TWI895228B - Glass substrate inspection system with detection of perforated waist - Google Patents
Glass substrate inspection system with detection of perforated waistInfo
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- TWI895228B TWI895228B TW114112543A TW114112543A TWI895228B TW I895228 B TWI895228 B TW I895228B TW 114112543 A TW114112543 A TW 114112543A TW 114112543 A TW114112543 A TW 114112543A TW I895228 B TWI895228 B TW I895228B
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Abstract
本發明係提供一種本發明係提供一種適用於檢測經穿孔製程後之玻璃基板的玻璃基板檢測系統,藉由該玻璃基板檢測系統所揭露的各子構件的技術特徵,將能讓檢測人員有效率地獲取經穿孔製程後之玻璃基板的穿孔腰身的實際樣態之功效。The present invention provides a glass substrate inspection system suitable for inspecting glass substrates after a perforation process. By virtue of the technical features of the various sub-components disclosed in the glass substrate inspection system, inspection personnel can efficiently obtain the actual shape of the perforation waist of the glass substrate after the perforation process.
Description
本發明係與玻璃檢測技術相關,特別是指一種適宜經穿孔後之玻璃基板檢測系統。 This invention relates to glass inspection technology, and in particular to a system suitable for inspecting perforated glass substrates.
當前用於檢測經穿孔製程後之玻璃基板(TGV,Through Glass Via)時,一般係藉由傳統顯微鏡對於待測之玻璃基板進行檢測,雖能獲得經穿孔製程後之玻璃基板的每個孔洞(Via)的實際樣態,然而,前述習知檢測方式除了會讓已經穿孔製程之玻璃基板(TGV,Through Glass Via)大幅降低量測可靠度進而影響後續製程良率之外,更因傳統顯微鏡檢測待測玻璃基板的部分角度亦會受到相當大的限制等不便,著實讓檢測人員備感不便。 Currently, traditional microscopes are typically used to inspect glass substrates after TGV (Through Glass Via) processing. While this method can capture the actual appearance of each via in the glass substrate, it significantly reduces measurement reliability, impacting the yield of subsequent processes. Furthermore, traditional microscopes are significantly limited in their ability to inspect certain angles of the glass substrate, significantly inconvenient for inspectors.
因此,要如何有效地提升經穿孔製程後之玻璃基板(TGV,Through Glass Via)的良率,實則本發明亟欲改善之目的。 Therefore, how to effectively improve the yield of glass substrates after the through-glass via (TGV) process is actually the urgent goal of this invention.
而為了要解決先前技術所述之問題,本發明係提供一種適用於檢測經穿孔製程後之玻璃基板(TGV,Through Glass Via)的 玻璃基板檢測系統,藉由該玻璃基板檢測系統所揭露的各子構件的技術特徵,除了能有別於先前技術中所提之傳統顯微鏡對待測之玻璃基板進行檢測之外,更能讓檢測人員有效率地獲取經穿孔製程後之玻璃基板的穿孔腰身的實際樣態之功效。 To address the issues described in prior art, the present invention provides a glass substrate inspection system suitable for inspecting glass substrates that have undergone a through-glass via (TGV) process. The technical features of the various sub-components disclosed in this glass substrate inspection system not only differentiate this system from conventional microscopes used in prior art, but also enable inspectors to more efficiently obtain the actual appearance of the perforated waist of a glass substrate after the perforation process.
而為達成上述目的,本發明係提供一種玻璃基板檢測系統,其包含有一個微處理單元、一個承載單元、一個第一檢測裝置以及一個第二檢測裝置;其中,該微處理單元、該第一檢測裝置與該第二檢測裝置係各別組設在該承載單元,且該微處理單元係各別電性連接且各別電性控制該承載單元、該第一檢測裝置以及該第二檢測裝置,使該第一檢測裝置與該第二檢測裝置係各別對應於被放置在該承載單元上的一個待測物;其中,該微處理單元係具有一個單位面積穿孔補償角度演算邏輯以及一個穿孔腰身檢測演算邏輯,該單位面積穿孔補償角度演算邏輯係用以分析運算被放置在該承載單元上之待測物所產生的影像辨識後並產生一個單位面積穿孔補償角度判別資訊,該穿孔腰身檢測演算邏輯係用以結合運算該單位面積穿孔補償角度演算邏輯後並產生一個穿孔腰身判別資訊。 To achieve the above-mentioned object, the present invention provides a glass substrate inspection system, which includes a microprocessor unit, a carrier unit, a first inspection device, and a second inspection device; wherein the microprocessor unit, the first inspection device, and the second inspection device are respectively assembled in the carrier unit, and the microprocessor unit is respectively electrically connected to and electrically controls the carrier unit, the first inspection device, and the second inspection device, so that the first inspection device and the second inspection device are respectively placed corresponding to An object to be tested is placed on the carrier unit; wherein the microprocessor unit comprises a unit area perforation compensation angle calculation logic and a perforation waist detection calculation logic. The unit area perforation compensation angle calculation logic is used to analyze and calculate the image recognition of the object to be tested placed on the carrier unit and generate unit area perforation compensation angle discrimination information. The perforation waist detection calculation logic is used to combine the calculation with the unit area perforation compensation angle calculation logic to generate perforation waist discrimination information.
而透過本發明所揭露之玻璃基板檢測系統的該微處理單元之該單位面積穿孔補償角度演算邏輯、該穿孔腰身檢測演算邏輯、該第一檢測裝置以及該第二檢測裝置等技術特徵,除了能有別於先前技術中所提之傳統顯微鏡對待測之玻璃基板進行檢測之外,更能讓檢測人員有效率地獲取經穿孔製程後之玻璃基板的穿孔腰身的實際樣態之功效。 The glass substrate inspection system disclosed in this invention utilizes the unit-area perforation compensation angle calculation logic, the perforation waist detection logic, the first inspection device, and the second inspection device. This system not only distinguishes itself from conventional microscopes used in prior art for inspecting glass substrates, but also allows inspectors to more efficiently obtain the actual perforation waist characteristics of glass substrates after the perforation process.
1:玻璃基板檢測系統 1: Glass substrate inspection system
2:玻璃基板 2: Glass substrate
10:微處理單元 10: Microprocessor unit
13:單位面積穿孔補償角度演算邏輯 13: Calculation Logic of Perforation Compensation Angle Per Unit Area
14:穿孔腰身檢測演算邏輯 14: Perforated waist detection algorithm
20:承載單元 20: Carrier unit
21:載台 21: Carrier
212:頂部 212: Top
213:底部 213: Bottom
214:凸垣 214: Convex Wall
23:載台滑軌組 23: Carrier slide rail assembly
25:支撐臂 25: Support Arm
251:第一滑軌組 251: First slide rail assembly
253:第二滑軌組 253: Second slide rail assembly
255:基座 255: Base
30:第一檢測裝置 30: First detection device
31:攝像模組 31: Camera Module
40:第二檢測裝置 40: Second detection device
41:攝像模組 41: Camera Module
50:電源供應模組 50: Power supply module
2n、2o、2p、2q:穿孔 2n, 2o, 2p, 2q: Perforation
θ1、θ2、θ3:穿孔補償角度 θ1, θ2, θ3: Perforation compensation angles
B1、B2、B3:穿孔腰身 B1, B2, B3: Perforated waistband
圖1係本發明較佳實施例之系統架構圖,主要係揭露一種適用於檢測經穿孔製程後之玻璃基板的玻璃基板檢測系統。 Figure 1 is a system architecture diagram of a preferred embodiment of the present invention, primarily illustrating a glass substrate inspection system suitable for inspecting glass substrates after a perforation process.
圖2係為圖1所揭露之玻璃基板檢測系統中部分構件立體示意圖,主要係揭露一經穿孔製程後之玻璃基板尚未放置在該玻璃基板檢測系統前之狀態。 Figure 2 is a schematic three-dimensional diagram of some components of the glass substrate inspection system disclosed in Figure 1, primarily illustrating a glass substrate that has undergone a perforation process but has not yet been placed in the glass substrate inspection system.
圖3係為類似圖2之部分構件立體示意圖,主要係揭露該經穿孔製程後之玻璃基板已放置在該玻璃基板檢測系統之一承載單元上之狀態。 Figure 3 is a schematic 3D diagram of some components similar to Figure 2, primarily showing the glass substrate after the perforation process being placed on a carrier unit of the glass substrate inspection system.
圖4係為類似圖3之部分構件立體示意圖,主要係揭露該經穿孔製程後之玻璃基板及該承載單元已被推進運動至一待檢測位置之狀態。 Figure 4 is a schematic three-dimensional diagram of some components similar to Figure 3, primarily showing the glass substrate after the perforation process and the carrier unit being advanced to a position to be inspected.
圖5係為類似圖4之部分構件立體示意圖,主要係揭露該玻璃基板檢測系統之一第一檢測裝置、一第二檢測裝置下降運動靠近至該經穿孔製程後之玻璃基板上方之狀態。 Figure 5 is a schematic three-dimensional diagram of some components similar to Figure 4 , primarily illustrating a first inspection device and a second inspection device of the glass substrate inspection system moving downward and approaching the top of the glass substrate after the perforation process.
圖6係為類似圖5之前視示意圖,主要係揭露該玻璃基板檢測系統之該第一檢測裝置、該第二檢測裝置一併經抬升運動後遠離該經穿孔製程後之玻璃基板的檢測狀態。 FIG6 is a front view schematic diagram similar to FIG5 , primarily illustrating the first and second inspection devices of the glass substrate inspection system being lifted and moved away from the perforated glass substrate.
圖7係為圖6之側視示意圖。 Figure 7 is a schematic side view of Figure 6.
圖8係為圖6所揭露之玻璃基板檢測系統經該第一檢測裝置、該第二檢測裝置攝取該經穿孔製程後之玻璃基板局部若干個穿孔圖像數據 後,並由該微處理單元執行一單位面積穿孔補償角度演算邏輯、一穿孔腰身檢測演算邏輯後的檢測狀態示意圖。 Figure 8 is a schematic diagram of the glass substrate inspection system shown in Figure 6 , after the first and second inspection devices capture image data of several perforations on a portion of the glass substrate after the perforation process, and the microprocessor unit executes a perforation compensation angle calculation per unit area and a perforation waist detection calculation.
圖9係為圖8之側視檢測狀態示意圖。 Figure 9 is a schematic diagram of the side view detection status of Figure 8.
申請人首先在此說明,於整篇說明書中,包括以下介紹的實施例以及申請專利範圍的各請求項中,有關方向性的名詞皆以本案〔圖示簡單說明〕中所列各圖式的方向為基準。其次,在以下將要介紹之實施例及圖式中,相同之元件標號,代表相同或近似之元件或其結構特徵。而且,有關本發明的詳細構造、特點、組裝或使用、製造等方式,將於後續的實施方式詳細說明中予以描述,然,在本發明領域中具有通常知識者應能瞭解,該等詳細說明及本發明所列舉的實施例,係僅用於支持說明本發明實能據以實現,並非用以限制本發明之申請專利範圍。 The applicant first clarifies that throughout this specification, including the embodiments described below and the various claims in the patent application, directional terms are based on the orientation of the various figures listed in the [Simplified Description of the Figures] of this application. Furthermore, in the embodiments and figures described below, identical component numbers represent identical or similar components or structural features. Furthermore, the detailed structure, features, assembly, use, and manufacturing methods of the present invention will be described in the subsequent detailed description of the embodiments. However, those skilled in the art will understand that such detailed description and the embodiments listed herein are intended solely to support and illustrate that the present invention can be implemented and are not intended to limit the scope of the patent application.
請先參閱圖1,為本發明較佳實施例所揭露之一種適用於檢測經穿孔製程後之玻璃基板2(TGV,Through Glass Via)的玻璃基板檢測系統1,而該玻璃基板檢測系統1係包含有一個微處理單元10、一個承載單元20、一個第一檢測裝置30、一個第二檢測裝置40以及一個電源供應模組50,其中,該微處理單元10、該第一檢測裝置30、該第二檢測裝置40以及該電源供應模組50係各別組設在該承載單元20;而該微處理單元10係各別電性連接且各別電性控制該承載單元20、該第一檢測裝置30以及該第二檢測裝置40,使該第一檢測裝置30以及該第二檢測裝置 40係各別對應被放置在該承載單元20上的待測物,即本實施例中所舉例之經穿孔製程後的該玻璃基板2;而該電源供應模組50係各別電性連接且各別供應該微處理單元10、該承載單元20、該第一檢測裝置30以及該第二檢測裝置40所需之電力電源。 Please refer to FIG1 , which shows a glass substrate inspection system 1 for inspecting a glass substrate 2 after a through-glass via (TGV) process according to a preferred embodiment of the present invention. The glass substrate inspection system 1 includes a microprocessor unit 10, a carrier unit 20, a first inspection device 30, a second inspection device 40, and a power supply module 50. The microprocessor unit 10, the first inspection device 30, the second inspection device 40, and the power supply module 50 are respectively assembled on the carrier unit 20; and the microprocessor unit 10 is respectively electrically connected to and electrically controls the first inspection device 30, the second inspection device 40, and the power supply module 50. The carrier unit 20, the first detection device 30, and the second detection device 40 are configured such that the first detection device 30 and the second detection device 40 correspond to the object to be tested placed on the carrier unit 20, i.e., the glass substrate 2 after the perforation process in this embodiment. The power supply module 50 is electrically connected to and supplies the power required by the microprocessor 10, the carrier unit 20, the first detection device 30, and the second detection device 40.
請再參閱圖1,該微處理單元10係具有一個單位面積穿孔補償角度演算邏輯13以及一個穿孔腰身檢測演算邏輯14;其中,該單位面積穿孔補償角度演算邏輯13基本上係用以分析運算被放置在該承載單元20上之待測物的影像辨識演算邏輯進而產生一個單位面積穿孔補償角度判別資訊所構成;其中,該穿孔腰身檢測演算邏輯14係用以結合運算該單位面積穿孔補償角度演算邏輯13進而產生一個穿孔腰身判別資訊所構成;而值得一提的是,本發明較佳實施例所提之微處理單元10的該單位面積穿孔補償角度演算邏輯13係以點積演算法(dot product)、叉積演算法(cross product)或其組合等演算邏輯所組成;又值得一提的是,本發明較佳實施例所提之微處理單元10的該單位面積穿孔腰身檢測演算邏輯14係包含但不限於採用傅立葉轉換演算法、掃描線演算法(sweep-line)、核函數(kernel method)或其組合等演算邏輯所組成。 Please refer to FIG1 again. The microprocessor 10 has a unit area perforation compensation angle calculation logic 13 and a perforation waist detection calculation logic 14. The unit area perforation compensation angle calculation logic 13 is basically used to analyze and calculate the image recognition calculation logic of the object to be tested placed on the carrier unit 20 to generate a unit area perforation compensation angle. The perforation waist detection logic 14 is used to combine and calculate the unit area perforation compensation angle calculation logic 13 to generate a perforation waist discrimination information. It is worth mentioning that the unit area perforation compensation angle calculation logic 13 of the microprocessor 10 of the preferred embodiment of the present invention is based on the dot product algorithm (dot product), cross product, or a combination thereof; it is also worth mentioning that the unit area perforation waist detection logic 14 of the microprocessor unit 10 of the preferred embodiment of the present invention includes but is not limited to the Fourier transform algorithm, sweep-line algorithm, kernel method, or a combination thereof.
請再一併參閱圖1及圖2,而該承載單元20係包含一個呈板形體的載台21、一個載台滑軌組23以及一個大致上呈垂直且鄰近於該載台滑軌組23的支撐臂25;而該呈成板形體的載台21係具有一個頂部212以及一個相對應於該頂部212的底部213,該載台21之頂部212係用以承載該經穿孔製程後的該玻璃基板2,較佳地,該載台21之頂部212係 具有複數間隔設置的凸垣214,使經穿孔製程後的該玻璃基板2得以被承載在該等凸垣214上,該載台21之底部213係用以樞設在該載台滑軌組23上,使該載台21及該玻璃基板2係可依據該載台滑軌組23的軌道方向呈往復滑移運動;而該支撐臂25係包含一個第一滑軌組251、一個第二滑軌組253以及一個基座255,該支撐臂25之第一滑軌組251係組設在該支撐臂25對應於該載台滑軌組23的同一側,且該第一滑軌組251的滑軌延伸方向基本上與該載台滑軌組23的滑軌延伸方向呈同一方向設置,該支撐臂25之第二滑軌組253係樞設在該第一滑軌組251上,且該第二滑軌組253的滑軌延伸方向基本上係與第一滑軌組251的滑軌延伸方向呈交叉設置,該基座255係樞設在該第二滑軌組253,並可依據第二滑軌組253的軌道延伸方向呈往復滑移運動,較佳地,該第二滑軌組253以及該基座255係可依據該第一滑軌組251的軌道延伸方向呈往復滑移運動。 Please refer to Figures 1 and 2 together. The supporting unit 20 includes a plate-shaped carrier 21, a carrier rail assembly 23, and a support arm 25 that is substantially vertical and adjacent to the carrier rail assembly 23. The plate-shaped carrier 21 has a top 212 and a bottom 213 corresponding to the top 212. The top 212 of the carrier 21 is used to support the glass after the perforation process. The glass substrate 2 is preferably provided on the top portion 212 of the carrier 21 with a plurality of spaced-apart ridges 214, so that the glass substrate 2 after the perforation process can be supported on the ridges 214. The bottom portion 213 of the carrier 21 is pivotally mounted on the carrier rail assembly 23, so that the carrier 21 and the glass substrate 2 can slide back and forth along the track of the carrier rail assembly 23. The support arm 25 includes a The support arm 25 comprises a first slide group 251, a second slide group 253 and a base 255. The first slide group 251 of the support arm 25 is arranged on the same side of the support arm 25 as the platform slide group 23, and the slide extension direction of the first slide group 251 is substantially the same as the slide extension direction of the platform slide group 23. The second slide group 253 of the support arm 25 is pivotally arranged on the first slide group 25. 1, and the second rail assembly 253 extends in a direction substantially intersecting the direction of extension of the first rail assembly 251. The base 255 is pivotally mounted on the second rail assembly 253 and can slide back and forth along the extension direction of the second rail assembly 253. Preferably, the second rail assembly 253 and the base 255 can slide back and forth along the extension direction of the first rail assembly 251.
請再一併參閱圖1至圖7,而該第一檢測裝置30與該第二檢測裝置40係各別裝設在該承載單元20之支撐臂25的該基座255上,如此一來,該第一檢測裝置30與該第二檢測裝置40係可依據該承載單元20之支撐臂25的該第一滑軌組251的軌道延伸方向呈往復滑移運動,或者可依據該承載單元20之支撐臂25的該第二滑軌組253的軌道延伸方向呈往復滑移運動;而該第一檢測裝置30係包含有一個攝像模組31,且該攝像模組31係受該微處理單元10的電性連接與電性控制,其中,該攝像模組31基本上係垂直且對應於該承載單元20之載台滑軌組23的方向;而該第二檢測裝置40係包含有一個攝像模組41,且該攝像模組41係受該微處 理單元10的電性連接與電性控制,其中,該攝像模組41基本上係與該承載單元20之載台滑軌組23的方向呈一預定傾斜角度設置。而值得一提的是,該第一檢測裝置30之攝像模組31以及該第二檢測裝置40之攝像模組41基本上係皆由一工業用攝像機(其型號係包含但不限於MBS2041POE[5m 5472 x 3648畫素、5.5fps]、GigE[6M黑白1/1.8"/5m 3072 x 2048畫素]等)及一工業用攝像鏡頭(其型號係包含但不限於FA鏡頭[LM12FC24M]、1X遠心鏡頭等)所組成,前述所提之技術特徵皆為凡所屬技術領域中具有通常知識者得經參酌本發明較佳實施例後,即能易於思及、或僅屬型號、數量上或尺寸上之簡易置換變化,因此,皆非用以作為限定本發明所欲主張之技術特徵,合先敘明。 Please refer to Figures 1 to 7 together. The first detection device 30 and the second detection device 40 are respectively installed on the base 255 of the support arm 25 of the carrier unit 20. In this way, the first detection device 30 and the second detection device 40 can be reciprocated according to the extension direction of the track of the first slide group 251 of the support arm 25 of the carrier unit 20, or can be reciprocated according to the extension direction of the track of the second slide group 253 of the support arm 25 of the carrier unit 20; and the first detection device 3 System 0 includes a camera module 31, which is electrically connected to and controlled by the microprocessor unit 10. The camera module 31 is substantially perpendicular to and oriented in relation to the direction of the stage rail assembly 23 of the carrier unit 20. The second detection device 40 includes a camera module 41, which is electrically connected to and controlled by the microprocessor unit 10. The camera module 41 is substantially tilted at a predetermined angle relative to the direction of the stage rail assembly 23 of the carrier unit 20. It is worth mentioning that the camera module 31 of the first detection device 30 and the camera module 41 of the second detection device 40 are basically an industrial camera (its model includes but is not limited to MBS2041POE [5m 5472 x 3648 pixels, 5.5fps], GigE [6M black and white 1/1.8"/5m 3072 x 2048 pixels], etc.) and an industrial camera lens (models including but not limited to FA lenses [LM12FC24M] and 1X telecentric lenses). The aforementioned technical features are readily apparent to those skilled in the art after considering the preferred embodiments of the present invention, and may simply involve simple substitutions and variations in model, quantity, or size. Therefore, they are not intended to limit the technical features claimed by the present invention and should be noted in advance.
以上為本發明較佳實施例所揭露之玻璃基板檢測系統1及其各子構件的技術特徵,其後將繼續揭露若藉由該玻璃基板檢測系統1並經檢測經穿孔製程後之玻璃基板2(TGV,Through Glass Via)而進行有別於先前技術所提之傳統顯微鏡檢測及其所欲達成之功效在於: The above describes the technical features of the glass substrate inspection system 1 and its various subcomponents disclosed in a preferred embodiment of the present invention. The following describes how the glass substrate inspection system 1 can be used to inspect glass substrates 2 that have undergone a through-glass via (TGV) process, thereby performing inspections that differ from conventional microscope inspections used in prior art. The intended benefits are:
其一,請一併參閱圖1至圖4,首先,當該玻璃基板檢測系統1欲進行檢測動作前,此時,藉由該玻璃基板檢測系統1之微處理單元10係先行產生一個初始訊號並以電性各別傳輸至該承載單元20、該第一檢測裝置30以及該第二檢測裝置40的技術特徵,如此一來,將使該承載單元20之載台滑軌組23得以依據該初始訊號將該載台21推進運行至遠離該支撐臂25的一個預定水平初始位置,亦將使該承載單元20之支撐臂25的該第一滑軌組251得以依據該初始訊號一併將該第二滑軌組253、 該基座255、該第一檢測裝置30以及該第二檢測裝置40抬升運行至遠離該載台滑軌組23的一個預定垂直初始位置,進而讓檢測人員在進行檢測前得以達到機構初步復歸之功效。 First, please refer to Figures 1 to 4. First, before the glass substrate detection system 1 is about to perform a detection operation, the microprocessor 10 of the glass substrate detection system 1 first generates an initial signal and transmits it electrically to the carrier unit 20, the first detection device 30, and the second detection device 40. In this way, the carrier slide rail assembly 23 of the carrier unit 20 can push the carrier 21 forward according to the initial signal. When the support arm 25 reaches a predetermined horizontal initial position, the first rail assembly 251 of the support arm 25 of the carrier unit 20 will, based on the initial signal, simultaneously lift the second rail assembly 253, the base 255, the first detection device 30, and the second detection device 40 to a predetermined vertical initial position away from the carrier rail assembly 23. This allows the inspector to achieve a preliminary reset of the mechanism before conducting an inspection.
其二,請一併參閱圖1至圖5,接著,當該經穿孔製程後之玻璃基板2(TGV,Through Glass Via)被穩定地放置在該承載單元20之載台21的頂部212之該等凸垣214上時,此時,藉由該玻璃基板檢測系統1之微處理單元10產生一個待測訊號並以電性各別傳輸至該承載單元20、該第一檢測裝置30以及該第二檢測裝置40的技術特徵,如此一來,使該承載單元20之載台滑軌組23得以依據該待測訊號將該載台21以及被放置在該載台21之該等凸垣214上的該玻璃基板2等構件自該預定水平初始位置穩定地滑移運行至靠近該支撐臂25下方的一個預定待測位置,同時,亦將使該承載單元20之支撐臂25的該第一滑軌組251得以依據該待測訊號一併將該第二滑軌組253、該基座255、該第一檢測裝置30以及該第二檢測裝置40自該預定垂直初始位置下降運行至距離被放置在該載台21之該等凸垣214上的該玻璃基板2的一個預定待測高度,較佳地,使該第一檢測裝置30之攝像模組31的攝像鏡頭與該玻璃基板2的垂直待測預定距離係介於10mm至220mm之間,使該第二檢測裝置40之攝像模組41的攝像鏡頭與該玻璃基板2的待測預定距離係介於10mm至220mm之間,進而讓該玻璃基板檢測系統1整體達到檢測前機構對位校準之功效。 Secondly, please refer to Figures 1 to 5. Then, when the glass substrate 2 (TGV, Through Glass Via) is stably placed on the protrusions 214 of the top 212 of the carrier 21 of the supporting unit 20, at this time, the microprocessor unit 10 of the glass substrate detection system 1 generates a signal to be tested and transmits it electrically to the supporting unit 20, the first detection device 30 and the second detection device 40 respectively. In this way, the carrier slide rail assembly 23 of the supporting unit 20 can slide the carrier 21 and the glass substrate 2 placed on the protrusions 214 of the carrier 21 steadily from the predetermined horizontal initial position to a predetermined position to be tested near the bottom of the support arm 25 according to the signal to be tested. At the same time, the first slide rail assembly 23 of the support arm 25 of the supporting unit 20 can also slide the carrier 21 and the glass substrate 2 placed on the protrusions 214 of the carrier 21 steadily from the predetermined horizontal initial position to a predetermined position to be tested near the bottom of the support arm 25. Based on the test signal, the second slide rail assembly 253, the base 255, the first inspection device 30, and the second inspection device 40 are simultaneously lowered from the predetermined vertical initial position to a predetermined test height from the glass substrate 2 placed on the ridges 214 of the stage 21. Preferably, the predetermined vertical distance between the camera lens of the imaging module 31 of the first inspection device 30 and the glass substrate 2 is between 10 mm and 220 mm, and the predetermined vertical distance between the camera lens of the imaging module 41 of the second inspection device 40 and the glass substrate 2 is between 10 mm and 220 mm. This allows the entire glass substrate inspection system 1 to achieve pre-test mechanism alignment.
其三,請一併參閱圖1至圖9,而當該玻璃基板檢測系統1之微處理單元10產生一個補償角度訊號並以電性各別傳輸至該承載單元20、該第一檢測裝置30及該第二檢測裝置40時,該承載單元20之支撐臂25的該第一滑軌組251、該第二滑軌組253係皆依據該補償角度訊號再次地將該第一檢測裝置30進行運動,直至該第一檢測裝置30之攝像模組31的攝像鏡頭、該第二檢測裝置40之攝像模組41的攝像鏡頭各別與該玻璃基板2的垂直檢測距離係介於30mm至200mm之間,其中,該第二檢測裝置40之攝像模組41的攝像鏡頭與該玻璃基板2二者之間係形成一個預定檢測角度係介於20度至70度之間,此時,該第一檢測裝置30之攝像模組31的攝像鏡頭與該第二檢測裝置40之攝像模組41的攝像鏡頭係各別將該玻璃基板2上的複數個穿孔圖像數據(於本實施例中,該數據基本上係由文字、圖像、多媒體視頻或其組合等所構成)電性傳輸至該微處理單元10中,使該微處理單元10係藉由執行該單位面積穿孔補償角度演算邏輯13的技術特徵,如此一來,係使該微處理單元10之單位面積穿孔補償角度演算邏輯13得依據經該第一檢測裝置30之攝像模組31的攝像鏡頭與該第二檢測裝置40之攝像模組41的攝像鏡頭所攝取自該玻璃基板2上該等複數個穿孔圖像數據進行邏輯運算後,進而產生一個單位面積穿孔補償角度判別資訊(包含但不限於該玻璃基板2上之任一實際穿孔匹配其任一假想垂直貫穿該玻璃基板2的一假想補償線L之間所形成的一穿孔補償角度,其中,該穿孔補償角度基於該假想補償線L係介於0度~50度等資訊)並藉由電性連接於外部的一顯示裝置予以顯示, 即如圖8、圖9所示,該玻璃基板2上的局部穿孔2n、2o、2p及2q中,經該玻璃基板檢測系統1之微處理單元10執行該單位面積穿孔補償角度演算邏輯13後可獲悉其後相關判別資訊:(a)該穿孔2n、2o、2p的穿孔成立,該穿孔2n貫穿該玻璃基板2的貫穿度最佳;(b)該穿孔2q判定為未穿孔;(c)該穿孔2o係基於該假想補償線L之穿孔補償角度θ1係大致上大於等於1度且小於10度之間、該穿孔2p係基於該假想補償線L之穿孔補償角度θ2係大致上大於等於10度且小於30度之間、該穿孔2q係基於該假想補償線L之穿孔補償角度θ3係大致上大於等於30度且小於50度之間。綜前所述,係進而讓該玻璃基板檢測系統1除了能有別於先前技術中所提之傳統顯微鏡對待測之玻璃基板進行檢測之外,更能有效地克服因先前技術中所提之傳統顯微鏡檢測待測玻璃基板的部分角度會受到相當大的限制,進而獲取得經穿孔製程後之玻璃基板2的單位面積內各穿孔與該玻璃基板2二者之間的穿孔補償角度實際樣態之功效。 Third, please refer to Figures 1 to 9 together. When the microprocessor 10 of the glass substrate detection system 1 generates a compensation angle signal and transmits it electrically to the support unit 20, the first detection device 30 and the second detection device 40, the first slide rail group 251 and the second slide rail group 253 of the support arm 25 of the support unit 20 are both based on The compensation angle signal moves the first detection device 30 again until the vertical detection distance between the camera lens of the camera module 31 of the first detection device 30 and the camera lens of the camera module 41 of the second detection device 40 and the glass substrate 2 is between 30mm and 200mm, wherein the camera module of the second detection device 40 A predetermined detection angle is formed between the camera lens 41 and the glass substrate 2, which is between 20 degrees and 70 degrees. At this time, the camera lens 31 of the first detection device 30 and the camera lens 41 of the second detection device 40 respectively capture a plurality of perforated image data (in this embodiment, the data The data is basically composed of text, images, multimedia videos or a combination thereof) and is electrically transmitted to the microprocessor 10, so that the microprocessor 10 executes the unit area perforation compensation angle calculation logic 13. In this way, the unit area perforation compensation angle calculation logic 13 of the microprocessor 10 can be based on the first detection. The camera lens of the camera module 31 of the device 30 and the camera lens of the camera module 41 of the second detection device 40 perform logical operations on the plurality of perforation image data on the glass substrate 2, thereby generating a unit area perforation compensation angle discrimination information (including but not limited to any actual perforation on the glass substrate 2 matching any imaginary vertical through hole). A perforation compensation angle is formed between an imaginary compensation line L passing through the glass substrate 2, wherein the perforation compensation angle is based on information such as whether the imaginary compensation line L is between 0 degrees and 50 degrees and is displayed by an external display device electrically connected. As shown in Figures 8 and 9, the local perforations 2n, 2o, 2p, and 2q on the glass substrate 2 are formed by passing through the glass substrate 2. After executing the unit area perforation compensation angle calculation logic 13, the microprocessor 10 of the glass substrate detection system 1 can obtain the following related judgment information: (a) the perforations 2n, 2o, and 2p are established, and the perforation 2n has the best penetration through the glass substrate 2; (b) the perforation 2q is determined to be not perforated; (c) the perforation 2o is based on the hypothetical The perforation compensation angle θ1 of the compensation line L is approximately greater than or equal to 1 degree and less than 10 degrees, the perforation compensation angle θ2 of the perforation 2p based on the imaginary compensation line L is approximately greater than or equal to 10 degrees and less than 30 degrees, and the perforation compensation angle θ3 of the perforation 2q based on the imaginary compensation line L is approximately greater than or equal to 30 degrees and less than 50 degrees. In summary, the glass substrate inspection system 1 not only distinguishes itself from conventional microscopes used in prior art for inspecting glass substrates, but also effectively overcomes the significant limitations of conventional microscopes in inspecting certain angles of the glass substrates. This allows the system to accurately measure the perforation compensation angle between each perforation per unit area of the glass substrate 2 after the perforation process.
其四,請一併參閱圖1至圖9,而當該玻璃基板檢測系統1之微處理單元10產生一個穿孔腰身檢測訊號並以電性各別傳輸至該承載單元20、該第一檢測裝置30及該第二檢測裝置40時,該承載單元20之支撐臂25的該第一滑軌組251、該第二滑軌組253係皆依據該穿孔腰身檢測訊號再次地將該第一檢測裝置30進行運動,直至該第一檢測裝置30之攝像模組31的攝像鏡頭、該第二檢測裝置40之攝像模組41的攝像鏡頭各別與該玻璃基板2的垂直檢測距離係介於30mm至200mm之間,其中,該第二檢測裝置40之攝像模組41的攝像鏡頭與該玻璃基板2二者之 間係形成一個預定檢測角度係介於20度至70度之間,此時,該第一檢測裝置30之攝像模組31的攝像鏡頭與該第二檢測裝置40之攝像模組41的攝像鏡頭係各別將該玻璃基板2上的複數個穿孔圖像數據(於本實施例中,該數據基本上係由文字、圖像、多媒體視頻或其組合等所構成)電性傳輸至該微處理單元10中,使該微處理單元10係藉由一併執行該單位面積穿孔補償角度演算邏輯13與該穿孔腰身檢測演算邏輯14的技術特徵,如此一來,係使該微處理單元10之穿孔腰身檢測演算邏輯14得依據經該第一檢測裝置30之攝像模組31的攝像鏡頭與該第二檢測裝置40之攝像模組41的攝像鏡頭所攝取自該玻璃基板2上該等複數個穿孔圖像數據進行邏輯運算後,進而產生一個穿孔腰身判別資訊(包含但不限於該玻璃基板2上之任一實際穿孔腰身係小於或等於任一實際穿孔的孔徑等資訊)並藉由電性連接於外部的該顯示裝置予以顯示,即又如圖8、圖9所示,該玻璃基板2上的局部穿孔2n、2o、2p及2q中,經該玻璃基板檢測系統1之微處理單元10一併執行該單位面積穿孔補償角度演算邏輯13與該穿孔腰身檢測演算邏輯14後可獲悉其後相關判別資訊:(a)該穿孔2n、2o、2p的穿孔成立,其中,該穿孔2n貫穿該玻璃基板2的貫穿度最佳;(b)該穿孔2q判定為未穿孔;(c)該穿孔2n之穿孔腰身B1係小於或等於該穿孔2n之孔徑、該穿孔2o之穿孔腰身B2係略小於該穿孔2o之孔徑、該穿孔2q之穿孔腰身B3係小於該穿孔2q之孔徑。綜前所述,係進而讓該玻璃基板檢測系統1除了能有別於先前技術中所提之傳統顯微鏡對待測之玻璃基板進行檢測之外,更能有效地克服因先前技術中所提之傳統顯微鏡 檢測待測玻璃基板的部分角度會受到相當大的限制,進而獲取得經穿孔製程後之玻璃基板2的單位面積內各穿孔是否實際有效地貫穿該玻璃基板2的實際樣態之功效。 Fourthly, please refer to Figures 1 to 9 together. When the microprocessor unit 10 of the glass substrate detection system 1 generates a perforated waist detection signal and transmits it electrically to the carrier unit 20, the first detection device 30 and the second detection device 40, the first slide rail group 251 and the second slide rail group 253 of the support arm 25 of the carrier unit 20 both move the first detection device 30 again according to the perforated waist detection signal until the vertical detection distance between the camera lens of the camera module 31 of the first detection device 30 and the camera lens of the camera module 41 of the second detection device 40 and the glass substrate 2 is between 30 mm and 20 mm. 0 mm, wherein a predetermined detection angle is formed between the camera lens of the camera module 41 of the second detection device 40 and the glass substrate 2, which is between 20 and 70 degrees. At this time, the camera lens of the camera module 31 of the first detection device 30 and the camera lens of the camera module 41 of the second detection device 40 respectively transmit a plurality of perforation image data on the glass substrate 2 (in this embodiment, the data is basically composed of text, images, multimedia video, or a combination thereof) to the microprocessor 10, so that the microprocessor 10 executes the unit area perforation compensation angle calculation logic 13 and the perforation compensation angle calculation logic 13 simultaneously. The technical features of the hole waist detection calculation logic 14 are such that the perforation waist detection calculation logic 14 of the microprocessor unit 10 performs a logical operation based on the plurality of perforation image data captured from the glass substrate 2 by the camera lens of the camera module 31 of the first detection device 30 and the camera lens of the camera module 41 of the second detection device 40, and then generates a perforation waist discrimination information (including but not limited to information such as whether any actual perforation waist on the glass substrate 2 is smaller than or equal to the aperture of any actual perforation) and displays it by the display device electrically connected to the outside, that is, as shown in Figures 8 and 9, the local perforation waist on the glass substrate 2 is Among the perforations 2n, 2o, 2p and 2q, the microprocessor 10 of the glass substrate detection system 1 executes the unit area perforation compensation angle calculation logic 13 and the perforation waist detection calculation logic 14 simultaneously, and the subsequent relevant judgment information can be obtained: (a) the perforations 2n, 2o, and 2p are established, among which the penetration degree of the perforation 2n through the glass substrate 2 is the best; (b) the perforation 2q is determined to be unperforated; (c) the perforation waist B1 of the perforation 2n is smaller than or equal to the aperture of the perforation 2n, the perforation waist B2 of the perforation 2o is slightly smaller than the aperture of the perforation 2o, and the perforation waist B3 of the perforation 2q is smaller than the aperture of the perforation 2q. In summary, the glass substrate inspection system 1 not only distinguishes itself from conventional microscopes used in prior art for inspecting glass substrates, but also effectively overcomes the significant limitations of conventional microscopes in inspecting certain angles of the glass substrate. This allows the system to determine whether each perforation per unit area of the glass substrate 2 has effectively penetrated the glass substrate 2 after the perforation process.
其五,請一併參閱圖1至圖7,最後,當該玻璃基板檢測系統1完成前述該等檢測動作後,此時,藉由該玻璃基板檢測系統1之微處理單元10係先行產生一個復歸訊號並以電性各別傳輸至該承載單元20、該第一檢測裝置30以及該第二檢測裝置40的技術特徵,如此一來,將使該承載單元20之載台滑軌組23得以依據該復歸訊號將該載台21再次推進運行至遠離該支撐臂25的該預定水平初始位置,亦將使該承載單元20之支撐臂25的該第一滑軌組251得以依據該復歸訊號一併將該第二滑軌組253、該基座255、該第一檢測裝置30以及該第二檢測裝置40抬升運行至遠離該載台滑軌組23的該預定垂直初始位置,進而讓檢測人員在進行檢測動作後得以達到機構復歸之功效。 Fifth, please refer to Figures 1 to 7 together. Finally, when the glass substrate detection system 1 completes the aforementioned detection operations, the microprocessor 10 of the glass substrate detection system 1 first generates a reset signal and transmits it electrically to the carrier unit 20, the first detection device 30, and the second detection device 40. In this way, the carrier slide rail assembly 23 of the carrier unit 20 can move the carrier 21 according to the reset signal. Once the support arm 25 is advanced again to the predetermined horizontal initial position, the first rail assembly 251 of the support arm 25 of the carrier unit 20 will, in response to the reset signal, simultaneously lift the second rail assembly 253, the base 255, the first detection device 30, and the second detection device 40 to the predetermined vertical initial position away from the carrier rail assembly 23, thereby allowing the inspection personnel to achieve the mechanism reset after performing the inspection.
1:玻璃基板檢測系統 1: Glass substrate inspection system
10:微處理單元 10: Microprocessor unit
13:單位面積穿孔補償角度演算邏輯 13: Calculation Logic of Perforation Compensation Angle Per Unit Area
14:穿孔腰身檢測演算邏輯 14: Perforated waist detection algorithm
20:承載單元 20: Carrier unit
30:第一檢測裝置 30: First detection device
40:第二檢測裝置 40: Second detection device
50:電源供應模組 50: Power supply module
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Citations (5)
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|---|---|---|---|---|
| US20160354808A1 (en) * | 2015-06-03 | 2016-12-08 | Boe Technology Group Co., Ltd. | Substrate Mark Detection Apparatus and Substrate Mark Detection Method |
| TW201809643A (en) * | 2016-06-13 | 2018-03-16 | 日本美可多龍股份有限公司 | Substrate inspection device and substrate manufacturing method |
| TW202205340A (en) * | 2020-04-06 | 2022-02-01 | 荷蘭商Asml荷蘭公司 | Aperture assembly, beam manipulator unit, method of manipulating charged particle beams, and charged particle projection apparatus |
| CN119198535A (en) * | 2024-11-07 | 2024-12-27 | 苏州群策科技有限公司 | A method for detecting bonding force of blind holes in circuit boards |
| TWM665260U (en) * | 2024-10-16 | 2025-01-01 | 聚嶸科技股份有限公司 | Laser defect detection system |
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| US20160354808A1 (en) * | 2015-06-03 | 2016-12-08 | Boe Technology Group Co., Ltd. | Substrate Mark Detection Apparatus and Substrate Mark Detection Method |
| TW201809643A (en) * | 2016-06-13 | 2018-03-16 | 日本美可多龍股份有限公司 | Substrate inspection device and substrate manufacturing method |
| TW202205340A (en) * | 2020-04-06 | 2022-02-01 | 荷蘭商Asml荷蘭公司 | Aperture assembly, beam manipulator unit, method of manipulating charged particle beams, and charged particle projection apparatus |
| TWM665260U (en) * | 2024-10-16 | 2025-01-01 | 聚嶸科技股份有限公司 | Laser defect detection system |
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