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WO2012019531A1 - 制造网格图案型触控面板的方法 - Google Patents

制造网格图案型触控面板的方法 Download PDF

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Publication number
WO2012019531A1
WO2012019531A1 PCT/CN2011/078117 CN2011078117W WO2012019531A1 WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1 CN 2011078117 W CN2011078117 W CN 2011078117W WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1
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Prior art keywords
conductive material
etching
grid pattern
touch panel
transparent conductive
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PCT/CN2011/078117
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English (en)
French (fr)
Inventor
陈栋南
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MUTTO OPTRONICS(SUZHOU)CO Ltd
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MUTTO OPTRONICS(SUZHOU)CO Ltd
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the invention relates to a method for manufacturing a grid pattern type touch panel, and belongs to the technical field of touch panel process.
  • the processing method of the touch panel is to adopt a layer-by-layer bonding process, the bonding position is inaccurate, and the thickness and weight of the touch panel are increased, and the transmittance and touch sensitivity of the touch product are reduced. Quality is hard to get much improved.
  • a large amount of etching waste liquid is required to be etched due to the formation of a corresponding sensing line pattern, resulting in a large amount of etching waste liquid, and the environmental pollution is serious; and the color difference of the touch panel is large, and the etching trace is obvious.
  • the invention can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern; then plating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace, and operating Simple can reduce manufacturing costs. Therefore, the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch panel, and improving the transmittance and touch sensitivity.
  • the invention uses a photoresist technology to etch a transparent conductive material to form a grid pattern non-conductive region to reduce etching traces, reduce etching waste liquid to facilitate environmental protection; and then electroplating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching Metal routing, simple operation can reduce manufacturing costs.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, which can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern, and etch a transparent conductive material into a grid by using a photoresist technology.
  • the pattern non-conducting area is used to reduce the etching trace, and the etching waste liquid is reduced to be environmentally friendly;
  • the metal conductive material is electroplated, the photoresist film is adhered on the metal conductive material, and the metal trace is formed by exposure and development etching, and the operation cost is simple to reduce the manufacturing cost.
  • the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch product, and improving the transmittance and touch sensitivity.
  • Figure 1 is a schematic block diagram of a partial structure pattern of the present invention.
  • FIG. 2 is a schematic block diagram of a non-conductive region of a partial grid pattern of the present invention.
  • Figure 3 is a schematic block diagram of the production flow of the present invention.
  • the present invention discloses a method for manufacturing a grid pattern type touch panel, which comprises the following steps under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the thickness of the nameplate layer is 0.7 mm; the thickness of the metallic conductive material is 0.04 ⁇ m; the thickness of the transparent conductive material is 0.045 mm; the thickness of the substrate layer is 50 ⁇ m, and the substrate layer is polycarbonate.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.1. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 15 ⁇ m. Among them, the etching reaction time was 30 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 50 microns.
  • the thickness of the nameplate layer is 1.8 mm; the thickness of the metallic conductive material is 0.1 micrometer; the thickness of the transparent conductive material is 0.1 micrometer; the thickness of the substrate layer is 180 micrometers, and the substrate layer is hardened glass.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.5. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 20 ⁇ m. Among them, the etching reaction time was 60 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 100 micrometers.
  • the thickness of the nameplate layer is 1.1 mm; the thickness of the metal conductive material is 0.08 ⁇ m; the thickness of the transparent conductive material is 0.07 ⁇ m; the thickness of the substrate layer is 125 ⁇ m, and the substrate layer is polycarbonate resin.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.3 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 18 ⁇ m. Among them, the etching reaction time was 45 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 75 microns.

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Description

制造网格图案型触控面板的方法 技术领域
本发明涉及一种制造网格图案型触控面板的方法，属于触控面板制程技术领域。
 背景技术
若是触控面板的加工方式是采取逐层贴合的工序，容易造成贴合对位不精确，而且增加触控面板的厚度和重量，降低触控产品的透光度及触控敏感度，产品品质很难得到很大提升。加工透明导电材料时，因为成形相应的感应线图案需要蚀刻掉大量透明导电材料，造成大量的蚀刻废液，环境污染严重；而且触控面板的色差大，蚀刻痕迹明显。
本发明通过采用光阻工艺可以对触控面板的不同深度层面进行光阻蚀刻得到相应的图案；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。因此，电镀工艺与光阻工艺的有机结合可以省去复杂的贴合工序来加工触控面板，从而有效降低触控面板的厚度和重量，提高透光度和触控敏感度。
 技术问题
本发明使用光阻技术对透明导电材料蚀刻形成网格图案非导电区域来降低蚀刻痕迹，减少蚀刻废液利于环保；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。
 技术解决方案
本发明公开一种制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；
步骤一：对透明导电材料老化结晶；
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
上述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。蚀刻反应时间为30秒钟到60秒钟。金属导电材料是铜；透明导电材料是氧化铟锡。步骤五中透明光学胶的厚度范围值在50微米到100微米之间。最后各线路图案成形后用光阻剂清除残余光阻膜，提高产品外观品质。
 有益效果
本发明公开了制造网格图案型触控面板的方法，通过采用光阻工艺可以对触控面板的不同深度层面进行光阻蚀刻得到相应的图案，使用光阻技术对透明导电材料蚀刻形成网格图案非导电区域来降低蚀刻痕迹，减少蚀刻废液利于环保；再来电镀金属导电材料，在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线，操作简单可以降低制造成本。电镀工艺与光阻工艺的有机结合可以省去复杂的贴合工序来加工触控面板，从而有效降低触控产品的厚度重量，提高透光度和触控敏感度。
 附图说明
图1是本发明的局部结构图案示意框图。
图2是本发明的局部网格图案非导电区域示意框图。
图3是本发明的制作流程示意框图。
 本发明的实施方式
下面是本发明的具体实施例来进一步描述：
图3所示，本发明公开一种制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；
步骤一：对透明导电材料老化结晶；
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
上述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。蚀刻反应时间为30秒钟到60秒钟。金属导电材料是铜；透明导电材料是氧化铟锡。步骤五中透明光学胶的厚度范围值在50微米到100微米之间。
实施例1：
铭板层的厚度是0.7毫米；金属导电材料的厚度是0.04微米；透明导电材料的厚度是0.045毫米；基板层的厚度是50微米，基板层是聚碳酸树脂。
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；
步骤一：对透明导电材料老化结晶；
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
上述步骤二中盐酸的摩尔浓度是4.1 MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是15微米。其中，蚀刻反应时间为30秒钟。步骤五中透明光学胶的厚度是50微米。
实施例2：
铭板层的厚度是1.8毫米；金属导电材料的厚度是0.1微米；透明导电材料的厚度是0.1微米；基板层的厚度是180微米，基板层是硬化玻璃。
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；
步骤一：对透明导电材料老化结晶；
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
上述步骤二中盐酸的摩尔浓度是4.5 MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是20微米。其中，蚀刻反应时间为60秒钟。步骤五中透明光学胶的厚度是100微米。
实施例3：
铭板层的厚度是1.1毫米；金属导电材料的厚度是0.08微米；透明导电材料的厚度是0.07微米；基板层的厚度是125微米，基板层是聚碳酸树脂。
制造网格图案型触控面板的方法，包括如下步骤在无尘干燥条件下进行；
步骤一：对透明导电材料老化结晶；
步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
上述步骤二中盐酸的摩尔浓度是4.3MOL/L；步骤四中硫酸双氧水混合液的摩尔浓度是1.0MOL/L。步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度是18微米。其中，蚀刻反应时间为45秒钟。步骤五中透明光学胶的厚度是75微米。

Claims (6)

  1. 一种制造网格图案型触控面板的方法，包括如下步骤，其特征在于：所述步骤在无尘干燥条件下进行；
    步骤一：对透明导电材料老化结晶；
    步骤二：曝光蚀刻老化结晶透明导电材料，在温度40摄氏度状态下，用盐酸对透明导电材料蚀刻，形成感应线和网格图案非导电区域；
    步骤三：在步骤二中透明导电材料表面电镀金属导电材料；
    步骤四：在金属导电材料上贴光阻膜，曝光显影蚀刻形成金属走线；其中，在室温状态下，用硫酸双氧水混合溶液蚀刻金属导电材料得到金属走线；
    步骤五：用透明光学胶将铭板层贴合在金属走线和透明导电材料上。
  2. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤二中盐酸的摩尔浓度范围值在4.1MOL/L到4.5MOL/L之间；步骤四中硫酸双氧水混合液的摩尔浓度值是1MOL/L。
  3. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤二中网格图案为方块矩阵；其中，单个方块蚀刻边长0.35毫米，蚀刻线宽60微米；步骤四中光阻膜的厚度范围值在15微米到20微米之间。
  4. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述蚀刻反应时间为30秒钟到60秒钟。
  5. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述金属导电材料是铜；透明导电材料是氧化铟锡。
  6. 如权利要求1所述制造网格图案型触控面板的方法，其特征在于：所述步骤五中透明光学胶的厚度范围值在50微米到100微米之间。
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109901742A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法
CN109901743A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101968697B (zh) * 2010-08-13 2015-12-16 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法
CN103376958A (zh) * 2012-04-19 2013-10-30 深圳欧菲光科技股份有限公司 电容感应组件、其制备方法及使用电容感应组件的触控屏
CN102707837A (zh) * 2012-05-04 2012-10-03 牧东光电（苏州）有限公司 单面多点触控面板及其制造方法
CN103631456B (zh) 2012-08-24 2017-07-04 深圳欧菲光科技股份有限公司 薄膜感应器、包含该感应器的电容触摸屏及其制作方法和终端产品
US9510456B2 (en) 2012-11-09 2016-11-29 Shenzhen O-Film Tech Co., Ltd. Transparent conductor and preparation method thereof
CN107665065A (zh) * 2017-09-21 2018-02-06 意力(广州)电子科技有限公司 一种触控面板及触控装置
CN109696973A (zh) * 2017-10-20 2019-04-30 南昌欧菲光科技有限公司 触摸面板的制造方法及触摸面板

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101308768A (zh) * 2007-05-14 2008-11-19 海力士半导体有限公司 形成半导体器件的图案的方法
CN101728324A (zh) * 2008-11-03 2010-06-09 海力士半导体有限公司 形成半导体器件的图案的方法
CN101968697A (zh) * 2010-08-13 2011-02-09 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101441545A (zh) * 2008-12-08 2009-05-27 中国南玻集团股份有限公司 电容式触控屏及其制造方法
US7918019B2 (en) * 2009-01-09 2011-04-05 Apple Inc. Method for fabricating thin touch sensor panels
CN101661360B (zh) * 2009-09-07 2011-12-07 苏州超联光电有限公司 电容式触摸屏及其制作方法
CN101770321A (zh) * 2010-01-22 2010-07-07 牧东光电（苏州）有限公司 对电阻感应层的加工方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101308768A (zh) * 2007-05-14 2008-11-19 海力士半导体有限公司 形成半导体器件的图案的方法
CN101728324A (zh) * 2008-11-03 2010-06-09 海力士半导体有限公司 形成半导体器件的图案的方法
CN101968697A (zh) * 2010-08-13 2011-02-09 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109901742A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法
CN109901743A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法
CN109901743B (zh) * 2019-01-31 2023-02-28 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法
CN109901742B (zh) * 2019-01-31 2023-02-28 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法

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