WO2007036996A1 - Substrate holding structure - Google Patents
Substrate holding structure Download PDFInfo
- Publication number
- WO2007036996A1 WO2007036996A1 PCT/JP2005/017832 JP2005017832W WO2007036996A1 WO 2007036996 A1 WO2007036996 A1 WO 2007036996A1 JP 2005017832 W JP2005017832 W JP 2005017832W WO 2007036996 A1 WO2007036996 A1 WO 2007036996A1
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- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- plate
- holding
- surface receiving
- receiving plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
Definitions
- the present invention relates to a glass substrate such as CF glass or TFT glass or a synthetic resin substrate in the manufacturing process of a flat panel display such as a liquid crystal display (LCD) or a plasma display (PDP).
- a substrate holding structure used for a substrate assembling apparatus including a substrate laminating machine for holding and sticking and bonding, and a substrate transporting apparatus for transporting a substrate.
- the present invention relates to a substrate holding structure that holds a substrate with respect to the holding surface at a plurality of dispersed positions and holds the substrate while ensuring flatness.
- a plurality of openings are provided in each of the holding surfaces of the pressure plate and the table, and a rotation actuator and a vertical drive actuator are provided in each of these openings.
- the adhesive member is attached to the tip of the rotating shaft where the rotary actuator also extends, and the adhesive member is moved and exposed within the opening by the operation of the vertical drive actuator.
- There is one that retreats and peels the adhesive member off the substrate cover see, for example, Patent Document 1).
- Patent Document 1 Japanese Patent Application Laid-Open No. 2003-273508 (Page 3-5, Fig. 1-5)
- the thin adhesive member may not contact the substrate, so that the adhesive force is insufficient and the substrate may be displaced or dropped.
- the invention described in claim 1 aims to achieve the flatness on the holding surface side that is required even when rubber is used as the elastic material.
- the invention described in claim 2 aims to improve the followability by elastic deformation in the longitudinal direction of the surface receiving plate.
- the invention described in claim 3 is intended to reliably prevent the substrate from being displaced due to insufficient adhesive force.
- the invention according to claim 1 of the present invention is configured such that a plurality of voids are dispersed and recessed in the holding surface, and the openings of these voids are fixed to be elastically deformable.
- Each plate is covered with a plate, and a surface receiving plate having a inertia material force smaller than the opening of the gap is attached to the center of each fixed plate so as to protrude toward the substrate, and the fixed plate and the surface receiving plate are attached.
- These dispersed surface receiving plates are brought into contact with the substrate and held while being flatly supported, and the above-mentioned gap is formed by elastic deformation of the integrated fixing plate and surface receiving plate. It is characterized by being used as a escape space.
- the invention according to claim 2 is the structure of the invention according to claim 1, wherein a through hole is opened in the fixing plate, and an internal force of the through hole is a surface receiving plate along at least the substrate side surface of the fixing plate.
- a through hole is opened in the fixing plate, and an internal force of the through hole is a surface receiving plate along at least the substrate side surface of the fixing plate.
- a structure is added in which the compressive deformation of the substrate-side laminated portion of the surface receiving plate is moved to the opposite side through the through hole.
- the invention described in claim 3 is intended to reliably prevent the substrate from being displaced due to insufficient adhesive force.
- the invention according to claim 1 is formed by dispersing a plurality of gaps on the holding surface and forming recesses, covering the openings of these gaps with fixing plates, respectively, at substantially the center of each fixing plate, Attach a bearing plate that has a smaller elastic material force than the opening of the above-mentioned gap so that it protrudes toward the substrate. If there is variation in the thickness of the surface receiving plate that is elastic material force by holding it while flatly receiving it, the thickness of the surface receiving plate becomes larger as the surface receiving plate comes into contact with the substrate. The fixed plate or the surface receiving plate is elastically deformed toward the gap, and this elastic deformation is released to the air gap, so that the thickness V is large, and the surface receiving plate sinks toward the air gap. of Receiving plate and Ru are flat I fire.
- a through hole is formed in the fixing plate, and at least the surface of the fixing plate facing the substrate is formed from the inside of the through hole. Therefore, when there is variation in the thickness dimension of the substrate-side laminated portion of the surface receiving plate by forming the surface receiving plate, the substrate-side laminated portion of the surface receiving plate having a large thickness is brought into contact with the substrate. Then, the substrate side laminated part of the surface receiving plate is compressed and deformed, and is moved to the opposite side through the through-hole, thereby increasing the thickness dimension !, and the substrate side laminated part of the surface receiving plate sinks to the gap side. And flattened with the other laminated parts on the substrate side of the surface receiving plate.
- the face plate is integrally formed from the inside of the through hole along at least the substrate side surface of the fixed plate, it is possible to prevent the position plate from being misaligned with respect to the fixed plate. Handling of fixed plate and bearing plate is easy.
- the invention of claim 3 provides an adhesive portion on the surface of the surface receiving plate so that the adhesive portion can be surely brought into contact with the substrate. Adhesion is retained.
- the substrate holding structure A of the present invention is provided in a substrate bonding apparatus that bonds and holds a glass substrate such as a liquid crystal display (LCD) panel is shown.
- LCD liquid crystal display
- This substrate laminating machine holds two glass substrates D and D on holding surfaces 1 and 1, which are arranged in parallel with each other, as shown in FIGS.
- the upper and lower holding plates B and C are relatively adjusted in the ⁇ ⁇ direction (horizontal direction), and the substrates D and D
- the upper substrate D is forcibly peeled from the holding surface 1 of the upper holding plate B and is instantaneously pressure-bonded to the annular adhesive (seal material) E on the lower substrate D.
- the two are sealed and overlapped, and thereafter, a pressure difference between the substrates D and D is pressurized to a predetermined gap between the substrates D and D.
- the upper and lower holding plates B and C are supported by an elevating means (not shown) so as to be relatively movable in the Z direction (up and down direction), and the upper and lower holding plates B and C are moved in the vertical direction.
- the substrates D and D are set on the holding surfaces 1 and 1, respectively, and then the upper and lower holding plates B and C are brought close by the operation of the lifting means to form the closed space S.
- a plurality of surface receiving portions made of an elastic material are distributed, and these surface receiving portions are arranged on the upper and lower substrates D and D.
- the back surface D1 of the substrate D can be prevented from being displaced in the ⁇ direction (lateral displacement) with respect to the holding surface 1 by holding it detachably while being in contact with the flat surface. If the surface of the surface receiving portion is formed of an adhesive member, the substrate D can be held in an adhesive state.
- the holding surfaces 1 and 1 on the substrate side of the upper and lower holding plates B and C are provided with the substrate holding structure A of the present invention.
- a plurality of voids 2 are dispersed and recessed in the holding surface 1 facing the back surface D1 of the substrate D as shown in FIGS.
- the opening is covered with an elastically deformable material such as stainless steel or other metal, or a fixed plate 3 that is also difficult to elastically deform, and the above-mentioned gap portion 2 is provided at the approximate center of each fixed plate 3.
- the fixing plate 3 and the surface receiving plate 4 are integrated by attaching a surface receiving plate 4 which is smaller than the opening area of the substrate and made of rubber or a similar elastic material so as to protrude toward the back surface D1 of the substrate D. /!
- the gap 2, the fixed plate 3 and the surface receiving plate 4 are unitized, and a large number of units U are distributed at equal intervals on the holding surface 1 so that each unit U is arranged on the back surface D1 of the substrate D.
- Each of the surface receiving plates 4 is held in contact with each other in a flat shape, and the gap 2 is used as a clearance space when the integrated fixed plate 3 and surface receiving plate 4 are elastically deformed. And then.
- about 200 sets of the unit U are arranged at a pitch of about 100 mm with respect to the holding surface 1 whose XY dimension is, for example, 1500 X 1800 mm.
- a gap portion 2 is formed in a disc shape with respect to the holding surface 1, and a disc shape having a larger diameter than that is formed.
- the gap plate 2 is arranged so as to cover the entire gap portion 2 with the elastically deformable fixing plate 3, and its peripheral portion is attached to the holding surface 1 with a screw or the like.
- the rubber bearing plate 4 formed in a disk shape smaller than the opening area of the rubber plate is integrally fixed with an adhesive, and the surface receiving plate 4 is brought into contact with the substrate D to be flat. It is held while receiving
- the thickness dimensions of some of the surface receiving plates 4 are When the thickness of the other surface receiving plate 4 is larger than that of the other surface receiving plate 4, the surface receiving plate 4 ′ having a larger thickness as shown in FIG. 1 (c) comes into contact with the back surface D1 of the substrate D.
- the fixing plate 3 supporting it is elastically deformed toward the gap 2, this elastic deformation is released to the gap 2, so that the surface receiving plate 4 ′ having a large thickness sinks toward the gap 2. And flattened with the face plate 4 of the other unit U.
- the gap portion 2 is recessed in a rectangular plate shape with respect to the holding surface 1 as shown in Figs. 2 (a) to 2 (c), whereby a large rectangular plate-like fixing plate is formed. 3 so that the gap 2 is partially covered, and both ends thereof are attached to the holding surface 1 with screws or the like, and the opening area of the gap 2 is approximately at the center of the fixing plate 3.
- the configuration in which the rubber bearing plate 4 formed in a smaller rectangular plate shape is fixed integrally with an adhesive is different from that in the first embodiment shown in FIG. The same as in Example 1.
- the second embodiment shown in FIG. 2 can achieve the same operational effects as the first embodiment described above.
- a cavity 2 recessed in the holding surface 1 as shown in Figs. 3 (a) to 3 (c) is covered with a fixing plate 3 having a material force that is not easily elastically deformed.
- a plurality of through holes 3a are opened in the thickness direction of the fixing plate 3 at appropriate intervals, and an elastic material (rubber) is made from the inside of the through holes 3a along at least the substrate side surface of the fixing plate 3.
- the surface receiving plate 4 is integrally formed, and the substrate side laminated portion (surface side laminated portion) 4a of the surface receiving plate 4 is caused to float (flow) to the opposite side 4b through the through hole 3a.
- the configuration that escapes to the gap portion 2 is different from the first embodiment shown in FIG. 1 and the second embodiment shown in FIG. 2, and the other configurations are the same as the first and second embodiments. .
- the gap 2, the fixing plate 3, and the surface receiving plate 4 are formed in the same disk shape as in the first embodiment shown in FIG. 1, and a round hole is opened as the through hole 3a.
- the substrate-side stacked portion 4a and the back-side stacked portion 4b are formed at the same time by integrally forming along both the front and back surfaces of the fixing plate 3 through the through holes 3a.
- Example 2 shown in FIG. 2 may be used, or a hole having a shape other than a round hole such as a square hole may be opened as the through hole 3a. It is possible.
- the substrate side stacked portions 4a of some of the surface receiving plates 4 are included. Thickness dimensional force of other surface plate 4
- the substrate side laminated part 4a may be thicker than the thickness dimension.
- Example 3 shown in FIG. 3 also has the same effects as those of Example 1 and Example 2 described above.
- the substrate side of the elastic material (rubber) surface receiving plate 4 is compared to that obtained by elastically deforming the fixed plate 3 as in Example 1 and flattening with the other surface receiving plate 4. Since the laminated portion 4a 'is easily elastically deformed even if the contact force with the substrate D is small, the followability by the elastic deformation in the longitudinal direction (Z direction) of the surface receiving plate 4 is improved, and the flattening is performed. As a result, the required flatness of the holding surface 1 can be more reliably achieved, and as a result, the substrate can be bonded with higher accuracy.
- the surface receiving plate 4 is formed in a body from the inside of the through hole 3a along at least the substrate side surface of the fixed plate 3, the surface receiving plate 4 is fixed to the fixed plate 3 and integrated. Compared to the first embodiment, the position plate 4 can be prevented from being displaced with respect to the fixed plate 3 and the fixed plate 3 and the surface plate 4 can be handled easily.
- the face plate 4 is integrally formed along both the front and back surfaces of the fixing plate 3 through the hole 3a, there is an advantage that it is further improved.
- the substrate side laminated portion 4a of the surface receiving plate 4 formed on the surface of the fixed plate 3 on the substrate side.
- the substrate-side laminated part 4a when the substrate-side laminated part 4a is compressed and deformed, it does not expand in the horizontal direction ( ⁇ ⁇ direction) and moves (flows) to the opposite side 4b. There is also an advantage that there is no adverse effect when deployed.
- This Example 4 is a rubber bearing that is formed in a disc shape or a rectangular plate shape so as to allow the substrate D to be adhered and held as shown in Figs. 4 (a) and 4 (b).
- An adhesive portion 4c is provided on the surface of the plate 4, and a lift pin 5 is provided as a means for separating the adhesive portion 4c from the substrate D. By the extension movement of the lift pin 5, the back surface D1 of the substrate D is removed from the adhesive portion 4c.
- the configuration for forced peeling is different from Example 1 shown in FIG. 1 and Example 2 shown in FIG. 2 and Example 3 shown in FIG. Same as Example 2 and Example 3.
- the adhesive portion 4c is preferably disposed close to a later-described lift pin 5 and is partially disposed so as to be annular along the periphery of a later-described through hole 5a. .
- the force for surface treatment of the bearing plate 4 which is also a rubber material or the like
- the adhesive portion 4c is formed integrally with the surface of the surface receiving plate 4 only at a desired location on the surface thereof, or formed integrally therewith.
- the lift pin 5 is used when the substrate D is transferred from the substrate transfer robot (not shown) to the upper and lower holding plates B and C, and the lift pin 5 is fixed to the fixing plate 3 from the gap 2 of the holding surface 1. Further, a through hole 5a penetrating linearly across the surface receiving plate 4 is opened, and it is disposed inside the through hole 5a so as to reciprocate toward the substrate D! /.
- the gap 2, the fixed plate 3, and the surface receiving plate 4 are shown in the same disk shape as in the first embodiment shown in FIG.
- FIGS. 5 (a) and 5 (b) show a process in which the held substrates D and D are bonded together by the substrate bonding apparatus including the substrate holding structure A having such a structure.
- a large number of units U having the above-described structure are incorporated into the base la of the lower holding plate C to adhere and hold the back surface D1 of the lower substrate D, and the upper holding plate. Hold the back surface D 1 of the upper substrate D immovably by the electrostatic chuck 6 built in B.
- a large number of units U having the above-described structure can be incorporated to adhere and hold the back surface D1 of the upper substrate D.
- the upper and lower holding plates B and C approach each other to form a closed space S between them, and then the upper and lower holding plates B and C adjust and move in the XY 0 direction, and the substrates D and D Then, the upper substrate D is forcibly separated from the holding surface 1 of the upper holding plate B as shown in Fig. 5 (b), and the annular adhesive (sealant) on the lower substrate D is then removed.
- the two substrates D and D are pressurized to a predetermined gap by the pressure difference generated between the inside and outside of the substrates D and D! /
- Example 4 shown in FIG. 4 and FIG. 5 also provides the same operational effects as those of Example 1, Example 2 and Example 3 described above, and additionally, the lower holding plate C has the holding surface 1.
- Example 5 As a means for separating the adhesive portion 4c and the substrate D as shown in Figs. 6 (a) and 6 (b), a pedestal lb that can be raised and lowered with respect to the holding surface 1, and a recess provided in the pedestal.
- a large number of elevating units U ⁇ consisting of the gap 2, fixed plate 3 and face plate 4 are arranged so as to be able to reciprocate vertically so as to approach or separate from the base plate D with respect to the holding surface 1 respectively.
- the configuration in which the entire lifting unit U including the adhesive portion 4c provided on the surface of the surface receiving plate 4 is forcibly removed from the back surface D1 of the substrate D by driving the actuator 7 is shown in FIG. (a) Unlike Example 4 shown in (b) and FIGS. 5 (a) and (b), the other configurations are the same as Example 4.
- a large number of lifting units U ⁇ having the above-described structure can be incorporated in both the holding surfaces 1 and 1 of the upper and lower holding plates B and C so as to be reciprocally movable.
- the upper and lower holding plates B and C have a large number of adhesive portions 4c provided on both the holding surfaces 1 and 1, respectively. An effect is obtained that the back surface Dl, D1 of D, D1 can be securely contacted and adhered and held, thereby preventing the substrate D from being displaced due to insufficient adhesion.
- the substrate holding structure A of the present invention is provided in a substrate bonding apparatus for bonding and holding a glass substrate such as a liquid crystal display (LCD) panel
- the present invention is not limited to this. Even if it is installed on a substrate assembly device other than this substrate bonding device, a substrate transport device that transports substrates, or a substrate other than the glass substrate for LCD panels is adhesively held good.
- the substrate bonding apparatus for bonding the upper and lower substrates D, D in a vacuum has been described.
- the present invention is not limited to this, and a substrate bonding apparatus for bonding the substrates D, D in the atmosphere may be used.
- the same effect as the above-described vacuum bonding apparatus can be obtained.
- FIG. 1 (a) is a partial plan view showing Example 1 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) shows during elastic deformation. It is a vertical front view.
- FIG. 2 (a) is a partial plan view showing Example 2 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) is a longitudinal front view showing during elastic deformation. It is.
- FIG. 3 (a) is a partial plan view showing Embodiment 3 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) is a longitudinal front view showing the state of elastic deformation. It is.
- FIG. 4 (a) is a partial plan view showing Example 4 of the substrate holding structure of the present invention, and (b) is a longitudinal front view.
- FIG. 5 is a reduced longitudinal sectional front view in which the substrate holding structure of Example 4 is incorporated in a substrate bonding apparatus, and its operation process is shown in (a) and (b).
- FIG. 6 is a reduced longitudinal front view showing Example 5 in which the substrate holding structure of the present invention is incorporated in a substrate bonding apparatus, and its operation steps are shown in (a) and (b).
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Abstract
Description
明 細 書 Specification
基板保持構造 Substrate holding structure
技術分野 Technical field
[0001] 本発明は、例えば液晶ディスプレー(LCD)やプラズマディスプレー(PDP)などの フラットパネルディスプレーの製造過程にぉ 、て、 CFガラスや TFTガラスなどのガラ ス製基板か又は合成樹脂製基板を粘着保持して貼り合わせる基板貼り合わせ機を 含む基板組立装置や、基板を搬送する基板搬送装置などに用いられる基板保持構 造に関する。 [0001] The present invention relates to a glass substrate such as CF glass or TFT glass or a synthetic resin substrate in the manufacturing process of a flat panel display such as a liquid crystal display (LCD) or a plasma display (PDP). The present invention relates to a substrate holding structure used for a substrate assembling apparatus including a substrate laminating machine for holding and sticking and bonding, and a substrate transporting apparatus for transporting a substrate.
詳しくは、保持面に対し基板を、分散された複数箇所で面受けして、平坦度を確保 しながら保持する基板保持構造に関する。 More specifically, the present invention relates to a substrate holding structure that holds a substrate with respect to the holding surface at a plurality of dispersed positions and holds the substrate while ensuring flatness.
背景技術 Background art
[0002] 従来、この種の基板保持構造としては、加圧板とテーブルの保持面に開口を夫々 複数個ずつ設け、これら開口内に回転用ァクチユエータと上下駆動用ァクチユエ一 タを夫々備え、夫々の回転用ァクチユエ一タカも伸びた回転軸の先端に粘着部材が 取り付けられ、上下駆動用ァクチユエータの動作により開口内で各粘着部材を移動 して露出させ、基板に接触して粘着保持させ、この保持状態のまま位置決めしながら 貼り合わせを行い、粘着部材を各開口内に退行させる時は、粘着部材を基板面に対 して回転用ァクチユエータにより捻りながら、又は捻って力も上下駆動用ァクチユエ一 タにより退行させて、粘着部材を基板カゝら剥がすものがある(例えば、特許文献 1参 照)。 Conventionally, as this type of substrate holding structure, a plurality of openings are provided in each of the holding surfaces of the pressure plate and the table, and a rotation actuator and a vertical drive actuator are provided in each of these openings. The adhesive member is attached to the tip of the rotating shaft where the rotary actuator also extends, and the adhesive member is moved and exposed within the opening by the operation of the vertical drive actuator. When sticking while positioning and positioning the adhesive member in each opening, twist the adhesive member against the substrate surface with the rotation actuator or use the vertical drive actuator to twist the force. There is one that retreats and peels the adhesive member off the substrate cover (see, for example, Patent Document 1).
[0003] 特許文献 1 :特開 2003— 273508号公報(第 3— 5頁、図 1— 5) [0003] Patent Document 1: Japanese Patent Application Laid-Open No. 2003-273508 (Page 3-5, Fig. 1-5)
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0004] しかし乍ら、このような従来の基板保持構造では、基板に複数の粘着部材を接触さ せて平坦状に面受けしながら保持することで、 2枚の基板の貼り合わせを行って 、る 1S この面受けする保持面側に要求される平面度は、一辺が例えば 1000mmを越 える大型の基板であっても士数十 μ mの範囲である。 これに対し、面受けする粘着部材の材料としては、確実な粘着を実行するため主に ゴムのような弾性材料を使用するが、このゴムの寸法精度は曖昧で士数百/ z mであ る。 However, in such a conventional substrate holding structure, two substrates are bonded together by holding a plurality of adhesive members in contact with the substrate and holding them flatly. The flatness required for the holding surface side that receives this surface is in the range of several tens of μm even for a large substrate having a side exceeding 1000 mm, for example. On the other hand, as the material of the adhesive member to be received, an elastic material such as rubber is mainly used in order to perform reliable adhesion. However, the dimensional accuracy of this rubber is vague and is several hundred / zm. .
従って、面受けする粘着部材の材料としてゴムを使用した場合には、基板を面受け する保持面側のうち、各ゴムの配置部分のみが数百/ z mの凹凸となってしまい、要求 される平面度(士数十 /z m)を達成できず、その結果として、高精度な基板貼り合わ せができな!/、と!、う問題があった。 Therefore, when rubber is used as the material for the pressure-sensitive adhesive member for receiving the surface, only the rubber arrangement portion of the holding surface for receiving the substrate becomes unevenness of several hundreds / zm, which is required. Flatness (several tens / zm) could not be achieved, and as a result, there was a problem that it was impossible to attach substrates with high precision!
更に、厚みの薄い粘着部材は基板と接触しない場合もあり、そのため粘着力が不 足して基板が位置ズレしたり落下する恐れもあった。 In addition, the thin adhesive member may not contact the substrate, so that the adhesive force is insufficient and the substrate may be displaced or dropped.
[0005] 本発明のうち請求項 1記載の発明は、弾性材料としてゴムを使用しても要求される 保持面側の平面度を達成することを目的としたものである。 [0005] Of the present invention, the invention described in claim 1 aims to achieve the flatness on the holding surface side that is required even when rubber is used as the elastic material.
請求項 2記載の発明は、請求項 1に記載の発明の目的に加えて、面受けプレート の縦方向の弾性変形による倣い性を向上させることを目的としたものである。 In addition to the object of the invention described in claim 1, the invention described in claim 2 aims to improve the followability by elastic deformation in the longitudinal direction of the surface receiving plate.
請求項 3記載の発明は、請求項 1または 2に記載の発明の目的に加えて、粘着力 不足による基板の位置ズレゃ落下を確実に防止することを目的としたものである。 課題を解決するための手段 In addition to the object of the invention described in claim 1 or 2, the invention described in claim 3 is intended to reliably prevent the substrate from being displaced due to insufficient adhesive force. Means for solving the problem
[0006] 前述した目的を達成するために、本発明のうち請求項 1記載の発明は、保持面に 複数の空隙部を分散させて凹設し、これら空隙部の開口を弾性変形可能な固定プレ ートで夫々覆い、各固定プレートの略中央に、上記空隙部の開口よりも小さな弹性材 料力もなる面受けプレートを基板へ向け突出するように取り付けて、この固定プレート 及び面受けプレートを一体ィ匕し、これら分散された面受けプレートを基板に夫々当接 させて平坦状に面受けしながら保持すると共に、上記空隙部を、一体化された固定 プレート及び面受けプレートの弾性変形の逃げ空間として利用したことを特徴とする ものである。 [0006] In order to achieve the above-mentioned object, the invention according to claim 1 of the present invention is configured such that a plurality of voids are dispersed and recessed in the holding surface, and the openings of these voids are fixed to be elastically deformable. Each plate is covered with a plate, and a surface receiving plate having a inertia material force smaller than the opening of the gap is attached to the center of each fixed plate so as to protrude toward the substrate, and the fixed plate and the surface receiving plate are attached. These dispersed surface receiving plates are brought into contact with the substrate and held while being flatly supported, and the above-mentioned gap is formed by elastic deformation of the integrated fixing plate and surface receiving plate. It is characterized by being used as a escape space.
請求項 2記載の発明は、請求項 1記載の発明の構成に、前記固定プレートに貫通 孔を開穿し、この貫通孔の内部力 上記固定プレートの少なくとも基板側表面に沿つ て面受けプレートを一体的に形成し、該面受けプレートの基板側積層部の圧縮変形 を、上記貫通孔を通して反対側へ遊動させた構成を加えたことを特徴とする。 請求項 3記載の発明は、請求項 1または 2に記載の発明の目的に加えて、粘着力 不足による基板の位置ズレゃ落下を確実に防止することを目的としたものである。 発明の効果 The invention according to claim 2 is the structure of the invention according to claim 1, wherein a through hole is opened in the fixing plate, and an internal force of the through hole is a surface receiving plate along at least the substrate side surface of the fixing plate. Are integrally formed, and a structure is added in which the compressive deformation of the substrate-side laminated portion of the surface receiving plate is moved to the opposite side through the through hole. In addition to the object of the invention described in claim 1 or 2, the invention described in claim 3 is intended to reliably prevent the substrate from being displaced due to insufficient adhesive force. The invention's effect
[0007] 本発明のうち請求項 1記載の発明は、保持面に複数の空隙部を分散させて凹設し 、これら空隙部の開口を固定プレートで夫々覆い、各固定プレートの略中央に、上記 空隙部の開口よりも小さな弾性材料力もなる面受けプレートを基板へ向け突出するよ うに取り付けて、これら両者を一体ィ匕し、このように分散配置された面受けプレートを 基板に夫々当接させて平坦状に面受けしながら保持することにより、弾性材料力 な る面受けプレートの厚み寸法にバラツキがあった時には、厚さ寸法の大き 、面受けプ レートが基板と当接することに伴い、その固定プレート又は該面受けプレートが空隙 部へ向け弾性変形して、この弾性変形を空隙部に逃がし、それにより厚さ寸法の大き V、面受けプレートが空隙部側へ沈み込んで、その他の面受けプレートと平坦ィヒされ る。 [0007] Of the present invention, the invention according to claim 1 is formed by dispersing a plurality of gaps on the holding surface and forming recesses, covering the openings of these gaps with fixing plates, respectively, at substantially the center of each fixing plate, Attach a bearing plate that has a smaller elastic material force than the opening of the above-mentioned gap so that it protrudes toward the substrate. If there is variation in the thickness of the surface receiving plate that is elastic material force by holding it while flatly receiving it, the thickness of the surface receiving plate becomes larger as the surface receiving plate comes into contact with the substrate. The fixed plate or the surface receiving plate is elastically deformed toward the gap, and this elastic deformation is released to the air gap, so that the thickness V is large, and the surface receiving plate sinks toward the air gap. of Receiving plate and Ru are flat I fire.
従って、弾性材料としてゴムを使用しても要求される保持面側の平面度を達成する ことができる。 Therefore, even when rubber is used as the elastic material, the required flatness on the holding surface side can be achieved.
その結果、基板を面受けする保持面側のうち、各ゴムの配置部分のみが数百/ z m の凹凸とならず、高精度な基板貼り合わせができる。 As a result, on the holding surface side for receiving the substrate, only the rubber arrangement portions do not have unevenness of several hundreds / z m, and the substrates can be bonded with high accuracy.
[0008] 請求項 2の発明は、請求項 1の発明の効果にカ卩えて、固定プレートに貫通孔を開 穿し、この貫通孔の内部から上記固定プレートの少なくとも基板と対向する表面に沿 つて面受けプレートを形成することにより、面受けプレートの基板側積層部の厚み寸 法にバラツキがあった時には、厚さ寸法の大きい面受けプレートの基板側積層部が 基板と当接することに伴い、該面受けプレートの基板側積層部自体が圧縮変形し、 貫通孔を通って反対側へ遊動させ、それにより厚さ寸法の大き!、面受けプレートの 基板側積層部が空隙部側へ沈み込んで、その他の面受けプレートの基板側積層部 と平坦化される。 [0008] In the invention of claim 2, in consideration of the effect of the invention of claim 1, a through hole is formed in the fixing plate, and at least the surface of the fixing plate facing the substrate is formed from the inside of the through hole. Therefore, when there is variation in the thickness dimension of the substrate-side laminated portion of the surface receiving plate by forming the surface receiving plate, the substrate-side laminated portion of the surface receiving plate having a large thickness is brought into contact with the substrate. Then, the substrate side laminated part of the surface receiving plate is compressed and deformed, and is moved to the opposite side through the through-hole, thereby increasing the thickness dimension !, and the substrate side laminated part of the surface receiving plate sinks to the gap side. And flattened with the other laminated parts on the substrate side of the surface receiving plate.
従って、面受けプレートの縦方向の弾性変形による倣い性を向上させることができ る。 Accordingly, it is possible to improve the copyability due to the elastic deformation in the vertical direction of the surface receiving plate.
その結果、要求される保持面側の平面度をより確実に達成することができて、更に 高精度な基板貼り合わせができる。 As a result, the required flatness on the holding surface side can be achieved more reliably, and further High precision substrate bonding is possible.
また、貫通孔の内部から固定プレートの少なくとも基板側表面に沿って面受けプレ ートを一体的に形成するため、固定プレートに対する面受けプレートの位置ズレゃ剥 がれなどを防止できる共に、これら固定プレート及び面受けプレートの取り扱いも容 易である。 In addition, since the face plate is integrally formed from the inside of the through hole along at least the substrate side surface of the fixed plate, it is possible to prevent the position plate from being misaligned with respect to the fixed plate. Handling of fixed plate and bearing plate is easy.
[0009] 請求項 3の発明は、請求項 1または 2の発明の効果にカ卩えて、面受けプレートの表 面に粘着部を設けることにより、これら粘着部が基板に対し確実に接触して粘着保持 される。 [0009] In addition to the effects of the invention of claim 1 or 2, the invention of claim 3 provides an adhesive portion on the surface of the surface receiving plate so that the adhesive portion can be surely brought into contact with the substrate. Adhesion is retained.
従って、粘着力不足による基板の位置ズレゃ落下を確実に防止することができる。 発明を実施するための最良の形態 Therefore, it is possible to reliably prevent the substrate from being displaced due to insufficient adhesive force. BEST MODE FOR CARRYING OUT THE INVENTION
[0010] 本発明の基板保持構造 Aが、液晶ディスプレー (LCD)パネルなどのガラス基板を 粘着保持して貼り合わせる基板貼り合わせ装置に配備された場合を示す。 [0010] The case where the substrate holding structure A of the present invention is provided in a substrate bonding apparatus that bonds and holds a glass substrate such as a liquid crystal display (LCD) panel is shown.
この基板貼り合わせ機は、図 1〜図 6に示す如ぐ上下に配置された保持板 B,じの 平行に対向する保持面 1, 1に二枚のガラス製基板 D, Dを夫々保持させ、それらの 周囲に区画形成された閉空間 S内が所定の真空度に達してから、上下保持板 B, C を相対的に ΧΥ Θ方向(水平方向)へ調整移動し、基板 D, D同士の位置合わせが行 われ、その後、上保持板 Bの保持面 1から上基板 Dを強制的に剥離して下基板 D上 の環状接着剤 (シール材) Eへ瞬間的に圧着することにより、両者間を封止して重ね 合わせ、その後は、両基板 D, Dの内外に生じる気圧差で両基板 D, Dの間を所定の ギャップまで加圧するものである。 This substrate laminating machine holds two glass substrates D and D on holding surfaces 1 and 1, which are arranged in parallel with each other, as shown in FIGS. After the inside of the closed space S defined around them reaches a predetermined degree of vacuum, the upper and lower holding plates B and C are relatively adjusted in the Θ Θ direction (horizontal direction), and the substrates D and D After that, the upper substrate D is forcibly peeled from the holding surface 1 of the upper holding plate B and is instantaneously pressure-bonded to the annular adhesive (seal material) E on the lower substrate D. The two are sealed and overlapped, and thereafter, a pressure difference between the substrates D and D is pressurized to a predetermined gap between the substrates D and D.
[0011] 詳しく説明すれば、上下保持板 B, Cが昇降手段(図示せず)で Z方向(上下方向) へ相対的に移動可能に支持され、これら上下保持板 B, Cを上下方向へ離した状態 で、夫々の保持面 1, 1に基板 D, Dがセットされ、その後、この昇降手段の作動により 上下保持板 B, Cを接近させることにより閉空間 Sが区画形成される。 More specifically, the upper and lower holding plates B and C are supported by an elevating means (not shown) so as to be relatively movable in the Z direction (up and down direction), and the upper and lower holding plates B and C are moved in the vertical direction. In the separated state, the substrates D and D are set on the holding surfaces 1 and 1, respectively, and then the upper and lower holding plates B and C are brought close by the operation of the lifting means to form the closed space S.
[0012] そして、この閉空間 Sから吸気手段(図示せず)の作動により、空気を抜いて所定の 真空度に達したところで、水平移動手段(図示せず)の作動により、上下保持板 B, C のどちらか一方を他方に対し XY 0方向へ調整移動させることで、それらに保持され た基板 D, D同士の位置合わせ (ァライメント)として粗合わせと微合わせが順次行わ れる。 [0012] Then, when the air is exhausted from the closed space S by the operation of the intake means (not shown) to reach a predetermined degree of vacuum, the upper and lower holding plates B are operated by the operation of the horizontal moving means (not shown). , C is adjusted and moved in the XY 0 direction with respect to the other, so that coarse alignment and fine alignment are sequentially performed as alignment (alignment) between the substrates D and D held by them. It is.
[0013] これらの位置合わせが完了して上下基板 D, Dを重ね合わせた後は、閉空間 S内 に空気や窒素を供給して、該閉空間 S内の雰囲気を大気圧に戻すことにより、両基 板 D, Dの内外に生じる気圧差で均等に加圧され、液晶が封入された状態で所定の ギャップまで押し潰れて製品を完成させて!/、る。 [0013] After these alignments are completed and the upper and lower substrates D and D are overlapped, air or nitrogen is supplied into the closed space S, and the atmosphere in the closed space S is returned to atmospheric pressure. Then, pressurize evenly by the pressure difference generated between the inside and outside of both substrates D, D, and crush to a predetermined gap with the liquid crystal sealed.
[0014] 更に、上下保持板 B, Cの基板側である保持面 1, 1には、弾性材料カゝらなる複数の 面受け部を分散配置し、これら面受け部を上下基板 D, Dに当接させて平坦状に面 受けしながら着脱自在に保持すれば、該保持面 1に対して基板 Dの裏面 D1が ΧΥ Θ 方向へ位置ズレ (横ズレ)するのを防止できると共に、これら面受け部の表面を粘着 部材で形成すれば、基板 Dの粘着保持が可能となる。 [0014] Further, on the holding surfaces 1 and 1 on the substrate side of the upper and lower holding plates B and C, a plurality of surface receiving portions made of an elastic material are distributed, and these surface receiving portions are arranged on the upper and lower substrates D and D. The back surface D1 of the substrate D can be prevented from being displaced in the ΧΥΘ direction (lateral displacement) with respect to the holding surface 1 by holding it detachably while being in contact with the flat surface. If the surface of the surface receiving portion is formed of an adhesive member, the substrate D can be held in an adhesive state.
[0015] しかし、上記面受け部の弾性材料としてゴム材を用いた場合には、該ゴムの寸法精 度が士数百; z mであるため、保持面 1全体のうちゴムの配置部分のみが数百/ z mの 凹凸となってしまい、基板貼り合わせ装置の保持板 B, Cの保持面 1として要求される 平面度(士数十/ z m)を達成できな力つた。 [0015] However, when a rubber material is used as the elastic material of the surface receiving portion, the dimensional accuracy of the rubber is several hundreds; zm. The unevenness was several hundreds / zm, and the flatness (tens of tens / zm) required as the holding surface 1 of the holding plates B and C of the substrate bonding apparatus was not achieved.
[0016] そこで、このような問題を解決するために、少なくとも上下保持板 B, Cの基板側で ある保持面 1, 1のどちらか一方か又は両方に、本発明の基板保持構造 Aを備える。 本発明の基板保持構造 Aは、図 1及び図 2に示す如ぐ基板 Dの裏面 D1と対向す る保持面 1に、複数の空隙部 2を分散させて凹設し、これら空隙部 2の開口を、例え ばステンレスやそれ以外の金属などの弾性変形可能な材料又は弾性変形し難い材 料力もなる固定プレート 3で夫々覆い、夫々の固定プレート 3の略中央には、上記空 隙部 2の開口面積よりも小さくてゴム又はそれに類似する弾性材料で形成された面 受けプレート 4を基板 Dの裏面 D1へ向け突出するように取り付けることで、これら固定 プレート 3及び面受けプレート 4を一体化して!/、る。 [0016] Therefore, in order to solve such a problem, at least one or both of the holding surfaces 1 and 1 on the substrate side of the upper and lower holding plates B and C are provided with the substrate holding structure A of the present invention. . In the substrate holding structure A of the present invention, a plurality of voids 2 are dispersed and recessed in the holding surface 1 facing the back surface D1 of the substrate D as shown in FIGS. The opening is covered with an elastically deformable material such as stainless steel or other metal, or a fixed plate 3 that is also difficult to elastically deform, and the above-mentioned gap portion 2 is provided at the approximate center of each fixed plate 3. The fixing plate 3 and the surface receiving plate 4 are integrated by attaching a surface receiving plate 4 which is smaller than the opening area of the substrate and made of rubber or a similar elastic material so as to protrude toward the back surface D1 of the substrate D. /!
[0017] これら空隙部 2、固定プレート 3及び面受けプレート 4はユニットィ匕され、上記保持面 1に対し多数のユニット Uを等間隔毎に分散配置して、基板 Dの裏面 D1に各ユニット Uの面受けプレート 4を夫々面接触させて平坦状に面受けしながら保持すると共に、 上記空隙部 2を、一体化された固定プレート 3及び面受けプレート 4が弾性変形した 時の逃げ空間として利用して 、る。 その具体例を挙げれば、 XY方向寸法が例えば 1500 X 1800mmの保持面 1に対し て、上記ユニット Uを約 100mm程度のピッチで約 200組程度配置する。 [0017] The gap 2, the fixed plate 3 and the surface receiving plate 4 are unitized, and a large number of units U are distributed at equal intervals on the holding surface 1 so that each unit U is arranged on the back surface D1 of the substrate D. Each of the surface receiving plates 4 is held in contact with each other in a flat shape, and the gap 2 is used as a clearance space when the integrated fixed plate 3 and surface receiving plate 4 are elastically deformed. And then. To give a specific example, about 200 sets of the unit U are arranged at a pitch of about 100 mm with respect to the holding surface 1 whose XY dimension is, for example, 1500 X 1800 mm.
以下、本発明の各実施例を図面に基づいて説明する。 Embodiments of the present invention will be described below with reference to the drawings.
実施例 1 Example 1
[0018] この実施例 1は、図 1 (a)及び (b)に示す如ぐ前記保持面 1に対して空隙部 2を円 板状に凹設し、それより大径な円板状の弾性変形可能な固定プレート 3で空隙部 2 の全体を覆うように配置すると共に、その周縁部を保持面 1に対してネジなどで取り 付け、この固定プレート 3の略中央に、上記空隙部 2の開口面積よりも小さい円板状 に形成されたゴム製の面受けプレート 4を接着剤なとで一体的に固着し、これら面受 けプレート 4を基板 Dに夫々当接させて平坦状に面受けしながら保持したものである [0018] In the first embodiment, as shown in Figs. 1 (a) and (b), a gap portion 2 is formed in a disc shape with respect to the holding surface 1, and a disc shape having a larger diameter than that is formed. The gap plate 2 is arranged so as to cover the entire gap portion 2 with the elastically deformable fixing plate 3, and its peripheral portion is attached to the holding surface 1 with a screw or the like. The rubber bearing plate 4 formed in a disk shape smaller than the opening area of the rubber plate is integrally fixed with an adhesive, and the surface receiving plate 4 is brought into contact with the substrate D to be flat. It is held while receiving
[0019] そして、このような空隙部 2、固定プレート 3及び面受けプレート 4からなるユニット U を保持面 1に対して分散配置した状態で、そのうちいくつかの面受けプレート 4の厚さ 寸法が、その他の面受けプレート 4の厚さ寸法よりも厚い場合には、図 1 (c)に示す如 ぐこの厚さ寸法の大きい面受けプレート 4' が基板 Dの裏面 D1と当接することに伴 い、それを支持する固定プレート 3が空隙部 2へ向け弾性変形することで、この弾性 変形を空隙部 2に逃がし、それにより厚さ寸法の大きい面受けプレート 4' が空隙部 2側へ沈み込んで、その他のユニット Uの面受けプレート 4と平坦ィ匕される。 [0019] Then, in a state where the unit U composed of the gap 2, the fixed plate 3, and the surface receiving plate 4 is dispersedly arranged with respect to the holding surface 1, the thickness dimensions of some of the surface receiving plates 4 are When the thickness of the other surface receiving plate 4 is larger than that of the other surface receiving plate 4, the surface receiving plate 4 ′ having a larger thickness as shown in FIG. 1 (c) comes into contact with the back surface D1 of the substrate D. When the fixing plate 3 supporting it is elastically deformed toward the gap 2, this elastic deformation is released to the gap 2, so that the surface receiving plate 4 ′ having a large thickness sinks toward the gap 2. And flattened with the face plate 4 of the other unit U.
[0020] それにより、面受けプレート 4の材料として、その寸法精度が士数百/ z mのゴムを使 用しても、要求される保持面 1の平面度、数十 mを達成でき、その結果として高精 度な基板貼り合わせが可能となる。 [0020] Accordingly, even when rubber having a dimensional accuracy of several hundreds of z / zm is used as the material of the surface receiving plate 4, the required flatness of the holding surface 1, several tens of meters, can be achieved. As a result, highly accurate substrate bonding becomes possible.
実施例 2 Example 2
[0021] この実施例 2は、図 2 (a)〜(c)に示す如ぐ前記保持面 1に対して空隙部 2を矩形 板状に凹設し、それにより大きな矩形板状の固定プレート 3で空隙部 2を部分的に覆 うように配置すると共に、その両端部を保持面 1に対してネジなどで取り付け、この固 定プレート 3の略中央には、上記空隙部 2の開口面積よりも小さい矩形板状に形成さ れたゴム製の面受けプレート 4を接着剤なとで一体的に固着した構成が、前記図 1に 示した実施例 1とは異なり、それ以外の構成は実施例 1と同じものである。 [0022] 従って、図 2に示す実施例 2も、上述した実施例 1と同様な作用効果が得られる。 実施例 3 [0021] In the second embodiment, the gap portion 2 is recessed in a rectangular plate shape with respect to the holding surface 1 as shown in Figs. 2 (a) to 2 (c), whereby a large rectangular plate-like fixing plate is formed. 3 so that the gap 2 is partially covered, and both ends thereof are attached to the holding surface 1 with screws or the like, and the opening area of the gap 2 is approximately at the center of the fixing plate 3. Unlike the embodiment 1 shown in FIG. 1, the configuration in which the rubber bearing plate 4 formed in a smaller rectangular plate shape is fixed integrally with an adhesive is different from that in the first embodiment shown in FIG. The same as in Example 1. [0022] Therefore, the second embodiment shown in FIG. 2 can achieve the same operational effects as the first embodiment described above. Example 3
[0023] この実施例 3は、図 3 (a)〜(c)に示す如ぐ前記保持面 1に凹設された空隙部 2を、 弾性変形し難い材料力もなる固定プレート 3で覆い、この固定プレート 3にはその厚さ 方向へ複数の貫通孔 3aを適宜間隔毎に開穿し、これら貫通孔 3aの内部から上記固 定プレート 3の少なくとも基板側表面に沿って弾性材料 (ゴム)製の面受けプレート 4 を一体的に形成すると共に、該面受けプレート 4の基板側積層部 (表面側積層部) 4a の圧縮変形を、上記貫通孔 3aを通して反対側 4bへ遊動 (流動)させることで空隙部 2 に逃がした構成が、前記図 1に示した実施例 1や図 2に示した実施例 2とは異なり、そ れ以外の構成は実施例 1や実施例 2と同じものである。 [0023] In the third embodiment, a cavity 2 recessed in the holding surface 1 as shown in Figs. 3 (a) to 3 (c) is covered with a fixing plate 3 having a material force that is not easily elastically deformed. A plurality of through holes 3a are opened in the thickness direction of the fixing plate 3 at appropriate intervals, and an elastic material (rubber) is made from the inside of the through holes 3a along at least the substrate side surface of the fixing plate 3. The surface receiving plate 4 is integrally formed, and the substrate side laminated portion (surface side laminated portion) 4a of the surface receiving plate 4 is caused to float (flow) to the opposite side 4b through the through hole 3a. The configuration that escapes to the gap portion 2 is different from the first embodiment shown in FIG. 1 and the second embodiment shown in FIG. 2, and the other configurations are the same as the first and second embodiments. .
[0024] 図示例では、上記空隙部 2、固定プレート 3及び面受けプレート 4を、前記図 1に示 した実施例 1と同じ円板状にすると共に、貫通孔 3aとして丸孔を開穿し、これら貫通 孔 3aを通って該固定プレート 3の表裏両面沿いに一体成形することにより、基板側積 層部 4aと裏面側積層部 4bが同時に形成された場合を示している。 In the illustrated example, the gap 2, the fixing plate 3, and the surface receiving plate 4 are formed in the same disk shape as in the first embodiment shown in FIG. 1, and a round hole is opened as the through hole 3a. In this example, the substrate-side stacked portion 4a and the back-side stacked portion 4b are formed at the same time by integrally forming along both the front and back surfaces of the fixing plate 3 through the through holes 3a.
それ以外の例として図示せぬが、前記図 2に示した実施例 2と同じ矩形板状にした り、貫通孔 3aとして例えば角孔など、丸孔以外の形状の孔を開穿することも可能であ る。 Although not shown as other examples, the same rectangular plate shape as in Example 2 shown in FIG. 2 may be used, or a hole having a shape other than a round hole such as a square hole may be opened as the through hole 3a. It is possible.
[0025] そして、このような空隙部 2、固定プレート 3及び面受けプレート 4からなるユニット U を保持面 1に分散配置した状態で、そのうちいくつかの面受けプレート 4の基板側積 層部 4aの厚さ寸法力 その他の面受けプレート 4の基板側積層部 4aの厚さ寸法より も厚い場合が考えられる。 [0025] Then, in a state in which the units U including the gap 2, the fixed plate 3, and the surface receiving plate 4 are dispersedly arranged on the holding surface 1, the substrate side stacked portions 4a of some of the surface receiving plates 4 are included. Thickness dimensional force of other surface plate 4 The substrate side laminated part 4a may be thicker than the thickness dimension.
この場合には、図 3 (c)に示す如ぐこの厚さ寸法の大きい面受けプレート 4' の基 板側積層部 4 が基板 Dの裏面 D1と当接すると、該面受けプレート^ の基板側 積層部 4a' 自体が圧縮変形し、その弾性材料 (ゴム)が貫通孔 3aを通って反対側 4 bへ遊動 (流動)することで、この圧縮変形を空隙部 2に逃がし、それにより厚さ寸法の 大きい面受けプレート 4' の基板側積層部 4 が空隙部 2側へ沈み込んで、その他 のユニット Uの面受けプレート 4の基板側積層部 4aと平坦ィ匕される。 In this case, as shown in FIG. 3 (c), when the base plate side laminated portion 4 of the large thickness plate 4 'comes into contact with the back surface D1 of the substrate D, the substrate of the surface plate ^ The side laminated part 4a 'itself compressively deforms, and its elastic material (rubber) loosens (flows) through the through hole 3a to the opposite side 4b, so that this compressive deformation is released to the gap part 2, thereby increasing the thickness. The board-side laminated portion 4 of the surface receiving plate 4 ′ having a large dimension sinks to the gap 2 side, and is flattened with the substrate-side laminated portion 4a of the other unit U surface receiving plate 4.
[0026] 従って、図 3に示す実施例 3も、上述した実施例 1や実施例 2と同様な作用効果が 得られ、更に加えて実施例 1のような固定プレート 3を弾性変形させて他の面受けプ レート 4と平坦ィ匕するものに比べ、弾性材料 (ゴム)製の面受けプレート 4の基板側積 層部 4a' は基板 Dとの当接力が小さくても容易に弾性変形するため、面受けプレー ト 4の縦方向(Z方向)の弾性変形による倣い性が向上して、平坦化のための作動が スムーズでしかも確実であり、要求される保持面 1の平面度をより確実に達成でき、そ の結果として更に高精度な基板貼り合わせが可能となるという利点がある。 Therefore, Example 3 shown in FIG. 3 also has the same effects as those of Example 1 and Example 2 described above. In addition to this, the substrate side of the elastic material (rubber) surface receiving plate 4 is compared to that obtained by elastically deforming the fixed plate 3 as in Example 1 and flattening with the other surface receiving plate 4. Since the laminated portion 4a 'is easily elastically deformed even if the contact force with the substrate D is small, the followability by the elastic deformation in the longitudinal direction (Z direction) of the surface receiving plate 4 is improved, and the flattening is performed. As a result, the required flatness of the holding surface 1 can be more reliably achieved, and as a result, the substrate can be bonded with higher accuracy.
[0027] また、貫通孔 3aの内部から固定プレート 3の少なくとも基板側表面に沿って面受け プレート 4がー体的に形成されるため、固定プレート 3に面受けプレート 4を固着して 一体ィ匕する実施例 1に比べ、固定プレート 3に対する面受けプレート 4の位置ズレゃ 剥がれなどを防止できる共に、これら固定プレート 3及び面受けプレート 4の取り扱い も容易であり、特に図示例のように貫通孔 3aを通って固定プレート 3の表裏両面沿い に面受けプレート 4を一体成形した場合には更に向上するという利点もある。 [0027] Further, since the surface receiving plate 4 is formed in a body from the inside of the through hole 3a along at least the substrate side surface of the fixed plate 3, the surface receiving plate 4 is fixed to the fixed plate 3 and integrated. Compared to the first embodiment, the position plate 4 can be prevented from being displaced with respect to the fixed plate 3 and the fixed plate 3 and the surface plate 4 can be handled easily. When the face plate 4 is integrally formed along both the front and back surfaces of the fixing plate 3 through the hole 3a, there is an advantage that it is further improved.
[0028] また更に、固定プレート 3に面受けプレート 4を固着して一体ィ匕する実施例 1に比べ 、固定プレート 3の基板側表面に形成される面受けプレート 4の基板側積層部 4aの 厚さを薄く形成できると共に、この基板側積層部 4aの圧縮変形時に水平方向 (ΧΥ Θ 方向)へ膨張せずに反対側 4bへ遊動(流動)するため、面受けプレート 4を相互に接 近させて配備した際に悪影響を与えることがないというという利点もある。 [0028] Further, as compared with the first embodiment in which the surface receiving plate 4 is fixed to the fixed plate 3 and integrally formed, the substrate side laminated portion 4a of the surface receiving plate 4 formed on the surface of the fixed plate 3 on the substrate side. In addition to being able to reduce the thickness, when the substrate-side laminated part 4a is compressed and deformed, it does not expand in the horizontal direction (ΧΥ Θ direction) and moves (flows) to the opposite side 4b. There is also an advantage that there is no adverse effect when deployed.
実施例 4 Example 4
[0029] この実施例 4は、図 4 (a) (b)に示す如ぐ前記基板 Dの粘着保持を可能とするため に、円板状又は矩形板状に形成されるゴム製の面受けプレート 4の表面に粘着部 4c を設けると共に、この粘着部 4cと基板 Dとの剥離手段としてリフトピン 5を配設し、この リフトピン 5の伸長移動によって、該粘着部 4cから基板 Dの裏面 D1を強制的に押し 剥がす構成が、前記図 1に示した実施例 1や図 2に示した実施例 2や図 3に示した実 施例 3とは異なり、それ以外の構成は実施例 1や実施例 2や実施例 3と同じものであ る。 [0029] This Example 4 is a rubber bearing that is formed in a disc shape or a rectangular plate shape so as to allow the substrate D to be adhered and held as shown in Figs. 4 (a) and 4 (b). An adhesive portion 4c is provided on the surface of the plate 4, and a lift pin 5 is provided as a means for separating the adhesive portion 4c from the substrate D. By the extension movement of the lift pin 5, the back surface D1 of the substrate D is removed from the adhesive portion 4c. The configuration for forced peeling is different from Example 1 shown in FIG. 1 and Example 2 shown in FIG. 2 and Example 3 shown in FIG. Same as Example 2 and Example 3.
[0030] 上記粘着部 4cは、後述するリフトピン 5と接近して配置することが好ましぐ図示例 では後述する通孔 5aの周囲に沿って環状となるように部分的に配設している。 [0030] In the illustrated example, the adhesive portion 4c is preferably disposed close to a later-described lift pin 5 and is partially disposed so as to be annular along the periphery of a later-described through hole 5a. .
この配設方法としては、ゴム材カもなる面受けプレート 4を表面処理する力、又はそ れに類似する加工を行うことで、その表面の所望箇所のみに粘着部 4cを、該面受け プレート 4の表面と面一状に一体形成するか或いは一体的に形成している。 As this arrangement method, the force for surface treatment of the bearing plate 4 which is also a rubber material or the like By performing processing similar to this, the adhesive portion 4c is formed integrally with the surface of the surface receiving plate 4 only at a desired location on the surface thereof, or formed integrally therewith.
[0031] 上記リフトピン 5は、基板搬送用ロボット(図示せず)から上下保持板 B, Cへ基板 D を受け渡す際に使用されるもので、前記保持面 1の空隙部 2から固定プレート 3及び 面受けプレート 4に亘つて直線状に貫通する通孔 5aが開穿され、この通孔 5aの内部 で基板 Dへ向けて往復動自在に配設して!/、る。 The lift pin 5 is used when the substrate D is transferred from the substrate transfer robot (not shown) to the upper and lower holding plates B and C, and the lift pin 5 is fixed to the fixing plate 3 from the gap 2 of the holding surface 1. Further, a through hole 5a penetrating linearly across the surface receiving plate 4 is opened, and it is disposed inside the through hole 5a so as to reciprocate toward the substrate D! /.
[0032] 更に図示例では、上記空隙部 2、固定プレート 3及び面受けプレート 4を、前記図 1 に示した実施例 1と同じ円板状にした場合を示している。 Further, in the illustrated example, the gap 2, the fixed plate 3, and the surface receiving plate 4 are shown in the same disk shape as in the first embodiment shown in FIG.
それ以外の例として図示せぬが、前記図 2に示した実施例 2と同じ矩形板状にする ことも可能であり、また前記図 3に示した実施例 3と同様に、固定プレート 3に貫通孔 3 aを開穿し、この貫通孔 3aを通って該固定プレート 3の表裏両面沿いに面受けプレー ト 4を一体成形することも可能である。 Although not shown as an example other than that, it is also possible to make the same rectangular plate shape as in the second embodiment shown in FIG. 2, and in the same way as in the third embodiment shown in FIG. It is also possible to open the through hole 3a and integrally form the surface receiving plate 4 along both the front and back surfaces of the fixing plate 3 through the through hole 3a.
[0033] このような構造の基板保持構造 Aを備えた基板貼り合わせ装置によって、保持した 基板 D, D同士が貼り合わされる工程を図 5 (a) (b)に示す。 [0033] FIGS. 5 (a) and 5 (b) show a process in which the held substrates D and D are bonded together by the substrate bonding apparatus including the substrate holding structure A having such a structure.
[0034] 図 5 (a)に示した例では、下方の保持板 Cの台座 laに上述した構造のユニット Uを 多数組み込んで、下基板 Dの裏面 D1を粘着保持すると共に、上方の保持板 Bに組 み込まれた静電チャック 6により上基板 Dの裏面 D 1を移動不能に保持して ヽる。 それ以外の変形例として、上方の保持板 Bの静電チャック 6に代えて、上述した構 造のユニット Uを多数組み込んで、上基板 Dの裏面 D1を粘着保持することも可能で ある。 [0034] In the example shown in Fig. 5 (a), a large number of units U having the above-described structure are incorporated into the base la of the lower holding plate C to adhere and hold the back surface D1 of the lower substrate D, and the upper holding plate. Hold the back surface D 1 of the upper substrate D immovably by the electrostatic chuck 6 built in B. As another modification, instead of the electrostatic chuck 6 of the upper holding plate B, a large number of units U having the above-described structure can be incorporated to adhere and hold the back surface D1 of the upper substrate D.
[0035] その後、これら上下保持板 B, Cが接近移動して両者間に閉空間 Sを区画形成して から、上下保持板 B, Cが XY 0方向へ調整移動して、基板 D, D同士の位置合わせ を行い、その後、図 5 (b)に示す如ぐ上保持板 Bの保持面 1から上基板 Dを強制的 に剥離して下基板 D上の環状接着剤 (シール材) Eへ瞬間的に圧着することにより、 両者間を封止して重ね合わせ、その後は、両基板 D, Dの内外に生じる気圧差で両 基板 D, Dの間を所定のギャップまで加圧して!/、る。 [0035] After that, the upper and lower holding plates B and C approach each other to form a closed space S between them, and then the upper and lower holding plates B and C adjust and move in the XY 0 direction, and the substrates D and D Then, the upper substrate D is forcibly separated from the holding surface 1 of the upper holding plate B as shown in Fig. 5 (b), and the annular adhesive (sealant) on the lower substrate D is then removed. The two substrates D and D are pressurized to a predetermined gap by the pressure difference generated between the inside and outside of the substrates D and D! /
[0036] 従って、図 4及び図 5に示す実施例 4も、上述した実施例 1や実施例 2や実施例 3と 同様な作用効果が得られ、更に加えて下保持板 Cに保持面 1に配備した多数の粘着 部 4cが基板 Dの裏面 Dlに対し確実に接触して粘着保持でき、それにより粘着力不 足による基板 Dの位置ズレを確実に防止できるという利点がある。 Accordingly, Example 4 shown in FIG. 4 and FIG. 5 also provides the same operational effects as those of Example 1, Example 2 and Example 3 described above, and additionally, the lower holding plate C has the holding surface 1. Many adhesives deployed in There is an advantage that the part 4c can securely contact and hold the back surface Dl of the substrate D, thereby reliably preventing the displacement of the substrate D due to insufficient adhesive force.
実施例 5 Example 5
[0037] この実施例 5は、図 6 (a) (b)に示す如ぐ前記粘着部 4cと基板 Dとの剥離手段とし て、保持面 1に対し昇降自在な台座 lbと、それに凹設された空隙部 2、固定プレート 3及び面受けプレート 4とからなる昇降ユニット U〃を多数、夫々保持面 1に対して基 板 Dと接近又は離隔するように上下方向へ往復動自在に配設し、これらの面受けプ レート 4の表面に設けられる粘着部 4cを含む昇降ユニット U 全体を、ァクチユエ一 ター 7の駆動によって、基板 Dの裏面 D1から強制的に押し剥がす構成が、前記図 4 ( a) (b)及び図 5 (a) (b)に示した実施例 4とは異なり、それ以外の構成は実施例 4と同 じものである。 [0037] In Example 5, as a means for separating the adhesive portion 4c and the substrate D as shown in Figs. 6 (a) and 6 (b), a pedestal lb that can be raised and lowered with respect to the holding surface 1, and a recess provided in the pedestal. A large number of elevating units U〃 consisting of the gap 2, fixed plate 3 and face plate 4 are arranged so as to be able to reciprocate vertically so as to approach or separate from the base plate D with respect to the holding surface 1 respectively. The configuration in which the entire lifting unit U including the adhesive portion 4c provided on the surface of the surface receiving plate 4 is forcibly removed from the back surface D1 of the substrate D by driving the actuator 7 is shown in FIG. (a) Unlike Example 4 shown in (b) and FIGS. 5 (a) and (b), the other configurations are the same as Example 4.
[0038] 図示例では、図 5 (a) (b)に示した実施例 4の上方の保持板 Bに組み込まれた静電 チャック 6に代えて、上述した構造の昇降ユニット U〃を多数往復動自在に組み込ん でおり、それ以外の構成は実施例 3と同じものである。 [0038] In the illustrated example, instead of the electrostatic chuck 6 incorporated in the upper holding plate B of Example 4 shown in Figs. 5 (a) and 5 (b), a number of reciprocating lift units U〃 having the above-described structure are reciprocated. The configuration is the same as that of the third embodiment except that it is freely movable.
その他の変形例としては、上下保持板 B, Cの保持面 1, 1の両方に上述した構造 の昇降ユニット U〃を夫々多数往復動自在に組み込むことも可能である。 As another modification, a large number of lifting units U〃 having the above-described structure can be incorporated in both the holding surfaces 1 and 1 of the upper and lower holding plates B and C so as to be reciprocally movable.
[0039] 従って、図 6に示す実施例 5は、上述した実施例 4に比べ、上下保持板 B, Cに保持 面 1, 1の両方において、夫々に配備した多数の粘着部 4cが上下基板 D, Dの裏面 Dl, D1に対し確実に接触して粘着保持でき、それにより粘着力不足による基板 Dの 位置ズレゃ落下を確実に防止できるという作用効果が得られる。 Therefore, in the fifth embodiment shown in FIG. 6, compared to the fourth embodiment described above, the upper and lower holding plates B and C have a large number of adhesive portions 4c provided on both the holding surfaces 1 and 1, respectively. An effect is obtained that the back surface Dl, D1 of D, D1 can be securely contacted and adhered and held, thereby preventing the substrate D from being displaced due to insufficient adhesion.
更に加えて、上下保持板 B, Cに保持面 1, 1の両方において、夫々の面受けプレ ート 4の材料に、その寸法精度が士数百/ z mのゴムを使用しても、要求される保持面 1の平面度、数十 mを達成でき、その結果として高精度な基板貼り合わせが可能と なる作用効果が得られるという利点がある。 In addition, it is required even if rubber with a dimensional accuracy of several hundred / zm is used for the material of each face plate 4 on both the holding surfaces 1 and 1 on the upper and lower holding plates B and C. The flatness of the holding surface 1 to be achieved can be several tens of meters, and as a result, there is an advantage that an operational effect that enables highly accurate substrate bonding is obtained.
[0040] 尚、本発明の基板保持構造 Aが、液晶ディスプレー (LCD)パネルなどのガラス基 板を粘着保持して貼り合わせる基板貼り合わせ装置に配備される場合を示したが、こ れに限定されず、この基板貼り合わせ装置以外の基板組立装置や、基板を搬送する 基板搬送装置に配備したり、 LCDパネル用ガラス基板以外の基板を粘着保持しても 良い。 [0040] Although the substrate holding structure A of the present invention is provided in a substrate bonding apparatus for bonding and holding a glass substrate such as a liquid crystal display (LCD) panel, the present invention is not limited to this. Even if it is installed on a substrate assembly device other than this substrate bonding device, a substrate transport device that transports substrates, or a substrate other than the glass substrate for LCD panels is adhesively held good.
[0041] 更に、真空中で上下基板 D, Dを貼り合わせる基板貼り合わせ装置を説明したが、 これに限定されず、大気中で基板 D, Dを貼り合わせる基板貼り合わせ装置でも良く 、この場合でも、上述した真空貼り合わせ装置と同じ作用効果が得られる。 [0041] Further, the substrate bonding apparatus for bonding the upper and lower substrates D, D in a vacuum has been described. However, the present invention is not limited to this, and a substrate bonding apparatus for bonding the substrates D, D in the atmosphere may be used. However, the same effect as the above-described vacuum bonding apparatus can be obtained.
図面の簡単な説明 Brief Description of Drawings
[0042] [図 1] (a)が本発明の基板保持構造の実施例 1を示す部分的な平面図であり、(b)が 縦断正面図であり、 (c)が弾性変形時を示す縦断正面図である。 [0042] [FIG. 1] (a) is a partial plan view showing Example 1 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) shows during elastic deformation. It is a vertical front view.
[図 2] (a)が本発明の基板保持構造の実施例 2を示す部分的な平面図であり、 (b)が 縦断正面図であり、 (c)が弾性変形時を示す縦断正面図である。 FIG. 2 (a) is a partial plan view showing Example 2 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) is a longitudinal front view showing during elastic deformation. It is.
[図 3] (a)が本発明の基板保持構造の実施例 3を示す部分的な平面図であり、 (b)が 縦断正面図であり、 (c)が弾性変形時を示す縦断正面図である。 [FIG. 3] (a) is a partial plan view showing Embodiment 3 of the substrate holding structure of the present invention, (b) is a longitudinal front view, and (c) is a longitudinal front view showing the state of elastic deformation. It is.
[図 4] (a)が本発明の基板保持構造の実施例 4を示す部分的な平面図であり、 (b)が 縦断正面図である。 FIG. 4 (a) is a partial plan view showing Example 4 of the substrate holding structure of the present invention, and (b) is a longitudinal front view.
[図 5]実施例 4の基板保持構造を基板貼り合わせ装置に組み込んだ縮小縦断正面 図であり、その作動工程を (a) (b)に示している。 FIG. 5 is a reduced longitudinal sectional front view in which the substrate holding structure of Example 4 is incorporated in a substrate bonding apparatus, and its operation process is shown in (a) and (b).
[図 6]本発明の基板保持構造を基板貼り合わせ装置に組み込んだ実施例 5を示す縮 小縦断正面図であり、その作動工程を (a) (b)に示している。 FIG. 6 is a reduced longitudinal front view showing Example 5 in which the substrate holding structure of the present invention is incorporated in a substrate bonding apparatus, and its operation steps are shown in (a) and (b).
符号の説明 Explanation of symbols
[0043] A 基板保持構造 B 上方の保持板 [0043] A Substrate holding structure B Upper holding plate
C 下方の保持板 C1 台座 C Lower holding plate C1 Base
D 基板 D1 裏面 D substrate D1 back
E 環状接着剤 (シール材) S 閉空間 E Ring adhesive (sealant) S Closed space
U ユニット Uグ 昇降ユニット U unit U group Lifting unit
1 保持面 la, lb 台座 1 Holding surface la, lb pedestal
2 空隙部 3 固定プレート 2 Cavity 3 Fixing plate
3a 貫通孔 4 面受けプレート 3a Through hole 4-sided receiving plate
4' 厚い面受けプレート 4a 基板側積層部 (表面側積層部) 4b 反対側 (裏面側積層部) 4c 粘着部 リフトピン 5a 通孔 4 'Thick surface receiving plate 4a Board side laminated part (front side laminated part) 4b Opposite side (back side laminated part) 4c Adhesive part Lift pin 5a through hole
静電チャック 7 ァクチユエ一ター Electrostatic chuck 7actuator
Claims
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005800233477A CN100533513C (en) | 2005-09-28 | 2005-09-28 | Substrate holding structure |
| KR1020077002543A KR101038026B1 (en) | 2005-09-28 | 2005-09-28 | Board Support Structure |
| PCT/JP2005/017832 WO2007036996A1 (en) | 2005-09-28 | 2005-09-28 | Substrate holding structure |
| JP2007505310A JP3943590B2 (en) | 2005-09-28 | 2005-09-28 | Substrate holding structure |
| TW095102289A TW200712020A (en) | 2005-09-28 | 2006-01-20 | Substrate holding structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2005/017832 WO2007036996A1 (en) | 2005-09-28 | 2005-09-28 | Substrate holding structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2007036996A1 true WO2007036996A1 (en) | 2007-04-05 |
Family
ID=37899435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/017832 Ceased WO2007036996A1 (en) | 2005-09-28 | 2005-09-28 | Substrate holding structure |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP3943590B2 (en) |
| KR (1) | KR101038026B1 (en) |
| CN (1) | CN100533513C (en) |
| TW (1) | TW200712020A (en) |
| WO (1) | WO2007036996A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9023611B2 (en) | 2009-02-06 | 2015-05-05 | Beth Israel Deaconess Medical Center | Charged-balanced imaging agents |
| US10493169B2 (en) | 2009-02-06 | 2019-12-03 | Beth Israel Deaconess Medical Center | Use of charge-balanced imaging agents for determining renal function |
| CN112750746A (en) * | 2019-10-29 | 2021-05-04 | 佳能特机株式会社 | Substrate holding unit, substrate holding member, substrate holding device, and substrate processing device |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2490073B1 (en) | 2011-02-18 | 2015-09-23 | ASML Netherlands BV | Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder |
| JP5422767B1 (en) * | 2013-05-09 | 2014-02-19 | 信越エンジニアリング株式会社 | Bonding separation method and separation apparatus |
| TWM519795U (en) * | 2014-09-15 | 2016-04-01 | 巴而可公司 | Display with bricks that increase the display area |
| KR102277918B1 (en) * | 2016-07-09 | 2021-07-14 | 어플라이드 머티어리얼스, 인코포레이티드 | substrate carrier |
| TWI642999B (en) * | 2017-07-07 | 2018-12-01 | 友達光電股份有限公司 | Display module |
| CN109036147B (en) * | 2018-09-19 | 2020-05-22 | 京东方科技集团股份有限公司 | A substrate and a display panel |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05305592A (en) * | 1992-04-28 | 1993-11-19 | Sony Corp | Vacuum chuck |
| JPH09181156A (en) * | 1995-12-25 | 1997-07-11 | Sony Corp | Vacuum chuck |
| US20030232561A1 (en) * | 2002-03-14 | 2003-12-18 | Satoshi Yawata | Manufacturing method of liquid crystal display apparatus and substrate assembling apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3773866B2 (en) | 2002-03-14 | 2006-05-10 | 株式会社 日立インダストリイズ | Substrate assembly method and apparatus |
-
2005
- 2005-09-28 JP JP2007505310A patent/JP3943590B2/en not_active Expired - Fee Related
- 2005-09-28 CN CNB2005800233477A patent/CN100533513C/en not_active Expired - Fee Related
- 2005-09-28 KR KR1020077002543A patent/KR101038026B1/en not_active Expired - Fee Related
- 2005-09-28 WO PCT/JP2005/017832 patent/WO2007036996A1/en not_active Ceased
-
2006
- 2006-01-20 TW TW095102289A patent/TW200712020A/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05305592A (en) * | 1992-04-28 | 1993-11-19 | Sony Corp | Vacuum chuck |
| JPH09181156A (en) * | 1995-12-25 | 1997-07-11 | Sony Corp | Vacuum chuck |
| US20030232561A1 (en) * | 2002-03-14 | 2003-12-18 | Satoshi Yawata | Manufacturing method of liquid crystal display apparatus and substrate assembling apparatus |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9023611B2 (en) | 2009-02-06 | 2015-05-05 | Beth Israel Deaconess Medical Center | Charged-balanced imaging agents |
| US9687567B2 (en) | 2009-02-06 | 2017-06-27 | Beth Israel Deaconess Medical Center, Inc. | Charged-balanced imaging agents |
| US10201621B2 (en) | 2009-02-06 | 2019-02-12 | Beth Israel Deaconess Medical Center, Inc. | Charge-balanced imaging agents |
| US10478512B2 (en) | 2009-02-06 | 2019-11-19 | Beth Israel Deaconess Medical Center, Inc. | Charge-balanced imaging agents |
| US10493169B2 (en) | 2009-02-06 | 2019-12-03 | Beth Israel Deaconess Medical Center | Use of charge-balanced imaging agents for determining renal function |
| CN112750746A (en) * | 2019-10-29 | 2021-05-04 | 佳能特机株式会社 | Substrate holding unit, substrate holding member, substrate holding device, and substrate processing device |
| CN112750746B (en) * | 2019-10-29 | 2024-01-12 | 佳能特机株式会社 | Substrate holding unit, substrate holding member, substrate holding device, and substrate processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101038026B1 (en) | 2011-05-31 |
| KR20080053245A (en) | 2008-06-12 |
| JPWO2007036996A1 (en) | 2009-04-02 |
| TW200712020A (en) | 2007-04-01 |
| JP3943590B2 (en) | 2007-07-11 |
| CN100533513C (en) | 2009-08-26 |
| TWI317353B (en) | 2009-11-21 |
| CN101061528A (en) | 2007-10-24 |
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