WO1996037573A1 - Process for the production of photochromic product of curing - Google Patents
Process for the production of photochromic product of curing Download PDFInfo
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- WO1996037573A1 WO1996037573A1 PCT/JP1996/001384 JP9601384W WO9637573A1 WO 1996037573 A1 WO1996037573 A1 WO 1996037573A1 JP 9601384 W JP9601384 W JP 9601384W WO 9637573 A1 WO9637573 A1 WO 9637573A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
- C09K9/02—Organic tenebrescent materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
- G03C1/733—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/163—Radiation-chromic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/91—Treatment through an external filter or mask, nonphotograghic process
Definitions
- the present invention relates to a method for producing a photochromic cured product which is polymerized and cured by a photopolymerization method, and the cured product exhibits good photomouth mixability.
- Photochromism is a phenomenon that has been attracting attention for several years.
- a compound When a compound is irradiated with light containing ultraviolet light, such as sunlight or light from a mercury lamp, the color changes rapidly, and the light irradiation is stopped. It is a reversible action that returns to the original color in the dark.
- a compound having this property is called a photomix compound, and compounds having various structures have been conventionally synthesized, but no special common skeleton is recognized in the structure.
- the cured product exhibiting photochromic properties is obtained by coating the photochromic compound on the surface of a preformed polymer, or by dissolving the photochromic compound in a radical polymerizable monomer followed by polymerization and curing. Obtained by a method such as
- a method of polymerizing a radical polymerizable monomer a method of promoting polymerization by heat and a method of promoting polymerization by light are generally known.
- the photopolymerization method involves the absorption of ultraviolet light necessary for cleavage of a photopolymerization initiator by a contained photochromic compound and the irradiation of light. Therefore, it is not possible to expect a suitable polymerization of the radical polymerizable monomer because light transmission is impaired by the color development of the photochromic compound itself.
- an object of the present invention is to adopt a photopolymerization method and to provide a method of obtaining a cured product which can be easily polymerized in a short time and whose cured product has excellent photochromic properties. Disclosure of the invention
- the present invention provides (A) a radical polymerizable monomer, (B) a main absorption in the ultraviolet region, and a molar extinction coefficient at 400 nm of at least 150 liters Z (mo 1 ⁇ cm).
- a photopolymerizable composition containing an ultraviolet polymerization initiator and a photochromic compound (C) is irradiated with an active energy ray having a light emission spectrum of 400 nm or more as a main spectrum. This is a method for producing a photochromic cured product, which is characterized by being cured by heating.
- radical polymerizable monomer used in the method for producing a photochromic cured product of the present invention a monomer having a radical polymerizable group can be used without any limitation.
- Suitable radical polymerizable groups include acrylate groups, methacrylate groups, and vinyl groups.
- radically polymerizable monomers that can be suitably used in the present invention are, for example, compounds represented by formulas (1), (2) and (3).
- formula (1) compounds represented by formulas (1), (2) and (3).
- R is the same or different hydrogen atom or methyl group
- A is the same or different alkylene group, oxyalkylene group or
- n is an integer from 1 to 20;
- R-: 'and are the same or different hydrogen atoms or methyl groups, respectively, and R 4 and R 5 are the same or different alkylene groups which may be substituted or
- radical polymerizable monomer that can be suitably used in the present invention are as follows.
- diacrylate or dimethacrylate compound examples include, for example, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, butanediol dimethacrylate, hexamethylene dimethacrylate, and bisulfite.
- Phenol dimethacrylate 2,2-bis (4-methacryloyloxyethoxy-1,3,5-dibromophenyl) propane, 2,2-bis (4-methacryloyloxyethoxyphenylpropane, 2,2-— Bis (4-methacryloyloxydiethoxyphenylpropane, 2,2-bis (4-methacryloyloxytriethoxyphenylpropane, 2,2-bi (4-methacryloyloxybenzene) Ethoxyphenyl propane, etc.
- Epoxy group-containing It is a chestnut rates compound or methacrylic rate compounds, such as glycidyl ⁇ click relays DOO, glycidyl methacrylate rate, S-methylstyrene Dali glycidyl ⁇ click Li rate-methylstyrene Dali glycidyl meth click Relay And bisphenol A-monoglycidyl ether methacrylate.
- glycidyl ⁇ click DOO, glycidyl methacrylate rate, S-methylstyrene Dali glycidyl ⁇ click Li rate-methylstyrene Dali glycidyl meth click Relay And bisphenol A-monoglycidyl ether methacrylate.
- vinylbenzyl compound examples include bis-4-vinylbenzyl ether, bis-4-vinylbenzyl sulfide, 1,2- (p-vinylbenzyloxy) ethane, 1,2- ( ⁇ -vinylbenzyl) Thio) ethane, bis- (p-vinylbenzyloxyshethyl) sulfide and the like.
- unsaturated carboxylic acid, acrylic acid and methacrylic acid ester, fumaric acid ester and aromatic vinyl compound can also be used as the radical polymerizable monomer.
- unsaturated carboxylic acid compounds include acrylic acid, methacrylic acid, maleic anhydride, fumaric acid, and acrylic acid.
- methacrylic acid esters examples include methyl acrylate, methyl methyl methacrylate, and methacrylic acid.
- Benzyl acid, phenyl methacrylate, tribromophenyl methacrylate, 2-hydroxyshethyl methacrylate, trifluoromethyl methacrylate, urethane acrylate, and fumarate esters such as monomethyl fumarate examples include dimethyl fumarate, diphenyl fumarate, and examples of the aromatic vinyl compound include styrene, chlorostyrene, a-methylstyrene, vinylnaphthalene, isobrobenylnaphthalene, bromostyrene, and divinylbenzene. These radically polymerizable monomers may be used alone or in combination of two or more.
- the cured product obtained by photopolymerizing a mixture of a photomixable compound and a radical polymerizable monomer which will be described later, has photochromic durability and color elimination.
- the acrylate compound or dimethacrylate compound represented by the above-mentioned general formula (1) and the epoxy group-containing acrylate compound or methacrylate represented by the general formula (2) It is preferable to use a radically polymerizable monomeric "" mixture obtained by mixing a compound with the compound.
- ultraviolet light having a main absorption in the ultraviolet region and a molar extinction coefficient at 400 nm of not less than 150 liters / (mo 1 ⁇ cm) is used. It is essential to use a coalescence initiator. It is not preferable to use a photopolymerization initiator having a main absorption in the visible region of 400 nm or more, since the photoinitiator itself is colored and is colored before the photochromic property is exhibited. . Furthermore, even if there is a main absorption in the ultraviolet region, if the molar absorption coefficient at 400 nm is less than 150 liters / (mo 1 -cm), the emission efficiency at 40 O nm or more will be described later.
- photochromic compounds generally absorb ultraviolet rays from 380 nm to 400 nm to form a color, so that the photoinitiator absorbs the active energy ray for cleavage and the cleavage occurs. And the polymerization cannot be completed in a short time. Exposing the active energy beam for a long time to complete the polymerization causes degradation of the photochromic compound.
- Ultraviolet polymerization initiators can be broadly classified into self-cleaving type and hydrogen abstraction type.
- the latter ultraviolet polymerization initiator is generally used in combination with a photosensitizer.
- An amine compound is generally used as the photosensitizer.
- the initial coloring of the polymer becomes large, so that it is preferable to use a self-cleaving type ultraviolet polymerization initiator.
- self-cleaving UV polymerization initiators ⁇ -aminoalkylphenone UV polymerization initiators, acylphosphinoxide UV polymerization initiators, and bisacyl are preferred because of the colorless and transparent nature of the resulting cured product.
- a phosphoxide-based UV polymerization initiator is preferably employed.
- the suitable ultraviolet polymerization initiator is not particularly limited, but typical examples include compounds represented by the following formulas (4), (5) and (6).
- R 11 are the same or different and are a methyl group or an ethyl group
- R 12 are the same or different and are a methyl group, a methoxy group or a chlorine atom, e is 2 or 3, and R 13 is a phenyl group or a methoxy group,
- R 14 are the same or different and each is a methyl group, a methoxy group or a chlorine atom, f is 2 or 3, and R 15 is a 2,4,4-trimethylpentyl group ,
- UV polymerization initiator having a light absorption coefficient of at least 150 liters (mo 1 ⁇ cm) that can be suitably used are as follows.
- UV polymerization initiators can be used alone or in combination of two or more.
- the amount of the UV polymerization initiator to be added depends on the polymerization conditions, the type of the initiator, the type of the radical polymerizable monomer, and the composition, and cannot be limited unconditionally.
- the radical polymerizable monomer 1 It is in the range of 0.01 to 1 part by weight, preferably 0.05 to 1 part by weight, based on 0.00 part by weight.
- the addition amount exceeds 1 part by weight, the internal uniformity of the obtained polymer is poor and the hue is also deteriorated.
- the amount is less than 0.01 part by weight, a sufficient degree of curing cannot be obtained.
- a thermal polymerization initiator may be added in addition to the ultraviolet polymerization initiator.
- thermal polymerization initiators that can be added can be used without limitation.
- the thermal polymerization initiator include di-silver oxides such as benzoyl peroxyside and lauroyl peroxy-xide; peroxy esters such as t-butyl vinyloxy neodecane; diisopropyl peroxydi carbonate; And azo compounds such as azobisisobutyronitrile.
- the photochromic compound contained in the photopolymerizable composition used in the present invention can be used without any limitation as long as its absorption at the time of color development is in the visible light range.
- the absorption in the visible region shows that a photochromic compound exhibiting absorption characteristics around 400 to 480 nm has a color tone from yellow to orange, and a photochromic compound exhibiting absorption characteristics around 480 to 550 nm.
- the color compounds exhibit a red to purple color tone
- the photo compounds exhibiting absorption characteristics near 550 to 600 nm exhibit a purple to blue color tone.
- These photochromic compounds may be used alone, or a combination of two or more of them can provide an intermediate color tone such as gray, brown and amber.
- Examples of the photochromic compound suitably used in the present invention include a chromene compound, fulgide or a fulgimide compound and a spiroxazine compound.
- chromene compound a known compound having a chromene skeleton and having photochromic properties can be used without any limitation, and specific examples include the following compounds.
- chromene fulgide compound a known compound having a fulgide skeleton and having photochromic properties can be used without any limitation.
- chromene fulgide compound a known compound having a fulgide skeleton and having photochromic properties can be used without any limitation.
- spirooxazine compound a known compound having a spirooxazine skeleton and having photochromic properties can be employed without any limitation, and specific examples include the following compounds.
- Spiroxazine compounds a known compound having a spirooxazine skeleton and having photochromic properties
- the amount of the photochromic compound to be added may be appropriately selected depending on the concentration at the time of color development, but is usually 0.001 to 1.0 part by weight, preferably 0.01 to 1.0 part by weight, per 100 parts by weight of the radical polymerizable monomer. It is in the range of ⁇ 0.5 parts by weight. If the amount of the photochromic compound is less than 0.001 part by weight, a sufficient color density cannot be obtained, and the durability of the photochromic property is reduced. If it exceeds 1.0 parts by weight, polymerization will not be completed in a short time. Easy, not preferred.
- the photopolymerizable composition used in the present invention includes various types of stabilizers such as a release agent, an ultraviolet absorber, an ultraviolet stabilizer, an antioxidant, a coloring inhibitor, an antistatic agent, a fluorescent dye, a dye, a pigment, a fragrance, and the like. Additives and the like can be selected and blended as needed.
- an active energy ray having an emission spectrum of 400 nm or more as a main spectrum in other words, a spectrum in a visible light region is mainly used. Anything that emits as a vector can be used.
- metal halide lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, germicidal lamps, xenon lamps, tungsten lamps, etc. are used.
- a photochromic compound absorbs ultraviolet rays from 380 nm to 400 nm to form a color, so the photochromic compound after coloring absorbs an active energy ray for cleavage of a photopolymerization initiator. As a result, cleavage becomes difficult to occur, and the polymerization cannot be completed in a short time. Irradiation with active energy rays for a long time to complete the polymerization will cause the degradation of the photochromic compound. Therefore, if the light source also emits ultraviolet light, use an ultraviolet cut filter or the like to block or reduce the active energy rays in the ultraviolet region to suppress the color development of the photochromic compound, It is possible to use even a light source including.
- the energy ray may partially include an ultraviolet ray having an activity-energy ray of less than 400 nm.
- the photochromic compound is weakly colored by the ultraviolet active energy rays and partially absorbs the active energy rays, the active energy rays having a wavelength of 400 nm or more can be substantially transmitted.
- the UV polymerization initiator can be cleaved, polymerization and curing proceed sufficiently.
- the irradiation time varies depending on the wavelength and intensity of the light source, the shape and the constituents of the cured body, and it is desirable to determine the irradiation time in advance by preliminary experiments and the like.
- a material that easily transmits ultraviolet light such as English glass, is preferable, but the material is not limited as long as it is transparent. Also, there is no problem if polymerization is performed while applying pressure from the outside during molding.
- the production method of the present invention can be applied to a known casting polymerization method.
- the photopolymerizable composition is injected between the molds held by the elastomer gasket or the spacer, and is irradiated with the active energy, cured, and then taken out.
- the photochromic cured product obtained by the method of the present invention can be further subjected to the following treatment depending on the use. That is, staining are use a disperse dye or the like, a silane coupling agent or Geimoto, zirconium, antimony, aluminum, tin, hard co mainly of sol component such as tungsten - DOO agent and, S i 0 2, T i 0 2, the antireflection treatment by the application of a thin film deposition or an organic polymer thin film of Z r metal oxide such as 02, can be subjected to machining Contact and secondary treatment of the antistatic treatment or the like.
- staining are use a disperse dye or the like, a silane coupling agent or Geimoto, zirconium, antimony, aluminum, tin, hard co mainly of sol component such as tungsten - DOO agent and, S i 0 2, T i 0 2, the antireflection treatment by the application of a thin film deposition or an organic polymer
- the photopolymerization method of the present invention By adopting the production method by the photopolymerization method of the present invention, it is possible to obtain a photochromic cured product having high color density and sufficient hardness without deterioration of the photochromic compound in a short time.
- the cured product changes from colorless to colored by light including ultraviolet rays such as sunlight or light from a mercury lamp, and the change is reversible and has excellent dimming properties. Therefore, the obtained cured product is useful as an organic glass having photochromic properties, and can be suitably used, for example, for photochromic lens applications.
- radical monomers used in the following examples are as follows.
- Ml 2 Bentaerythritol triacrylate hexamethylene diisodiisocyanate urethane prepolymer polymer is the following compound.
- F 1 N-Methyl-6,7-dihydro 4-methylspiro (5,6-benzo [b] thiophenedicarboximidido 7,2-tricyclo [3.3.1.1] decane
- F 2 N-cyanomethyl-6,7-dihydro 4-methyl-12-phenylspiro (5,6-benzo [b] thiophenedicarboxymido 7,2, -tricyclo [3.3.1.1] decane spiroxazine
- the mixed solution was injected into a mold composed of a glass plate and a gasket made of ethylene-pinyl acetate copolymer, and the active energy of 400 nm or more was substantially applied between the metal halide lamp and the mold.
- the curability of the obtained cured product (2 mm thick) was photopolymerized under the same conditions without adding a photochromic compound, and the curability was evaluated by comparing the hardness.
- the evaluation was as follows.
- a xenon lamp L-1480 (30 OW) SHL-100 manufactured by Hamamatsu Photonics was applied to the polymer through an air port mass filter (manufactured by Koning Co., Ltd.). ° C ⁇ 1 ° C, Beam intensity at polymer surface 365 nm
- Example 1 was performed in the same manner as in Example 1 except that the types of the photochromic compound and the radical polymerizable monomer shown in Example 1 were changed. The results are shown in Table 2.
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- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Description
Claims
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53556296A JP3385029B2 (ja) | 1995-05-26 | 1996-05-24 | フォトクロミック硬化体の製造方法 |
| US08/776,030 US5910516A (en) | 1995-05-26 | 1996-05-24 | Process for production of photochromic cured product |
| AU57793/96A AU696006B2 (en) | 1995-05-26 | 1996-05-24 | Process for production of photochromic cured product |
| DE69603339T DE69603339T2 (de) | 1995-05-26 | 1996-05-24 | Photochromische zusammensetzung und herstellungsverfahren eines photochromischen, gehärteten produkts |
| EP96914424A EP0773271B1 (en) | 1995-05-26 | 1996-05-24 | Process for the production of photochromic product of curing |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7/128145 | 1995-05-26 | ||
| JP7128145A JPH08319481A (ja) | 1995-05-26 | 1995-05-26 | フォトクロミック硬化体の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1996037573A1 true WO1996037573A1 (en) | 1996-11-28 |
Family
ID=14977509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1996/001384 Ceased WO1996037573A1 (en) | 1995-05-26 | 1996-05-24 | Process for the production of photochromic product of curing |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5910516A (ja) |
| EP (1) | EP0773271B1 (ja) |
| JP (2) | JPH08319481A (ja) |
| AU (1) | AU696006B2 (ja) |
| DE (1) | DE69603339T2 (ja) |
| ES (1) | ES2135899T3 (ja) |
| WO (1) | WO1996037573A1 (ja) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002014387A1 (fr) * | 2000-08-11 | 2002-02-21 | Tokuyama Corporation | Procede pour produire une composition photochromique durcie |
| US6362248B1 (en) * | 1998-01-26 | 2002-03-26 | Tokuyama Corporation | Photochromic polymerizable composition |
| US6602603B2 (en) | 1999-07-02 | 2003-08-05 | Ppg Industries Ohio, Inc. | Poly(meth)acrylic photochromic coating |
| US7189456B2 (en) | 2004-03-04 | 2007-03-13 | Transitions Optical, Inc. | Photochromic optical article |
| US7261843B2 (en) | 2004-03-04 | 2007-08-28 | Transitions Optical, Inc. | Photochromic optical article |
| US7410691B2 (en) | 2001-12-27 | 2008-08-12 | Ppg Industries Ohio, Inc. | Photochromic optical article |
| US7411034B2 (en) | 2002-12-20 | 2008-08-12 | Ppg Industries Ohio, Inc. | Sulfide-containing polythiols |
| US7452611B2 (en) | 2001-12-27 | 2008-11-18 | Transitions Optical, Inc. | Photochromic optical article |
| US7553925B2 (en) | 2006-05-05 | 2009-06-30 | Ppg Industries Ohio, Inc. | Thioether functional oligomeric polythiols and articles prepared therefrom |
| US8835592B2 (en) | 2004-09-01 | 2014-09-16 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
| JPWO2014051046A1 (ja) * | 2012-09-27 | 2016-08-22 | Jnc株式会社 | 光造形用重合性組成物 |
| US9464169B2 (en) | 2004-09-01 | 2016-10-11 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
| US9598527B2 (en) | 2004-09-01 | 2017-03-21 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
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- 1996-05-24 ES ES96914424T patent/ES2135899T3/es not_active Expired - Lifetime
- 1996-05-24 AU AU57793/96A patent/AU696006B2/en not_active Expired
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- 1996-05-24 JP JP53556296A patent/JP3385029B2/ja not_active Expired - Lifetime
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Cited By (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6362248B1 (en) * | 1998-01-26 | 2002-03-26 | Tokuyama Corporation | Photochromic polymerizable composition |
| US6602603B2 (en) | 1999-07-02 | 2003-08-05 | Ppg Industries Ohio, Inc. | Poly(meth)acrylic photochromic coating |
| WO2002014387A1 (fr) * | 2000-08-11 | 2002-02-21 | Tokuyama Corporation | Procede pour produire une composition photochromique durcie |
| US6864299B1 (en) | 2000-08-11 | 2005-03-08 | Tokuyama Corporation | Process for producing cured photochromic |
| AU2000264754B2 (en) * | 2000-08-11 | 2005-08-04 | Tokuyama Corporation | Process for producing cured photochromic |
| US7410691B2 (en) | 2001-12-27 | 2008-08-12 | Ppg Industries Ohio, Inc. | Photochromic optical article |
| US7452611B2 (en) | 2001-12-27 | 2008-11-18 | Transitions Optical, Inc. | Photochromic optical article |
| US7411034B2 (en) | 2002-12-20 | 2008-08-12 | Ppg Industries Ohio, Inc. | Sulfide-containing polythiols |
| US7491790B2 (en) | 2002-12-20 | 2009-02-17 | Ppg Industries Ohio, Inc. | Sulfide-containing polythiols |
| US7189456B2 (en) | 2004-03-04 | 2007-03-13 | Transitions Optical, Inc. | Photochromic optical article |
| US7261843B2 (en) | 2004-03-04 | 2007-08-28 | Transitions Optical, Inc. | Photochromic optical article |
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| US9994670B2 (en) | 2004-09-01 | 2018-06-12 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
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| US10590230B2 (en) | 2004-09-01 | 2020-03-17 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
| US11008418B2 (en) | 2004-09-01 | 2021-05-18 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
| US11149107B2 (en) | 2004-09-01 | 2021-10-19 | Ppg Industries Ohio, Inc. | Polyurethanes, articles and coatings prepared therefrom and methods of making the same |
| US11248083B2 (en) | 2004-09-01 | 2022-02-15 | Ppg Industries Ohio, Inc. | Aircraft windows |
| US7553925B2 (en) | 2006-05-05 | 2009-06-30 | Ppg Industries Ohio, Inc. | Thioether functional oligomeric polythiols and articles prepared therefrom |
| JPWO2014051046A1 (ja) * | 2012-09-27 | 2016-08-22 | Jnc株式会社 | 光造形用重合性組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2135899T3 (es) | 1999-11-01 |
| EP0773271B1 (en) | 1999-07-21 |
| US5910516A (en) | 1999-06-08 |
| AU696006B2 (en) | 1998-08-27 |
| EP0773271A4 (en) | 1997-08-20 |
| AU5779396A (en) | 1996-12-11 |
| JP3385029B2 (ja) | 2003-03-10 |
| EP0773271A1 (en) | 1997-05-14 |
| DE69603339D1 (de) | 1999-08-26 |
| JPH08319481A (ja) | 1996-12-03 |
| DE69603339T2 (de) | 2000-03-30 |
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