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WO2006090529A1 - Resin remover - Google Patents

Resin remover Download PDF

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Publication number
WO2006090529A1
WO2006090529A1 PCT/JP2006/300118 JP2006300118W WO2006090529A1 WO 2006090529 A1 WO2006090529 A1 WO 2006090529A1 JP 2006300118 W JP2006300118 W JP 2006300118W WO 2006090529 A1 WO2006090529 A1 WO 2006090529A1
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WO
WIPO (PCT)
Prior art keywords
mass
acetate
group
compound
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2006/300118
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French (fr)
Japanese (ja)
Inventor
Takashi Tokuhashi
Syuji Iwakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Priority to KR1020077011960A priority Critical patent/KR101251396B1/en
Priority to CN2006800013132A priority patent/CN101068915B/en
Publication of WO2006090529A1 publication Critical patent/WO2006090529A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00Chemical paint or ink removers
    • C09D9/005Chemical paint or ink removers containing organic solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/37Polymers
    • C11D3/3703Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3707Polyethers, e.g. polyalkyleneoxides

Definitions

  • the present invention relates to a remover containing a specific epoxy compound and used for removing or washing a solid surface strength resin or a resin composition.
  • Patent Document 1 reports a cleaning agent containing ⁇ -petit-mouth rataton
  • Patent Document 2 discloses a mixture of a ketone solvent and a soot or an ester solvent and an ether solvent.
  • a cleaning agent comprising a nitrogen-containing compound is reported in Patent Document 3.
  • Negative or positive resists are used for patterns such as printed circuit boards, electronic circuit wiring such as ICs, display element color filters, and CCD color filters.
  • Alcohol-based, ether-based, and ester-based solvents are used as organic-based removers (developers, stripping solutions) for removing the cured or uncured resist composition used in these.
  • the organic solvent-based cleaning agent or removing agent has a problem in that the residual liquid is volatilized and the resin residue adheres to the solid surface.
  • a cleaning agent or a removing agent using an alkaline compound such as a nitrogen-containing compound is a solid after the removal of the resin, because the decomposition product of the resin or the alkaline compound remains on the solid surface from which the resin has been removed. The use of the surface may have an adverse effect.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 8-117707
  • Patent Document 2 JP-A-8-165496
  • Patent Document 3 Japanese Patent Laid-Open No. 2001-518552
  • an object of the present invention is to provide a remover for removing or washing a rosin or rosin composition from a solid surface, and after removing the rosin or rosin composition having a large removal effect.
  • An object of the present invention is to provide a remover that does not affect the use of the body surface.
  • the present invention has been made on the basis of the above findings, and is a remover for removing or washing the rosin or the rosin composition from the solid surface, and 100 parts by mass of one or more kinds of organic solvents.
  • An epoxy compound represented by the following general formula (I) 1 to: provides a remover containing LOO parts by mass.
  • R represents a hydrocarbon group having 1 to 18 carbon atoms
  • R i ⁇ R 8 each independently represents a hydrogen atom
  • p represents 0 or 1
  • m and n each independently represents 0, 1 or 2;
  • the hydrocarbon group having 1 to 18 carbon atoms represented by R when p is 0, includes a benzene ring, a cycloalkane ring, a cycloalkene ring, etc. in the chain.
  • Alkyl group which may have a hydrocarbon ring, alkenyl which may have a hydrocarbon ring such as a benzene ring, a cycloalkane ring and a cycloalkene ring in a chain which may be linear or branched
  • a hydrocarbon group such as a benzene ring, a cycloalkane ring, a cycloalkene ring or the like, a alkynyl group, a cycloalkyl group, and an aryl group.
  • an alkyl group and an aryl group are preferable in that the epoxy compound is inexpensive and chemically stable.
  • hydrocarbon group having 1 to 18 carbon atoms represented by R when p is 1, a benzene ring, a cycloalkane ring, a cycloalkene in a chain that may be linear or branched.
  • An alkanedyl group which may have a hydrocarbon ring such as a ring, or a hydrocarbon ring such as a benzene ring, a cycloalkane ring or a cycloalkene ring in a chain which may be linear or branched Alkenes that may be Diyl group, hydrocarbon chain such as benzene ring, cycloalkane ring, cycloalkene ring, etc.
  • an alkanedyl group and an arylene group are preferable in that the epoxy compound is inexpensive and chemically stable.
  • R is preferred when p is 0! /,
  • the above alkyl group is methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, isobutyl, amyl, isoamyl, Tertiary amyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, tertiary heptyl, n-octyl, iso-octyl , Tert-octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, am
  • the aryl group which is a preferred group for R when p is 0, includes phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 3-isopropyl.
  • the above alkanediyl group which is a preferred group as R when p is 1, can also introduce a diol compound force.
  • the dioly compound include ethylene glycol, 1,2 propanediol, 1,3 propanediol, 2-methyl-1,3 propanediol, 2 butyl-2-ethyl-1,3 propanediol, 1,4 butanediol, Neopentyl glycol, 3-methyl-2,4 pentanediol, 2,4 pentanediol, 1,5 pentanediol, 3-methyl-1,5 pentanediol, 2-methi Lu 2, 4-pentanediol, 2, 4-jetyl 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 3,5-heptanediol, 1,8-otatandiol, 2 — Aliphatic diol compounds such as
  • the arylene group which is a preferred group as R when p is 1, can also introduce dihydroxy aromatic compound power.
  • dihydroxy aromatic compound examples include resorcin, catechol, hydroquinone, 3-methyl resorcin, 3-ethyl resorcin, 3-propyl resorcin, 3-butyl resorcin, 3-tert-butyl resorcin, 3-phenyl resorcin, 3-cumyl resorcin, 3-methyl hydroquinone, 3-ethyl hydroquinone, 3-propyl hydroquinone, 3-butyl hydroquinone, 3-tert-butyl hydroquinone, 3-phenyl hydroquinone, 3-tamyl hydroquinone, 4, 4 ' Dihydroxyaryl compounds such as dihydroxydiphenyl; bis (1, 1-bis (4-hydroxyphenyl) cyclopentane, 1,1-bis (4-hydroxyphenyl
  • Hydroxyaryl) cycloalkanes bis (4-hydroxyphenol) methane, 1 , 1-bis (4-hydroxyphenol) ethane, 1,2-bis (4-hydroxyphenoxy) ethane, 1,3-bis (4-hydroxyphenol) propane, 2, 2-bis (4 —Hydroxyphenyl) propane, 2,2-bis (4-hydroxy-3,5-dimethylphenol) propan, 1,1-bis (4-hydroxyphenyl) butane, 1,1-bis ( Bis (hydroxyaryl) such as 4-hydroxyphenyl) butane, 2,2-bis (4-hydroxyphenyl) butane, 2,4-bis (4-hydroxyphenol 2-methyl) butane Examples include alkanes.
  • m and n are each independently 0, 1 or 2.
  • the content of the epoxy compound represented by the general formula (I) in the removing agent of the present invention is 1 to L00 parts by mass with respect to 100 parts by mass of the organic solvent. Less than 1 part by mass is sufficient The use effect cannot be obtained, and even if the amount exceeds 100 parts by mass, the use effect is not further improved.
  • the content of the epoxy compound represented by the general formula (I) is preferably 10 to 85 parts by mass, more preferably 20 to 75 parts by mass.
  • the organic solvent used in the removing agent of the present invention is not particularly limited, and a known general organic solvent can be used.
  • the organic solvent include alcohol solvents, polyol solvents, ketone solvents, ester solvents, ether solvents, polyether solvents, aliphatic hydrocarbon solvents, aromatic hydrocarbon solvents, chlorine.
  • examples thereof include hydrocarbon solvents having a cyano group, pyrrolidone solvents, and the like, and these can be used alone or in combination of two or more.
  • the epoxy compound represented by the general formula (I) can be stably dissolved, is inexpensive, and has a large removal effect on the resin or resin composition. It is preferable to use a ketone solvent and a Z or C 2-18 ester solvent.
  • the ketone solvent in an organic solvent at 50 to: LO 0% by mass, particularly 50 to 90% by mass.
  • the ester solvent is preferably 10 to in an organic solvent: LOO% by mass, particularly 10 to 50%. It is preferable to use mass%.
  • a C3-C18 ketone solvent which is an organic solvent, such as acetone, ethyl methyl ketone, methyl propyl ketone, methyl isopropyl ketone, butyl methyl ketone, Isobutyl methyl ketone, sec-butyl methyl ketone, tributyl methyl ketone, jetyl ketone, 2-heptanone, 3-heptanone, dibutyl ketone, diisoptyl ketone, di-tert-butyl ketone, cyclopentanone, cyclohexanone, 4-methylhexanone and the like can be mentioned. These may be used alone or in combination of two or more.
  • a preferable organic solvent used in the removing agent of the present invention having 2 to 18 carbon atoms, methyl formate, ethyl formate, methyl acetate, ethyl acetate, isopropyl acetate, acetic acid acetate, Butyl, isobutyl acetate, 2 butyl acetate, 3 butyl acetate, amyl acetate, isoamyl acetate, 3 amyl acetate, phenyl acetate, methyl propionate, ethyl propionate, isopropyl propionate, butyl propionate, isobutyl propionate, propionate 2 butyl acid, 3 butyl propionate, amyl propionate, propion Isoamyl acid, tertiary amyl propionate, propionate phenol, methyl lactate, ethyl lactate, methyl methoxypropionate, methyl
  • additives may be used as necessary for the removing agent of the present invention.
  • the additive include alkaline compounds such as inorganic alkali compounds, organic amines, ammonia and quaternary ammonium salts; acidic compounds such as organic acids; viscosity modifiers; leveling agents; Agents; anti-gelling agents; dispersion stabilizers; antistatic agents; surfactants such as ionic surfactants and nonionic surfactants; water and the like.
  • the amount of these additives to be used is appropriately selected according to the type of additive to be used, etc., but the total amount of all additives is usually 20 parts per 100 parts by mass of the organic solvent. It selects from the range used as the mass part or less.
  • Apps of the remover of the present invention include cleaning of a resin composition for sealants used for ICs, printed wiring boards, etc., and a resin composition adhering to plastic processing equipment such as molds and processing machines. Cleaning of products, cleaning of mixing or manufacturing apparatus for mixing or manufacturing a resin or a resin composition, a developing solution of photoresist, a stripping solution of photoresist, cleaning of a photoresist apparatus, and the like.
  • a 30 mm ⁇ 50 mm ⁇ lmm SUS304 plate was dip coated with the black resin composition produced by the following production method to prepare a test piece.
  • the test piece was immersed in a remover sample (see Tables 1 to 3) for 60 seconds. At this time, while the test piece was immersed, the remover sample was stirred with a magnetic stirrer. After pulling up the test piece, the surface condition was observed. Also, stick to the surface of the specimen! / Transfer the black fat composition to cellophane tape, measure the OD value of the cellophane tape before and after transfer with a Macbeth densitometer (Macbeth RD-933 type), and calculate the increase (A OD) did. The results are shown in Tables 1-3.
  • tetrahydroanhydranoic anhydride 6. Calored Og at 120 ° C. for 4 hours. 3 hours at 100 ° C [3 ⁇ 4, stirred at 80 ° C for 4 hours, 60 ° C for 6 hours, and 40 ° C for 11 hours, and then added 29 g of propylene glycol-1-monomethyl ether-2-acetate To 12g of this composition, Trimethylolpropane tri Atari rate 8 g, benzophenone 1. 8 g, carbon black (Mitsubishii ⁇ “MA100” manufactured by Gakusha Co., Ltd. (3.2 g) and ethyl acetate mouthsolve (75 g) were added and stirred well to obtain a black moon cake composition.
  • the organic solvent contains a specific epoxy compound.
  • the removing agent of the present invention When the removing agent of the present invention is used, the solid surface is uniformly washed, and there are few resin compositions remaining on the solid surface (Examples 1 to 8).
  • the solid surface is not evenly washed and becomes patchy, and there are many rosin compositions remaining on the solid surface (Comparative Example 1). .

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Materials Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Paints Or Removers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Disclosed is a remover for removing or cleaning a resin or resin composition from a solid surface. The remover contains 1-100 parts by mass of an epoxy compound represented by the general formula (I) below per 100 parts by mass of one or more organic solvents. (In the formula, R represents a hydrocarbon group having 1-18 carbon atoms; R1-R8 independently represent a hydrogen atom or a methyl group; p represents 0 or 1; and m and n independently represent 0, 1 or 2.)

Description

明 細 書  Specification

樹脂用除去剤  Resin remover

技術分野  Technical field

[0001] 本発明は、特定のエポキシィ匕合物を含有してなり、固体表面力 榭脂又は榭脂組 成物を除去又は洗浄するために用いられる除去剤に関する。  [0001] The present invention relates to a remover containing a specific epoxy compound and used for removing or washing a solid surface strength resin or a resin composition.

背景技術  Background art

[0002] 榭脂又は榭脂組成物の製造、使用にお 、て、容器、装置、配管、製品等に付着し た榭脂を除去するには、有機溶剤を主体とした洗浄剤が使用される。例えば、特許 文献 1には、 γ —プチ口ラタトンを含有してなる洗浄剤が報告されており、特許文献 2 には、ケトン系溶剤及び Ζ又はエステル系溶剤とエーテル系溶剤との混合物力ゝらな る洗浄剤が報告されており、特許文献 3には、含窒素化合物を含有してなる洗浄剤 が報告されている。  [0002] In the manufacture and use of a resin or a resin composition, a cleaning agent mainly composed of an organic solvent is used to remove the resin adhering to containers, equipment, piping, products and the like. The For example, Patent Document 1 reports a cleaning agent containing γ-petit-mouth rataton, and Patent Document 2 discloses a mixture of a ketone solvent and a soot or an ester solvent and an ether solvent. A cleaning agent comprising a nitrogen-containing compound is reported in Patent Document 3.

[0003] また、プリント配線基板、 IC等の電子回路配線、表示素子用カラーフィルター、 CC D用カラーフィルタ一等のパターユングには、ネガ型又はポジ型のレジストが使用さ れている。これらに用いられる硬化又は未硬化のレジスト組成物を除去するための有 機系除去剤(現像液、剥離液)としては、アルコール系、エーテル系、エステル系溶 剤が使用されている。  [0003] Negative or positive resists are used for patterns such as printed circuit boards, electronic circuit wiring such as ICs, display element color filters, and CCD color filters. Alcohol-based, ether-based, and ester-based solvents are used as organic-based removers (developers, stripping solutions) for removing the cured or uncured resist composition used in these.

[0004] 上記の有機溶剤系の洗浄剤又は除去剤は、残液が揮発して固体表面に榭脂残渣 が付着する問題点を有していた。また、含窒素化合物等のアルカリ性ィ匕合物を使用 した洗浄剤又は除去剤は、榭脂を除去した固体表面に榭脂の分解物やアルカリ性 化合物が残存することにより、榭脂除去後の固体表面の使用において、悪影響を及 ぼす場合がある。  [0004] The organic solvent-based cleaning agent or removing agent has a problem in that the residual liquid is volatilized and the resin residue adheres to the solid surface. In addition, a cleaning agent or a removing agent using an alkaline compound such as a nitrogen-containing compound is a solid after the removal of the resin, because the decomposition product of the resin or the alkaline compound remains on the solid surface from which the resin has been removed. The use of the surface may have an adverse effect.

[0005] 特許文献 1 :特開平 8— 117707号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 8-117707

特許文献 2 :特開平 8— 165496号公報  Patent Document 2: JP-A-8-165496

特許文献 3:特開 2001— 518552号公報  Patent Document 3: Japanese Patent Laid-Open No. 2001-518552

発明の開示  Disclosure of the invention

発明が解決しょうとする課題 [0006] 従って、本発明の目的は、固体表面から榭脂又は榭脂組成物を除去又は洗浄する ための除去剤において、除去効果が大きぐ榭脂又は榭脂組成物を除去した後の固 体表面の使用に対して影響を及ぼすことの無い除去剤を提供することにある。 Problems to be solved by the invention [0006] Therefore, an object of the present invention is to provide a remover for removing or washing a rosin or rosin composition from a solid surface, and after removing the rosin or rosin composition having a large removal effect. An object of the present invention is to provide a remover that does not affect the use of the body surface.

課題を解決するための手段  Means for solving the problem

[0007] 本発明者等は、検討を重ねた結果、特定のエポキシィ匕合物が榭脂成分の除去に 有用であることを知見した。 [0007] As a result of repeated studies, the present inventors have found that a specific epoxy compound is useful for removing a resin component.

[0008] 本発明は、上記知見に基づいてなされたものであり、固体表面から榭脂又は榭脂 組成物を除去又は洗浄するための除去剤であり、 1種類以上の有機溶剤 100質量 部に、下記一般式 (I)で表されるエポキシィ匕合物 1〜: LOO質量部を含有させてなる除 去剤を提供するものである。 [0008] The present invention has been made on the basis of the above findings, and is a remover for removing or washing the rosin or the rosin composition from the solid surface, and 100 parts by mass of one or more kinds of organic solvents. An epoxy compound represented by the following general formula (I) 1 to: provides a remover containing LOO parts by mass.

[0009] [化 1]

Figure imgf000004_0001
[0009] [Chemical 1]
Figure imgf000004_0001

(式中、 Rは、 炭素数 1〜 1 8の炭化水素基を表し、 R i ^ R 8は、 各々独立して水素原 (In the formula, R represents a hydrocarbon group having 1 to 18 carbon atoms, and R i ^ R 8 each independently represents a hydrogen atom.

子又はメチル基を表し、 pは 0又 1を表し, m及び nは、 各々独立して 0、 1又は 2を  Child or methyl group, p represents 0 or 1, m and n each independently represents 0, 1 or 2;

表す。) 発明を実施するための最良の形態  To express. The best mode for carrying out the invention

[0010] 上記一般式 (I)において、 Rで表される炭素数 1〜18の炭化水素基としては、 pが 0 の場合は、鎖中にベンゼン環、シクロアルカン環、シクロアルケン環等の炭化水素環 を有してもよいアルキル基、直鎖でも分枝を有してもよぐ鎖中にベンゼン環、シクロ アルカン環、シクロアルケン環等の炭化水素環を有してもよいァルケ-ル基、直鎖で も分枝を有してもよぐ鎖中にベンゼン環、シクロアルカン環、シクロアルケン環等の 炭化水素環を有してもょ 、アルキニル基、シクロアルキル基及びァリール基等が挙げ られ、これらの中でも、エポキシ化合物が安価であり、化学的に安定である点で、ァ ルキル基、ァリール基が好ましい。 In the above general formula (I), the hydrocarbon group having 1 to 18 carbon atoms represented by R, when p is 0, includes a benzene ring, a cycloalkane ring, a cycloalkene ring, etc. in the chain. Alkyl group which may have a hydrocarbon ring, alkenyl which may have a hydrocarbon ring such as a benzene ring, a cycloalkane ring and a cycloalkene ring in a chain which may be linear or branched A hydrocarbon group such as a benzene ring, a cycloalkane ring, a cycloalkene ring or the like, a alkynyl group, a cycloalkyl group, and an aryl group. Among these, an alkyl group and an aryl group are preferable in that the epoxy compound is inexpensive and chemically stable.

また、 Rで表される炭素数 1〜18の炭化水素基としては、 pが 1の場合は、直鎖でも 分枝を有してもよぐ鎖中にベンゼン環、シクロアルカン環、シクロアルケン環等の炭 化水素環を有してもよいアルカンジィル基、直鎖でも分枝を有してもよぐ鎖中にベン ゼン環、シクロアルカン環、シクロアルケン環等の炭化水素環を有してもよいアルケン ジィル基、直鎖でも分枝を有してもよぐ鎖中にベンゼン環、シクロアルカン環、シクロ アルケン環等の炭化水素環を有してもょ 、アルキンジィル基、シクロアンカンジィル 基及びァリーレン基等が挙げられ、これらの中でも、エポキシ化合物が安価であり、 化学的に安定である点で、アルカンジィル基、ァリーレン基が好ましい。 In addition, as the hydrocarbon group having 1 to 18 carbon atoms represented by R, when p is 1, a benzene ring, a cycloalkane ring, a cycloalkene in a chain that may be linear or branched. An alkanedyl group which may have a hydrocarbon ring such as a ring, or a hydrocarbon ring such as a benzene ring, a cycloalkane ring or a cycloalkene ring in a chain which may be linear or branched Alkenes that may be Diyl group, hydrocarbon chain such as benzene ring, cycloalkane ring, cycloalkene ring, etc. in a chain which may be straight chain or branched, alkyne diyl group, cycloancandiyl group and arylene group Among these, an alkanedyl group and an arylene group are preferable in that the epoxy compound is inexpensive and chemically stable.

[0011] pが 0の場合の Rとして好まし!/、基である上記アルキル基としては、メチル、ェチル、 プロピル、イソプロピル、ブチル、第二ブチル、第三ブチル、イソブチル、ァミル、イソ ァミル、第三アミル、へキシル、 2 へキシル、 3 へキシル、シクロへキシル、 1—メチ ルシクロへキシル、ヘプチル、 2 へプチル、 3 へプチル、イソへプチル、第三ヘプ チル、 n—ォクチル、イソオタチル、第三ォクチル、 2—ェチルへキシル、ノニル、イソ ノニル、デシル、ドデシル、トリデシル、テトラデシル、ペンタデシル、へキサデシル、 ヘプタデシル、ォクタデシル、ベンジル、フエネチル、 2—フエ-ルプロパン 2—ィ ル、ジフエ-ルメチル、スチリル、シンナミル等が挙げられる。  [0011] R is preferred when p is 0! /, And the above alkyl group is methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, isobutyl, amyl, isoamyl, Tertiary amyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, tertiary heptyl, n-octyl, iso-octyl , Tert-octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, benzyl, phenethyl, 2-phenylpropane-2-yl, diphenylmethyl , Styryl, cinnamyl and the like.

また、上記アルキル基と同様に pが 0の場合の Rとして好ましい基である上記ァリー ル基としては、フエ-ル、ナフチル、 2 メチルフエ-ル、 3 メチルフエ-ル、 4ーメチ ルフエニル、 3—イソプロピルフエ-ル、 4—イソプロピルフエ-ル、 4—ブチルフエ- ル、 4 イソブチルフエ-ル、 4 第三ブチルフエ-ル、 4一へキシルフエ-ル、 4ーシ クロへキシルフエ-ル、 4—ォクチルフエ-ル、 4— (2—ェチルへキシル)フエ-ル、 2 , 3 ジメチルフヱニル、 2, 4 ジメチルフヱニル、 2, 5 ジメチルフヱニル、 2, 6— ジメチルフエ-ル、 3, 4 ジメチルフエ-ル、 3, 5 ジメチルフエ-ル、 2, 4 ジ第三 ブチルフエニル、 2, 5 ジ第三ブチルフエニル、 2, 6 ジー第三ブチルフエニル、 2 , 4 ジ第三ペンチルフエ-ル、 2, 5 ジ第三アミルフエ-ル、シクロへキシルフエ- ル、ビフエ-ル、 2, 4, 5 トリメチルフエ-ル等が挙げられる。  As in the case of the alkyl group, the aryl group, which is a preferred group for R when p is 0, includes phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 3-isopropyl. Phenol, 4-Isopropyl, 4-Butyl, 4-Isobutyl, 4 Tertiary, 4-Hexyl, 4-Cyclohexyl, 4-Octyl , 4- (2-ethylhexyl) phenol, 2,3 dimethylphenyl, 2,4 dimethylphenyl, 2,5 dimethylphenyl, 2,6-dimethyldimethyl, 3,4 dimethylphenol, 3,5 dimethylphenol 2,4 ditertiary butylphenyl, 2,5 ditertiarybutylphenyl, 2,6 ditertiarybutylphenyl, 2,4 ditertiarypentylphenyl, 2,5 ditertiary amylfel, cyclohexylphenyl Le, bihuel, 2, 4, 5 Trimethylphenol and the like.

[0012] pが 1の場合の Rとして好ましい基である上記アルカンジィル基は、ジオール化合物 力も導入することができる。該ジオールィ匕合物としては、例えば、エチレングリコール 、 1, 2 プロパンジオール、 1, 3 プロパンジオール、 2—メチルー 1, 3 プロパン ジオール、 2 ブチルー 2 ェチルー 1, 3 プロパンジオール、 1, 4 ブタンジォー ル、ネオペンチルグリコール、 3—メチルー 2, 4 ペンタンジオール、 2, 4 ペンタン ジオール、 1, 5 ペンタンジオール、 3—メチルー 1, 5 ペンタンジオール、 2—メチ ルー 2, 4—ペンタンジオール、 2, 4—ジェチルー 1, 5—ペンタンジオール、 1, 6— へキサンジオール、 1, 7—ヘプタンジオール、 3, 5—ヘプタンジオール、 1, 8—オタ タンジオール、 2—メチルー 1, 8—オクタンジオール、 1, 9ーノナンジオール、 1, 10 ーデカンジオール等の脂肪族ジオール化合物;シクロへキサンジメタノール、シクロ へキサンジオール、水添ビスフエノール A等の脂環式ジオール化合物が挙げられる。 これらの中でも、炭素数 2〜8のジオールィ匕合物力 導入されるアルカンジィル基が 特に好ましい。 [0012] The above alkanediyl group, which is a preferred group as R when p is 1, can also introduce a diol compound force. Examples of the dioly compound include ethylene glycol, 1,2 propanediol, 1,3 propanediol, 2-methyl-1,3 propanediol, 2 butyl-2-ethyl-1,3 propanediol, 1,4 butanediol, Neopentyl glycol, 3-methyl-2,4 pentanediol, 2,4 pentanediol, 1,5 pentanediol, 3-methyl-1,5 pentanediol, 2-methi Lu 2, 4-pentanediol, 2, 4-jetyl 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 3,5-heptanediol, 1,8-otatandiol, 2 — Aliphatic diol compounds such as methyl-1,8-octanediol, 1,9-nonanediol, 1,10-decanediol; and cycloaliphatic diol compounds such as cyclohexanedimethanol, cyclohexanediol, and hydrogenated bisphenol A It is done. Among these, an alkanediyl group having 2 to 8 carbon atoms in which a diol compound strength is introduced is particularly preferable.

また、上記アルカンジィル基と同様に pが 1の場合の Rとして好ましい基である上記 ァリーレン基は、ジヒドロキシ芳香族化合物力も導入することができる。該ジヒドロキシ 芳香族化合物としては、例えば、レゾルシン、カテコール、ハイドロキノン、 3—メチル レゾルシン、 3—ェチルレゾルシン、 3—プロピルレゾルシン、 3—ブチルレゾルシン、 3—第三ブチルレゾルシン、 3—フエ-ルレゾルシン、 3—クミルレゾルシン、 3—メチ ルハイドロキノン、 3—ェチルハイドロキノン、 3—プロピルハイドロキノン、 3—ブチル ハイドロキノン、 3—第三ブチルハイドロキノン、 3—フエニルハイドロキノン、 3—タミル ハイドロキノン、 4, 4'ージヒドロキシジフエ-ル等のジヒドロキシァリール化合物; 1, 1 -ビス(4 -ヒドロキシフエ-ル)シクロペンタン、 1, 1—ビス(4 -ヒドロキシフエ-ル)シ クロへキサン等のビス(ヒドロキシァリール)シクロアルカン類;ビス(4—ヒドロキシフエ -ル)メタン、 1, 1—ビス(4—ヒドロキシフエ-ル)ェタン、 1, 2—ビス(4—ヒドロキシフ エノキシ)ェタン、 1, 3—ビス(4—ヒドロキシフエ-ル)プロパン、 2, 2—ビス(4—ヒドロ キシフエ-ル)プロパン、 2, 2—ビス(4—ヒドロキシ— 3, 5—ジメチルフエ-ル)プロパ ン、 1, 1—ビス(4—ヒドロキシフエ-ル)ブタン、 1, 1—ビス(4—ヒドロキシフエ-ル)ィ ソブタン、 2, 2—ビス(4—ヒドロキシフエ-ル)ブタン、 2, 4—ビス(4—ヒドロキシフエ -ル 2—メチル)ブタン等のビス(ヒドロキシァリール)アルカン類が挙げられる。  Similarly to the alkanedyl group, the arylene group, which is a preferred group as R when p is 1, can also introduce dihydroxy aromatic compound power. Examples of the dihydroxy aromatic compound include resorcin, catechol, hydroquinone, 3-methyl resorcin, 3-ethyl resorcin, 3-propyl resorcin, 3-butyl resorcin, 3-tert-butyl resorcin, 3-phenyl resorcin, 3-cumyl resorcin, 3-methyl hydroquinone, 3-ethyl hydroquinone, 3-propyl hydroquinone, 3-butyl hydroquinone, 3-tert-butyl hydroquinone, 3-phenyl hydroquinone, 3-tamyl hydroquinone, 4, 4 ' Dihydroxyaryl compounds such as dihydroxydiphenyl; bis (1, 1-bis (4-hydroxyphenyl) cyclopentane, 1,1-bis (4-hydroxyphenyl) cyclohexane, etc. Hydroxyaryl) cycloalkanes; bis (4-hydroxyphenol) methane, 1 , 1-bis (4-hydroxyphenol) ethane, 1,2-bis (4-hydroxyphenoxy) ethane, 1,3-bis (4-hydroxyphenol) propane, 2, 2-bis (4 —Hydroxyphenyl) propane, 2,2-bis (4-hydroxy-3,5-dimethylphenol) propan, 1,1-bis (4-hydroxyphenyl) butane, 1,1-bis ( Bis (hydroxyaryl) such as 4-hydroxyphenyl) butane, 2,2-bis (4-hydroxyphenyl) butane, 2,4-bis (4-hydroxyphenol 2-methyl) butane Examples include alkanes.

[0013] また、上記一般式(I)において、 m及び nは各々独立に 0、 1又は 2である。上記一 般式 (I)における m及び nが各々独立に 0又は 1であるエポキシィ匕合物力 流動性が 大きぐ洗浄に適するので好ましい。  [0013] In the general formula (I), m and n are each independently 0, 1 or 2. Epoxy compound strength in which m and n in the general formula (I) are each independently 0 or 1. This is preferable because it is suitable for washing.

[0014] また、本発明の除去剤中の上記一般式 (I)で表されるエポキシィ匕合物の含有量は、 有機溶剤 100質量部に対して、 1〜: L00質量部である。 1質量部より小さいと充分な 使用効果を得ることができず、 100質量部を超えても、使用効果のさらなる向上は見 らない。上記一般式 (I)で表されるエポキシィ匕合物の含有量は、 10〜85質量部が好 ましぐ 20〜75質量部がより好ましい。 [0014] The content of the epoxy compound represented by the general formula (I) in the removing agent of the present invention is 1 to L00 parts by mass with respect to 100 parts by mass of the organic solvent. Less than 1 part by mass is sufficient The use effect cannot be obtained, and even if the amount exceeds 100 parts by mass, the use effect is not further improved. The content of the epoxy compound represented by the general formula (I) is preferably 10 to 85 parts by mass, more preferably 20 to 75 parts by mass.

[0015] 本発明に係る上記一般式 (I)で表されるエポキシィ匕合物の好ま 、具体例としては[0015] Preferred and specific examples of the epoxy compound represented by the general formula (I) according to the present invention include

、下記に示す化合物 No. l〜No. 45が挙げられる。 And Compound Nos. 1 to 45 shown below.

[0016] [化 2] 化合物 化合物 化合物 。 化合物[Chemical Formula 2] Compound Compound Compound Compound

H 0— Cll2— CI、【 C C12H2-0~ CH-CH-CH2 C13 r0— C — CH_CH2 C"ll,rU— (H2— CH—C【【2 H 0— Cll 2 — CI, 【CC 12 H 2 -0 ~ CH-CH-CH 2 C 13 r 0— C — CH_CH 2 C "ll, r U— (H 2 — CH—C 【【 2

化合物 化合物 化合物 化合物 N  Compound Compound Compound Compound N

:15H3ro-cH-cH-cH2 cIC[[3 o-c[i cif-c[i2 C 5—0— CK「(^つ (¾ c¾ro— CH2— i CK2 : 15 H 3r o-cH-cH-cH 2 c IC [[ 3 oc [i cif-c [i 2 C 5 —0— CK “(^ ((c 1 £ ¾ r o— CH 2 — i CK 2

0 0 0 0  0 0 0 0

Figure imgf000007_0001
Figure imgf000007_0001

[0017] [化 3] 化合 化合物 N' 化合物 L7 [0017] [Chemical 3] Compound N ′ Compound L7

C4H— 0-CH— CH-0— CH— CH-CH, CgH, ~0~CH— CH"0— CH— CH"CH2 CSH17— 0— C — CH— 0— CH2— CH - CH2 化合物 化合物 化合物 C 4 H— 0-CH— CH-0— CH— CH-CH, CgH, ~ 0 ~ CH— CH "0— CH— CH” CH 2 C S H 17 — 0— C — CH— 0— CH 2 — CH-CH 2 Compound Compound Compound

C12H2— 0-CH— CH-0— CH2-CH-.CH2 C14H29— 0— C ? H 0— C — C[; [ CH2 C16H33— 0— CH2— H_0— CH2— CFi_CH2 C 12 H 2 — 0-CH— CH-0— CH 2 -CH-.CH 2 C 14 H 29 — 0— C? H 0— C — C [; [CH 2 C 16 H 33 — 0— CH 2 — H_0— CH 2 — CFi_CH 2

CH3 0 CH3 0 CH3 0 化合物 CH 3 0 CH 3 0 CH 3 0 Compound

化合物  Compound

~ -0~ H"C -0— CH— CH"CH2 化合物 ~ - 0 ~ H "C -0- CH- CH" CH 2 Compound

H3C— (j:- -0— CH— CH-0— 'CH— ti-CH. H 3 C— ( j :--0— CH— CH-0— 'CH— ti-CH.

CH3 CH 3

Figure imgf000007_0002
Figure imgf000007_0002

[0018] [化 4]

Figure imgf000008_0001
[0018] [Chemical 4]
Figure imgf000008_0001

墓〔〕画 化合物 No. 44 Tomb [] Compound No. 44

— CH„— 0— CH— CH2—ひ 0— CH-CH— 0— C¾— CH-CH, — CH „— 0— CH— CH 2 — HI 0— CH-CH— 0— C¾— CH-CH,

0 CH3 c¾ 、o' ' 化合物 No. 45 0 CH 3 c¾, o '' Compound No. 45

CH-CH— CH— 0— CH— CH— Ό— CH2-CH— 0— CH— CH-CH2 0 C¾ ' at, 、0' CH-CH— CH— 0— CH— CH— CH— Ό— CH 2 -CH— 0— CH— CH-CH 2 0 C¾ 'at,, 0 '

[0022] また、本発明の除去剤に使用される有機溶剤としては、特に制限を受けることはな く周知一般の有機溶剤を用いることができる。該有機溶剤としては、例えば、アルコ ール系溶剤、ポリオール系溶剤、ケトン系溶剤、エステル系溶剤、エーテル系溶剤、 ポリエーテル系溶剤、脂肪族炭化水素系溶剤、芳香族炭化水素系溶剤、塩素系溶 剤、シァノ基を有する炭化水素溶剤、ピロリドン溶剤等が挙げられ、これらは、 1種類 で又は 2種類以上混合して用いることができる。特に、前記一般式 (I)で表されるェポ キシィ匕合物を安定に溶解させることができ、安価で、榭脂又は榭脂組成物に対する 除去効果が大きい点で、炭素数 3〜18のケトン系溶剤及び Z又は炭素数 2〜18の エステル系溶剤を使用することが好ましい。該ケトン系溶剤は、有機溶剤中 50〜: LO 0質量%、特に 50〜90質量%用いることが好ましぐ該エステル系溶剤は、有機溶 剤中 10〜: LOO質量%、特に 10〜50質量%用いることが好ましい。 [0022] The organic solvent used in the removing agent of the present invention is not particularly limited, and a known general organic solvent can be used. Examples of the organic solvent include alcohol solvents, polyol solvents, ketone solvents, ester solvents, ether solvents, polyether solvents, aliphatic hydrocarbon solvents, aromatic hydrocarbon solvents, chlorine. Examples thereof include hydrocarbon solvents having a cyano group, pyrrolidone solvents, and the like, and these can be used alone or in combination of two or more. In particular, the epoxy compound represented by the general formula (I) can be stably dissolved, is inexpensive, and has a large removal effect on the resin or resin composition. It is preferable to use a ketone solvent and a Z or C 2-18 ester solvent. It is preferable to use the ketone solvent in an organic solvent at 50 to: LO 0% by mass, particularly 50 to 90% by mass. The ester solvent is preferably 10 to in an organic solvent: LOO% by mass, particularly 10 to 50%. It is preferable to use mass%.

[0023] 本発明の除去剤に使用される好ま 、有機溶剤である炭素数 3〜 18のケトン系溶 媒としては、アセトン、ェチルメチルケトン、メチルプロピルケトン、メチルイソプロピル ケトン、ブチルメチルケトン、イソブチルメチルケトン、第 2ブチルメチルケトン、第 3ブ チルメチルケトン、ジェチルケトン、 2—へプタノン、 3—へプタノン、ジブチルケトン、 ジイソプチルケトン、ジ第 3ブチルケトン、シクロペンタノン、シクロへキサノン、 4ーメチ ルへキサノン等が挙げられる。これらは単独で用いてもよぐ 2種以上組み合わせて 用いてもよい。  [0023] Preferably used as the removal agent of the present invention is a C3-C18 ketone solvent which is an organic solvent, such as acetone, ethyl methyl ketone, methyl propyl ketone, methyl isopropyl ketone, butyl methyl ketone, Isobutyl methyl ketone, sec-butyl methyl ketone, tributyl methyl ketone, jetyl ketone, 2-heptanone, 3-heptanone, dibutyl ketone, diisoptyl ketone, di-tert-butyl ketone, cyclopentanone, cyclohexanone, 4-methylhexanone and the like can be mentioned. These may be used alone or in combination of two or more.

[0024] また、本発明の除去剤に使用される好ましい有機溶剤である炭素数 2〜18のエス テル系溶剤としては、ギ酸メチル、ギ酸ェチル、酢酸メチル、酢酸ェチル、酢酸イソプ 口ピル、酢酸ブチル、酢酸イソブチル、酢酸第 2ブチル、酢酸第 3ブチル、酢酸アミル 、酢酸イソァミル、酢酸第 3ァミル、酢酸フエニル、プロピオン酸メチル、プロピオン酸 ェチル、プロピオン酸イソプロピル、プロピオン酸ブチル、プロピオン酸イソブチル、 プロピオン酸第 2ブチル、プロピオン酸第 3ブチル、プロピオン酸ァミル、プロピオン 酸イソァミル、プロピオン酸第 3ァミル、プロピオン酸フエ-ル、乳酸メチル、乳酸ェチ ル、メトキシプロピオン酸メチル、エトキシプロピオン酸メチル、メトキシプロピオン酸ェ チル、エトキシプロピオン酸ェチル、エチレングリコールモノメチルエーテルァセテ一 ト、ジエチレングリコーノレモノメチノレエーテノレアセテート、エチレングリコーノレモノェチ ノレエーテノレアセテート、エチレングリコーノレモノプロピノレエーテノレアセテート、ェチレ ングリコールモノイソプロピルエーテルアセテート、エチレングリコーノレモノブチノレエ 一テルアセテート、エチレングリコールモノ第 2ブチルエーテルアセテート、エチレン グリコールモノイソブチルエーテルアセテート、エチレングリコールモノ第 3ブチルェ 一テルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレング リコーノレモノェチノレエーテノレアセテート、プロピレングリコーノレモノプロピノレエーテノレ アセテート、プロピレングリコールモノイソプロピルエーテルアセテート、プロピレングリ コーノレモノブチノレエーテノレアセテート、プロピレングリコーノレモノ第 2ブチノレエーテノレ アセテート、プロピレングリコールモノイソブチルエーテルアセテート、プロピレングリコ ールモノ第 3ブチルエーテルアセテート、ブチレングリコールモノメチルエーテルァセ テート、ブチレングリコールモノェチルエーテルアセテート、ブチレングリコーノレモノプ 口ピルエーテルアセテート、ブチレングリコールモノイソプロピルエーテルアセテート、 ブチレングリコーノレモノブチノレエーテノレアセテート、ブチレングリコーノレモノ第 2ブチ ルエーテルアセテート、ブチレングリコールモノイソブチルエーテルアセテート、ブチ レングリコールモノ第 3ブチルエーテルアセテート、ァセト酢酸メチル、ァセト酢酸ェチ ル、ォキソブタン酸メチル、ォキソブタン酸ェチル、 γ—ラタトン、 δ—ラタトンなどが 挙げられる。これらは単独で用いてもよぐ 2種以上組み合わせて用いてもよい。 本発明の除去剤には、前記一般式 (I)で表されるエポキシィ匕合物、上記の有機溶 剤の他に、必要に応じて各種添加剤を使用してもよい。該添加剤としては、無機アル カリ化合物、有機ァミン、アンモニア、四級アンモ-ゥム塩等のアルカリ性ィ匕合物;有 機酸等の酸性化合物;粘度調整剤;レべリング剤;消泡剤;ゲル化防止剤;分散安定 剤;帯電防止剤;イオン性界面活性剤、非イオン性界面活性剤等の界面活性剤;水 等が挙げられる。これらの添加剤の使用量は、使用する添加剤の種類等に応じて適 宜選択されるが、通常、前記有機溶剤 100質量部に対し、全添加剤の合計量が 20 質量部以下となる範囲から選択する。 [0024] In addition, as a preferable organic solvent used in the removing agent of the present invention having 2 to 18 carbon atoms, methyl formate, ethyl formate, methyl acetate, ethyl acetate, isopropyl acetate, acetic acid acetate, Butyl, isobutyl acetate, 2 butyl acetate, 3 butyl acetate, amyl acetate, isoamyl acetate, 3 amyl acetate, phenyl acetate, methyl propionate, ethyl propionate, isopropyl propionate, butyl propionate, isobutyl propionate, propionate 2 butyl acid, 3 butyl propionate, amyl propionate, propion Isoamyl acid, tertiary amyl propionate, propionate phenol, methyl lactate, ethyl lactate, methyl methoxypropionate, methyl ethoxypropionate, ethyl methoxypropionate, ethyl ethoxypropionate, ethylene glycol monomethyl ether acetate Diethylene glycol monomethenoyl etherate acetate, ethylene glycol monoethanolate acetate, ethylene glycol monopropenoate etherate acetate, ethylene glycol monoisopropyl ether acetate, ethylene glycol monobutyl etherate Teracetate, ethylene glycol mono-tert-butyl ether acetate, ethylene glycol mono-isobutyl ether acetate, ethylene glycol mono-tert-butyl ether , Propylene glycol monomethyl ether acetate, propylene glycol monoethylenoate acetate, propylene glycol monopropinoate etherate, propylene glycol monoisopropyl ether acetate, propylene glycol monobutinoate acetate, propylene Glycolanol monobutylene etherate acetate, propylene glycol monoisobutyl ether acetate, propylene glycol mono tertiary butyl ether acetate, butylene glycol monomethyl ether acetate, butylene glycol monoethyl ether acetate, butylene glycol monoethyl ether pill ether Acetate, butylene glycol monoisopropyl ether acetate, butylene Ricohone Monobutinoleate Noleacetate, Butylene Glycolone Mono Second Butyl Ether Acetate, Butylene Glycol Monoisobutyl Ether Acetate, Butylene Glycol Mono Tertiary Butyl Ether Acetate, Methyl Acetate Acetate, Ethyl Acetate Acetate, Methyl Oxobutanoate, Oxobutane Examples include oxyl, γ-latathon, and δ-latathon. These may be used alone or in combination of two or more. In addition to the epoxy compound represented by the general formula (I) and the organic solvent, various additives may be used as necessary for the removing agent of the present invention. Examples of the additive include alkaline compounds such as inorganic alkali compounds, organic amines, ammonia and quaternary ammonium salts; acidic compounds such as organic acids; viscosity modifiers; leveling agents; Agents; anti-gelling agents; dispersion stabilizers; antistatic agents; surfactants such as ionic surfactants and nonionic surfactants; water and the like. The amount of these additives to be used is appropriately selected according to the type of additive to be used, etc., but the total amount of all additives is usually 20 parts per 100 parts by mass of the organic solvent. It selects from the range used as the mass part or less.

[0026] 本発明の除去剤の用途としては、 ICやプリント配線基板等に用いられる封止剤用 榭脂組成物の洗浄、金型、加工機等のプラスチック加工用機材に付着した榭脂組成 物の洗浄、榭脂又は榭脂組成物を混合又は製造するための混合又は製造装置の洗 浄、フォトレジストの現像液、フォトレジストの剥離液、フォトレジスト装置の洗浄等が挙 げられる。  [0026] Applications of the remover of the present invention include cleaning of a resin composition for sealants used for ICs, printed wiring boards, etc., and a resin composition adhering to plastic processing equipment such as molds and processing machines. Cleaning of products, cleaning of mixing or manufacturing apparatus for mixing or manufacturing a resin or a resin composition, a developing solution of photoresist, a stripping solution of photoresist, cleaning of a photoresist apparatus, and the like.

実施例  Example

[0027] 以下、実施例及び比較例をもって本発明を更に詳細に説明する。し力しながら、本 発明は、以下の実施例等によって何ら制限を受けるものではない。  Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. However, the present invention is not limited by the following examples.

[0028] [実施例 1〜8及び比較例 1]  [Examples 1 to 8 and Comparative Example 1]

30mm X 50mm X lmmの SUS304板に、下記製造方法により製造した黒色榭脂 組成物をディップコートして試験片を作成した。該試験片を除去剤試料 (表 1〜表 3 参照)に 60秒浸漬した。この際、試験片浸漬中は、マグネチックスターラーで除去剤 試料を攪拌した。試験片を引き上げた後、表面状態を観察した。また、試験片表面に 付着して!/、る黒色榭脂組成物をセロハンテープに転写し、転写前後のセロハンテー プの OD値をマクベス濃度計 (マクベス社製 RD— 933型)で測定して、その増加分( A OD)を算出した。それらの結果を表 1〜3に示す。  A 30 mm × 50 mm × lmm SUS304 plate was dip coated with the black resin composition produced by the following production method to prepare a test piece. The test piece was immersed in a remover sample (see Tables 1 to 3) for 60 seconds. At this time, while the test piece was immersed, the remover sample was stirred with a magnetic stirrer. After pulling up the test piece, the surface condition was observed. Also, stick to the surface of the specimen! / Transfer the black fat composition to cellophane tape, measure the OD value of the cellophane tape before and after transfer with a Macbeth densitometer (Macbeth RD-933 type), and calculate the increase (A OD) did. The results are shown in Tables 1-3.

[0029] (黒色樹脂組成物の製造方法)  [0029] (Method for producing black resin composition)

1 , 1 ビス(4,一エポキシプロピルォキシフエ-ル) 1— ( 1 " ビフエ-ル) 1— シクロへキシルメタン 43g、アクリル酸 l lg、 2, 6 ジ tert—ブチルー p クレゾ一 ル 0. 05g、テトラブチルアンモ -ゥムアセテート 0. l lg及びプロピレングリコール— 1 —モノメチルエーテル— 2 アセテート 23gを仕込み、 120°Cで 16時間攪拌した。室 温まで冷却し、プロピレングリコール— 1—モノメチルエーテル— 2 アセテート 35g 及びビフエ-ルテトラカルボン酸 2無水物 9. 4gをカ卩えて、 120°Cで 8時間攪拌した。 更 ίこテトラヒドロ無水フタノレ酸 6. Ogをカロえて、 120°Cで 4時 f¾、 100°Cで 3時 [¾、 80 °Cで 4時間、 60°Cで 6時間、 40°Cで 11時間それぞれ攪拌した後、プロピレングリコー ル— 1—モノメチルエーテル— 2 アセテート 29gを加えた。この組成物 12gに、トリメ チロールプロパントリアタリレート 8g、ベンゾフエノン 1. 8g、カーボンブラック (三菱ィ匕 学社製「MA100」)3.2g及びェチルセ口ソルブ 75gを加えてよく攪拌し、黒色榭月 組成物を得た。 1, 1 Bis (4, 1 epoxypropyloxyphenyl) 1— (1 ”biphenyl) 1— 43 g of cyclohexylmethane, l lg acrylate, 2, 6 di tert-butyl p cresol 05 g, tetrabutylammonium acetate 0.1 l lg and propylene glycol-1 —monomethyl ether-2 acetate 23 g were charged and stirred for 16 hours at 120 ° C. Cooled to room temperature, propylene glycol-1-monomethyl ether-2 35 g of acetate and 9.4 g of biphenyltetracarboxylic dianhydride were added and stirred for 8 hours at 120 ° C. Further, tetrahydroanhydranoic anhydride 6. Calored Og at 120 ° C. for 4 hours. 3 hours at 100 ° C [¾, stirred at 80 ° C for 4 hours, 60 ° C for 6 hours, and 40 ° C for 11 hours, and then added 29 g of propylene glycol-1-monomethyl ether-2-acetate To 12g of this composition, Trimethylolpropane tri Atari rate 8 g, benzophenone 1. 8 g, carbon black (Mitsubishii匕 “MA100” manufactured by Gakusha Co., Ltd. (3.2 g) and ethyl acetate mouthsolve (75 g) were added and stirred well to obtain a black moon cake composition.

[表 1]

Figure imgf000012_0001
[table 1]
Figure imgf000012_0001

* B y k— C h e m i e社製  * B y k—Che m i e

[0031] [表 2]

Figure imgf000012_0002
[0031] [Table 2]
Figure imgf000012_0002

[0032] [表 3] [0032] [Table 3]

Figure imgf000012_0003
Figure imgf000012_0003

[0033] 表 1〜3から明らかなように、有機溶媒に特定のエポキシィ匕合物を含有させてなる 本発明の除去剤を用いると、固体表面は均一に洗浄され、固体表面に残存する榭 脂組成物は少ない(実施例 1〜8)。これに対し、本発明に係る特定のエポキシ化合 物を含有しない除去剤を用いると、固体表面は均一に洗浄されず斑状となり、固体 表面に残存する榭脂組成物も多 、 (比較例 1)。 [0033] As is apparent from Tables 1 to 3, the organic solvent contains a specific epoxy compound. When the removing agent of the present invention is used, the solid surface is uniformly washed, and there are few resin compositions remaining on the solid surface (Examples 1 to 8). On the other hand, when a remover that does not contain the specific epoxy compound according to the present invention is used, the solid surface is not evenly washed and becomes patchy, and there are many rosin compositions remaining on the solid surface (Comparative Example 1). .

産業上の利用可能性 Industrial applicability

本発明によれば、除去効果が大きぐ榭脂又は榭脂組成物を除去した後の固体表 面の使用に対して影響を及ぼすことの無 、除去剤を提供することができる。  According to the present invention, it is possible to provide a remover without affecting the use of the solid surface after removing the resin or the resin composition having a large removal effect.

Claims

請求の範囲 [1] 固体表面力 榭脂又は榭脂組成物を除去又は洗浄するための除去剤であり、 1種 類以上の有機溶剤 100質量部に、下記一般式 (I)で表されるエポキシィ匕合物 1〜10 0質量部を含有させてなる除去剤。 Claims [1] Solid surface force A removal agent for removing or washing the greaves or greaves composition, represented by the following general formula (I) in 100 parts by mass of one or more organic solvents A removal agent comprising 1 to 100 parts by mass of an epoxy compound. [化 1] (I ) [Chemical 1] (I)
Figure imgf000014_0001
Figure imgf000014_0001
(式中、 Rは、 炭素数 1〜 1 8の炭化水素某を表し、 R i R 8は, 各々独立して水素原 子又はメチル基を表し、 pは 0又 1を表し、 m及び nは, 各々独立して 0、 1又は 2を 表す。) (Wherein R represents a hydrocarbon group having 1 to 18 carbon atoms, R i R 8 each independently represents a hydrogen atom or a methyl group, p represents 0 or 1, m and n Each independently represents 0, 1 or 2.)
[2] 上記一般式 (I)において、 Rで表される炭素数 1〜18の炭化水素基力 アルカンジ ィル基及びァリーレン基力 選ばれる基である請求の範囲第 1項に記載の除去剤。 [2] The removing agent according to claim 1, which is a group selected from hydrocarbon basic force alkanedyl group and arylene basic force having 1 to 18 carbon atoms represented by R in the general formula (I). . [3] 上記一般式 (I)において、 m及び nが各々独立して 0又は 1である請求の範囲第 1項 又は第 2項に記載の除去剤。 [3] The remover according to claim 1 or 2, wherein in the general formula (I), m and n are each independently 0 or 1. [4] 上記有機溶剤が、炭素数 3〜18のケトン系溶剤を 50質量%以上含むものである請 求の範囲第 1項〜第 3項のいずれかに記載の除去剤。 [4] The removing agent according to any one of claims 1 to 3, wherein the organic solvent contains 50% by mass or more of a ketone solvent having 3 to 18 carbon atoms. [5] 上記有機溶剤が、炭素数 2〜18のエステル系溶剤を 10質量%以上含むものであ る請求の範囲第 1項〜第 4項のいずれかに記載の除去剤。 [5] The removing agent according to any one of claims 1 to 4, wherein the organic solvent contains 10% by mass or more of an ester solvent having 2 to 18 carbon atoms.
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JPH07216398A (en) * 1994-01-31 1995-08-15 Asahi Chem Ind Co Ltd Detergent
JPH09194891A (en) * 1995-11-13 1997-07-29 Japan Energy Corp Low corrosive cleaning composition
JPH1036890A (en) * 1996-07-22 1998-02-10 Asahi Chem Ind Co Ltd Ink cleaning agent
JPH1135993A (en) * 1997-07-23 1999-02-09 Sanyo Chem Ind Ltd Detergent composition for screen printing plate

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