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WO2013031221A1 - Dispositif mobile, dispositif d'exposition, procédé de fabrication d'un écran plat et procédé de fabrication d'un dispositif - Google Patents

Dispositif mobile, dispositif d'exposition, procédé de fabrication d'un écran plat et procédé de fabrication d'un dispositif Download PDF

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Publication number
WO2013031221A1
WO2013031221A1 PCT/JP2012/005462 JP2012005462W WO2013031221A1 WO 2013031221 A1 WO2013031221 A1 WO 2013031221A1 JP 2012005462 W JP2012005462 W JP 2012005462W WO 2013031221 A1 WO2013031221 A1 WO 2013031221A1
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WO
WIPO (PCT)
Prior art keywords
holding member
object holding
exposure apparatus
moving body
axis direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2012/005462
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English (en)
Japanese (ja)
Inventor
青木　保夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to KR1020147007385A priority Critical patent/KR20140068999A/ko
Priority to KR1020197036024A priority patent/KR102202760B1/ko
Priority to CN201280042125.XA priority patent/CN103765554B/zh
Publication of WO2013031221A1 publication Critical patent/WO2013031221A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H10P76/202—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Definitions

  • the present invention relates to a moving body apparatus, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method, and more specifically, a moving body apparatus that drives an object holding member that holds an object along a horizontal plane, and the moving body.
  • the present invention relates to an exposure apparatus including an apparatus for forming a predetermined pattern on the object, a flat panel display manufacturing method using the exposure apparatus, and a device manufacturing method using the exposure apparatus.
  • a lithography process for manufacturing an electronic device such as a liquid crystal display element, a semiconductor element (such as an integrated circuit), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or a wafer (hereinafter referred to as “mask”).
  • Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). The device is used.
  • a so-called gantry type biaxial is used to control the position of the substrate in the horizontal plane (scanning direction, cross-scanning direction, and the position around the axis perpendicular to the horizontal plane) with high speed and high accuracy.
  • a substrate stage apparatus having a coarse / fine movement structure in which a coarse movement stage and a fine movement stage are combined is known (for example, see Patent Document 1).
  • the substrate stage device has also increased in size, and a substrate stage device capable of controlling the position of the large substrate in the horizontal plane with high accuracy and high speed with a simple configuration has been desired.
  • the first moving body capable of moving a position along a first direction in a two-dimensional plane parallel to a horizontal plane, and the first
  • a second direction that is provided on one moving body is movable along the first direction together with the first moving body, and is perpendicular to the first direction in the two-dimensional plane with respect to the first moving body;
  • a second moving body that can move along the position, an object holding member that holds an object and moves along the two-dimensional plane guided by the second moving body, and the first direction with respect to the first direction.
  • the object holding member is disposed on one side of the moving body and supports a region on one side of the object holding member in the first direction from below when the object holding member moves along the second direction.
  • a first guide member movable along the first direction; When the object holding member moves along the second direction with respect to the first direction, an area on the other side of the object holding member in the first direction is viewed from below. And a second guide member that supports and can move along the first direction together with the object holding member.
  • the object holding member is guided along the two-dimensional plane parallel to the horizontal plane by the first and second moving bodies. Since the first and second guide members that support the region on one side and the other side of the object holding member in the first direction from below move together with the object holding member in the first direction, the configuration of the apparatus is simplified. .
  • a moving body device according to the first aspect of the present invention, and a pattern forming apparatus that forms a predetermined pattern on the object held by the object holding member using an energy beam. And an exposure apparatus.
  • a flat panel display comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. It is a manufacturing method.
  • a device manufacturing method comprising: exposing the object using the exposure apparatus according to the second aspect of the present invention; and developing the exposed object. is there.
  • FIG. 3 is a sectional view taken along line BB in FIG.
  • FIG. 1 schematically shows a configuration of a liquid crystal exposure apparatus 10 according to an embodiment.
  • the liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object.
  • a projection exposure apparatus a so-called scanner.
  • a resist (sensitive agent) is applied to the illumination system 12, the mask stage 14 that holds the mask M, the projection optical system 16, the substrate stage base 18, and the surface (the surface facing the + Z side in FIG. 1).
  • the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction
  • the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis.
  • the orthogonal direction is the Z-axis direction
  • the rotation directions around the X-axis, Y-axis, and Z-axis are the ⁇ x, ⁇ y, and ⁇ z directions, respectively.
  • the illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331.
  • the illumination system 12 irradiates the mask M with illumination light IL for exposure.
  • illumination light IL for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.
  • the mask stage 14 holds a mask M on which a predetermined circuit pattern is formed, for example, by vacuum suction.
  • the mask stage 14 is driven with a predetermined long stroke in the scanning direction (X-axis direction) by a mask stage driving system (not shown) including a linear motor, for example, and is also slightly driven in the Y-axis direction and the ⁇ z direction as appropriate.
  • Position information of the mask stage 14 in the XY plane is obtained by a mask interferometer system including a laser interferometer (not shown).
  • the projection optical system 16 is disposed below the mask stage 14.
  • the projection optical system 16 is configured similarly to the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system 16 is a so-called multi-lens projection optical system including, for example, a plurality of optical systems that form an erect image with a bilateral telecentric equal magnification system, and is a single rectangular shape having a longitudinal direction in the Y-axis direction. Functions in the same way as a projection optical system having an image field.
  • the illumination light IL that has passed through the mask M causes the circuit of the mask M in the illumination area to pass through the projection optical system 16.
  • a projected image of the pattern is formed in the irradiation region of the illumination light IL conjugate to the illumination region on the substrate P.
  • the mask M is driven in the scanning direction with respect to the illumination area (illumination light IL)
  • the substrate P is driven in the scanning direction with respect to the exposure area (illumination light IL).
  • the pattern formed on the mask M is transferred to one shot area.
  • the substrate stage base 18 is composed of a plate-like member extending in the Y-axis direction, and as shown in FIG. 2, for example, two are provided at predetermined intervals in the X-axis direction.
  • a plurality of Y linear guides 27a extending in the Y-axis direction, for example, three in this embodiment are fixed on the upper surface of each of the two substrate stage stands 18 in the X-axis direction.
  • the substrate stage base 18 is supported from below by a vibration isolator 19 installed on the floor 11 of the clean room, as shown in FIG.
  • the substrate stage gantry 18 constitutes a part of the apparatus body (body) of the liquid crystal exposure apparatus 10.
  • the mask stage 14 and the projection optical system 16 are supported by the apparatus main body and are vibrationally separated from the floor 11.
  • the substrate stage apparatus 20 shown in FIG. 1 corresponds to a cross-sectional view taken along line AA in FIG.
  • the substrate stage apparatus 20 includes a pair of base frames 22, an X beam 24 installed on the pair of base frames 22, a coarse movement stage 26 mounted on the X beam 24, and a coarse movement stage.
  • a fine movement stage 28 guided by a predetermined stroke in the X-axis direction and / or the Y-axis direction by the H. 26, and a pair of step guides 30 for guiding the movement of the fine movement stage 28 along the XY plane.
  • a pair of base frames 22 are spaced apart from each other by a predetermined distance (vibrating) on the + X side of the + X side substrate stage base 18 and on the ⁇ X side of the ⁇ X side substrate stage base 18 respectively. Installed on the floor 11 of the clean room.
  • the pair of base frames 22 supports the vicinity of both ends in the longitudinal direction of the X beam 24 described later from below, and functions as a guide member when the X beam 24 moves in the Y axis direction with a predetermined long stroke.
  • magnet units 21 a (Y stators) including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction are fixed to both side surfaces of the base frame 22.
  • a Y linear guide 23 a that is an element of the Y linear guide device 23 is fixed to the upper end surface (the end on the + Z side) of the base frame 22.
  • the X beam 24 is made of a member whose YZ section extending in the X-axis direction is rectangular (see FIG. 1). On the lower surface in the vicinity of both ends in the longitudinal direction of the X beam 24, an XZ cross-section inverted U-shaped member called a Y carriage 25 corresponding to the pair of base frames 22 is fixed.
  • the base frame 22 is inserted between a pair of opposing surfaces of the Y carriage 25.
  • a Y slide member 23b constituting the Y linear guide device 23 is fixed to the ceiling surface of the Y carriage 25 together with the Y linear guide 23a.
  • the Y slide member 23b is slidably engaged with the corresponding Y linear guide 23a with low friction, and the X beam 24 can move on the pair of base frames 22 with a predetermined stroke in the Y axis direction with low friction. It has become.
  • a coil unit 21b (X mover) constituting the Y linear motor 21 together with the magnet unit 21a is fixed to each of the pair of opposing surfaces of the Y carriage 25.
  • the X beam 24 is driven in the Y-axis direction on the pair of base frames 22 by the Y linear motor 21.
  • the type of the Y actuator that drives the X beam 24 is not limited to this, and for example, a feed screw device, a belt driving device, a wire driving device, or the like can be used.
  • the Z position of the lower surface of the X beam 24 is set to the + Z side with respect to the upper end portion of the Y linear guide 27a, and the X beam 24 is sent from the substrate stage mount 18 (that is, the apparatus main body). Vibrationally separated.
  • An auxiliary base frame that supports the central portion in the longitudinal direction of the X beam 24 from below may be disposed between the pair of substrate stage mounts 18.
  • two X linear guides 29a which are elements of the X linear guide device 29, are fixed on the upper surface of the X beam 24 at a predetermined interval in the X-axis direction.
  • magnet units 31 a X stators
  • magnet units 31 a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed to both side surfaces of the X beam 24.
  • the coarse movement stage 26 is formed of a rectangular parallelepiped member, and a plurality of X slide members 29b constituting the X linear guide device 29 together with the X linear guide 29a are fixed to the lower surface thereof. As shown in FIG. 3, for example, two X slide members 29b are provided at a predetermined interval in the X-axis direction for each X linear guide 29a.
  • the X slide member 29b is slidably engaged with the corresponding X linear guide 29a with low friction, and the coarse movement stage 26 can move on the X beam 24 with a predetermined stroke in the X axis direction with low friction. It has become.
  • Coil units 31b (X movers) constituting an X linear motor 31 for driving the coarse movement stage 26 with a predetermined stroke in the X-axis direction are attached to both side surfaces of the coarse movement stage 26 together with the magnet unit 31a. It is fixed via a plate 32.
  • the coarse movement stage 26 is restricted in relative movement in the Y axis direction with respect to the X beam 24 by the X linear guide device 29, and moves in the Y axis direction integrally with the X beam 24. That is, the coarse movement stage 26 constitutes a gantry-type two-axis stage device together with the X beam 24.
  • Each of the Y position information of the X beam 24 and the X position information of the coarse movement stage 26 is obtained, for example, by a linear encoder system (or an optical interferometer system) not shown.
  • Each of the pair of step guides 30 is mounted on a pair of substrate stage mounts 18 as shown in FIG.
  • Each of the pair of step guides 30 is formed of a member having a rectangular YZ section (see FIG. 1) extending in the X-axis direction, and is disposed in parallel to each other at a predetermined interval in the Y-axis direction.
  • the X beam 24 is inserted between the pair of step guides 30 with a predetermined clearance.
  • the length of the step guide 30 in the longitudinal direction (X-axis direction) is set somewhat shorter than that of the X beam 24, and the width direction (Y-axis direction) is set somewhat wider than that of the X beam 24.
  • the upper surface of the step guide 30 is finished with very high flatness.
  • a plurality of Y slide members 27b constituting the Y linear guide device 27 together with the Y linear guide 27a are fixed to the lower surface of the step guide 30.
  • two Y slide members 27b are provided at a predetermined interval in the Y-axis direction for one Y linear guide 27a.
  • the Y slide member 27b is slidably engaged with the corresponding Y linear guide 27a with low friction, and the step guide 30 moves on the pair of substrate stage mounts 18 with a predetermined stroke in the Y axis direction with low friction. It is possible.
  • Each of the pair of step guides 30 is mechanically coupled to the X beam 24 via a coupling device 34 in the vicinity of both ends in the longitudinal direction, as shown in FIG.
  • the coupling device 34 includes a rod-shaped member extending in the Y-axis direction, and a slide device (for example, a ball joint) attached to both ends of the rod-shaped member.
  • the X beam 24 and the step guide are connected via the slide device. 30.
  • the rod-shaped member is set to have high rigidity in the Y-axis direction.
  • the X beam 24 is driven in one (eg, + Y) direction in the Y-axis direction by a plurality of Y linear motors 21 (not shown in FIG. 2, see FIG. 3), the other in the Y-axis direction.
  • the step guide 30 on the side (for example, ⁇ Y side) is pulled by the X beam 24 via the coupling device 34, and the step guide 30 on one side (for example, + Y side) in the Y-axis direction is X via the coupling device 34. Pressed by the beam 24.
  • the pair of step guides 30 moves in the Y-axis direction integrally with the X beam 24.
  • the fine movement stage 28 is formed of a rectangular box-shaped member in plan view, and a substrate holder 36 is fixed on the upper surface thereof.
  • the substrate holder 36 is made of a plate-like member having a rectangular shape in plan view, and holds the substrate P by suction.
  • a Y-bar mirror 40y having a reflecting surface orthogonal to the Y axis is fixed to the ⁇ Y side surface of fine movement stage 28 via mirror base 38, and the ⁇ X side side surface of fine movement stage 28 is shown in FIG.
  • an X bar mirror 40x having a reflecting surface orthogonal to the X axis is fixed via a mirror base 38. 2
  • the illustration of the substrate holder 36, the mirror base 38, the Y bar mirror 40y, and the X bar mirror 40x (see FIG. 1 or FIG. 3) is omitted from the viewpoint of avoiding the complication of the drawing.
  • raising blocks 42 are attached to the vicinity of the four corners on the lower surface of fine movement stage 28, respectively.
  • An air bearing 44 is attached to the lower surface of the raising block 42 as shown in FIG.
  • the gas ejection surfaces (bearing surfaces) of, for example, two air bearings 44 on the + Y side are on the upper surface of the step guide 30 on the + Y side, and the gas ejection surfaces of, for example, two air bearings 44 on the ⁇ Y side.
  • each of the four air bearings 44 ejects pressurized gas (for example, air) to the upper surface of the corresponding step guide 30.
  • the fine movement stage 28 floats on the pair of step guides 30 through a slight clearance due to the static pressure of the gas supplied between the air bearing 44 and the step guide 30.
  • the arrangement and number of the air bearings 44 are not particularly limited as long as the fine movement stage 28 can be floated stably on the pair of step guides 30.
  • the fine movement stage 28 is guided to the coarse movement stage 26 and driven in the X-axis direction and / or the Y-axis direction by a fine movement stage drive system including a plurality of voice coil motors.
  • the plurality of voice coil motors include, for example, two X voice coil motors 46x and two Y voice coil motors 46y that generate thrust in the X-axis direction.
  • one of the two X voice coil motors 46x is arranged on the + Y side of the fine movement stage 28, and the other is arranged on the ⁇ Y side of the fine movement stage 28.
  • one of the two Y voice coil motors 46y is + X of the fine movement stage 28.
  • the other side and the other side are arranged on the ⁇ X side of fine movement stage 28, respectively.
  • the X voice coil motor 46x includes an X stator 46 a fixed to the + Y side surface of the coarse movement stage 26 and an X mover 46 b fixed to the lower surface of the fine movement stage 28. .
  • the X stator 46a has a coil unit (not shown).
  • the X mover 46b is formed in a cross-sectional YZ cross-sectional U shape, and a permanent magnet is fixed to a pair of opposed surfaces.
  • the coil unit included in the X stator 46a is inserted between the pair of permanent magnets with a predetermined clearance.
  • the X voice coil motor 46x of the present embodiment is a moving magnet type, but may be a moving coil type.
  • the fine movement stage 28 moves in the same direction and at the same speed as the coarse movement stage 26.
  • the thrust (Lorentz force) in the X-axis direction generated by the two X voice coil motors 46x is controlled.
  • the X beam 24 moves in the Y-axis direction with a long stroke, for example, two Y voice coils so that the fine movement stage 28 moves in the same direction and at the same speed as the X beam 24 (that is, the coarse movement stage 26).
  • the thrust in the Y-axis direction generated by the motor 46y is controlled.
  • the coarse movement stage 26 and the fine movement stage 28 integrally move along the XY plane with a long stroke.
  • the fine movement stage 28 is set to ⁇ z with respect to the coarse movement stage 26 by making the thrust directions of the two X voice coil motors 46x (or, for example, two Y voice coil motors 46y) opposite to each other. Slightly driven in the direction.
  • the fine movement stage 28 is guided by the coarse movement stage 26 and driven with a long stroke in the X-axis direction, the fine movement stage 28 is appropriately finely driven in the Y-axis direction and the / ⁇ z direction.
  • the mask M is loaded onto the mask stage 14 by a mask loader (not shown) under the control of a main controller (not shown).
  • the substrate P is loaded onto the substrate holder 36 by a substrate loader (not shown).
  • alignment measurement is performed by the main controller using an alignment detection system (not shown), and after completion of the alignment measurement, a plurality of shot areas set on the substrate P are sequentially exposed in a step-and-scan manner. Operation is performed. Since this exposure operation is the same as the conventional step-and-scan exposure operation, detailed description thereof is omitted here.
  • the fine movement stage 28 that holds the substrate P via the substrate holder 36 has a predetermined length in the X-axis direction. Driven by stroke.
  • the length of the step guide 30 in the longitudinal direction (X-axis direction) is set to be slightly longer than the movable distance in the X-axis direction of the fine movement stage 28, and the fine movement stage 28 is integrally formed with the coarse movement stage 26.
  • the coarse movement stage 26 When moving in the axial direction, it moves on the pair of step guides 30.
  • the fine movement stage 28 performs a step operation in the Y-axis direction, the coarse movement stage 26, the X beam 24, and the pair of step guides 30 integrally move in the Y-axis direction. Therefore, the fine movement stage 28 does not fall off from the pair of step guides 30.
  • the fine movement stage 28 is mounted on the pair of step guides 30 in a non-contact state, the fine movement stage 28 is moved in the X axis and / or Y with a small thrust. It can be driven (guided) in the axial direction. Further, since the position control system of the fine movement stage 28 is improved, high-precision exposure is possible. Further, since transmission of external vibration and reaction force to the fine movement stage 28 is suppressed, the position of the fine movement stage 28 can be controlled with high accuracy.
  • the pair of step guides 30 covers the movable range of the fine movement stage 28 in the X axis direction and moves integrally with the fine movement stage 28 in the Y axis direction.
  • a guide member for example, a surface plate
  • having a large area that covers the entire movement range in the XY plane is unnecessary. Therefore, the cost is low, and transportation and assembly are easy.
  • the magnet unit 21a (Y stator), which is an element of the Y linear motor 21 for driving the X beam 24, is vibrationally separated from the substrate stage gantry 18, when the X beam 24 is driven. Is not transmitted to the projection optical system 16 supported by the apparatus main body.
  • a Z / tilt actuator is disposed between the fine movement stage 28 and the substrate holder 36 or between the raising block 42 and the fine movement stage 28 to control the position of the substrate P in the Z-axis direction, ⁇ x direction, and ⁇ y direction. It may be possible.
  • a plurality of X beams 24 may be arranged between the pair of step guides 30.
  • the step guide 30 is moved in the Y-axis direction by being pulled by the X beam 24.
  • the step guide 30 is not limited to this, and for example, each of the pair of step guides 30 using an actuator such as a linear motor is used. It may be driven independently of the X beam 24.
  • a Y stator 21a (see FIG. 3) fixed to the base frame 22 may be used as a stator of the linear motor for driving the pair of step guides 30.
  • the X-beam 24 is driven in the Y-axis direction by the plurality of Y linear motors 21 so that the pair of step guides 30 moves integrally with the X-beam 24 in the Y-axis direction.
  • the present invention is not limited to this, and even if the pair of step guides 30 is driven in the Y-axis direction by an actuator (for example, a linear motor) and the X-beam 24 is moved in the Y-axis direction accordingly (X-beam 24). (There is no need to provide an actuator for driving).
  • the fine movement stage 28 is supported in a non-contact manner on the pair of step guides 30 via a plurality of air bearings 44 from below.
  • the fine movement stage 28 is in a contact state via a rolling element (for example, a ball). 28 may be mounted on the step guide 30.
  • the pair of step guides 30 may be connected physically (mechanically) (but not to interfere with the X beam 24). In this case, when one of the step guides 30 is pulled by the X beam 24, the other step guide 30 also moves together. For example, if the X beam 24 pulls (or presses) only one of the step guides 30, for example. good.
  • the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F 2 laser light (wavelength 157 nm).
  • a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium).
  • harmonics converted into ultraviolet light using a nonlinear optical crystal may be used.
  • a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.
  • the case of the multi-lens projection optical system 16 including a plurality of projection optical units has been described.
  • the number of projection optical units is not limited to this, and one or more projection optical units may be used.
  • the projection optical system is not limited to a multi-lens type projection optical system, and may be a projection optical system using an Offner type large mirror, for example.
  • the projection optical system 16 has a projection magnification of the same magnification has been described.
  • the present invention is not limited to this, and the projection optical system may be either a reduction system or an enlargement system.
  • a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive mask substrate is used.
  • a predetermined light shielding pattern or phase pattern / dimming pattern
  • an electronic mask (variable molding mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, for example, a non-light-emitting image display
  • DMD Digital * Micro-mirror * Device
  • An exposure apparatus is particularly suitable.
  • the exposure apparatus can also be applied to a step-and-repeat type exposure apparatus and a step-and-stitch type exposure apparatus.
  • the object held by the mobile device is not limited to the substrate that is the object to be exposed, and may be a pattern holder (original) such as a mask.
  • the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus that transfers a liquid crystal display element pattern onto a square glass plate.
  • an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip The present invention can also be widely applied to an exposure apparatus for manufacturing the above.
  • an exposure apparatus for manufacturing in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc.
  • the present invention can also be applied to an exposure apparatus that transfers a circuit pattern.
  • the object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks.
  • the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member).
  • the step of designing the function and performance of the device the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer)
  • the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .
  • the mobile device of the present invention is suitable for driving an object holding member that holds an object along a two-dimensional plane parallel to a horizontal plane.
  • the exposure apparatus of the present invention is suitable for exposing an object.
  • the manufacturing method of the flat panel display of this invention is suitable for manufacture of a flat panel display.
  • the device manufacturing method of the present invention is suitable for manufacturing micro devices.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

L'invention concerne un dispositif (20) de plateau pour substrat, lequel comporte: un cylindre X (24) pouvant se déplacer en direction d'un axe Y; un plateau (26) de mouvement approximatif situé sur le cylindre X (24) et pouvant se déplacer en direction de l'axe Y avec ce cylindre X, et pouvant également se déplacer dans une direction X par rapport au cylindre X (24); un plateau (28) de micromouvement maintenant un substrat (P) et pouvant, guidé par le plateau (26) de mouvement approximatif, se déplacer en direction de l'axe X et/ou de l'axe Y; une paire de guides (30) de pas, situés respectivement côté +Y et côté -Y du cylindre X (24), ces guides soutenant depuis le bas les régions côté +Y et -Y du plateau (28) de micromouvement et pouvant se déplacer en direction de l'axe Y avec le plateau (28) de micromouvement.
PCT/JP2012/005462 2011-08-30 2012-08-30 Dispositif mobile, dispositif d'exposition, procédé de fabrication d'un écran plat et procédé de fabrication d'un dispositif Ceased WO2013031221A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020147007385A KR20140068999A (ko) 2011-08-30 2012-08-30 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법 및 디바이스 제조 방법
KR1020197036024A KR102202760B1 (ko) 2011-08-30 2012-08-30 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법 및 디바이스 제조 방법
CN201280042125.XA CN103765554B (zh) 2011-08-30 2012-08-30 移动体装置、曝光装置、平板显示器的制造方法、及元件制造方法

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TWI762610B (zh) * 2017-03-31 2022-05-01 日商尼康股份有限公司 物體保持裝置、處理裝置、平板顯示器的製造方法、元件製造方法以及物體保持方法
KR102595405B1 (ko) * 2017-03-31 2023-10-27 가부시키가이샤 니콘 이동체 장치, 노광 장치, 플랫 패널 디스플레이의 제조 방법, 디바이스 제조 방법, 및 이동체의 구동 방법
TWI791036B (zh) 2017-10-05 2023-02-01 日商索尼股份有限公司 光源裝置及投射型顯示裝置

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TW201842417A (zh) 2018-12-01
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