[go: up one dir, main page]

WO2009063955A1 - スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 - Google Patents

スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 Download PDF

Info

Publication number
WO2009063955A1
WO2009063955A1 PCT/JP2008/070715 JP2008070715W WO2009063955A1 WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1 JP 2008070715 W JP2008070715 W JP 2008070715W WO 2009063955 A1 WO2009063955 A1 WO 2009063955A1
Authority
WO
WIPO (PCT)
Prior art keywords
spacer
radiation
resin composition
sensitive resin
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/070715
Other languages
English (en)
French (fr)
Inventor
Hideyuki Nakamura
Kyohei Mochizuki
Kenta Yamazaki
Yuuichi Fukushige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to CN200880115544.5A priority Critical patent/CN101855597B/zh
Priority to JP2009541176A priority patent/JP5178737B2/ja
Publication of WO2009063955A1 publication Critical patent/WO2009063955A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

　高感度で、かつ、保存性に優れたスペーサー用感放射線性樹脂組成物、それを用いて形成したスペーサー、該スペーサーの形成方法、該スペーサーを備えた液晶表示素子を提供する。スペーサー形成用感放射線性樹脂組成物は、（Ａ）分岐構造および／または脂環構造と、酸性基と、エステル基を介してエチレン性不飽和基とを側鎖に有する樹脂、（Ｂ）重合性不飽和化合物、並びに（Ｃ）（Ｃ１）ヘキサアリールビイミダゾール化合物、（Ｃ２）芳香族メルカプト化合物、及び（Ｃ３）助剤を含有する。
PCT/JP2008/070715 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子 Ceased WO2009063955A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880115544.5A CN101855597B (zh) 2007-11-16 2008-11-13 间隔物形成用感放射线性树脂组合物、间隔物、间隔物的形成方法及液晶显示元件
JP2009541176A JP5178737B2 (ja) 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-298177 2007-11-16
JP2007298177 2007-11-16
JP2008113856 2008-04-24
JP2008-113856 2008-04-24

Publications (1)

Publication Number Publication Date
WO2009063955A1 true WO2009063955A1 (ja) 2009-05-22

Family

ID=40638803

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070715 Ceased WO2009063955A1 (ja) 2007-11-16 2008-11-13 スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子

Country Status (4)

Country Link
JP (1) JP5178737B2 (ja)
CN (1) CN101855597B (ja)
TW (1) TWI432894B (ja)
WO (1) WO2009063955A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130047656A (ko) * 2011-10-31 2013-05-08 히타치가세이가부시끼가이샤 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 인쇄 배선판의 제조 방법
KR20220110775A (ko) * 2019-12-02 2022-08-09 에네오스 가부시키가이샤 지환식 아크릴레이트 화합물, 지환식 에폭시 아크릴레이트 화합물, 경화성 조성물 및 경화물

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101299380B1 (ko) * 2005-03-02 2013-08-22 제이에스알 가부시끼가이샤 감방사선성 수지 조성물 및 액정 표시 소자용 스페이서

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016545A (ja) * 2004-07-02 2006-01-19 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2006276847A (ja) * 2005-03-02 2006-10-12 Jsr Corp 感放射線性樹脂組成物および液晶表示素子用スペーサー
JP2007148366A (ja) * 2005-10-25 2007-06-14 Hitachi Chem Co Ltd 液晶スペーサー及びその製造方法
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置
JP2007206217A (ja) * 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011006558A (ja) * 2009-06-24 2011-01-13 Showa Denko Kk 水系媒体に分散した光硬化性樹脂組成物
JP2013117716A (ja) * 2011-10-31 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2014081456A (ja) * 2012-10-16 2014-05-08 Sanyo Chem Ind Ltd 感光性樹脂組成物、硬化物およびスペーサー
JP2017049587A (ja) * 2015-09-03 2017-03-09 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. ネガ型感光性樹脂組成物及びそれから形成される光硬化性パターン及び当該光硬化性パターンを備える画像表示装置
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices

Also Published As

Publication number Publication date
JP5178737B2 (ja) 2013-04-10
TW200931177A (en) 2009-07-16
TWI432894B (zh) 2014-04-01
CN101855597A (zh) 2010-10-06
JPWO2009063955A1 (ja) 2011-03-31
CN101855597B (zh) 2012-12-12

Similar Documents

Publication Publication Date Title
WO2009063955A1 (ja) スペーサー形成用感放射線性樹脂組成物、スペーサー、スペーサーの形成方法、及び液晶表示素子
WO2009084909A3 (en) Optical film, protection film for polarizer, polarizing plate fabricated therefrom, and display device employing thereof
WO2012125009A3 (ko) 화학증폭형 포지티브 감광형 유기절연막 조성물 및 이를 이용한 유기절연막의 형성방법
WO2009041248A1 (ja) 接着剤組成物及び接合方法
WO2008064744A8 (en) A method of preparing polymer dispensed liquid crystal
EP2012150A4 (en) POLARIZING PLATE PROTECTION FILM, METHOD OF MANUFACTURING THEREOF, POLARIZATION PLATE AND LIQUID CRYSTAL DISPLAY
WO2009025951A3 (en) Page modules and states
WO2008126700A1 (ja) 光学フィルム、偏光板、液晶表示装置、及び紫外線吸収性ポリマー
WO2008136346A1 (ja) 表示画面用保護フィルムおよび偏光板
ATE479735T1 (de) Flüssigkristallanzeige
WO2013095482A3 (en) Refractive polarization converter and polarized color combiner
WO2012024070A3 (en) Radiation curable temporary laminating adhesive for use in high temperature applications
EP1887390A4 (en) GRID POLARIZATION FILM, METHOD FOR PRODUCING THE SAME, OPTICAL LAMINATE, MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY
WO2010107248A3 (ko) 디스플레이 필터 및 디스플레이 장치
TW200736776A (en) Liquid crystal display
WO2009139560A3 (en) Optical sheet
WO2006066969A3 (en) Sugarcane plants with an increased storage carbohydrate content
WO2010038978A3 (en) Photopolymer resin composition
WO2009003651A3 (de) Anzeigevorrichtung, insbesondere transparente multimediafassade
WO2008126699A1 (ja) 紫外線吸収性ポリマー、セルロースエステル光学フィルム、セルロースエステル光学フィルムの製造方法、偏光板、及び液晶表示装置
WO2008114689A1 (ja) 光学フィルム積層体およびその製造方法並びにそれを用いた表示装置
TW200643515A (en) Liquid crystal display device and method for fabricating the same
TW200736726A (en) Display device
TW200730989A (en) Method and apparatus for reducing back-glass deflection in an interferometric modulator display device
WO2008143470A3 (en) Polymerizable liquid crystal composition and optical film and device using the same

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880115544.5

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08850742

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009541176

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08850742

Country of ref document: EP

Kind code of ref document: A1