TWM341704U - Folding vacuum apparatus - Google Patents
Folding vacuum apparatus Download PDFInfo
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- TWM341704U TWM341704U TW97206790U TW97206790U TWM341704U TW M341704 U TWM341704 U TW M341704U TW 97206790 U TW97206790 U TW 97206790U TW 97206790 U TW97206790 U TW 97206790U TW M341704 U TWM341704 U TW M341704U
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- 239000000758 substrate Substances 0.000 claims description 67
- 239000007003 mineral medium Substances 0.000 claims 1
- 239000002689 soil Substances 0.000 claims 1
- 230000007723 transport mechanism Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 230000032258 transport Effects 0.000 description 10
- 238000009434 installation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 241001494479 Pecora Species 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 210000000496 pancreas Anatomy 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Description
M341704 八、新型說明: 【新型所屬之技術領域】 本新型是有關於一種真空裝置,特別是指一種供鍍膜 作業使用的折合式真空裝置。 【先前技術】 在半導體、電機電子與光電產業中,許多製程都需要 在真空裝置中進行鍍膜,而且隨著製品需求的不同,有此 基板需要經過多道鍍膜步驟以形成多種不同材質的臈層,M341704 VIII. New description: [New technical field] The present invention relates to a vacuum device, in particular to a folding vacuum device for coating work. [Prior Art] In the semiconductor, motor, electronics, and optoelectronic industries, many processes require coating in a vacuum device, and depending on the requirements of the product, the substrate needs to undergo multiple coating steps to form a plurality of different layers of germanium. ,
為此目如市面上已出現一種如圖1所示之真空裳置1,At 用於供多數片連續排列的基板10輸送通過,其包含多數個 長串連接排列的中空腔體u、一用於帶動基板1〇輸送通過 該等腔體11的輸送單i 12,及多數個分別安裝在腔體^For this reason, for example, a vacuum skirt 1 as shown in FIG. 1 has appeared on the market, and At is used for transporting a plurality of substrates 10 in a continuous arrangement, which comprises a plurality of long-chain connected hollow cavities, one for use. a transport unit i 12 that transports the substrate 1 through the chambers 11, and a plurality of tubes are respectively mounted in the chambers ^
曰例丄且用於在基板10上鍍膜的靶材13。腔體U的數 量對應於所設定之鍍膜層數,每一腔豸U $有一可被 啟閉的腔室11 1。 I 級胰日f,操作人員將基板 且立排放在輸送單元12 上,利用輸送單it 12送入腔體u巾,並循著箭頭所示方向 ㈣該等腔室⑴中,藉由婦13分別在基板1G上鑛膜, 最後再將基板H)送出。當然,在實際操作時,為了加速製 程,:般會持續地將基板1G接連放置在輸送單元12上, 以連續不斷地進行鍍膜作業。 雖然上述真空裝置1之每一 靶材13皆會在基板10表 面鍍上不同膜層,但是由於該真 .M 具二裝置1僅呈早線排列, 故§腔體11的數目較多時,真处 、二裝置1的延伸長度會相當 M341704 長,此時,廠房就需要佔用較寬敞的地方,導致所須成本 較南。此外’當基板10需要鍍上的膜層數目較真空裝置1 設置的腔體11的數目多,或是需要在基板10之雙側表面上 都要鍍膜時,操作人員必須分批多次地將基板1〇重覆送入 真空裝置1,進行不同材質的鍍膜,此將造成生產效率較低 〇 【新型内容】 因此’本新型之目的,即在提供一種減少佔用空間且 生產效率較高的折合式真空裝置。 於是,本新型折合式真空裝置,供至少一基板輸送通 過,並包含:一第一腔體單元、一第二腔體單元、一真空 連接單元、多數個第一靶材,及多數個第二靶材。 該第一腔體單元包括内、外間隔相對之一第一内壁與 第外壁、間隔相對地形成在第一内壁與第一外壁之間 兩端的一第一入口與一第一出口,及多數個彼此連接串列 地形成在第一入口與第一出口之間的第一腔室,所述基板 台由第一入口進入,通過該等第一腔室之後再由第一出口 輸出。 該第二腔體單元與第一腔體單元對應並列,並包括内 外間隔相對之一第二内壁與一第二外壁、間隔相對地形 、在苐一内壁與第一外壁之間兩端的一第二出口與一第二 入口,及多數個彼此連接串列地形成在第二出口與第二入 口之間的第二腔室,該第二内壁鄰近第一内壁,且第二外 壁逖離第一内壁,所述基板會由第二入口進入,通過該等 6 M341704 第二腔室之後再由第二出口輸出。 該真空連接單元係連接第一腔體單元與第二腔體單元 ’並包括一女裝在弟一出口旁側的第一迴轉件,及一安裝 在第二入口旁側的第二迴轉件,第一迴轉件將輸出第一出 口之基板轉向輸送至第二迴轉件,且第二迴轉件再將基板 轉向送入第二入口。A target 13 for coating on the substrate 10 is exemplified. The number of cavities U corresponds to the number of coating layers set, and each chamber U $ has a chamber 11 1 that can be opened and closed. Class I pancreas day f, the operator discharges the substrate on the transport unit 12, and sends it to the cavity u towel by the transport unit it 12 and follows the direction indicated by the arrow (4) in the chamber (1), by the woman 13 The film is deposited on the substrate 1G, and finally the substrate H) is sent out. Of course, in actual operation, in order to speed up the process, the substrate 1G is continuously placed on the transport unit 12 in succession to continuously perform the coating operation. Although each of the targets 13 of the vacuum device 1 is coated with a different film layer on the surface of the substrate 10, since the two devices 1 are arranged only in the early line, when the number of the cavity 11 is large, The length of the extension and the length of the second unit 1 will be equivalent to M341704. At this time, the factory needs to occupy a relatively large space, resulting in a relatively low cost. In addition, when the number of layers to be plated on the substrate 10 is larger than the number of the cavities 11 provided in the vacuum device 1, or when it is required to be coated on both surfaces of the substrate 10, the operator must repeatedly apply the batches in batches. The substrate 1 is repeatedly fed into the vacuum device 1 to perform coating of different materials, which results in low production efficiency. [New content] Therefore, the object of the present invention is to provide a reduction in space consumption and high production efficiency. Vacuum device. Therefore, the novel folding vacuum device is configured to transport at least one substrate, and comprises: a first cavity unit, a second cavity unit, a vacuum connection unit, a plurality of first targets, and a plurality of second Target. The first cavity unit includes a first inlet and a first outlet opposite to the first inner wall and the outer wall, and a first inlet and a first outlet spaced apart from each other between the first inner wall and the first outer wall, and a plurality of A first chamber is formed in series between the first inlet and the first outlet, the substrate stage being accessed by the first inlet, and then outputted by the first outlet through the first chamber. The second cavity unit is juxtaposed with the first cavity unit, and includes a second inner wall and a second inner wall and a second outer wall spaced apart from each other, and a second portion between the inner wall and the first outer wall An outlet and a second inlet, and a plurality of second chambers connected in series between the second outlet and the second inlet, the second inner wall being adjacent to the first inner wall, and the second outer wall being separated from the first inner wall The substrate is accessed by the second inlet, and then passed through the second outlet after the 6 M341704 second chamber. The vacuum connecting unit is connected to the first cavity unit and the second cavity unit 'and includes a first rotating member on the side of the outlet of the female, and a second rotating member mounted on the side of the second inlet. The first rotating member turns the substrate outputting the first outlet to the second rotating member, and the second rotating member turns the substrate into the second inlet.
該等第一靶材分別安裝在第一内壁或/及第一外壁上且 連通第一腔室,乃用於在所述基板上鍍膜。 該等第二靶材分別安裝在第二内壁或/及第二外壁上且 連通第二腔室,乃用於在所述基板上鍍膜。 【實施方式】 有關本新型之前述及其他技術内容、特點與功效’在 以下配合參考圖式之四個較佳實施例的詳細說明中,將可 清楚的呈現。 隹+坷尘被砰細描述之前,要注%、〜心 明内容中’類似的元件是以相同的編號來表示。 例:斤示’本新型折合式真空裝置之第-較佳實施 彳’疋〇數片連續排列的基板2輸送通過 板 具有内外相反之一内側面?1命 裝置包〜… 侧面22。該折合式真空 "3 、、平仃排列之一第一腔體單元3盥一第-腔 體單元4、一 i車垃铱卞興弟一腔 連接單元5用"' 單元3與第二腔體單元4的真空 連接早兀5、—用於輪送所述基板 分別安裝在第-腔體單元3上之第_1=機構6、多數個 安裝在第二腔體單元4上之第二無材%及多數個分別 M341704 該第一腔體單元3包括内、外間隔相對且左右長向延 伸之一第一内壁3 1與一第一外壁32、左右間隔相對地形成 在第一内壁31與第一外壁32之間兩端的一第一入口 %與 一第一出口 34、多數個彼此連接串列地形成在第一入口 33 與第一出口 34之間的第一腔室35,及多數個分別安裝在兩 相鄰之第一腔室35間的第一閥門36。該等第一腔室35皆 為真空狀態。而第一閥門36可受電腦控制而開啟或關閉,The first targets are respectively mounted on the first inner wall or/and the first outer wall and communicate with the first chamber for coating on the substrate. The second targets are respectively mounted on the second inner wall or/and the second outer wall and communicate with the second chamber for coating on the substrate. The above and other technical contents, features and effects of the present invention will be apparent from the following detailed description of the preferred embodiments. Before the 隹+坷尘 is described in detail, the similar elements in the % and ~ 心 content are indicated by the same number. Example: The first preferred embodiment of the present invention is a - 疋〇 疋〇 疋〇 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 连续 基板 基板 基板 基板 基板 基板1 life Device package ~... Side 22. The folded vacuum "3, one of the first cavity unit 3, the first cavity unit 4, and the i-car 铱卞 弟 一 one cavity connection unit 5 use "' unit 3 and the second cavity The vacuum connection of the body unit 4 is as early as 5, the _1 = mechanism 6 for rotating the substrate respectively mounted on the first cavity unit 3, and the second one mounted on the second cavity unit 4 The first cavity unit 3 includes the inner and outer portions, and the first inner wall 31 and the first outer wall 32 are oppositely formed on the first inner wall 31. a first inlet % and a first outlet 34 at both ends of the first outer wall 32, and a plurality of first chambers 35 connected in series between the first inlet 33 and the first outlet 34, and a plurality of A first valve 36 is mounted between the two adjacent first chambers 35, respectively. The first chambers 35 are all in a vacuum state. The first valve 36 can be turned on or off by computer control.
能用以控制第一腔室35間之連通與否,圖2中第一閥門% 為開啟狀態。 該第二腔體單元4與第一腔體單元3結構相同且對應 並列,並包括内、外間隔相對且左右長向延伸之一第二内 壁41與一第二外壁42、左右間隔相對地形成在第二内壁 41與第一外壁42之間兩端的一第二出口 43與一第二入口 44、多數個彼此連接串列地形成在第二出口 43與第二入口 44之間的第一腔i 45,及多數個分別安裝在兩相鄰之第二 月工至45間的第一閥門46。該第二内壁41鄰近第一内壁” ’且第二外壁42遠離第一内壁3卜第二腔室“亦為真空 狀態’且第二閥門46同樣是用來控制第二腔室45之連通 與否,在此不再詳細說明。 、該真空連接單元5包括-安裝在第—出σ34旁側的第 一迴轉件51、一安裝在第二入口 44旁侧的第二迴轉件52 ’及一連接在第一迴轉件51與第二迴轉件52之間的連接 腔體53。該連接腔體53具有一連接腔室531。該真空連接 早凡5還包括—安I在連接腔體53之外侧上且連通該連接 8 M341704 ^ 腔室531的連接靶材54。本實施例之第一、二迴轉件51、 52可被控制而順時鐘旋轉,當然也可以設計為逆時鐘旋轉 。另外,該真空連接單元5亦可以省略連接靶材54的設置 ,甚至也可以連同連接腔體53 一起省略,而讓第一、二迴 轉件51、52直接轉動接觸。 , 該輸送機構6包括一帶動基板2朝一第一方向91輸送 ' 通過該等第一腔室35的第一輸送單元61、-帶動基板2朝 m 一第二方向92輸送通過該等第二腔室45的第二輸送單元 62,及一帶動基板2朝一第三方向93輸送通過連接腔室 531的第三輸送單元63。第一方向91係由第一入口 朝 向第一出口 34,第二方向92是由第二入口 44朝向第二出 口 43且與第一方向91平行相反,而第三方向”則是由第 一迴轉件51朝向第二迴轉件52且垂直於第一、二方向91 、92。第一、二、三輸送單元61、62、63冑包括一長向延 伸之軌道(圖未示)、多數個設於執道上的滾輪(圖未示),以 φ 及多數個受滾輪帶動而移動並用於載送基板2的載具(圖未 . 示),惟因輸送機構6並非本新型改良之重點,故不再詳細 說明。 該等第一靶材7分別安裝在第一腔體單元3之第一外 2 32上且對應連通第-腔室35,乃用於在輸送通過之基板 2上鍍膜。該等第一靶材7可為不同材質,且每一第一腔室 35内可搭配第一把材7設置有不同的鍍膜系統(圖未示),用 :在基板2上成形不同材質的膜層。當㈣—崎7的數 量亦可依設計增減’甚至亦可視需要開啟或關閉,藉以改 9 M341704 變鍍臈層數。 該等第二靶材8與第一靶材7結構類似 第二腔體單元4之筮-J女裝在 早凡之弟一外壁42上且連通第二腔室45,鬥接 用於在輸送通過之基板2上鍍膜45间樣 _,且每-第一二:-二::::置為: =::統(_)’用於在基板2上成心質的 / 弟一靶材8的數量也能依設計增減,甚至 亦可視需要開啟或關閉,藉以改變鍍臈層數。 操作人貞將絲2擺放在第—輸送單元6 輸送單元61會沿著第一方向91,將基板2由第一第一 送入第-腔體單元3,通過該等第一腔室Μ時,藉入由口二3 靶材7在基板2之外側面22鍍上不同臈層,之後二 出口 34輸出。接著第-迴轉件51承接輸出第—出口 34之 基板2’並順時鐘旋轉9『後將基板2由第—方向μ轉往 弟二方向93送至第三輸送單以3,帶動基板2沿著第三方 ==連接腔室531,藉由連脉材54在基板2之外側 /鍍上另一膜層,之後將基板2輸送到第二迴轉件52 ,且弟二迴轉件52會順時鐘旋轉9〇。後將基板2由第 =一93轉往第二方向92送至第二輸送單元Q。令基板2由 弟1入°/4進人第二腔體單元4,通過該等第二腔室45, 並精由第二靶材8在基板2之外侧面22鍍上不同膜層,之 =由第二出口 43輸出,此時基板2之外側面心二 序鍍上所需膜層。 參閱圖3,本新型折合式真空裝置之第二較佳實施例, 10 M341704 本實施例之構造大致與第一實施例相同’ + 改變第二㈣8的安裝位置,令第二乾材8安裝在第二腔 體單元4之第二内壁41上,如此一來,當通過第一腔體單 元3’而完成外側面22㈣之基板2,被輸送通過第二腔 體單=4時,第二_ 8即會在基板2之内側面?!上錄膜 ,使得基板2之内、外側面21、22上皆鑛設有膜層。本實It can be used to control the connection between the first chambers 35, and the first valve % in Fig. 2 is in an open state. The second cavity unit 4 is identical in structure and corresponding to the first cavity unit 3, and includes a second inner wall 41 and a second outer wall 42 which are oppositely spaced apart from each other and extend left and right. A second outlet 43 and a second inlet 44 at two ends between the second inner wall 41 and the first outer wall 42 are connected to each other to form a first cavity between the second outlet 43 and the second inlet 44. i 45, and a plurality of first valves 46 respectively installed between two adjacent second month to 45. The second inner wall 41 is adjacent to the first inner wall "" and the second outer wall 42 is away from the first inner wall 3. The second chamber is also "vacuum" and the second valve 46 is also used to control the communication between the second chamber 45 and No, it will not be described in detail here. The vacuum connecting unit 5 includes a first rotating member 51 mounted on the side of the first-out σ34, a second rotating member 52' mounted on the side of the second inlet 44, and a first rotating member 51 and a first connecting member A connecting cavity 53 between the two rotating members 52. The connection cavity 53 has a connection chamber 531. The vacuum connection also includes an attachment target 54 on the outer side of the connection chamber 53 and communicating with the connection 8 M341704 ^ chamber 531. The first and second rotary members 51, 52 of this embodiment can be controlled to rotate clockwise, and of course can also be designed to rotate counterclockwise. In addition, the vacuum connecting unit 5 can also omit the arrangement of the connecting target 54, and can even be omitted together with the connecting cavity 53, and the first and second rotating members 51, 52 can be directly in rotational contact. The conveying mechanism 6 includes a driving substrate 2 that conveys in a first direction 91 through the first conveying unit 61 of the first chambers 35, and drives the substrate 2 to pass through the second chamber 92 in a second direction 92. The second conveying unit 62 of the chamber 45, and a driving substrate 2 are conveyed in a third direction 93 through the third conveying unit 63 of the connecting chamber 531. The first direction 91 is from the first inlet toward the first outlet 34, the second direction 92 is from the second inlet 44 toward the second outlet 43 and is parallel to the first direction 91, and the third direction is the first revolution The member 51 faces the second rotating member 52 and is perpendicular to the first and second directions 91 and 92. The first, second and third conveying units 61, 62, 63A include a long-distance extending rail (not shown), and a plurality of units. The roller (not shown) on the road is moved by φ and a plurality of rollers that are driven by the roller and used to carry the substrate 2 (not shown). However, since the conveying mechanism 6 is not the focus of the improvement of the present invention, The first targets 7 are respectively mounted on the first outer portion 32 of the first cavity unit 3 and correspondingly communicate with the first chamber 35 for coating on the substrate 2 that is transported through. The first target material 7 can be made of different materials, and each of the first chambers 35 can be provided with a different coating system (not shown) for the first material 7 to form a film of different materials on the substrate 2. When the number of (4)-Kazaki 7 can also be increased or decreased according to the design, it can even be turned on or off as needed. 9 M341704 The number of layers of the rhodium plated. The second target 8 is similar in structure to the first target 7. The second cavity unit 4 is on the outer wall 42 of the younger brother and is connected to the second chamber. 45, the bucket connection is used for coating 45 on the substrate 2 conveyed through, and each - first two: - two:::: is set to: =:: system (_) 'for forming on the substrate 2 The number of core/different targets 8 can also be increased or decreased according to design, or even turned on or off as needed, thereby changing the number of rhodium plating layers. The operator places the wires 2 on the first conveying unit 6 conveying unit 61. In the first direction 91, the substrate 2 is fed from the first first portion into the first cavity unit 3, and when the first chamber is passed through, the surface of the substrate 2 is borrowed from the outside of the substrate 2 22 is plated with different layers, and then the two outlets 34 are output. Then, the first-rotating member 51 receives the substrate 2' of the output first-outlet 34 and rotates 9 clockwise, and then the substrate 2 is rotated from the first direction to the second direction. Sending to the third transport sheet to 3, driving the substrate 2 along the third-party == connection chamber 531, on the outer side of the substrate 2 by plating the pulse material 54 / plating another film layer, and then transporting the substrate 2 to the second layer Rotary member 52 And the second rotating member 52 will rotate 9 times clockwise. Then the substrate 2 is transferred from the first = 93 to the second direction 92 to the second conveying unit Q. The substrate 2 is entered into the second by the brother 1 into the second. The cavity unit 4, through the second chambers 45, and the second target 8 are plated with different film layers on the outer side 22 of the substrate 2, which are output by the second outlet 43, at this time outside the substrate 2 The side core is secondly plated with the desired film layer. Referring to Fig. 3, a second preferred embodiment of the novel folding vacuum device, 10 M341704, the configuration of this embodiment is substantially the same as that of the first embodiment ' + changing the second (four) 8 The mounting position is such that the second dry material 8 is mounted on the second inner wall 41 of the second cavity unit 4, so that the substrate 2 of the outer side surface 22 (four) is passed through the first cavity unit 3', and is transported through the first When the two chambers are single = 4, the second _ 8 will be on the inner side of the substrate 2? ! The film is recorded so that the inner and outer sides 21, 22 of the substrate 2 are provided with a film layer. Real
施例可省略連接㈣54的設置,當然也可以視需要增設, 在此不再詳細說明。 參閱圖4,本新型折合式真空裝置之第三較佳實施例, 本實施例之構造與第一、二實施例相似,不同之處在於·· i曰加第 _靶材7、8的設置位置,在第一腔體單元3之 第-内壁31與第_外壁32上皆安裝有第_婦7,並在第 二腔體單兀4之第二内壁41與第二外壁42上亦各別安裝 有第二靶材8。當基板2通過第一腔體單元3時,第一靶材 7即會在基板2之内、外側面21、22上分別鍍膜,使得基 板2之内、外側面21、22上皆鍍設有膜層,且當基板2再 通過第二腔體單元4時,第二乾材8亦會在基板2之内、 外側面21、22上分別鑛膜,使得基板2之内、外側面21、 22上再依需要增加不同膜層。同樣地,本實施例可省略連 接乾材54的&置’當然也可以視需要增加設置在連接腔體 之單内側、或單一外側或内、外兩側,在此不再詳細 說明。 參閱圖5,本新型折合式真空裝置之第四較佳實施例, 本實施例之構造與第二實施例大致雷同,不同之處在於: 11 M341704 本實施例增加第一靶材7的安裝,令第一靶材7分別安裝 在第-腔體單it 3之第—内壁31與第一外壁32上,所以 ,當基板2通過第_腔體單元3時,第一靶材7即會在基 板2之内、外側面21、22上分別鍍設膜層。The embodiment may omit the setting of the connection (four) 54. Of course, it may be added as needed, and will not be described in detail herein. Referring to FIG. 4, a third preferred embodiment of the present invention is similar to the first and second embodiments, except that the arrangement of the first and second targets 7 and 8 is different. In the position, the first inner wall 31 and the first outer wall 32 of the first cavity unit 3 are mounted with the first female body 7, and the second inner wall 41 and the second outer wall 42 of the second cavity unit 4 are also respectively Do not install the second target 8. When the substrate 2 passes through the first cavity unit 3, the first target 7 is coated on the inner and outer sides 21, 22 of the substrate 2, so that the inner and outer sides 21, 22 of the substrate 2 are plated. a film layer, and when the substrate 2 passes through the second cavity unit 4, the second dry material 8 also respectively deposits a film on the inner and outer sides 21, 22 of the substrate 2, so that the inner and outer sides 21 of the substrate 2, Add different layers on the 22nd as needed. Similarly, the &' can be omitted in the present embodiment. Of course, it can be added to the single inner side or the single outer side or the inner and outer sides of the connecting cavity as needed, and will not be described in detail herein. Referring to FIG. 5, a fourth preferred embodiment of the present invention is similar to the second embodiment. The difference is that: 11 M341704 This embodiment increases the installation of the first target 7, The first target 7 is mounted on the first inner wall 31 of the first cavity 3 and the first outer wall 32, so that when the substrate 2 passes through the first cavity unit 3, the first target 7 will A film layer is plated on each of the inner and outer side surfaces 21 and 22 of the substrate 2.
當然本新型第一、二靶材7、8之安裝位置及數量,亦 不以上述第一〜四實施例為限,在此不再詳細說明。須進一 步說明的是’當然本新型也可以直接如第三實施例般設置 使用時’、要視所需情況關閉不同位置的第-、二把材7、 8如此即此達到如同第一、二、四實施例的效果,甚至亦 可以有其他不同的安裝方式。 由上述說明可知,本新型折合式真空裝置在設計上, 係將原本5又置上需要一長串排列的腔體單元,對折成兩段 月體單元3 4’並藉由真空連接單元5連接,故能避免習 知單線延伸會造成真空裝置的延伸長度過長之缺失,並能 減小所佔用的空間,降低所須成本。此外,本新型更能配 合需要選擇在第―、二腔體單元3、4上安裝第-、二乾材 7、8,使得本新型在㈣玉作上更為多元化且完成度高, … 羊 了減乂基板2送入真空裝置的次數 ’生產效率較高,所以本新型具有減少佔用空間以及生產 效率較高之功效’確實能夠達到本新型之目的,因此 新型不僅疋别所未有之創新,更可供產業上利用。 准以上所述者,僅為本新型之較佳實施例而已,當 ,以此限定本新型實施之範圍,即大凡依本新型中請:利 範圍及新型說明内容所作之簡單的等效變化與修飾,皆仍 12 M341704 屬本新型專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一種習知真空裝置的裝置示意圖; 圖2是本新型之折合式真空裝置的一第一較佳實施例 的一簡單示意圖; 圖3是本新型之折合式真空裝置的一第二較佳實施例 的一簡單示意圖; 圖4是本新型之折合式真空裝置的一第三較佳實施例 • 的一簡單示意圖;及 圖5是本新型之折合式真空裝置的一第四較佳實施例 的一簡單示意圖。Of course, the installation positions and the number of the first and second targets 7, 8 of the present invention are not limited to the first to fourth embodiments described above, and will not be described in detail herein. It should be further explained that 'of course, the present invention can also be set directly as in the third embodiment', and the first and second materials 7, 8 which are closed at different positions depending on the required condition, thus reach the first and second. The effects of the four embodiments may even have other different installation methods. It can be seen from the above description that the folding vacuum device of the present invention is designed such that the original 5 is placed on a cavity unit that requires a long string arrangement, and is folded into two segments of the body unit 34' and connected by the vacuum connection unit 5. Therefore, it can be avoided that the conventional single-wire extension will cause the loss of the extension length of the vacuum device to be too long, and the space occupied can be reduced, and the required cost can be reduced. In addition, the present invention is more suitable for the installation of the first and second dry materials 7, 8 on the first and second cavity units 3, 4, so that the new type is more diversified and ... The number of times the sheep has reduced the feeding of the substrate 2 into the vacuum device 'high production efficiency, so the new type has the effect of reducing the space occupied and the production efficiency is high' can indeed achieve the purpose of the new model, so the new type is not only an unprecedented one. Innovation is more available for industry use. The above is only the preferred embodiment of the present invention, and thus, the scope of the present invention is limited, that is, the simple equivalent change of the present invention: the range of interest and the new description Modifications, all still 12 M341704 are covered by this new patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a conventional vacuum device; FIG. 2 is a simplified schematic view of a first preferred embodiment of the folded vacuum device of the present invention; FIG. 3 is a folded vacuum of the present invention. A simplified schematic view of a second preferred embodiment of the apparatus; FIG. 4 is a simplified schematic view of a third preferred embodiment of the folding vacuum apparatus of the present invention; and FIG. 5 is a folding vacuum apparatus of the present invention. A simplified schematic diagram of a fourth preferred embodiment.
13 M34170413 M341704
【主要元件符號說明】 2…… …·基板 21 ··.·· • · · ·内側面 22••… —外側面 3…… •…第一腔體單元 31••… —第 内壁 32••… —弟 外壁 33…" •…第一入口 34••… •…第一出口 35····. •…第 腔室 36••… •…第一閥門 4…… •…第二腔體單元 41 ····· •…第二内壁 42••… •…第二外壁 43····· •…第二出口 44··.·· •…第二入口 45••… •…第二腔室 46···.· •…第二閥門 5…… •…真空連接單元 51 ····. …·第一迴轉件 52••… …·第二迴轉件 53"… •…連接腔體 531… •…連接腔室 54••… •…連接靶材 6…… • · ·輸送機構 61 ••… •…第一輸送單元 62••… •…第二輸送單元 63"… —弟二輸送早元 7…… •…第一靶材 8…… 第一輕材 91 ••… •…第一方向 92••… •…第二方向 93••… •…第三方向 14[Description of main component symbols] 2...... ...·Substrate 21 ······· · · · Inner side 22••... —Outer side 3... •...First cavity unit 31••... —Inner wall 32• •...——弟外壁33..." •...first entrance 34••... •...first exit 35····.......first chamber 36••... •...first valve 4... •...second Cavity unit 41 ······...the second inner wall 42••...•...the second outer wall 43·····...the second exit 44·····...the second entrance 45••... ...the second chamber 46······...the second valve 5...•...the vacuum connection unit 51····....the first revolving member 52••...the second revolving member 53"... ...connecting the cavity 531... •...connecting the chamber 54••... •...connecting the target 6... • ··delivery mechanism 61 ••... •...the first transport unit 62••...•...the second transport unit 63" ... - Di Er 2 transports early 7... •...first target 8... first light material 91 ••... •...first direction 92••... •... Direction 93 •• ... • ... the third direction 14
Claims (1)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97206790U TWM341704U (en) | 2008-04-21 | 2008-04-21 | Folding vacuum apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97206790U TWM341704U (en) | 2008-04-21 | 2008-04-21 | Folding vacuum apparatus |
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| Publication Number | Publication Date |
|---|---|
| TWM341704U true TWM341704U (en) | 2008-10-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW97206790U TWM341704U (en) | 2008-04-21 | 2008-04-21 | Folding vacuum apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI480406B (en) * | 2013-11-28 | 2015-04-11 | Metal Ind Res & Dev Ct | Deposition apparatus and conveyer module |
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2008
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI480406B (en) * | 2013-11-28 | 2015-04-11 | Metal Ind Res & Dev Ct | Deposition apparatus and conveyer module |
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