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WO2008129981A1 - Matériau de plaque d'impression lithographique photosensible - Google Patents

Matériau de plaque d'impression lithographique photosensible Download PDF

Info

Publication number
WO2008129981A1
WO2008129981A1 PCT/JP2008/057334 JP2008057334W WO2008129981A1 WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1 JP 2008057334 W JP2008057334 W JP 2008057334W WO 2008129981 A1 WO2008129981 A1 WO 2008129981A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
plate material
lithographic printing
photosensitive lithographic
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/057334
Other languages
English (en)
Japanese (ja)
Inventor
Emiko Kataoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Medical and Graphic Inc
Original Assignee
Konica Minolta Medical and Graphic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical and Graphic Inc filed Critical Konica Minolta Medical and Graphic Inc
Publication of WO2008129981A1 publication Critical patent/WO2008129981A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

L'invention concerne un matériau de plaque d'impression lithographique photosensible qui a, sur un corps de soutien, une couche photosensible contenant un amorceur de polymérisation, un composé contenant une double liaison éthylénique polymérisable, un colorant de sensibilisation et un liant polymère. Ce matériau de plaque d'impression lithographique photosensible est caractérisé par le fait de comprendre un composé représenté par la formule générale (1) ci-dessous comme colorant de sensibilisation. Ce matériau de plaque d'impression lithographique photosensible convient pour une exposition à une lumière laser ayant une longueur d'onde d'émission allant de 350 à 450 nm, tout en ayant une sensibilité élevée et une excellente stabilité de stockage. Dans ce matériau de plaque d'impression lithographique photosensible, une boue est difficilement produite pendant le développement, et une tache d'encre dans une zone de non-image est supprimée. (1)
PCT/JP2008/057334 2007-04-18 2008-04-15 Matériau de plaque d'impression lithographique photosensible Ceased WO2008129981A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007109159 2007-04-18
JP2007-109159 2007-04-18
JP2007220808 2007-08-28
JP2007-220808 2007-08-28

Publications (1)

Publication Number Publication Date
WO2008129981A1 true WO2008129981A1 (fr) 2008-10-30

Family

ID=39875509

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057334 Ceased WO2008129981A1 (fr) 2007-04-18 2008-04-15 Matériau de plaque d'impression lithographique photosensible

Country Status (1)

Country Link
WO (1) WO2008129981A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (fr) * 2014-08-13 2016-02-18 日本曹達株式会社 Composé de diarylimidazole et agent de lutte antiparasitaire

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (fr) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Compositions radiosensibles et elements pouvant former une image a base de telles compositions
JP2005221542A (ja) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版及び平版印刷版の記録方法
WO2006008073A2 (fr) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Plaques d'impression lithographique a grande stabilite d'impression
WO2006090623A1 (fr) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Materiau de plaque d'impression lithographique photosensible
JP2006243365A (ja) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006259319A (ja) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料、画像形成方法及び感光性平版印刷版の製版方法
JP2007233127A (ja) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc 感光性平版印刷版材料

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074930A2 (fr) * 2003-02-21 2004-09-02 Kodak Polychrome Graphics Gmbh Compositions radiosensibles et elements pouvant former une image a base de telles compositions
JP2005221542A (ja) * 2004-02-03 2005-08-18 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版及び平版印刷版の記録方法
WO2006008073A2 (fr) * 2004-07-16 2006-01-26 Kodak Polychrome Graphics Gmbh Plaques d'impression lithographique a grande stabilite d'impression
WO2006090623A1 (fr) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Materiau de plaque d'impression lithographique photosensible
JP2006243365A (ja) * 2005-03-03 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006259319A (ja) * 2005-03-17 2006-09-28 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版材料、画像形成方法及び感光性平版印刷版の製版方法
JP2007233127A (ja) * 2006-03-02 2007-09-13 Konica Minolta Medical & Graphic Inc 感光性平版印刷版材料

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016024587A1 (fr) * 2014-08-13 2016-02-18 日本曹達株式会社 Composé de diarylimidazole et agent de lutte antiparasitaire
KR20170040243A (ko) * 2014-08-13 2017-04-12 닛뽕소다 가부시키가이샤 디아릴이미다졸 화합물 및 유해 생물 방제제
CN106573894A (zh) * 2014-08-13 2017-04-19 日本曹达株式会社 二芳基咪唑化合物和有害生物防除剂
JPWO2016024587A1 (ja) * 2014-08-13 2017-05-25 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤
US10021880B2 (en) 2014-08-13 2018-07-17 Nippon Soda Co., Ltd. Diarylimidazole compound and harmful organism control agent
JP2020114827A (ja) * 2014-08-13 2020-07-30 日本曹達株式会社 ジアリールイミダゾール化合物および有害生物防除剤
EP3766871A1 (fr) * 2014-08-13 2021-01-20 Nippon Soda Co., Ltd. Composé de diarylimidazole et agent de lutte antiparasitaire
KR102447094B1 (ko) * 2014-08-13 2022-09-23 닛뽕소다 가부시키가이샤 디아릴이미다졸 화합물 및 유해 생물 방제제

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