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SG156561A1 - Copolymer and composition for organic antireflective layer - Google Patents

Copolymer and composition for organic antireflective layer

Info

Publication number
SG156561A1
SG156561A1 SG200808638-1A SG2008086381A SG156561A1 SG 156561 A1 SG156561 A1 SG 156561A1 SG 2008086381 A SG2008086381 A SG 2008086381A SG 156561 A1 SG156561 A1 SG 156561A1
Authority
SG
Singapore
Prior art keywords
carbon atoms
copolymer
patterns
composition
alkyl group
Prior art date
Application number
SG200808638-1A
Inventor
Kim Myung-Woong
Park Joo-Hyeon
Lim Young-Taek
Kim Hyung-Gi
Lee Jun-Ho
Lee Jong-Don
Cho Seung-Duk
Original Assignee
Korea Kumho Petrochem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080034955A external-priority patent/KR100886314B1/en
Application filed by Korea Kumho Petrochem Co Ltd filed Critical Korea Kumho Petrochem Co Ltd
Publication of SG156561A1 publication Critical patent/SG156561A1/en

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

The present invention provides an organic anti reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: (Formula 1] wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05 < m/(m+n) < 0.95 and 0.05 < n/(m+n) < 0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.
SG200808638-1A 2008-04-16 2008-11-19 Copolymer and composition for organic antireflective layer SG156561A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080034955A KR100886314B1 (en) 2007-06-25 2008-04-16 Copolymer for organic anti-reflective coating and Oil-based anti-reflective coating composition comprising same

Publications (1)

Publication Number Publication Date
SG156561A1 true SG156561A1 (en) 2009-11-26

Family

ID=41278669

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200808638-1A SG156561A1 (en) 2008-04-16 2008-11-19 Copolymer and composition for organic antireflective layer

Country Status (3)

Country Link
CN (1) CN101560279B (en)
SG (1) SG156561A1 (en)
TW (1) TW200944546A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100997502B1 (en) * 2008-08-26 2010-11-30 금호석유화학 주식회사 Organic anti-reflective coating composition comprising ring-opened phthalic anhydride and method for preparing same
KR101301464B1 (en) * 2011-04-26 2013-08-29 금호석유화학 주식회사 Copolymer for organic antireflective layer, monomer and composition comprising the copolymer
CN103833873B (en) * 2014-02-10 2016-06-08 上纬（江苏）新材料有限公司 Epoxy-modified copolymer-maleic anhydride prepolymer and resin combination, preparation method and application
KR102662122B1 (en) * 2016-06-01 2024-04-30 주식회사 동진쎄미켐 Composition for forming organic anti-reflective coating layer suitable for negative tone development
CN112662298A (en) * 2020-12-22 2021-04-16 海安浩驰科技有限公司 Manufacturing process and application of anti-dazzling aniseed
CN116102937B (en) * 2021-11-09 2023-10-20 上海新阳半导体材料股份有限公司 Bottom anti-reflection coating and preparation method and application thereof
CN116102938B (en) * 2021-11-09 2023-10-20 上海新阳半导体材料股份有限公司 Bottom anti-reflection coating for deep ultraviolet lithography and preparation method and application thereof
CN116102939B (en) * 2021-11-09 2023-10-03 上海新阳半导体材料股份有限公司 A bottom anti-reflective coating for deep ultraviolet lithography and its preparation method and application
CN114181342B (en) * 2021-12-28 2024-02-23 宁波南大光电材料有限公司 193nmBARC resin and preparation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4307007A (en) * 1980-08-22 1981-12-22 E. I. Du Pont De Nemours And Company Antisticking and antiblocking elastomeric compositions comprising copolymers of ethylene, alkyl acrylates, and half esters of 1,4 butenedioic acid and organic acid phosphates
CN1177602A (en) * 1996-05-31 1998-04-01 埃尔夫阿托化学有限公司 Bonding of paper using latex-dispersions of copolymers made of hydrophobic monomers/polymers of styrene/maleic anhydride type
JPH11249311A (en) 1998-03-03 1999-09-17 Jsr Corp Composition for forming antireflection film
US6394383B1 (en) * 2000-11-21 2002-05-28 E. I. Du Pont De Nemours And Company Winder for elastomeric fibers
US6642299B2 (en) * 2000-12-22 2003-11-04 Georgia-Pacific Resins, Inc. Urea-formaldehyde resin binders containing styrene acrylates and acrylic copolymers

Also Published As

Publication number Publication date
CN101560279B (en) 2013-05-08
TW200944546A (en) 2009-11-01
CN101560279A (en) 2009-10-21

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