WO2015198671A1 - 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート - Google Patents
銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート Download PDFInfo
- Publication number
- WO2015198671A1 WO2015198671A1 PCT/JP2015/059483 JP2015059483W WO2015198671A1 WO 2015198671 A1 WO2015198671 A1 WO 2015198671A1 JP 2015059483 W JP2015059483 W JP 2015059483W WO 2015198671 A1 WO2015198671 A1 WO 2015198671A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- copper powder
- copper
- dendritic
- resin
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C5/00—Electrolytic production, recovery or refining of metal powders or porous metal masses
- C25C5/02—Electrolytic production, recovery or refining of metal powders or porous metal masses from solutions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/0551—Flake form nanoparticles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/0553—Complex form nanoparticles, e.g. prism, pyramid, octahedron
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/06—Metallic powder characterised by the shape of the particles
- B22F1/068—Flake-like particles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/62—Metallic pigments or fillers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D201/00—Coating compositions based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
- C25C7/08—Separating of deposited metals from the cathode
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0081—Electromagnetic shielding materials, e.g. EMI, RFI shielding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
- B22F2301/10—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2304/00—Physical aspects of the powder
- B22F2304/10—Micron size particles, i.e. above 1 micrometer up to 500 micrometer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Definitions
- the present invention relates to a copper powder used as a material for a conductive paste or the like, and more particularly to a copper powder having a novel shape capable of improving conductivity and a copper paste using the same.
- Silver or copper metal filler paste is applied or printed on various substrates of an electronic device, and is subjected to heat curing or heat baking treatment to form a conductive film to be a wiring layer or an electrode.
- a resin-type conductive paste is composed of a metal filler, a resin, a curing agent, a solvent, etc., printed on a conductor circuit pattern or terminal, and heat-cured at 100 ° C. to 200 ° C. to form a conductive film. And forming electrodes.
- the resin-type conductive paste since the thermosetting resin is cured and contracted by heat, the metal fillers are pressed and contacted with each other so that the metal fillers overlap each other, and as a result, an electrically connected current path is formed. Since this resin-type conductive paste is processed at a curing temperature of 200 ° C. or less, it is often used for a substrate using a heat-sensitive material such as a printed wiring board.
- the fired conductive paste is made of a metal filler, glass, solvent, etc., printed on a conductor circuit pattern or terminal, and heated and fired at 600 ° C. to 800 ° C. to form a conductive film.
- the fired conductive paste is processed at a high temperature to sinter the metal fillers to ensure conductivity. Since this fired conductive paste is processed at such a high firing temperature, it cannot be used for printed wiring boards that use resin materials. However, since metal fillers are connected by sintering, they have low resistance. Is easy to obtain.
- Such a fired conductive paste is used, for example, for an external electrode of a multilayer ceramic capacitor.
- the copper and silver powders used as the metal filler in order to connect the particles and conduct electricity, shapes such as a granular shape, a dendritic shape, and a flat plate shape have been often used.
- a flat plate shape with a small thickness contributes to a reduction in the thickness of the wiring material due to a decrease in thickness, and a certain thickness.
- a larger area where the grains come into contact with each other than a certain cubic or spherical particle can be ensured, and that low resistance, that is, high conductivity can be achieved. For this reason, it is suitable especially for the use of the conductive paint and conductive paste which want to maintain electroconductivity.
- Patent Document 1 discloses a method for obtaining a flaky copper powder suitable for a filler of a conductive paste. Specifically, a spherical copper powder having an average particle size of 0.5 to 10 ⁇ m is used as a raw material and is processed into a flat plate shape by a mechanical energy of a medium loaded in the mill using a ball mill or a vibration mill. is there.
- Patent Document 2 discloses a technique relating to a copper powder for conductive paste, more specifically, a disk-shaped copper powder that provides high performance as a copper paste for through holes and external electrodes, and a method for manufacturing the same. Specifically, the granular atomized copper powder is put into a medium agitating mill, and a steel ball having a diameter of 1/8 to 1/4 inch is used as a grinding medium. 1% is added and processed into a flat plate shape by grinding in air or in an inert atmosphere.
- Patent Document 3 discloses a method for obtaining electrolytic copper powder that can be molded with high strength, with improved formability than conventional electrolytic copper powder, without unnecessarily developing the branches of electrolytic copper powder.
- the electrolytic solution is used for the purpose of reducing the size of the crystallites constituting the electrolytic copper powder.
- One or two or more selected from tungstate, molybdate, and sulfur-containing organic compounds are added to a certain aqueous copper sulfate solution to deposit electrolytic copper powder.
- the obtained granular copper powder is mechanically deformed (processed) using a medium such as a ball to form a flat plate.
- a medium such as a ball
- the average particle size is 1 to 30 ⁇ m in the technique of Patent Document 1
- the average particle diameter is 7 to 12 ⁇ m in the technique of Patent Document 3.
- dendritic shape electrolytic copper powder deposited in a dendritic shape called dendritic shape.
- the dendritic electrolytic copper powder branches from the needle-grown primary copper in the secondary direction, grows in a needle-like shape, and further grows in a needle-like shape from the secondary direction to the tertiary direction. It is formed through the process of growing, and further, the shape of the branches grows as if the leaves of the trees grow on the branches.
- Such dendritic electrolytic copper powder has a dendritic shape, so it has a large surface area, excellent formability and sinterability, and is used as a raw material for oil-impregnated bearings and machine parts for powder metallurgy applications. in use.
- Patent Document 4 discloses a copper powder for metal powder injection molding having a complicated three-dimensional shape and high dimensional accuracy, and a method for manufacturing an injection molded product using the same. Specifically, it has been shown that by further developing the dendritic shape, the dendrites of the electrolytic copper powder adjacent to each other at the time of compression molding are intertwined and firmly connected to each other, so that it can be molded with high strength. Furthermore, when it is used as a conductive paste or a metal filler for electromagnetic wave shielding, since it has a dendritic shape, it can be used that it can have more contacts than a spherical shape.
- the dendritic copper powder as described above when used as a metal filler such as a conductive paste or a resin for electromagnetic wave shielding, the dendritic copper powder has a shape in which the metal filler in the resin has developed into a dendritic shape. They are entangled with each other and agglomerate occurs, which causes a problem that they are not uniformly dispersed in the resin, and the viscosity of the paste increases due to agglomeration, resulting in problems in wiring formation by printing. Such a problem is pointed out in Patent Document 3, for example.
- the dendritic copper powder As described above, it is not easy to use the dendritic copper powder as a metal filler such as a conductive paste, and the improvement of the conductivity of the paste has been difficult.
- a dendritic shape is easy to ensure a contact rather than granular, and can ensure high electroconductivity as a conductive paste or an electromagnetic wave shield.
- the present invention has been proposed in view of the above-described circumstances, and is preferably used as an application such as a conductive paste or an electromagnetic wave shield while ensuring excellent conductivity by increasing the number of contacts between copper powders. It aims at providing the copper powder which can do.
- the present inventors present a dendritic shape having a main trunk that grows linearly and a plurality of branches separated from the main trunk, and the main trunk and the branch have flat cross-sectional copper particles having a predetermined cross-sectional average thickness. It is found that the average particle size is in a specific range, while ensuring excellent conductivity, for example, can be uniformly mixed with a resin and can be suitably used for applications such as a conductive paste,
- the present invention has been completed. That is, the present invention provides the following.
- a first invention according to the present invention has a dendritic shape having a main trunk that grows linearly and a plurality of branches separated from the main trunk, and the main trunk and the branch have a cross-sectional average thickness.
- a copper powder comprising flat copper particles of 0.2 ⁇ m to 1.0 ⁇ m, wherein the copper powder has an average particle diameter (D50) of 5.0 ⁇ m to 30 ⁇ m.
- a ratio obtained by dividing the cross-sectional average thickness of the tabular copper particles by the average particle diameter (D50) of the copper powder is 0.00. in the range 01 to 0.1 and a copper powder, wherein the bulk density of the copper powder is in the range of 0.3g / cm 3 ⁇ 5.0g / cm 3.
- the third invention according to the present invention is characterized in that, in the first or second invention, the crystallite diameter in the Miller index of the (111) plane by X-ray diffraction is in the range of 800 to 2000 mm. Copper powder.
- a fourth invention according to the present invention is a metal filler characterized by containing the copper powder according to any one of the first to third inventions in a proportion of 20% by mass or more of the whole. .
- a fifth invention according to the present invention is a copper paste obtained by mixing the metal filler according to the fourth invention with a resin.
- a sixth invention according to the present invention is a conductive paint for electromagnetic wave shielding, characterized by using the metal filler according to the fourth invention.
- a seventh invention according to the present invention is a conductive sheet for electromagnetic wave shielding, characterized by using the metal filler according to the fourth invention.
- the copper powder according to the present invention is a dendritic copper powder having a main trunk and a plurality of branches branched from the main trunk, and the main trunk and branch portions are made of flat copper particles having a predetermined cross-sectional average thickness. .
- a large number of contacts can be secured and a large contact area can be secured, and excellent electrical conductivity can be ensured, and aggregation can be prevented and used suitably for applications such as conductive pastes and electromagnetic wave shields. be able to.
- the present embodiment specific embodiments of the copper powder according to the present invention (hereinafter referred to as “the present embodiment”) will be described in detail with reference to the drawings.
- this invention is not limited to the following embodiment, A various change is possible in the range which does not change the summary of this invention.
- FIG. 1 is a schematic diagram showing a specific shape of the copper powder according to the present embodiment.
- the copper powder 1 according to the present embodiment is a copper powder having a dendritic shape that is a two-dimensional or three-dimensional form (hereinafter, copper powder according to the present embodiment). Is also called “dendritic copper powder”. More specifically, the dendritic copper powder 1 is a dendritic copper powder having a main trunk 2 that grows linearly and a plurality of branches 3 that are linearly separated from the main trunk, and the main trunk 2 and the main trunk 2.
- the copper particles constituting the branch 3 branched from the shape of a flat plate having a cross-sectional average thickness of 0.2 ⁇ m to 1.0 ⁇ m.
- the average particle diameter (D50) of the dendritic copper powder 1 composed of such flat copper particles is 5.0 ⁇ m to 30 ⁇ m.
- the branch 3 in the dendritic copper powder 1 means both a branch 3a branched from the main trunk 2 and a branch 3b further branched from the branch 3a.
- the dendritic copper powder 1 is obtained in detail later.
- the dendritic copper powder 1 is deposited on the cathode by immersing the anode and the cathode in a sulfuric acid electrolytic solution containing copper ions, and flowing a direct current to perform electrolysis. be able to.
- FIGS. 2 to 4 are photographic views showing examples of observation images when the dendritic copper powder 1 according to the present embodiment is observed with a scanning electron microscope (SEM).
- SEM scanning electron microscope
- 2 shows the dendritic copper powder 1 observed at a magnification of 500 times
- FIG. 3 shows the dendritic copper powder 1 observed at a magnification of 5,000 times
- FIG. 4 shows the dendritic copper powder 1 (At the time of mass production) is observed at a magnification of 1,000 times.
- the copper powder 1 according to the present embodiment has a main trunk 2 and a branch 3 (3a, 3b) branched from the main trunk 2.
- the precipitation state is exhibited.
- the main trunk 2 and the branches 3 are composed of flat copper particles.
- the flat copper particles constituting the main trunk 2 and the branch 3 have a cross-sectional average thickness of 0.2 ⁇ m to 1.0 ⁇ m.
- the dendritic copper powder 1 is composed of the flat fine copper particles 2, it can contribute to thinning of the wiring material and the like.
- the lower limit value of the cross-sectional average thickness of the copper particles 2 is preferably 0.2 ⁇ m or more, which can increase the number of contacts.
- the average particle diameter (D50) is 5.0 ⁇ m to 30 ⁇ m.
- an average particle diameter (D50) can be measured by the laser diffraction scattering type particle size distribution measuring method, for example.
- the metal filler in the resin is When the shape is developed in a dendritic shape, the dendritic copper powders are entangled with each other to cause agglomeration, which may not be uniformly dispersed in the resin. In addition, the agglomeration increases the viscosity of the paste and causes problems in wiring formation by printing. This occurs because the shape of the dendritic copper powder is large, and in order to solve this problem while effectively utilizing the dendritic shape, it is necessary to reduce the shape of the dendritic copper powder. It becomes.
- the effect of being in a dendritic shape that is, a three-dimensional shape, has a large surface area and excellent moldability and sinterability, and can be molded with high strength by being firmly connected via a branch-like portion.
- the dendritic copper powder is larger than a predetermined size.
- the average particle diameter of the dendritic copper powder 1 is 5.0 ⁇ m to 30 ⁇ m, the surface area is increased, and good moldability and sinterability can be secured.
- the dendritic copper powder 1 which concerns on this Embodiment is dendritic since the trunk 2 and the branch 3 consist of flat copper particles in addition to being dendritic shape in this way. Due to this three-dimensional effect and the effect that the copper particles constituting the dendritic shape are flat, more contacts between the copper powders 1 can be secured.
- divided the cross-sectional average thickness of the flat copper particle mentioned above by the average particle diameter (D50) of the said dendritic copper powder 1. / Average particle diameter) is preferably in the range of 0.01 to 0.1.
- the ratio (aspect ratio) represented by “average cross-sectional thickness / average particle diameter” is, for example, the degree of aggregation and dispersibility when processed as a conductive copper paste, and the retention of appearance when coating copper paste It becomes an indicator such as.
- this aspect ratio is less than 0.01, it comes close to a copper powder made of spherical copper particles, and aggregation tends to occur, making it difficult to uniformly disperse the resin in the paste.
- the aspect ratio exceeds 0.1, the viscosity increases during paste formation, and the external shape retainability and surface smoothness during application of the copper paste may deteriorate.
- the bulk density of the dendritic copper powder 1 is not particularly limited, but is preferably in the range of 0.3 g / cm 3 to 5.0 g / cm 3 . If the bulk density is less than 0.3 g / cm 3 , there is a possibility that sufficient contact between the copper powders cannot be secured. On the other hand, when the bulk density exceeds 5.0 g / cm 3, an average particle diameter of the dendritic copper powder 1 also increases, there is the surface area becomes moldability and sintering property may deteriorate reduced.
- the dendritic copper powder 1 is not particularly limited, but it is preferable that the crystallite diameter belongs to a range of 800 to 2000 angstroms.
- the crystallite diameter is less than 800 mm, the copper particles constituting the main trunk 2 and the branch 3 tend to have a shape close to a spherical shape instead of a flat plate shape, and it becomes difficult to ensure a sufficiently large contact area. May be reduced.
- the crystallite diameter exceeds 2000 mm, the average particle diameter of the dendritic copper powder 1 also increases, the surface area decreases, and the moldability and sinterability may deteriorate.
- the crystallite diameter here is obtained from a diffraction pattern obtained by an X-ray diffraction measurement device based on Scherrer's calculation formula shown by the following formula (1), and is based on the (111) plane by X-ray diffraction. This is the crystallite diameter in the Miller index.
- D 0.9 ⁇ / ⁇ cos ⁇ Formula (1) (D: crystallite diameter ( ⁇ ), ⁇ : diffraction peak spread (rad) depending on crystallite size, ⁇ : X-ray wavelength [CuK ⁇ ] ( ⁇ ), ⁇ : diffraction angle (°). .)
- the dendritic copper powder having the shape as described above is occupied at a predetermined ratio in the obtained copper powder when observed with an electron microscope, copper powder having other shapes is mixed.
- the effect similar to the copper powder which consists only of the dendritic copper powder can be acquired.
- the dendritic copper powder having the shape described above is 50% by number or more, preferably 80% by number or more of the total copper powder, More preferably, as long as it occupies a ratio of 90% by number or more, copper powder of other shapes may be included.
- the dendritic copper powder 1 according to the present embodiment can be produced, for example, by a predetermined electrolytic method using a sulfuric acid acidic solution containing copper ions as an electrolytic solution.
- the above-described sulfuric acid-containing electrolytic solution containing copper ions is contained in an electrolytic cell in which metallic copper is used as an anode (anode) and a stainless plate or titanium plate is used as a cathode (cathode).
- the electrolytic solution is subjected to electrolytic treatment by applying a direct current at a predetermined current density.
- the dendritic copper powder 1 can be deposited (electrodeposited) on the cathode with energization.
- the fine copper particles 2 having a plate shape are obtained only by electrolysis without mechanically deforming the granular copper powder obtained by electrolysis using a medium such as a ball.
- the dendritic copper powder 1 aggregated to form a dendritic shape can be deposited on the cathode surface.
- the electrolytic solution for example, a solution containing a water-soluble copper salt, sulfuric acid, an additive such as an amine compound, and chloride ions can be used.
- the water-soluble copper salt is a copper ion source that supplies copper ions, and examples thereof include copper sulfate such as copper sulfate pentahydrate, copper chloride, and copper nitrate, but are not particularly limited.
- the copper ion concentration in the electrolytic solution can be about 1 g / L to 20 g / L, preferably about 5 g / L to 10 g / L.
- Sulfuric acid is for making sulfuric acid electrolyte.
- concentration of sulfuric acid in the electrolytic solution can be about 20 g / L to 300 g / L, preferably about 50 g / L to 150 g / L, as the free sulfuric acid concentration. Since the sulfuric acid concentration affects the conductivity of the electrolyte, it affects the uniformity of the copper powder obtained on the cathode.
- an amine compound can be used as the additive.
- the amine compound contributes to shape control of the copper powder deposited together with chloride ions described later, and the copper powder deposited on the cathode surface is composed of flat copper particles having a predetermined cross-sectional average thickness. And a dendritic copper powder having a branch branched from its main trunk.
- amine compound For example, a safranine etc. can be used.
- amine compound you may add individually by 1 type and may add it in combination of 2 or more types.
- the addition amount of the amine compounds is preferably such that the concentration in the electrolytic solution is in the range of about 0.1 mg / L to 500 mg / L.
- chloride ions compounds that supply chloride ions such as hydrochloric acid and sodium chloride (chloride ion source) can be added to the electrolyte solution.
- a chloride ion contributes to shape control of the copper powder to precipitate with additives, such as an amine compound mentioned above.
- the chloride ion concentration in the electrolytic solution can be about 30 mg / L to 1000 mg / L, preferably about 50 mg / L to 800 mg / L, more preferably about 100 mg / L to 300 mg / L.
- the copper powder is deposited and produced on the cathode by electrolysis using the electrolytic solution having the composition as described above.
- the electrolysis method a known method can be used.
- the order to electrolysis using an electrolytic solution of sulfuric acid acidity preferably in the range of 5A / dm 2 ⁇ 30A / dm 2 is energized while stirring the electrolytic solution.
- the liquid temperature (bath temperature) of the electrolytic solution can be, for example, about 20 ° C. to 60 ° C.
- the electrolysis time may be appropriately set according to the copper ion concentration of the electrolytic solution, and may be, for example, about 6 to 15 hours.
- the dendritic copper powder 1 is a dendritic copper powder having a main trunk that grows linearly and a plurality of branches branched from the main trunk. It consists of tabular copper particles having an average cross-sectional thickness of 0.2 ⁇ m to 1.0 ⁇ m, and the average particle diameter (D50) of the copper powder is 5.0 ⁇ m to 30 ⁇ m.
- the dendritic shape increases the surface area and makes it excellent in formability and sinterability, and its main trunk and branches are composed of predetermined flat copper particles. As a result, a large number of contacts can be ensured, and excellent conductivity is exhibited.
- the dendritic copper powder 1 having such a predetermined structure, even when it is a copper paste or the like, it is possible to suppress agglomeration and to uniformly disperse in the resin, In addition, it is possible to suppress the occurrence of poor printability due to an increase in the viscosity of the paste. Therefore, the dendritic copper powder 1 can be suitably used for applications such as conductive paste and conductive paint.
- the conductive paste (copper paste) is not limited to use under particularly limited conditions.
- the dendritic copper powder 1 according to the present embodiment is used as a metal filler, a binder resin, a solvent, and further necessary. Accordingly, it can be produced by kneading with an additive such as an antioxidant or a coupling agent.
- the dendritic copper powder 1 according to the present embodiment is used as a metal filler such as a conductive paste, it can be used by mixing with copper powder of other shapes. At this time, it is preferable that it is 20 mass% or more as a ratio of the dendritic copper powder 1 among copper powder whole quantity, It is more preferable that it is 50 mass% or more, It is further more preferable that it is 75 mass% or more.
- the copper powder of another shape is mixed with the dendritic copper powder 1 as a copper powder, and the copper powder of another shape is filled into the gap of the dendritic copper powder 1. As a result, more contacts for ensuring conductivity can be secured.
- the dendritic copper powder 1 is less than 20% by mass of the total amount of copper powder used as the metal filler, the contacts between the dendritic copper powders 1 are reduced, and the contact by mixing with copper powder of other shapes. Even if this increase is taken into account, the conductivity of the metal filler is lowered.
- the copper paste only needs to contain dendritic copper powder 1 in a proportion of 20% by mass or more, and other components such as spherical copper powder of about 1 ⁇ m to 10 ⁇ m are mixed. May be.
- the binder resin is not particularly limited, but an epoxy resin, a phenol resin, or the like can be used.
- organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, glycerol, and terpineol, can be used.
- the amount of the organic solvent added is not particularly limited, but the amount added is adjusted in consideration of the particle size of the dendritic copper powder 1 so as to have a viscosity suitable for a conductive film forming method such as screen printing or a dispenser. can do.
- resin components can be added to adjust the viscosity.
- a cellulose-based resin typified by ethyl cellulose can be used, which is added as an organic vehicle dissolved in an organic solvent such as terpineol.
- an antioxidant or the like can be added in order to improve the conductivity after firing.
- a hydroxycarboxylic acid etc. can be mentioned. More specifically, hydroxycarboxylic acids such as citric acid, malic acid, tartaric acid, and lactic acid are preferable, and citric acid or malic acid having a high adsorptive power to copper is particularly preferable.
- the addition amount of the antioxidant can be set to, for example, about 1 to 15% by mass in consideration of the antioxidant effect and the viscosity of the paste.
- the above-described metal filler is used as an electromagnetic wave shielding material, it is not limited to use under particularly limited conditions, and a general method, for example, using the metal filler mixed with a resin can be used. it can.
- a general method for example, mixing the metal filler with a resin and a solvent, and further adding an antioxidant, a thickener as necessary. It can be used as a conductive paint by mixing and kneading with an agent, an anti-settling agent and the like.
- the binder resin and solvent used at this time are not particularly limited, and those conventionally used can be used.
- vinyl chloride resin, vinyl acetate resin, acrylic resin, polyester resin, fluororesin, silicon resin, phenol resin, or the like can be used.
- the solvent conventionally used alcohols such as isopropanol, aromatic hydrocarbons such as toluene, esters such as methyl acetate, ketones such as methyl ethyl ketone, and the like can be used.
- the antioxidant conventionally used fatty acid amides, higher fatty acid amines, phenylenediamine derivatives, titanate coupling agents, and the like can be used.
- the resin used for forming the electromagnetic wave shielding layer of the conductive sheet for electromagnetic wave shielding is not particularly limited. Conventionally used ones can be used. For example, various polymers and copolymers such as vinyl chloride resin, vinyl acetate resin, vinylidene chloride resin, acrylic resin, polyurethane resin, polyester resin, olefin resin, chlorinated olefin resin, polyvinyl alcohol resin, alkyd resin, phenol resin, etc. A thermoplastic resin, a thermosetting resin, a radiation curable resin, and the like can be appropriately used.
- the method for producing the electromagnetic shielding material is not particularly limited.
- an electromagnetic shielding layer is formed by applying or printing a coating material in which a metal filler and a resin are dispersed or dissolved in a solvent on a substrate, and the surface is solidified. It can manufacture by drying to such an extent.
- a metal filler containing the dendritic silver-coated copper powder 1 according to the present embodiment can also be used.
- the average particle diameter (D50) of the obtained copper powder was measured using a laser diffraction / scattering particle size distribution analyzer (manufactured by Nikkiso Co., Ltd., HRA9320 X-100).
- the obtained copper powder was embedded in an epoxy resin to prepare a measurement sample, the sample was cut and polished, and observed with a scanning electron microscope to observe the cross section of the copper powder. First, 20 copper powders were observed, and the average thickness (cross-sectional average thickness) of the copper powder was determined. Next, the aspect ratio (average thickness / D50) was determined from the ratio between the average thickness value and the average particle size (D50) determined with a laser diffraction / scattering particle size distribution analyzer.
- the specific resistance value of the film was determined by measuring the sheet resistance value by a four-terminal method using a low resistivity meter (Loresta-GP MCP-T600, manufactured by Mitsubishi Chemical Corporation), and measuring the surface roughness shape measuring instrument (Tokyo Seimitsu ( The film thickness of the film was measured by SURFCO M130A), and the sheet resistance value was determined by dividing the film resistance by the film thickness.
- the electromagnetic shielding characteristics were evaluated by measuring the attenuation rate of the samples obtained in the examples and comparative examples using an electromagnetic wave having a frequency of 1 GHz. Specifically, the level in the case of Comparative Example 4 that does not use dendritic copper powder is set as “ ⁇ ”, and the level that is worse than the level of Comparative Example 4 is set as “X”. Was evaluated as “ ⁇ ”, and when it was excellent, “ ⁇ ”.
- Example 1 An electrolytic cell having a capacity of 100 L is charged with an electrolytic solution in the electrolytic cell using a titanium electrode plate having an electrode area of 200 mm ⁇ 200 mm as a cathode and a copper plate having an electrode area of 200 mm ⁇ 200 mm as an anode. Then, a direct current was passed through this to deposit copper powder on the cathode plate.
- an electrolytic solution having a composition with a copper ion concentration of 10 g / L and a sulfuric acid concentration of 100 g / L was used.
- Basic Red 2 manufactured by Kanto Chemical Co., Inc.
- a hydrochloric acid solution manufactured by Wako Pure Chemical Industries, Ltd. was added.
- the chloride ion (chlorine ion) concentration in the electrolyte solution was 30 mg / L.
- the temperature is maintained at 25 ° C. so that the current density of the cathode becomes 25 A / dm 2. Current was applied to deposit copper powder on the cathode plate.
- the electrolytic copper powder deposited on the cathode plate was recovered by mechanically scraping it off the bottom of the electrolytic cell using a scraper, and the recovered copper powder was washed with pure water and then put in a vacuum dryer and dried. .
- the deposited copper powder is a two-dimensional or three-dimensional dendritic copper powder, It was a copper powder having a dendritic shape having a main trunk that has been grown, a plurality of branches that are linearly branched from the main trunk, and a branch that is further branched from the branch. Further, the copper particles constituting the main trunk and the branches had a flat plate shape having a cross-sectional thickness (average cross-sectional thickness) of 0.42 ⁇ m. Moreover, the average particle diameter (D50) of the dendritic copper powder was 25.1 ⁇ m.
- the aspect ratio computed from the cross-sectional average thickness of the copper particle and the average particle diameter of dendritic copper powder was 0.016.
- the crystallite diameter of the dendritic copper powder was 1752 mm.
- the bulk density of the obtained copper powder was 0.43 g / cm 3.
- Example 2 An electrolytic solution having a copper ion concentration of 5 g / L and a sulfuric acid concentration of 100 g / L is used, and the basic red 2 as an additive is added to the electrolytic solution to a concentration of 100 mg / L in the electrolytic solution. Copper powder was deposited on the cathode plate under the same conditions as in Example 1 except that the hydrochloric acid solution was further added so that the chlorine ion concentration in the electrolytic solution was 50 mg / L.
- the deposited copper powder is a two-dimensional or three-dimensional dendritic copper powder, It was a copper powder having a dendritic shape having a main trunk that has been grown, a plurality of branches that are linearly branched from the main trunk, and a branch that is further branched from the branch. Further, the copper particles constituting the main trunk and the branches had a flat plate shape having a cross-sectional thickness (average cross-sectional thickness) of 0.38 ⁇ m. Moreover, the average particle diameter (D50) of the dendritic copper powder was 8.5 ⁇ m.
- the aspect ratio computed from the cross-sectional average thickness of the copper particle and the average particle diameter of dendritic copper powder was 0.045.
- the crystallite diameter of the dendritic copper powder was 922 mm.
- the bulk density of the obtained copper powder was 0.76 g / cm 3 .
- Example 3 An electrolytic solution having a copper ion concentration of 5 g / L and a sulfuric acid concentration of 100 g / L is used, and the basic red 2 as an additive is added to the electrolytic solution to a concentration of 150 mg / L in the electrolytic solution. Copper powder was deposited on the cathode plate under the same conditions as in Example 1 except that the hydrochloric acid solution was further added so that the chlorine ion concentration in the electrolyte was 75 mg / L.
- the deposited copper powder is a two-dimensional or three-dimensional dendritic copper powder, It was a copper powder having a dendritic shape having a main trunk that has been grown, a plurality of branches that are linearly branched from the main trunk, and a branch that is further branched from the branch. Further, the copper particles constituting the main trunk and the branches had a flat plate shape with a cross-sectional thickness (average cross-sectional thickness) of 0.88 ⁇ m. Moreover, the average particle diameter (D50) of the dendritic copper powder was 15.5 ⁇ m.
- the aspect ratio computed from the cross-sectional average thickness of the copper particle and the average particle diameter of dendritic copper powder was 0.057.
- the crystallite diameter of the dendritic copper powder was 1272 mm.
- the bulk density of the obtained copper powder was 0.58 g / cm 3 .
- FIG. 5 is an SEM observation image of the copper powder obtained in Comparative Example 1. Moreover, it was confirmed that the obtained copper powder is a very large dendritic copper powder having an average particle diameter (D50) of 40 ⁇ m or more. The crystallite diameter of the copper particles was 628 mm. The bulk density of the obtained copper powder was 1.42 g / cm 3.
- the temperature is maintained at 45 ° C. so that the current density of the cathode becomes 20 A / dm 2.
- Current was applied to deposit copper powder on the cathode plate.
- the electrolytic copper powder was prepared in the same manner as in Example 1 except for these conditions.
- FIG. 6 shows the result of observing the shape of the obtained electrolytic copper powder by the method using the scanning electron microscope (SEM) described above.
- the deposited copper powder was a two-dimensional or three-dimensional dendritic copper powder.
- the dendritic main trunks and branches are rounded, and it was not a flat plate composed of one or a plurality of laminated structures, like the copper powder obtained in the examples.
- Table 1 summarizes the results of evaluating the dendritic copper powder obtained in the above-described Examples and Comparative Examples.
- the case where the main trunk and the branch extending from the main trunk were dendritic copper powder composed of tabular copper particles was set as “O”, and the dendritic shape composed of tabular copper particles When it was not copper powder, it was set as "x".
- Example 4 To 70 parts by mass of the electrolytic copper powder obtained in Example 1, 15 parts by mass of a phenol resin (manufactured by Gunei Chemical Co., Ltd., PL-2211) and 10 parts by mass of butyl cellosolve (manufactured by Kanto Chemical Co., Ltd., deer special grade) Using a small kneader (Nippon Seiki Seisakusho, non-bubbling kneader NBK-1), the mixture was kneaded at 1200 rpm for 3 minutes three times to form a paste. During pasting, the copper powder was uniformly dispersed in the resin without agglomeration. The obtained copper paste was printed on a glass with a metal squeegee and cured at 150 ° C. and 200 ° C. for 30 minutes in an air atmosphere.
- a phenol resin manufactured by Gunei Chemical Co., Ltd., PL-2211
- butyl cellosolve manufactured by Kanto Chemical Co., Ltd
- Example 5 70 parts by mass of the electrolytic copper powder obtained in Example 2 was added 15 parts by mass of phenol resin (manufactured by Gunei Chemical Co., Ltd., PL-2211) and 10 parts by mass of butyl cellosolve (manufactured by Kanto Chemical Co., Ltd., deer special grade). Using a small kneader (Nippon Seiki Seisakusho, non-bubbling kneader NBK-1), the mixture was kneaded at 1200 rpm for 3 minutes three times to form a paste. During pasting, the copper powder was uniformly dispersed in the resin without agglomeration. The obtained conductive paste was printed on a glass with a metal squeegee and cured at 150 ° C. and 200 ° C. for 30 minutes in an air atmosphere.
- phenol resin manufactured by Gunei Chemical Co., Ltd., PL-2211
- butyl cellosolve manufactured by Kanto Chemical Co., Ltd.,
- the flat copper powder was prepared by adding 5 g of stearic acid to 500 g of granular atomized copper powder (manufactured by Mekin Metal Powders) having an average particle diameter of 7.9 ⁇ m, and performing a flattening treatment with a ball mill.
- the ball mill was flattened by charging 5 kg of 3 mm zirconia beads and rotating for 90 minutes at a rotation speed of 500 rpm.
- the plate-like copper powder thus produced was measured with a laser diffraction / scattering particle size distribution measuring instrument. As a result, the average particle diameter was 20.1 ⁇ m, and as a result of observation with a scanning electron microscope, the thickness was 0.00. It was 4 ⁇ m.
- Example 4 the obtained flat copper powder was mixed with 70 parts by mass of the flat copper powder, 15 parts by mass of phenol resin (manufactured by Gunei Chemical Co., Ltd., PL-2211), butyl cellosolve (Kanto). Paste by mixing 10 parts by mass of Chemical Co., Ltd. (Deer Special Grade) and repeating kneading at 1200 rpm for 3 minutes three times using a small kneader (Nippon Seiki Seisakusho, non-bubbling kneader NBK-1). did.
- the obtained copper paste was printed on a glass with a metal squeegee and cured at 150 ° C. and 200 ° C. for 30 minutes in an air atmosphere.
- the specific resistance value of the film obtained by curing As a result of measuring the specific resistance value of the film obtained by curing, it was 2.1 ⁇ 10 ⁇ 4 ⁇ ⁇ cm (curing temperature 150 ° C.) and 5.6 ⁇ 10 ⁇ 5 ⁇ ⁇ cm (curing temperature 200 ° C.), respectively. Yes, the specific resistance value was high and the conductivity was inferior compared to the copper pastes obtained in Examples 4 and 5.
- Example 6 The dendritic copper powder prepared in Example 1 was dispersed in a resin to obtain an electromagnetic wave shielding material.
- Example 2 100 g of vinyl chloride resin and 200 g of methyl ethyl ketone were mixed with 40 g of the dendritic copper powder obtained in Example 1, and kneading at 1200 rpm for 3 minutes was repeated three times using a small kneader. To make a paste. During pasting, the copper powder was uniformly dispersed in the resin without agglomeration. This was coated and dried on a base material made of a transparent polyethylene terephthalate sheet having a thickness of 100 ⁇ m using a Mayer bar to form an electromagnetic wave shielding layer having a thickness of 25 ⁇ m.
- the electromagnetic shielding characteristics were evaluated by measuring the attenuation rate using an electromagnetic wave having a frequency of 1 GHz.
- Table 2 shows the results of the characteristic evaluation.
- Example 7 The dendritic copper powder produced in Example 2 was dispersed in a resin to obtain an electromagnetic wave shielding material.
- Example 2 100 g of vinyl chloride resin and 200 g of methyl ethyl ketone were mixed with 40 g of the dendritic copper powder obtained in Example 2, and kneading at 1200 rpm for 3 minutes was repeated three times using a small kneader. To make a paste. During pasting, the copper powder was uniformly dispersed in the resin without agglomeration. This was coated and dried on a base material made of a transparent polyethylene terephthalate sheet having a thickness of 100 ⁇ m using a Mayer bar to form an electromagnetic wave shielding layer having a thickness of 25 ⁇ m.
- the electromagnetic shielding characteristics were evaluated by measuring the attenuation rate using an electromagnetic wave having a frequency of 1 GHz.
- Table 2 shows the results of the characteristic evaluation.
- the electromagnetic shielding characteristics were evaluated by measuring the attenuation rate using an electromagnetic wave having a frequency of 1 GHz.
- Table 2 shows the results of the characteristic evaluation.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Powder Metallurgy (AREA)
- Conductive Materials (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Electrolytic Production Of Metals (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
図1は、本実施の形態に係る銅粉の具体的な形状を示した模式図である。この図1の模式図に示すように、本実施の形態に係る銅粉1は、2次元又は3次元の形態である樹枝状の形状をもつ銅粉(以下、本実施の形態に係る銅粉を「樹枝状銅粉」ともいう)である。より具体的に、樹枝状銅粉1は、直線的に成長した主幹2と、その主幹から直線的に分かれた複数の枝3とを有する樹枝状の銅粉であり、その主幹2及び主幹2から分岐した枝3を構成する銅粒子が、断面平均厚さが0.2μm~1.0μmの平板の形状を有している。また、このような平板状の銅粒子から構成される樹枝状銅粉1の平均粒子径(D50)が5.0μm~30μmである。なお、この樹枝状銅粉1における枝3は、主幹2から分岐した枝3aと、その枝3aからさらに分岐した枝3bの両方を意味する。
D=0.9λ/βcosθ ・・・式(1)
(なお、D:結晶子径(Å)、β:結晶子の大きさによる回折ピークの拡がり(rad)、λ:X線の波長[CuKα](Å)、θ:回折角(°)である。)
本実施の形態に係る樹枝状銅粉1は、例えば、銅イオンを含有する硫酸酸性溶液を電解液として用いて所定の電解法により製造することができる。
本実施の形態に係る樹枝状銅粉1は、上述したように、直線的に成長した主幹と、その主幹から分岐した複数の枝を有する樹枝状の銅粉であり、その主幹及び枝は、断面平均厚さが0.2μm~1.0μmの平板状の銅粒子からなり、当該銅粉の平均粒子径(D50)が5.0μm~30μmである。このような樹枝状銅粉1では、樹枝状の形状であることにより表面積が大きくなり、成形性や焼結性に優れたものとなり、またその主幹及び枝が所定の平板状の銅粒子から構成されていることにより、接点の数を多く確保することができ、優れた導電性を発揮する。
下記実施例及び比較例にて得られた銅粉について、以下の方法により、形状の観察、平均粒子径の測定、結晶子径の測定を行った。
走査型電子顕微鏡(日本電子(株)製,JSM-7100F型)により、倍率1,000倍の視野で任意に20視野を観察し、その視野内に含まれる銅粉を観察した。
得られた銅粉の平均粒子径(D50)は、レーザー回折・散乱法粒度分布測定器(日機装(株)製,HRA9320 X-100)を用いて測定した。
X線回折測定装置(PAN analytical社製,X‘Pert PRO)により得られた回折パターンから、一般にScherrerの式として知られる公知の方法を用いて算出した。
得られた銅粉をエポキシ樹脂に埋め込んで測定試料を作製し、その試料に対して切断・研磨を行い、走査型電子顕微鏡で観察することによって銅粉の断面を観察した。先ず、銅粉を20個観察して、その銅粉の平均厚さ(断面平均厚さ)を求めた。次に、その平均厚さの値とレーザー回折・散乱法粒度分布測定器で求めた平均粒子径(D50)との比から、アスペクト比(平均厚さ/D50)を求めた。
被膜の比抵抗値は、低抵抗率計(三菱化学(株)製、Loresta-GP MCP-T600)を用いて四端子法によりシート抵抗値を測定し、表面粗さ形状測定器(東京精密(株)製、SURFCO M130A)により被膜の膜厚を測定して、シート抵抗値を膜厚で除することによって求めた。
電磁波シールド特性の評価は、各実施例及び比較例にて得られた試料について、周波数1GHzの電磁波を用いて、その減衰率を測定して評価した。具体的には、樹枝状銅粉を使用していない比較例4の場合のレベルを『△』として、その比較例4のレベルよりも悪い場合を『×』とし、その比較例4のレベルよりも良好な場合を『○』とし、さらに優れている場合を『◎』として評価した。
[実施例1]
容量が100Lの電解槽に、電極面積が200mm×200mmのチタン製の電極板を陰極として、電極面積が200mm×200mmの銅製の板を陽極として用いて、その電解槽中に電解液を装入し、これに直流電流を通電して銅粉を陰極板に析出させた。
電解液として、銅イオン濃度が5g/L、硫酸濃度が100g/Lの組成のものを用い、その電解液に、添加剤としてベーシックレッド2を電解液中の濃度として100mg/Lとなるように添加し、さらに塩酸溶液を電解液中の塩素イオン濃度として50mg/Lとなるように添加したこと以外は、実施例1と同じ条件で銅粉を陰極板上に析出させた。
電解液として、銅イオン濃度が5g/L、硫酸濃度が100g/Lの組成のものを用い、その電解液に、添加剤としてベーシックレッド2を電解液中の濃度として150mg/Lとなるように添加し、さらに塩酸溶液を電解液中の塩素イオン濃度として75mg/Lとなるように添加したこと以外は、実施例1と同じ条件で銅粉を陰極板上に析出させた。
電解液に、添加剤としてのベーシックレッド2と、塩素イオンとを添加しない条件としたこと以外は、実施例1と同じ条件で銅粉を陰極板上に析出させた。
電解液として、銅イオン濃度が10g/L、硫酸濃度が150g/Lの組成のものを用いた。また、この電解液に、ベーシックレッド2(関東化学(株)製)を電解液中の濃度として50mg/Lとなるように添加し、さらに塩酸溶液(和光純薬工業株式会社製)を電解液中の塩化物イオン(塩素イオン)濃度として10mg/Lとなるように添加した。そして、上述したような濃度に調整した電解液を、定量ポンプを用いて15L/minの流量で循環しながら、温度を45℃に維持し、陰極の電流密度が20A/dm2になるように通電して陰極板上に銅粉を析出させた。なお、これら以外の条件は、実施例1と同様にして電解銅粉を作製した。
[実施例4]
実施例1で得られた電解銅粉70質量部に、フェノール樹脂(群栄化学(株)製、PL-2211)15質量部、ブチルセロソルブ(関東化学(株)製、鹿特級)10質量部を混合し、小型ニーダー(日本精機製作所製、ノンバブリングニーダーNBK-1)を用いて、1200rpm、3分間の混錬を3回繰り返すことでペースト化した。ペースト化に際しては、銅粉が凝集することなく、樹脂中に均一に分散した。得られた銅ペーストを金属スキージでガラス上に印刷し、大気雰囲気中にて150℃、200℃でそれぞれ30分間硬化させた。
実施例2で得られた電解銅粉70質量部に、フェノール樹脂(群栄化学(株)製、PL-2211)15質量部、ブチルセロソルブ(関東化学(株)製、鹿特級)10質量部を混合し、小型ニーダー(日本精機製作所製、ノンバブリングニーダーNBK-1)を用いて、1200rpm、3分間の混錬を3回繰り返すことでペースト化した。ペースト化に際しては、銅粉が凝集することなく、樹脂中に均一に分散した。得られた導電ペーストを金属スキージでガラス上に印刷し、大気雰囲気中にて150℃、200℃でそれぞれ30分間硬化させた。
従来の平板状銅粉との比較を行うため、粒状の電解銅粉を機械的に扁平化させて作製した平板状銅粉との比較を行った。具体的に、その平板状銅粉の作製は、平均粒子径7.9μmの粒状アトマイズ銅粉(メイキンメタルパウダーズ社製)500gにステアリン酸5gを添加し、ボールミルで扁平化処理を行った。ボールミルには3mmのジルコニアビーズを5kg投入し、500rpmの回転速度で90分間回転させることで扁平化処理を行った。このようにして作製した平板状銅粉について、レーザー回折・散乱法粒度分布測定器で測定した結果、平均粒子径が20.1μmであり、走査型電子顕微鏡で観察した結果、厚さは0.4μmであった。
[実施例6]
実施例1で作製した樹枝状銅粉を樹脂に分散して電磁波シールド材とした。
実施例2で作製した樹枝状銅粉を樹脂に分散して電磁波シールド材とした。
比較例3で作製した、粒状の電解銅粉を機械的に扁平化させた平板状銅粉を樹脂に分散して電磁波シールド材とした。
2 主幹
3,3a,3b 枝
Claims (7)
- 直線的に成長した主幹と該主幹から分かれた複数の枝とを有する樹枝状の形状をなし、
前記主幹及び前記枝は、断面平均厚さが0.2μm~1.0μmの平板状の銅粒子からなり、
当該銅粉の平均粒子径(D50)が5.0μm~30μmである
ことを特徴とする銅粉。 - 前記平板状の銅粒子の断面平均厚さを、当該銅粉の平均粒子径(D50)で除した比が0.01~0.1の範囲であり、且つ、当該銅粉の嵩密度が0.3g/cm3~5.0g/cm3の範囲であることを特徴とする請求項1に記載の銅粉。
- X線回折による(111)面のミラー指数における結晶子径が800Å~2000Åの範囲に属することを特徴とする請求項1又は2に記載の銅粉。
- 請求項1乃至3の何れかに記載の銅粉を、全体の20質量%以上の割合で含有することを特徴とする金属フィラー。
- 請求項4に記載の金属フィラーを樹脂に混合させてなることを特徴とする銅ペースト。
- 請求項4に記載の金属フィラーを用いてなることを特徴とする電磁波シールド用導電性塗料。
- 請求項4に記載の金属フィラーを用いてなることを特徴とする電磁波シールド用導電性シート。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/320,333 US20170152386A1 (en) | 2014-06-25 | 2015-03-26 | Copper powder, and copper paste, electrically conductive coating material and electrically conductive sheet each produced using said copper powder |
| EP15812645.8A EP3162466A4 (en) | 2014-06-25 | 2015-03-26 | Copper powder, and copper paste, electrically conductive coating material and electrically conductive sheet each produced using said copper powder |
| JP2015516330A JP5858201B1 (ja) | 2014-06-25 | 2015-03-26 | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート |
| KR1020167034133A KR20170003634A (ko) | 2014-06-25 | 2015-03-26 | 동분 및 그것을 이용한 동페이스트, 도전성 도료, 도전성 시트 |
| CN201580032790.4A CN106457386A (zh) | 2014-06-25 | 2015-03-26 | 铜粉及使用其的铜膏、导电性涂料、导电性片材 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014130456 | 2014-06-25 | ||
| JP2014-130456 | 2014-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2015198671A1 true WO2015198671A1 (ja) | 2015-12-30 |
Family
ID=54937772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2015/059483 Ceased WO2015198671A1 (ja) | 2014-06-25 | 2015-03-26 | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20170152386A1 (ja) |
| EP (1) | EP3162466A4 (ja) |
| JP (1) | JP5858201B1 (ja) |
| KR (1) | KR20170003634A (ja) |
| CN (1) | CN106457386A (ja) |
| WO (1) | WO2015198671A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018030089A (ja) * | 2016-08-24 | 2018-03-01 | 住友金属鉱山株式会社 | サフラニンを含有する廃液の処理方法 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5920540B1 (ja) * | 2015-03-26 | 2016-05-18 | 住友金属鉱山株式会社 | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート |
| JP5907301B1 (ja) | 2015-05-15 | 2016-04-26 | 住友金属鉱山株式会社 | 銀コート銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート、並びに銀コート銅粉の製造方法 |
| JP5907302B1 (ja) * | 2015-05-15 | 2016-04-26 | 住友金属鉱山株式会社 | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート、並びに銅粉の製造方法 |
| WO2019093121A1 (ja) * | 2017-11-13 | 2019-05-16 | 京セラ株式会社 | ペースト組成物、半導体装置及び電気・電子部品 |
| RU2691474C1 (ru) * | 2018-08-15 | 2019-06-14 | Марина Владимировна Пузанова | Медный порошок для очистки технического тетрахлорида титана от примеси окситрихлорида ванадия |
| CN109926577B (zh) * | 2019-05-05 | 2020-11-17 | 深圳第三代半导体研究院 | 一种可低温而高密度烧结的铜膏 |
| JP6704083B1 (ja) * | 2019-11-22 | 2020-06-03 | 東邦チタニウム株式会社 | 銅粉体とその製造方法 |
| US20220340794A1 (en) * | 2020-01-17 | 2022-10-27 | Soltrium Advanced Materials Technology, Ltd Shenzhen | Modified epoxy acrylate resin conductive adhesive and preparation method and application thereof |
| WO2021142752A1 (zh) * | 2020-01-17 | 2021-07-22 | 深圳市首骋新材料科技有限公司 | 一种有机硅树脂导电胶及其制备方法和应用 |
| KR102470033B1 (ko) * | 2020-12-21 | 2022-11-23 | 한국전자기술연구원 | 덴드라이트형 금속입자를 포함하는 소자실장소결접합재 및 반도체 소자 패키지 |
| CN115188589B (zh) * | 2021-04-02 | 2023-08-01 | 北京元六鸿远电子科技股份有限公司 | 一种mlcc可印刷用铜外电极浆料 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011214032A (ja) * | 2010-03-31 | 2011-10-27 | Jx Nippon Mining & Metals Corp | ブレーキパッド用銅粉 |
| JP2013053347A (ja) * | 2011-09-05 | 2013-03-21 | Mitsui Mining & Smelting Co Ltd | デンドライト状銅粉 |
| JP2013100592A (ja) * | 2011-10-21 | 2013-05-23 | Mitsui Mining & Smelting Co Ltd | 銀被覆銅粉 |
| JP5503813B1 (ja) * | 2012-08-02 | 2014-05-28 | 三井金属鉱業株式会社 | 導電性フィルム |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002015622A (ja) | 2000-06-30 | 2002-01-18 | Fukuda Metal Foil & Powder Co Ltd | 導電ペースト用銅粉末及びその製造方法 |
| JP4296347B2 (ja) * | 2004-01-19 | 2009-07-15 | Dowaエレクトロニクス株式会社 | フレーク状銅粉およびその製造法 |
| JP4697643B2 (ja) | 2009-09-07 | 2011-06-08 | 福田金属箔粉工業株式会社 | 電解銅粉の集合体及び該電解銅粉の製造方法 |
| JP5320442B2 (ja) * | 2011-07-13 | 2013-10-23 | 三井金属鉱業株式会社 | デンドライト状銅粉 |
| JP2013136818A (ja) * | 2011-12-28 | 2013-07-11 | Mitsui Mining & Smelting Co Ltd | 銅粉 |
| JP2013144829A (ja) * | 2012-01-13 | 2013-07-25 | Sumitomo Electric Ind Ltd | 樹枝状金属粉、樹枝状金属粉を含む導電ペースト、電磁波シールド材、放熱材、および樹枝状金属粉の製造方法 |
| JP2014019877A (ja) * | 2012-07-12 | 2014-02-03 | Furukawa Electric Co Ltd:The | 銅微粒子の製造方法 |
-
2015
- 2015-03-26 US US15/320,333 patent/US20170152386A1/en not_active Abandoned
- 2015-03-26 KR KR1020167034133A patent/KR20170003634A/ko not_active Ceased
- 2015-03-26 JP JP2015516330A patent/JP5858201B1/ja not_active Expired - Fee Related
- 2015-03-26 EP EP15812645.8A patent/EP3162466A4/en not_active Withdrawn
- 2015-03-26 WO PCT/JP2015/059483 patent/WO2015198671A1/ja not_active Ceased
- 2015-03-26 CN CN201580032790.4A patent/CN106457386A/zh active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011214032A (ja) * | 2010-03-31 | 2011-10-27 | Jx Nippon Mining & Metals Corp | ブレーキパッド用銅粉 |
| JP2013053347A (ja) * | 2011-09-05 | 2013-03-21 | Mitsui Mining & Smelting Co Ltd | デンドライト状銅粉 |
| JP2013100592A (ja) * | 2011-10-21 | 2013-05-23 | Mitsui Mining & Smelting Co Ltd | 銀被覆銅粉 |
| JP5503813B1 (ja) * | 2012-08-02 | 2014-05-28 | 三井金属鉱業株式会社 | 導電性フィルム |
Non-Patent Citations (1)
| Title |
|---|
| See also references of EP3162466A4 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018030089A (ja) * | 2016-08-24 | 2018-03-01 | 住友金属鉱山株式会社 | サフラニンを含有する廃液の処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106457386A (zh) | 2017-02-22 |
| KR20170003634A (ko) | 2017-01-09 |
| EP3162466A1 (en) | 2017-05-03 |
| JP5858201B1 (ja) | 2016-02-10 |
| US20170152386A1 (en) | 2017-06-01 |
| JPWO2015198671A1 (ja) | 2017-04-20 |
| EP3162466A4 (en) | 2018-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5858201B1 (ja) | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート | |
| JP5920540B1 (ja) | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート | |
| JP5920541B1 (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| WO2016038914A1 (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| WO2016031286A1 (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP5907302B1 (ja) | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート、並びに銅粉の製造方法 | |
| JP2017071819A (ja) | 銀粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP5858200B1 (ja) | 銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート、帯電防止塗料 | |
| JP6274076B2 (ja) | 銅粉及びそれを用いた銅ペースト、導電性塗料、導電性シート | |
| JP2016008333A (ja) | 銅粉及びそれを用いた銅ペースト | |
| JP5790900B1 (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP6332125B2 (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP6332124B2 (ja) | 銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP6332058B2 (ja) | 銅粉、及びそれを用いた銅ペースト、導電性塗料、導電性シート | |
| JP6350475B2 (ja) | 銅粉の製造方法、及びそれを用いた導電性ペーストの製造方法 | |
| JP2016060966A (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート | |
| JP2016138301A (ja) | 樹枝状銅粉の製造方法、及びそれを用いた導電性銅ペースト、導電性塗料、導電性シート | |
| TWI541305B (zh) | Copper powder and the use of its copper paste, conductive paint, conductive film | |
| JP5994897B1 (ja) | 樹枝状銅粉の製造方法、及びその樹枝状銅粉を用いた銅ペースト、導電性塗料、導電性シート | |
| JP2016094658A (ja) | 銀コート銅粉及びそれを用いた導電性ペースト、導電性塗料、導電性シート |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ENP | Entry into the national phase |
Ref document number: 2015516330 Country of ref document: JP Kind code of ref document: A |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15812645 Country of ref document: EP Kind code of ref document: A1 |
|
| ENP | Entry into the national phase |
Ref document number: 20167034133 Country of ref document: KR Kind code of ref document: A |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 15320333 Country of ref document: US |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| REEP | Request for entry into the european phase |
Ref document number: 2015812645 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2015812645 Country of ref document: EP |