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WO2015030013A1 - Verre non alcalin - Google Patents

Verre non alcalin Download PDF

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Publication number
WO2015030013A1
WO2015030013A1 PCT/JP2014/072337 JP2014072337W WO2015030013A1 WO 2015030013 A1 WO2015030013 A1 WO 2015030013A1 JP 2014072337 W JP2014072337 W JP 2014072337W WO 2015030013 A1 WO2015030013 A1 WO 2015030013A1
Authority
WO
WIPO (PCT)
Prior art keywords
less
glass
temperature
alkali
cao
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2014/072337
Other languages
English (en)
Japanese (ja)
Inventor
直和 真崎
和孝 小野
博文 ▲徳▼永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to CN201480047349.9A priority Critical patent/CN105492402A/zh
Priority to KR1020167004769A priority patent/KR20160048081A/ko
Publication of WO2015030013A1 publication Critical patent/WO2015030013A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties

Definitions

  • the present invention relates to a non-alkali glass which is suitable for various display substrate glasses and photomask substrate glasses and which is substantially free of alkali metal oxides and can be float-molded.
  • the following characteristics have been required for various display substrate glasses, particularly those in which a metal or oxide thin film is formed on the surface.
  • alkali metal oxide When an alkali metal oxide is contained, alkali metal ions diffuse into the thin film and deteriorate the film characteristics, so that the alkali metal ions are not substantially contained.
  • the strain point When exposed to a high temperature in the thin film forming process, the strain point is high so that the deformation (thermal shrinkage) associated with glass deformation and glass structural stabilization can be minimized.
  • BHF buffered hydrofluoric acid
  • ITO various acids used for etching metal electrodes
  • ITO various acids used for etching metal electrodes
  • resistant to alkali of resist stripping solution Resistant to alkali of resist stripping solution.
  • a-Si amorphous silicon
  • p-Si polycrystalline silicon
  • a glass having a small average thermal expansion coefficient is required to increase productivity and thermal shock resistance by increasing the temperature raising / lowering rate of the heat treatment for producing a liquid crystal display.
  • Patent Document 1 discloses a glass containing 0 to 3% by weight of B 2 O 3 , but the strain point of Examples is 690 ° C. or lower.
  • Patent Document 2 discloses a glass containing 0 to 5 mol% of B 2 O 3 , but the average coefficient of thermal expansion at 50 to 350 ° C. exceeds 50 ⁇ 10 ⁇ 7 / ° C.
  • an alkali-free glass described in Patent Document 3 has been proposed.
  • the alkali-free glass described in Patent Document 3 has a high strain point, can be molded by a float process, and is suitable for uses such as a display substrate and a photomask substrate.
  • the glass viscosity especially the temperature T 4 at which the glass viscosity becomes 10 4 dPa ⁇ s and the devitrification temperature should be lowered, and the strain point should not be raised excessively. Is required.
  • the object of the present invention is to solve the above-mentioned drawbacks, have a high strain point and a high Young's modulus, but have a low temperature T 2 at which the glass viscosity becomes 10 2 dPa ⁇ s and can be easily dissolved, and the glass viscosity is 10
  • An object of the present invention is to provide a non-alkali glass that has a low temperature T 4 of 4 dPa ⁇ s and is easy to float, and that can keep the thermal expansion coefficient and specific gravity relatively low.
  • the present invention has a strain point of 680 ° C. or higher, an average coefficient of thermal expansion at 50 to 350 ° C. of 30 ⁇ 10 ⁇ 7 to 45 ⁇ 10 ⁇ 7 / ° C., and a glass viscosity of 10 2 dPa ⁇ s.
  • the temperature T 2 is 1730 ° C. or less
  • the temperature T 4 is 1350 ° C. or less
  • the glass viscosity is 10 4 dPa ⁇ s
  • the Young's modulus is 80 GPa or more, and is expressed in mass% based on oxide.
  • the present invention has a strain point of 690 ° C. or higher, an average coefficient of thermal expansion at 50 to 350 ° C. of 30 ⁇ 10 ⁇ 7 to 43 ⁇ 10 ⁇ 7 / ° C., and a glass viscosity of 10 2.
  • the temperature T 2 at which dPa ⁇ s is reached is 1710 ° C.
  • the temperature T 4 at which the glass viscosity is 10 4 dPa ⁇ s is 1330 ° C. or lower, the Young's modulus is 80 GPa or higher, SiO 2 57-65 by mass% display, Al 2 O 3 18-23, B 2 O 3 0-5, MgO more than 1 and less than 8, CaO 6-12, SrO 0 or more and less than 2,
  • the alkali-free glass of the present invention is particularly suitable for display substrates for high strain points, photomask substrates, and the like, and is glass that is easy to float.
  • the alkali-free glass of the present invention can also be used as a glass substrate for a magnetic disk.
  • the composition range of each component (mass% based on oxides, hereinafter the same unless otherwise specified) will be described. If the SiO 2 content is less than 55%, the strain point is not sufficiently increased, the thermal expansion coefficient is increased, and the density is increased. It is preferably 57% or more, more preferably 58% or more, more preferably 59% or more, and further preferably 60% or more. In 70%, solubility decreases, and increases the temperature T 4 which is a temperature T 2 and 10 4 dPa ⁇ s glass viscosity of 10 2 dPa ⁇ s, since the devitrification temperature increases, 70% or less It is. It is preferably 67% or less, more preferably 65% or less, further preferably 64% or less, and more preferably 63% or less.
  • Al 2 O 3 suppresses the phase separation of the glass, lowers the thermal expansion coefficient and raises the strain point. However, if it is less than 10%, this effect does not appear, and other components that increase the expansion increase. As a result, thermal expansion increases. For this reason, it is 10% or more. It is preferably 14% or more, more preferably 16% or more, further preferably 18% or more, further preferably 18.5% or more, and more preferably 19% or more. If it exceeds 25%, the solubility of the glass may be deteriorated or the devitrification temperature may be increased, so it is 25% or less. It is preferably 24% or less, more preferably 23% or less, further preferably 22% or less, and more preferably 21% or less.
  • B 2 O 3 can be contained to improve the melting reactivity of the glass, lower the devitrification temperature, and improve the BHF resistance.
  • 0.1% or more is preferable, 0.3% or more is more preferable, 0.5% or more is further more preferable, and 1% or more is especially preferable.
  • it exceeds 5% the strain point becomes low and the Young's modulus becomes small, so it is 5% or less. It is preferably 4% or less, more preferably 3.5% or less, more preferably 3% or less, and even more preferably 2.5% or less.
  • MgO has the characteristics of increasing the Young's modulus while keeping the density low and does not increase expansion in alkaline earths, and improves the solubility, but this effect does not appear sufficiently at 1% or less, Moreover, since the density becomes high because the ratio of other alkaline earths becomes high, it exceeds 1%. It is preferably 2% or more, more preferably 3% or more, further preferably 4% or more, still more preferably 4.5% or more, and particularly preferably 5% or more. Since devitrification temperature rises at 8% or more, it is preferably 7.5% or less, more preferably 7% or less, and even more preferably 6.5% or less, which is less than 8%.
  • CaO has the characteristics of increasing the Young's modulus while maintaining the low density without increasing the expansion in alkaline earth following MgO, and also improves the solubility. If it is less than 6%, the above-described effect due to the addition of CaO is not sufficiently exhibited, so it is 6% or more. It is preferably 7% or more, more preferably 7.5% or more, and further preferably 8% or more. However, if it exceeds 12%, the devitrification temperature rises or phosphorus, which is an impurity in limestone (CaCO 3 ) as a CaO raw material, may be mixed in a large amount, so the content is made 12% or less. 11% or less is preferable, 10.5% or less is more preferable, and 10% or less is more preferable.
  • SrO can be contained to improve the solubility without increasing the devitrification temperature of the glass. However, if it is 2% or more, the expansion coefficient may increase, so it is less than 2%. It is preferably 1.5% or less, more preferably 1% or less, still more preferably 0.7% or less, and particularly preferably less than 0.5%.
  • BaO can be included to improve solubility. 1% or more is preferable, 1.5% or more is more preferable, and 2% or more is more preferable. However, if it is too much, the expansion and density of the glass are excessively increased, so the content is made less than 5%. 4.5% or less is preferable and 4% or less is more preferable.
  • the glass of the present invention does not contain an alkali metal oxide in excess of the impurity level (ie substantially) in order not to cause deterioration of the characteristics of the metal or oxide thin film provided on the glass surface during panel production.
  • PbO, As 2 O 3 Sb 2 O 3 is preferably not substantially contained.
  • the P 2 O 5 content is not substantially contained.
  • the alkali-free glass of the present invention improves the solubility, clarity, and moldability (float moldability) of the glass, so ZrO 2 , ZnO, Fe 2 O 3 , SO 3 , F, Cl, SnO 2. In a total amount of 5% or less, preferably 1% or less, more preferably 0.5% or less, and still more preferably 0.1% or less. More preferably, ZrO 2 and ZnO are not substantially contained.
  • the alkali-free glass of the present invention has a strain point of 680 ° C. or higher, preferably 690 ° C. or higher, thermal shrinkage during panel manufacture can be suppressed. Further, a laser annealing method can be applied as a method for manufacturing the p-Si TFT. 695 ° C or higher is more preferable, 700 ° C or higher is more preferable, and 705 ° C or higher is particularly preferable. Since the alkali-free glass of the present invention has a strain point of 680 ° C. or higher, preferably 690 ° C.
  • a high strain point for example, a plate thickness of 0.7 mm or less, preferably 0.5 mm or less, more preferably 0.8 mm or less.
  • the alkali-free glass of the present invention has a glass transition point of preferably 740 ° C. or higher, more preferably 750 ° C. or higher, and further preferably 760 ° C. or higher for the same reason as the strain point.
  • the alkali-free glass of the present invention has an average coefficient of thermal expansion at 50 to 350 ° C. of 30 ⁇ 10 ⁇ 7 to 45 ⁇ 10 ⁇ 7 / ° C., preferably 30 ⁇ 10 ⁇ 7 to 43 ⁇ 10 ⁇ 7 / ° C. Yes, it has high thermal shock resistance and can increase productivity during panel manufacturing.
  • the average thermal expansion coefficient at 50 to 350 ° C. is preferably 35 ⁇ 10 ⁇ 7 or more.
  • the average thermal expansion coefficient at 50 to 350 ° C. is preferably 42.5 ⁇ 10 ⁇ 7 / ° C. or less, more preferably 42 ⁇ 10 ⁇ 7 / ° C. or less, and further preferably 41.5 ⁇ 10 ⁇ 7 / ° C. or less. is there.
  • the alkali-free glass of the present invention has a specific gravity of preferably 2.7 or less, more preferably 2.65 or less, and even more preferably 2.6 or less.
  • the alkali-free glass of the present invention has a temperature T 2 at which the viscosity becomes 10 2 dPa ⁇ s is 1730 ° C. or less, preferably 1710 ° C. or less, preferably 1690 ° C. or less, more preferably 1670 ° C. or less, More preferably, it is 1650 ° C. or lower, particularly preferably 1640 ° C. or lower, so that dissolution is relatively easy.
  • the alkali-free glass of the present invention has a temperature T 4 at which the viscosity becomes 10 4 dPa ⁇ s is 1350 ° C. or less, preferably 1330 ° C. or less, preferably 1320 ° C. or less, more preferably 1310 ° C. or less, Preferably it is 1300 degrees C or less, Most preferably, it is 1290 degrees C or less, and it is preferable for float forming.
  • the alkali-free glass of the present invention preferably has a devitrification temperature of 1340 ° C. or lower, further 1330 ° C. or lower, and further 1320 ° C. or lower because molding by the float method becomes easy.
  • T 4 temperature at which the glass viscosity is 10 4 dPa ⁇ s, unit: ° C.
  • T 4 ⁇ devitrification temperature which is a standard for float moldability and fusion moldability, is It is preferably ⁇ 20 ° C. or higher, ⁇ 10 ° C. or higher, further 0 ° C. or higher, more preferably 10 ° C. or higher, still more preferably 20 ° C. or higher, and particularly preferably 30 ° C. or higher.
  • the devitrification temperature is obtained by putting crushed glass particles in a platinum dish and performing heat treatment for 17 hours in an electric furnace controlled at a constant temperature. It is an average value of the maximum temperature at which crystals are deposited inside and the minimum temperature at which crystals are not deposited.
  • the alkali-free glass of the present invention preferably has a Young's modulus of 80 GPa or more, 81 GPa or more, 82 GPa or more, 84 GPa or more, more preferably 85 GPa or more, and more preferably 86 GPa or more.
  • the alkali-free glass of the present invention preferably has a photoelastic constant of 31 nm / MPa / cm or less. Due to the birefringence of the glass substrate due to stress generated during the manufacturing process of the liquid crystal display panel and the liquid crystal display device, a phenomenon in which the black display becomes gray and the contrast of the liquid crystal display decreases may be observed. By setting the photoelastic constant to 31 nm / MPa / cm or less, this phenomenon can be suppressed small.
  • the alkali-free glass of the present invention has a photoelastic constant of preferably 23 nm / MPa / cm or more, more preferably 25 nm / MPa / cm or more, considering the ease of securing other physical properties.
  • the photoelastic constant can be measured by a disk compression method at a measurement wavelength of 546 nm.
  • the alkali-free glass of the present invention preferably has a small shrinkage during heat treatment.
  • the heat treatment process is different between the array side and the color filter side. Therefore, particularly in a high-definition panel, when the thermal shrinkage rate of glass is large, there is a problem in that dot displacement occurs during fitting.
  • the evaluation of the heat shrinkage rate can be measured by the following procedure. The sample is held at a temperature of glass transition point + 100 ° C. for 10 minutes and then cooled to room temperature at 40 ° C. per minute. Here, the total length of the sample is measured.
  • the sample is heated to 600 ° C at 100 ° C per minute, held at 600 ° C for 80 minutes, cooled to room temperature at 100 ° C per minute, and the total length of the sample is measured again.
  • the ratio between the amount of shrinkage of the sample before and after the heat treatment at 600 ° C. and the total length of the sample before the heat treatment at 600 ° C. is defined as the thermal shrinkage rate.
  • the heat shrinkage rate is preferably 100 ppm or less, more preferably 80 ppm or less, further preferably 60 ppm or less, further 55 ppm or less, and particularly preferably 50 ppm or less.
  • the alkali-free glass of the present invention can be produced, for example, by the following method.
  • the raw materials of the respective components that are normally used are blended so as to become target components, which are continuously charged into a melting furnace, heated to 1500-1800 ° C. and melted.
  • a plate glass can be obtained by forming this molten glass into a predetermined plate thickness by a float method (or a fusion method), and then cutting after slow cooling. Since the glass of the present invention has relatively low solubility, it is preferable to use the following as a raw material for each component.
  • the float method is preferable in view of stably producing a large plate glass (for example, one side of 2 m or more).
  • Examples 1 to 8 and 11 to 19 are Examples, and Examples 9 to 10 are Comparative Examples.
  • the raw materials of each component were prepared so as to have a target composition, and dissolved at a temperature of 1550 to 1650 ° C. using a platinum crucible. In melting, the mixture was stirred using a platinum stirrer to homogenize the glass. Next, the molten glass was poured out, formed into a plate shape, and then slowly cooled.
  • Tables 1 and 2 show that the glass composition (unit: mass%), the coefficient of thermal expansion at 50 to 350 ° C. (unit: ⁇ 10 ⁇ 7 / ° C.), strain point (unit: ° C.), glass transition point (unit: ° C.) ), Specific gravity, Young's modulus (GPa) (measured by ultrasonic method), high-temperature viscosity value, temperature T 2 (temperature at which glass viscosity becomes 10 2 dPa ⁇ s, unit: ° C.) Temperature T 4 (temperature at which the glass viscosity becomes 10 4 dPa ⁇ s, unit: ° C.), devitrification temperature (unit: ° C.), photoelastic constant (unit: nm / MPa), which is a standard for float moldability and fusion moldability / Cm) (measured by a disk compression method at a measurement wavelength of 546 nm).
  • GPa Young's modulus
  • the sample is held at a temperature of glass transition point + 100 ° C. for 10 minutes and then cooled to room temperature at 40 ° C. per minute. Here, the total length of the sample is measured. Then, it heats to 600 degreeC at 100 degreeC / min, hold
  • the ratio between the amount of shrinkage of the sample before and after heat treatment at 600 ° C. and the total length of the sample before heat treatment at 600 ° C. was defined as the heat shrinkage rate.
  • the values shown in parentheses are calculated values.
  • the thermal expansion coefficients of all the glasses of the examples are 30 ⁇ 10 ⁇ 7 to 45 ⁇ 10 ⁇ 7 / ° C., preferably 30 ⁇ 10 ⁇ 7 to 43 ⁇ 10 ⁇ 7 / ° C.
  • the temperature T 2 at which the glass viscosity becomes 10 2 dPa ⁇ s is 1730 ° C. or lower, preferably 1710 ° C. or lower
  • the temperature T 4 at which the glass viscosity becomes 10 4 dPa ⁇ s is 1350 ° C. or lower, preferably Since it is 1330 ° C.
  • the strain point is as high as 680 ° C. or higher, preferably 690 ° C. or higher, the Young's modulus is high as 80 GPa or higher, the specific gravity is as low as 2.7 or less, the heat shrinkage rate is as low as 100 ppm or less, and the photoelastic constant is 31 nm / MPa. / Cm or less.
  • the devitrification temperature is 1340 ° C. or lower, further 1330 ° C. or lower, and further 1320 ° C., and devitrification is not easily generated during float forming.
  • the alkali-free glass of the present invention has a high strain point and a high Young's modulus, and is suitable for uses such as a display substrate and a photomask substrate. Moreover, it is suitable also for uses, such as a substrate for information recording media and a substrate for solar cells.

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

La présente invention concerne un verre non alcalin qui a un point de déformation de 680 °C ou plus, un coefficient de dilatation thermique moyen de 30 × 10-7 à 45 × 10-7/°C dans une plage de température de 50 à 350 °C, une température (T2) à laquelle la viscosité du verre devient 102 dPa•s de 1730 °C ou moins, une température (T4) à laquelle la viscosité du verre devient 104 dPa•s de 1350 °C ou moins, et un module d'élasticité de 80 GPa ou plus, et qui contient, en % en masse en termes de teneurs en oxyde, de 55 à 70 de SiO2, de 10 à 25 de Al2O3, de 0 à 5 de B2O3, de 1 à 8 exclu de MgO, de 6 à 12 de CaO, 0 ou plus et moins de 2 de SrO, 0 ou plus et moins de 5 de BaO, la teneur totale de MgO, CaO, SrO et BaO étant de 12 à 23.
PCT/JP2014/072337 2013-08-30 2014-08-26 Verre non alcalin Ceased WO2015030013A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201480047349.9A CN105492402A (zh) 2013-08-30 2014-08-26 无碱玻璃
KR1020167004769A KR20160048081A (ko) 2013-08-30 2014-08-26 무알칼리 유리

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-179120 2013-08-30
JP2013179120A JP2016188148A (ja) 2013-08-30 2013-08-30 無アルカリガラスおよびその製造方法

Publications (1)

Publication Number Publication Date
WO2015030013A1 true WO2015030013A1 (fr) 2015-03-05

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PCT/JP2014/072337 Ceased WO2015030013A1 (fr) 2013-08-30 2014-08-26 Verre non alcalin

Country Status (5)

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JP (1) JP2016188148A (fr)
KR (1) KR20160048081A (fr)
CN (1) CN105492402A (fr)
TW (1) TW201512142A (fr)
WO (1) WO2015030013A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11214512B2 (en) 2017-12-19 2022-01-04 Owens Coming Intellectual Capital, LLC High performance fiberglass composition
CN115636584A (zh) * 2018-03-09 2023-01-24 Ａｇｃ株式会社 无碱玻璃基板

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Publication number Priority date Publication date Assignee Title
CN111225883A (zh) 2017-10-25 2020-06-02 日本板硝子株式会社 玻璃组合物
CN116395954B (zh) * 2018-03-14 2025-12-23 Ａｇｃ株式会社 无碱玻璃
KR102815028B1 (ko) * 2018-03-14 2025-06-04 에이지씨 가부시키가이샤 유리
JP7389400B2 (ja) * 2018-10-15 2023-11-30 日本電気硝子株式会社 無アルカリガラス板
JP7478340B2 (ja) * 2018-10-17 2024-05-07 日本電気硝子株式会社 無アルカリガラス板
CN109678341B (zh) * 2018-12-11 2022-03-25 东旭光电科技股份有限公司 无碱玻璃组合物和无碱玻璃及应用
KR20250084982A (ko) * 2019-02-07 2025-06-11 에이지씨 가부시키가이샤 무알칼리 유리
KR20210119419A (ko) 2019-02-07 2021-10-05 에이지씨 가부시키가이샤 무알칼리 유리
TW202031613A (zh) 2019-02-07 2020-09-01 日商Ａｇｃ股份有限公司 無鹼玻璃

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57191251A (en) * 1981-05-19 1982-11-25 Nippon Electric Glass Co Ltd Glass composition
JPS5864243A (ja) * 1981-10-13 1983-04-16 Asahi Glass Co Ltd 高弾性耐熱性のガラス組成物
JPH09208253A (ja) * 1996-02-02 1997-08-12 Carl Zeiss:Fa アルカリを含有しないアルミノホウケイ酸塩ガラスとその使用
JP2000302475A (ja) * 1999-04-12 2000-10-31 Carl Zeiss:Fa アルカリ非含有アルミノ硼珪酸ガラスとその用途

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57191251A (en) * 1981-05-19 1982-11-25 Nippon Electric Glass Co Ltd Glass composition
JPS5864243A (ja) * 1981-10-13 1983-04-16 Asahi Glass Co Ltd 高弾性耐熱性のガラス組成物
JPH09208253A (ja) * 1996-02-02 1997-08-12 Carl Zeiss:Fa アルカリを含有しないアルミノホウケイ酸塩ガラスとその使用
JP2000302475A (ja) * 1999-04-12 2000-10-31 Carl Zeiss:Fa アルカリ非含有アルミノ硼珪酸ガラスとその用途

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11214512B2 (en) 2017-12-19 2022-01-04 Owens Coming Intellectual Capital, LLC High performance fiberglass composition
US12344546B2 (en) 2017-12-19 2025-07-01 Owens Corning Intellectual Capital, Llc High performance fiberglass composition
US12473226B2 (en) 2017-12-19 2025-11-18 Owens Corning Intellectual Capital, Llc High performance fiberglass composition
CN115636584A (zh) * 2018-03-09 2023-01-24 Ａｇｃ株式会社 无碱玻璃基板

Also Published As

Publication number Publication date
TW201512142A (zh) 2015-04-01
JP2016188148A (ja) 2016-11-04
KR20160048081A (ko) 2016-05-03
CN105492402A (zh) 2016-04-13

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