TW201408612A - Method of manufacturing glare-free low-reflection glass surface - Google Patents

Abstract

A method of manufacturing a glare-free low-reflection glass surface mainly comprises: providing a glass substrate at least containing a surface to be processed; providing a first etching solution, which is a solution formed by uniformly mixing the materials containing, based on the total weight, 10% to 35% of the water-soluble inorganic salt, 5% to 60% of the acid, 0.5% to 5% of the dispersing agent, 1% to 10% of the stabilizer, and the deionized water; performing a first etching process to react the first etching solution to the surface to be processed of the glass substrate so as to form a plurality of fine pits on the surface and roughen the surface to reduce the light reflection; providing a second etching solution, which is a solution formed by uniformly mixing the material containing the hydrofluoric acid, the inorganic acid, the modifier and the deionized water; and performing a second etching process to react the second etching solution to the surface to be processed having been subjected to the first etching process, so as to passivate the shape of the fine pits on the surface to be processed and reduce the depth difference of the pits, uniformizing the roughness of the surface to be processed and increasing the surface gloss, thereby greatly increasing the transparency of the glass surface and forming a glare-free low-reflection glass surface with the high transmittance.

Description

Method for manufacturing glare-free low-reflection glass surface

The invention relates to a method for optimizing a glass surface, in particular to a glass substrate used in various displays, an exposed panel, and various glass materials, and forms a glare-free low-reflection surface on a glass substrate by wet etching. Methods.

With the advancement of the times and technology, today's image displays have been widely used in a variety of electronic products, and the current industry is striving to improve the quality of the display, so that users can have better visual effects and enjoyment; As is known, the use of a glass substrate without glare and low reflection enables the display to have better visual quality, reduce the light interference of the external environment, and at the same time improve the viewing angle of the display screen and reduce the reflection of the screen, so that the screen display image is clearer. The color is more saturated.

At present, the production methods of glass substrates without glare and low reflection are mostly processed by using a resin having a different refractive index or by a physical collision method to form glare-free and low-reflection characteristics on the surface of the glass substrate; Among them, the resin-stacked film is used to form an anti-glare and anti-reflective glass surface, and a resin film is stacked on the surface of the glass substrate, and particles are added to the resin, and the scattering phenomenon of the particles is used to generate anti-glare. The effect is that, by stacking a plurality of resin films having different refractive indexes on the surface of the glass substrate, the wavelength of the light wave passing through each layer of the resin film is completely destructively interfered, and the reflected light is offset to achieve anti-reflection. The above-mentioned manner of stacking a resin film on the surface of a glass substrate is mostly achieved by a coating technique, but the coating process has been coated for a long time. Both of them are troubled, and the unevenly coated resin film not only fails to exert an anti-reflection effect, but also leads to a decrease in the yield of the finished product, and the uneven resin film layer has to be subjected to a second or more coating rework process, not only Increasing the production cost also increases the thickness of the coated resin film, which does not satisfy the demand for thinning of the glass substrate.

In addition, the physical collision method is that the fine steel sand is impacted on the surface of the glass substrate by high-speed collision by wind pressure, the surface is roughened to reduce the effect of reflecting light, and after the sandblasting, the polishing process is performed to The glass surface which has both anti-glare and anti-reflection performance is formed; the surface treatment of the glass substrate by the physical collision method has the advantages of high efficiency, low cost, and reworkability, but the technical means also has many uncontrollable factors. For example, the life of the consumables is short, the impact depth is different, the working environment is poor, and static electricity is generated. The polishing process after the blasting is mostly performed by mechanical grinding, and the stress generated when the glass surface material is removed during the polishing process often causes The fragmentation of the glass substrate, due to the sandblasting process, causes the glass surface to form a plurality of pits having different depths and pore sizes. Although the mechanical polishing method can remove part of the material of the glass surface, although the surface gloss and flatness can be improved, The anti-glare and anti-reflection effects that can be achieved are limited, and it is difficult to effectively improve the anti-glare effect of the display. And visual imaging quality; it is known that in addition to the mechanical polishing method described above, the polishing process may be performed by a wet etching method, which is processed by an etching solution, and the etching liquid is a mixture of a plurality of compounds. The strong acid solution usually contains fluoride such as potassium hydride or calcium fluoride as the main component. In the wet etching process, the glass substrate is immersed in the strong acid solution, and the hydrofluoric acid formed by the reaction erodes the glass surface to prevent Glare effect; current wet etching method for polishing process common question The questions include: 1. The finished product yield is low, and the subsequent surface polishing treatment time is long; 2. The limitation of the production method is large, and the processing result is difficult to control. 3. The acidity of the etching liquid is too large, which seriously affects the production operation of the personnel; The etchant has high toxicity and strong volatility, and is highly erosive to the skin and respiratory tract, which seriously endangers the health of workers; 5. The etching process takes too long; 6. It cannot be produced in large quantities and with high efficiency; The stability of the etching solution is poor, the useful life is short, and 8, the personnel cost is high, etc.; because the technical means of the conventional wet etching is not mature enough, there are still many shortcomings, which still cannot be applied to the mass production process.

As mentioned above, various prior art techniques have their advantages, but the disadvantages cannot be ignored. Therefore, it is a common goal of the industry to develop a method that can achieve the above advantages without the above disadvantages.

In view of the above, the main object of the present invention is to provide a method for manufacturing a non-glare low-reflection glass surface with low cost and high mass production efficiency, which is provided with a plurality of uniformly distributed fine pits on the glass surface by wet etching. Forming an anti-reflective glass surface, and then passivating the difference in depth of the fine pits to improve the gloss of the glass surface, thereby obtaining a glass surface having high light transmittance and having no glare and low reflection, and the method of the invention can be overcome The shortcomings of the prior art simplify the production process to reduce the production cost while improving production efficiency and finished product yield.

In order to achieve the above object, the method for manufacturing a glare-free low-reflection glass surface provided by the present invention mainly comprises the following steps: a. providing a glass substrate: the material of the glass substrate is selected from the group consisting of sodium calcium silicate. Glass, sodium borosilicate glass, lead crystal glass, aluminosilicate glass, low iron glass, etc., but the material range of the implementation is not limited to the above materials; in particular, the glass substrate contains at least one surface to be processed, The surface to be processed may be a flat surface, a curved surface, a spherical surface or other various regular or irregularly shaped glass surfaces; in the process of the present invention, the glass substrate is kept open except for the surface to be processed. In addition, the remaining surfaces can be shielded by a corrosion-resistant mask, and those skilled in the art know that the mask can be selected from polymethyl methacrylate, silicone or the like, by stencil printing, spin coating. (spin coating) and slot coating method (slot coating) or capillary coating method, film coating method and other technical means to the surface of the glass substrate; b, providing a first etching solution: which is composed of water-soluble inorganic salts a material such as an acid, a dispersant, a stabilizer, and a deionized water are uniformly mixed to form a solution; in particular, the water-soluble inorganic salt accounts for 10% to 35% by weight, and the acid solution accounts for 5% by weight. Up to 60%, The dispersant is 0.5% to 5% by weight, the stabilizer is 1% to 10% by weight of the total weight, and the balance is deionized water; the water-soluble inorganic salt is selected from potassium fluoride and sodium hydrogencarbonate. Or a mixture of potassium hydrogencarbonate, hydrofluoric acid, ammonium perchlorate or a mixture thereof selected from the group consisting of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartaric acid or a mixture thereof, the dispersing agent a stabilizer selected from the group consisting of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or a mixture thereof. The stabilizer is selected from the group consisting of tin ethyl mercaptan, magnesium chloride, sodium niobate, one of organic nickel compounds, or a mixture thereof; c. performing a first etching process: applying the first etching solution to the surface to be processed of the glass substrate, maintaining the temperature of the etching solution between 40 ° C and 50 ° C, and the action time is about 10 to 30 minutes, and then The surface to be processed is subjected to cleaning to remove residual etching liquid, so that many fine pits can be formed on the surface to be processed, and the surface is roughened to reduce the effect of reflecting light; in particular, the etching liquid and the surface to be processed The mode of action can be practiced by various means. For example, the etching liquid can be contained in a working tank, and the glass substrate is put into the working tank, so that the surface to be processed is completely immersed in the etching liquid for etching. A person skilled in the art knows that in addition to the foregoing modes of action, a continuous spraying method can also be used, for example, the etching liquid is continuously sprayed on the surface to be processed for etching; therefore, the etching liquid and the desired The mode of action of the machined surface is not limited by the aforementioned technical means; and d, providing a second etching solution: hydrofluoric acid (HF), inorganic acid, modifier, and deionized water The material is uniformly mixed to form a solution; in particular, the hydrofluoric acid accounts for 15% to 45% by weight, the inorganic acid accounts for 15% to 45% by weight, and the modifier accounts for 0.1% to 5% by weight. And the remaining amount is deionized water; the inorganic acid is selected from one of phosphoric acid, hydrochloric acid, carbonic acid, chloric acid or a mixture thereof; the modifier is selected from the group consisting of malic acid, gluconic acid, sorbic acid, and citric acid a mixture of one or the same; e, performing a second etching process: applying the second etching solution to the surface to be processed through the first etching process to maintain the temperature of the etching solution at 40 ° C to Between 50 ° C, the action time is about 20 to 40 minutes, then the surface to be processed is cleaned and dried, and the material of the glass surface is removed by the second etching solution to perform a thinning process, and simultaneously the glass surface is The shape of the fine pit is passivated, and the difference in depth of the pit is reduced, thereby improving the gloss and flatness of the glass surface, thereby obtaining a glass substrate having no glare and low reflection surface; wherein the second etching liquid The practical means of working with the surface to be processed is the same as the first etching process described above, and thus will not be described herein.

In the foregoing manufacturing method of the present invention, a plurality of fine pits may be formed on the surface to be processed by the first etching process to roughen the surface to reduce the effect of reflecting light; and the second etching process may passivate the fines. The difference in the depth of the pit makes the roughness of the surface to be machined uniform and enhances the gloss of the surface, so that the light transmittance of the glass surface can be greatly improved, and a glare-free low-reflection glass surface having high light transmittance can be formed.

In other words, the glare-free low-reflection surface of the present invention is composed of a plurality of fine pits formed on the surface of the light-transmitting substrate, and can control the distribution density of the fine pits and the difference in the depth of the pits. And adjusting the reflectance and the light transmittance of the surface of the light-transmitting substrate; therefore, according to the present invention, the second etching process may be further performed after the second etching process for one or more times. The roughness of the surface to be processed is manipulated, thereby adjusting the gloss of the glass surface and the effect of no glare and low reflection.

The glare-free low-reflection surface formed by the present invention can be clearly displayed after being magnified several times by a microscope, and a plurality of hexagonal pits are evenly distributed on the glass surface, and the The hexagonal pits together form a turtle-like mesh pattern.

The present invention further provides an etchant capable of optimizing a glass surface, which can form a surface having a low reflection efficiency on a glass substrate; the composition of the etchant liquid comprises at least:

a, water-soluble inorganic salts: the water-soluble inorganic salts are selected from potassium fluoride (KF), sodium hydrogencarbonate (NaHCO ₃ ), potassium hydrogencarbonate (KHCO ₃ ), hydrofluoric acid (HF), One or a mixture of ammonium chlorate (ClH ₄ NO ₄ ), but the material range of the implementation is not limited to the foregoing materials; the water-soluble inorganic salt is the main material component of the surface etching, preferably, the total weight ratio 10% to 35%; when the water-soluble inorganic salt is less than 10% by weight, the low-reflecting surface rate is slow, and it cannot be rapidly mass-produced, and when the water-soluble inorganic salt is more than 35% by weight, The formation of a low-reflection surface rate is relatively fast, but it takes a long time to uniformly mix the composition of the etching liquid; in addition, the glass surface is etched by using a water-soluble inorganic salt alone, and only a high surface roughness (Ra) can be obtained. , but can not get a smoother and more uniform surface, because the water-soluble inorganic salts can not completely adhere to the surface of the glass, causing the inorganic salts to slowly slide down, resulting in surface erosion for different lengths of time, resulting in different shades of concave Hole, and to avoid the aforementioned situation, therefore Other optional acid was added as an aid to enhance the adhesion ability of water-soluble inorganic salts, inorganic salt capable of eroding a long stay on the glass surface, creating more uniform erosion depth of the pocket.

b. Acid solution: the acid solution may be various organic or inorganic acids, and the material thereof is selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartaric acid or the like. Mixture, but the range of materials to be implemented is not limited to the above materials; the use of the aforementioned acid solution as an auxiliary material can enhance the ability of the water-soluble inorganic salt to adhere to the glass surface. Preferably, the acid solution is used in an amount of about The total weight ratio is 5% to 60%; when the acid solution is less than 5% by weight, the water-soluble inorganic salt is not easy to adhere to the glass surface, and when the acid usage is higher than 60% of the total weight ratio, The water-soluble inorganic salt is uniformly adhered to the surface of the glass, so that a low-reflection glass surface having uneven etching and poor flatness is caused.

c, a dispersing agent, which comprises 0.5% to 5% by weight, the dispersing agent being selected from one or a mixture of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid; the dispersing agent is selected from nitric acid ( HNO ₃ ), one of sulfuric acid (H ₂ SO ₄ ), hydrofluoric acid (HF), hydrochloric acid (HCl) or a mixture thereof, but the material range of the implementation is not limited to the above materials; the use of the aforementioned dispersant can promote water solubility The inorganic salt is uniformly attached to the surface of the glass. Preferably, the dispersant is used in an amount of about 0.5% to 5% by weight, and when the dispersant is less than 0.5% by weight, the water-soluble inorganic salt There is no effect of uniformly adhering to the surface of the glass, and when the amount of the dispersant used is 5% or more by weight, the ability of the water-soluble inorganic salt to adhere to the surface of the glass is lowered.

d. Stabilizer: The stabilizer is selected from the group consisting of tin ethyl mercaptan, magnesium chloride (MgCl ₂ ), sodium niobate (Na ₂ SiO ₃ ), one of organic nickel compounds or a mixture thereof, but the material is implemented. The range is not limited to the above materials; the stabilizer can be used to easily mix and stabilize the components in the etching solution, and the long-acting performance of the etching solution can be improved; preferably, the amount of the stabilizer is used. The total weight ratio is 1% to 10%. When the stabilizer is less than 1.0% by weight, the composition in the etching solution cannot be stably mixed and the long-acting performance is increased, but when the stabilizer is used in the total weight ratio Above 10%, the water-soluble inorganic salts are unable to chemically react with the glass material to form a low-reflective surface;

e. Deionized water, which accounts for the balance of the weight ratio of each of the above materials.

The etching liquid of the invention can erode the surface of the glass, and can change the surface morphology of the glass to form a surface having a glare-free low reflection effect; and the invention can enhance the inorganic salt by adding a dispersing agent and a stabilizer in the etching solution. The ability to attach and distribute the uniformity of the class to achieve a significant increase in product yield and finished product quality.

The present invention is not limited to the above-described embodiments, and it is obvious that there are more technical improvements and variations after referring to the above description; therefore, those skilled in the art have the same inventive spirit in the same inventive spirit. Any modifications or alterations are still intended to be included in the scope of the invention.

The above and other technical contents, features and effects of the present invention will be apparent from the following detailed description of the embodiments of the present invention. The scope of rights.

The optical glass of different materials and thicknesses is cut into a glass substrate of 10 cm * 5 cm size, and a corrosion-resistant mask of a silicone material is disposed on one of the surfaces to facilitate the soaking etching test of the single side of the glass.

Before the immersion etching, the glass surface cleaning operation is performed in advance, and then the glass substrate is placed in a working tank containing the etching liquid of the above-mentioned formula of the present invention, and the surface of the glass substrate is completely immersed in the etching liquid for etching (chemical milling) In the present embodiment, the working tank is a container made of an acid-resistant material and has a volume of about 1,000 ml.

In the test experiment described, at least a secondary soak etching process is included.

In the first soaking etching process, the acid-resistant container contains a first etching liquid having a composition of 10% to 35% by weight of a water-soluble inorganic salt (for example, potassium fluoride), and the total weight ratio is 5 % to 60% acid (for example, phosphoric acid), 0.5% to 5% by weight of a dispersant (for example, nitric acid), 1% to 10% by weight of a stabilizer (for example, ethyl mercaptan tin), and The remaining amount is deionized water; the embodiment is: maintaining the working temperature of the etching solution at about 45 ° C, and putting the tested glass substrate into a working tank containing the first etching liquid, so that the glass substrate is The surface is completely immersed in the first etching solution, and immersion etching is performed for about 20 minutes. After completion, the cleaning step is performed, and the surface of the glass substrate is cleaned with pure water.

In the second soaking etching process, the acid-resistant container is filled with a second etching liquid, which is composed of 15% to 45% by weight of hydrofluoric acid, and 15% to 45% by weight of the inorganic acid (total weight ratio). For example, phosphoric acid), a modifier (for example, malic acid) in a total weight ratio of 0.1% to 5%, and the balance being deionized water; the embodiment is: maintaining the working temperature of the etching solution at about 45 ° C, and going through The test glass substrate of the first soaking etching process is placed in a working tank containing the second etching liquid, and the surface of the glass substrate is completely immersed in the second etching liquid, and is carried out for about 30 minutes. The immersion etching is performed after the completion of the cleaning step, and the surface of the glass substrate is cleaned with pure water; after the second immersion etching process is completed, the glass substrate is taken out and a cleaning and drying process is performed to successively surface the glass substrate. Roughness and gloss test.

Example 1

A glass substrate of Asahi Glass (soda-Lime) and a thickness of about 1.10 mm was used as an experimental sample. After the aforementioned immersion etching step, the surface roughness and gloss test results of the glass substrate were listed in The following table.

Example 2

The optical alkali-free glass of Corning® Gorilla® Glass and the glass substrate with a thickness of about 0.72 mm were used as experimental samples. After the immersion etching step, the surface roughness and gloss of the glass substrate were tested. Listed in the table below.

It can be seen from the above experimental result data that the gloss rising speed of the surface of the glass substrate during the etching process will be more and more slowly rising due to the higher gloss, and thus will increase. The amount of etching on the surface of the glass substrate; in addition, the experimental results show that the 60° gloss of the surface of the glass substrate can be precisely controlled, so the present invention can regulate the 60° gloss by the second soaking etching process. High and low, to meet the needs of customers.

Claims (13)

A method for manufacturing a non-glare low-reflection glass surface, comprising the steps of: a. providing a glass substrate comprising at least one surface to be processed; b, providing a first etching liquid, the material composition of which at least comprises a water-soluble inorganic salt, an acid a liquid, a dispersing agent, a stabilizer, and a deionized water; c. performing a first etching process: applying the etching liquid to a surface to be processed of the glass substrate, and maintaining the temperature of the etching liquid between 40 ° C and 50 ° C, The action time is about 10 to 30 minutes, and then the surface to be processed is cleaned to remove the residual etching liquid, thereby forming a glass substrate having a low reflection surface; d, providing a second etching liquid, the material composition of which contains at least hydrogen a fluoric acid, a mineral acid, a modifier, and deionized water; and e, performing a second etching process, applying the second etching solution to the surface of the glass substrate to be processed by the first etching process to make the temperature of the etching solution Maintaining between 40 ° C and 50 ° C, the action time is about 20 to 40 minutes, and then the surface to be processed is cleaned to remove the residual etching liquid and dried to obtain a glare-free low reflection table. Glass substrate. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the material of the glass substrate is selected from the group consisting of sodium calcium silicate glass, sodium borosilicate glass, lead crystal glass, One of aluminum silicate glass and low iron glass. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the water-soluble inorganic salt of the first etching solution is selected from the group consisting of potassium fluoride, sodium hydrogencarbonate, potassium hydrogencarbonate, and hydrogen. One of or a mixture of hydrofluoric acid or ammonium perchlorate Compound. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the acid solution of the first etching solution is selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartaric acid or the like. And other mixtures. The method for producing a non-glare low-reflection glass surface according to claim 1, wherein the dispersing agent of the first etching liquid is selected from one of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or a mixture thereof. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the stabilizer of the first etching solution is selected from the group consisting of tin ethyl mercaptan, magnesium chloride, sodium niobate, and organic nickel compounds. One or a mixture of them. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the first etching solution comprises: a water-soluble inorganic salt in an amount of 10% to 35% by weight, based on a total weight ratio of 5 From 0.01% to 60% acid, from 0.5% to 5% by weight of the dispersant, from 1% to 10% by weight of the stabilizer, and the balance being deionized water. The method for producing a glare-free low-reflection glass surface according to claim 1, wherein the inorganic acid of the second etching solution is selected from one of phosphoric acid, hydrochloric acid, carbonic acid, chloric acid or a mixture thereof. The method for manufacturing a non-glare low-reflection glass surface according to claim 1, wherein the modifier of the second etching solution is selected from one or the other of malic acid, gluconic acid, sorbic acid, and citric acid. And other mixtures. The manufacturer of the glare-free low-reflection glass surface as described in claim 1 of the patent application scope The method, wherein the second etching solution comprises: 15% to 45% by weight of hydrofluoric acid, 15% to 45% by weight of the inorganic acid, and 0.1% to 5% by weight of the total weight The agent and the balance are deionized water. The method for manufacturing a non-glare low-reflection glass surface according to claim 1, further comprising: providing a mask having corrosion resistance on the glass substrate before the first etching process; The surface is shielded and only the surface to be processed is exposed. The method for manufacturing a non-glare low-reflection glass surface according to claim 1, wherein the second etching process is performed one or more times after the second etching process. An etchant capable of optimizing a surface of a glass, the composition comprising at least: a, a water-soluble inorganic salt, which accounts for 10% to 35% by weight, and the water-soluble inorganic salt is selected from potassium fluoride and carbonic acid. a mixture of sodium hydrogen carbonate, potassium hydrogencarbonate, hydrofluoric acid, ammonium perchlorate or a mixture thereof; b, an acid solution, which accounts for 5% to 60% by weight, the acid solution being selected from the group consisting of phosphoric acid and citric acid And one or a mixture of acetic acid, lactic acid, boric acid, tartaric acid; c, a dispersing agent, which is 0.5% to 5% by weight, and the dispersing agent is selected from one of nitric acid, sulfuric acid, hydrofluoric acid and hydrochloric acid. Or a mixture thereof; d, a stabilizer, which accounts for 1% to 10% by weight, the stabilizer is selected from one of tin ethyl mercaptan, magnesium chloride, sodium niobate, organic nickel compounds or the like. The mixture; and e, deionized water, the total weight ratio is the balance of the weight ratio of each of the foregoing materials.