-pressure (HPHT) method and a chemical vapor synthesis (CVD).
- An artificially produced diamond such as a single crystal diamond produced by the Vapor Deposition method.
- the “CVD single crystal diamond” refers to a single crystal diamond produced by epitaxially growing a single crystal of diamond on a single crystal substrate of diamond using a CVD method.
- the ⁇ 110> direction of the CVD single crystal diamond means four equivalent crystal orientations including [01-1] of the CVD single crystal diamond, and specifically, the [01-1] direction of the CVD single crystal diamond.
- CVD single-crystal diamond means four equivalent crystal orientations including [010] of CVD single-crystal diamond, and specifically, [010] and [00 ⁇ ] of CVD single-crystal diamond. 1], [0-10] and [001].
- "-" when expressing the crystal orientation is originally expressed above the numeral and is read as "bar”. For example, [01-1] is read as "zero one-one bar”.
- the turning tool according to the present embodiment is a turning tool used for turning.
- the turning tool includes a holder and a cutting edge fixed to the holder.
- the cutting edge is made of synthetic single crystal diamond.
- the cutting edge portion includes a rake face, a flank face, and a cutting edge arranged at an intersection where the rake face and the flank face intersect, and a radius of curvature of 0.1 mm or more and 1.2 mm or less.
- Nose R The nose R is such that the direction of intersection between the bisected cross section of the apex angle and the rake face is within ⁇ 10 ° from the ⁇ 110> direction of the synthetic single crystal diamond and within ⁇ 10 ° from the ⁇ 100> direction. At least one of the conditions is satisfied.
- a turning tool having such characteristics has abrasion resistance and can finish a machined surface of a workpiece smoothly.
- the turning is preferably performed under the condition that the feed f is 0.01 mm / rev or more and less than 0.7 mm / rev.
- the synthetic single crystal diamond is preferably a CVD single crystal diamond.
- the intersection line direction between the bisected cross section of the apex angle of the nose R and the rake face is a synthetic single crystal.
- a mode in which the diamond is within ⁇ 10 ° from the ⁇ 110> direction will be described.
- the mode in which the direction of intersection between the bisected section of the apex angle of the nose R and the rake face is within ⁇ 10 ° from the ⁇ 100> direction of the synthetic single crystal diamond. explain.
- the turning by the turning tool is performed under the condition that the feed f is 0.01 mm / rev or more and less than 0.7 mm / rev, and the synthetic single crystal diamond is a CVD single crystal diamond. I do.
- the turning tool according to the first embodiment is a turning tool used for turning.
- the turning is preferably performed under the condition that the feed f is 0.01 mm / rev or more and less than 0.7 mm / rev.
- the feed f is determined by a relationship with a radius of curvature of a cutting edge (nose R) of a turning tool used for turning.
- the turning tool according to the first embodiment has particularly excellent wear resistance and smoothes the machined surface of the work material when used for turning under the condition that the feed f is in the above range. Can be finished.
- using a turning tool for turning under conditions where the feed f is less than 0.01 mm / rev tends to be impractical because the machining time becomes extremely long.
- using a turning tool for turning under conditions where the feed f is 0.7 mm / rev or more makes it easy for the cutting edge to be broken, making it difficult to finish the machined surface of the work material smoothly. Tend.
- the turning tool 1 includes a holder 10 and the cutting edge 3 fixed to the holder 10.
- the material of the holder 10 is not particularly limited, but is preferably made of, for example, steel, cemented carbide, or the like.
- the shape of the holder 10 is not particularly limited as long as it can be used for turning, but may be, for example, a shape including a corner for accommodating the base metal 2 shown in FIG.
- the corner of the holder 10 is formed by partially dropping a part of the upper surface of the holder 10.
- the cutting blade 3 is fixed to the corner of the holder 10 via the base metal 2.
- the cutting blade 3 uses the method of clamping the hole (lever lock method) or the method of screwing the hole (screw-on method) so that the base metal 2 It is fixed to the holder part 10 through the.
- the cutting blade 3 is fixed to the holder 10 via the base metal 2 by using a clamping means such as a method of holding and holding the upper surface of the base metal 2 (clamp-on method). Is done.
- the base metal 2 is not particularly limited in its material, but is preferably made of, for example, a cemented carbide.
- the cutting edge 3 is made of synthetic single crystal diamond. Specifically, in the first embodiment, the cutting edge portion 3 is made of CVD single crystal diamond. This CVD single crystal diamond will be described later. As shown in FIG. 3, the cutting edge portion 3 includes a rake face 4, a flank face 5, and a cutting edge 6 arranged at an intersection where the rake face 4 and the flank face 5 intersect, and has a radius of curvature. Has a nose radius of not less than 0.1 mm and not more than 1.2 mm. The rake face 4 and the flank face 5 are formed by grinding or polishing CVD single crystal diamond. The cutting edge 6 corresponds to a ridgeline as an intersection where the rake face 4 and the flank face 5 intersect.
- An uneven width chamfer 8 may be arranged at an intersection where the rake face 4 and the flank face 5 intersect.
- the cutting edge 6 is formed at a ridgeline at a position where the flank 5 and the chamfer 8 intersect.
- the chamfer 8 can also be formed by grinding or polishing a CVD single crystal diamond.
- the rake face 4 of the cutting edge 3 is preferably a (100) face of CVD single crystal diamond.
- the cutting edge portion 3 is made of CVD single crystal diamond.
- the CVD single crystal diamond can be manufactured by epitaxially growing a diamond single crystal on a diamond single crystal substrate using a CVD method as described later. It is preferable that the synthetic single crystal diamond contains 1 to 100 ppm of nitrogen atoms. Specifically, in the first embodiment, the CVD single crystal diamond preferably contains 1 to 100 ppm of nitrogen atoms.
- the CVD single crystal diamond contains nitrogen atoms in the above-described range, the effect of suppressing the extension of the chip even when a strong stress is applied to a specific portion of the cutting edge 6 is obtained. Target strength can be improved. As a result, the turning tool can have excellent fracture resistance.
- the nitrogen atoms are present as impurity elements in CVD single crystal diamond.
- the impurity element refers to an element (a foreign element) other than carbon, which is a main constituent element of single crystal diamond.
- the content of nitrogen atoms in the CVD single crystal diamond is less than 1 ppm, the effect of suppressing the extension of cracks cannot be sufficiently obtained, and the fracture resistance tends to be unable to be improved. If the content of nitrogen atoms in the CVD single crystal diamond exceeds 100 ppm, crystal defects increase, and when a strong stress is applied to a specific portion of the cutting edge 6, a large defect tends to occur in the cutting edge 6. .
- the content of nitrogen atoms in the CVD single crystal diamond is preferably 20 ppm or more and 80 ppm or less.
- CVD single crystal diamond may contain impurity elements other than nitrogen atoms.
- the CVD single crystal diamond may contain, for example, silicon, boron, hydrogen, and the like as impurity elements other than nitrogen atoms.
- Impurity elements other than nitrogen atoms in the CVD single crystal diamond may contain 0.01 ppm or more and 3 ppm or less for each element for silicon and boron, and may contain 1 ppm or more and 100 ppm or less for hydrogen alone. The total of these elements may be 1 ppm or more and 100 ppm or less.
- the content of nitrogen atoms and other impurity elements in the CVD single crystal diamond can be measured by secondary ion mass spectrometry (SIMS: Secondary Ion Mass Spectrometry).
- the cutting edge has a nose R having a radius of curvature of 0.1 mm or more and 1.2 mm or less as described above.
- the radius of curvature of the nose R is 0.1 mm or more and 1.2 mm or less, the balance between the cutting resistance and the edge strength is improved, so that the processed surface of the workpiece can be finished smoothly.
- the radius of curvature of the nose R is less than 0.1 mm, the cutting edge 6 becomes excessively sharp, so that smooth finishing of the machined surface tends to be difficult.
- the radius of curvature of the nose R exceeds 1.2 mm, the cutting resistance increases, and the cutting edge 6 tends to be easily broken.
- the radius of curvature of the nose R is preferably between 0.2 mm and 0.8 mm.
- the radius of curvature of the nose R can be measured by enlarging and projecting on a screen using a projector used for tool inspection and the like.
- the direction of intersection of the apex angle bisecting section and the rake face 4 is within ⁇ 10 ° from the ⁇ 110> direction of the synthetic single crystal diamond.
- the direction of the intersection between the bisected section of the apex angle of the nose R and the rake face 4 be within ⁇ 5 ° from the ⁇ 110> direction of the synthetic single crystal diamond.
- the nose R can be such that the direction of the intersection of the bisecting section of the apex angle and the rake face 4 is within ⁇ 10 ° from the ⁇ 110> direction of the CVD single crystal diamond, It is preferable that the direction of intersection of the bisected section of the apex angle of the nose R and the rake face 4 be within ⁇ 5 ° from the ⁇ 110> direction of the CVD single crystal diamond.
- the apex angle of the nose R is preferably 55 ° or more and 90 ° or less.
- the apex angle of the nose R can be 35 ° or more and 90 ° or less.
- the (110) plane perpendicular to the ⁇ 110> direction is the surface that comes into contact with the work material, that is, the surface that is worn during cutting. It is known that the ⁇ 100> direction, which is the direction of wear in the 110) plane, is the direction of easy wear.
- the ⁇ 100> direction of the CVD single crystal diamond is located at the front cutting edge boundary portion of the cutting edge 6 which is the boundary that comes into contact with the work material, so that it is perpendicular to the ⁇ 100> direction.
- a ⁇ 100> direction that is a direction having relatively high wear resistance with respect to the above-mentioned easy wear direction (hereinafter, also referred to as “wear direction”) can be arranged.
- the off-angle which is the angle at which the ⁇ 100> direction of the CVD single crystal diamond of the cutting edge 6 intersects with the orientation of the CVD single crystal diamond at the front cutting edge boundary of the cutting edge 6 increases.
- the apex angle of the nose R is 55 ° or more and 90 ° or less, in a state where the off-angle is made smaller, the boundary between the front cutting edge of the cutting edge 6 and the ⁇ 100 in the (100) plane of the CVD single crystal diamond is formed. > Direction. Thereby, an effect is obtained that the front cutting edge boundary portion of the cutting edge 6 is relatively hard to wear in the above-mentioned easy wear direction.
- the ⁇ 100> direction (easy wear direction) in the (110) plane of the CVD single crystal diamond is arranged at the position of the cutting edge 6 corresponding to the position where the cutting depth of the work material is maximized, and at the front cutting edge boundary portion.
- the ⁇ 100> direction (abrasion resistance direction) in the (100) plane of the CVD single crystal diamond is arranged, the following effects can be obtained.
- the cutting edge 6 wears at a position corresponding to the position where the cut of the workpiece becomes maximum, while the wear hardly progresses at the front cutting edge boundary portion. That is, as the turning progresses, the amount of chips decreases at the position of the cutting edge 6 corresponding to the position where the cut of the work material is maximized, but the amount of chips hardly changes at the boundary of the front cutting edge.
- the turning tool according to the present embodiment can finish the machined surface of the work material smoothly.
- the turning tool of the present embodiment can have excellent wear resistance.
- the above-mentioned turning is performed under the condition that the clearance angle is 7 ° or more and 15 ° or less.
- the clearance angle is 7 ° or more and 15 ° or less.
- the crystal orientation of the CVD single crystal diamond in the direction of the intersection of the bisecting section of the apex angle of the nose R and the rake face 4 can be obtained, for example, by using a Laue camera method utilizing X-ray diffraction.
- the turning tool according to the first embodiment has abrasion resistance and can finish the machined surface of the work material smoothly.
- it is suitable for cutting under severe conditions with a large depth of cut (ap).
- the nose R has an apex angle bisected cross section and the intersection line of the rake face 4 within ⁇ 10 ° from the ⁇ 100> direction of the synthetic single crystal diamond.
- the direction of the intersection between the bisected section of the apex angle of the nose R and the rake face 4 is within ⁇ 5 ° from the ⁇ 100> direction of the synthetic single crystal diamond.
- the nose R can be such that the direction of the intersection between the bisected section of the apex angle and the rake face 4 is within ⁇ 10 ° from the ⁇ 100> direction of the CVD single crystal diamond, It is preferable that the direction of the intersection of the bisected section of the apex angle of the nose R and the rake face 4 be within ⁇ 5 ° from the ⁇ 100> direction of the CVD single crystal diamond.
- the apex angle of the nose R is preferably not less than 55 ° and not more than 90 ° as in the turning tool according to the first embodiment.
- the clearance is performed under the condition that the clearance angle is 7 ° or more and 15 ° or less as in the first embodiment.
- the apex angle of the nose R can be set to 35 ° or more and 90 ° or less, and the clearance angle in turning can be executed under the condition of 7 ° or more and 20 ° or less.
- the ⁇ 100> direction of CVD single crystal diamond is the wear-resistant direction as described above.
- the (100) plane perpendicular to the ⁇ 100> direction of the CVD single crystal diamond is the surface that comes into contact with the workpiece (wear surface during cutting)
- the ⁇ 100> direction in the (100) plane is the wear-resistant direction. It is known that For this reason, when the direction of the intersection between the bisecting section of the apex angle of the nose R and the rake face 4 is within ⁇ 10 °, preferably ⁇ 5 ° from the ⁇ 100> direction of the CVD single crystal diamond, In the portion of the cutting edge 6 corresponding to the position where the cut is maximum, the wear hardly proceeds.
- a direction close to the ⁇ 100> direction (abrasion resistance direction) of the CVD single crystal diamond is also present at the front cutting edge boundary, which is the boundary contacting with the work material. Can be located.
- the turning tool of the present embodiment can have wear resistance.
- the turning tool according to the present embodiment can finish the machined surface of the work material smoothly.
- the turning tool according to the second embodiment has abrasion resistance and can smoothly finish the machined surface of the work material.
- it is suitable for cutting under a condition where the depth of cut (ap) is small.
- the turning tool according to the present embodiment can be manufactured by appropriately using a conventionally known technique. Therefore, the manufacturing method of the turning tool should not be particularly limited. However, in the above turning tool, it is preferable to use, for example, the following method in terms of manufacturing a cutting edge portion made of CVD single crystal diamond.
- a first step of preparing a single crystal substrate made of diamond and a second step of forming a conductive layer on the surface of the single crystal substrate by ion-implanting the single crystal substrate are performed.
- a step of epitaxially growing a growth layer made of diamond on the conductive layer a fourth step of separating the growth layer from the single crystal substrate, and grinding or polishing the separated growth layer,
- a single crystal substrate made of diamond is prepared.
- a conventionally known single crystal substrate made of diamond can be used.
- the single crystal substrate can be prepared by using a single crystal substrate (type: Ib) having a flat plate shape and made of diamond manufactured by a high-temperature high-pressure synthesis method.
- the single crystal substrate is a flat plate having a surface composed of a (100) plane of single crystal diamond and side faces composed of a (001) plane and a (011) plane perpendicular to the surface.
- the single crystal substrate preferably has a flat plate with a thickness variation of 10% or less.
- the surface of the single crystal substrate preferably has a surface roughness (Ra) of 30 nm or less.
- the shape of the surface (upper surface) of the single crystal substrate may be, for example, a rectangle such as a square or a rectangle, or a polygon other than a rectangle such as a hexagon or an octagon.
- etching is performed on the surface of the single crystal substrate.
- the surface of the single crystal substrate is etched by reactive ion etching (RIE) using an oxygen (O 2 ) gas and a carbon tetrafluoride (CF 4 ) gas.
- RIE reactive ion etching
- the etching method should not be limited to the above-mentioned RIE, but may be, for example, sputtering using a gas mainly composed of argon (Ar) gas.
- a conductive layer is formed on the surface of the single crystal substrate by ion implantation into the single crystal substrate. Specifically, carbon (C) ions are implanted toward the surface of the single crystal substrate etched as described above. Thus, a conductive layer can be formed in a region including the surface of the single crystal substrate.
- the implanted ions are not limited to carbon ions, but may be nitrogen ions, silicon ions, phosphorus ions, or sulfur ions.
- a growth layer made of diamond is epitaxially grown on the conductive layer.
- the single crystal substrate on which the conductive layer is formed is placed in a CVD furnace in which an atmosphere is formed by introducing a hydrogen (H 2 ) gas, a methane (CH 4 ) gas, and a nitrogen (N 2 ) gas.
- a microwave plasma CVD method is performed in the CVD furnace.
- the single crystal diamond is epitaxially grown through the conductive layer, so that a growth layer made of diamond can be formed on the conductive layer.
- the method for forming the growth layer should not be limited to the microwave plasma CVD method, and for example, a hot filament CVD method, a DC plasma method, or the like can be used.
- a hot filament CVD method By adjusting the amount of nitrogen (N 2 ) gas in the atmosphere in the CVD furnace, the content of nitrogen atoms in the CVD single crystal diamond can be determined.
- the surface of the single crystal substrate for forming the growth layer is preferably a (100) plane, and a plane having an off angle of 0.5 ° to 0.7 ° with respect to the (100) plane. Is more preferred.
- the growth layer is separated from the single crystal substrate. Specifically, by performing electrochemical etching on the conductive layer in the single crystal substrate, the single crystal substrate and the growth layer can be separated. Thereby, a CVD single crystal diamond (growth layer) can be obtained.
- the method of separating the growth layer should not be limited to the electrochemical etching described above, but may be a slice using a laser, for example.
- a cutting edge portion made of CVD single crystal diamond is obtained by grinding or polishing the separated growth layer. Specifically, by performing conventionally known grinding or polishing on the CVD single crystal diamond (growth layer), a rake face, a flank, and an intersection where the rake face and the flank intersect are formed. A cutting edge portion including the arranged cutting edge can be obtained. At this time, the cutting edge is ground or polished so as to have a nose R having a radius of curvature of 0.1 mm or more and 1.2 mm or less.
- intersection line direction between the bisected cross section of the apex angle of the nose R and the rake face is within ⁇ 10 ° from the ⁇ 110> direction and ⁇ 10 ° from the ⁇ 100> direction of the CVD single crystal diamond. At least one of them must be satisfied.
- the cutting edge portion made of the CVD single crystal diamond in the present embodiment can be manufactured.
- the turning tool according to the present embodiment can be manufactured by fixing the above-mentioned cutting edge portion to a corner of the holder portion via a base metal using, for example, a known clamping means.
- a turning tool used for turning under a condition that the feed f is equal to or more than 0.01 mm / rev and less than 0.7 mm / rev The turning tool includes a holder, and a cutting edge fixed to the holder.
- the cutting edge portion is made of CVD single crystal diamond,
- the cutting edge portion includes a rake face, a flank, and a cutting edge disposed at an intersection where the rake face and the flank intersect, and has a radius of curvature of 0.1 mm or more and 1.2 mm or less.
- the nose R is such that the direction of intersection between the bisected cross section of the apex angle and the rake face is within ⁇ 10 ° from the ⁇ 110> direction of the CVD single crystal diamond or within ⁇ 10 ° from the ⁇ 100> direction.
- There is a turning tool. (Appendix 2) The turning tool according to claim 1, wherein the intersection direction is within ⁇ 5 ° from the ⁇ 110> direction of the CVD single crystal diamond.
- (Appendix 3) The turning tool according to claim 1, wherein the intersection direction is within ⁇ 5 ° from the ⁇ 100> direction of the CVD single crystal diamond.
- Example 1 >> ⁇ Preparation of cutting edge part made of CVD single crystal diamond>
- a cutting edge made of CVD single crystal diamond was manufactured.
- Example 1 a total of 26 cutting edges of sample 1-1 to sample 1-21 and sample 1-A to sample 1-E shown in Table 1 were produced to cope with a cutting test described later.
- carbon ions were implanted at an energy of 3 MeV and a dose of 3.0 ⁇ 10 16 / cm 2 to form a conductive layer on the surface of the single crystal substrate (second step). Further, a microwave plasma CVD method was performed to epitaxially grow a growth layer made of diamond having a thickness of 0.7 mm on the conductive layer of the single crystal substrate (third step). At this time, hydrogen gas, methane gas and nitrogen gas were used as atmospheres in the CVD furnace, the concentration of methane gas relative to hydrogen gas was 10% by volume, and the concentration of nitrogen gas relative to methane gas was 1% by volume. Further, the pressure in the CVD furnace was set to 10 kPa, and the substrate temperature was set to 900 ° C.
- a growth layer (CVD single crystal diamond) was separated from the single crystal substrate by performing electrochemical etching on the conductive layer in the single crystal substrate (fourth step).
- the content of nitrogen atoms in the growth layer was measured by SIMS and found to be 50 ppm. Further, the crystal plane and the crystal direction of the growth layer (CVD single crystal diamond) were specified using the Laue camera method described above.
- the growth layer (CVD single crystal diamond) is appropriately ground and polished to form a rake face, a flank, and a cutting edge disposed at an intersection where the rake face and the flank intersect.
- the resulting cutting edge was obtained (fifth step).
- the radius of curvature of the nose R of the cutting edges of the samples 1-1 to 1-21 and the samples 1-A to 1-E is as shown in Table 1. did.
- the angle at which the direction of intersection of the bisected section of the apex angle of the nose R with the rake face and the ⁇ 110> direction of the CVD single crystal diamond at the above-mentioned cutting edge portion intersects the “off angle” in Table 1. ".
- ⁇ Cutting test> The following cutting tests were performed using the turning tools of Sample 1-1 to Sample 1-21 and Sample 1-A to Sample 1-E. Specifically, the turning tool was mounted on a turret of an NC lathe. On the other hand, a cylindrical workpiece was fixed to a chuck of an NC lathe, and the workpiece was subjected to turning under the following cutting conditions. In this turning, the clearance angle was set to 7 °.
- flank wear width of the cutting edge corresponding to the position where the cut of the work material is the maximum
- the flank wear width was measured at the cutting edge portion corresponding to the position where the maximum value was obtained. The results are shown in the column of "flank wear width (maximum depth of cut)" in Table 1.
- the unit of the numerical value described in the column of “flank wear width (maximum depth of cut)” is mm.
- the description of “deletion” in this column means that the above-mentioned turning was stopped due to occurrence of a defect such as a chip in a cutting edge portion corresponding to a position where the cut of the work material was maximized. . It is understood that the smaller the value shown in the column of "flank wear width (maximum depth of cut)", the more excellent the abrasion resistance of the sample is at the cutting edge portion corresponding to the position where the depth of cut of the work material is maximum. You.
- the turning tools of Samples 1-1 to 1-21 have smaller values of the surface roughness (Ra) of the work material than the turning tools of Samples 1-A to 1-E. You can see that. That is, the turning tools of Sample 1-1 to Sample 1-21 can finish the machined surface of the work material smoothly. Further, the turning tools of Sample 1-1 to Sample 1-21 have values of the flank wear width at the cutting edge portion corresponding to the position where the cutting depth of the work material is maximized and the flank wear width at the front cutting edge boundary portion. From this, it is understood that the steel has abrasion resistance that enables turning under severe conditions.
- Example 2 >> ⁇ Preparation of cutting edge part made of CVD single crystal diamond>
- a cutting edge portion made of CVD single crystal diamond was manufactured.
- Example 2 a total of 26 cutting edges of Samples 2-1 to 2-21 and Samples 2-A to 2-E shown in Table 1 were produced to cope with a cutting test described later.
- Example 2 the cutting edges of Samples 2-1 to 2-21 and Samples 2-A to 2-E were used in the grinding and polishing to obtain the cutting edges from the growth layer (CVD single crystal diamond).
- Table 2 shows the radius of curvature of the nose R for the portion.
- the angle at which the direction of intersection of the bisected section of the apex angle of the nose R with the rake face and the ⁇ 100> direction of the CVD single crystal diamond at the above-mentioned cutting edge portion intersects is referred to as the “off angle” in Table 2. ".
- the turning tools of Samples 2-1 to 2-21 have smaller values of the surface roughness (Ra) of the work material than the turning tools of Samples 2-A to 2-E. You can see that. That is, the turning tools of Sample 2-1 to Sample 2-21 can finish the machined surface of the workpiece smoothly. Further, the turning tools of Samples 2-1 to 2-21 have values of the flank wear width at the cutting edge portion corresponding to the position where the cutting depth of the work material is maximum and the flank wear width at the front cutting edge boundary portion. From this, it is understood that the steel has abrasion resistance that enables turning under severe conditions.
- Example 3 Preparation of cutting edge part made of CVD single crystal diamond> By using the same method as in Example 1, a cutting edge portion made of CVD single crystal diamond was manufactured. In Example 3, a total of eight cutting edges of Samples 3-1 to 3-8 were prepared to cope with a cutting test described later.
- Example 3 when performing the microwave plasma CVD method, the nitrogen (N 2 ) gas in the atmosphere was adjusted to adjust the cutting edge (CVD single crystal diamond) of Samples 3-1 to 3-8.
- the content of the nitrogen atom was set as shown in Table 3. The content of this nitrogen atom was measured by SIMS.
- the nose of the cutting edges of the samples 3-1 to 3-2 and 3-5 to 3-6 was matched with the ⁇ 110> direction of the CVD single crystal diamond (off angle was 0 °).
- the direction of the intersection between the halved cross section of the apex angle of the nose R and the rake face was changed by the CVD single crystal diamond. It was matched with the ⁇ 100> direction (off angle was 0 °).
- the above-mentioned Laue camera method was used to specify the crystal direction of the CVD single crystal diamond.
- the apex angle of the nose R was set to 60 °.
- ⁇ Cutting test> A cutting test for evaluating fracture resistance was performed on the turning tools of Samples 3-1 to 3-8. Specifically, the turning tool was mounted on a turret of an NC lathe. On the other hand, a cylindrical workpiece was fixed to a chuck of an NC lathe, and the workpiece was subjected to turning under the following cutting conditions. In this turning, the clearance angle was set to 7 °. Thereby, the fracture resistance was evaluated by the evaluation method described later. Here, in Example 3, the fracture resistance described later was also evaluated for the turning tools of Sample 1-1 and Sample 2-1 described above.
- the turning tools of Sample 1-1, Sample 2-1 and Sample 3-1 to Sample 3-4 in which the content of nitrogen atoms contained in the CVD single crystal diamond is 1 ppm or more and 100 ppm or less are nitrogen It can be understood that the chip has excellent fracture resistance as compared with the turning tools of Samples 3-5 to 3-8 in which the atomic content is out of the above range.
- Example 4 ⁇ Preparation of cutting edge part made of CVD single crystal diamond> By using the same method as in Example 1, a cutting edge portion made of CVD single crystal diamond was manufactured. In Example 4, a total of two cutting edge portions of Samples 4-1 and 4-2 were prepared to cope with a cutting test described later.
- Example 4 in the grinding process and the polishing process for obtaining the cutting edge portion from the growth layer (CVD single crystal diamond), the apex angles of the cutting edge portions of Samples 4-1 to 4-2 are as shown in Table 4. And at the same time, regarding the cutting edge portions of Samples 4-1 and 4-2, the direction of intersection between the halved surface at the apex angle of the nose R and the rake face coincides with the ⁇ 110> direction of the CVD single crystal diamond. (Off angle was 0 °). The above-mentioned Laue camera method was used to specify the crystal direction of the CVD single crystal diamond.
- Table 4 shows that the turning tools of Samples 4-1 and 4-2 all have small surface roughness (Ra) values. That is, the turning tools of Sample 4-1 and Sample 4-2 can finish the machined surface of the work material smoothly. Further, the turning tools of Samples 4-1 to 4-2 have the values of the flank wear width at the cutting edge portion corresponding to the position where the cut of the work material is maximized and the flank wear width at the front cutting edge boundary portion. From this, it is understood that the steel has abrasion resistance that enables turning under severe conditions.
- ⁇ 1 ⁇ turning tool ⁇ 2 ⁇ base metal, ⁇ 3 ⁇ cutting edge, ⁇ 4 ⁇ rake face, ⁇ 5 ⁇ flank, ⁇ 6 ⁇ cutting edge, ⁇ 8 ⁇ chamfer, 10 ⁇ holder, Z work material.
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Abstract
Description
上述の単結晶ダイヤモンド切削工具は、非鉄金属加工市場のうち自動車部品の加工にほとんど用いられていない。自動車部品において汎用される高速切削、高送り、深い切込みといった過酷な条件の加工を、単結晶ダイヤモンド切削工具を用いて行なった場合、欠損が多発するとともに、容易に摩耗するからである。したがって単結晶ダイヤモンド切削工具に対し、過酷な条件での加工が可能となるように優れた耐摩耗性を付与することが求められている。さらに自動車部品などの加工品の表面を平滑に仕上げることに対して強い要請がある。
上記によれば、耐摩耗性を有し、かつ被削材の加工面を平滑に仕上げることが可能な旋削工具を提供することができる。
最初に本開示の実施態様を列記して説明する。
以下、本開示の実施形態(以下、「本実施形態」とも記す)についてさらに詳細に説明するが、本実施形態はこれらに限定されるものではない。以下では図面を参照しながら説明する。
本実施形態に係る旋削工具は、旋削加工に用いられる旋削工具である。旋削工具は、ホルダ部と、上記ホルダ部に固定された切れ刃部とを備える。上記切れ刃部は、合成単結晶ダイヤモンドからなる。さらに上記切れ刃部は、すくい面と、逃げ面と、上記すくい面および上記逃げ面が交差する交差部に配置された切れ刃とを含み、かつ曲率半径が0.1mm以上1.2mm以下となるノーズRを有する。上記ノーズRは、その頂角の二等分断面と上記すくい面との交線方向が、上記合成単結晶ダイヤモンドの<110>方向から±10°以内および<100>方向から±10°以内という条件のうち少なくとも一方を満たす。このような特徴を備えた旋削工具は、耐摩耗性を有し、かつ被削材の加工面を平滑に仕上げることができる。
第1実施形態に係る旋削工具は、旋削加工に用いられる旋削工具である。上記旋削加工は、送りfが0.01mm/rev以上0.7mm/rev未満という条件で実行されることが好ましい。送りfは、旋削加工に用いられる旋削工具が有する切れ刃部(ノーズR)の曲率半径との関係で決まる。このため第1実施形態に係る旋削工具は、送りfが上述の範囲となる条件の旋削加工に用いられる場合において、特に優れた耐摩耗性を有し、かつ被削材の加工面を平滑に仕上げることができる。本実施形態において、送りfが0.01mm/rev未満となる条件の旋削加工に旋削工具を用いることは、加工時間が著しく長くなるため現実的ではない傾向がある。本実施形態において、送りfが0.7mm/rev以上となる条件の旋削加工に旋削工具を用いることは、切れ刃が欠損しやすく、被削材の加工面を平滑に仕上げることが困難となる傾向がある。
切れ刃部3は、合成単結晶ダイヤモンドからなる。具体的には、第1実施形態において切れ刃部3は、CVD単結晶ダイヤモンドからなる。このCVD単結晶ダイヤモンドについては後述する。図3に示すように切れ刃部3は、すくい面4と、逃げ面5と、上記すくい面4および上記逃げ面5が交差する交差部に配置された切れ刃6とを含み、かつ曲率半径が0.1mm以上1.2mm以下となるノーズRを有する。すくい面4および逃げ面5は、CVD単結晶ダイヤモンドを研削加工あるいは研磨加工することにより形成される。切れ刃6は、すくい面4および逃げ面5が交差する交差部としての稜線に相当する。すくい面4および逃げ面5が交差する交差部には、不等幅のチャンファー8が配置されてもよい。この場合、切れ刃6は、逃げ面5とチャンファー8とが交差した位置の稜線に形成される。チャンファー8も、CVD単結晶ダイヤモンドを研削加工あるいは研磨加工することにより形成することができる。切れ刃部3のすくい面4は、CVD単結晶ダイヤモンドの(100)面であることが好ましい。
上述のとおり第1実施形態において切れ刃部3は、CVD単結晶ダイヤモンドからなる。CVD単結晶ダイヤモンドは、後述するようにCVD法を用い、ダイヤモンドの単結晶基板上にダイヤモンドの単結晶をエピタキシャル成長させることにより作製することができる。上記合成単結晶ダイヤモンドは、窒素原子を1ppm以上100ppm以下含むことが好ましい。具体的には第1実施形態においてCVD単結晶ダイヤモンドは、窒素原子を1ppm以上100ppm以下含むことが好ましい。CVD単結晶ダイヤモンドは、窒素原子を上述の範囲で含む場合、切れ刃6の特定部位に強い応力がかかったときであっても欠けの伸展を抑制する効果が得られるため、靱性および硬度といった機械的強度を向上させることができる。これにより旋削工具は、耐欠損性にも優れることができる。上記窒素原子は、CVD単結晶ダイヤモンド中の不純物元素として存在する。ここで不純物元素とは、単結晶ダイヤモンドの主な構成元素である炭素以外の元素(異元素)をいう。
切れ刃部は、上述のとおり曲率半径が0.1mm以上1.2mm以下となるノーズRを有する。ノーズRの曲率半径が0.1mm以上1.2mm以下であることにより、切削抵抗と刃先強度とのバランスが良くなり、もって被削材の加工面を平滑に仕上げることができる。ノーズRの曲率半径が0.1mm未満である場合、切れ刃6が過度に鋭角となるので、加工面の平滑な仕上げが困難となる傾向がある。ノーズRの曲率半径が1.2mmを超える場合、切削抵抗が大きくなるため、切れ刃6が欠損しやすくなる傾向がある。ノーズRの曲率半径は、0.2mm以上0.8mm以下とすることが好ましい。ノーズRの曲率半径は、工具検査などで使用される投影機を用いてスクリーン上に拡大投影することにより測定することができる。
以上から、第1実施形態に係る旋削工具は、耐摩耗性を有し、かつ被削材の加工面を平滑に仕上げることが可能となる。特に、切込み量(ap)が大きい過酷な条件での切削加工に好適となる。
以下、第2実施形態に係る旋削工具について説明する。以下においては、第1実施形態に係る旋削工具と異なる点を主に説明し、重複することとなる説明は繰り返さない。
以上から、第2実施形態に係る旋削工具は、耐摩耗性を有し、かつ被削材の加工面を平滑に仕上げることができる。特に、切込み量(ap)が少ない条件での切削加工に好適となる。
本実施形態に係る旋削工具は、従来公知の手法を適宜用いることにより製造することができる。このため上記旋削工具の製造方法は、特に制限されるべきではない。しかしながら上記旋削工具において、CVD単結晶ダイヤモンドからなる切れ刃部を製造する点に関し、たとえば次の方法を用いることが好ましい。
まず第1工程では、ダイヤモンドからなる単結晶基板を準備する。ダイヤモンドからなる単結晶基板は従来公知のものを用いることができる。たとえば平板形状を有し、高温高圧合成法により製造されたダイヤモンドからなる単結晶基板(タイプ:Ib)を用いることにより、上記単結晶基板を準備することができる。
第2工程では、上記単結晶基板に対しイオン注入することにより、上記単結晶基板の表面に導電層を形成する。具体的には、上述のようにエッチングされた単結晶基板の表面へ向けて、カーボン(C)イオンを注入する。これにより、単結晶基板の表面を含む領域に導電層を形成することができる。注入イオンは、カーボンイオンに限定されるべきではなく、窒素イオンでもよいし、シリコンイオンでもよいし、リンイオンでもよいし、硫黄イオンでもよい。
第3工程では、上記導電層上にダイヤモンドからなる成長層をエピタキシャル成長させる。具体的には、水素(H2)ガス、メタン(CH4)ガスおよび窒素(N2)ガスを導入することにより雰囲気を形成したCVD炉に、上記導電層が形成された単結晶基板を配置し、上記CVD炉においてマイクロ波プラズマCVD法を実行する。これにより導電層を介して単結晶ダイヤモンドをエピタキシャル成長させ、もって導電層上にダイヤモンドからなる成長層を形成することができる。成長層の形成方法は、マイクロ波プラズマCVD法に限定されるべきではなく、たとえば熱フィラメントCVD法、DCプラズマ法などを用いることができる。CVD炉内の雰囲気において、窒素(N2)ガスの量を調整することにより、CVD単結晶ダイヤモンドにおける窒素原子の含有量を決定することができる。
第4工程では、上記成長層を単結晶基板から分離する。具体的には、単結晶基板中の導電層に対し電気化学的なエッチングを実行することにより、単結晶基板と成長層とを分離することができる。これによりCVD単結晶ダイヤモンド(成長層)を得ることができる。成長層の分離方法は、上述した電気化学的なエッチングに限定されるべきではなく、たとえばレーザを用いたスライスであってもよい。
第5工程では、分離した成長層を研削加工あるいは研磨加工することにより、CVD単結晶ダイヤモンドからなる切れ刃部を得る。具体的には、上記CVD単結晶ダイヤモンド(成長層)に対して従来公知の研削加工あるいは研磨加工を実行することにより、すくい面と、逃げ面と、すくい面および逃げ面が交差する交差部に配置された切れ刃とを含む切れ刃部を得ることができる。このとき切れ刃部に関して、曲率半径が0.1mm以上1.2mm以下となるノーズRを有するように研削加工あるいは研磨加工する。併せて、ノーズRの頂角の二等分断面とすくい面との交線方向が、CVD単結晶ダイヤモンドの<110>方向から±10°以内および<100>方向から±10°以内という条件のうち少なくとも一方を満たすようにする。
以上の説明は、以下に付記する実施形態を含む。
(付記1)
送りfが0.01mm/rev以上0.7mm/rev未満となる条件の旋削加工に用いられる旋削工具であって、
前記旋削工具は、ホルダ部と、前記ホルダ部に固定された切れ刃部とを備え、
前記切れ刃部は、CVD単結晶ダイヤモンドからなり、
前記切れ刃部は、すくい面と、逃げ面と、前記すくい面および前記逃げ面が交差する交差部に配置された切れ刃とを含み、かつ曲率半径が0.1mm以上1.2mm以下となるノーズRを有し、
前記ノーズRは、その頂角の二等分断面と前記すくい面との交線方向が、前記CVD単結晶ダイヤモンドの<110>方向から±10°以内または<100>方向から±10°以内である、旋削工具。
(付記2)
前記交線方向は、前記CVD単結晶ダイヤモンドの<110>方向から±5°以内である、付記1に記載の旋削工具。
(付記3)
前記交線方向は、前記CVD単結晶ダイヤモンドの<100>方向から±5°以内である、付記1に記載の旋削工具。
(付記4)
前記CVD単結晶ダイヤモンドは、窒素原子を1ppm以上100ppm以下含む、付記1から付記3のいずれか1つに記載の旋削工具。
(付記5)
前記頂角は、55°以上90°以下である、付記1から付記4のいずれか1つに記載の旋削工具。
(付記6)
前記旋削加工は、逃げ角が7°以上15°以下という条件で実行される、付記1から付記5のいずれか1つに記載の旋削工具。
<CVD単結晶ダイヤモンドからなる切れ刃部の作製>
上述した切れ刃部の製造方法を用いることにより、CVD単結晶ダイヤモンドからなる切れ刃部を製造した。実施例1では、後述する切削試験に対応するため、表1に示す試料1-1~試料1-21、および試料1-A~試料1-Eの合計26個の切れ刃部を作製した。
上記切れ刃部をホルダ部(材質:超硬合金)に、台金を介してスクリューオン方式により固定した。以上により、試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具を作製した。試料1-1~試料1-21の旋削工具が実施例であり、試料1-A~試料1-Eの旋削工具が比較例である。
試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具を用いることにより次の切削試験を行なった。具体的には、上記旋削工具をNC旋盤のタレットに取り付けた。一方、NC旋盤のチャックに円筒形状の被削材を固定し、この被削材に対して以下の切削条件により旋削加工を行なった。この旋削加工においては、逃げ角を7°に設定した。
被削材: アルミニウム合金ADC12(断続溝4か所)
切削速度(Vc): 200m/分
切込み量(ap): 0.3mm
送り(f): 0.005~0.7mm/revの範囲で変更(表1参照)
切削油材: 水溶性エマルジョン2質量%。
(表面粗さ(Ra))
試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具に対し、上記の旋削加工により切削距離が1km、30kmおよび60kmとなった時点での被削材の表面粗さ(Ra)を測定した。この表面粗さ(Ra)については、表面粗さ測定機を用いてJIS B 0601:2001に準拠して求めた。結果を表1の「表面粗さ[Ra]」の欄に示す。この「表面粗さ[Ra]」の欄において「-」という記載は、切れ刃の欠損により切削を完了できなかったことから値がないことを意味する。「表面粗さ[Ra]」の欄に示した数値が小さいほど、その試料が被削材の加工面を平滑に仕上げることができると理解される。
試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具に対し、上記の旋削加工により切削距離が1km、30kmおよび60kmとなった時点において、被削材の切込みが最大となる位置に対応する切れ刃部位における逃げ面摩耗幅を測定した。結果を表1の「逃げ面摩耗幅(切込み最大点)」の欄に示す。この「逃げ面摩耗幅(切込み最大点)」の欄に記載された数値の単位は、mmである。さらに、この欄における「欠損」との記載は、被削材の切込みが最大となる位置に対応する切れ刃部位に欠け等の欠損が発生したことにより上記の旋削加工を中止したことを意味する。「逃げ面摩耗幅(切込み最大点)」の欄に示した数値が小さいほど、その試料が被削材の切込みが最大となる位置に対応する切れ刃部位において耐摩耗性に優れることが理解される。
試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具に対し、上記の旋削加工により切削距離が1km、30kmおよび60kmとなった時点において、切れ刃の前切れ刃境界部における逃げ面摩耗幅を測定した。結果を表1の「逃げ面摩耗幅(前切れ刃境界部)」の欄に示す。この「逃げ面摩耗幅(前切れ刃境界部)」の欄に記載された数値の単位は、mmである。さらに、この欄における「欠損」との記載は、切れ刃の前切れ刃境界部に欠け等の欠損が発生したことにより上記の旋削加工を中止したことを意味する。「逃げ面摩耗幅(前切れ刃境界部)」の欄に示した数値が小さい値であるほど、その試料が切れ刃の前切れ刃境界部において耐摩耗性に優れることが理解される。
試料1-1~試料1-21、および試料1-A~試料1-Eの旋削工具に対し、上記の旋削加工により断続部抜け際にバリ(高さ0.1mm)が発生した時点での切削距離(km)を測定した。結果を表1の「バリ発生」の欄に示す。この「バリ発生」の欄において「-」という記載は、切削距離60kmを超えた時点で高さ0.1mm以上のバリは発生しなかったことを意味する。「バリ発生」の欄に示した数値が大きいほど、その試料が被削材の加工面を平滑に仕上げることができると理解される。さらに「バリ発生」の欄において「-」が記載された試料も被削材の加工面を平滑に仕上げることができると理解される。
<CVD単結晶ダイヤモンドからなる切れ刃部の作製>
上記実施例1と同じ方法を用いることにより、CVD単結晶ダイヤモンドからなる切れ刃部を製造した。実施例2では、後述する切削試験に対応するため、表1に示す試料2-1~試料2-21、および試料2-A~試料2-Eの合計26個の切れ刃部を作製した。
上記実施例1と同じ方法を用いることにより、試料2-1~試料2-21、および試料2-A~試料2-Eの旋削工具を作製した。試料2-1~試料2-21の旋削工具が実施例であり、試料2-A~試料2-Eの旋削工具が比較例である。
試料2-1~試料2-21、および試料2-A~試料2-Eの旋削工具に対し、実施例1と同じ切削試験を行なった。その評価についても実施例1と同じとした。結果を表2に示す。
<CVD単結晶ダイヤモンドからなる切れ刃部の作製>
上記実施例1と同じ方法を用いることにより、CVD単結晶ダイヤモンドからなる切れ刃部を製造した。実施例3では、後述する切削試験に対応するため、試料3-1~試料3-8の合計8個の切れ刃部を作製した。
上記実施例1と同じ方法を用いることにより、試料3-1~試料3-8の旋削工具を作製した。
上記の試料3-1~試料3-8の旋削工具に対し、耐欠損性を評価する切削試験を行なった。具体的には、上記旋削工具をNC旋盤のタレットに取り付けた。一方、NC旋盤のチャックに円筒形状の被削材を固定し、この被削材に対して以下の切削条件により旋削加工を行なった。この旋削加工においては、逃げ角を7°に設定した。これにより後述する評価方法により耐欠損性を評価した。ここで実施例3において、後述する耐欠損性の評価を上述した試料1-1および試料2-1の旋削工具に対しても行なった。
被削材: アルミニウム合金A390(断続溝8か所)
切削速度(Vc): 800m/分
切込み量(ap): 0.3mm
送り(f): 0.3mm/rev
切削油材: 水溶性エマルジョン2質量%。
(耐欠損性)
耐欠損性の評価として、試料1-1、試料2-1および試料3-1~試料3-8の旋削工具の切れ刃部において、0.02mm以上の欠けが発生するまでに上記の旋削加工を行なうことができた加工距離(単位は、km)をそれぞれ測定した。加工距離が長い試料であるほど、耐欠損性に優れると理解される。結果を表3に示す。
<CVD単結晶ダイヤモンドからなる切れ刃部の作製>
上記実施例1と同じ方法を用いることにより、CVD単結晶ダイヤモンドからなる切れ刃部を製造した。実施例4では、後述する切削試験に対応するため、試料4-1~試料4-2の合計2個の切れ刃部を作製した。
上記実施例1と同じ方法を用いることにより、試料4-1~試料4-2の旋削工具を作製した。
試料4-1~試料4-2の旋削工具に対し、表4に示す逃げ角により旋削加工を実行すること以外については、実施例1と同じ切削条件により切削試験を行なった。具体的には、試料4-1~試料4-2については、試料1-10と同じ曲率半径、送り、オフ角および切削条件とした。ただし、試料4-1~試料4-2の旋削工具の評価では、上記の旋削加工により切削距離が60kmとなった時点のみにおいて、表面粗さ(Ra)、被削材の切込みが最大となる位置に対応する切れ刃部位における逃げ面摩耗幅、および切れ刃の前切れ刃境界部における逃げ面摩耗幅を測定した。さらに、高さ0.1mm以上のバリが発生した時点の切削距離(km)も測定した。結果を表4に示す。
Claims (8)
- 旋削加工に用いられる旋削工具であって、
前記旋削工具は、ホルダ部と、前記ホルダ部に固定された切れ刃部とを備え、
前記切れ刃部は、合成単結晶ダイヤモンドからなり、
前記切れ刃部は、すくい面と、逃げ面と、前記すくい面および前記逃げ面が交差する交差部に配置された切れ刃とを含み、かつ曲率半径が0.1mm以上1.2mm以下となるノーズRを有し、
前記ノーズRは、その頂角の二等分断面と前記すくい面との交線方向が、前記合成単結晶ダイヤモンドの<110>方向から±10°以内および<100>方向から±10°以内という条件のうち少なくとも一方を満たす、旋削工具。 - 前記交線方向は、前記合成単結晶ダイヤモンドの<110>方向から±5°以内である、請求項1に記載の旋削工具。
- 前記交線方向は、前記合成単結晶ダイヤモンドの<100>方向から±5°以内である、請求項1に記載の旋削工具。
- 前記合成単結晶ダイヤモンドは、窒素原子を1ppm以上100ppm以下含む、請求項1から請求項3のいずれか1項に記載の旋削工具。
- 前記頂角は、55°以上90°以下である、請求項1から請求項4のいずれか1項に記載の旋削工具。
- 前記旋削加工は、逃げ角が7°以上15°以下という条件で実行される、請求項1から請求項5のいずれか1項に記載の旋削工具。
- 前記旋削加工は、送りfが0.01mm/rev以上0.7mm/rev未満という条件で実行される、請求項1から請求項6のいずれか1項に記載の旋削工具。
- 前記合成単結晶ダイヤモンドは、CVD単結晶ダイヤモンドである、請求項1から請求項7のいずれか1項に記載の旋削工具。
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| JP2023135175A (ja) * | 2022-03-15 | 2023-09-28 | 株式会社大阪プロジャパン | 真空容器の製造方法 |
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| CN114981028B (zh) * | 2020-01-17 | 2024-04-05 | 联合材料公司 | 单晶金刚石切削工具 |
| CN113579275A (zh) * | 2021-08-06 | 2021-11-02 | 四川省柏均机械制造有限责任公司 | 用于高铬铸铁孔加工的刀具 |
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2019
- 2019-08-02 JP JP2020535722A patent/JP7695035B2/ja active Active
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- 2019-08-02 WO PCT/JP2019/030411 patent/WO2020031871A1/ja not_active Ceased
- 2019-08-02 EP EP19847482.7A patent/EP3834967A4/en not_active Withdrawn
- 2019-08-02 CN CN201980051496.6A patent/CN112533713B/zh active Active
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2023
- 2023-09-22 JP JP2023158730A patent/JP2023175852A/ja not_active Withdrawn
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190168310A1 (en) * | 2016-07-28 | 2019-06-06 | Kyocera Corporation | Cutting insert, cutting tool, and method of manufacturing machined product |
| US11517965B2 (en) * | 2016-07-28 | 2022-12-06 | Kyocera Corporation | Cutting insert, cutting tool, and method of manufacturing machined product |
| US20200130072A1 (en) * | 2018-10-31 | 2020-04-30 | Kyocera Corporation | Cutting insert, cutting tool, and method for manufacturing machined product |
| JP2023135175A (ja) * | 2022-03-15 | 2023-09-28 | 株式会社大阪プロジャパン | 真空容器の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3834967A4 (en) | 2022-05-04 |
| CN112533713B (zh) | 2024-04-05 |
| JP7695035B2 (ja) | 2025-06-18 |
| JP2023175852A (ja) | 2023-12-12 |
| US11938547B2 (en) | 2024-03-26 |
| EP3834967A1 (en) | 2021-06-16 |
| JPWO2020031871A1 (ja) | 2021-08-26 |
| US20200316691A1 (en) | 2020-10-08 |
| CN112533713A (zh) | 2021-03-19 |
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