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WO2008129981A1 - 感光性平版印刷版材料 - Google Patents

感光性平版印刷版材料 Download PDF

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Publication number
WO2008129981A1
WO2008129981A1 PCT/JP2008/057334 JP2008057334W WO2008129981A1 WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1 JP 2008057334 W JP2008057334 W JP 2008057334W WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
plate material
lithographic printing
photosensitive lithographic
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/057334
Other languages
English (en)
French (fr)
Inventor
Emiko Kataoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Medical and Graphic Inc
Original Assignee
Konica Minolta Medical and Graphic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical and Graphic Inc filed Critical Konica Minolta Medical and Graphic Inc
Publication of WO2008129981A1 publication Critical patent/WO2008129981A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

　本発明は、支持体上に、重合開始剤、重合可能なエチレン性二重結合含有化合物、増感色素及び高分子結合材を含有する感光層を有する感光性平版印刷版材料において、該増感色素として下記一般式（１）で表される化合物を含有することを特徴とし、発光波長が３５０～４５０ｎｍのレーザー光での露光に適し、高感度で保存性に優れ、現像時のスラッジが発生し難く非画像部のインキ汚れが少ない感光性平版印刷版材料が提供できる。 　　【化１】
PCT/JP2008/057334 2007-04-18 2008-04-15 感光性平版印刷版材料 Ceased WO2008129981A1 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007109159 2007-04-18
JP2007-109159 2007-04-18
JP2007220808 2007-08-28
JP2007-220808 2007-08-28

Publications (1)

Publication Number Publication Date
WO2008129981A1 true WO2008129981A1 (ja) 2008-10-30

Family

ID=39875509

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057334 Ceased WO2008129981A1 (ja) 2007-04-18 2008-04-15 感光性平版印刷版材料

Country Status (1)

Country Link
WO (1) WO2008129981A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (ja) * 2014-08-13 2016-02-18 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (en) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
JP2005221542A (ja) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版及び平版印刷版の記録方法
WO2006008073A2 (en) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Lithographic printing plates with high print run stability
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
JP2006243365A (ja) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006259319A (ja) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料、画像形成方法及び感光性平版印刷版の製版方法
JP2007233127A (ja) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc 感光性平版印刷版材料

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (en) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon
JP2005221542A (ja) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版及び平版印刷版の記録方法
WO2006008073A2 (en) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Lithographic printing plates with high print run stability
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
JP2006243365A (ja) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006259319A (ja) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料、画像形成方法及び感光性平版印刷版の製版方法
JP2007233127A (ja) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc 感光性平版印刷版材料

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (ja) * 2014-08-13 2016-02-18 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤
KR20170040243A (ko) * 2014-08-13 2017-04-12 닛뽕소다 가부시키가이샤 디아릴이미다졸 화합물 및 유해 생물 방제제
CN106573894A (zh) * 2014-08-13 2017-04-19 日本曹达株式会社 二芳基咪唑化合物和有害生物防除剂
JPWO2016024587A1 (ja) * 2014-08-13 2017-05-25 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤
US10021880B2 (en) 2014-08-13 2018-07-17 Nippon Soda Co., Ltd. Diarylimidazole compound and harmful organism control agent
JP2020114827A (ja) * 2014-08-13 2020-07-30 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤
EP3766871A1 (en) * 2014-08-13 2021-01-20 Nippon Soda Co., Ltd. Diarylimidazole compound and pest control agent
KR102447094B1 (ko) * 2014-08-13 2022-09-23 닛뽕소다 가부시키가이샤 디아릴이미다졸 화합물 및 유해 생물 방제제

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