WO2008119309A2 - Wärmesenke sowie bau- oder moduleinheit mit einer wärmesenke - Google Patents
Wärmesenke sowie bau- oder moduleinheit mit einer wärmesenke Download PDFInfo
- Publication number
- WO2008119309A2 WO2008119309A2 PCT/DE2007/002186 DE2007002186W WO2008119309A2 WO 2008119309 A2 WO2008119309 A2 WO 2008119309A2 DE 2007002186 W DE2007002186 W DE 2007002186W WO 2008119309 A2 WO2008119309 A2 WO 2008119309A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- heat sink
- cooling
- ceramic
- compensating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02476—Heat spreaders, i.e. improving heat flow between laser chip and heat dissipating elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20436—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing
- H05K7/20445—Inner thermal coupling elements in heat dissipating housings, e.g. protrusions or depressions integrally formed in the housing the coupling element being an additional piece, e.g. thermal standoff
- H05K7/20472—Sheet interfaces
- H05K7/20481—Sheet interfaces characterised by the material composition exhibiting specific thermal properties
-
- H10W40/255—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0235—Method for mounting laser chips
- H01S5/02355—Fixing laser chips on mounts
- H01S5/0237—Fixing laser chips on mounts by soldering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02469—Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
- H05K3/0061—Laminating printed circuit boards onto other substrates, e.g. metallic substrates onto a metallic substrate, e.g. a heat sink
-
- H10W72/5363—
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- H10W72/884—
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- H10W74/00—
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- H10W90/00—
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- H10W90/734—
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- H10W90/753—
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- H10W90/754—
Definitions
- the invention relates to a heat sink according to the preamble of claim 1 or 3 and to a modular unit according to claim 22.
- Heat sinks are also known for this purpose, in the heat sink of which at least one, preferably highly branched cooling channel structure is formed, which can be flowed through by a liquid and / or gaseous and / or vaporous heat transport medium or cooling medium, for example water.
- solder joint between the component or assembly and the heat sink has u.a. also the advantage that both components can be prepared separately and are connected to each other after their production.
- DCB method direct copper bond technology
- metal layers or sheets eg copper sheets or sheets
- metal sheets eg copper sheets or sheets
- copper sheets or metal or copper foils which have on their surface sides a layer or coating (reflow layer) of a chemical compound of the metal and a reactive gas, preferably oxygen, in this example in US-PS 3,744,120 or in US Pat DE-PS 23 19 854 described method
- this layer or coating forms a eutectic having a melting temperature below the melting temperature of the metal (eg copper), so that by placing the film on the ceramic and by heating all layers connected to each other can be, by melting the metal or copper substantially only in the range of Aufsc melt layer or oxide layer.
- This DCB method then indicates e.g. the following process steps:
- active soldering process for example for joining metal layers or metal foils forming metallizations, in particular also copper layers or copper foils with ceramic material.
- active soldering process which is also used especially for the production of metal-ceramic substrates, at a temperature between about 800 - 1000 0 C, a connection between a metal foil, such as copper foil, and a ceramic substrate, such as aluminum nitride ceramic, using a brazing filler metal, which also contains an active metal in addition to a main component such as copper, silver and / or gold.
- This active metal which is, for example, at least one element of the group Hf, Ti, Zr, Nb, Ce, establishes a connection between the solder and the ceramic by chemical reaction, while the connection between the solder and the metal is a metallic braze joint ,
- the object of the invention is to provide a heat sink, which avoids the aforementioned disadvantages.
- a heat sink according to claim 1 or 3 is formed.
- a building or module unit with a heat sink is the subject of claim 22.
- a module or module is achieved, in particular also between the metallic heat sink and one with this over the Solder connection connected metal-ceramic substrate or with another substrate or intermediate carrier, which consists of a deviating from the heat sink material, for example of a material or metal, which or has a relation to the heat sink reduced thermal expansion coefficient.
- FIG. 1 shows a schematic representation of an arranged on a heat sink of a heat sink electronic power module.
- 2 and 3 show the temperature profile of the power module as a function of time when switching on or activating the module ( Figure 2) and when switching off or deactivating the module ( Figure 3), and at different
- Fig. 4 is a schematic representation of the structure of the module according to the
- FIG. 5-7 in a schematic representation of further embodiments of the invention.
- 1 electrical or electronic power module is essentially composed of a ceramic-metal substrate 2, namely a DCB substrate made of a ceramic layer 3, which is provided with a metallization 4 on both sides.
- the metallizations 4 and 5, for example, each formed of copper foils, with Help the DCB technology are applied flat on the relevant surface side of the ceramic layer 3.
- the ceramic layer 3 consists, for example, of an aluminum oxide ceramic (AbOs ceramic) or an aluminum nitride ceramic (AlN ceramic).
- the thickness of the ceramic layer 3 is for example in the range between 0.2 and 2 mm.
- the metallization 4 on the upper side of the ceramic layer 3 is structured to form conductor tracks, contact surfaces, etc.
- a power device 6 e.g. In the form of an electronic switching element (IGBT) and other, serving for driving components 7.
- the components 6 and 7 are housed in a closed housing 8, which, for example. made of plastic.
- the interior 9 of the housing 8 is potted with a suitable material.
- corresponding terminals 10 are led out at the top of the housing.
- heatsink 11 which serves as a heat sink for dissipating the heat loss generated by the module 1 and to which the metallization 5 is connected in a good heat transfer ensuring manner
- the heat sink 1 1 is plate-shaped or cuboidal, with an upper side 11.1, a bottom 11.2, with two longitudinal sides 1 1.3 and with end faces 11.4 and 11.5, which together with the longitudinal sides 11.3 of the peripheral surface of the heat sink 1 1 form.
- Figures 2 and 3 initially show in principle the temperature / time profile of the module 1 and thus also the base of this module 1 forming ceramic metal substrate 2 when activating or switching on the module ( Figure 2) and when switching off or deactivating of the module 1 ( Figure 3), each for a air-cooled heat sink 12 (curve LK) and a liquid- or water-cooled heat sink 1 1 (curve VVK).
- LK air-cooled heat sink 12
- VVK liquid- or water-cooled heat sink 1
- the temperature T slows down to the operating temperature with time t, while with a water-cooled heat sink 11, a relatively steep temperature rise occurs, the temperature gradient, i.e., the temperature gradient.
- the change in temperature with time t is relatively abrupt.
- the temperature T decreases relatively slowly and steadily after deactivation, while in a liquid-cooled heat sink 1 1 a very abrupt temperature change occurs, so even when deactivating the temperature gradient (change in temperature as a function of time t) much larger is than in an air-cooled heat sink 11, wherein the absolute cooling capacity in a water-cooled heat sink 1 1 is of course much higher.
- the thermal expansion coefficient given in e -10 "6 / K 0 is given for different materials, namely of aluminum, silicon, copper, aluminum nitride ceramics (AlN), alumina ceramics (Al2O3), for DCB Substrates with alumina ceramic (Al 2O3-DC B substrates) and for DCB substrates with an aluminum nitride ceramic (AIN-DCB substrates).
- heat sink according to the heat sink 1 1 usually metals with high thermal conductivity, ie copper or aluminum are used, it can be seen from the illustration of Figure 4, that in the module structure or the module unit of Figure 1 consisting of the module 1 and the heat sink 1 1 alone due to the different thermal expansion coefficient e of the substrate 2 and the example consisting of copper heatsink 1 1 significant voltages within the module unit occur, which act (voltages) substantially in the solder layer 12, that is taken from this s partly compensated.
- the solder layer 12 is as thin as possible. The thickness of the solder layer 12 is as thin as possible. The thickness
- the module 1 is not in continuous operation, but in switching mode or intermittently operated, as is the case, for example, in a module for controlling or switching drives, etc., so occur in the solder layer 12 quite significant, constantly changing mechanical stresses on, in particular in a water- or liquid-cooled heat sink 11 cause a high shock load of the solder layer 12. This can lead to a destruction of the solder joint between the module 1 and the heat sink 11 and thus ultimately to a destruction of the module 1 due to the lack of sufficient cooling.
- the load of the solder layer 12 by the different thermal expansion coefficient of the adjacent ceramic-metal substrate 2 and the heat sink 11 increases with the reduction of the thickness of this solder layer and is also dependent on the composition of the solder of the solder layer 12. Particularly high is the load of the solder layer 12 when a lead-free solder is used for this layer, as is increasingly required for reasons of environmental relief.
- lead-free solders are, for example, SnAg5, SnCu3.
- the heat sink 11 is provided on its upper side 11.1 or cooling surface to be connected to the substrate 1 with a leveling layer 13 which consists of a material with high thermal conductivity and a thermal coefficient of thermal expansion which is reduced compared to copper and aluminum e consists, ie of a material with a thermal expansion coefficient e less than 10 x 10 ⁇ 6 / ° K.
- the leveling layer 13 which has a thermal conductivity greater than 100 W / mK and whose thickness is for example in the range between 0.05 and 2 mm, is without any intermediate layer, that is applied directly to the heat sink 11 and to the metal (for example copper) of this heat sink 11 and consists for example of Mo, W, Mo-Cu, W-Cu, Cu-diamond and / or Cu-CNF (copper with Carbon nanotubes or carbon nanofibers).
- the thickness of the compensating layer 13 to the thickness of the ceramic layer 3 is preferably adjusted so that the ratio "thickness of the compensation layer 13 / thickness of the ceramic layer 3" is in the range between 1.3 and 0.25 , In a preferred embodiment of the invention, the thickness of the leveling layer 13 is in the range between 0.05 and 3 mm.
- the application of the leveling layer 3 on the metallic surface of the heat sink 1 1 is carried out by suitable surface methods, for example by plating, e.g. Explosion plating, by metal cold spraying, by thermal metal spraying, for example molten bath spraying, flame spraying, flame spraying, arc spraying, plasma spraying, etc.
- plating e.g. Explosion plating
- metal cold spraying by metal cold spraying
- thermal metal spraying for example molten bath spraying, flame spraying, flame spraying, arc spraying, plasma spraying, etc.
- an adjustment of the thermal expansion coefficient takes place on both sides of the solder layer 12 provided components and thus a relief of the solder layer 12 in particular during a stop and go operation of the module 1 and the resulting permanent change in temperature of the module 1 and the ceramic and metal substrate 2.
- This relief is particularly advantageous because of the high temperature gradient in an active heat sink, ie, in a heat sink, within its Heatsink 11 with flowed through by a gaseous and / or vaporous and / or liquid medium cooling channels and which are designed for optimum cooling as possible, for example, that the inner, with the cooling medium in contact heat exchange or cooling surface is substantially larger, for example by at least a factor of 2 or a factor of 4 is greater than the outer, with the module 1 related cooling surface.
- a symmetrical with respect to the temperature behavior training of the heat sink 1 1 is also provided on its module 1 side facing away from the underside with a compensation layer 13 corresponding additional layer 13 a, which then preferably a larger compared to the thickness of the compensation layer 13 Thickness.
- FIG. 6 shows, in a simplified representation, an arrangement 14, which in turn is made of the ceramic-metal substrate 2, which is, for example, a component of a module (not shown in detail in this figure) and of the ceramic-metal substrate 2 via a soldered connection (FIG. Lot für 12) connected heat sink 11 is made, which is made at least at its surface connected to the ceramic-metal substrate surface side of copper.
- the intermediate or compensation layer 13 is applied on the heat sink 1 1, in turn.
- a further intermediate layer 15 of nickel or a nickel alloy for example of a nickel-silver alloy or another alloy, which contains at least one metal, which also forms part of the solder of the solder layer 12, is applied to the layer 13 is, which adjoins the intermediate layer 15 and connects this intermediate layer and thus the heat sink 1 1 with the ceramic-metal substrate.
- FIG. 7 shows, in an enlarged partial view, the heat sink 11 together with a laser bar 12 which, with its longitudinal extension, is perpendicular to the plane of the drawing 7 is oriented and has a plurality of laser light-emitting emitters, which are provided longitudinally offset in laser bars against each other.
- the heat sink 1 1 is again plate or cuboid running, with the top 1.1, the bottom 11.2, the longitudinal sides 1 1.3 and the end faces 11.4 and 11.5.
- the laser bar 12 is provided on the upper side 11.1 in the region of an end face 1 1.5, in such a way that it is oriented with its longitudinal extent parallel to this end face and the upper side 11.1, ie perpendicular to the plane of the figure 7 and with its laser light exit side in is approximately flush with the front side 11.5.
- a compensation layer 13 is applied to the upper side 11.1 and to the lower side 11.2.
- laser bar 16 is soldered, via the provided between the leveling layer 13 and the intermediate carrier 17 (Submount) solder layer 18.
- the connection between the laser bar 16 and the intermediate carrier 17 is likewise formed by a solder layer 19, in such a way that the laser bar with its laser light exit side is flush with a longitudinal side or longitudinal edge of the over the entire length of the laser bar 16 extending intermediate carrier 17, the latter but with its other longitudinal side on the back of the laser bar 16 stands.
- the compensation layer 13 By means of the compensation layer 13, an alignment between the different coefficients of thermal expansion of the heat sink 1 1 made of copper or aluminum and the intermediate support 17 made of Cu-Mo is achieved in this embodiment as well, thus relieving the solder layer 18.
- the compensation layer 13 opposite to the underside 11.2 a corresponding layer 13a is applied, in such a way that the thickness of the layer 13a is greater than the thickness of the compensation layer 13, but is smaller than the sum of the thicknesses of the compensation layer 13 and the intermediate carrier 17th
- compensation layer 13 and / or counter-layer 13a those made of sputtered ceramics or high-strength metals are also possible.
- the compensation layer 13 and / or counter-layer 13a as composite layers, in one or more layers or layers, wherein e.g. each layer of several different materials, e.g. is made of different metals or alloys of different metals, or e.g. different layers of different materials or material mixtures (for example, metal alloys) exist, which are then applied, for example, with different methods.
- a metallic layer e.g., Cu layer
- another layer e.g., ceramic layer
- layers or layers of diamond, carbon, and / or carbon nanofibers may be used e.g. be applied by CVD (Chemical Vapor Deposition), these layers or layers can then be coated with Cu powder cold gas.
- CVD Chemical Vapor Deposition
- the heat sink 11 may also be part of a so-called heat pipe, in which case the layers 13 and / or 13a also serve to seal risk zones with respect to leaks and contribute to an improvement in the life of a building or modular unit alone. LIST OF REFERENCE NUMBERS
- ceramic-metal substrate in particular ceramic-copper substrate
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07846389A EP2132772A2 (de) | 2007-03-30 | 2007-12-04 | Wärmesenke sowie bau- oder moduleinheit mit einer wärmesenke |
| US12/450,505 US8559475B2 (en) | 2007-03-30 | 2007-12-04 | Heat sink and assembly or module unit |
| CN2007800524433A CN101641786B (zh) | 2007-03-30 | 2007-12-04 | 具有散热装置的模块单元 |
| JP2010500059A JP5429819B2 (ja) | 2007-03-30 | 2007-12-04 | モジュールユニット |
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007015771 | 2007-03-30 | ||
| DE102007015771.3 | 2007-03-30 | ||
| DE102007027991.6 | 2007-06-14 | ||
| DE102007027991 | 2007-06-14 | ||
| DE102007030389.2A DE102007030389B4 (de) | 2007-03-30 | 2007-06-29 | Moduleinheit mit einer Wärmesenke |
| DE102007030389.2 | 2007-06-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2008119309A2 true WO2008119309A2 (de) | 2008-10-09 |
| WO2008119309A3 WO2008119309A3 (de) | 2009-02-19 |
Family
ID=39719647
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2007/002186 Ceased WO2008119309A2 (de) | 2007-03-30 | 2007-12-04 | Wärmesenke sowie bau- oder moduleinheit mit einer wärmesenke |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8559475B2 (de) |
| EP (1) | EP2132772A2 (de) |
| JP (1) | JP5429819B2 (de) |
| CN (1) | CN101641786B (de) |
| DE (1) | DE102007030389B4 (de) |
| WO (1) | WO2008119309A2 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102024204732A1 (de) * | 2024-05-23 | 2025-11-27 | Robert Bosch Gesellschaft mit beschränkter Haftung | Kühleranordnung sowie Verfahren zu dessen Herstellung |
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| US8081462B2 (en) * | 2007-09-13 | 2011-12-20 | Rockwell Automation Technologies, Inc. | Modular liquid cooling system |
| DE102009042518A1 (de) * | 2009-09-16 | 2011-03-24 | Esw Gmbh | Vorrichtung zur Kühlung von Halbleitern |
| JP5191527B2 (ja) * | 2010-11-19 | 2013-05-08 | 日本発條株式会社 | 積層体および積層体の製造方法 |
| JP5848874B2 (ja) * | 2011-01-07 | 2016-01-27 | 日本発條株式会社 | 温度調節装置およびこの温度調節装置の製造方法 |
| DE102011076774A1 (de) * | 2011-05-31 | 2012-12-06 | Continental Automotive Gmbh | Baugruppe mit einem Träger und einem Kühlkörper |
| JP2013055218A (ja) * | 2011-09-05 | 2013-03-21 | Kiko Kagi Kofun Yugenkoshi | 放熱装置 |
| JP5409740B2 (ja) * | 2011-09-28 | 2014-02-05 | 日本発條株式会社 | 放熱構造体、パワーモジュール、放熱構造体の製造方法およびパワーモジュールの製造方法 |
| DE102012102611B4 (de) * | 2012-02-15 | 2017-07-27 | Rogers Germany Gmbh | Metall-Keramik-Substrat sowie Verfahren zum Herstellen eines Metall-Keramik-Substrates |
| CN104704629A (zh) * | 2012-10-16 | 2015-06-10 | 富士电机株式会社 | 冷却构造体和发热体 |
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| JP5880519B2 (ja) * | 2013-10-21 | 2016-03-09 | トヨタ自動車株式会社 | 車載電子装置 |
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| CN104750207A (zh) * | 2013-12-30 | 2015-07-01 | 鸿富锦精密工业(武汉)有限公司 | 散热模组 |
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| CN111326949B (zh) * | 2018-12-15 | 2023-04-11 | 深圳市中光工业技术研究院 | 激光器芯片的制造方法及激光器芯片 |
| DE102019113308A1 (de) * | 2019-05-20 | 2020-11-26 | Rogers Germany Gmbh | Verfahren zur Herstellung eines Metall-Keramik-Substrats und Metall-Keramik- Substrat, hergestellt mit einem solchen Verfahren |
| US20210410331A1 (en) * | 2020-06-25 | 2021-12-30 | Intel Corporation | Integrated circuit die thermal solutions with a contiguously integrated heat pipe |
| CN111933594A (zh) * | 2020-07-16 | 2020-11-13 | 杰群电子科技(东莞)有限公司 | 一种功率半导体结构及功率半导体结构的封装方法 |
| FR3152104A1 (fr) * | 2023-08-08 | 2025-02-14 | Renault S.A.S. | Procédé de fabrication d’un circuit imprimé comprenant un substrat portant une couche de cuivre |
| CN120638018A (zh) * | 2025-06-19 | 2025-09-12 | 中国科学院合肥物质科学研究院 | 一种用于OHx探测的大能量板条激光器散热系统 |
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| US3744120A (en) | 1972-04-20 | 1973-07-10 | Gen Electric | Direct bonding of metals with a metal-gas eutectic |
| DE2213115A1 (de) | 1972-03-17 | 1973-09-27 | Siemens Ag | Verfahren zum hochfesten verbinden von karbiden, einschliesslich des diamanten, boriden, nitriden, siliziden mit einem metall nach dem trockenloetverfahren |
| DE2319854A1 (de) | 1972-04-20 | 1973-10-25 | Gen Electric | Verfahren zum direkten verbinden von metallen mit nichtmetallischen substraten |
| EP0153618A2 (de) | 1984-02-24 | 1985-09-04 | Kabushiki Kaisha Toshiba | Verfahren zur Herstellung eines hochwärmeleitenden Substrates und Kupferleiterblech verwendbar in diesem Verfahren |
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| DE10234704A1 (de) * | 2002-07-30 | 2004-02-19 | Osram Opto Semiconductors Gmbh | Halbleitervorrichtung mit Kühlelement |
| AT412265B (de) * | 2002-11-12 | 2004-12-27 | Electrovac | Bauteil zur wärmeableitung |
| JP2004200571A (ja) * | 2002-12-20 | 2004-07-15 | Mitsubishi Materials Corp | パワーモジュール用基板及びその製造方法、パワーモジュール |
| US7112472B2 (en) * | 2003-06-25 | 2006-09-26 | Intel Corporation | Methods of fabricating a composite carbon nanotube thermal interface device |
| JP2005079580A (ja) * | 2003-08-29 | 2005-03-24 | Osram Opto Semiconductors Gmbh | 複数の発光領域を有するレーザー装置 |
| US20060045153A1 (en) * | 2004-08-31 | 2006-03-02 | Carter Serrena M | Low thermal expansion coefficient cooler for diode-laser bar |
| DE102004055534B4 (de) * | 2004-11-17 | 2017-10-05 | Danfoss Silicon Power Gmbh | Leistungshalbleitermodul mit einer elektrisch isolierenden und thermisch gut leitenden Schicht |
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2007
- 2007-06-29 DE DE102007030389.2A patent/DE102007030389B4/de not_active Expired - Fee Related
- 2007-12-04 US US12/450,505 patent/US8559475B2/en not_active Expired - Fee Related
- 2007-12-04 CN CN2007800524433A patent/CN101641786B/zh not_active Expired - Fee Related
- 2007-12-04 EP EP07846389A patent/EP2132772A2/de not_active Withdrawn
- 2007-12-04 WO PCT/DE2007/002186 patent/WO2008119309A2/de not_active Ceased
- 2007-12-04 JP JP2010500059A patent/JP5429819B2/ja not_active Expired - Fee Related
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|---|---|---|---|---|
| DE2213115A1 (de) | 1972-03-17 | 1973-09-27 | Siemens Ag | Verfahren zum hochfesten verbinden von karbiden, einschliesslich des diamanten, boriden, nitriden, siliziden mit einem metall nach dem trockenloetverfahren |
| US3744120A (en) | 1972-04-20 | 1973-07-10 | Gen Electric | Direct bonding of metals with a metal-gas eutectic |
| DE2319854A1 (de) | 1972-04-20 | 1973-10-25 | Gen Electric | Verfahren zum direkten verbinden von metallen mit nichtmetallischen substraten |
| EP0153618A2 (de) | 1984-02-24 | 1985-09-04 | Kabushiki Kaisha Toshiba | Verfahren zur Herstellung eines hochwärmeleitenden Substrates und Kupferleiterblech verwendbar in diesem Verfahren |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102024204732A1 (de) * | 2024-05-23 | 2025-11-27 | Robert Bosch Gesellschaft mit beschränkter Haftung | Kühleranordnung sowie Verfahren zu dessen Herstellung |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101641786A (zh) | 2010-02-03 |
| US8559475B2 (en) | 2013-10-15 |
| DE102007030389B4 (de) | 2015-08-13 |
| JP5429819B2 (ja) | 2014-02-26 |
| WO2008119309A3 (de) | 2009-02-19 |
| EP2132772A2 (de) | 2009-12-16 |
| US20100290490A1 (en) | 2010-11-18 |
| CN101641786B (zh) | 2012-12-12 |
| JP2010522974A (ja) | 2010-07-08 |
| DE102007030389A1 (de) | 2008-10-02 |
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