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WO2012019531A1 - Procédé de fabrication d'un écran tactile de type motif quadrillé - Google Patents

Procédé de fabrication d'un écran tactile de type motif quadrillé Download PDF

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Publication number
WO2012019531A1
WO2012019531A1 PCT/CN2011/078117 CN2011078117W WO2012019531A1 WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1 CN 2011078117 W CN2011078117 W CN 2011078117W WO 2012019531 A1 WO2012019531 A1 WO 2012019531A1
Authority
WO
WIPO (PCT)
Prior art keywords
conductive material
etching
grid pattern
touch panel
transparent conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2011/078117
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English (en)
Chinese (zh)
Inventor
陈栋南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MUTTO OPTRONICS(SUZHOU)CO Ltd
Original Assignee
MUTTO OPTRONICS(SUZHOU)CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MUTTO OPTRONICS(SUZHOU)CO Ltd filed Critical MUTTO OPTRONICS(SUZHOU)CO Ltd
Publication of WO2012019531A1 publication Critical patent/WO2012019531A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the invention relates to a method for manufacturing a grid pattern type touch panel, and belongs to the technical field of touch panel process.
  • the processing method of the touch panel is to adopt a layer-by-layer bonding process, the bonding position is inaccurate, and the thickness and weight of the touch panel are increased, and the transmittance and touch sensitivity of the touch product are reduced. Quality is hard to get much improved.
  • a large amount of etching waste liquid is required to be etched due to the formation of a corresponding sensing line pattern, resulting in a large amount of etching waste liquid, and the environmental pollution is serious; and the color difference of the touch panel is large, and the etching trace is obvious.
  • the invention can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern; then plating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace, and operating Simple can reduce manufacturing costs. Therefore, the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch panel, and improving the transmittance and touch sensitivity.
  • the invention uses a photoresist technology to etch a transparent conductive material to form a grid pattern non-conductive region to reduce etching traces, reduce etching waste liquid to facilitate environmental protection; and then electroplating a metal conductive material, attaching a photoresist film on the metal conductive material, exposing and developing etching Metal routing, simple operation can reduce manufacturing costs.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the invention discloses a method for manufacturing a grid pattern type touch panel, which can perform photoresist etching on different depth layers of the touch panel by using a photoresist process to obtain a corresponding pattern, and etch a transparent conductive material into a grid by using a photoresist technology.
  • the pattern non-conducting area is used to reduce the etching trace, and the etching waste liquid is reduced to be environmentally friendly;
  • the metal conductive material is electroplated, the photoresist film is adhered on the metal conductive material, and the metal trace is formed by exposure and development etching, and the operation cost is simple to reduce the manufacturing cost.
  • the organic combination of the electroplating process and the photoresist process can eliminate the complicated bonding process to process the touch panel, thereby effectively reducing the thickness and weight of the touch product, and improving the transmittance and touch sensitivity.
  • Figure 1 is a schematic block diagram of a partial structure pattern of the present invention.
  • FIG. 2 is a schematic block diagram of a non-conductive region of a partial grid pattern of the present invention.
  • Figure 3 is a schematic block diagram of the production flow of the present invention.
  • the present invention discloses a method for manufacturing a grid pattern type touch panel, which comprises the following steps under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration range of hydrochloric acid in the above step 2 is between 4.1 MOL/L and 4.5 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and in step 4, the thickness of the photoresist film ranges from 15 ⁇ m to 20 ⁇ m.
  • the etching reaction time is from 30 seconds to 60 seconds.
  • the metal conductive material is copper; the transparent conductive material is indium tin oxide.
  • the transparent optical adhesive has a thickness ranging from 50 micrometers to 100 micrometers.
  • the thickness of the nameplate layer is 0.7 mm; the thickness of the metallic conductive material is 0.04 ⁇ m; the thickness of the transparent conductive material is 0.045 mm; the thickness of the substrate layer is 50 ⁇ m, and the substrate layer is polycarbonate.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.1. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 15 ⁇ m. Among them, the etching reaction time was 30 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 50 microns.
  • the thickness of the nameplate layer is 1.8 mm; the thickness of the metallic conductive material is 0.1 micrometer; the thickness of the transparent conductive material is 0.1 micrometer; the thickness of the substrate layer is 180 micrometers, and the substrate layer is hardened glass.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.5. MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 20 ⁇ m. Among them, the etching reaction time was 60 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 100 micrometers.
  • the thickness of the nameplate layer is 1.1 mm; the thickness of the metal conductive material is 0.08 ⁇ m; the thickness of the transparent conductive material is 0.07 ⁇ m; the thickness of the substrate layer is 125 ⁇ m, and the substrate layer is polycarbonate resin.
  • a method for manufacturing a grid pattern type touch panel comprising the following steps: performing under dust-free drying conditions;
  • Step 1 aging and crystallizing the transparent conductive material
  • Step 2 exposing and etching the crystallization transparent conductive material, etching the transparent conductive material with hydrochloric acid at a temperature of 40 degrees Celsius to form a non-conductive region of the sensing line and the grid pattern;
  • Step 3 plating the metal conductive material on the surface of the transparent conductive material in the second step
  • Step 4 attaching a photoresist film on the metal conductive material, exposing and developing etching to form a metal trace; wherein, at room temperature, etching the metal conductive material with a mixed solution of hydrogen peroxide to obtain a metal trace;
  • Step 5 Lay the nameplate layer on the metal traces and the transparent conductive material with a transparent optical adhesive.
  • the molar concentration of hydrochloric acid in the above step 2 is 4.3 MOL/L; the molar concentration of the sulfuric acid hydrogen peroxide mixture in the fourth step is 1.0 MOL/L.
  • the grid pattern is a matrix of squares; wherein the single square has a side length of 0.35 mm and an etch line width of 60 ⁇ m; and the thickness of the photoresist film in step 4 is 18 ⁇ m. Among them, the etching reaction time was 45 seconds.
  • the thickness of the transparent optical adhesive in step 5 is 75 microns.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Of Switches (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Laminated Bodies (AREA)
  • Position Input By Displaying (AREA)

Abstract

L'invention concerne un procédé de fabrication d'un écran tactile du type à motif quadrillé, comportant les étapes consistant à : attaquer chimiquement un matériau conducteur transparent pour former des régions non conductrices régions non conductrices selon un motif quadrillé en utilisant une technologie à résine photosensible, puis en le revêtant électrochimiquement d'un matériau conducteur métallique, en fixant un film de résine photosensible sur le matériau conducteur métallique et en formant un câblage métallique par exposition, développement et attaque chimique sur celui-ci. Le procédé selon l'invention est susceptible de réduire les traces de gravure chimique et de diminuer la quantité de déchets liquides de gravure chimique, ce qui est bénéfique pour la protection de l'environnement, tout en étant simple à mettre en œuvre, ce qui peut réduire les coûts de fabrication.
PCT/CN2011/078117 2010-08-13 2011-08-08 Procédé de fabrication d'un écran tactile de type motif quadrillé Ceased WO2012019531A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201010252112.8 2010-08-13
CN201010252112.8A CN101968697B (zh) 2010-08-13 2010-08-13 制造网格图案型触控面板的方法

Publications (1)

Publication Number Publication Date
WO2012019531A1 true WO2012019531A1 (fr) 2012-02-16

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PCT/CN2011/078117 Ceased WO2012019531A1 (fr) 2010-08-13 2011-08-08 Procédé de fabrication d'un écran tactile de type motif quadrillé

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CN (1) CN101968697B (fr)
WO (1) WO2012019531A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109901742A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法
CN109901743A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法

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* Cited by examiner, † Cited by third party
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CN101968697B (zh) * 2010-08-13 2015-12-16 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法
CN103376958A (zh) * 2012-04-19 2013-10-30 深圳欧菲光科技股份有限公司 电容感应组件、其制备方法及使用电容感应组件的触控屏
CN102707837A (zh) * 2012-05-04 2012-10-03 牧东光电（苏州）有限公司 单面多点触控面板及其制造方法
CN103631456B (zh) 2012-08-24 2017-07-04 深圳欧菲光科技股份有限公司 薄膜感应器、包含该感应器的电容触摸屏及其制作方法和终端产品
US9510456B2 (en) 2012-11-09 2016-11-29 Shenzhen O-Film Tech Co., Ltd. Transparent conductor and preparation method thereof
CN107665065A (zh) * 2017-09-21 2018-02-06 意力(广州)电子科技有限公司 一种触控面板及触控装置
CN109696973A (zh) * 2017-10-20 2019-04-30 南昌欧菲光科技有限公司 触摸面板的制造方法及触摸面板

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CN101728324A (zh) * 2008-11-03 2010-06-09 海力士半导体有限公司 形成半导体器件的图案的方法
CN101968697A (zh) * 2010-08-13 2011-02-09 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法

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CN101441545A (zh) * 2008-12-08 2009-05-27 中国南玻集团股份有限公司 电容式触控屏及其制造方法
US7918019B2 (en) * 2009-01-09 2011-04-05 Apple Inc. Method for fabricating thin touch sensor panels
CN101661360B (zh) * 2009-09-07 2011-12-07 苏州超联光电有限公司 电容式触摸屏及其制作方法
CN101770321A (zh) * 2010-01-22 2010-07-07 牧东光电（苏州）有限公司 对电阻感应层的加工方法

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CN101308768A (zh) * 2007-05-14 2008-11-19 海力士半导体有限公司 形成半导体器件的图案的方法
CN101728324A (zh) * 2008-11-03 2010-06-09 海力士半导体有限公司 形成半导体器件的图案的方法
CN101968697A (zh) * 2010-08-13 2011-02-09 牧东光电（苏州）有限公司 制造网格图案型触控面板的方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109901742A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法
CN109901743A (zh) * 2019-01-31 2019-06-18 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法
CN109901743B (zh) * 2019-01-31 2023-02-28 深圳市骏达光电股份有限公司 一种柔性导电材料触控传感器及其制备方法
CN109901742B (zh) * 2019-01-31 2023-02-28 深圳市骏达光电股份有限公司 一种柔性触控模组及其制备方法

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CN101968697A (zh) 2011-02-09

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