[go: up one dir, main page]

WO2006092949A1 - Élément optique avec un film supprimant les dégâts occasionnés par le laser - Google Patents

Élément optique avec un film supprimant les dégâts occasionnés par le laser Download PDF

Info

Publication number
WO2006092949A1
WO2006092949A1 PCT/JP2006/302437 JP2006302437W WO2006092949A1 WO 2006092949 A1 WO2006092949 A1 WO 2006092949A1 JP 2006302437 W JP2006302437 W JP 2006302437W WO 2006092949 A1 WO2006092949 A1 WO 2006092949A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
film
substrate
layer
blue laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2006/302437
Other languages
English (en)
Japanese (ja)
Inventor
Yasuaki Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nalux Co Ltd
Original Assignee
Nalux Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nalux Co Ltd filed Critical Nalux Co Ltd
Publication of WO2006092949A1 publication Critical patent/WO2006092949A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers

Definitions

  • the present invention relates to an optical element having a damage suppression film on a substrate made of a blue laser compatible plastic material.
  • the present invention relates to an optical element having a laser damage suppression film used for a blue laser with a short wavelength and a pi power (30 mWZmm 2 or more).
  • plastic materials that can handle a relatively low-power blue laser have the power of each material manufacturer. There is no plastic material that can withstand a high-power blue laser.
  • an antireflection film is often formed on the surface of a plastic lens used in a video camera, a still camera, glasses, or the like.
  • Such an antireflection film is formed of a multilayer film in which low refractive index layers and high refractive index layers are alternately laminated.
  • Such multilayer films are disclosed in JP-A-11-30703, JP-A-11-171596, JP-A-11 326634, JP-A-2002-71903, JP-A-2003-98308 and JP-A-2003-.
  • An optical element according to the present invention is an antireflection optical element comprising a multilayer film in which a layer made of a low refractive material and a layer having a high refractive material force are alternately laminated on a plastic substrate.
  • the oxygen transmission coefficient is reduced so that the laser transmittance change after continuous irradiation with a blue laser with an energy density of 120 mWZmm 2 at an ambient temperature of 25 ° C is 2% or less.
  • the optical element according to the present invention has a small oxygen transmission coefficient, it is not easily damaged by blue laser irradiation.
  • FIG. 1 is a diagram showing a configuration of an optical element provided with a laser damage suppressing film according to one embodiment of the present invention.
  • FIG. 2 is a diagram showing the result of measuring the light intensity change rate of an optical element after irradiating the optical element with a blue laser for 1000 hours.
  • FIG. 3 is a diagram showing the result of measuring the total wavefront aberration (RMS) of the optical element before and after irradiating the optical element with a blue laser for 1000 hours.
  • RMS total wavefront aberration
  • FIG. 4 is a diagram showing a configuration of an ion plating apparatus for performing an ion plating method.
  • FIG. 5 is a diagram showing the amount of change in light transmittance of an optical element in which a conventional film is formed on a conventional substrate and an optical element in which improvement films 1 and 2 are formed on a conventional substrate.
  • FIG. 6 is a diagram showing oxygen transmission coefficients of an optical element in which a conventional film is formed on a conventional substrate and an optical element in which improvement films 1 and 2 are formed on a conventional substrate.
  • FIG. 7 A diagram showing the change in the amount of chemiluminescence after irradiation with a blue laser on an optical element in which a conventional film is formed on a conventional substrate and an optical element in which an improvement film 1 is formed on a conventional substrate, and then stopped. is there.
  • FIG. 8 is an enlarged view of a part of the time axis in FIG.
  • FIG. 9 is a view showing a change in light transmittance between a conventional substrate and a nitrogen molded substrate.
  • FIG. 11 is a diagram showing a change in light transmittance between an optical element in which the improvement film 1 is formed on a conventional substrate and an optical element in which the improvement film 1 is formed on a nitrogen-molded substrate.
  • FIG. 1 is a diagram showing a configuration of an optical element provided with a laser damage suppressing film according to one embodiment of the present invention.
  • a layer 103 made of monoacidic silicon (SiO) is formed on a substrate 101 that also has a plastic material strength for blue laser.
  • the layer 103 made of silicon monoxide fulfills a function of improving the adhesion between the substrate 101 having plastic material strength and the layer formed thereon.
  • layers 105 made of a low refractive material and layers 107 made of a high refractive material cover are alternately laminated. In this embodiment, three layers 105 made of a low refractive material cover and three layers 107 made of a high refractive material cover are formed.
  • the blue laser compatible plastic material is an olefin-based material. More specifically, it is a thermoplastic transparent olefin cycloolefin polymer having a function of preventing acidification.
  • the layer 103 made of silicon monoxide is formed on the substrate 101 by a vacuum deposition method.
  • a material to be formed into a thin film in this case, silicon monoxide
  • the evaporated material is deposited (deposited) on the substrate to form a thin film.
  • the thickness of the layer 103 made of silicon monoxide is about several hundred nanometers.
  • the low refractive index material is silicon dioxide (SiO 2) in the present embodiment. From silicon dioxide
  • the refractive index of the layer 105 is 1.4-1.5.
  • the layer 105 which is also composed of diacid oxide, is formed by vacuum evaporation.
  • the thickness of the layer 105, which is also a diacid key, is several tens to several hundreds of nanometers.
  • the high refractive index material is made of tantalum pentoxide (Ta 2 O 3) and titanium dioxide (TiO 2).
  • the refractive index of the layer 107 which mainly consists of tantalum pentoxide, is 2.0-2.3.
  • the layer 107 mainly composed of tantalum pentoxide force is formed by an ion plating method.
  • the ion plating method uses gas plasma to ionize a part of evaporated particles and deposit it on a substrate biased at a negative high voltage. Since the vapor deposition material is accelerated by the electric field and adheres to the substrate, a film having a strong adhesion can be obtained.
  • the thickness of the layer 107 made of aluminum is several tens of nanometers to several hundreds of nanometers.
  • the material of the layer 107 a material in which the values of x and y of TaO are appropriately determined can be used.
  • an acid titanium-based material can also be used.
  • the multilayer film may have an antireflection function in addition to the laser damage suppressing function.
  • FIG. 4 is a diagram showing a configuration of an ion plating apparatus for performing the ion plating method.
  • An ion plating apparatus is disclosed in, for example, Japanese Patent Publication No. 1-48347.
  • a capacitor 406 is formed by a base material holder 407, which is a conductive member supporting the base material 408, and a support member, which is a conductive member supporting the base material holder via an insulating member. Is configured.
  • a high-frequency power source 401 is connected between the vacuum chamber 412 and the base material holder 407 via a blocking capacitor 403 and a matching box 402 to supply a high-frequency voltage.
  • a DC power supply 404 is connected between the vacuum chamber 412 and the substrate holder 407 via a choke coil 405 so that the substrate holder 407 side becomes a cathode, and a DC noise voltage is supplied.
  • the output of the high frequency power supply 401 is 500 W, and the voltage of the DC power supply 404 is 10 OV.
  • the output of the high frequency power supply 401 is preferably a power S of 300-900W. By adjusting the output value within this range, the denseness of the film can be increased.
  • Capacitor 406 force By operating together with a matching box 402 connected to a high-frequency power source 401 that supplies a high-frequency voltage into the chamber 412 to perform matching, the evaporation material 409 on the resistance heating board 410 and the base A stable electric field can be formed and maintained with the material 408. As a result, a high-purity 'high density' and high adhesion thin film can be formed on the surface of the substrate 408. [0022] At the bottom of the crucible including the resistance heating board 410, there is an electron gun 4 for electron beam heating.
  • the outline of the film forming method is shown in the following table.
  • No plasma generation refers to the case where the high frequency power supply 401 and the DC power supply 404 are not used. In this case, the film is formed by a vacuum deposition method.
  • RH resistance heating
  • EB electron beam heating
  • oxygen is introduced into the vacuum chamber 412 by a valve (not shown).
  • the oxygen introduction pressure setting is a setting of the oxygen pressure of the chamber.
  • Oxygen partial pressure is 3.0 X 10
  • A it is preferably in the range of ⁇ 5.0 X 10- 2 Pa.
  • the light intensity change rate of the optical element described later can be set to an appropriate value.
  • the gas in the vacuum chamber 412 is exhausted from the exhaust port 411.
  • Ion plating method Ion plating method Vacuum deposition method
  • Comparative Example 3 an optical element including a blue laser compatible plasticizer having no surface coated was also prepared.
  • FIG. 2 is a diagram showing the results of measuring the light intensity change rate of the optical element after irradiating the optical element with a blue laser for 1000 hours at an ambient temperature of 25 ° C. Energy density of the blue laser radiation is about 120mWZmm 2.
  • the light intensity change rate of the optical element can be expressed by the following equation.
  • Light intensity change rate ((transmission after irradiation Z transmission before irradiation) 1) ⁇ 100%
  • the rate of change in light intensity is
  • FIG. 2B shows the measurement result of the light intensity change rate of the optical element of the present embodiment.
  • a in FIG. 2 shows the measurement result of the light intensity change rate of Comparative Example 1.
  • C in FIG. 2 shows the measurement result of the light intensity change rate of Comparative Example 2.
  • D of FIG. 2 shows the measurement result of the light intensity change rate of the optical element of Comparative Example 3.
  • the optical element of Comparative Example 3 was irradiated with a blue laser in a nitrogen atmosphere.
  • FIG. 3 is a diagram showing the results of measuring the total wavefront aberration (RMS) of the optical element before and after irradiating the optical element with a blue laser for 1000 hours at an ambient temperature of 25 ° C.
  • the energy density of the blue laser radiation is about 120mWZmm 2.
  • the total wavefront aberration is a deviation of the wavefront from the reference spherical surface expressed as a standard deviation.
  • the reference spherical surface refers to a spherical surface that takes the principal ray as the center and intersects the optical axis at the center of the entrance and exit pupils.
  • the total wavefront aberration is measured by generating an interference fringe with an interferometer. Map force of fringes Calculates wavefront aberration.
  • ⁇ 1 and ⁇ 2 show the measurement results of the total wavefront aberration of the optical element of the present embodiment.
  • ⁇ 1 and ⁇ 2 in Fig. 3 show the measurement results of total wavefront aberration in Comparative Example 1.
  • C1′C2 in FIG. 3 shows the measurement result of the total wavefront aberration of Comparative Example 2.
  • D1 'D2 in Fig. 3 shows the measurement result of the total wavefront aberration of the optical element of Comparative Example 3.
  • the optical element of Comparative Example 3 was irradiated with a blue laser in a nitrogen atmosphere.
  • Al, Bl, Cl, and D1 show the measurement results of total wavefront aberration before blue laser irradiation
  • A2, B2, C2, and D2 show the measurement results of total wavefront aberration after blue laser irradiation.
  • the light intensity change rate is about 10% in Comparative Example 1 (A in FIG. 2), about 20% in Comparative Example 2 (C in FIG. 2), and about 20% in Comparative Example 3 (D in FIG. 2). Decrease by about 5%.
  • the light intensity change is large in the case of Comparative Example 2 (C in Fig. 2) without using the ion plating method to form the high refractive index material layer! That is, the light transmission intensity of the optical element is greatly reduced.
  • the reason why the light transmission intensity of the optical element decreases is that, when a high-power blue laser is irradiated for a long time, the chemical bond of the polymer plastic is broken (damaged) and the bonding state changes. it is conceivable that. If ion plating is used to form the high refractive index material layer, the above damage can be suppressed.
  • the total wavefront aberration after irradiation with the high-power blue laser is about 2.5 times in the case of Comparative Example 1 ( ⁇ 1 and ⁇ 2 in Fig. 3) using PMMA plastic for the substrate.
  • Comparative Examples 2 and 3 the total wavefront aberration after irradiating the same blue laser is almost unchanged. Because of this, optical elements using blue laser plastic In this case, it is considered that the shape of the surface of the optical element hardly changes. On the other hand, in the case of an optical element using PMMA plastic, the shape of the optical element surface changes, so the total wavefront aberration is thought to increase.
  • the film is formed by the ion plating method! /, And the plasma state is generated by the 1S plasma CVD method, the ion beam assisted vapor deposition method, the sputtering method, or the like. Do film formation.
  • the present invention is characterized in that a film is formed on a blue laser plastic material substrate by a method of generating plasma such as an ion plating method.
  • a catalytic action that creates a function having an oxidative decomposition ability from moisture and oxygen uses a substrate that is a thermoplastic transparent olefin cycloolefin polymer having an antioxidant function, and is based on an ion plating method. It is thought to be suppressed by improving the film density by forming a film (forming an oxygen-impermeable film). Therefore, it can be estimated that substrate damage due to blue laser light is suppressed. The grounds for this estimation are also expected from the measurement results of the rate of change of light intensity when laser irradiation experiments are performed in a nitrogen atmosphere (D in Fig. 2). In addition, it is considered that the use of an acid-italic tantalum material further improves the film density in the film formation by the ion plating method.
  • a multilayer film formed by the following film forming method will be described.
  • a multilayer film formed by this film forming method is referred to as an improvement film 1.
  • the film forming method shown in Table 3 is different from the film forming method shown in Table 1 in that a low refractive material layer made of diacidic silicon is formed while generating a plasma state in an argon atmosphere.
  • a low refractive material layer is formed while generating a plasma state in an argon atmosphere, the substrate is exposed to a high temperature environment (e.g. 85 ° C) or a high temperature and high humidity environment (e.g. 60 ° C 90%) for a long time. In any case, this is more advantageous than an oxygen plasma atmosphere in which there is almost no change in transmittance.
  • a multilayer film formed by the following film forming method will be described.
  • a multilayer film formed by this film forming method is referred to as an improvement film 2.
  • the improvement film 2 does not include an adhesion layer made of oxy-enzyme, and has a layer made of tantalum oxide-based material as the first layer on the substrate.
  • the total film thickness of improvement film 1 is 547.5 nm.
  • the total film thickness of good film 2 is 182. Onm.
  • a diffractive optical element having a fine structure formed on the surface if the film thickness is thick, the influence on the shape of the fine structure increases.
  • the improvement film 2 has a small film thickness and thus has little influence on the shape of the microstructure.
  • a multilayer film having a structure similar to that of the improvement film 1 formed by a vacuum deposition method that does not generate plasma is referred to as a conventional film.
  • a substrate made of a thermoplastic transparent olefin cycloolefin polymer, which is not a nitrogen-molded substrate described later, is referred to as a conventional substrate.
  • FIG. 5 is a diagram showing the light transmittance change amount of the optical element in which the conventional film is formed on the conventional substrate and the optical element in which the improvement films 1 and 2 are formed on the conventional substrate.
  • the optical transmittance change amount of the optical element formed with the improvement films 1 and 2 is greatly improved compared to the optical transmittance change amount of the optical element formed with the conventional film.
  • FIG. 6 is a diagram showing oxygen transmission coefficients of an optical element in which a conventional film is formed on a conventional substrate and an optical element in which improvement films 1 and 2 are formed on a conventional substrate.
  • the gas permeability coefficient can be expressed by the following equation.
  • Gas permeation coefficient Gas permeation (standard volume) X thickness
  • the unit of the oxygen transmission coefficient is cm 3 'mmZ (m 2 '24hr'atm).
  • the oxygen transmission coefficient of the optical element in which the improved films 1 and 2 are formed on the conventional substrate is lower than the oxygen transmission coefficient of the optical element in which the conventional film is formed on the conventional substrate.
  • An optical element in which the improvement films 1 and 2 are formed on the substrate is difficult to transmit oxygen.
  • FIG. 7 shows the change in the amount of chemiluminescence after the blue laser was irradiated to the optical element in which the conventional film was formed on the conventional substrate and the optical element in which the improvement film 1 was formed on the conventional substrate.
  • FIG. 8 is an enlarged view of a part of the time axis of FIG.
  • the amount of chemiluminescence shows the relative magnitude. For up to 20 seconds after the irradiation is stopped, the chemiluminescence amount of the optical element in which the conventional film is formed on the conventional substrate is larger than the chemiluminescence amount of the optical element in which the improvement film 1 is formed on the conventional substrate.
  • Chemiluminescence is believed to be caused by oxygen-mediated reactions.
  • the optical element with the improved film 1 formed on the conventional substrate has a smaller oxygen transmission coefficient than the optical element with the conventional film formed on the conventional substrate, and is less likely to transmit oxygen. It is thought that the chemical reaction is suppressed.
  • FIG. 9 is a diagram showing the amount of fluorescence emission between a conventional substrate and a nitrogen-molded substrate at a wavelength of about 320 nm when excited at a wavelength of 280 nm.
  • the nitrogen-molded substrate is a substrate obtained by drying a thermoplastic transparent olefin cycloolefin polymer in nitrogen, transporting it in a nitrogen atmosphere, and molding it in the nitrogen atmosphere.
  • the amount of fluorescent light emission is an arbitrary unit and indicates a relative size. Since the fluorescence emission is considered to be oxygen-mediated, the reason why the amount of fluorescence emission of the nitrogen-molded substrate is small is considered to be because the amount of oxygen absorbed is smaller than that of the conventional substrate.
  • FIG. 10 is a diagram showing the amount of change in light transmittance between the conventional substrate and the nitrogen molded substrate.
  • the amount of change in light transmittance of the nitrogen-shaped substrate is significantly smaller than the amount of change in light transmittance of the conventional substrate.
  • the nitrogen molded substrate is less susceptible to damage from the blue laser irradiation than the conventional substrate.
  • FIG. 11 is a diagram showing a change in light transmittance between an optical element in which the improvement film 1 is formed on a conventional substrate and an optical element in which the improvement film 1 is formed on a nitrogen-molded substrate.
  • the amount of change in light transmittance can be kept very small by combining a low-oxygen absorption substrate with a nitrogen-molded substrate and an improved film 1 that hardly transmits oxygen.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L’invention concerne un élément optique comportant un film supprimant les dégâts occasionnés par le laser capable de résister à un laser bleu haute puissance et formé sur un substrat de plastique. Elle concerne spécifiquement un élément optique antireflet comprenant un film multicouche, qui est composé de couches de matériau de faible indice de réfraction (105) et de couches de matériau de fort indice de réfraction (107) disposées en alternance, formé sur un substrat de plastique. Dans cet élément optique antireflet, le coefficient de perméabilité d’oxygène est réduit pour que la variation de perméabilité laser soit inférieure ou égale à 2% après une irradiation continue avec un laser bleu ayant une densité d’énergie de 120 mW/mm2 pendant 1000 heures à une température ambiante de 25°C. Selon un mode de réalisation, le coefficient de perméabilité d’oxygène est inférieur ou égal à 30 cm3·mm/(m2·24hr·atm).
PCT/JP2006/302437 2005-02-28 2006-02-13 Élément optique avec un film supprimant les dégâts occasionnés par le laser Ceased WO2006092949A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005054023A JP2008032757A (ja) 2005-02-28 2005-02-28 レーザ損傷抑制膜を有する光学素子
JP2005-054023 2005-02-28

Publications (1)

Publication Number Publication Date
WO2006092949A1 true WO2006092949A1 (fr) 2006-09-08

Family

ID=36940986

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/302437 Ceased WO2006092949A1 (fr) 2005-02-28 2006-02-13 Élément optique avec un film supprimant les dégâts occasionnés par le laser

Country Status (2)

Country Link
JP (1) JP2008032757A (fr)
WO (1) WO2006092949A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103882378A (zh) * 2014-02-13 2014-06-25 同济大学 一种三硼酸氧钙钇晶体(ycob)高激光损伤阈值增透膜的制备方法
CN108758549A (zh) * 2018-08-30 2018-11-06 华域视觉科技(上海)有限公司 交通工具激光灯具防护装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010248580A (ja) * 2009-04-16 2010-11-04 Nidek Co Ltd 機能性膜付基板の製造方法
CN108717212B (zh) * 2018-04-04 2019-06-25 福建农林大学 一种滤蓝光增透膜及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000006181A (ja) * 1998-06-22 2000-01-11 Teijin Ltd 水添α−オレフィン−ジシクロペンタジエン系共重合体の成形方法およびそれから得られる成形物
JP2002055207A (ja) * 2000-05-29 2002-02-20 Konica Corp 光学部品および光学装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000006181A (ja) * 1998-06-22 2000-01-11 Teijin Ltd 水添α−オレフィン−ジシクロペンタジエン系共重合体の成形方法およびそれから得られる成形物
JP2002055207A (ja) * 2000-05-29 2002-02-20 Konica Corp 光学部品および光学装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103882378A (zh) * 2014-02-13 2014-06-25 同济大学 一种三硼酸氧钙钇晶体(ycob)高激光损伤阈值增透膜的制备方法
CN108758549A (zh) * 2018-08-30 2018-11-06 华域视觉科技(上海)有限公司 交通工具激光灯具防护装置

Also Published As

Publication number Publication date
JP2008032757A (ja) 2008-02-14

Similar Documents

Publication Publication Date Title
JP4178190B2 (ja) 多層膜を有する光学素子およびその製造方法
CN103764387B (zh) 气体阻隔性膜
JP5141213B2 (ja) 光学デバイス、波長可変フィルタモジュール、および光スペクトラムアナライザ
EP1882678A1 (fr) Film antireflets, procédé pour chauffer un film métallique et appareil de chauffage
JP2017177343A (ja) 積層フィルムおよびその製造方法
TW202522039A (zh) 光學濾波器及感測器系統
JP2004157497A (ja) 光学用反射防止膜及びその成膜方法
JP4434949B2 (ja) 薄い、安定した、フッ素ドープ処理シリカ層を得る方法、得られた薄い層、およびこれらの眼科光学における応用
JP2000121804A (ja) 反射防止フィルム
WO2006092949A1 (fr) Élément optique avec un film supprimant les dégâts occasionnés par le laser
TWI732028B (zh) 積層體
US7852562B2 (en) Optical element with laser damage suppression film
JP2007327619A (ja) 真空断熱材用積層体及び真空断熱材
CN100492056C (zh) 光学物品及其制造方法
WO2008023440A1 (fr) Élément optique doté d'un film de protection contre un laser, et son procédé de fabrication
JP2009179866A (ja) 紫外波長域用反射防止膜の製造方法
WO2025013860A1 (fr) Film antireflet
JP2004053720A (ja) 赤外線透過フィルターの製造方法
JP2011127199A (ja) 透明体およびその製造方法
WO2025013859A1 (fr) Film de revêtement dur et film stratifié
WO2025013857A1 (fr) Film stratifié
JP2013044978A (ja) レーザ光用光ファイバ構造体及びその製造方法
JP2025170094A (ja) 積層フィルム
JP6756197B2 (ja) 誘電体膜の成膜方法
WO2025013858A1 (fr) Film de revêtement dur, film multicouche et procédé de production de film multicouche

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 11885154

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Ref document number: JP

122 Ep: pct application non-entry in european phase

Ref document number: 06713579

Country of ref document: EP

Kind code of ref document: A1

WWW Wipo information: withdrawn in national office

Ref document number: 6713579

Country of ref document: EP