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WO2008130031A1 - 導電性反射膜及びその製造方法 - Google Patents

導電性反射膜及びその製造方法 Download PDF

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Publication number
WO2008130031A1
WO2008130031A1 PCT/JP2008/057595 JP2008057595W WO2008130031A1 WO 2008130031 A1 WO2008130031 A1 WO 2008130031A1 JP 2008057595 W JP2008057595 W JP 2008057595W WO 2008130031 A1 WO2008130031 A1 WO 2008130031A1
Authority
WO
WIPO (PCT)
Prior art keywords
reflecting film
pores
manufacturing
same
conductive reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/057595
Other languages
English (en)
French (fr)
Inventor
Kazuhiko Yamasaki
Yoshiaki Takata
Toshiharu Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to EP08740650A priority Critical patent/EP2139044B1/en
Priority to ES08740650T priority patent/ES2399370T3/es
Priority to US12/596,125 priority patent/US8758891B2/en
Priority to CN2008800123038A priority patent/CN101657908B/zh
Publication of WO2008130031A1 publication Critical patent/WO2008130031A1/ja
Anticipated expiration legal-status Critical
Priority to US13/572,360 priority patent/US10020409B2/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements
    • H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
    • H10F77/48—Back surface reflectors [BSR]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/52—PV systems with concentrators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/24997—Of metal-containing material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249978—Voids specified as micro
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249978—Voids specified as micro
    • Y10T428/249979—Specified thickness of void-containing component [absolute or relative] or numerical cell dimension

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biophysics (AREA)
  • Dispersion Chemistry (AREA)
  • Conductive Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

　この導電性反射膜は、金属ナノ粒子を焼成することにより形成される導電性反射膜であって、この膜の基材側の接触面に出現する気孔の平均直径は１００ｎｍ以下、この気孔が位置する平均深さは１００ｎｍ以下、この気孔の数密度は３０個／μｍ２以下である。
PCT/JP2008/057595 2007-04-19 2008-04-18 導電性反射膜及びその製造方法 Ceased WO2008130031A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP08740650A EP2139044B1 (en) 2007-04-19 2008-04-18 Conductive reflecting film and method for manufacturing the same
ES08740650T ES2399370T3 (es) 2007-04-19 2008-04-18 Película reflectante conductora y método de producción de la misma
US12/596,125 US8758891B2 (en) 2007-04-19 2008-04-18 Conductive reflective film and production method thereof
CN2008800123038A CN101657908B (zh) 2007-04-19 2008-04-18 导电性反射膜及其制备方法
US13/572,360 US10020409B2 (en) 2007-04-19 2012-08-10 Method for producing a conductive reflective film

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-110598 2007-04-19
JP2007110598 2007-04-19
JP2008-095008 2008-04-01
JP2008095008A JP5169389B2 (ja) 2007-04-19 2008-04-01 導電性反射膜の製造方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/596,125 A-371-Of-International US8758891B2 (en) 2007-04-19 2008-04-18 Conductive reflective film and production method thereof
US13/572,360 Division US10020409B2 (en) 2007-04-19 2012-08-10 Method for producing a conductive reflective film

Publications (1)

Publication Number Publication Date
WO2008130031A1 true WO2008130031A1 (ja) 2008-10-30

Family

ID=39875553

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057595 Ceased WO2008130031A1 (ja) 2007-04-19 2008-04-18 導電性反射膜及びその製造方法

Country Status (7)

Country Link
US (2) US8758891B2 (ja)
EP (1) EP2139044B1 (ja)
JP (1) JP5169389B2 (ja)
CN (1) CN101657908B (ja)
ES (1) ES2399370T3 (ja)
TW (1) TWI472041B (ja)
WO (1) WO2008130031A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102097513A (zh) * 2009-10-23 2011-06-15 三菱综合材料株式会社 导电性反射膜及其制造方法
WO2012063908A1 (ja) * 2010-11-12 2012-05-18 三菱マテリアル株式会社 発光素子向け反射膜用組成物、発光素子、および発光素子の製造方法
US20120247537A1 (en) * 2009-06-17 2012-10-04 Aaron Mei Glass system of a solar photovoltaic panel
JP2013077415A (ja) * 2011-09-30 2013-04-25 Mitsubishi Materials Corp 導電性反射膜用組成物および導電性反射膜の製造方法

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TWI401702B (zh) * 2010-02-10 2013-07-11 Cheng Uei Prec Ind Co Ltd 導電薄膜的製備方法
JP5741810B2 (ja) * 2011-02-23 2015-07-01 三菱マテリアル株式会社 発光素子向け反射膜用組成物、発光素子、および発光素子の製造方法
US10168451B2 (en) * 2011-11-04 2019-01-01 Cambrios Film Solutions Corporation Methods for reducing diffuse reflection of nanostructure-based transparent conductive films and touch panels made of the same
JP5948936B2 (ja) * 2012-02-20 2016-07-06 三菱マテリアル株式会社 導電性反射膜の製造方法
US20140178247A1 (en) 2012-09-27 2014-06-26 Rhodia Operations Process for making silver nanostructures and copolymer useful in such process
CN104616728B (zh) * 2015-01-26 2016-09-14 河南大学 一种以铜为内芯的纳米电缆透明导电薄膜及其制备方法
WO2017094166A1 (ja) * 2015-12-03 2017-06-08 ハリマ化成株式会社 導電性ペーストの製造方法
WO2017144555A1 (en) * 2016-02-23 2017-08-31 Basf Se Conductive paste comprising a silicone oil
CN105948528B (zh) * 2016-04-25 2019-03-19 上海西源新能源技术有限公司 一种高反射镀膜玻璃及其制备方法
CN106057359B (zh) * 2016-07-19 2018-08-10 中山大学 一种嵌入式多取向金属纳米线透明导电薄膜的制备方法

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CN101657908B (zh) 2012-08-15
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US20100126582A1 (en) 2010-05-27
US8758891B2 (en) 2014-06-24
EP2139044B1 (en) 2012-12-05
US20120308720A1 (en) 2012-12-06
EP2139044A1 (en) 2009-12-30
US10020409B2 (en) 2018-07-10
TWI472041B (zh) 2015-02-01

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