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WO2009072810A3 - Etchant composition for glass substrate - Google Patents

Etchant composition for glass substrate Download PDF

Info

Publication number
WO2009072810A3
WO2009072810A3 PCT/KR2008/007143 KR2008007143W WO2009072810A3 WO 2009072810 A3 WO2009072810 A3 WO 2009072810A3 KR 2008007143 W KR2008007143 W KR 2008007143W WO 2009072810 A3 WO2009072810 A3 WO 2009072810A3
Authority
WO
WIPO (PCT)
Prior art keywords
etchant composition
composition
glass substrate
total weight
inorganic salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2008/007143
Other languages
French (fr)
Other versions
WO2009072810A2 (en
Inventor
Woong Kim
Jae-Seong Park
Jae-Won Jeong
Sang-Hyup Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemtronics Co Ltd
Original Assignee
Chemtronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40284061&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2009072810(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Chemtronics Co Ltd filed Critical Chemtronics Co Ltd
Publication of WO2009072810A2 publication Critical patent/WO2009072810A2/en
Publication of WO2009072810A3 publication Critical patent/WO2009072810A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
  • Weting (AREA)

Abstract

It relates to an etchant composition for glass substrates and more particularly, to an etchant composition including 10-45wt% of an inorganic salt including fluorine to the total weight of the composition; 1-10wt% of NH4HF2; 1-10wt% of an acid having a lower acid dissociation constant (pKa) than the inorganic salt including fluorine; and water to make the total weight of the composition be 100wt%, in which the etchant composition for glass substrates allows reduced complexity and manufacturing cost by using simple elements, provides high etch rate, etches the surface of a glass substrate smoothly, exhibits excellent etchability, and improves image quality.
PCT/KR2008/007143 2007-12-04 2008-12-03 Etchant composition for glass substrate Ceased WO2009072810A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2007-0124792 2007-12-04
KR1020070124792A KR100868228B1 (en) 2007-12-04 2007-12-04 Etch solution composition for glass substrate

Publications (2)

Publication Number Publication Date
WO2009072810A2 WO2009072810A2 (en) 2009-06-11
WO2009072810A3 true WO2009072810A3 (en) 2009-09-03

Family

ID=40284061

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/007143 Ceased WO2009072810A2 (en) 2007-12-04 2008-12-03 Etchant composition for glass substrate

Country Status (2)

Country Link
KR (1) KR100868228B1 (en)
WO (1) WO2009072810A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106425129B (en) 2010-11-30 2018-07-17 康宁股份有限公司 The method for forming high density hole array in glass
KR101223877B1 (en) * 2011-03-14 2013-01-17 노바테크인더스트리 주식회사 Ultra Slim Panel Manufacturing System
US9315412B2 (en) * 2011-07-07 2016-04-19 Corning Incorporated Surface flaw modification for strengthening of glass articles
TW201408612A (en) * 2012-08-17 2014-03-01 Onano Ind Corp Method of manufacturing glare-free low-reflection glass surface
US9488857B2 (en) 2014-01-10 2016-11-08 Corning Incorporated Method of strengthening an edge of a glass substrate
KR102269921B1 (en) * 2014-03-31 2021-06-28 삼성디스플레이 주식회사 Composition for glass reinforcing and manufacturing method of touch screen glass using thereof
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
US10134657B2 (en) 2016-06-29 2018-11-20 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
KR102079042B1 (en) * 2016-07-04 2020-02-20 오씨아이 주식회사 Etching solution for silicon substrate
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
KR102087703B1 (en) * 2019-04-08 2020-03-11 (주)혜덕 Etchant composition for manufacturing blackboard glass and method of manuacturing the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990075903A (en) * 1998-03-26 1999-10-15 이기원 Cleaning and Etching Compositions for Electronic Displays and Substrates
KR20060033333A (en) * 2004-10-14 2006-04-19 주식회사 동진쎄미켐 Etching Composition of Thin Film Transistor Liquid Crystal Display
KR100614985B1 (en) * 1998-11-24 2006-08-28 다이킨 고교 가부시키가이샤 Etching solution, etched article and method for etched article
KR100677052B1 (en) * 2005-06-17 2007-02-02 테크노세미켐 주식회사 Etching liquid composition for liquid crystal glass substrate
KR20070108212A (en) * 2005-01-31 2007-11-08 어플라이드 머티어리얼스, 인코포레이티드 Etch Treatment Process for Substrate Surface and Chamber Surface

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132859B2 (en) * 2001-08-24 2013-01-30 ステラケミファ株式会社 Micro-processed surface treatment liquid for glass substrates with multiple components

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990075903A (en) * 1998-03-26 1999-10-15 이기원 Cleaning and Etching Compositions for Electronic Displays and Substrates
KR100614985B1 (en) * 1998-11-24 2006-08-28 다이킨 고교 가부시키가이샤 Etching solution, etched article and method for etched article
KR20060033333A (en) * 2004-10-14 2006-04-19 주식회사 동진쎄미켐 Etching Composition of Thin Film Transistor Liquid Crystal Display
KR20070108212A (en) * 2005-01-31 2007-11-08 어플라이드 머티어리얼스, 인코포레이티드 Etch Treatment Process for Substrate Surface and Chamber Surface
KR100677052B1 (en) * 2005-06-17 2007-02-02 테크노세미켐 주식회사 Etching liquid composition for liquid crystal glass substrate

Also Published As

Publication number Publication date
WO2009072810A2 (en) 2009-06-11
KR100868228B1 (en) 2008-11-11

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