WO2008084599A1 - 感光性平版印刷版材料 - Google Patents
感光性平版印刷版材料 Download PDFInfo
- Publication number
- WO2008084599A1 WO2008084599A1 PCT/JP2007/072649 JP2007072649W WO2008084599A1 WO 2008084599 A1 WO2008084599 A1 WO 2008084599A1 JP 2007072649 W JP2007072649 W JP 2007072649W WO 2008084599 A1 WO2008084599 A1 WO 2008084599A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- printing plate
- plate material
- lithographic printing
- compound
- double bond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Abstract
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008553014A JPWO2008084599A1 (ja) | 2007-01-10 | 2007-11-22 | 感光性平版印刷版材料 |
| US12/522,300 US20100040978A1 (en) | 2007-01-10 | 2007-11-22 | Photosensitive lithographic printing plate material |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007002238 | 2007-01-10 | ||
| JP2007-002238 | 2007-01-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008084599A1 true WO2008084599A1 (ja) | 2008-07-17 |
Family
ID=39608497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/072649 Ceased WO2008084599A1 (ja) | 2007-01-10 | 2007-11-22 | 感光性平版印刷版材料 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20100040978A1 (ja) |
| JP (1) | JPWO2008084599A1 (ja) |
| WO (1) | WO2008084599A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007171406A (ja) * | 2005-12-20 | 2007-07-05 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| WO2018181556A1 (ja) * | 2017-03-29 | 2018-10-04 | 旭化成株式会社 | 感光性樹脂組成物 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101438209A (zh) * | 2006-05-09 | 2009-05-20 | 柯尼卡美能达医疗印刷器材株式会社 | 光敏性平版印刷板材料 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10193825A (ja) * | 1996-12-23 | 1998-07-28 | Agfa Gevaert Nv | 熱により像形成可能な材料 |
| JP2001125255A (ja) * | 1999-10-27 | 2001-05-11 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP2003295426A (ja) * | 2002-03-28 | 2003-10-15 | Agfa Gevaert Nv | 300〜450nmの波長範囲に関して増感された光重合可能な組成物 |
| WO2006090623A1 (ja) * | 2005-02-25 | 2006-08-31 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
| WO2007102322A1 (ja) * | 2006-03-06 | 2007-09-13 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
| WO2007129576A1 (ja) * | 2006-05-09 | 2007-11-15 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3710282A1 (de) * | 1987-03-28 | 1988-10-13 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| EP0851296B1 (en) * | 1996-12-23 | 2002-06-26 | Agfa-Gevaert | Thermally imageable material |
| US6468711B1 (en) * | 1998-09-09 | 2002-10-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition and method for manufacturing lithographic printing plate |
| US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
| WO2004035546A1 (en) * | 2002-10-15 | 2004-04-29 | Showa Denko K. K. | Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same |
-
2007
- 2007-11-22 WO PCT/JP2007/072649 patent/WO2008084599A1/ja not_active Ceased
- 2007-11-22 JP JP2008553014A patent/JPWO2008084599A1/ja active Pending
- 2007-11-22 US US12/522,300 patent/US20100040978A1/en not_active Abandoned
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10193825A (ja) * | 1996-12-23 | 1998-07-28 | Agfa Gevaert Nv | 熱により像形成可能な材料 |
| JP2001125255A (ja) * | 1999-10-27 | 2001-05-11 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP2003295426A (ja) * | 2002-03-28 | 2003-10-15 | Agfa Gevaert Nv | 300〜450nmの波長範囲に関して増感された光重合可能な組成物 |
| WO2006090623A1 (ja) * | 2005-02-25 | 2006-08-31 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
| WO2007102322A1 (ja) * | 2006-03-06 | 2007-09-13 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
| WO2007129576A1 (ja) * | 2006-05-09 | 2007-11-15 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007171406A (ja) * | 2005-12-20 | 2007-07-05 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| WO2018181556A1 (ja) * | 2017-03-29 | 2018-10-04 | 旭化成株式会社 | 感光性樹脂組成物 |
| JPWO2018181556A1 (ja) * | 2017-03-29 | 2019-08-08 | 旭化成株式会社 | 感光性樹脂組成物 |
| KR20190100968A (ko) * | 2017-03-29 | 2019-08-29 | 아사히 가세이 가부시키가이샤 | 감광성 수지 조성물 |
| KR102295744B1 (ko) | 2017-03-29 | 2021-08-30 | 아사히 가세이 가부시키가이샤 | 감광성 수지 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2008084599A1 (ja) | 2010-04-30 |
| US20100040978A1 (en) | 2010-02-18 |
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| 122 | Ep: pct application non-entry in european phase |
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