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WO2009072496A1 - Nouveau dérivé de tricyclodécane et son procédé de fabrication - Google Patents

Nouveau dérivé de tricyclodécane et son procédé de fabrication Download PDF

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Publication number
WO2009072496A1
WO2009072496A1 PCT/JP2008/071894 JP2008071894W WO2009072496A1 WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1 JP 2008071894 W JP2008071894 W JP 2008071894W WO 2009072496 A1 WO2009072496 A1 WO 2009072496A1
Authority
WO
WIPO (PCT)
Prior art keywords
useful
excimer laser
optical
derivative compound
tricyclodecane derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/071894
Other languages
English (en)
Japanese (ja)
Inventor
Dai Oguro
Masatoshi Echigo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP2009544678A priority Critical patent/JP5504892B2/ja
Publication of WO2009072496A1 publication Critical patent/WO2009072496A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/13—Monohydroxylic alcohols containing saturated rings
    • C07C31/133—Monohydroxylic alcohols containing saturated rings monocyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/24—Halogenated derivatives
    • C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/12—Saturated ethers containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/40—Unsaturated compounds
    • C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
    • C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
    • C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
    • C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/67—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids
    • C07C69/675—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of saturated acids of saturated hydroxy-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
    • C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
    • C07C2603/68—Dicyclopentadienes; Hydrogenated dicyclopentadienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)

Abstract

L'invention porte sur les points suivants (1) à (3). (1) Un nouveau composé dérivé de tricyclodécane qui est utile comme modificateur pour une résine de photorésist utilisée dans le domaine de la photolithographie, agent améliorant la résistance à la gravure sèche ou intermédiaire de produit pour l'agriculture ou pharmaceutique, ou qui est utile pour être utilisé dans divers produits industriels ; et un procédé de fabrication du composé dérivé de tricyclodécane. (2) Un composé dérivé de tricyclodécane qui est utile pour être utilisé dans une résine réticulée, une matière optique pour une fibre optique, un guide d'ondes optique, un substrat de disque optique, un photorésist ou similaire, une matière première pour la matière optique, un intermédiaire de produit pharmaceutique ou pour l'agriculture, ou qui est utile pour être utilisé dans divers produits industriels. (3) Une résine fonctionnelle ayant d'excellentes propriétés de développement par les alcalis et une excellente adhésion à un substrat, qui peut être utilisée comme résist amplifié chimiquement sensible au rayonnement ultraviolet lointain exemplifié par un laser à excimère KrF, un laser à excimère ArF, un laser à excimère F2 ou un EUV, et qui peut parvenir à l'amélioration de la résolution ou de la rugosité de bord de ligne sans détériorer les propriétés physiques de base requises pour un résist, telles que les propriétés de formation de motif, la résistance à la gravure sèche et la résistance à la chaleur ; une composition de résine fonctionnelle ; et un composé matière première pour la composition de résine fonctionnelle.
PCT/JP2008/071894 2007-12-05 2008-12-02 Nouveau dérivé de tricyclodécane et son procédé de fabrication Ceased WO2009072496A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009544678A JP5504892B2 (ja) 2007-12-05 2008-12-02 新規なトリシクロデカン誘導体及びその製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007314688 2007-12-05
JP2007-314688 2007-12-05
JP2007316352 2007-12-06
JP2007-316352 2007-12-06

Publications (1)

Publication Number Publication Date
WO2009072496A1 true WO2009072496A1 (fr) 2009-06-11

Family

ID=40717674

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/071894 Ceased WO2009072496A1 (fr) 2007-12-05 2008-12-02 Nouveau dérivé de tricyclodécane et son procédé de fabrication

Country Status (3)

Country Link
JP (1) JP5504892B2 (fr)
TW (1) TW200940493A (fr)
WO (1) WO2009072496A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016106083A (ja) * 2010-07-30 2016-06-16 三菱瓦斯化学株式会社 化合物、感放射線性組成物及びレジストパターン形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028071A1 (fr) * 2004-09-10 2006-03-16 Mitsubishi Rayon Co., Ltd. Polymere de reserve, processus de production de celui-ci, composition de reserve, et processus de production de substrats a motifs
JP2006113140A (ja) * 2004-10-12 2006-04-27 Tokyo Ohka Kogyo Co Ltd 液浸露光用ポジ型レジスト組成物およびレジストパターン形成方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58121207A (ja) * 1982-01-14 1983-07-19 Kao Corp 三環式メチロ−ルのエステル又はエ−テル化合物並びにこれを含有する香料又はフレ−バ−組成物
JP2776273B2 (ja) * 1994-01-31 1998-07-16 日本電気株式会社 ビニル基を有する単量体
JP3736817B2 (ja) * 1996-07-12 2006-01-18 日本化薬株式会社 多官能ビニルエーテル、重合性組成物及びその硬化物
JP2002371115A (ja) * 2001-06-15 2002-12-26 Toagosei Co Ltd 活性エネルギー線硬化型樹脂シート形成剤
JP3783670B2 (ja) * 2002-09-09 2006-06-07 日本電気株式会社 ネガ型フォトレジスト組成物及びパターン形成方法
JP5396738B2 (ja) * 2007-05-09 2014-01-22 三菱瓦斯化学株式会社 感放射線性組成物、化合物、化合物の製造方法およびレジストパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006028071A1 (fr) * 2004-09-10 2006-03-16 Mitsubishi Rayon Co., Ltd. Polymere de reserve, processus de production de celui-ci, composition de reserve, et processus de production de substrats a motifs
JP2006113140A (ja) * 2004-10-12 2006-04-27 Tokyo Ohka Kogyo Co Ltd 液浸露光用ポジ型レジスト組成物およびレジストパターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016106083A (ja) * 2010-07-30 2016-06-16 三菱瓦斯化学株式会社 化合物、感放射線性組成物及びレジストパターン形成方法

Also Published As

Publication number Publication date
JPWO2009072496A1 (ja) 2011-04-21
JP5504892B2 (ja) 2014-05-28
TW200940493A (en) 2009-10-01

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