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WO2008102820A1 - 反射防止コーティング用組成物 - Google Patents

反射防止コーティング用組成物 Download PDF

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Publication number
WO2008102820A1
WO2008102820A1 PCT/JP2008/052890 JP2008052890W WO2008102820A1 WO 2008102820 A1 WO2008102820 A1 WO 2008102820A1 JP 2008052890 W JP2008052890 W JP 2008052890W WO 2008102820 A1 WO2008102820 A1 WO 2008102820A1
Authority
WO
WIPO (PCT)
Prior art keywords
composition
antireflective coating
atom
fluorine
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/052890
Other languages
English (en)
French (fr)
Inventor
Nobuyuki Otozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to AT08720771T priority Critical patent/ATE543123T1/de
Priority to CN2008800056993A priority patent/CN101617273B/zh
Priority to JP2009500220A priority patent/JP4962559B2/ja
Priority to KR1020097015933A priority patent/KR101415430B1/ko
Priority to EP08720771A priority patent/EP2113811B1/en
Publication of WO2008102820A1 publication Critical patent/WO2008102820A1/ja
Priority to US12/544,723 priority patent/US7964659B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　炭素数７以上のＰＦＯＳおよびＰＦＯＡを使用することなく、表面張力が低くて塗布性に優れるとともに、屈折率が低い反射防止膜を形成できる反射防止コーティング用組成物を提供する。 　下記一般式（Ｉ）で表わされる化合物（Ａ１）からなる含フッ素界面活性剤（Ａ）と、水溶性ポリマー（Ｂ）と、水性媒体（Ｃ）を含有する反射防止コーティング用組成物。 　Ｒ１－Ｏ－(Ｒ２－Ｏ)ｎ－Ｒ３－Ｘ１　…（Ｉ） （式中、Ｒ１は末端のフッ素原子が水素原子または塩素原子で置換されていてもよい、直鎖状または分岐状のパーフルオロアルキル基を示し、Ｒ２及びＲ３はそれぞれ独立に、直鎖状または分岐状のパーフルオロアルキレン基を示し、Ｒ１、Ｒ２及びＲ３の炭素数の合計が５以下であり、ｎは０または１以上の整数を示し、Ｘ１は塩を形成していてもよい、－ＣＯＯＨまたは－Ｃ（ＣＦ２Ｚ１）（ＣＦ２Ｚ２）ＯＨである。Ｚ１およびＺ２はそれぞれ、水素原子、フッ素原子、塩素原子またはトリフルオロメチル基である。）
PCT/JP2008/052890 2007-02-22 2008-02-20 反射防止コーティング用組成物 Ceased WO2008102820A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
AT08720771T ATE543123T1 (de) 2007-02-22 2008-02-20 Zusammensetzung für eine antireflexive beschichtung
CN2008800056993A CN101617273B (zh) 2007-02-22 2008-02-20 防反射涂覆用组合物
JP2009500220A JP4962559B2 (ja) 2007-02-22 2008-02-20 反射防止コーティング用組成物
KR1020097015933A KR101415430B1 (ko) 2007-02-22 2008-02-20 반사 방지 코팅용 조성물
EP08720771A EP2113811B1 (en) 2007-02-22 2008-02-20 Composition for antireflective coating
US12/544,723 US7964659B2 (en) 2007-02-22 2009-08-20 Antireflection coating composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007042418 2007-02-22
JP2007-042418 2007-02-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/544,723 Continuation US7964659B2 (en) 2007-02-22 2009-08-20 Antireflection coating composition

Publications (1)

Publication Number Publication Date
WO2008102820A1 true WO2008102820A1 (ja) 2008-08-28

Family

ID=39710094

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052890 Ceased WO2008102820A1 (ja) 2007-02-22 2008-02-20 反射防止コーティング用組成物

Country Status (8)

Country Link
US (1) US7964659B2 (ja)
EP (1) EP2113811B1 (ja)
JP (1) JP4962559B2 (ja)
KR (1) KR101415430B1 (ja)
CN (1) CN101617273B (ja)
AT (1) ATE543123T1 (ja)
TW (1) TWI421314B (ja)
WO (1) WO2008102820A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015080061A1 (ja) * 2013-11-29 2015-06-04 旭硝子株式会社 コーティング用組成物およびフォトレジスト積層体の製造方法
JP2017197718A (ja) * 2016-04-22 2017-11-02 旭硝子株式会社 コーティング用組成物およびフォトレジスト積層体の製造方法
WO2025095106A1 (ja) * 2023-11-02 2025-05-08 日産化学株式会社 レジスト下層膜形成用組成物

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6071255B2 (ja) * 2012-06-04 2017-02-01 キヤノン株式会社 光硬化物
CN113913060B (zh) * 2021-10-19 2022-05-03 苏州润邦半导体材料科技有限公司 一种顶部抗反射涂层组合物
CN114035405B (zh) * 2022-01-07 2022-04-22 甘肃华隆芯材料科技有限公司 制备顶部抗反射膜的组合物、顶部抗反射膜和含氟组合物

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05188598A (ja) 1991-06-28 1993-07-30 Internatl Business Mach Corp <Ibm> 表面反射防止コーティングフィルム
JPH07160002A (ja) 1993-12-01 1995-06-23 Mitsubishi Chem Corp 表面反射防止塗布組成物
JPH0844066A (ja) 1994-08-01 1996-02-16 Mitsubishi Chem Corp 表面反射防止塗布組成物
JPH0895253A (ja) * 1994-09-21 1996-04-12 Shin Etsu Chem Co Ltd 水溶性膜材料
JPH08305032A (ja) 1995-05-01 1996-11-22 Hoechst Ind Kk 反射防止コーティング用組成物
JPH09325500A (ja) 1996-06-07 1997-12-16 Mitsubishi Chem Corp 表面反射防止塗布組成物及びパターン形成方法
JPH11124531A (ja) 1997-10-24 1999-05-11 Asahi Glass Co Ltd コーティング組成物
JP2001200019A (ja) * 2000-01-21 2001-07-24 Shin Etsu Chem Co Ltd 高分子化合物、反射防止膜材料及びパターン形成方法
JP2004037887A (ja) 2002-07-04 2004-02-05 Clariant (Japan) Kk 反射防止コーティング用組成物およびパターン形成方法
WO2006003958A1 (ja) * 2004-06-30 2006-01-12 Dainippon Ink And Chemicals, Inc. 反射防止コーティング用組成物及びそれを用いたパターン形成方法
JP2006194962A (ja) * 2005-01-11 2006-07-27 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料、積層体およびレジストパターン形成方法
WO2007007422A1 (ja) * 2005-07-13 2007-01-18 Asahi Glass Company, Limited ポリテトラフルオロエチレン水性分散液およびその製造方法
JP2007042418A (ja) 2005-08-03 2007-02-15 Mk Seiko Co Ltd 発光装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4175112B2 (ja) * 2001-02-23 2008-11-05 ダイキン工業株式会社 ヒドロキシル基またはフルオロアルキルカルボニル基含有含フッ素エチレン性単量体およびそれらを重合して得られる含フッ素重合体
CN1742063A (zh) * 2003-01-29 2006-03-01 旭硝子株式会社 涂料组合物、抗反射膜、光刻胶及采用该光刻胶的图形形成方法
KR100852840B1 (ko) * 2003-11-19 2008-08-18 다이킨 고교 가부시키가이샤 레지스트 적층체의 형성 방법
JP2006047351A (ja) * 2004-07-30 2006-02-16 Asahi Glass Co Ltd フォトレジスト保護膜用組成物、フォトレジスト保護膜およびフォトレジストパターン形成方法
JP5183069B2 (ja) * 2006-01-08 2013-04-17 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトレジストのためのコーティング組成物
JP4752597B2 (ja) * 2006-02-14 2011-08-17 ダイキン工業株式会社 レジスト積層体の形成方法

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05188598A (ja) 1991-06-28 1993-07-30 Internatl Business Mach Corp <Ibm> 表面反射防止コーティングフィルム
JPH07160002A (ja) 1993-12-01 1995-06-23 Mitsubishi Chem Corp 表面反射防止塗布組成物
JPH0844066A (ja) 1994-08-01 1996-02-16 Mitsubishi Chem Corp 表面反射防止塗布組成物
JPH0895253A (ja) * 1994-09-21 1996-04-12 Shin Etsu Chem Co Ltd 水溶性膜材料
JPH08305032A (ja) 1995-05-01 1996-11-22 Hoechst Ind Kk 反射防止コーティング用組成物
JPH09325500A (ja) 1996-06-07 1997-12-16 Mitsubishi Chem Corp 表面反射防止塗布組成物及びパターン形成方法
JPH11124531A (ja) 1997-10-24 1999-05-11 Asahi Glass Co Ltd コーティング組成物
JP2001200019A (ja) * 2000-01-21 2001-07-24 Shin Etsu Chem Co Ltd 高分子化合物、反射防止膜材料及びパターン形成方法
JP2004037887A (ja) 2002-07-04 2004-02-05 Clariant (Japan) Kk 反射防止コーティング用組成物およびパターン形成方法
WO2006003958A1 (ja) * 2004-06-30 2006-01-12 Dainippon Ink And Chemicals, Inc. 反射防止コーティング用組成物及びそれを用いたパターン形成方法
JP2006194962A (ja) * 2005-01-11 2006-07-27 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料、積層体およびレジストパターン形成方法
WO2007007422A1 (ja) * 2005-07-13 2007-01-18 Asahi Glass Company, Limited ポリテトラフルオロエチレン水性分散液およびその製造方法
JP2007042418A (ja) 2005-08-03 2007-02-15 Mk Seiko Co Ltd 発光装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2113811A4

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015080061A1 (ja) * 2013-11-29 2015-06-04 旭硝子株式会社 コーティング用組成物およびフォトレジスト積層体の製造方法
JP2017197718A (ja) * 2016-04-22 2017-11-02 旭硝子株式会社 コーティング用組成物およびフォトレジスト積層体の製造方法
WO2025095106A1 (ja) * 2023-11-02 2025-05-08 日産化学株式会社 レジスト下層膜形成用組成物

Also Published As

Publication number Publication date
KR20090122201A (ko) 2009-11-26
CN101617273A (zh) 2009-12-30
US20090312471A1 (en) 2009-12-17
EP2113811B1 (en) 2012-01-25
EP2113811A1 (en) 2009-11-04
JPWO2008102820A1 (ja) 2010-05-27
TW200904914A (en) 2009-02-01
US7964659B2 (en) 2011-06-21
EP2113811A4 (en) 2010-08-04
ATE543123T1 (de) 2012-02-15
CN101617273B (zh) 2012-11-28
JP4962559B2 (ja) 2012-06-27
TWI421314B (zh) 2014-01-01
KR101415430B1 (ko) 2014-08-06

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