[go: up one dir, main page]

TWI384066B - Resin removal agent - Google Patents

Resin removal agent Download PDF

Info

Publication number
TWI384066B
TWI384066B TW095101608A TW95101608A TWI384066B TW I384066 B TWI384066 B TW I384066B TW 095101608 A TW095101608 A TW 095101608A TW 95101608 A TW95101608 A TW 95101608A TW I384066 B TWI384066 B TW I384066B
Authority
TW
Taiwan
Prior art keywords
group
methyl
solvent
mass
acetate
Prior art date
Application number
TW095101608A
Other languages
Chinese (zh)
Other versions
TW200641120A (en
Inventor
Takashi Tokuhashi
Syuji Iwakura
Original Assignee
Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Publication of TW200641120A publication Critical patent/TW200641120A/en
Application granted granted Critical
Publication of TWI384066B publication Critical patent/TWI384066B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00Chemical paint or ink removers
    • C09D9/005Chemical paint or ink removers containing organic solvents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/37Polymers
    • C11D3/3703Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3707Polyethers, e.g. polyalkyleneoxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Materials Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Paints Or Removers (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

樹脂用除去劑Resin remover

本發明係關於一種含有特定之環氧化合物而成、且用於自固體表面除去或清洗去樹脂或樹脂組合物之除去劑。The present invention relates to a remover comprising a specific epoxy compound and used for removing or cleaning a resin or resin composition from a solid surface.

於樹脂或樹脂組合物之製造、使用中,為除去附著於容器、裝置、配管、製品等上之樹脂,而使用以有機溶劑為主體之清洗劑。例如於專利文獻1中,報告有含有γ-丁內酯而成之清洗劑,於專利文獻2中,報告有含有酮系溶劑及/或酯系溶劑與醚系溶劑之混合物之清洗劑,於專利文獻3中,報告有含有含氮化合物而成之清洗劑。In the production and use of the resin or resin composition, in order to remove the resin adhering to the container, the device, the piping, the product, or the like, a cleaning agent mainly composed of an organic solvent is used. For example, Patent Document 1 discloses a cleaning agent containing γ-butyrolactone, and Patent Document 2 discloses a cleaning agent containing a mixture of a ketone solvent and/or an ester solvent and an ether solvent. Patent Document 3 discloses a cleaning agent containing a nitrogen-containing compound.

又,於印刷配線基板、IC等之電子電路配線、顯示元件用彩色濾光器、CCD用彩色濾光器等之圖案化中,使用有正性或負性抗蝕劑。作為用於除去使用於該等之硬化或未硬化之抗蝕劑組合物的有機系除去劑(顯像液、剝離液),使用有醇系、醚系、酯系溶劑。Further, a positive or negative resist is used for patterning of a printed wiring board, an electronic circuit wiring such as an IC, a color filter for a display element, and a color filter for CCD. An organic-based remover (developing liquid or peeling liquid) for removing the hardened or uncured resist composition used is an alcohol-based, ether-based or ester-based solvent.

上述有機溶劑系之清洗劑或除去劑,存有因殘留液體揮發而樹脂殘渣附著於固體表面之問題點。又,使用含氮化合物等之鹼性化合物之清洗劑或除去劑,於已除去樹脂之固體表面上殘存樹脂之分解物或鹼性化合物,故而於除去樹脂後之固體表面上使用時,有時可帶來不良影響。The organic solvent-based cleaning agent or the removing agent has a problem that the residual resin is volatilized and the resin residue adheres to the solid surface. Further, when a cleaning agent or a removing agent of a basic compound such as a nitrogen-containing compound is used, a decomposition product or a basic compound of the resin remains on the surface of the solid from which the resin has been removed, and thus, when used on a solid surface after removing the resin, sometimes Can have adverse effects.

專利文獻1:日本專利特開平8-117707號公報專利文獻2:日本專利特開平8-165496號公報專利文獻3:日本專利特開2001-518552號公報Patent Document 1: Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei.

故而,本發明之目的在於提供一種除去劑,其係用於自固體表面除去或清洗去樹脂或樹脂組合物者,其除去效果較佳,且並未影響及除去樹脂或樹脂組合物後之固體表面之使用。Accordingly, it is an object of the present invention to provide a remover which is used for removing or cleaning a resin or resin composition from a solid surface, which has a better removal effect and does not affect and remove the solid after the resin or resin composition. Use of the surface.

本發明者等經過反覆研究,結果發現特定之環氧化合物可用於除去樹脂成分。The inventors of the present invention have conducted repeated studies and found that a specific epoxy compound can be used for removing the resin component.

本發明係基於上述發現而完成者,其係提供一種除去劑,其特徵為其係用於自固體表面除去或清洗去樹脂或樹脂組合物,且係使於100質量份之一種以上有機溶劑中含有1~100質量份之如下述通式(I)所示之環氧化合物而成者。The present invention has been accomplished based on the above findings, and provides a remover characterized in that it is used for removing or washing a resin or resin composition from a solid surface, and is contained in 100 parts by mass or more of an organic solvent. It is composed of 1 to 100 parts by mass of an epoxy compound represented by the following formula (I).

(式中,R表示碳數1~18之烴基,R1 ~R3 各自獨立表示氫原子或甲基,p表示0或1,m及n各自獨立表示0、1或2。) (wherein R represents a hydrocarbon group having 1 to 18 carbon atoms, R 1 to R 3 each independently represent a hydrogen atom or a methyl group, p represents 0 or 1, and m and n each independently represent 0, 1 or 2.)

於上述通式(1)中,至於以R所表示之碳數1~18之烴基,於p為0之情形時,可列舉有:於鏈中亦可具有苯環、環烷烴環、環烯烴環等烴環之烷基;直鏈中亦可具有支鏈,且鏈中亦可具有苯環、環烷烴環、環烯烴環等烴環之烯基;直鏈中亦可具有支鏈,且鏈中可具有苯環、環烷烴環、環烯烴環等烴環之炔基;環烷基及芳基等,於該等之中,考慮到環氧化合物廉價,且化學性穩定之方面,較好的是烷基、芳基。In the above formula (1), as for the hydrocarbon group having 1 to 18 carbon atoms represented by R, when p is 0, there may be mentioned a benzene ring, a cycloalkane ring or a cycloolefin in the chain. An alkyl group of a cyclic hydrocarbon ring; may also have a branch in a straight chain, and may have an alkenyl group of a hydrocarbon ring such as a benzene ring, a cycloalkane ring or a cycloolefin ring; and may have a branch in a straight chain, and The chain may have an alkynyl group such as a benzene ring, a cycloalkane ring or a cycloolefin ring; a cycloalkyl group and an aryl group; among these, in view of the fact that the epoxy compound is inexpensive and chemically stable, Good is alkyl or aryl.

又,至於以R表示之碳數1~18之烴基,於p為1之情形時,可列舉有:直鏈中亦可具有支鏈,且鏈中亦可具有苯環、環烷烴環、環烯烴環等烴環之伸烷基;直鏈中亦可具有支鏈,且鏈中亦可具有苯環、環烷烴環、環烯烴環等烴環之亞烯基;直鏈中亦可具有支鏈,且鏈中亦可具有苯環、環烷烴環、環烯烴環等烴環之亞炔基,亞環烷基及伸芳基等,於該等之中,考慮到環氧化合物廉價,且化學性穩定之方面,較好的是伸烷基、伸芳基。Further, as for the hydrocarbon group having 1 to 18 carbon atoms represented by R, when p is 1, the chain may have a branch, and the chain may have a benzene ring, a cycloalkane ring or a ring. The alkyl group of the hydrocarbon ring such as an olefin ring; the chain may also have a branch, and the chain may also have an alkenylene group of a hydrocarbon ring such as a benzene ring, a cycloalkane ring or a cycloalkene ring; a chain, and the chain may have an alkynylene group such as a benzene ring, a cycloalkane ring or a cycloolefin ring, a cycloalkylene group and an exoaryl group, etc., among which the epoxy compound is considered to be inexpensive, and In terms of chemical stability, an alkyl group and an aryl group are preferred.

至於p為0時作為R之較好之基即上述烷基,可列舉有:甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁基、異丁基、戊基、異戊基、第三戊基、己基、2-己基、3-己基、環己基、1-甲基環己基、庚基、2-庚基、3-庚基、異庚基、第三庚基、正辛基、異辛基、第三辛基、2-乙基己基、壬基、異壬基、癸基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基、苯甲基、苯乙基、2-苯基丙烷-2-基、二苯甲基、苯乙烯基、肉桂基等。The above-mentioned alkyl group which is a preferred group for R when p is 0 may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, a third butyl group or an isobutyl group. , pentyl, isopentyl, third amyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, isoheptyl, Third heptyl, n-octyl, isooctyl, trioctyl, 2-ethylhexyl, decyl, isodecyl, decyl, dodecyl, tridecyl, tetradecyl, ten Pentaalkyl, hexadecyl, heptadecyl, octadecyl, benzyl, phenethyl, 2-phenylpropan-2-yl, benzhydryl, styryl, cinnamyl and the like.

又,與上述烷基相同,至於p為0之情形時作為R之較好之基即上述芳基,可列舉有:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、3-異丙基苯基、4-異丙基苯基、4-丁基苯基、4-異丁基苯基、4-第三丁基苯基、4-己基苯基、4-環己基苯基、4-辛基苯基、4-(2-乙基己基)苯基、2,3-二甲基苯基、2,4-二甲基苯基、2,5-二甲基苯基、2,6-二甲基苯基、3,4-二甲基苯基、3,5-二甲基苯基、2,4-二第三丁基苯基、2,5-二第三丁基苯基、2,6-二-第三丁基苯基、2,4-二第三戊基苯基、2,5-二第三戊基苯基、環己基苯基、聯苯、2,4,5-三甲基苯基等。Further, the same as the above-mentioned alkyl group, when p is 0, a preferred group of R, that is, the above aryl group, may be phenyl, naphthyl, 2-methylphenyl or 3-methylphenyl. 4-methylphenyl, 3-isopropylphenyl, 4-isopropylphenyl, 4-butylphenyl, 4-isobutylphenyl, 4-tert-butylphenyl, 4- Hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4-(2-ethylhexyl)phenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-Dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-di-t-butylbenzene , 2,5-di-t-butylphenyl, 2,6-di-t-butylphenyl, 2,4-di-t-pentylphenyl, 2,5-di-t-pentylphenyl , cyclohexylphenyl, biphenyl, 2,4,5-trimethylphenyl and the like.

p為1之情形時作為R之較好之基即上述伸烷基,可自二醇化合物中導入。至於該二醇化合物,例如可列舉有:乙二醇、1,2-丙二醇、1,3-丙二醇、2-甲基-1,3-丙二醇、2-丁基-2-乙基-1,3-丙二醇、1,4-丁二醇、新戊二醇、3-甲基-2,4-戊二醇、2,4-戊二醇、1,5-戊二醇、3-甲基-1,5-戊二醇、2-甲基-2,4-戊二醇、2,4-二乙基-1,5-戊二醇、1,6-己二醇、1,7-庚二醇、3,5-庚二醇、1,8-辛二醇、2-甲基-1,8-辛二醇、1,9-壬二醇、1,10-癸二醇等之脂肪族二醇化合物;環己烷二甲醇、環己烷二醇、氫化雙酚A等脂環式二醇化合物。於該等之中,尤其好的是自碳數2~8之二醇化合物中導入之伸烷基。In the case where p is 1, the above-mentioned alkylene group which is a preferred group of R may be introduced from the diol compound. Examples of the diol compound include ethylene glycol, 1,2-propylene glycol, 1,3-propanediol, 2-methyl-1,3-propanediol, and 2-butyl-2-ethyl-1. 3-propanediol, 1,4-butanediol, neopentyl glycol, 3-methyl-2,4-pentanediol, 2,4-pentanediol, 1,5-pentanediol, 3-methyl -1,5-pentanediol, 2-methyl-2,4-pentanediol, 2,4-diethyl-1,5-pentanediol, 1,6-hexanediol, 1,7- Heptanediol, 3,5-heptanediol, 1,8-octanediol, 2-methyl-1,8-octanediol, 1,9-nonanediol, 1,10-nonanediol, etc. An aliphatic diol compound; an alicyclic diol compound such as cyclohexane dimethanol, cyclohexane diol or hydrogenated bisphenol A. Among these, particularly preferred is an alkylene group introduced from a diol compound having 2 to 8 carbon atoms.

又,與上述伸烷基相同,p為1之情形時較好之基即上述伸芳基,可自二羥基芳香族化合物導入。至於該羥基芳香族化合物,例如可列舉有:間苯二酚、鄰苯二酚、對苯二酚、3-甲基間苯二酚、3-乙基間苯二酚、3-丙基間苯二酚、3-丁基間苯二酚、3-第三丁基間苯二酚、3-苯基間苯二酚、3-異丙苯基間苯二酚、3-甲基對苯二酚、3-乙基對苯二酚、3-丙基對苯二酚、3-丁基對苯二酚、3-第三丁基對苯二酚、3-苯基對苯二酚、3-異丙苯基對苯二酚、4,4'-二羥基二苯基等之二羥基芳基化合物;1,1-雙(4-羥基苯基)環戊烷、1,1-雙(4-羥基苯基)環己烷等之雙(羥基芳基)環烷類;雙(4-羥基苯基)甲烷、1,1-雙(4-羥基苯基)乙烷、1,2-雙(4-羥基苯氧基)乙烷、1,3-雙(4-羥基苯基)丙烷、2,2-雙(4-羥基苯基)丙烷、2,2-雙(4-羥基-3,5-二甲基苯基)丙烷、1,1-雙(4-羥基苯基)丁烷、1,1-雙(4-羥基苯基)異丁烷、2,2-雙(4-羥基苯基)丁烷、2,4-雙(4-羥基苯基2-甲基)丁烷等之雙(羥基芳基)烷類。Further, in the case where p is 1, the above-mentioned exoaryl group, which is preferably the same as the above-mentioned alkylene group, can be introduced from the dihydroxy aromatic compound. Examples of the hydroxyaromatic compound include resorcinol, catechol, hydroquinone, 3-methyl resorcinol, 3-ethyl resorcinol, and 3-propyl group. Hydroquinone, 3-butyl resorcinol, 3-tert-butyl resorcinol, 3-phenyl resorcinol, 3-isopropylphenyl resorcinol, 3-methyl-p-benzene Diphenol, 3-ethylhydroquinone, 3-propyl hydroquinone, 3-butyl hydroquinone, 3-tert-butyl hydroquinone, 3-phenyl hydroquinone, a dihydroxyaryl compound such as 3-isopropylphenyl hydroquinone or 4,4'-dihydroxydiphenyl; 1,1-bis(4-hydroxyphenyl)cyclopentane, 1,1-double Bis(hydroxyaryl)cycloalkanes such as (4-hydroxyphenyl)cyclohexane; bis(4-hydroxyphenyl)methane, 1,1-bis(4-hydroxyphenyl)ethane, 1,2 - bis(4-hydroxyphenoxy)ethane, 1,3-bis(4-hydroxyphenyl)propane, 2,2-bis(4-hydroxyphenyl)propane, 2,2-bis(4-hydroxyl -3,5-dimethylphenyl)propane, 1,1-bis(4-hydroxyphenyl)butane, 1,1-bis(4-hydroxyphenyl)isobutane, 2,2-dual ( 4-hydroxyphenyl)butane, 2,4-bis (4- A bis(hydroxyaryl)alkane such as hydroxyphenyl 2-methyl)butane.

又,於上述通式(I)中,m及n各自獨立為0、1或2。作為於上述通式(I)中m及n各自獨立為0或1之環氧化合物,其流動性較大,且適宜清洗故而較好。Further, in the above formula (I), m and n are each independently 0, 1, or 2. The epoxy compound in which m and n are each independently 0 or 1 in the above formula (I) is preferred because it has a large fluidity and is suitable for washing.

又,本發明之除去劑中之於上述通式(I)中所示之環氧化合物的含量,相對於有機溶劑100質量份,為1~100質量份。若小於1質量份則無法得到充分之使用效果,即使超出100質量份亦未發現使用效果之進一步提高。以上述通式(I)所表示之環氧化合物之含量,較好的是10~85質量份,更好的是20~75質量份。In addition, the content of the epoxy compound represented by the above formula (I) in the removing agent of the present invention is from 1 to 100 parts by mass based on 100 parts by mass of the organic solvent. If it is less than 1 part by mass, a sufficient use effect cannot be obtained, and even if it exceeds 100 parts by mass, no further improvement in the use effect is observed. The content of the epoxy compound represented by the above formula (I) is preferably from 10 to 85 parts by mass, more preferably from 20 to 75 parts by mass.

至於本發明相關之以上述通式(I)所表示之環氧化合物之較好具體例,可列舉有下述所示之化合物No.1~No.45。Preferred examples of the epoxy compound represented by the above formula (I) according to the present invention include the following compounds No. 1 to No. 45.

又,作為於本發明之除去劑中所使用之有機溶劑,並不受特別限制,可使用眾所周知之通常之有機溶劑。至於該有機溶劑,例如可列舉有:醇系溶劑、多元醇系溶劑、酮系溶劑、酯系溶劑、醚系溶劑、聚醚系溶劑、脂肪族烴系溶劑、芳香族烴系溶劑、氯系溶劑、具有氰基之烴溶劑、吡咯酮溶劑,該等可使用1種或混合2種以上使用。尤其為自可使上述通式(I)中所示之環氧化物穩定溶解,價格低廉,且對樹脂或樹脂組合物之除去效果較大方面考慮,較好的是使用碳數為3~18之酮系溶劑以及/或者碳數2~18之酯系溶劑。該酮系溶劑,較好的是有機溶劑中之50~100質量%,尤其好的是50~90質量%。該酯系溶劑,較好的是有機溶劑中之10~100質量%,尤其好的是10~50質量%。Further, the organic solvent used in the removing agent of the present invention is not particularly limited, and a well-known ordinary organic solvent can be used. Examples of the organic solvent include an alcohol solvent, a polyol solvent, a ketone solvent, an ester solvent, an ether solvent, a polyether solvent, an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent, and a chlorine system. The solvent, the hydrocarbon solvent having a cyano group, and the pyrrolidone solvent may be used alone or in combination of two or more. In particular, since the epoxide shown in the above formula (I) can be stably dissolved, the price is low, and the effect of removing the resin or the resin composition is large, it is preferred to use a carbon number of 3 to 18. A ketone solvent and/or an ester solvent having 2 to 18 carbon atoms. The ketone solvent is preferably 50 to 100% by mass in the organic solvent, particularly preferably 50 to 90% by mass. The ester solvent is preferably from 10 to 100% by mass, particularly preferably from 10 to 50% by mass, based on the organic solvent.

至於於本發明之除去劑中所使用之較好之有機溶劑即碳數3~18之酮系溶劑,可列舉有:丙酮、丁酮、甲基丙基酮、甲基異丙基酮、丁基甲基酮、異丁基甲基酮、第2丁基甲基酮、第3丁基甲基酮、二乙基酮、2-庚酮、3-庚酮、二丁基酮、二異丁基酮、二第3丁基酮、環庚酮、環己酮、4-甲基己酮等。該等可單獨使用,亦可組合兩種以上使用。As the preferred organic solvent to be used in the remover of the present invention, that is, a ketone solvent having 3 to 18 carbon atoms, acetone, methyl ethyl ketone, methyl propyl ketone, methyl isopropyl ketone, and butyl group are exemplified. Ketone, isobutyl methyl ketone, 2, butyl methyl ketone, 3 butyl methyl ketone, diethyl ketone, 2-heptanone, 3-heptanone, dibutyl ketone, diisobutyl ketone, dibutyl Ketone, cycloheptanone, cyclohexanone, 4-methylhexanone, and the like. These may be used singly or in combination of two or more.

又,作為用於本發明之除去劑中較好之有機溶劑之碳數2~18的酯系溶劑,可列舉有:甲酸甲酯、甲酸乙酯、乙酸甲酯、乙酸乙酯、乙酸異丙酯、乙酸丁酯、乙酸異丁酯、乙酸第2丁酯、乙酸第3丁酯、乙酸戊酯、乙酸異戊酯、乙酸第3戊酯、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙酸異丙酯、丙酸丁酯、丙酸異丁酯、丙酸第2丁酯、丙酸第3丁酯、丙酸戊酯、丙酸異戊酯、丙酸第3戊酯、丙酸苯酯、乳酸甲酯、乳酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸甲酯、甲氧基丙酸乙酯、乙氧基丙酸乙酯、乙二醇甲醚醋酸酯、二乙二醇甲醚醋酸酯、乙二醇乙醚醋酸酯、乙二醇丙醚醋酸酯、乙二醇異丙醚醋酸酯、乙二醇丁醚醋酸酯、乙二醇第2丁醚醋酸酯、乙二醇異丁醚醋酸酯、乙二醇第3丁醚醋酸酯、丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯、丙二醇丙醚醋酸酯、丙二醇異丙醚醋酸酯、丙二醇丁醚醋酸酯、丙二醇第2丁醚醋酸酯、丙二醇異丁醚醋酸酯、丙二醇第3丁醚醋酸酯、丁二醇甲醚醋酸酯、丁二醇乙醚醋酸酯、丁二醇丙醚醋酸酯、丁二醇異丙醚醋酸酯、丁二醇丁醚醋酸酯、丁二醇第2丁醚醋酸酯、丁二醇異丁醚醋酸酯、丁二醇第3丁醚醋酸酯、乙醯醋酸甲酯、乙醯醋酸乙酯、氧代丁酸甲酯、氧代丁酸乙酯、γ-內酯、δ-內酯等。該等可單獨使用,亦可組合兩種以上使用。Further, examples of the ester solvent having 2 to 18 carbon atoms which are preferably used in the organic solvent of the solvent of the present invention include methyl formate, ethyl formate, methyl acetate, ethyl acetate and isopropyl acetate. Ester, butyl acetate, isobutyl acetate, 2 butyl acetate, 3 butyl acetate, amyl acetate, isoamyl acetate, 3 pentyl acetate, phenyl acetate, methyl propionate, propionic acid B Ester, isopropyl propionate, butyl propionate, isobutyl propionate, 2 butyl propionate, 3 butyl propionate, amyl propionate, isoamyl propionate, 3 pentyl propionate , phenyl propionate, methyl lactate, ethyl lactate, methyl methoxypropionate, methyl ethoxypropionate, ethyl methoxypropionate, ethyl ethoxypropionate, ethylene glycol Ether acetate, diethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol propyl ether acetate, ethylene glycol isopropyl ether acetate, ethylene glycol butyl ether acetate, ethylene glycol second Butyl ether acetate, ethylene glycol isobutyl ether acetate, ethylene glycol third butyl ether acetate, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate, propylene glycol propyl ether acetate, propylene glycol isopropyl ether vinegar Ester, propylene glycol butyl ether acetate, propylene glycol 2 butyl ether acetate, propylene glycol isobutyl ether acetate, propylene glycol 3 butyl ether acetate, butanediol methyl ether acetate, butane diol ether acetate, butanediol C Ether acetate, butanediol isopropyl ether acetate, butanediol butyl ether acetate, butanediol second butyl ether acetate, butanediol isobutyl ether acetate, butanediol third butyl ether acetate, Ethyl acetate, ethyl acetate, methyl oxobutyrate, ethyl oxobutyrate, γ-lactone, δ-lactone, and the like. These may be used singly or in combination of two or more.

於本發明之除去劑中,除上述通式(I)所述之環氧化合物、上述有機溶劑之外,亦可根據需要使用各種添加劑。至於該添加劑,可列舉有:無機鹼化合物、有機胺、氨、四級銨鹽等之鹼性化合物;有機酸等酸性化合物;黏度調節劑;勻化劑;消泡劑;抗膠凝劑;分散穩定劑;靜電防止劑;離子性界面活性劑、非離子性界面活性劑等之界面活性劑;水等。該等添加劑之使用量,根據所使用之添加劑之種類加以適宜選擇,通常,相對於上述有機溶劑100質量份,於全部添加劑之合計量為20質量份以下之範圍內進行選擇。In the removal agent of the present invention, in addition to the epoxy compound described in the above formula (I) and the above organic solvent, various additives may be used as needed. Examples of the additive include basic compounds such as an inorganic base compound, an organic amine, ammonia, and a quaternary ammonium salt; an acidic compound such as an organic acid; a viscosity modifier; a homogenizing agent; an antifoaming agent; and an antigelling agent; Dispersion stabilizer; antistatic agent; surfactant such as ionic surfactant, nonionic surfactant; water, etc. The amount of the additives to be used is appropriately selected in accordance with the type of the additive to be used, and is usually selected in the range of 20 parts by mass or less based on 100 parts by mass of the total amount of the organic solvent.

至於本發明之除去劑之用途,可列舉有:於IC或印刷配線基板中作為密封劑使用之樹脂組合物之清洗,附著於金屬模具、加工機械等之塑膠加工用器材上之樹脂組合物之清洗,用於混合或製造樹脂或樹脂組合物的混合或製造裝置之清洗,光阻劑之顯像液、光阻劑之剝離液、光阻.劑裝置之清洗等。For the use of the remover of the present invention, the resin composition used as a sealant in an IC or a printed wiring board is cleaned, and the resin composition is attached to a plastic processing equipment such as a metal mold or a processing machine. Cleaning, cleaning of a mixing or manufacturing apparatus for mixing or manufacturing a resin or a resin composition, development of a photoresist of a photoresist, peeling of a photoresist, cleaning of a photoresist apparatus, and the like.

[實施例][Examples]

以下,藉由實施例及比較例對本發明進行更詳細之說明。然而,本發明不受以下實施例之任何限制。Hereinafter, the present invention will be described in more detail by way of examples and comparative examples. However, the invention is not limited by the following examples.

[實施例1~8及比較例1][Examples 1 to 8 and Comparative Example 1]

於30 mm×50 mm×1 mm之SUS304板上,浸漬塗布藉由下述製造方法製造之黑色樹脂組合物而製為檢測試片。將該檢測試片於除去劑試料(參照表1~表3)中浸漬60秒。此時,於檢驗試片浸漬過程中,以電磁攪拌器攪拌除去劑試料。取撈出檢測試片後,觀察其表面狀態。又,將附著於檢測試片表面之黑色樹脂組合物轉印至玻璃紙膠帶,以馬克貝斯濃度計(馬克貝斯公司製RD-933型)測定轉印前後之玻璃紙膠帶之OD值,算出其增量(△OD)。其等結果示於表1~3。A black resin composition produced by the following production method was immersed and coated on a SUS304 plate of 30 mm × 50 mm × 1 mm to prepare a test piece. The test piece was immersed in the remover sample (refer to Tables 1 to 3) for 60 seconds. At this time, during the impregnation of the test piece, the sample was removed by stirring with a magnetic stirrer. After taking out the test piece, observe the surface state. Further, the black resin composition attached to the surface of the test piece was transferred to a cellophane tape, and the OD value of the cellophane tape before and after the transfer was measured by a Markbes concentration meter (Model RD-933 manufactured by Markbeth) to calculate the increment. (ΔOD). The results are shown in Tables 1-3.

(黑色樹脂組合物之製造方法)(Manufacturing method of black resin composition)

添加43 g 1,1-雙(4'-環氧丙氧基苯基)-1-(1'-聯苯)-1-環己甲烷,11 g丙烯酸,0.05 g 2,6-二-第三丁基對甲酚,0.11 g四丁基銨醋酸鹽及23 g丙二醇-1-甲醚-2-醋酸酯23g,於120℃下攪拌16小時。冷卻至室溫,加入35 g丙二醇-1-甲醚-2-醋酸酯及9.4 g聯苯四羰酸二酸酐,於120℃下攪拌8小時。進而加入6.0 g四氫苯二甲酸酐,分別於120℃下攪拌4小時,100℃下攪拌3小時,80℃下攪拌4小時,60℃下攪拌6小時,40℃下攪拌11小時後,加入29 g丙二醇-1-甲醚-2-醋酸酯。於12 g該組合物中加入8 g三羥甲基丙烷三丙烯酸酯,1.8 g二苯甲酮,3.2 g碳黑(三菱化學公司製「MA100」)及75 g乙基溶纖劑充分攪拌,獲得黑色樹脂組合物。Add 43 g of 1,1-bis(4'-glycidoxyphenyl)-1-(1'-biphenyl)-1-cyclohexanemethane, 11 g of acrylic acid, 0.05 g of 2,6-di- Tributyl-p-cresol, 0.11 g of tetrabutylammonium acetate and 23 g of propylene glycol-1-methyl ether-2-acetate 23 g were stirred at 120 ° C for 16 hours. After cooling to room temperature, 35 g of propylene glycol-1-methyl ether-2-acetate and 9.4 g of biphenyltetracarboxylic acid dianhydride were added, and the mixture was stirred at 120 ° C for 8 hours. Further, 6.0 g of tetrahydrophthalic anhydride was added, and the mixture was stirred at 120 ° C for 4 hours, at 100 ° C for 3 hours, at 80 ° C for 4 hours, at 60 ° C for 6 hours, and at 40 ° C for 11 hours, and then added. 29 g of propylene glycol-1-methyl ether-2-acetate. 8 g of trimethylolpropane triacrylate, 1.8 g of benzophenone, 3.2 g of carbon black ("MA100" manufactured by Mitsubishi Chemical Corporation) and 75 g of ethyl cellosolve were thoroughly stirred in 12 g of the composition. A black resin composition was obtained.

如表1~3所表明,若使用於有機溶液中含有特定之環氧化合物而成之本發明之除去劑,則固體表面得以均勻清洗,殘存於固體表面之樹脂組合物較少(實施例1~8)。與其相對,若使用未含有本發明之特定環氧化合物之除去劑,則固體表面無法得以均勻清洗且形成斑狀,殘存於固體表面之樹脂組合物亦較多(比較例1)。As shown in Tables 1 to 3, when the removing agent of the present invention containing a specific epoxy compound in an organic solution is used, the solid surface is uniformly washed, and the resin composition remaining on the solid surface is less (Example 1) ~8). On the other hand, when a remover which does not contain the specific epoxy compound of the present invention is used, the solid surface cannot be uniformly washed and formed into a patch shape, and the resin composition remaining on the solid surface is also large (Comparative Example 1).

[產業上之可利用性][Industrial availability]

藉由本發明,可提供一種除去劑,其除去效果較大,且未影響及除去樹脂或樹脂組合物後之固體表面之使用。According to the present invention, it is possible to provide a removing agent which has a large removal effect and which does not affect the use of the solid surface after the resin or resin composition is removed.

Claims (3)

一種除去劑,其係用於自固體表面除去或清洗樹脂或樹脂組合物,該除去劑係於100質量份之一種以上有機溶劑中、含有1~100質量份之以下述化學式(I)所表示之環氧化合物者: A removing agent for removing or washing a resin or a resin composition from a solid surface, the removing agent being contained in 100 parts by mass or more of the organic solvent, and containing 1 to 100 parts by mass represented by the following chemical formula (I) The epoxy compound: 如請求項1之除去劑,其中上述有機溶劑係含有50質量%以上之碳數3~18之酮系溶劑者。 The removing agent according to claim 1, wherein the organic solvent contains 50% by mass or more of a ketone solvent having 3 to 18 carbon atoms. 如請求項1之除去劑,其中上述有機溶劑係含有10質量%以上之碳數2~18之酯系溶劑者。The removal agent of claim 1, wherein the organic solvent contains 10% by mass or more of an ester solvent having 2 to 18 carbon atoms.
TW095101608A 2005-02-24 2006-01-16 Resin removal agent TWI384066B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005048299A JP4707409B2 (en) 2005-02-24 2005-02-24 Resin remover

Publications (2)

Publication Number Publication Date
TW200641120A TW200641120A (en) 2006-12-01
TWI384066B true TWI384066B (en) 2013-02-01

Family

ID=36927177

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101608A TWI384066B (en) 2005-02-24 2006-01-16 Resin removal agent

Country Status (5)

Country Link
JP (1) JP4707409B2 (en)
KR (1) KR101251396B1 (en)
CN (1) CN101068915B (en)
TW (1) TWI384066B (en)
WO (1) WO2006090529A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5540917B2 (en) * 2010-06-15 2014-07-02 横浜ゴム株式会社 Paint remover
CN103157621A (en) * 2011-12-13 2013-06-19 贵州黎阳航空动力有限公司 Chemical method for clearing sealant and solution prepared by using chemical method
JP6260441B2 (en) * 2014-04-30 2018-01-17 旭硝子株式会社 Removal method of resin layer
KR102097253B1 (en) * 2019-12-12 2020-04-03 하민아 Mixed solvent composition and cleaning agent for paint comprising the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07216398A (en) * 1994-01-31 1995-08-15 Asahi Chem Ind Co Ltd Detergent
CN1159478A (en) * 1995-11-13 1997-09-17 株式会社日本能源 Lowly corrosive cleaner composition
JPH1036890A (en) * 1996-07-22 1998-02-10 Asahi Chem Ind Co Ltd Ink cleaning agent
JPH1135993A (en) * 1997-07-23 1999-02-09 Sanyo Chem Ind Ltd Detergent composition for screen printing plate
US6828295B2 (en) * 2001-09-10 2004-12-07 Proacter & Gamble Company Non-silicone polymers for lipophilic fluid systems

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09194891A (en) * 1995-11-13 1997-07-29 Japan Energy Corp Low corrosive cleaning composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07216398A (en) * 1994-01-31 1995-08-15 Asahi Chem Ind Co Ltd Detergent
CN1159478A (en) * 1995-11-13 1997-09-17 株式会社日本能源 Lowly corrosive cleaner composition
JPH1036890A (en) * 1996-07-22 1998-02-10 Asahi Chem Ind Co Ltd Ink cleaning agent
JPH1135993A (en) * 1997-07-23 1999-02-09 Sanyo Chem Ind Ltd Detergent composition for screen printing plate
US6828295B2 (en) * 2001-09-10 2004-12-07 Proacter & Gamble Company Non-silicone polymers for lipophilic fluid systems

Also Published As

Publication number Publication date
JP2006232957A (en) 2006-09-07
CN101068915A (en) 2007-11-07
TW200641120A (en) 2006-12-01
KR20070106498A (en) 2007-11-01
CN101068915B (en) 2012-12-26
KR101251396B1 (en) 2013-04-05
WO2006090529A1 (en) 2006-08-31
JP4707409B2 (en) 2011-06-22

Similar Documents

Publication Publication Date Title
EP1016699B1 (en) Use of a solvent composition comprising an oxyisobutyric acid ester as a cleaning agent
US5612303A (en) Solvent composition
CN101544932B (en) Stripper for dry film removal
TWI494713B (en) Photoresist stripping solution
TW201533549A (en) Photoresist stripper
JP3248780B2 (en) Solvent for removing and cleaning resist and method for producing base material for producing electronic parts using this solvent
TWI384066B (en) Resin removal agent
TW201635051A (en) Resist stripper
JP5593678B2 (en) Quinonediazide photosensitizer solution and positive resist composition
JP2016095413A (en) Resist removal liquid
WO2007074862A1 (en) Cleaning liquid for photolithography and method of circulation and use of the same
JP2018511079A (en) Compositions and methods for promoting charge complex copper protection in low PKA driven polymer strips
TWI418957B (en) Recycling method for resist stripper scrapped and recycling device for the same
JP2009115929A (en) Stripper for color resist
TWI559102B (en) Resin stripping solution
CN104391428B (en) Emulsion, photoetching compositions and preparation method containing diazonium groups
KR101741839B1 (en) Cleaning Composition for removing photosensitive resin
CN102147576A (en) Photoresist stripping liquid composite
CN103733137A (en) resist stripper
KR20060064933A (en) Cleaning liquid composition, preparation method thereof and recovery method thereof
KR100843984B1 (en) Thinner composition for removing the photosensitive resin composition
CN100595680C (en) Thinner composition for removing photosensitive resin
TW201631414A (en) Photoresist stripping liquor
US20060287533A1 (en) Solvent containing 1,2,5-thiadiazole compound, and method for extracting an organic compound using the solvent
JP4536318B2 (en) Color filter protective film material and color filter protective film