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WO2007111261A1 - Dispositif de lecture de faisceau électronique et procédé de réglage dudit faisceau - Google Patents

Dispositif de lecture de faisceau électronique et procédé de réglage dudit faisceau Download PDF

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Publication number
WO2007111261A1
WO2007111261A1 PCT/JP2007/056058 JP2007056058W WO2007111261A1 WO 2007111261 A1 WO2007111261 A1 WO 2007111261A1 JP 2007056058 W JP2007056058 W JP 2007056058W WO 2007111261 A1 WO2007111261 A1 WO 2007111261A1
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WO
WIPO (PCT)
Prior art keywords
electron beam
scale error
scale
speed fluctuation
rotational speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/056058
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English (en)
Japanese (ja)
Inventor
Hiroaki Kitahara
Yasumitsu Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corp filed Critical Pioneer Corp
Priority to JP2008507470A priority Critical patent/JPWO2007111261A1/ja
Publication of WO2007111261A1 publication Critical patent/WO2007111261A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
    • G01D18/001—Calibrating encoders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/244—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing characteristics of pulses or pulse trains; generating pulses or pulse trains
    • G01D5/24471—Error correction
    • G01D5/2449—Error correction using hard-stored calibration data
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Definitions

  • the present invention relates to a beam recording apparatus and a beam adjusting method, and more particularly to an electron beam recording apparatus and an electron beam adjusting method for manufacturing a master disk of a high-speed rotating recording medium such as a magnetic disk using an electron beam.
  • a beam recording apparatus that performs lithography using an exposure beam such as an electron beam or a laser beam is a magnetic recording represented by a digital versatile disc (DVD), an optical disc such as a Blu-ray disc, and a hard disc. It is widely applied to master production equipment for large-capacity discs such as media.
  • DVD digital versatile disc
  • optical disc such as a Blu-ray disc
  • hard disc a hard disc
  • a powerful beam recording apparatus is a disk substrate that serves as a master in manufacturing the above-described disk.
  • a resist layer is formed on the recording surface, and while rotating the substrate, a beam spot is appropriately sent in a radial direction relative to the substrate recording surface, thereby forming a spiral or concentric circle. Control is made so that a latent image is formed on the resist by drawing a track track on the substrate recording surface.
  • the rotation unevenness (rotational speed fluctuation) of the disk substrate (that is, the turntable) used in the optical disk master disk is, as is well known, a synchronous rotational speed fluctuation that is a fluctuation component synchronized with the rotation of the disk substrate, There are irregular asynchronous rotational speed fluctuations that do not depend on the rotation angle of the substrate.
  • Asynchronous rotation unevenness correction technology is a technology that can improve the recording position accuracy relative to adjacent tracks, and is effective, for example, when drawing radially aligned pits.
  • this technology it is not possible to correct the rotation unevenness (synchronous rotational speed fluctuation) synchronized with the rotation of the substrate.
  • Patent Document 1 JP-A-6-76293 (Page 4, Figure 1)
  • Patent Document 2 JP-A-8-212552 (Page 4, Fig. 1)
  • Patent Document 3 JP 2000-20964 (Page 4, Fig. 2)
  • the present invention has been made in view of the above points, and corrects true rotation unevenness including synchronous rotation unevenness (synchronous rotational speed fluctuation) with extremely high accuracy, and has excellent absolute recording position accuracy.
  • One example is to provide a disk master exposure apparatus.
  • An electron beam recording apparatus is an electron beam recording apparatus that irradiates an electron beam toward a substrate while rotating the turntable on which the substrate is placed, and is a scale indicating the rotation angle position of the turntable. And at least three read heads that are arranged at a predetermined relative angle on a circumference centered on the rotation center of the turntable, each reading the scale and generating a read signal, and the read signal.
  • the phase difference detector detects a phase difference between the read signal other than the reference read signal and the reference read signal among the read signals of the at least three read heads, and the phase difference
  • a scale error calculation unit that calculates a scale error that is an angular position error of the scale, and based on the scale error and the read signal.
  • a rotational speed variation calculating unit for calculating a rotational speed variation of Nte one table is characterized by having a beam irradiation position adjuster for adjusting the irradiation position of the rotational speed variation based on Dzu !, electron Te beam.
  • the method according to the present invention is a method for calculating a rotational speed fluctuation of a turntable in an electron beam recording apparatus that irradiates an electron beam toward the substrate while rotating the turntable on which the substrate is placed.
  • the scale is read by at least three reading heads arranged at a predetermined relative angle on the circumference centered on the rotation center of the turntable and the scale on which the scale indicating the rotation angle position of the turntable is formed.
  • a read signal generation step for generating each read signal at the predetermined relative angle; and 1 of the read signal as a reference read signal, and a read signal other than the reference read signal among the at least three read signals at a predetermined relative angle;
  • a phase difference detection step for detecting a phase difference with respect to the reference reading signal; and an error in the angular position of the scale based on the phase difference.
  • scale error calculation step of calculating a Der Ru scale error is characterized by having a rotation speed variation de San step calculates the rotational speed fluctuation of the turntable based on the scaled errors and the upper Symbol read signal.
  • FIG. 1 is a block diagram schematically showing the configuration of an electron beam recording apparatus that is an embodiment of the present invention.
  • FIG. 2 is a diagram schematically showing a configuration for detecting a synchronous rotational speed variation and adjusting an irradiation position of an electron beam (EB) based on the detection result.
  • EB electron beam
  • FIG. 3 is a top view schematically showing the arrangement of the encoder scale and the read heads (ENC-1 to ENC-4).
  • FIG. 4 is a block diagram showing the configuration of the relative angular position error detection unit and the scale error calculation unit.
  • FIG. 5 is a diagram for explaining the configuration and operation of a rotational speed variation calculator.
  • FIG. 6 is a diagram showing a case where exposure beam irradiation position correction is performed by exposure beam blanking control.
  • FIG. 7 is a block diagram showing a case where exposure beam irradiation position correction is performed while updating scale error data ⁇ ( ⁇ ) in real time during exposure.
  • FIG. 8 shows the relationship between the number of read heads and the undetectable Fourier order.
  • FIG. 9 is a flowchart showing a procedure for obtaining scale error data.
  • FIG. 10 is a flowchart showing a procedure of a method of correcting a rotational speed variation by measuring and storing a scale error in advance.
  • FIG. 11 is a flowchart showing a procedure of a method for correcting a rotational speed variation while calculating a scale error in real time.
  • FIG. 12 is a diagram schematically showing a configuration of a patterned magnetic recording disk.
  • FIG. 13 is a diagram showing a process of manufacturing a pattern recording medium using an imprint mold manufactured by the electron beam recording apparatus according to the present invention.
  • FIG. 1 is a block diagram schematically showing a configuration of an electron beam recording apparatus 10 that is an embodiment of the present invention.
  • the electron beam recording apparatus 10 is a disk mastering apparatus that uses an electron beam to create a master disk for manufacturing a hard disk. [Configuration and operation of electron beam recording apparatus]
  • the electron beam recording apparatus 10 includes a vacuum chamber 11, a driving device that places, rotates, and translates a substrate 15 disposed in the vacuum chamber 11, an electron beam column 20 attached to the vacuum chamber 11, and a substrate Various circuits and control systems for driving control and electron beam control are provided.
  • the substrate 15 for the disk master is coated on the surface with a resist and placed on the turntable 16.
  • the turntable 16 is rotationally driven with respect to the vertical axis of the main surface of the disk substrate by a spindle motor 17 which is a rotational drive device that rotationally drives the substrate 15.
  • the spindle motor 17 is provided on a feed stage (hereinafter also referred to as X stage) 18.
  • the stage 18 is coupled to a feed motor 19 that is a transfer (translation drive) device, and can move the spindle motor 17 and the turntable 16 in a predetermined direction (X direction) in a plane parallel to the main surface of the substrate 15. It ’s like that.
  • the X ⁇ stage is constituted by the X stage 18, the spindle motor 17 and the turntable 16.
  • the X stage 18 is driven by a feed motor 19, and the feed amount of the X stage 18, which is the drive amount, is controlled by a feed control unit 37.
  • the feed control unit 37 operates under the control of the controller 30 that controls the entire electron beam recording apparatus 10.
  • the turntable 16 is made of a dielectric material, for example, a ceramic cage, and has a chucking mechanism such as an electrostatic chucking mechanism (not shown) for holding the substrate 15. By such a chucking mechanism, the substrate 15 placed on the turntable 16 is securely fixed to the turntable 16.
  • a chucking mechanism such as an electrostatic chucking mechanism (not shown) for holding the substrate 15.
  • a reflecting mirror 35A for reflecting the measurement laser light from the laser interferometer 35 is disposed on the X stage 18.
  • the vacuum chamber 11 is installed via a vibration isolator (not shown) such as an air damper, and transmission of vibration from the outside is suppressed.
  • the vacuum chamber 11 is connected to a vacuum pump (not shown), and the interior of the vacuum chamber 11 is set to a vacuum atmosphere at a predetermined pressure by evacuating the chamber. Yes.
  • an electron gun (emitter) 21 for emitting an electron beam a convergence lens 22, blanking electrode 23, aperture 24, beam deflection electrode 25, focus lens 27, and objective lens 28 are arranged in this order.
  • the electron gun 21 is a cathode to which a high voltage supplied from an acceleration high-voltage power supply (not shown) is applied.
  • an electron beam (EB) accelerated to several lOKeV is emitted by (not shown).
  • the converging lens 22 converges the emitted electron beam.
  • the blanking electrode 23 performs on-Z-off switching (ONZO FF) of the electron beam based on the modulation signal from the blanking control unit 31. That is, by applying a voltage between the blanking electrodes 23 to greatly deflect the passing electron beam, the electron beam can be prevented from passing through the aperture 24 and the electron beam can be turned off.
  • the beam deflection electrode 25 can control the deflection of the electron beam at high speed based on the control signal from the beam deflection unit 33. With this deflection control, the position of the electron beam spot relative to the substrate 15 is controlled.
  • the focus lens 28 is driven based on the drive signal from the focus control unit 34, and the focus control of the electron beam is performed.
  • the vacuum chamber 11 is provided with a height detection unit 36 for detecting the height of the surface of the substrate 15.
  • the photodetector 36B includes, for example, a position sensor, a CCD (Charge Coupled Device), etc., and receives the light beam emitted from the light source 36A and reflected by the surface of the substrate 15, and the received light signal has a height. This is supplied to the detector 36.
  • the height detector 36 detects the height of the surface of the substrate 15 based on the received light signal and generates a detection signal.
  • a detection signal indicating the height of the surface of the substrate 15 is supplied to the focus control unit 34, and the focus control unit 34 performs focus control of the electron beam based on the detection signal.
  • the laser interferometer 35 measures the displacement of the X stage 18 using laser light emitted from the light source in the laser interferometer 35, and the measured data, that is, the feed (X direction) position of the tee 18 The data is sent to the stage drive unit 37.
  • the spindle motor 17 is controlled by the rotation control unit 40.
  • the spindle motor 17 is provided with a rotary encoder (R—ENC) 41.
  • R—ENC rotary encoder
  • the rotation signal includes an origin signal indicating the reference rotation position of the substrate 15 and a pulse signal (rotary encoder signal) for each predetermined rotation angle from the reference rotation position.
  • the rotation signal Supplied to the controller 40.
  • the feed control unit 37 generates position data representing the position of the electron beam spot on the substrate based on the feed position data from the stage 18 and supplies the position data to the controller 30.
  • the controller 30 is supplied with track pattern data used for discrete track media, patterned media, etc., and data (record data) RD to be recorded (exposed).
  • the controller 30 includes a blanking control unit 31, a beam deflection unit 33, and a focus control unit.
  • a blanking control signal CB, a deflection control signal CD, and a focus control signal CF are respectively sent to 34, and data recording (exposure or drawing) control is performed based on the recording data RD. That is, the resist on the substrate 15 is irradiated with an electron beam (EB) based on the recording data RD, and a latent image is formed only at a portion exposed by the electron beam irradiation, and recording (exposure) is performed.
  • EB electron beam
  • Such recording control is performed based on the feed position data and the rotation position data described above.
  • FIG. 2 is a diagram schematically showing a configuration for detecting a rotational speed variation and adjusting the irradiation position of the electron beam (EB) based on the detection result.
  • a substrate 15 (not shown) is placed on the main surface (xy plane) of the turntable 16, and as shown in Fig. 2, a spindle motor 17 serves as a central axis (z direction: rotation central axis RA). Rotated around).
  • a disk-shaped scale (hereinafter referred to as an encoder scale) 41S is attached to the rotary shaft 17A of the spindle motor 17 as a reference scale.
  • Encoder scale 41 S rotation axis is spindle motor 17 rotation center axis R Installed to match A.
  • the encoder scale 41S is provided with at least three reading heads. For example, in the case shown in FIG. 2, four read heads 41A, 41B, 41C, and 41D are provided.
  • FIG. 3 is a top view schematically showing the arrangement of the encoder scale 41S and the read head 41A (ENC-1), 41B (ENC-2), 41C (ENC-3), 41D (ENC-4). is there.
  • reading head 41A (ENC-1) is used as a reference (angle position 0 °)
  • reading head 41B (ENC-2) is used as a reference (angle position 0 °)
  • 41 C (ENC-3) and 41D (ENC-4) are 180 ° and 90 °, respectively. It is arranged at the angular positions of ° and 45 °.
  • Equation 1 [0041] can be arranged as follows.
  • the encoder scale 41S is formed with slit-like scale notches (scale marks) 41R in which notches (scales) are formed at predetermined intervals. That is, the scale step 41R is formed with a step (scale) that equally divides the circumference (angle) around the rotation center of the encoder scale 41S.
  • Each of the read heads 41A, 41B, 41C, and 41D detects the step (pattern) of the scale step 41R, and reads the read signals SA, SB, SC, and SD according to the cycle of the formed step. (Hereinafter also referred to as a relative angle position error detection unit.) 4 That is, the encoder scale 41S and the read heads 41A to 41D function as a single encoder (R—ENC) 41.
  • the reading heads 41A to 41D are configured as optical reading heads that optically detect the increments of the scale increment 41R, but are not limited to a powerful detection method.
  • the scale step 41R may be made of a magnetic material, and a magnetization pattern that equally divides the circumference around the rotation center of the encoder scale 41S may be formed.
  • the reading heads 41A to 41D may be configured as magnetic reading heads.
  • the rotation control unit 40 is provided with a relative angular position error detection unit 43, a scale error calculation unit 45A, a rotation speed fluctuation calculation unit 45, and the like.
  • the relative angular position error detection unit 43 uses one of the read signals SA, SB, SC, SD from the read heads 41A to 41D as a reference, and the reference read signal and the other read signals.
  • the phase difference between the signals read from the head is detected, and the detected phase difference (diagonal position error) ⁇ ⁇ , 6 2, S 3 is supplied to the scale error calculation unit 45 ⁇ .
  • the scale error calculation unit 45 ⁇ calculates the scale error ⁇ ( ⁇ ) based on the phase difference ⁇ diagonal position error) ⁇ ⁇ , 62, S3, and stores it in the memory.
  • the rotation speed fluctuation calculator 45 calculates the rotation speed fluctuation data VD ( ⁇ ) based on the stored scale error ⁇ ( ⁇ ) data and the current rotation angle error data PV ( ⁇ ) during rotation (exposure). , Supplied to the controller 30.
  • the rotation of the spindle motor 17 that rotates the turntable 16 is controlled by a motor control circuit 47.
  • the motor control circuit 47 operates based on the reference rotation signal RR from the reference rotation signal generator 46 and the read signal from the rotary encoder 41, for example, one of the read heads 41A to 41D.
  • the reference rotation signal from the reference rotation signal generator 46 is supplied to the rotation speed fluctuation calculator 45.
  • reference rotation signal generator 46 and the motor control circuit 47 may be provided in the rotation control unit 40, for example.
  • FIG. 4 is a block diagram showing the configuration of the relative angular position error detection unit 43 and the scale error calculation unit 45A.
  • the relative angular position error detection unit 43 and the scale error calculation unit 45A as a method for calibrating the scale error of the rotary encoder 41, for example, calculation based on the principle of the multi-playback head method (or multi-head method) is used. ing.
  • the principle of the multi-replay head method is described in, for example, the non-patent document “Development of a precision automatic calibration system for angle detectors” (Masuda, Sugaya, Journal of Precision Engineering (52/10/1986), 1732-1738. Page)).
  • ⁇ is the angular position (0 to 2 ⁇ )
  • ⁇ is a positive integer
  • ⁇ and a are the amplitude and phase angle of the n-th order component.
  • the phase difference between the output signals of two heads separated by a relative angle ⁇ that is, the relative angle position error ⁇ ( ⁇ , ⁇ ) has the following relationship.
  • the reproducing head is arranged at a relative angle ⁇ expressed by the following equation (4), and T ( ⁇ k k defined by equation (5) is used.
  • Equation (5) can be expressed as the following equation by substituting Equation (3), and ⁇ is k among the Fourier components of ⁇ .
  • n ⁇ 2m- ⁇ i (k - l)
  • the reading head is arranged at a position corresponding to ⁇ in advance,
  • the method of obtaining the estimated value ⁇ of the above is called the multi-replay head method.
  • FIG. 8 shows the relationship between the number of reading heads and the undetectable Fourier order. As can be seen from this figure, the greater the number of heads, the smaller the number of undetectable Fourier components, and the estimated value of the scale error approaches the true value. However, the minimum head-to-head angle ⁇
  • the number of heads is desirably the maximum number of heads that can be arranged in order to reduce the error.
  • FIG. 9 is a flowchart showing a procedure for obtaining such scale error data.
  • phase difference detectors 43A, 43B, and 43C of the relative angle position error detector (phase difference detector) 43 step S11.
  • SD is supplied (Step k
  • the detected relative angular position error is supplied to the scale error calculator 45A of the rotation speed fluctuation calculator 45, and the scale error ⁇ ( ⁇ ) is calculated based on the above equation (7) (Step S13). ).
  • the calculated scale error ⁇ ( ⁇ ) is stored in a memory (RAM) 51 provided in the rotational speed fluctuation calculator 45 (step S14).
  • FIG. 5 is a diagram for explaining the configuration and operation of the rotational speed variation calculator 45.
  • FIG. 10 is a flowchart showing a procedure of a method for correcting the rotational speed fluctuation by measuring and storing the scale error in advance.
  • the scale error ⁇ ( ⁇ ) with respect to the rotation angle ( ⁇ ) obtained by the scale calibration method is used as scale error data or a scale error waveform.
  • Stored in The stored scale error data (scale error waveform) ⁇ ( ⁇ ) is output based on the reference rotation signal from the reference rotation signal generator 46.
  • the reference rotation signal RR is also supplied to the phase difference detection unit 43.
  • any one of the rotary encoder read heads (ENC-1 to ENC-4) 41A to 41D (ENC-n) output signal (for example, encoder signal SA) ) And the reference rotation signal RR are captured (step S21), and phase comparison is performed to generate (measure) a rotation angle error (current rotation angle error) PV ( ⁇ ) during the current rotation (step S22).
  • the current rotation angle error PV ( ⁇ ) includes a scale error.
  • the current rotation angle error PV ( ⁇ ) is output based on the reference rotation signal, and is supplied to a subtracter 53 provided in the rotation speed fluctuation calculator 45.
  • the rotational speed variation data VD ( ⁇ ) obtained in this way is supplied to the controller 30.
  • the controller 30 controls the beam deflector 33 based on the rotational speed fluctuation data VD (control signal CD) and adjusts (corrects) the irradiation position of the electron beam (EB) in real time (step) S25).
  • the process returns to step S21 and the above procedure is repeated (step S26).
  • the recording position is corrected by displacing the irradiation position of the exposure beam (electron beam) according to the rotation speed fluctuation signal.
  • true rotation unevenness can be corrected with extremely high accuracy and exposure with good absolute recording position accuracy can be performed without being affected by the rotation angle error of the spindle motor 17.
  • the exposure beam irradiation position is adjusted in the tangential direction (ie, actually displaced) and corrected in accordance with the rotational speed fluctuation data.
  • the exposure beam irradiation position may be corrected by another method.
  • the controller 30 controls the blanking control unit 31 based on the rotational speed fluctuation data VD (0), and adjusts the exposure beam blanking (ONZOFF) timing to thereby adjust the exposure beam.
  • the irradiation position may be corrected.
  • the scale error data ⁇ ( ⁇ ) is used to obtain the rotational speed fluctuation data VD to obtain the exposure beam.
  • the case where the irradiation position is adjusted has been described as an example.
  • the scale error ⁇ ( ⁇ ) at the time of recording (exposure) when the substrate is irradiated with an electron beam is calculated, and the rotational speed fluctuation VD ( ⁇ ) is calculated in real time using the scale error ⁇ ( ⁇ ). You can adjust the irradiation position of the electron beam by calculating with!
  • FIG. 11 is a flowchart showing a procedure of a method for correcting the rotational speed fluctuation while calculating the scale error in real time.
  • the encoder signals SA, SB, SC, SD are taken from the rotary encoder read heads (ENC-1 to ENC-4) 41A to 41D (step S31).
  • the reference rotation signal RR is fetched from the reference rotation signal generator 46 (step S32), and the scale error ⁇ ( ⁇ ) is calculated (step S33).
  • the current rotation unevenness VD (0) is calculated by subtracting the scale error ⁇ ( ⁇ ) from the current rotation angle error data PV ( ⁇ ) (step S34). Based on the calculated current rotation unevenness VD ( ⁇ ), beam deflection is performed, and the electron beam irradiation position is corrected in real time (step S35). When continuing the correction control, the process returns to step S31 and the above procedure is repeated (step S36).
  • scale error data ⁇ (0) may be updated while calculating the scale error in real time (real time).
  • the scale error calculation unit 45 ⁇ calculates the scale error data ⁇ ( ⁇ ) in real time during exposure. That is, the scale error calculation unit 45 ⁇ calculates the scale error data ⁇ ( ⁇ ) based on the phase difference (relative angle position error) ⁇ 1 to ⁇ ⁇ from the phase difference detection unit 43 during exposure, and performs an averaging process. Supply to part 54.
  • the averaging processor 54 sequentially updates the scale error data ⁇ ( ⁇ ). For example, the moving average calculation of the scale error data ⁇ ( ⁇ ) for a plurality of rotations is performed, and the scale error data ⁇ ( ⁇ ) stored in the memory (RAM) 51 is appropriately updated with the moving average scale error data. For example, the averaging processing unit 54 performs control so as to update the storage scale error data ⁇ ( ⁇ ) every rotation.
  • the rotational speed fluctuation calculator 45 calculates the rotational speed fluctuation data VD ( ⁇ ) using the updated average scale error data ⁇ ( ⁇ ) in real time during exposure. To the controller 30.
  • the scale error data ⁇ ( ⁇ ) By configuring the scale error data ⁇ ( ⁇ ) to be updated in real time in this way, the measurement radius position changes due to the thermal expansion of the encoder scale, and the measured scale error waveform changes. Since there is no error in the calculation result of rotation unevenness, long exposure can be supported. Note that changes in scale error are usually due to thermal changes.
  • the scale error data need not always be updated every rotation, but may be updated every multiple rotations.
  • the present invention can also be applied to the production of high-density hard disks such as discrete track media and patterned media. Since the rotational speed of a hard disk is higher than that of an optical disk in a hard disk, it is difficult to follow the angular position error of the exposure pattern caused by the uneven rotation of the master disk by PLL control of the recording / playback system. It is thought to be. In such a case, especially in the case of patterned media, the recording / reproducing head cannot record / reproduce at the correct position, which causes a recording / reproducing error. However, if a disk medium with good angular position accuracy manufactured by correcting the rotation unevenness according to the present invention is used, a high-density hard disk drive can be manufactured with a low error rate.
  • a high density magnetic recording medium manufactured by using the beam recording apparatus according to the present invention will be described by taking a disk-shaped patterned medium as an example.
  • a patterned magnetic recording disk 60 called a patterned medium has a servo pattern portion 61 and a patterned data track portion 62.
  • the dot pattern of the data track portion 62 is not drawn on the inner and outer peripheral portions of the magnetic recording disk 60, but is merely schematically shown. It is formed over the entire effective diameter.
  • the servo pattern portion 61 is only partly shown, and may be formed other than shown in the figure!
  • FIG. 12 shows an enlarged part 62 ⁇ of the data track section 62.
  • the data track section 62 is formed with a magnetic dot row in which magnetic dots 63 are arranged concentrically.
  • the servo pattern section 61 includes a rectangular pattern indicating address information and track detection information, and a line pattern extending in a direction crossing the track for extracting clock timing. Are formed.
  • the swing arm head 64 writes and reads data.
  • the servo pattern unit 61 is shown in the same form as the current hard disk medium! /, But the servo pattern unit of a new format optimized for patterned media is used. May be used to have a pattern shape, arrangement, etc. different from those of current hard disk media.
  • a pattern recording medium such as a powerful pattern magnetic recording disk 60 is produced by directly etching a recording material using a resist mask formed by drawing and exposure using the above-described electronic beam recording apparatus. Is also possible. However, since the manufacturing efficiency is not high, it is preferable to use an imprint manufacturing method as a mass production process.
  • a pattern recording medium is manufactured by using a master (also referred to as a master or a mold) manufactured by the above-described electron beam recording apparatus as an imprint transfer mold (hereinafter referred to as an imprint mold) 70.
  • a master also referred to as a master or a mold
  • an imprint transfer mold hereinafter referred to as an imprint mold 70.
  • the powerful imprint mold and pattern recording medium have an effective density of 500 Gbpsi (Gbit / inch 2 ) or more, especially for ultra-fine patterns corresponding to a very high surface recording density of about 1 to 10 Tbpsi. It is. Specifically, by using an imprint mold having a pattern with a pit interval of about 25 nm (nanometer), a high-density pattern recording medium having a recording density of about lTbpsi can be produced from the imprint mold.
  • a recording layer 72, a metal mask layer 73, and a transfer material layer 74 are formed on a recording medium base substrate 71 that also has material strength such as a Si wafer or tempered glass.
  • the recording layer 72 is formed by depositing a magnetic material layer by sputtering or the like.
  • a perpendicular magnetic recording medium it has a laminated structure in which a soft magnetic material layer, an intermediate layer, and a ferromagnetic recording layer are laminated in this order.
  • a metal mask layer 73 such as Ta or Ti is formed on the recording layer (magnetic material layer) 72 by sputtering or the like.
  • a thermoplastic resin resist is formed as the transfer material layer 74 by a spin coating method or the like.
  • Imprint mold 70 is uneven
  • the imprinting device (not shown) is set so that the transfer surface of the substrate faces the transfer material layer 74 (FIG. 13, step 1).
  • the transfer material layer 74 is heated until it has fluidity, and then the imprint mold 70 is pressed onto the transfer material layer 74 (step 2).
  • step 3 by removing the imprint mold 70 from the transfer material layer 74, the uneven pattern of the imprint mold 70 is transferred to the transfer material layer 74 (step 3).
  • Unnecessary transfer material in the recesses of the transfer material layer 74 is removed by ashing or the like, and the metal mask layer 73 is patterned using the remaining transfer material as a mask. Then, the recording layer (magnetic material layer) 72 is patterned by, for example, dry etching using the patterned metal mask layer 73 as a mask (step 4).
  • a non-magnetic material 75 is embedded in a recess (pit) of the recording layer (magnetic material layer) 72 formed by the patterning, and is flattened. As a result, a structure in which the recording material (magnetic material) is separated by the non-recording material is formed (step 5).
  • a pattern recording medium is completed by forming a protective film 76 on the surface.
  • a high-density magnetic recording medium such as a discrete track medium or a patterned medium can be manufactured by creating a master using the electron beam recording apparatus according to the present invention. can do.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

L'invention a pour objet un dispositif de lecture de faisceau électronique dont l'échelle est pourvue de graduations destinées à indiquer la position angulaire de rotation d'un plateau de lecture, au moins trois têtes de lecture disposées selon des angles relatifs prédéterminés sur une circonférence formée sur le centre de rotation du plateau de lecture, à des fins de lecture individuelle des graduations pour générer des signaux de lecture, un détecteur de différence de phase qui utilise un des signaux de lecture comme signal de lecture de référence pour détecter des différences de phase entre les signaux de lecture desdites trois têtes de lecture autre que le signal de lecture de référence, et le signal de lecture de référence, une unité de calcul d'erreur d'échelle pour calculer une erreur d'échelle ou une erreur de position angulaire des graduations à partir de cette différence de phase, une unité de calcul des fluctuations de la vitesse de rotation pour calculer les fluctuations de la vitesse de rotation du plateau de lecture à partir de l'erreur d'échelle et des signaux de lecture, et un régleur de position de l'irradiation du faisceau pour régler la position d'irradiation d'un faisceau électronique à partir des fluctuations de la vitesse de rotation.
PCT/JP2007/056058 2006-03-27 2007-03-23 Dispositif de lecture de faisceau électronique et procédé de réglage dudit faisceau Ceased WO2007111261A1 (fr)

Priority Applications (1)

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JP2006085842 2006-03-27
JP2006-085842 2006-03-27

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010218644A (ja) * 2009-03-18 2010-09-30 Fujifilm Corp 電子ビーム描画方法および装置
EP2500695A4 (fr) * 2009-11-09 2017-08-09 National Institute of Advanced Industrial Science And Technology Détecteur d'angle comportant une fonction d'auto-étalonnage combinée
EP4056313A4 (fr) * 2019-11-08 2023-10-11 Sankyo Seisakusho Co. Dispositif de positionnement en rotation

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JPH06313719A (ja) * 1993-04-19 1994-11-08 Topcon Corp ロータリエンコーダ
JP2001356026A (ja) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd 磁気式エンコーダおよび磁気式エンコーダを搭載した測量機
JP2002050048A (ja) * 2000-08-02 2002-02-15 Fujitsu Ltd 原盤露光装置
JP2003262518A (ja) * 2002-03-11 2003-09-19 Tamagawa Seiki Co Ltd 自己校正型角度検出器
JP2005168280A (ja) * 2003-11-13 2005-06-23 Asmo Co Ltd モータ、回転制御装置、及び回転検出回路

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JPH03187031A (ja) * 1989-12-18 1991-08-15 Kenwood Corp 光ディスク記録装置のレーザ変調回路
JPH0676293A (ja) * 1992-08-27 1994-03-18 Ricoh Co Ltd 光ディスク原盤露光装置
JP2005246123A (ja) * 2004-03-01 2005-09-15 Seiko Epson Corp 吐出タイミング生成方法、液滴吐出装置、電気光学装置の製造方法および電子機器

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JPH06313719A (ja) * 1993-04-19 1994-11-08 Topcon Corp ロータリエンコーダ
JP2001356026A (ja) * 2000-06-14 2001-12-26 Asahi Optical Co Ltd 磁気式エンコーダおよび磁気式エンコーダを搭載した測量機
JP2002050048A (ja) * 2000-08-02 2002-02-15 Fujitsu Ltd 原盤露光装置
JP2003262518A (ja) * 2002-03-11 2003-09-19 Tamagawa Seiki Co Ltd 自己校正型角度検出器
JP2005168280A (ja) * 2003-11-13 2005-06-23 Asmo Co Ltd モータ、回転制御装置、及び回転検出回路

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010218644A (ja) * 2009-03-18 2010-09-30 Fujifilm Corp 電子ビーム描画方法および装置
EP2500695A4 (fr) * 2009-11-09 2017-08-09 National Institute of Advanced Industrial Science And Technology Détecteur d'angle comportant une fonction d'auto-étalonnage combinée
EP4056313A4 (fr) * 2019-11-08 2023-10-11 Sankyo Seisakusho Co. Dispositif de positionnement en rotation
US12304020B2 (en) 2019-11-08 2025-05-20 Sankyo Seisakusho Co. Rotational positioning device

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