WO2007015475A1 - Magnetic energy/electric energy conversion element having nano-structure - Google Patents
Magnetic energy/electric energy conversion element having nano-structure Download PDFInfo
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- WO2007015475A1 WO2007015475A1 PCT/JP2006/315189 JP2006315189W WO2007015475A1 WO 2007015475 A1 WO2007015475 A1 WO 2007015475A1 JP 2006315189 W JP2006315189 W JP 2006315189W WO 2007015475 A1 WO2007015475 A1 WO 2007015475A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
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- the present invention relates to a magnetic and electrical energy mutual conversion element having a nanostructure that mutually converts magnetic energy into electrical energy and electrical energy into magnetic energy.
- Electrons have charge and spin as their primary attributes.
- the power of conventional electronics that exclusively uses the charge of electrons
- spin which is another attribute of electrons
- GMR giant magnetoresistive
- TMR magnetic tunnel
- Figure 6 shows the domain wall and the domain wall movement in the electron-conductive ferromagnetic wire.
- A shows the position of the domain wall before passing the current through the wire, and
- B shows the current added for ⁇ t time. The position of the domain wall is shown. It is assumed that the magnetization is uniformly magnetized in the axial direction (z direction) of the fine wire, and A is the cross-sectional area of the fine magnetic wire.
- the spin of the conduction electron (size 1Z2) that carries the current tends to be parallel to the direction of the localized spin M (size S) due to the ferromagnetic interaction.
- the conduction electrons that carry the current form a spin-polarized spin current. If the polarizability is p, the spin current j (density) is expressed by the following equation (1).
- the unit of charge of electrons is e.
- the localized spin M of the magnetic material is reversed and the domain wall W is formed.
- the arrow of the localized spin M indicates the direction of the magnetic field due to the localized spin M.
- the spin current j that flows into the domain wall W per unit time is equal to the amount of change in the localized spin of the domain wall W. Since the localized spin amount of the domain wall W is conserved, the domain wall W moves in the same direction as the electron flow (the direction opposite to the current) at the speed given by the following equation (2).
- the external magnetic field B is applied parallel to the thin line, and the change in magnetic energy when the domain wall W is moved under the magnetic field B is evaluated.
- the domain wall moves at the speed of equation (2) during time At, the direction of v A tA / v localized spins changes from the direction opposite to the direction of magnetic field B to the direction of magnetic field B. Therefore, the magnetic energy is reduced by the following formula (3).
- Non-Patent Document 1 Maekawa Keisuke: Solid State Physics No. 32, No. 4, p. 3 (April 15, 1997, issued by Agne Technology Center)
- Non-Patent Document 2 Research Report on Spin Electronics Research II (March 1999, published by Japan Electronics Industry Promotion Association)
- Non-Patent Document 3 A. Yamaguchi et al: Phs. Rev. Lett. 92, 077205 (2004)
- Non-Patent Document 4 J.Z.Sun et al .: FA-11, 49th MMM (2004)
- an object of the present invention is to provide a magnetic and electrical energy mutual conversion element having a nanostructure.
- the inventors of the present invention can convert electric energy into magnetic energy and store it by making the magnetic energy that can be taken by the domain wall different depending on the position of the nanostructure such as a thin wire.
- the inventors have conceived of an interconversion element of magnetic and electric energy having a nanostructure that can take out magnetic energy as electric energy when necessary, and have reached the present invention.
- a magnetic and electrical energy mutual conversion element having a nanostructure of the present invention has a nanostructure made of a magnetic body having electron conductivity, and both ends of the nanostructure. Connected to the center of the nanostructure and the first and second electrodes connected to the A first domain wall holder that can hold a domain wall between the first electrode and the center electrode of the nanostructure, and a domain wall between the second electrode and the center electrode of the nanostructure. A second domain wall holder that can be formed, wherein the magnetic energy of the first domain wall holder and the second domain wall holder is smaller than the magnetic energy of both ends of the nanostructure.
- the magnetic energy is configured to be larger than the magnetic energy of the second domain wall holder, and electrical energy is applied between the first electrode and the central electrode via an input voltage or current, and the central electrode and the second electrode The output electric energy amplified through the output voltage or current is taken out from between.
- the magnetic energy is preferably stored by applying a voltage or current having a polarity opposite to the input voltage or current between the first electrode and the center electrode between the first electrode and the second electrode.
- the domain wall existing in the first domain wall holder is moved to the second domain wall holder by applying electric energy between the first electrode and the center electrode via an input voltage or current.
- the domain wall moves, and the magnetic energy corresponding to the decrease in magnetic energy caused by the domain wall movement is converted into electric energy, and this electric energy is output from the central electrode and the second electrode to the output voltage or current.
- the corresponding electrical energy is applied to the first electrode and the second electrode via voltage or current, and the domain wall held in the second domain wall holder is held again in the first domain wall. It can be done by returning to the department.
- the nanostructure preferably includes a first region in which the width of the thin line is wide, a second region in which the width of the thin line continuous to the first region is constricted in a wedge shape, and the second region. It consists of a third region where the width of the thin line continuing to the region 2 gradually narrows and a fourth region where the width of the thin line continuing to the third region is wide, and the width of the first region is d The narrowest width of the second region
- the widest width of the third region is d
- the narrowest width is d
- the first electrode is provided in the first region
- the center electrode is provided on the second region side of the third region
- the second electrode is provided in the fourth region.
- the magnetic energy of the domain wall is proportional to the width of the thin wire
- the domain wall in the second region generates a magnetic energy proportional to d-d and the first electrode and the central electrode.
- the magnetic energy that can be taken by the domain wall gradually decreases because the width of the third region gradually decreases, so that the magnetic wall that has moved to the third region spontaneously moves in the direction of narrowing and the extra magnetic energy. Is dissipated as electrical energy and passed to the current. This excess electrical energy can be extracted as electrical energy from the center electrode and the second electrode via the output voltage or current. The total amount of excess electrical energy is d — d
- Output electric energy larger than the input electric energy required to move the domain wall in the region to the third region can be obtained.
- a voltage amplification element when used as a voltage amplification element, it operates as a voltage amplification element having a single energy gain.
- the mutual conversion element of magnetic and electric energy having a nanostructure composed of fine wires can be configured as a planar structure on a substrate.
- the nanostructure preferably has a lamination structure force, and both end portions and the central portion are wide.
- the first narrow portion that can hold the domain wall between each end portion and the central portion is narrow.
- the 2nd domain wall holding part is formed.
- the material of the nanostructure is preferably any of permalloy, iron, iron-cobalt alloy, iron-platinum alloy, and samarium-conoleto alloy.
- the nanostructure includes the first hard magnetic layer, the first soft magnetic layer, the second hard magnetic layer, the second soft magnetic layer, and the third hard magnetic layer.
- the first electrode is connected to the first hard magnetic layer, which is one end of the nanostructure, and the third hard, which is the other end of the nanostructure.
- the second electrode is connected to the magnetic layer, the central electrode is connected to the second hard magnetic layer, and the first soft magnetic layer and the second soft magnetic layer serve as a domain wall holding portion that holds the domain wall. .
- the hard magnetic layer is made of iron-platinum alloy, and the soft magnetic layer Consists of permalloy.
- the manufacture is facilitated.
- the length L in the vertical direction of the nanostructure can be made smaller than that of the planar nanostructure, so that the internal resistance of the magnetic and electrical energy conversion element having the nanostructure can be reduced. it can.
- the magnetic and electrical energy mutual conversion elements having nanostructures are integrated. You can do it.
- a nanostructure for example, an extraction electrode provided on a magnetic wire
- electric energy is converted into magnetic energy and stored
- the stored magnetic energy is converted into electric energy. It can be converted into a single energy source and taken out.
- Conventional devices that convert electrical energy into magnetic energy and store it, and convert the stored magnetic energy into electrical energy and extract it are composed of, for example, a ferromagnetic material and a coil wound around the ferromagnetic material. Since the interaction between the magnetization of the magnetic material and the current flowing through the coil requires a large and bulky coil, the magnetic and electrical energy conversion device having the nanostructure of the present invention is It is possible to reduce the size and integration, and to increase the energy efficiency.
- FIG. 1 shows a configuration of a magnetic and electrical energy mutual conversion element having a nanostructure according to a first embodiment of the present invention, where (a) shows an initial state and (b) shows an input voltage.
- (C) is a diagram showing the width of each portion of the thin line.
- FIG. 2 is a diagram showing the relationship between the domain wall energy and the domain wall energy of the magnetic / electrical energy mutual conversion element having the nanostructure of the present invention, where the vertical axis is the domain wall energy, and the horizontal axis is the location of the domain wall. Indicates.
- FIG. 3 schematically shows a magnetic and electrical energy interconversion element having a nanostructure according to a second embodiment of the present invention, in which (A) is a cross-sectional view and (B) is a plan view.
- FIG. 4 schematically shows the structure of a magnetic and electrical energy mutual conversion element having a nanostructure according to a third embodiment of the present invention, where (A) is a cross-sectional view and (B) is a plan view.
- FIG. 5 is a perspective view schematically showing a configuration of an integrated circuit using a magnetic and electrical energy mutual conversion element having a nanostructure of the present invention.
- FIG. 6 Domain wall and domain wall movement in an electron-conducting ferromagnetic wire.
- A shows the position of the domain wall before passing a current through the magnetic wire, and
- B shows the current after adding the At time. The position of the domain wall is shown.
- FIG. 1 shows a configuration of a magnetic and electrical energy mutual conversion element having a nanostructure according to the first embodiment of the present invention, where (a) shows an initial state, and (b) shows an input voltage.
- (C) is a diagram showing the width of each part of the thin line.
- the magnetic / electrical energy mutual conversion element 1 having the nanostructure of the present invention has a nanostructure force that has electron conductivity and magnetic thin wire force.
- a magnetic thin wire that is, a magnetic thin wire (hereinafter referred to as a thin wire as appropriate) is continuous with the first region 2 where the thin wire is wide and the first region 2 as shown in FIG. 1 (a).
- the second region 3 in which the width of the thin line is wedged, the third region 4 in which the width of the thin line continuing to the second region 3 is gradually narrowed, and the thin line continuing in the third region 4 And the fourth region 5 is wide.
- the width of each part of the thin line is such that the width of the first region 2 is d and the width of the second region 3 is
- D is the narrowest width
- d is the widest width of the third region 4
- d is the thinnest width
- a first electrode 11 is provided in the first region 2
- a center electrode 12 is provided on the second region 3 side of the third region 4
- a second electrode 13 is provided in the fourth region 5.
- each part of the thin line is magnetized as indicated by an arrow 7 to form a domain wall 6 in the region 3.
- the domain wall has the narrowest width (d) of the second region 3 or the narrowest width (d) of the third region 4.
- the area of the narrowest width of the second area 3 is m.
- the first domain wall holder 8 is referred to as the narrowest region of the third region 4 and is referred to as the second domain wall holder 9.
- the width and thickness of the magnetic wire of the present invention are indispensable to be nanometer size. That is, when the width and film thickness of the magnetic wire are 1 ⁇ m or more, the domain wall is not driven uniformly by the current, and the structure of the domain wall itself changes (see Non-Patent Document 3).
- iron-cobalt alloy an alloy composed of iron and cobalt
- iron-cobalt alloy an alloy composed of iron and platinum
- a metal alloy referred to as a samarium-cobalt alloy as appropriate
- samarium-cobalt alloy which is also called samarium-cobalt alloy.
- FIG. 2 is a diagram showing the relationship between the position of the domain wall and the domain wall energy of the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention, where the vertical axis represents the domain wall energy, and the horizontal axis represents the location of the domain wall. Show.
- the domain wall position “1” is the first domain wall holder 8 corresponding to the position where the thin line width of the second region 3 in FIG. 1 is the narrowest.
- the domain wall position “0” is the second domain wall holder 9 corresponding to the boundary position between the third region 4 and the fourth region 5 in FIG.
- E indicates the difference in domain wall energy when the domain wall 6 a is present at the position of “0” when the domain wall 6 a is present at the position indicated by “1”, and E is the position of the domain wall 6 in the vicinity of the central electrode 12.
- the energy stored in the domain wall 6 is obtained by multiplying Equation (7) by the cross-sectional area of the thin line.
- Equation (7) the energy stored in the domain wall 6 is obtained by multiplying Equation (7) by the cross-sectional area of the thin line.
- the cross-sectional areas of the thin lines at the positions indicated by "0", "1" and the central electrode 12 are A, A and A, respectively, the energy barriers E and E shown in Fig. 2
- A d X h,
- the domain wall 6 to be stopped stops at the position "0".
- the width of the thin line is narrow and has a gradient, and the domain wall energy that the domain wall can take decreases according to the gradient. Therefore, the domain wall 6 has a gradient of the domain wall energy in the third region 4. According to the following equation (5) and (6): It is transferred to the conduction electrons and finally the central electrode 12 and the second electrode 13 , Dissipate.
- the amplification factor G is expressed by the following equation (9) using equation (8).
- Permalloy FeNi alloy
- a 10 "n j / m
- K 10 5 j / m 3 and ex u
- a magnetic and electrical energy mutual conversion element having a nanostructure according to a second embodiment of the present invention will be described.
- FIG. 3 schematically shows a magnetic and electrical energy mutual conversion element 20 having a nanostructure according to the second embodiment of the present invention, where (A) is a cross-sectional view and (B) is a plan view. It is.
- the magnetic and electrical energy conversion element 20 having a nanostructure is composed of a nanostructure and has a positional relationship obtained by rotating the thin wire 1 shown in FIG. 1 by 90 °. .
- the first layer 22 having a wider width
- the second layer 23 continuous with the first layer 22 and having a wedge-like width
- the second layer 23 having a width that is continuous with the second layer 23 It is composed of a third layer 24 that gradually becomes thin and a fourth layer 25 that is continuous with the third layer 24 and has a wide layer width.
- the width of each part of the nanostructure 20 is d for the width of the first layer 22 and d for the narrowest width of the second layer 23.
- the widest width of the third layer 24 is d and the narrowest width is d, and the width of the fourth layer 25 is d And d>d>d> d and d> d.
- the structure 20 has a thickness L in the stacking direction (Y-axis direction) and a length in the direction perpendicular to the paper surface (Z-axis direction).
- the width is d in order to hold the domain wall.
- a first domain wall holder 23A is formed. Between the other end 25 of the nanostructure 25 and the fourth layer 25, a second domain wall holder 24A having a width d is formed to hold the domain wall.
- FIG. 3 (B) is a plan view seen from the one end 25 side of the upper part of the nanostructure shown in FIG. 3 (A).
- the first electrode 26, the second electrode 27, and the central electrode 28 are connected to each other.
- the electrode wirings 26A, 27A, and 28A are respectively formed. These electrode wirings 26A, 27A, 28A can be formed through a plurality of interlayer insulating layers so as not to contact each other.
- the first and second domain wall holders 23A, 24A are formed by gradually changing the dimensions linearly from the end side and the center side. May be formed by a curve that is not a straight line as shown, or a combination of a straight line and a curve.
- the nanostructure 20 is made of a magnetic material having electron conductivity.
- the first and second electrodes 26 and 27 are connected to both ends of the nanostructure 20, and the center electrode 28 is connected to the center of the nanostructure.
- a first domain wall holder 23A that can hold a domain wall between the first electrode 26 and the center electrode 28 of the nanostructure 20 and a domain wall between the second electrode 27 and the center electrode 28 of the nanostructure 20 Second domain wall holder 24A And there will be a power waiting.
- the magnetic energy of the first domain wall holder 23A and the second domain wall holder 23A, 24A is smaller than the magnetic energy of the both ends of the nanostructure 20, and the magnetic energy of the first domain wall holder 23A is the first It is configured to be larger than the magnetic energy 24 A of the domain wall holder 2.
- an input voltage or current is applied between the first electrode 26 and the central electrode 28.
- the magnetic / electrical energy mutual conversion element 20 having the nanostructure of the present invention can be formed by a thin film forming technique and a processing method such as etching, so that its thickness in the vertical direction (Y direction in FIG. 4) Easy to control. For this reason, the vertical length L of the nanostructure 20 can be made smaller than that in the case of the nanostructure 1 having a planar structure, and therefore, the magnetic and electrical energy mutual conversion element 20 having the nanostructure 20 It is advantageous to reduce the internal resistance and increase its integration density.
- a magnetic and electrical energy mutual conversion element having a nanostructure according to a third embodiment of the present invention will be described.
- FIG. 4 schematically shows the structure of the magnetic and electrical energy mutual conversion element 30 having the nanostructure according to the third embodiment of the present invention, where (A) is a cross-sectional view and (B) is a cross-sectional view.
- FIG. 4 schematically shows the structure of the magnetic and electrical energy mutual conversion element 30 having the nanostructure according to the third embodiment of the present invention, where (A) is a cross-sectional view and (B) is a cross-sectional view.
- the nanostructure of the mutual conversion element 30 of magnetic and electrical energy shown in FIG. 4 (A) has a structure in which the lower force on the paper is also stacked on the first hard magnetic layer 34 in order.
- the first soft magnetic layer 35, the second hard magnetic layer 36, the second soft magnetic layer 37, and the third hard magnetic layer 38 are stacked.
- the first electrode 40 is connected to the first hard magnetic layer 34 which is one end thereof, and the second electrode 41 is connected to the third hard magnetic layer 38 which is the other end thereof.
- a central electrode 42 is connected near the boundary between the second hard magnetic layer 36 and the second hard magnetic layer 36.
- the ferromagnetic structure 33 has a thickness L in the stacking direction (Y-axis direction) and a width W.
- FIG. 4 (B) is a plan view of the nanostructure 30 of FIG. 4 (A) in which the side force of the third hard magnetic layer 38 on the upper side is also seen.
- the first electrode 40 and the second electrode 41 Electrode wirings 44, 45, and 46 are formed on the center electrode 42, respectively. These electrode self-intersecting wires 44, 45, 46 can be formed through a plurality of interlayer insulation layers, such as V, which are not in contact with each other.
- the first to third hard magnetic layers 34, 36, and 38 are made of a hard magnetic material that is a material in which the direction of the magnetic field hardly changes, and an iron-platinum alloy or the like can be used.
- This hard magnetic material is also called a hard magnetic material.
- the first and second soft magnetic layers 35 and 37 also have a hard magnetic material force, which is a material in which the direction of the magnetic moment is extremely easy to rotate, and permalloy or the like can be used.
- This soft magnetic material is also called a soft magnetic material.
- the first soft magnetic layer 35 inserted between the first and second hard magnetic layers 34 and 36 becomes a stable low energy layer holding a domain wall, and the first A domain wall holder is formed.
- the second soft magnetic layer 35 inserted between the second and third hard magnetic layers 36 and 38 becomes a stable low-energy layer that holds the domain wall, and serves as the second domain wall holding portion.
- the magnetic energy of the first domain wall holding unit and the second domain wall holding unit is smaller than the magnetic energy of the both ends of the nanostructure 30.
- the magnetic energy of the first domain wall holding unit is the second domain wall. It is configured to be larger than the magnetic energy of the holding part.
- the gradient of energy generated between the hard magnetic layer and the soft magnetic layer is determined by the mixing ratio of each magnetic substance at the boundary between each hard magnetic layer 34, 3 6, 38 and each soft magnetic layer 35, 37. It can be formed by gradually changing.
- the difference in potential energy between the first and second domain wall holders can be obtained.
- the potential energy of the domain wall holder is given by the product of the magnetic energy ⁇ per unit area multiplied by the section area ⁇ , that is, ⁇ X ⁇ .
- the cross-sectional area A is constant.
- the magnetic energy of the hard magnetic layer and that of the soft magnetic layer are different, so that a potential energy difference between the domain wall holders can be generated.
- Magnetic energy per unit area when the soft magnetic layer is permalloy ⁇ (soft) Is 10 3 j / m 2 as mentioned above.
- iron - magnetic energy per unit area in the case of platinum alloy sigma (hard) becomes 8 X 10- 3 j / m 2 approximately.
- the nanostructure 30 has a regular tetragonal pattern, the area is 1 X 10-15 m 2 when its width W (dimension in the X-axis direction in Fig. 4) is 32 nm.
- a difference in positional energy can be provided by changing the thickness of the soft magnetic layer in the stacking direction. The reason is described below.
- the width of the domain wall determines the magnitude of the exchange interaction A.
- the domain wall that is, the portion where the magnetic moment is spatially changed almost overlaps the soft magnetic layer, so that the magnetic energy is the above-mentioned ⁇ (soft)
- the lowest energy state among the nanostructures 30 is realized.
- the soft magnetic layer is made thinner and smaller than the domain wall width, the domain wall actually overlaps with the adjacent hard magnetic layer, so the energy of the domain wall is ⁇ (soft) and ⁇ (hard) Is given by an intermediate value.
- the energy of the domain wall is higher than that in the case of the thick soft magnetic layer.
- the soft magnetic layer serving as the second magnetic holding portion on the low energy side needs to be thicker than the domain wall width, and the soft magnetic layer serving as the first magnetic wall holding portion on the high energy side needs to be thinner than the domain wall width.
- the first and second soft magnetic layers 35 and 37 are used as the first and second magnetic holding portions, respectively.
- the magnetic and electrical energy mutual conversion element 1 having the nanostructure shown in FIG. 1 can be operated.
- the vertical length L of the body 30 can also be made smaller than that of the nanostructure 1 having a planar structure, the internal resistance of the magnetic and electrical energy conversion element 30 having the nanostructure can be reduced and integrated. It is advantageous to increase the density.
- the width and film thickness of the magnetic and electrical energy mutual conversion elements 20, 30 having the nanostructure of the present invention are indispensable to be nanometer size. That is, when the magnetic wire width and film thickness are 1 ⁇ m or more, the domain wall is not uniformly driven by the current, and the structure of the domain wall itself changes (see Non-Patent Document 3).
- FIG. 5 is a perspective view schematically showing a configuration of an integrated circuit using a magnetic and electrical energy mutual conversion element having the nanostructure of the present invention.
- the X-direction electrode wiring 52 and the Y-direction electrode wiring 54 cross each position.
- the nanostructures 20 are arranged in a matrix.
- Y-direction electrode wiring 52 and X-direction electrode wiring 54 are connected to the first and second electrode layers 26 and 27 of each nanostructure 20 arranged in the matrix form, respectively.
- An electrode wiring 56 is connected to the electrode 28.
- the nanostructure is not limited to the magnetic and electrical energy conversion element 20 having the nanostructure according to the second embodiment, and the nanostructures 1 and 30 according to the first embodiment and the third embodiment are used. May be.
- the magnetic and electrical energy mutual conversion elements having the nanostructure of the present invention can be integrated to increase the stored magnetic energy. If such an integrated circuit 50 is incorporated in an integrated circuit that is a semiconductor device, it can be used as an auxiliary power source in the event of a power failure.
- the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention includes the following: It can be manufactured as follows.
- a magnetic thin film to be a nanostructure is deposited on a substrate with a predetermined thickness.
- the magnetic material permalloy, iron, iron-cobalt alloy, iron-platinum alloy, samarium-cobalt alloy and the like can be used.
- a deposition method a sputtering method which is a physical vapor deposition method can be used.
- an MgO substrate or a substrate obtained by depositing MgO on a Si substrate coated with an insulating layer can be used.
- the magnetic wire 1 and the nanostructures 20, 30 are formed by the mask process and etching process, thereby producing magnetic and electrical energy mutual conversion elements 1, 20, 30 having the nanostructures. can do.
- the peripheral circuit for controlling the voltage and current between the electrodes of the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention is formed by an integrated circuit, the nanostructure manufactured by the above process is used.
- the entire substrate including the bodies 1, 20, and 30 is further covered with an insulating film, and after opening only the electrodes of the nanostructures 1, 20, and 30, the mutual magnetic and electrical energy of each nanostructure is obtained.
- the wiring of the conversion element memory may be performed.
- the peripheral circuit of the magnetic and electrical energy conversion elements 1, 20, and 30 having the nanostructure of the present invention is formed by a Si MOS transistor, the Si peripheral circuit is formed first, and then Thus, the magnetic and electrical energy mutual conversion elements 1, 20, and 30 having the nanostructure of the present invention may be formed.
- each material can be deposited using conventional thin film deposition methods such as CVD, vapor deposition, laser ablation, and MBE.
- CVD chemical vapor deposition
- vapor deposition vapor deposition
- laser ablation and MBE
- light exposure EB exposure, or the like can be used for a mask process for forming electrodes of a predetermined shape or wiring of an integrated circuit.
- the electric energy is converted into magnetic energy and stored, and the stored magnetic field is stored.
- Energy can be converted into electrical energy and extracted.
- the voltage can be amplified using the stored magnetic energy as an energy source.
- Conventional storage of magnetic energy requires a large and bulky coil to extract the magnetic force and electrical energy that is generated by magnetizing a ferromagnetic material in a specific direction.
- the element of the present invention it is only necessary to apply a voltage or current to the extraction electrode provided in the thin wire or the laminated structure. Therefore, the device can be miniaturized and integrated, and has high energy efficiency. It is extremely useful if it is used in a device that needs to convert electrical energy into magnetic energy and store it, and then convert the stored magnetic energy into electrical energy.
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Abstract
Description
明 細 書 Specification
ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 Magnetic and electrical energy interconversion device with nanostructures
技術分野 Technical field
[0001] 本発明は、磁気エネルギーを電気エネルギーに、電気エネルギーを磁気エネルギ 一に相互に変換するナノ構造体を有する磁気及び電気エネルギーの相互変換素子 に関する。 [0001] The present invention relates to a magnetic and electrical energy mutual conversion element having a nanostructure that mutually converts magnetic energy into electrical energy and electrical energy into magnetic energy.
背景技術 Background art
[0002] 電子は、その本来的属性として電荷とスピンを有している。従来のエレクトロニクス は電子の電荷をもっぱら利用したものである力 近年、電子のもう一つの属性である スピンを利用したデバイスの開発が盛んである。例えば、電子のスピンを利用した口 ジックデバイスや、電子のスピンにより電気抵抗を制御する巨大磁気抵抗 (GMR)素 子や磁気トンネル (TMR)素子が作製されて!ヽる (非特許文献 1 , 2参照)。 [0002] Electrons have charge and spin as their primary attributes. The power of conventional electronics that exclusively uses the charge of electrons In recent years, development of devices using spin, which is another attribute of electrons, has been active. For example, mouth devices using electron spin, giant magnetoresistive (GMR) elements and magnetic tunnel (TMR) elements that control electrical resistance by electron spin have been fabricated (Non-Patent Document 1, 2).
[0003] ところで、磁性体において、電子のスピン流と磁性体の局在スピン間における角運 動量の保存の帰結として、磁気エネルギーと電気エネルギーの変換が可能であるこ とが知られている(非特許文献 3, 4参照)。以下にその原理を説明する。 [0003] By the way, in magnetic materials, it is known that conversion of magnetic energy and electrical energy is possible as a consequence of the conservation of angular motion between the spin current of electrons and the localized spin of the magnetic material (non- (See Patent Documents 3 and 4). The principle will be described below.
図 6は、電子伝導性の強磁性細線における磁壁及び磁壁の移動を示すもので、 (a )は磁性細線に電流を流す前の磁壁の位置を示し、 (b)は電流を Δ t時間加えた後 の磁壁の位置を示す。なお、磁化は細線の軸方向(z方向)に一様に磁ィ匕されるとし 、磁性細線の断面積を Aとする。 Figure 6 shows the domain wall and the domain wall movement in the electron-conductive ferromagnetic wire. (A) shows the position of the domain wall before passing the current through the wire, and (b) shows the current added for Δt time. The position of the domain wall is shown. It is assumed that the magnetization is uniformly magnetized in the axial direction (z direction) of the fine wire, and A is the cross-sectional area of the fine magnetic wire.
磁性細線に電流密度 jの電流を流すと、電流を担う伝導電子のスピン (大きさ 1Z2) は強磁性的相互作用により局在スピン M (大きさ S)の向きと平行になる傾向があり、 電流を担う伝導電子はスピン分極したスピン流を形成する。その分極率を pとすると、 スピン流 j (密度)は次式(1)で表される。 When a current having a current density j is passed through a magnetic wire, the spin of the conduction electron (size 1Z2) that carries the current tends to be parallel to the direction of the localized spin M (size S) due to the ferromagnetic interaction. The conduction electrons that carry the current form a spin-polarized spin current. If the polarizability is p, the spin current j (density) is expressed by the following equation (1).
[数 1] (1) [Number 1] ( 1)
ここで、電子の電荷の単位を eとした。 Here, the unit of charge of electrons is e.
[0004] 次に、図 6 (a)に示すように、磁性体の局在スピン Mが反転し磁壁 Wが形成されて いる場合を考える。局在スピン Mの矢印は局在スピン Mによる磁ィ匕の向きを示す。伝 導電子のスピンと磁壁 Wの局在スピンとの間の角運動量の保存の帰結として、単位 時間当たりに磁壁 Wに流入するスピン流 j は、磁壁 Wの局在スピンの変化量に等しく なり、磁壁 Wの局在スピン量は保存されるので、磁壁 Wは次式(2)に与えられる速度 で電子の流れと同じ方向(電流と逆方向)に動く。 Next, as shown in FIG. 6 (a), the localized spin M of the magnetic material is reversed and the domain wall W is formed. Think if you are. The arrow of the localized spin M indicates the direction of the magnetic field due to the localized spin M. As a result of the conservation of angular momentum between the spin of the conduction electron and the localized spin of the domain wall W, the spin current j that flows into the domain wall W per unit time is equal to the amount of change in the localized spin of the domain wall W. Since the localized spin amount of the domain wall W is conserved, the domain wall W moves in the same direction as the electron flow (the direction opposite to the current) at the speed given by the following equation (2).
[数 2] [Equation 2]
pvc pv c
V: V:
ここで、 Vは単位胞の体積( = a3、 aは原子間距離)である。 Where V is the volume of the unit cell (= a 3 , a is the interatomic distance).
外部磁界 Bを、図 6 (a)に示すように細線に平行に加え、磁界 Bのもとで磁壁 Wを移 動させたときの磁気エネルギー変化を評価する。磁壁が時間 A tの間に式(2)の速 度で移動すると、 v A tA/v個の局在スピンの向きが磁界 Bの方向と反対の方向か ら磁界 Bの方向へと変化するので、下記式(3)だけ磁気エネルギーが減少する。 As shown in Fig. 6 (a), the external magnetic field B is applied parallel to the thin line, and the change in magnetic energy when the domain wall W is moved under the magnetic field B is evaluated. When the domain wall moves at the speed of equation (2) during time At, the direction of v A tA / v localized spins changes from the direction opposite to the direction of magnetic field B to the direction of magnetic field B. Therefore, the magnetic energy is reduced by the following formula (3).
[数 3] [Equation 3]
AE = 2SgMBBvMA /vc (3) ここで、 gは g_因子、 μ はボーァ磁子である。磁気エネルギーの減少に相当するェ AE = 2SgM B BvMA / v c (3) where g is g_factor and μ is Bohr magneton. This corresponds to a decrease in magnetic energy.
Β Β
ネルギ一は電流により散逸するので、下記式 (4)が成り立つ。 Since the energy is dissipated by the current, the following equation (4) holds.
画 Picture
ΑΕ = VjAAt (4) ここで Vは細線の両端に生じる電位差である。 (2)式と(3)式をあわせて (4)式に代 入すると次式(5)を得る。 ΑΕ = VjAAt (4) where V is the potential difference generated at both ends of the thin wire. By combining Eqs. (2) and (3) into Eq. (4), the following Eq. (5) is obtained.
[数 5] [Equation 5]
e e
(5)式は磁気エネルギー E ( =g ju B)と電気工ネルギー E (=eV)の関 Equation (5) is the relationship between magnetic energy E (= gj u B) and electrical energy E (= e V).
magnetic B electnc magnetic B electnc
係を示している。すなわち、外部磁場 Bが印加された一様な広さの細線中を電流を 流すことによって磁壁 Wが移動すれば、外部磁場 Bに基づく磁気エネルギーを電気 エネルギーに変換できることを示しており、実際、定量的な実証がなされている(非特 許文献 4参照)。また、磁気エネルギーと電気エネルギーの変換式は次式 (6)で表さ れることが分力ゝる。 Showing the staff. That is, if the domain wall W moves by passing a current through a thin wire of uniform width to which the external magnetic field B is applied, the magnetic energy based on the external magnetic field B is It shows that it can be converted into energy, and in fact, has been quantitatively verified (see Non-Patent Document 4). In addition, the conversion formula between magnetic energy and electric energy is expressed by the following formula (6).
[数 6] [Equation 6]
hjelectric tb hjelectric tb
[0006] 非特許文献 1 :前川禎通:固体物理第 32卷第 4号 3頁(1997年 4月 15日,ァグネ技 術センター発行) [0006] Non-Patent Document 1: Maekawa Keisuke: Solid State Physics No. 32, No. 4, p. 3 (April 15, 1997, issued by Agne Technology Center)
非特許文献 2 :スピンエレクトロニクス調査研究報告書 II (平成 11年 3月, 日本電子ェ 業振興協会発行) Non-Patent Document 2: Research Report on Spin Electronics Research II (March 1999, published by Japan Electronics Industry Promotion Association)
非特許文献 3 :A.Yamaguchi et al: Phs. Rev. Lett.92, 077205 (2004) Non-Patent Document 3: A. Yamaguchi et al: Phs. Rev. Lett. 92, 077205 (2004)
非特許文献 4 :J.Z.Sun et al.: FA- 11, 49th MMM (2004) Non-Patent Document 4: J.Z.Sun et al .: FA-11, 49th MMM (2004)
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0007] 上記に説明した磁気エネルギーと電気エネルギーとの変換原理は、単に外部磁場[0007] The principle of conversion between magnetic energy and electric energy described above is simply an external magnetic field.
Bに基づく磁気エネルギーを電気エネルギーに変換できることを示しているのみであ り、これだけでは、産業に利用できる有用な素子とはならないという課題がある。 It only shows that magnetic energy based on B can be converted into electrical energy, and this alone has the problem that it is not a useful element that can be used in industry.
[0008] 本発明は上記課題に鑑み、ナノ構造体を有する磁気及び電気エネルギーの相互 変換素子を提供することを目的として 、る。 In view of the above problems, an object of the present invention is to provide a magnetic and electrical energy mutual conversion element having a nanostructure.
課題を解決するための手段 Means for solving the problem
[0009] 本発明者らは、磁壁の取り得る磁気エネルギーが細線等のナノ構造体の位置によ つて異なるようにすることによって、電気エネルギーを磁気エネルギーに変換して蓄 積でき、この蓄積した磁気エネルギーを必要なときに電気エネルギーとして取り出せ るナノ構造体を有する磁気及び電気エネルギーの相互変換素子に想到し、本発明 に至った。 [0009] The inventors of the present invention can convert electric energy into magnetic energy and store it by making the magnetic energy that can be taken by the domain wall different depending on the position of the nanostructure such as a thin wire. The inventors have conceived of an interconversion element of magnetic and electric energy having a nanostructure that can take out magnetic energy as electric energy when necessary, and have reached the present invention.
[0010] 上記目的を達成するため、本発明のナノ構造体を有する磁気及び電気エネルギー の相互変換素子は、電子伝導性を有する磁性体からなるナノ構造体を有し、ナノ構 造体の両端部に接続される第 1及び第 2の電極と、ナノ構造体の中央部に接続され る中央電極と、ナノ構造体の第 1電極と中央電極との間には磁壁を保持できる第 1の 磁壁保持部と、ナノ構造体の第 2電極と中央電極との間には磁壁を保持できる第 2の 磁壁保持部と、を備え、第 1の磁壁保持部及び第 2の磁壁保持部の磁気エネルギー はナノ構造体の両端部側の磁気エネルギーよりも小さぐ第 1の磁壁保持部の磁気 エネルギーは第 2の磁壁保持部の磁気エネルギーよりも大きくなるように構成されて おり、第 1電極と中央電極間に入力電圧又は電流を介して電気エネルギーを加える と共に、中央電極と第 2電極間から出力電圧又は電流を介して増幅された出力電気 エネルギーを取り出すことを特徴とする。 [0010] In order to achieve the above object, a magnetic and electrical energy mutual conversion element having a nanostructure of the present invention has a nanostructure made of a magnetic body having electron conductivity, and both ends of the nanostructure. Connected to the center of the nanostructure and the first and second electrodes connected to the A first domain wall holder that can hold a domain wall between the first electrode and the center electrode of the nanostructure, and a domain wall between the second electrode and the center electrode of the nanostructure. A second domain wall holder that can be formed, wherein the magnetic energy of the first domain wall holder and the second domain wall holder is smaller than the magnetic energy of both ends of the nanostructure. The magnetic energy is configured to be larger than the magnetic energy of the second domain wall holder, and electrical energy is applied between the first electrode and the central electrode via an input voltage or current, and the central electrode and the second electrode The output electric energy amplified through the output voltage or current is taken out from between.
上記構成において、好ましくは、第 1電極と第 2電極間に第 1電極と中央電極間へ の入力電圧又は電流とは逆極性の電圧又は電流を印加して、磁気エネルギーを蓄 える。 In the above configuration, the magnetic energy is preferably stored by applying a voltage or current having a polarity opposite to the input voltage or current between the first electrode and the center electrode between the first electrode and the second electrode.
[0011] 上記構成によれば、第 1電極と中央電極間に入力電圧又は電流を介して電気エネ ルギーを加えて第 1の磁壁保持部に存在する磁壁を第 2の磁壁保持部に移動させ、 これにより磁壁が移動すると共に、この磁壁の移動によって生ずる磁気エネルギーの 減少分に相当する磁気エネルギーが電気エネルギーに変換され、この電気工ネル ギーを中央電極と第 2電極間から出力電圧又は電流を介して取り出すことができる。 磁気エネルギーの蓄積は、相当する電気工ネルギーを第 1電極と第 2電極に電圧又 は電流を介して印加し、第 2の磁壁保持部に保持されている磁壁を、再度第 1の磁壁 保持部へ戻すことで行なうことができる。 [0011] According to the above configuration, the domain wall existing in the first domain wall holder is moved to the second domain wall holder by applying electric energy between the first electrode and the center electrode via an input voltage or current. As a result, the domain wall moves, and the magnetic energy corresponding to the decrease in magnetic energy caused by the domain wall movement is converted into electric energy, and this electric energy is output from the central electrode and the second electrode to the output voltage or current. Can be taken out. To store magnetic energy, the corresponding electrical energy is applied to the first electrode and the second electrode via voltage or current, and the domain wall held in the second domain wall holder is held again in the first domain wall. It can be done by returning to the department.
[0012] 上記構成において、ナノ構造体は、好ましくは細線の幅が広い第 1の領域と、この 第 1の領域に連続する細線の幅がくさび状にくびれた第 2の領域と、この第 2の領域 に連続する細線の幅が徐々に細くなる第 3の領域と、この第 3の領域に連続する細線 の幅が広い第 4の領域とからなり、第 1の領域の幅を dとし、第 2の領域の最も細い幅 [0012] In the above configuration, the nanostructure preferably includes a first region in which the width of the thin line is wide, a second region in which the width of the thin line continuous to the first region is constricted in a wedge shape, and the second region. It consists of a third region where the width of the thin line continuing to the region 2 gradually narrows and a fourth region where the width of the thin line continuing to the third region is wide, and the width of the first region is d The narrowest width of the second region
1 1
を dとし、第 3の領域の最も広い幅を d とし最も細い幅を d とし、さらに、第 4の領域 D, the widest width of the third region is d, the narrowest width is d, and the fourth region
2 3 3m 2 3 3m
の幅を dとした場合に、 d >d >d >d 及び d >d の関係を満たすように構成さ Where d> d> d> d and d> d.
4 1 3 2 3m 4 3m 4 1 3 2 3m 4 3m
れており、第 1の領域に第 1電極が設けられ、第 3の領域の第 2の領域側に中央電極 が設けられ、第 4の領域に第 2電極が設けられて 、る。 The first electrode is provided in the first region, the center electrode is provided on the second region side of the third region, and the second electrode is provided in the fourth region.
[0013] 上記構成において、磁壁の磁気エネルギーは細線の幅に比例しており、従って、 第 2の領域にある磁壁は、 d -dに比例する磁気エネルギーを、第 1電極と中央電 [0013] In the above configuration, the magnetic energy of the domain wall is proportional to the width of the thin wire, The domain wall in the second region generates a magnetic energy proportional to d-d and the first electrode and the central electrode.
3 2 3 2
極間に印加する入力電圧又は電流を介して受け取ることにより第 3の領域に移動す る。第 3の領域は次第に幅が狭くなるため磁壁の取り得る磁気エネルギーも次第に小 さくなるので、第 3の領域に移動した磁壁は自発的に幅が狭くなる方向に移動すると 共に、余分な磁気エネルギーを電気エネルギーとして散逸し電流に受け渡す。この 余分な電気エネルギーは中央電極と第 2電極間から出力電圧又は電流を介して電 気エネルギーとして取り出すことができる。余分な電気エネルギーの総量は d — d Move to the third region by receiving via the input voltage or current applied between the poles. The magnetic energy that can be taken by the domain wall gradually decreases because the width of the third region gradually decreases, so that the magnetic wall that has moved to the third region spontaneously moves in the direction of narrowing and the extra magnetic energy. Is dissipated as electrical energy and passed to the current. This excess electrical energy can be extracted as electrical energy from the center electrode and the second electrode via the output voltage or current. The total amount of excess electrical energy is d — d
3 3m に比例しており、 d >d >d 、すなわち、 d — d >d — dであるから、第 2の領 3 Proportional to 3m and d> d> d, that is, d — d> d — d.
3 2 3m 3 3m 3 2 3 2 3m 3 3m 3 2
域にある磁壁を第 3の領域に移動するために要した入力電気エネルギーよりも大きな 出力電気エネルギーが得られ、例えば、電圧増幅素子として利用すれば、エネルギ 一利得を有する電圧増幅素子として動作する。この細線からなるナノ構造体を有する 磁気及び電気エネルギーの相互変換素子は、基板上に平面構造として構成すること ができる。 Output electric energy larger than the input electric energy required to move the domain wall in the region to the third region can be obtained. For example, when used as a voltage amplification element, it operates as a voltage amplification element having a single energy gain. . The mutual conversion element of magnetic and electric energy having a nanostructure composed of fine wires can be configured as a planar structure on a substrate.
[0014] 上記構成において、ナノ構造体は、好ましくは積層構造力もなり、その両端部及び 中央部は幅が広ぐ各端部と中央部との間には磁壁を保持できる幅の狭い第 1及び 第 2の磁壁保持部が形成されている。ナノ構造体の材料は、パーマロイ、鉄、鉄ーコ バルト合金、鉄—白金合金、サマリウム—コノ レト合金の何れかであれば好ましい。 ナノ構造体を積層構造とすることで、積層方向の厚さを平面構造のナノ構造体より も小さくすることができるので、ナノ構造体を有する磁気及び電気エネルギーの相互 変換素子内部抵抗を減少させることができる。また、その集積密度化にも有利である [0014] In the above configuration, the nanostructure preferably has a lamination structure force, and both end portions and the central portion are wide. The first narrow portion that can hold the domain wall between each end portion and the central portion is narrow. And the 2nd domain wall holding part is formed. The material of the nanostructure is preferably any of permalloy, iron, iron-cobalt alloy, iron-platinum alloy, and samarium-conoleto alloy. By making the nanostructure a laminated structure, the thickness in the stacking direction can be made smaller than that of a planar nanostructure, so that the internal resistance of the magnetic and electrical energy conversion element having the nanostructure is reduced. be able to. It is also advantageous for increasing the integration density.
[0015] 上記構成において、好ましくは、ナノ構造体は、第 1の硬質磁性層と第 1の軟質磁 性層と第 2の硬質磁性層と第 2の軟質磁性層と第3の硬質磁性層とが積層された構 造を有しており、ナノ構造体の一端部となる第 1の硬質磁性層には第 1電極が接続さ れ、ナノ構造体の他端部となる第 3の硬質磁性層には第 2電極が接続され、第 2の硬 質磁性層には中央電極が接続され、第 1の軟質磁性層と第2の軟質磁性層とが磁壁 を保持する磁壁保持部となる。 [0015] In the above configuration, preferably, the nanostructure includes the first hard magnetic layer, the first soft magnetic layer, the second hard magnetic layer, the second soft magnetic layer, and the third hard magnetic layer. The first electrode is connected to the first hard magnetic layer, which is one end of the nanostructure, and the third hard, which is the other end of the nanostructure. The second electrode is connected to the magnetic layer, the central electrode is connected to the second hard magnetic layer, and the first soft magnetic layer and the second soft magnetic layer serve as a domain wall holding portion that holds the domain wall. .
上記構成において、好ましくは、硬質磁性層は鉄—白金合金カゝらなり、軟質磁性層 はパーマロイからなる。 In the above configuration, preferably, the hard magnetic layer is made of iron-platinum alloy, and the soft magnetic layer Consists of permalloy.
上記構成によれば、ナノ構造体に磁壁保持部を形成するための幅の狭!ヽ領域を形 成する必要がなぐ垂直方向に均一の幅で形成すれば良いので製作が容易となる。 このため、ナノ構造体の垂直方向の長さ Lも平面構造のナノ構造体よりも小さくするこ とができるので、ナノ構造体を有する磁気及び電気エネルギーの相互変換素子内部 抵抗を減少させることができる。また、その集積化にも有利である。 According to the above configuration, since it is only necessary to form the nanostructure with a uniform width in the vertical direction without the need to form a narrow region for forming the domain wall holding portion in the nanostructure, the manufacture is facilitated. For this reason, the length L in the vertical direction of the nanostructure can be made smaller than that of the planar nanostructure, so that the internal resistance of the magnetic and electrical energy conversion element having the nanostructure can be reduced. it can. Moreover, it is advantageous also for the integration.
[0016] 本発明にお 、て、ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 がマトリクス状に配設されて ヽると、ナノ構造体を有する磁気及び電気エネルギーの 相互変換素子を集積ィ匕することができる。 In the present invention, when magnetic and electrical energy mutual conversion elements having nanostructures are arranged in a matrix, the magnetic and electrical energy mutual conversion elements having nanostructures are integrated. You can do it.
発明の効果 The invention's effect
[0017] 本発明によれば、ナノ構造体、例えば、磁性細線に設けた引き出し電極を介して電 流を流すことにより、電気エネルギーを磁気エネルギーに変換して蓄え、蓄えられた 磁気エネルギーを電気工ネルギ一に変換して取り出すことができる。従来の、電気工 ネルギーを磁気エネルギーに変換して蓄え、蓄えた磁気エネルギーを電気工ネルギ 一に変換して取り出す装置は、例えば、強磁性体と強磁性体に巻き付けたコイルとか らなり、強磁性体の磁化とコイルを流れる電流との相互作用で行うので、大きくかさば るコイルを必要とするの対して、本発明のナノ構造体を有する磁気及び電気工ネル ギ一の相互変換素子は、小型化、集積ィ匕できると共に、エネルギー効率を高くするこ とがでさる。 [0017] According to the present invention, by passing an electric current through a nanostructure, for example, an extraction electrode provided on a magnetic wire, electric energy is converted into magnetic energy and stored, and the stored magnetic energy is converted into electric energy. It can be converted into a single energy source and taken out. Conventional devices that convert electrical energy into magnetic energy and store it, and convert the stored magnetic energy into electrical energy and extract it are composed of, for example, a ferromagnetic material and a coil wound around the ferromagnetic material. Since the interaction between the magnetization of the magnetic material and the current flowing through the coil requires a large and bulky coil, the magnetic and electrical energy conversion device having the nanostructure of the present invention is It is possible to reduce the size and integration, and to increase the energy efficiency.
図面の簡単な説明 Brief Description of Drawings
[0018] [図 1]本発明の第 1の実施形態に係るナノ構造体を有する磁気及び電気エネルギー の相互変換素子の構成を示し、(a)は初期状態を、(b)は入力電圧を印力!]した後の 状態を示し、(c)は細線の各部の幅を示す図である。 [0018] FIG. 1 shows a configuration of a magnetic and electrical energy mutual conversion element having a nanostructure according to a first embodiment of the present invention, where (a) shows an initial state and (b) shows an input voltage. (C) is a diagram showing the width of each portion of the thin line.
[図 2]本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子の磁 壁の位置と磁壁エネルギーとの関係を示す図であり、縦軸は磁壁エネルギー、横軸 は磁壁の存在位置を示す。 FIG. 2 is a diagram showing the relationship between the domain wall energy and the domain wall energy of the magnetic / electrical energy mutual conversion element having the nanostructure of the present invention, where the vertical axis is the domain wall energy, and the horizontal axis is the location of the domain wall. Indicates.
[図 3]本発明の第 2の実施形態に係るナノ構造体を有する磁気及び電気エネルギー の相互変換素子を模式的に示すもので、(A)は断面図、(B)は平面図である。 [図 4]本発明の第 3の実施形態に係るナノ構造体を有する磁気及び電気エネルギー の相互変換素子の構造を模式的に示しており、(A)は断面図、(B)は平面図である FIG. 3 schematically shows a magnetic and electrical energy interconversion element having a nanostructure according to a second embodiment of the present invention, in which (A) is a cross-sectional view and (B) is a plan view. . FIG. 4 schematically shows the structure of a magnetic and electrical energy mutual conversion element having a nanostructure according to a third embodiment of the present invention, where (A) is a cross-sectional view and (B) is a plan view. Is
[図 5]本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子を用い た集積回路の構成を模式的に示す斜視図である。 FIG. 5 is a perspective view schematically showing a configuration of an integrated circuit using a magnetic and electrical energy mutual conversion element having a nanostructure of the present invention.
[図 6]電子伝導性の強磁性細線における磁壁及び磁壁の移動を示すもので、 (a)は 磁性細線に電流を流す前の磁壁の位置を、 (b)は電流を At時間加えた後の磁壁の 位置を示す。 [Fig. 6] Domain wall and domain wall movement in an electron-conducting ferromagnetic wire. (A) shows the position of the domain wall before passing a current through the magnetic wire, and (b) shows the current after adding the At time. The position of the domain wall is shown.
符号の説明 Explanation of symbols
1, 20, 30:ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 1, 20, 30: Magnetic and electrical energy interconversion elements with nanostructures
2:細線の幅が広い第 1の領域 2: First region with a wide thin line
3:細線の幅がくさび状にくびれた第 2の領域 3: The second area where the width of the thin line is wedged
4:細線の幅が徐々に細くなる第 3の領域 4: Third area where the width of the thin line gradually decreases
5:細線の幅が広 、第 4の領域 5: The width of the thin line is wide, the fourth area
6:磁壁 6: Domain wall
7:局在スピンの方向を示す矢印 7: Arrow indicating the direction of localized spin
8, 23A:第 1の磁壁保持部 8, 23A: 1st domain wall holder
9, 24A:第 2の磁壁保持部 9, 24A: Second domain wall holder
11, 26, 40:第 1電極 11, 26, 40: 1st electrode
12, 28, 42:中央電極 12, 28, 42: Center electrode
13, 27, 41:第 2電極 13, 27, 41: Second electrode
22:幅が広い第 1の層 22: Wide first layer
23:第 2の層 23: Second layer
24:第 3の層 24: 3rd layer
25:第 4の層 25: Fourth layer
34:第 1の硬質磁性層 34: First hard magnetic layer
35:第 1の軟質磁性層 35: First soft magnetic layer
36:第 2の硬質磁性層 37 :第 2の軟質磁性層 36: Second hard magnetic layer 37: Second soft magnetic layer
38 :第 3の硬質磁性層 38: Third hard magnetic layer
26A, 27A, 28A, 44, 45, 46, 52, 54, 56 :電極配線 26A, 27A, 28A, 44, 45, 46, 52, 54, 56: Electrode wiring
50:ナノ構造体を有する磁気及び電気エネルギーの相互変換素子を用いた集積回 路 50: Integrated circuit using magnetic and electrical energy conversion elements with nanostructures
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
[0020] 以下、本発明を実施するための幾つかの最良の形態を図面を参照して詳細に説 明する。 [0020] Hereinafter, some of the best modes for carrying out the present invention will be described in detail with reference to the drawings.
図 1は、本発明の第 1の実施形態に係るナノ構造体を有する磁気及び電気工ネル ギ一の相互変換素子の構成を示し、(a)は初期状態を、(b)は入力電圧を印力!]した 後の状態を、(c)は細線の各部の幅を示す図である。 FIG. 1 shows a configuration of a magnetic and electrical energy mutual conversion element having a nanostructure according to the first embodiment of the present invention, where (a) shows an initial state, and (b) shows an input voltage. (C) is a diagram showing the width of each part of the thin line.
本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子 1は、電子 伝導性を有しかつ磁性を有する細線力 なるナノ構造体力 構成されて 、る。磁性を 有する細線、即ち磁性細線 (以下、適宜に、細線と呼ぶ)は、図 1 (a)に示すように、 細線の幅が広い第 1の領域 2と、第 1の領域 2に連続する細線の幅がくさび状にくび れた第 2の領域 3と、第 2の領域 3に連続する細線の幅が徐々に細くなる第 3の領域 4 と、第 3の領域 4に連続する細線の幅が広 、第 4の領域 5とから構成される。 The magnetic / electrical energy mutual conversion element 1 having the nanostructure of the present invention has a nanostructure force that has electron conductivity and magnetic thin wire force. A magnetic thin wire, that is, a magnetic thin wire (hereinafter referred to as a thin wire as appropriate) is continuous with the first region 2 where the thin wire is wide and the first region 2 as shown in FIG. 1 (a). The second region 3 in which the width of the thin line is wedged, the third region 4 in which the width of the thin line continuing to the second region 3 is gradually narrowed, and the thin line continuing in the third region 4 And the fourth region 5 is wide.
[0021] 細線の各部の幅は、図 1 (c)に示すように、第 1の領域 2の幅を d、第 2の領域 3の [0021] As shown in FIG. 1 (c), the width of each part of the thin line is such that the width of the first region 2 is d and the width of the second region 3 is
1 1
最も細い幅を d、第 3の領域 4の最も広い幅を d 及び最も細い幅を d 、そして、第 4 D is the narrowest width, d is the widest width of the third region 4 and d is the thinnest width.
2 3 3m 2 3 3m
の領域 5の幅を dとした場合、 d >d >d >d 、そして d >d の関係を満たすよう If the width of region 5 is d, the relation d> d> d> d and d> d
4 1 3M 2 3m 4 3m 4 1 3M 2 3m 4 3m
に構成されている。 It is configured.
[0022] また、第 1の領域 2に第 1電極 11、第 3の領域 4の第 2の領域 3側に中央電極 12、第 4の領域 5に第 2電極 13を有している。また、図 1 (a)に示すように、細線の各部を矢 印 7で示すように各々磁ィ匕して磁壁 6を領域 3に形成しておく。後述するように、磁壁 は、第 2の領域 3の最も細い幅 (d )の領域又は第 3の領域 4の最も細い幅の領域 (d In addition, a first electrode 11 is provided in the first region 2, a center electrode 12 is provided on the second region 3 side of the third region 4, and a second electrode 13 is provided in the fourth region 5. Further, as shown in FIG. 1 (a), each part of the thin line is magnetized as indicated by an arrow 7 to form a domain wall 6 in the region 3. As will be described later, the domain wall has the narrowest width (d) of the second region 3 or the narrowest width (d) of the third region 4.
1 3 13
)の領域に保持され得る。磁壁の保持に関して、第 2の領域 3の最も細い幅の領域を m ). Regarding the domain wall retention, the area of the narrowest width of the second area 3 is m.
第 1の磁壁保持部 8と呼び、第 3の領域 4の最も細い幅の領域を第 2の磁壁保持部 9 と呼ぶことにする。 [0023] 本発明の磁性細線の幅及び膜厚は、ナノメータサイズであることが必要不可欠であ る。すなわち、磁性細線の幅及び膜厚が 1 μ m以上になると磁壁は電流により一様に 駆動されず、磁壁自体の構造が変化してしまうためである (非特許文献 3参照)。 The first domain wall holder 8 is referred to as the narrowest region of the third region 4 and is referred to as the second domain wall holder 9. [0023] The width and thickness of the magnetic wire of the present invention are indispensable to be nanometer size. That is, when the width and film thickness of the magnetic wire are 1 μm or more, the domain wall is not driven uniformly by the current, and the structure of the domain wall itself changes (see Non-Patent Document 3).
[0024] ここで、磁性細線の材料としては、パーマロイ、鉄、鉄とコバルトとからなる合金(以 下、適宜に鉄 コバルト合金と呼ぶ)、鉄と白金とからなる合金(以下、適宜に鉄 白 金合金と呼ぶ)、サマリウムとコバルトと力もなる合金(以下、適宜にサマリウム一コバ ルト合金と呼ぶ)を用いることができる。 [0024] Here, as the material of the magnetic wire, permalloy, iron, an alloy composed of iron and cobalt (hereinafter referred to as an iron-cobalt alloy as appropriate), an alloy composed of iron and platinum (hereinafter referred to as iron as appropriate). It is possible to use a metal alloy (referred to as a samarium-cobalt alloy as appropriate), which is also called samarium-cobalt alloy.
[0025] 次に、本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子の 作用を説明する。 Next, the operation of the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention will be described.
図 2は、本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子の 磁壁の位置と磁壁エネルギーとの関係を示す図であり、縦軸は磁壁エネルギー、横 軸は磁壁の存在位置を示す。磁壁の位置" 1"は、図 1の第 2の領域 3の細線幅が最 も細い位置に対応する第 1の磁壁保持部 8である。磁壁の位置" 0"は、図 1の第 3の 領域 4と第 4の領域 5の境界位置に対応する第 2の磁壁保持部 9である。 E は磁壁 6 a が " 1 "に示す位置に存在するときの磁壁エネルギーど' 0"の位置に存在するときの磁 壁エネルギーの差を示し、 E は、磁壁 6が中央電極 12の近傍位置に存在するときの b FIG. 2 is a diagram showing the relationship between the position of the domain wall and the domain wall energy of the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention, where the vertical axis represents the domain wall energy, and the horizontal axis represents the location of the domain wall. Show. The domain wall position “1” is the first domain wall holder 8 corresponding to the position where the thin line width of the second region 3 in FIG. 1 is the narrowest. The domain wall position “0” is the second domain wall holder 9 corresponding to the boundary position between the third region 4 and the fourth region 5 in FIG. E indicates the difference in domain wall energy when the domain wall 6 a is present at the position of “0” when the domain wall 6 a is present at the position indicated by “1”, and E is the position of the domain wall 6 in the vicinity of the central electrode 12. When present in b
磁壁エネルギーど' 1 "の位置に存在するときの磁壁エネルギーの差を示す。 This shows the difference in domain wall energy when the domain wall energy exists at the position of '1'.
[0026] 図 1 (a)に示す磁性細線の各部における磁壁のエネルギーを説明する。磁性体の 交換相互作用の大きさを A (単位 CiZm〕)、一軸磁気異方性定数を K (単位 CFZ The energy of the domain wall in each part of the magnetic wire shown in FIG. 1 (a) will be described. The magnitude of the exchange interaction of the magnetic material is A (unit CiZm), and the uniaxial magnetic anisotropy constant is K (unit CFZ
ex u ex u
m3〕 )とするとき、単位断面積当りの磁壁 6の持つエネルギー σ (単位 [j/m〕は、 式(7)で与えられる。 m 3 ]), the energy σ (unit [j / m]) of the domain wall 6 per unit cross-sectional area is given by equation (7).
[数 7] [Equation 7]
従って、磁壁 6に蓄えられるエネルギーは、式(7)に細線の断面積を乗じたものとな る。図 1 (a)の細線において、 "0"、 "1"及び中央電極 12で示した位置における細線 の断面積をそれぞれ、 A 、 A及び Aとすると、図 2に示したエネルギー障壁 E 、 E Therefore, the energy stored in the domain wall 6 is obtained by multiplying Equation (7) by the cross-sectional area of the thin line. In the thin line in Fig. 1 (a), assuming that the cross-sectional areas of the thin lines at the positions indicated by "0", "1" and the central electrode 12 are A, A and A, respectively, the energy barriers E and E shown in Fig. 2
0 1 b a b は次の式(8)で与えられる。 0 1 b a b is given by the following equation (8).
[数 8] Ea = aw (Ai - Ao), Eb = aw (Ab - Αι) (8) ここで、細線の膜厚を hとし、図 1 (c)に示した各部の幅を用いれば、 A = d X h、 [Equation 8] Ea = a w (Ai-Ao), Eb = a w (Ab-Αι) (8) Here, if the thin film thickness is h and the width of each part shown in Fig. 1 (c) is used, A = d X h,
0 3m 0 3m
A = d X h、A = d X h、また、 d > d > d であることから、 A >A >Aであり、A = d X h, A = d X h, and since d> d> d, A> A> A,
1 2 b 3 3 2 3m b 1 0 図 2に示したように、 E >Eとすることができる。また、 d > d であるから、第 1電極 1 a b 1 3 1 2 b 3 3 2 3m b 1 0 As shown in Fig. 2, E> E can be satisfied. Since d> d, the first electrode 1 a b 1 3
1と中央電極 12を介して電気エネルギーを供給した場合に、第 2の領域 3にある磁壁 6は第 3の領域 4側に励起される。また、 d > d であることから、第 3の領域 4を移動 When electric energy is supplied via 1 and the central electrode 12, the domain wall 6 in the second region 3 is excited toward the third region 4 side. Since d> d, move the third area 4
4 3m 4 3m
する磁壁 6は" 0"の位置で停止する。 The domain wall 6 to be stopped stops at the position "0".
図 1 (a)の状態、すなわち、磁壁 6が図 2の" 1"の位置にある時、第 1電極 11と中央 電極 12の間に電圧または電流パルスをカ卩えることにより、式(2)に従って磁壁 6が有 限の速度を持ち、図 2に示したエネルギー障壁 Eを越え、中央電極 12の位置まで移 b In the state of Fig. 1 (a), that is, when the domain wall 6 is at the position of "1" in Fig. 2, by applying a voltage or current pulse between the first electrode 11 and the central electrode 12, the equation (2 ), The domain wall 6 has a finite velocity, moves over the energy barrier E shown in Fig. 2 and moves to the position of the center electrode 12 b
動する。これにより、磁壁 6が第 1の磁壁保持部 8から第 2の磁壁保持部 9へ移動する 。この際、外部電源により磁壁 6に対して仕事 Eがなされている。 Move. As a result, the domain wall 6 moves from the first domain wall holder 8 to the second domain wall holder 9. At this time, work E is performed on the domain wall 6 by an external power source.
b b
第 3の領域 4においては、細線の幅が勾配を有して細くなつており、磁壁の取り得る 磁壁エネルギーはその勾配に従って減少するので、磁壁 6は、第 3の領域 4の磁壁 エネルギーの傾きに従って自発的に" 0"の位置まで移動する、すなわち、図 1 (b)の 状態になると共に、余分の磁気エネルギーを放出し、この余分の磁気エネルギーは 式(5)、式 (6)に従って伝導電子に受け渡され、最終的に中央電極 12と第 2電極 13 、て散逸する。 In the third region 4, the width of the thin line is narrow and has a gradient, and the domain wall energy that the domain wall can take decreases according to the gradient. Therefore, the domain wall 6 has a gradient of the domain wall energy in the third region 4. According to the following equation (5) and (6): It is transferred to the conduction electrons and finally the central electrode 12 and the second electrode 13 , Dissipate.
すなわち、第 1電極 11と中央電極 12の間に加えた入力電気エネルギー E 〖こ対し、 b 第 2電極 13と中央電極 12の間に出力電気工ネルギ一として、 p (E +E )が取り出さ a b In other words, the input electrical energy E applied between the first electrode 11 and the central electrode 12 is taken out, and b (E + E) is extracted as the output electrical energy between the second electrode 13 and the central electrode 12. ab
れる。このときのエネルギー増幅率を Gとすると、式(8)を用いて、増幅率 Gは次式(9 )で表される。 It is. When the energy amplification factor at this time is G, the amplification factor G is expressed by the following equation (9) using equation (8).
[数 9] [Equation 9]
G = p^ ^ = p (9) 細線形状を選択し、 Εを Εより十分大きくすることができるから、増幅率 G = lを越 a b G = p ^ ^ = p (9) Select a fine line shape and Ε can be made sufficiently larger than Ε.
えるエネルギー ·ゲインが得られる。 [0028] 磁壁 6を" 0"からに" 1"に戻す、すなわち、素子に磁気エネルギーを蓄えるには、第 2電極 13と第 1電極 11の間に、第 1電極 11と中央電極 12の間に印加する電圧また は電流パルスと逆極性の電圧または電流をカ卩えることにより可能である。これにより、 磁壁 6を、第 2の磁壁保持部 9から再び第 1の磁壁保持部 8へ移動させることができる 。また、この操作は、本素子を電圧増幅素子として用いる場合の素子の初期化に相 当する。 Energy gain. [0028] To return the domain wall 6 from "0" to "1", that is, to store magnetic energy in the element, between the second electrode 13 and the first electrode 11, the first electrode 11 and the central electrode 12 This can be done by measuring a voltage or current having a polarity opposite to that of the voltage or current pulse applied between them. As a result, the domain wall 6 can be moved again from the second domain wall holder 9 to the first domain wall holder 8. This operation corresponds to the initialization of the device when this device is used as a voltage amplification device.
[0029] 次に、具体的な磁性細線物質、素子形状に基づいて計算で求めた、本発明のナノ 構造体を有する磁気及び電気エネルギーの相互変換素子 1の増幅率を示す。 [0029] Next, the amplification factor of the mutual conversion element 1 of magnetic and electrical energy having the nanostructure of the present invention, which is calculated based on the specific magnetic wire substance and element shape, is shown.
具体的な磁性細線物質として、パーマロイ (FeNi合金)を考える。細線の厚みを 50 nmとし、図 2において" 0"の位置での断面積を 10— 15 m2 (幅 20nm)、 "1"の位置での 断面積を 1. 1 X 10— "m2 (幅 220nm)、中央電極 12の位置での断面積を 1. 2 X 10— 1 4 m2 (幅 240nm)とする。この条件によれば、 A = 10"nj/m, K = 105j/m3及び ex u Permalloy (FeNi alloy) is considered as a specific magnetic wire material. The thickness of the thin line and 50 nm, 10- 15 m 2 (width 20 nm) the cross-sectional area at the position of "0" in FIG. 2, "1" 1.1 the cross-sectional area at the position of X 10- "m 2 (width 220 nm), the cross-sectional area at the position of the center electrode 12 1. and 2 X 10- 1 4 m 2 (width 240 nm). According to this condition, a = 10 "n j / m, K = 10 5 j / m 3 and ex u
p = 0. 7となる。これらのパラメーターを用いると、式(7)、式(8)から、 a w = 10" m3、 E = 10— "J、 E = 10— 18Jとなる。さらに式(9)により、この場合のエネルギー増幅 a b p = 0.7. With these parameters, expression (7), from equation (8), and a w = 10 "m 3, E = 10-" J, E = 10- 18 J. Furthermore, the energy amplification in this case ab
率 Gとして、式(10)が得られる。 As the rate G, equation (10) is obtained.
[数 10] [Equation 10]
G = 7.7 (10) G = 7.7 (10)
[0030] 本発明の第 2の実施形態に係るナノ構造体を有する磁気及び電気エネルギーの相 互変換素子について説明する。 [0030] A magnetic and electrical energy mutual conversion element having a nanostructure according to a second embodiment of the present invention will be described.
図 3は、本発明の第 2の実施形態に係るナノ構造体を有する磁気及び電気工ネル ギ一の相互変換素子 20を模式的に示し、(A)は断面図、(B)は平面図である。図 3 に示すように、ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 20は ナノ構造体から構成されており、図 1に示した細線 1を 90° 回転した位置関係を有 している。下力も順に、幅が広い第 1の層 22と、第 1の層 22に連続し層の幅がくさび 状にくびれた第 2の層 23と、第 2の層 23に連続し層の幅が徐々に細くなる第 3の層 2 4と、第 3の層 24に連続し層の幅が広い第 4の層 25とから構成される。 FIG. 3 schematically shows a magnetic and electrical energy mutual conversion element 20 having a nanostructure according to the second embodiment of the present invention, where (A) is a cross-sectional view and (B) is a plan view. It is. As shown in FIG. 3, the magnetic and electrical energy conversion element 20 having a nanostructure is composed of a nanostructure and has a positional relationship obtained by rotating the thin wire 1 shown in FIG. 1 by 90 °. . In order of the lower force, the first layer 22 having a wider width, the second layer 23 continuous with the first layer 22 and having a wedge-like width, and the second layer 23 having a width that is continuous with the second layer 23 It is composed of a third layer 24 that gradually becomes thin and a fourth layer 25 that is continuous with the third layer 24 and has a wide layer width.
ナノ構造体 20の各部の幅は、第 1の層 22の幅を d、第 2の層 23の最も細い幅を d The width of each part of the nanostructure 20 is d for the width of the first layer 22 and d for the narrowest width of the second layer 23.
1 2 1 2
、第 3の層 24の最も広い幅を d 及び最も細い幅を d 、そして第 4の層 25の幅を dと し、 d >d >d >d 、そして d >d の関係を満たすように構成されている。ナノ構The widest width of the third layer 24 is d and the narrowest width is d, and the width of the fourth layer 25 is d And d>d>d> d and d> d. Nano structure
1 3 2 3m 4 3m 1 3 2 3m 4 3m
造体 20は、積層方向(Y軸方向)の厚さが Lであり、紙面垂直方向(Z軸方向)の長さ を Lとする。 The structure 20 has a thickness L in the stacking direction (Y-axis direction) and a length in the direction perpendicular to the paper surface (Z-axis direction).
z z
[0031] ナノ構造体の一端部 22と第 2の層との間には、磁壁を保持するために、幅が dで [0031] Between the one end portion 22 of the nanostructure and the second layer, the width is d in order to hold the domain wall.
2 ある第 1磁壁保持部 23Aが形成されている。ナノ構造体の他端部 25と第 4の層 25と の間には、磁壁を保持するために、幅が d である第 2磁壁保持部 24Aが形成されて 2 A first domain wall holder 23A is formed. Between the other end 25 of the nanostructure 25 and the fourth layer 25, a second domain wall holder 24A having a width d is formed to hold the domain wall.
3m 3m
いる。 Yes.
[0032] ナノ構造体 20においては、その一端である第 1の層 22に接続される第 1電極 26と 、その他端である第 4の層 25に接続される第 2電極 27と、中央部の第 2の層 23及び 第 3の層 24との境界近傍に接続される中央電極 28と、が形成されている。従って、ナ ノ構造体を有する磁気及び電気エネルギーの相互変換素子 20にお 、て、電極 26, 27, 28の接続される箇所の断面積が大きぐこれらの電極の間に配設される幅の狭 い第 1の磁壁保持部 23A及び第 2の磁壁保持部 24Aの断面積が小さくなつている。 この第 1の磁壁保持部 23Aの磁気エネルギーは第 2の磁壁保持部の磁気エネルギ 一 24Aよりも大きくなるようにその断面積が設定されて 、る。 [0032] In the nanostructure 20, the first electrode 26 connected to the first layer 22 as one end, the second electrode 27 connected to the fourth layer 25 as the other end, A central electrode 28 connected to the vicinity of the boundary between the second layer 23 and the third layer 24 is formed. Therefore, in the magnetic / electrical energy mutual conversion element 20 having a nano structure, the cross-sectional area of the portion where the electrodes 26, 27, 28 are connected is large, and the width disposed between these electrodes. The cross-sectional areas of the narrow first domain wall holder 23A and the second domain wall holder 24A are reduced. The cross-sectional area is set so that the magnetic energy of the first domain wall holder 23A is larger than the magnetic energy 24A of the second domain wall holder.
[0033] 図 3 (B)は、図 3 (A)に示すナノ構造体の上部の一端部 25側から見た平面図であり 、第 1電極 26と第 2電極 27と中央電極 28とには、それぞれ、電極配線 26A, 27A, 2 8Aが形成されている。これらの電極配線 26A, 27A, 28Aは互いに接触しないよう に、複数の層間絶縁層を介して形成することができる。なお、図示の場合には、第 1 及び第 2の磁壁保持部 23A, 24Aは、端部側及び中央部側から直線的に徐々に寸 法を変えて形成しているが、この傾斜線部は、図示のような直線ではなぐ曲線、直 線と曲線との組み合わせなどで形成してもよ 、。 FIG. 3 (B) is a plan view seen from the one end 25 side of the upper part of the nanostructure shown in FIG. 3 (A). The first electrode 26, the second electrode 27, and the central electrode 28 are connected to each other. The electrode wirings 26A, 27A, and 28A are respectively formed. These electrode wirings 26A, 27A, 28A can be formed through a plurality of interlayer insulating layers so as not to contact each other. In the illustrated case, the first and second domain wall holders 23A, 24A are formed by gradually changing the dimensions linearly from the end side and the center side. May be formed by a curve that is not a straight line as shown, or a combination of a straight line and a curve.
[0034] このように、本発明の第 2の実施形態に係るナノ構造体を有する磁気及び電気エネ ルギ一の相互変換素子において、ナノ構造体 20は、電子伝導性を有する磁性体か らなり、このナノ構造体 20の両端部には第 1及び第 2の電極 26, 27が接続され、また 、ナノ構造体の中央部には中央電極 28が接続されている。ナノ構造体 20の第 1電極 26と中央電極 28との間には磁壁を保持できる第 1の磁壁保持部 23Aと、ナノ構造体 20の第 2電極 27と中央電極 28との間には磁壁を保持できる第 2の磁壁保持部 24A と、力待設けられる。 [0034] In this manner, in the magnetic and electrical energy-conversion element having the nanostructure according to the second embodiment of the present invention, the nanostructure 20 is made of a magnetic material having electron conductivity. The first and second electrodes 26 and 27 are connected to both ends of the nanostructure 20, and the center electrode 28 is connected to the center of the nanostructure. A first domain wall holder 23A that can hold a domain wall between the first electrode 26 and the center electrode 28 of the nanostructure 20 and a domain wall between the second electrode 27 and the center electrode 28 of the nanostructure 20 Second domain wall holder 24A And there will be a power waiting.
ここで、第 1の磁壁保持部及び第 2の磁壁保持部 23A, 24Aの磁気エネルギーは ナノ構造体 20の両端部側の磁気エネルギーよりも小さぐ第 1の磁壁保持部 23Aの 磁気エネルギーは第 2の磁壁保持部の磁気エネルギー 24Aよりも大きくなるように構 成しておく。このように構成されるナノ構造体 20においては、細線力もなるナノ構造 体を有する磁気及び電気エネルギーの相互変換素子 1と同様に、第 1電極 26と中央 電極間 28に入力電圧又は電流を介して電気エネルギーを加えると共に、中央電極 2 8と第 2電極 27間から出力電圧又は電流を介して増幅された出力電気エネルギーを 取り出すことができる。 Here, the magnetic energy of the first domain wall holder 23A and the second domain wall holder 23A, 24A is smaller than the magnetic energy of the both ends of the nanostructure 20, and the magnetic energy of the first domain wall holder 23A is the first It is configured to be larger than the magnetic energy 24 A of the domain wall holder 2. In the nanostructure 20 configured as described above, similarly to the magnetic and electrical energy conversion element 1 having a nanostructure having a thin line force, an input voltage or current is applied between the first electrode 26 and the central electrode 28. Thus, it is possible to take out electrical energy from the center electrode 28 and the second electrode 27 through the output voltage or current and take out the electrical energy.
[0035] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子 20は、薄 膜形成技術とエッチングなどの加工方法で形成できるので、その垂直方向(図 4の Y 方向)の厚さ制御が容易である。このため、ナノ構造体 20の垂直方向の長さ Lを、平 面構造のナノ構造体 1の場合よりも小さくすることができるので、ナノ構造体を有する 磁気及び電気エネルギーの相互変換素子 20の内部抵抗の減少及びその集積密度 を挙げるために有利である。 The magnetic / electrical energy mutual conversion element 20 having the nanostructure of the present invention can be formed by a thin film forming technique and a processing method such as etching, so that its thickness in the vertical direction (Y direction in FIG. 4) Easy to control. For this reason, the vertical length L of the nanostructure 20 can be made smaller than that in the case of the nanostructure 1 having a planar structure, and therefore, the magnetic and electrical energy mutual conversion element 20 having the nanostructure 20 It is advantageous to reduce the internal resistance and increase its integration density.
[0036] 本発明の第 3の実施形態に係るナノ構造体を有する磁気及び電気エネルギーの相 互変換素子について説明する。 [0036] A magnetic and electrical energy mutual conversion element having a nanostructure according to a third embodiment of the present invention will be described.
図 4は、本発明の第 3の実施形態に係るナノ構造体を有する磁気及び電気工ネル ギ一の相互変換素子 30の構造を模式的に示し、(A)は断面図、(B)は平面図であ る。 FIG. 4 schematically shows the structure of the magnetic and electrical energy mutual conversion element 30 having the nanostructure according to the third embodiment of the present invention, where (A) is a cross-sectional view and (B) is a cross-sectional view. FIG.
図 4 (A)に示す磁気及び電気エネルギーの相互変換素子 30のナノ構造体は、紙 面の下力も上に積層される構造を有しており、下力も順に第 1の硬質磁性層 34と、第 1の軟質磁性層 35と、第 2の硬質磁性層 36と、第 2の軟質磁性層 37と、第 3の硬質 磁性層 38と、が積層された 5層構造を有している。 The nanostructure of the mutual conversion element 30 of magnetic and electrical energy shown in FIG. 4 (A) has a structure in which the lower force on the paper is also stacked on the first hard magnetic layer 34 in order. The first soft magnetic layer 35, the second hard magnetic layer 36, the second soft magnetic layer 37, and the third hard magnetic layer 38 are stacked.
[0037] ナノ構造体 30において、その一端部となる第 1の硬質磁性層 34には第 1電極 40が 接続され、その他端部となる第 3の硬質磁性層 38には第 2電極 41が接続され、第 2 の硬質磁性層 36と第 2の硬質磁性層 36の境界近傍には中央電極 42が接続されて いる。強磁性体構造 33は、積層方向(Y軸方向)の厚さが Lであり、その幅が Wであ る。 In the nanostructure 30, the first electrode 40 is connected to the first hard magnetic layer 34 which is one end thereof, and the second electrode 41 is connected to the third hard magnetic layer 38 which is the other end thereof. A central electrode 42 is connected near the boundary between the second hard magnetic layer 36 and the second hard magnetic layer 36. The ferromagnetic structure 33 has a thickness L in the stacking direction (Y-axis direction) and a width W. The
[0038] 図 4 (B)は、図 4 (A)のナノ構造体 30をその上部の第 3の硬質磁性層 38側力も見 た平面図であり、第 1電極 40と第 2電極 41と中央電極 42とには、それぞれ、電極配 線 44, 45, 46力形成されている。これらの電極酉己線 44, 45, 46は互いに接虫しな V、ように、複数の層間絶縁層を介して形成することができる。 FIG. 4 (B) is a plan view of the nanostructure 30 of FIG. 4 (A) in which the side force of the third hard magnetic layer 38 on the upper side is also seen. The first electrode 40 and the second electrode 41 Electrode wirings 44, 45, and 46 are formed on the center electrode 42, respectively. These electrode self-intersecting wires 44, 45, 46 can be formed through a plurality of interlayer insulation layers, such as V, which are not in contact with each other.
[0039] 第 1〜第 3の硬質磁性層 34, 36, 38は、磁ィ匕の向きが変化し難い材料である硬質 磁性材料からなり、鉄一白金合金などを使用することができる。この硬質磁性材料は ハード磁性材料とも呼ばれる。第 1及び第 2の軟質磁性層 35, 37は、磁気モーメント の向きが極めて回転し易い材料である硬質磁性材料力もなり、パーマロイなどを使用 することができる。この軟質磁性材料はソフト磁性材料とも呼ばれる。 [0039] The first to third hard magnetic layers 34, 36, and 38 are made of a hard magnetic material that is a material in which the direction of the magnetic field hardly changes, and an iron-platinum alloy or the like can be used. This hard magnetic material is also called a hard magnetic material. The first and second soft magnetic layers 35 and 37 also have a hard magnetic material force, which is a material in which the direction of the magnetic moment is extremely easy to rotate, and permalloy or the like can be used. This soft magnetic material is also called a soft magnetic material.
[0040] ナノ構造体 30においては、第 1及び第 2の硬質磁性層 34, 36の間に挿入される第 1の軟質磁性層 35が磁壁を保持する安定な低エネルギー層となり、第 1の磁壁保持 部が形成される。第 2及び第 3の硬質磁性層 36, 38の間に挿入される第 2の軟質磁 性層 35が磁壁を保持する安定な低エネルギー層となり、第 2の磁壁保持部となる。こ こで、第 1の磁壁保持部及び第 2の磁壁保持部の磁気エネルギーはナノ構造体 30 の両端部側の磁気エネルギーよりも小さぐ第 1の磁壁保持部の磁気エネルギーは 第 2の磁壁保持部の磁気エネルギーよりも大きくなるように構成しておく。上記の硬質 磁性層と軟質磁性層との間に生じさせるエネルギーの勾配は、各硬質磁性層 34, 3 6, 38と、各軟質磁性層 35, 37との境界において、各磁性体の混合比を徐々に変え ることで形成することができる。 [0040] In the nanostructure 30, the first soft magnetic layer 35 inserted between the first and second hard magnetic layers 34 and 36 becomes a stable low energy layer holding a domain wall, and the first A domain wall holder is formed. The second soft magnetic layer 35 inserted between the second and third hard magnetic layers 36 and 38 becomes a stable low-energy layer that holds the domain wall, and serves as the second domain wall holding portion. Here, the magnetic energy of the first domain wall holding unit and the second domain wall holding unit is smaller than the magnetic energy of the both ends of the nanostructure 30. The magnetic energy of the first domain wall holding unit is the second domain wall. It is configured to be larger than the magnetic energy of the holding part. The gradient of energy generated between the hard magnetic layer and the soft magnetic layer is determined by the mixing ratio of each magnetic substance at the boundary between each hard magnetic layer 34, 3 6, 38 and each soft magnetic layer 35, 37. It can be formed by gradually changing.
[0041] 上記ナノ構造体 30にお 、ては、硬質磁性層の単位面積当りの磁気エネルギー σ [0041] In the nanostructure 30, the magnetic energy per unit area of the hard magnetic layer σ
(hard)が軟質磁性層の単位面積当りの磁気エネルギー σ (soft)よりも大き!/、こと を利用して、第 1及び第 2の磁壁保持部の位置エネルギーの差を得ることができる。 つまり、磁壁保持部の位置エネルギーは、単位面積当りの磁気エネルギー σ に断 面積 Αを乗じた積、即ち σ X Αで与えられる。磁性体構造 33においては、断面積 A が一定であるが、硬質磁性層と軟質磁性層の磁気エネルギーが異なることで磁壁保 持部の位置エネルギー差を生じさせることができる。 (hard) is larger than the magnetic energy σ (soft) per unit area of the soft magnetic layer, the difference in potential energy between the first and second domain wall holders can be obtained. In other words, the potential energy of the domain wall holder is given by the product of the magnetic energy σ per unit area multiplied by the section area 面積, that is, σ X Α. In the magnetic structure 33, the cross-sectional area A is constant. However, the magnetic energy of the hard magnetic layer and that of the soft magnetic layer are different, so that a potential energy difference between the domain wall holders can be generated.
[0042] 軟質磁性層をパーマロイとした場合の単位面積当りの磁気エネルギー σ (soft) は上記したように、 10— 3j/m2である。硬質磁性層として鉄—白金合金の場合の単位 面積当りの磁気エネルギー σ (hard)は、 8 X 10— 3j/m2程度となる。ここで、物質パ ラメータとして、交換相互作用の大きさを A = 10— ujZmとし、 [0042] Magnetic energy per unit area when the soft magnetic layer is permalloy σ (soft) Is 10 3 j / m 2 as mentioned above. As the hard magnetic layer iron - magnetic energy per unit area in the case of platinum alloy sigma (hard) becomes 8 X 10- 3 j / m 2 approximately. Here, as a material parameter, the magnitude of the exchange interaction is A = 10— u jZm,
ex 一軸磁気異方性定数 ex Uniaxial magnetic anisotropy constant
K = 7 X 106j/m3とした。ナノ構造体 30が正四角形のパターンである場合には、そ の幅 W (図 4の X軸方向の寸法)を 32nmとすると、面積は 1 X 10— 15 m2となる。このK = 7 × 10 6 j / m 3 . If the nanostructure 30 has a regular tetragonal pattern, the area is 1 X 10-15 m 2 when its width W (dimension in the X-axis direction in Fig. 4) is 32 nm. this
1 1
面積におけるパーマロイ及び鉄—白金合金の磁気エネルギーは、それぞれ、 1 X 10 "18J, 8 X 10— 18Jとなる。従って、この場合の軟質磁性層と硬質磁性層との磁気エネル ギー障壁 Δ Εは 7 X 10— 18 J (43. 7eV)と計算される。このエネルギー障壁 Δ Εは十分 に大き!/、ので、本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換 素子 30は、通常の使用温度で安定して動作させることができる。 Permalloy and iron in the area -. Magnetic energy of platinum alloy, respectively, a 1 X 10 "18 J, 8 X 10- 18 J Thus, the magnetic energy barrier between the soft magnetic layer and the hard magnetic layer in this case Δ E is calculated to be 7 X 10- 18 J (43. 7eV ). this energy barrier delta E is sufficiently large! /, so interconversion element 30 of the magnetic and electric energy having a nano structure of the present invention Can operate stably at normal use temperature.
[0043] ナノ構造体 30においては、軟質磁性層の積層方向の膜厚も変化させることで、位 置エネルギーに差を設けることができる。下記にその理由を述べる。 [0043] In the nanostructure 30, a difference in positional energy can be provided by changing the thickness of the soft magnetic layer in the stacking direction. The reason is described below.
磁壁の幅(図 4 (A)の Y軸方向)は、交換相互作用の大きさ A を The width of the domain wall (in the Y-axis direction in Fig. 4 (A)) determines the magnitude of the exchange interaction A.
ex 一軸磁気異方性 定数 Kで割った値の平方根である( A /K ) 1/2で与えられる。この磁壁の幅は 10η u ex u ex Uniaxial magnetic anisotropy constant (A / K) 1/2 , which is the square root of the value divided by K. The width of this domain wall is 10η u ex u
m程度である。すなわち、軟質磁性層を厚くした場合には、磁壁、即ち磁気モーメン トが空間的に変化している部分が、殆ど軟質磁性層に重なるために、その磁気エネ ルギ一は上記の σ (soft)となり、ナノ構造体 30の中で最も低いエネルギー状態が 実現される。 m. That is, when the soft magnetic layer is thickened, the domain wall, that is, the portion where the magnetic moment is spatially changed almost overlaps the soft magnetic layer, so that the magnetic energy is the above-mentioned σ (soft) Thus, the lowest energy state among the nanostructures 30 is realized.
一方、軟質磁性層を薄くし磁壁幅より小さくした場合には、実際には磁壁は隣り合う 硬質磁性層とも重なり合 ヽをもっため、磁壁のエネルギーは上記の σ (soft)と σ ( hard)との中間的な値によって与えられる。この場合の磁壁のエネルギーは上記の 厚い軟質磁性層とした場合よりも高いエネルギー状態が得られる。もちろん、この場 合のエネルギーは、軟質磁性層がな 、場合の σ (hard)と比較して低エネルギーで あるので磁壁保持部として十分な働きをする。従って、低エネルギー側の第 2の磁気 保持部となる軟質磁性層は磁壁幅より厚くし、高エネルギー側の第 1の磁壁保持部と なる軟質磁性層は磁壁幅より薄くすることが必要である。 On the other hand, if the soft magnetic layer is made thinner and smaller than the domain wall width, the domain wall actually overlaps with the adjacent hard magnetic layer, so the energy of the domain wall is σ (soft) and σ (hard) Is given by an intermediate value. In this case, the energy of the domain wall is higher than that in the case of the thick soft magnetic layer. Of course, since the energy in this case is lower than the σ (hard) in the case where the soft magnetic layer is not provided, it sufficiently functions as a domain wall holding portion. Therefore, the soft magnetic layer serving as the second magnetic holding portion on the low energy side needs to be thicker than the domain wall width, and the soft magnetic layer serving as the first magnetic wall holding portion on the high energy side needs to be thinner than the domain wall width. .
[0044] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子 30は、第 1及び第 2の軟質磁性層 35, 37を、それぞれ、第 1及び第 2の磁気保持部とすること により、図 1で示したナノ構造体を有する磁気及び電気エネルギーの相互変換素子 1 と同様に動作させることができる。ナノ構造体 30の形成においては、ナノ構造体 20の ように積層方向の所定箇所を幅の狭い Wという領域を形成する必要がないので、垂 [0044] In the mutual conversion element 30 for magnetic and electrical energy having the nanostructure of the present invention, the first and second soft magnetic layers 35 and 37 are used as the first and second magnetic holding portions, respectively. Thus, the magnetic and electrical energy mutual conversion element 1 having the nanostructure shown in FIG. 1 can be operated. In the formation of the nanostructure 30, it is not necessary to form a narrow area of W at a predetermined position in the stacking direction unlike the nanostructure 20, so
2 2
直方向に均一の幅 Wとすれば良いことから製作が容易となる。このため、ナノ構造 Manufacture is easy because the width W should be uniform in the straight direction. Because of this, nanostructure
1 1
体 30の垂直方向の長さ Lも、平面構造のナノ構造体 1よりも小さくすることができるの で、ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 30の内部抵抗の 減少及びその集積密度を挙げるために有利である。 Since the vertical length L of the body 30 can also be made smaller than that of the nanostructure 1 having a planar structure, the internal resistance of the magnetic and electrical energy conversion element 30 having the nanostructure can be reduced and integrated. It is advantageous to increase the density.
[0045] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子 20, 30の 幅及び膜厚は、ナノメータサイズであることが必要不可欠である。すなわち、磁性細 線の幅及び膜厚が 1 μ m以上になると磁壁は電流により一様に駆動されず、磁壁自 体の構造が変化してしまうためである(非特許文献 3参照)。 [0045] The width and film thickness of the magnetic and electrical energy mutual conversion elements 20, 30 having the nanostructure of the present invention are indispensable to be nanometer size. That is, when the magnetic wire width and film thickness are 1 μm or more, the domain wall is not uniformly driven by the current, and the structure of the domain wall itself changes (see Non-Patent Document 3).
[0046] 次に、本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子の 集積回路について説明する。 図 5は、本発明 のナノ構造体を有する磁気及び電気エネルギーの相互変換素子を用いた集積回路 の構成を模式的に示す斜視図である。 [0046] Next, an integrated circuit of magnetic and electrical energy mutual conversion elements having the nanostructure of the present invention will be described. FIG. 5 is a perspective view schematically showing a configuration of an integrated circuit using a magnetic and electrical energy mutual conversion element having the nanostructure of the present invention.
図 5に示すように、ナノ構造体を有する磁気及び電気エネルギーの相互変換素子 を用いた集積回路 50において、 X方向の電極配線 52と Y方向の電極配線 54とが交 差する各位置に、マトリクス状にナノ構造体 20を配設した構成である。これらのマトリ タス状に配列された各ナノ構造体 20の第 1及び第 2の電極層 26, 27には、それぞれ 、 Y方向の電極配線 52と X方向の電極配線 54とが接続し、中央電極 28には電極配 線 56が接続されている。ナノ構造体は、第 2の実施形態であるナノ構造体を有する 磁気及び電気エネルギーの相互変換素子 20に限らず、第 1の実施形態及び第 3の 実施形態のナノ構造体 1, 30を用いてもよい。 As shown in FIG. 5, in the integrated circuit 50 using the magnetic and electrical energy mutual conversion elements having nanostructures, the X-direction electrode wiring 52 and the Y-direction electrode wiring 54 cross each position. In this configuration, the nanostructures 20 are arranged in a matrix. Y-direction electrode wiring 52 and X-direction electrode wiring 54 are connected to the first and second electrode layers 26 and 27 of each nanostructure 20 arranged in the matrix form, respectively. An electrode wiring 56 is connected to the electrode 28. The nanostructure is not limited to the magnetic and electrical energy conversion element 20 having the nanostructure according to the second embodiment, and the nanostructures 1 and 30 according to the first embodiment and the third embodiment are used. May be.
[0047] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子は集積ィ匕 することにより、蓄える磁気エネルギーを大きくすることができる。このような集積回路 50を半導体装置力 なる集積回路に内蔵させておけば、停電時の補助電源として 禾 IJ用することがでさる。 [0047] The magnetic and electrical energy mutual conversion elements having the nanostructure of the present invention can be integrated to increase the stored magnetic energy. If such an integrated circuit 50 is incorporated in an integrated circuit that is a semiconductor device, it can be used as an auxiliary power source in the event of a power failure.
[0048] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子は、以下 のようにして製作することができる。 [0048] The magnetic and electrical energy mutual conversion element having the nanostructure of the present invention includes the following: It can be manufactured as follows.
最初に、基板上に、ナノ構造体となる磁性体薄膜を所定の厚さで堆積する。磁性体 材料としては、パーマロイ、鉄、鉄—コバルト合金、鉄—白金合金、サマリウム—コバ ルト合金などが使用できる。堆積方法としては、物理蒸着法であるスパッタ法などを 用いることができる。この基板としては、 MgO基板や、絶縁層で被覆した Si基板に M gOを堆積した基板を用いることができる。 First, a magnetic thin film to be a nanostructure is deposited on a substrate with a predetermined thickness. As the magnetic material, permalloy, iron, iron-cobalt alloy, iron-platinum alloy, samarium-cobalt alloy and the like can be used. As a deposition method, a sputtering method which is a physical vapor deposition method can be used. As this substrate, an MgO substrate or a substrate obtained by depositing MgO on a Si substrate coated with an insulating layer can be used.
次に、マスク工程やエッチング工程により、磁性細線 1や、ナノ構造体 20, 30のパ ターンを形成することで、ナノ構造体を有する磁気及び電気エネルギーの相互変換 素子 1, 20, 30を作製することができる。 Next, the magnetic wire 1 and the nanostructures 20, 30 are formed by the mask process and etching process, thereby producing magnetic and electrical energy mutual conversion elements 1, 20, 30 having the nanostructures. can do.
[0049] 本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子の各電極 間の電圧や電流を制御する周辺回路を集積回路で形成する場合には、上記の工程 で製作したナノ構造体 1, 20, 30を含む基板全体をさらに絶縁膜で被覆し、ナノ構造 体 1, 20, 30の各電極だけに窓開けをした後に、各ナノ構造体を有する磁気及び電 気エネルギーの相互変換素子メモリの配線を行なえばよい。また、本発明のナノ構造 体を有する磁気及び電気エネルギーの相互変換素子 1, 20, 30の周辺回路を Siの MOSトランジスタなどで形成する場合には、最初に Siの周辺回路を形成し、その後 で、本発明のナノ構造体を有する磁気及び電気エネルギーの相互変換素子 1, 20, 30を形成してもよい。各材料の堆積には、スパッタ法以外には、 CVD法、蒸着法、レ 一ザアブレーシヨン法、 MBE法などの通常の薄膜成膜法を用いることができる。また 、所定の形状の電極や集積回路の配線を形成するためのマスク工程には、光露光 や EB露光などを用いることができる。 [0049] When the peripheral circuit for controlling the voltage and current between the electrodes of the magnetic and electrical energy mutual conversion element having the nanostructure of the present invention is formed by an integrated circuit, the nanostructure manufactured by the above process is used. The entire substrate including the bodies 1, 20, and 30 is further covered with an insulating film, and after opening only the electrodes of the nanostructures 1, 20, and 30, the mutual magnetic and electrical energy of each nanostructure is obtained. The wiring of the conversion element memory may be performed. In addition, when the peripheral circuit of the magnetic and electrical energy conversion elements 1, 20, and 30 having the nanostructure of the present invention is formed by a Si MOS transistor, the Si peripheral circuit is formed first, and then Thus, the magnetic and electrical energy mutual conversion elements 1, 20, and 30 having the nanostructure of the present invention may be formed. In addition to sputtering, each material can be deposited using conventional thin film deposition methods such as CVD, vapor deposition, laser ablation, and MBE. In addition, light exposure, EB exposure, or the like can be used for a mask process for forming electrodes of a predetermined shape or wiring of an integrated circuit.
[0050] 本発明はこれら実施例に限定されるものではなぐ特許請求の範囲に記載した発 明の範囲内で種々の変形が可能であり、それらも本発明の範囲内に含まれることは いうまでもない。 [0050] The present invention is not limited to these examples, and various modifications are possible within the scope of the invention described in the claims, and they are also included in the scope of the present invention. Not too long.
産業上の利用可能性 Industrial applicability
[0051] 上記説明から理解されるように、本発明のナノ構造体を有する磁気及び電気エネ ルギ一の相互変換素子によれば、電気エネルギーを磁気エネルギーに変換して蓄 え、蓄えられた磁気エネルギーを電気エネルギーに変換して取り出すことができる。 例えば、蓄えた磁気エネルギーをエネルギー源として、電圧を増幅することができる 。従来の磁気エネルギーの蓄積は、強磁性体を特定の方向に磁ィ匕することによって 行われている力 磁ィ匕及び電気エネルギーの取り出しには大きくかさばるコイルを必 要とする。一方、本発明の素子によれば、細線や積層構造に設けた引き出し電極に 電圧又は電流を印加するだけで良ぐ従って、小型化、集積ィ匕できると共に、ェネル ギー効率が高い。電気エネルギーを磁気エネルギーに変換して蓄え、蓄えられた磁 気エネルギーを電気工ネルギ一に変換することが必要な装置に用いれば、極めて有 用である。 [0051] As understood from the above description, according to the mutual conversion element of magnetic and electric energy having the nanostructure of the present invention, the electric energy is converted into magnetic energy and stored, and the stored magnetic field is stored. Energy can be converted into electrical energy and extracted. For example, the voltage can be amplified using the stored magnetic energy as an energy source. Conventional storage of magnetic energy requires a large and bulky coil to extract the magnetic force and electrical energy that is generated by magnetizing a ferromagnetic material in a specific direction. On the other hand, according to the element of the present invention, it is only necessary to apply a voltage or current to the extraction electrode provided in the thin wire or the laminated structure. Therefore, the device can be miniaturized and integrated, and has high energy efficiency. It is extremely useful if it is used in a device that needs to convert electrical energy into magnetic energy and store it, and then convert the stored magnetic energy into electrical energy.
Claims
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Cited By (11)
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| JP2007258655A (en) * | 2006-03-21 | 2007-10-04 | Korea Univ Foundation | Nanojunction with improved bonding morphology |
| JP2008166787A (en) * | 2006-12-29 | 2008-07-17 | Samsung Electronics Co Ltd | Information storage device using domain wall motion and manufacturing method thereof |
| JP2009099625A (en) * | 2007-10-12 | 2009-05-07 | Nec Corp | Magnetic random access memory and method of initializing the same |
| JP2010141340A (en) * | 2008-12-15 | 2010-06-24 | Samsung Electronics Co Ltd | Magnetic track, information storage device including magnetic track, and method of operating information storage device |
| WO2010101251A1 (en) * | 2009-03-06 | 2010-09-10 | 国立大学法人東京大学 | Magnetic-to-electric energy conversion device, power supply device, and magnetic sensor |
| JP2012209005A (en) * | 2011-03-30 | 2012-10-25 | Hitachi Ltd | Magnetic head and magnetic storage device |
| US8300456B2 (en) | 2006-12-06 | 2012-10-30 | Nec Corporation | Magnetic random access memory and method of manufacturing the same |
| JP5062481B2 (en) * | 2005-08-15 | 2012-10-31 | 日本電気株式会社 | Magnetic memory cell, magnetic random access memory, and data read / write method to magnetic random access memory |
| WO2011156028A3 (en) * | 2010-03-09 | 2014-03-20 | Board Of Regents Of The University Of Texas System | Porous and non-porous nanostructures |
| US8693238B2 (en) | 2006-08-07 | 2014-04-08 | Nec Corporation | MRAM having variable word line drive potential |
| JP5626741B1 (en) * | 2013-11-14 | 2014-11-19 | 株式会社日立製作所 | Magnetic memory |
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| JP2022144064A (en) | 2021-03-18 | 2022-10-03 | キオクシア株式会社 | magnetic memory |
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| WO2005069368A1 (en) * | 2004-01-15 | 2005-07-28 | Japan Science And Technology Agency | Current injection magnetic domain wall moving element |
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| JP3655229B2 (en) * | 2001-09-26 | 2005-06-02 | 株式会社東芝 | Magnetoresistive effect element and manufacturing method thereof, magnetic detection element, and magnetic recording / reproducing element |
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| JP2005191032A (en) * | 2003-12-24 | 2005-07-14 | Toshiba Corp | Magnetic storage device and magnetic information writing method |
| WO2005069368A1 (en) * | 2004-01-15 | 2005-07-28 | Japan Science And Technology Agency | Current injection magnetic domain wall moving element |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5062481B2 (en) * | 2005-08-15 | 2012-10-31 | 日本電気株式会社 | Magnetic memory cell, magnetic random access memory, and data read / write method to magnetic random access memory |
| JP2007258655A (en) * | 2006-03-21 | 2007-10-04 | Korea Univ Foundation | Nanojunction with improved bonding morphology |
| US8693238B2 (en) | 2006-08-07 | 2014-04-08 | Nec Corporation | MRAM having variable word line drive potential |
| US8300456B2 (en) | 2006-12-06 | 2012-10-30 | Nec Corporation | Magnetic random access memory and method of manufacturing the same |
| JP2008166787A (en) * | 2006-12-29 | 2008-07-17 | Samsung Electronics Co Ltd | Information storage device using domain wall motion and manufacturing method thereof |
| JP2009099625A (en) * | 2007-10-12 | 2009-05-07 | Nec Corp | Magnetic random access memory and method of initializing the same |
| JP2010141340A (en) * | 2008-12-15 | 2010-06-24 | Samsung Electronics Co Ltd | Magnetic track, information storage device including magnetic track, and method of operating information storage device |
| WO2010101251A1 (en) * | 2009-03-06 | 2010-09-10 | 国立大学法人東京大学 | Magnetic-to-electric energy conversion device, power supply device, and magnetic sensor |
| WO2011156028A3 (en) * | 2010-03-09 | 2014-03-20 | Board Of Regents Of The University Of Texas System | Porous and non-porous nanostructures |
| JP2012209005A (en) * | 2011-03-30 | 2012-10-25 | Hitachi Ltd | Magnetic head and magnetic storage device |
| JP5626741B1 (en) * | 2013-11-14 | 2014-11-19 | 株式会社日立製作所 | Magnetic memory |
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| JP2011216899A (en) | 2011-10-27 |
| JP4817148B2 (en) | 2011-11-16 |
| JP5071908B2 (en) | 2012-11-14 |
| WO2007015475A8 (en) | 2007-03-22 |
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