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TWI895229B - Glass substrate inspection system - Google Patents

Glass substrate inspection system

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Publication number
TWI895229B
TWI895229B TW114112544A TW114112544A TWI895229B TW I895229 B TWI895229 B TW I895229B TW 114112544 A TW114112544 A TW 114112544A TW 114112544 A TW114112544 A TW 114112544A TW I895229 B TWI895229 B TW I895229B
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TW
Taiwan
Prior art keywords
carrier
slide rail
unit
glass substrate
rail group
Prior art date
Application number
TW114112544A
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Chinese (zh)
Inventor
蔡俊良
呂明憲
蘇奐瑜
樊家妤
樊芃郁
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尹鑽科技有限公司
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Priority to TW114112544A priority Critical patent/TWI895229B/en
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Publication of TWI895229B publication Critical patent/TWI895229B/en

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Abstract

本發明係提供一種適用於檢測未經穿孔製程前之玻璃基板的玻璃基板檢測系統,藉由該玻璃基板檢測系統所揭露的各子構件的技術特徵,將能有別於先前技術中所提之傳統顯微鏡檢測方式而大幅提昇檢測未經穿孔製程之玻璃基板的後續製程可靠度。The present invention provides a glass substrate inspection system suitable for inspecting glass substrates before perforation. The technical features of the various subcomponents disclosed in this glass substrate inspection system significantly improve the reliability of subsequent processes for inspecting glass substrates before perforation, unlike conventional microscope inspection methods previously used.

Description

玻璃基板檢測系統Glass substrate inspection system

本發明係與玻璃檢測技術相關,特別是指一種適宜未經穿孔前之玻璃基板檢測系統。 This invention relates to glass inspection technology, and in particular to a system suitable for inspecting glass substrates before perforation.

當前用於檢測未經穿孔製程前(預穿孔)之玻璃基板(Pre-TGV,Through Glass Via)時,一般係經過雷射改質製程之玻璃基板後再進行穿孔製程,然而,前述習知檢測方式係透過傳統顯微鏡進行檢測,如此,除了會讓未經穿孔製程之玻璃基板大幅降低量測可靠度進而影響後續製程良率之外,此外,更常會發生未實質貫穿的現象,著實讓檢測人員備感不便。 Current inspection methods for pre-TGV (Through Glass Via) glass substrates prior to perforation (pre-TGV) typically involve laser-modifying the substrates before the perforation process. However, this conventional inspection method uses a traditional microscope. This significantly reduces measurement reliability, impacting the yield of subsequent processes, and often results in incomplete perforation, causing significant inconvenience for inspection personnel.

因此,要如何有效地提升未經穿孔製程前之玻璃基板(Pre-TGV,Through Glass Via)的檢測良率,實則本發明亟欲改善之目的。 Therefore, how to effectively improve the inspection yield of glass substrates before the perforation process (Pre-TGV, Through Glass Via) is actually the urgent goal of this invention.

而為了要解決先前技術所述之問題,本發明係提供一種適用於檢測未經穿孔製程前(預穿孔)之玻璃基板(Pre-TGV,Through Glass Via)的玻璃基板檢測系統,藉由該玻璃基板檢測系統所揭露的各子構件的技術特徵,將能有別於先前技術中所提之傳統顯微鏡檢測方式而大幅提昇檢測未經穿孔製程之玻璃基板的後續製程可靠度。 To address the issues described in prior art, the present invention provides a glass substrate inspection system suitable for inspecting pre-TGV (Through Glass Via) glass substrates before the perforation process. By utilizing the technical features of the various sub-components disclosed in this glass substrate inspection system, the system significantly improves the reliability of subsequent processes for inspecting pre-TGV glass substrates, unlike conventional microscope inspection methods used in prior art.

而為達成上述目的,本發明係提供一種玻璃基板檢測系統,其包含有一個微處理單元、一個承載單元、一個第一檢測裝置以及一個第二檢測裝置;而該微處理單元、該第一檢測裝置以及該第二檢測裝置係各別組設在該承載單元,且該承載單元係設有一個背光模組以及一個匹配該背光模組的背光模組偏光板;其中,該微處理單元係各別電性連接且各別電性控制該承載單元、該第一檢測裝置以及該第二檢測裝置,使該第一檢測裝置以及該第二檢測裝置係各別對應於被放置在該承載單元上的一待測物;其中,該微處理單元係具有一個單位面積預穿孔檢測運算邏輯,用以分析運算被放置在該承載單元上之待測物所產生的影像辨識後並產生一單位面積內未經穿孔製程之預穿孔判別資訊。 To achieve the above-mentioned purpose, the present invention provides a glass substrate detection system, which includes a microprocessor unit, a carrier unit, a first detection device and a second detection device; the microprocessor unit, the first detection device and the second detection device are respectively assembled in the carrier unit, and the carrier unit is provided with a backlight module and a backlight module polarizing plate matching the backlight module; wherein the microprocessor unit is respectively electrically connected to the first detection device and the second detection device. The carrier unit, the first detection device, and the second detection device are electrically controlled so that the first detection device and the second detection device correspond to a DUT placed on the carrier unit. The microprocessor unit includes a unit area pre-perforation detection logic for analyzing and calculating the image recognition of the DUT placed on the carrier unit and generating pre-perforation identification information for a unit area that has not undergone the perforation process.

而透過本發明所揭露之玻璃基板檢測系統的該微處理單元之單位面積預穿孔檢測運算邏輯、該第一檢測裝置以及該第二檢測裝置等技術特徵,除了能有別於先前技術中所提之傳統顯微鏡檢測方式,即大幅提昇未經穿孔製程之玻璃基板之後續製程可靠度之外,若一旦發現如該預穿孔並未完成特殊製程之預貫穿現象時,將能有效地讓檢測人員實質檢測出進而達到良率提升之顯著功效。 The glass substrate inspection system disclosed in this invention, featuring the microprocessor's per-area pre-drilling inspection logic, the first inspection device, and the second inspection device, not only significantly improves the reliability of subsequent processes for glass substrates that have not undergone perforation, compared to conventional microscope inspection methods in prior art. Furthermore, if a pre-drilling process is detected, such as one that has not completed a specific process, this system allows inspection personnel to conduct a physical inspection, significantly improving yield.

1A:玻璃基板檢測系統 1A: Glass Substrate Inspection System

2A:玻璃基板 2A: Glass substrate

10A:微處理單元 10A: Microprocessor Unit

11A:預穿孔真圓度演算邏輯 11A: Pre-punched roundness calculation logic

15A:單位面積預穿孔檢測運算邏輯 15A: Unit Area Pre-Punch Detection Logic

20A:承載單元 20A: Carrier unit

21A:載台 21A: Carrier

212A:頂部 212A: Top

213A:底部 213A: Bottom

214A:凸垣 214A: Convex Wall

215A:背光模組 215A: Backlight module

216A:背光模組偏光板 216A: Backlight module polarizer

23A:載台滑軌組 23A: Carrier slide rail assembly

25A:支撐臂 25A: Support Arm

251A:第一滑軌組 251A: First slide rail assembly

253A:第二滑軌組 253A: Second slide rail assembly

255A:基座 255A: Base

30A:第一檢測裝置 30A: First detection device

31A:攝像模組 31A: Camera Module

33A:第一檢測偏光板 33A: First detection polarizer

40A:第二檢測裝置 40A: Second detection device

41A:攝像模組 41A: Camera Module

43A:第二檢測偏光板 43A: Second detection polarizer

50A:電源供應模組 50A: Power supply module

2r、2s、2t:預穿孔 2r, 2s, 2t: Pre-punched

圖1係本發明較佳實施例之系統架構圖,主要係揭露一種適用於未經穿孔製程前之玻璃基板的玻璃基板檢測系統。 Figure 1 is a system architecture diagram of a preferred embodiment of the present invention, primarily illustrating a glass substrate inspection system suitable for glass substrates before undergoing a perforation process.

圖2係為圖1所揭露之玻璃基板檢測系統中部分構件立體示意圖,主要係揭露一未經穿孔製程前之玻璃基板尚未放置在該玻璃基板檢測系統前之狀態。 Figure 2 is a schematic three-dimensional diagram of some components of the glass substrate inspection system disclosed in Figure 1, primarily illustrating a glass substrate before being placed in front of the glass substrate inspection system and undergoing a perforation process.

圖3係為類似圖2之部分構件立體示意圖,主要係揭露該未經穿孔製程前之玻璃基板已放置在該玻璃基板檢測系統之一承載單元上之狀態。 Figure 3 is a schematic 3D diagram of some components similar to Figure 2, primarily illustrating the glass substrate before perforation, placed on a carrier unit of the glass substrate inspection system.

圖4係為類似圖3之部分構件立體示意圖,主要係揭露該未經穿孔製程前之玻璃基板及該承載單元已被推進運動至一待檢測位置之狀態。 Figure 4 is a schematic three-dimensional diagram of some components similar to Figure 3, primarily showing the glass substrate before the perforation process and the carrier unit being advanced to a position to be inspected.

圖5係為類似圖4之部分構件立體示意圖,主要係揭露該玻璃基板檢測系統之一第一檢測裝置、一第二檢測裝置下降運動靠近至該未經穿孔製程前之玻璃基板上方之狀態。 Figure 5 is a schematic three-dimensional diagram of some components similar to Figure 4 , primarily illustrating a first inspection device and a second inspection device of the glass substrate inspection system moving downward and approaching the top of the glass substrate before the perforation process.

圖6係為類似圖5之前視示意圖,主要係揭露該玻璃基板檢測系統之該第一檢測裝置、該第二檢測裝置一併經抬升運動後遠離該未經穿孔製程前之玻璃基板的檢測狀態。 FIG6 is a schematic front view similar to FIG5 , primarily illustrating the inspection status of the first inspection device and the second inspection device of the glass substrate inspection system after being lifted and moved away from the glass substrate before the perforation process.

圖7係為圖6所揭露之玻璃基板檢測系統經該第一檢測裝置、該第二檢測裝置攝取該未經穿孔製程前之玻璃基板局部若干個預穿孔圖像數據後,並由該微處理單元執行一單位面積預穿孔檢測運算邏輯後的檢測狀態示意圖。 Figure 7 is a schematic diagram of the glass substrate inspection system shown in Figure 6 , after the first and second inspection devices capture a plurality of pre-perforation image data of a portion of the glass substrate before the perforation process, and the microprocessor unit executes a unit area pre-perforation inspection logic operation.

申請人首先在此說明,於整篇說明書中,包括以下介紹的實施例以及申請專利範圍的各請求項中,有關方向性的名詞皆以本案〔圖示簡單說明〕中所列各圖式的方向為基準。其次,在以下將要介紹之實施例及圖式中,相同之元件標號,代表相同或近似之元件或其結構特徵。而且,有關本發明的詳細構造、特點、組裝或使用、製造等方式,將於後續的實施方式詳細說明中予以描述,然,在本發明領域中具有通常知識者應能瞭解,該等詳細說明及本發明所列舉的實施例,係僅用於支持說明本發明實能據以實現,並非用以限制本發明之申請專利範圍。 The applicant first clarifies that throughout this specification, including the embodiments described below and the various claims in the patent application, directional terms are based on the orientation of the various figures listed in the [Simplified Description of the Figures] of this application. Furthermore, in the embodiments and figures described below, identical component numbers represent identical or similar components or structural features. Furthermore, the detailed structure, features, assembly, use, and manufacturing methods of the present invention will be described in the subsequent detailed description of the embodiments. However, those skilled in the art will understand that such detailed description and the embodiments listed herein are intended solely to support and illustrate that the present invention can be implemented and are not intended to limit the scope of the patent application.

請先參閱圖1及圖2,為本發明較佳實施例所揭露之一種適用於檢測未經穿孔製程前之玻璃基板2A(Pre-TGV,Through Glass Via)的玻璃基板檢測系統1A,而該玻璃基板檢測系統1A係包含有一個微處理單元10A、一個承載單元20A、一個第一檢測裝置30A、一個第二檢測裝置40A以及一個電源供應模組50A,其中,該微處理單元10A、該第一檢測裝置30A、該第二檢測裝置40A以及該電源供應模組50A係各別組設在該承載單元20A;而該微處理單元10A係各別電性連接且各別電性控制該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置40A,使該第一檢測裝置30A以及該第二檢測裝置40A係各別對應被放置在該承載單元20A上的待測物,即本實施例中所舉例之經穿孔製程後的該玻璃基板2A;而該電源供應模組50A係各別電性連接且各別供應該 微處理單元10A、該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置40A所需之電力電源。 Please refer to FIG. 1 and FIG. 2 , which are a glass substrate inspection system 1A disclosed in a preferred embodiment of the present invention, which is suitable for inspecting a glass substrate 2A before a perforation process (Pre-TGV, Through Glass Via). The glass substrate inspection system 1A includes a microprocessor unit 10A, a carrier unit 20A, a first inspection device 30A, a second inspection device 40A, and a power supply module 50A. The microprocessor unit 10A, the first inspection device 30A, the second inspection device 40A, and the power supply module 50A are respectively assembled on the carrier unit 20A; and the microprocessor unit 10A is respectively electrically connected and electrically controlled. The carrier unit 20A, the first detection device 30A, and the second detection device 40A are configured so that the first detection device 30A and the second detection device 40A correspond to the object to be tested placed on the carrier unit 20A, i.e., the glass substrate 2A after the perforation process in this embodiment. The power supply module 50A is electrically connected to and supplies the power required by the microprocessor 10A, the carrier unit 20A, the first detection device 30A, and the second detection device 40A.

請再參閱圖1,該微處理單元10A係具有一個預穿孔真圓度演算邏輯11A以及一個單位面積預穿孔檢測運算邏輯15A;其中,該單位面積預穿孔檢測運算邏輯15A係用以結合運算該預穿孔真圓度演算邏輯11A並分析運算被放置在該承載單元20A上之待測物的影像辨識演算邏輯進而產生一個單位面積內未經穿孔製程之預穿孔判別資訊;而值得一提的是,本發明較佳實施例所提之微處理單元10A的該預穿孔真圓度演算邏輯11A係以經雷射改質後的預穿孔輪廓相對於理想穿孔的徑向偏移量來定義之,亦即相對於同一圓心之最大半徑與最小半徑的差值輔助界定之;又而值得一提的是,本發明較佳實施例所提之微處理單元10A的該單位面積預穿孔檢測運算邏輯15A係包含但不限於採用傅立葉轉換演算法、掃描線演算法(sweep-line)、核函數(kernel method)或其組合等演算邏輯所組成。 Please refer to FIG1 again. The microprocessor 10A has a pre-punching true roundness calculation logic 11A and a unit area pre-punching detection operation logic 15A. The unit area pre-punching detection operation logic 15A is used to combine the operation of the pre-punching true roundness calculation logic 11A and analyze the image recognition operation logic of the object to be tested placed on the carrier unit 20A to generate a unit area of pre-punching discrimination information without the punching process. It is worth mentioning that the microprocessor of the preferred embodiment of the present invention The pre-drilled hole true circularity calculation logic 11A of the processing unit 10A is defined by the radial offset of the laser-modified pre-drilled hole profile relative to the ideal hole, that is, the difference between the maximum radius and the minimum radius relative to the same center of the circle. It is also worth mentioning that the unit area pre-drilled hole detection calculation logic 15A of the microprocessor unit 10A of the preferred embodiment of the present invention includes, but is not limited to, calculation logic using Fourier transform algorithms, sweep-line algorithms, kernel methods, or combinations thereof.

請再一併參閱圖1至圖5,而該承載單元20A係包含一個呈板形體的載台21A、一個載台滑軌組23A以及一個大致上呈垂直且鄰近於該載台滑軌組23A的支撐臂25A;而該呈成板形體的載台21A係具有一個可透光的頂部212A以及一個相對應於該頂部212A的底部213A,該載台21A之頂部212A係用以承載該經穿孔製程後的該玻璃基板2A,較佳地,該載台21A之頂部212A係具有複數間隔設置的凸垣214A,使經穿孔製程後的該玻璃基板2A得以被承載在該等凸垣214A上,該載台 21A之底部213A係用以樞設在該載台滑軌組23A上,使該載台21A及該玻璃基板2A係可依據該載台滑軌組23A的軌道方向呈往復滑移運動,此外,該載台21A係內嵌設有一個背光模組215A以及一個匹配於該背光模組215A的背光模組偏光板216A,較佳地,該背光模組215A係較靠近該載台21A之底部213A的位置,該背光模組偏光板216A係較靠近該載台21A之頂部212A的位置,且皆朝該載台21A之頂部212A的方向透光;而該支撐臂25A係包含一個第一滑軌組251A、一個第二滑軌組253A以及一個基座255A,該支撐臂25A之第一滑軌組251A係組設在該支撐臂25A對應於該載台滑軌組23A的同一側,且該第一滑軌組251A的滑軌延伸方向基本上與該載台滑軌組23A的滑軌延伸方向呈同一方向設置,該支撐臂25A之第二滑軌組253A係樞設在該第一滑軌組251A上,且該第二滑軌組253A的滑軌延伸方向基本上係與第一滑軌組251A的滑軌延伸方向呈交叉設置,該基座255A係樞設在該第二滑軌組253A,並可依據第二滑軌組253A的軌道延伸方向呈往復滑移運動,較佳地,該第二滑軌組253A以及該基座255A係可依據該第一滑軌組251A的軌道延伸方向呈往復滑移運動。而值得一提的是,該承載單元20A之載台21A的該背光模組215A所產生的可調光源為1,000~20,000cd/m2,而經由該背光模組偏光板216A所產生的可調光源為500~10,000cd/m2。 Please refer to Figures 1 to 5 together. The supporting unit 20A includes a plate-shaped carrier 21A, a carrier rail assembly 23A, and a support arm 25A that is substantially vertical and adjacent to the carrier rail assembly 23A. The plate-shaped carrier 21A has a light-transmissive top 212A and a bottom 213A corresponding to the top 212A. The top 212A of the carrier 21A is used to support the glass substrate 2A after the perforation process. Preferably, the top 212A of the carrier 21A has a plurality of spaced-apart arrangements. The protruding walls 214A allow the perforated glass substrate 2A to be supported on these walls. The bottom 213A of the carrier 21A is pivoted on the carrier rail assembly 23A, allowing the carrier 21A and the glass substrate 2A to slide back and forth along the track of the carrier rail assembly 23A. Furthermore, the carrier 21A is embedded with a backlight module 215A and a backlight module polarizer 216A that matches the backlight module 215A. Preferably, the backlight module 215A is closer to the bottom of the carrier 21A. 213A, the backlight module polarizer 216A is closer to the top 212A of the carrier 21A and transmits light in the direction of the top 212A of the carrier 21A; and the support arm 25A includes a first slide rail group 251A, a second slide rail group 253A and a base 255A. The first slide rail group 251A of the support arm 25A is arranged on the same side of the support arm 25A corresponding to the carrier slide rail group 23A, and the extension direction of the slide rail of the first slide rail group 251A is basically the same as the extension direction of the slide rail of the carrier slide rail group 23A. The second slide group 253A of the support arm 25A is pivoted on the first slide group 251A, and the slide extension direction of the second slide group 253A is basically cross-arranged with the slide extension direction of the first slide group 251A. The base 255A is pivoted on the second slide group 253A and can slide back and forth according to the track extension direction of the second slide group 253A. Preferably, the second slide group 253A and the base 255A can slide back and forth according to the track extension direction of the first slide group 251A. It is worth mentioning that the adjustable light source generated by the backlight module 215A of the carrier 21A of the carrier unit 20A is 1,000-20,000 cd/m², while the adjustable light source generated by the backlight module polarizer 216A is 500-10,000 cd/m².

請再一併參閱圖1至圖5,而該第一檢測裝置30A與該第二檢測裝置40A係各別裝設在該承載單元20A之支撐臂25A的該基座255A上,如此一來,該第一檢測裝置30A與該第二檢測裝置40A係可依 據該承載單元20A之支撐臂25A的該第一滑軌組251A的軌道延伸方向呈往復滑移運動,或者可依據該承載單元20A之支撐臂25A的該第二滑軌組253A的軌道延伸方向呈往復滑移運動;而該第一檢測裝置30A係包含有一個攝像模組31A以及一個組設在該攝像模組31A的第一檢測偏光板33A,且該攝像模組31A與該第一檢測偏光板33A係皆受到該微處理單元10A的電性連接與電性控制,其中,該攝像模組31A與該第一檢測偏光板33A基本上係皆垂直且對應於該承載單元20A之載台滑軌組23A的方向,較佳地,該第一檢測偏光板33A係組設在該攝像模組31A的鏡頭前;而該第二檢測裝置40A係包含有一個攝像模組41A以及一個組設在該攝像模組41A的第二檢測偏光板43A,且該攝像模組41A與該第二檢測偏光板43A係皆受到該微處理單元10A的電性連接與電性控制,其中,該攝像模組41A與該第二檢測偏光板43A基本上係皆與該承載單元20A之載台滑軌組23A的方向呈相同的一個預定傾斜角度設置,較佳地,該第二檢測偏光板43A係組設在該攝像模組41A的鏡頭前。而值得一提的是,該第一檢測裝置30A之攝像模組31A以及該第二檢測裝置40A之攝像模組41A基本上係皆由一工業用攝像機(其型號係包含但不限於MBS2041POE[5m 5472 x 3648畫素、5.5fps]、GigE[6M黑白1/1.8"/5m 3072 x 2048畫素]等)及一工業用攝像鏡頭(其型號係包含但不限於FA鏡頭[LM12FC24M]、1X遠心鏡頭等)所組成,前述所提之技術特徵皆為凡所屬技術領域中具有通常知識者得經參酌本發明較佳實施例後,即 能易於思及、或僅屬型號、數量上或尺寸上之簡易置換變化,因此,皆非用以作為限定本發明所欲主張之技術特徵,合先敘明。 Please refer to Figures 1 to 5 together. The first detection device 30A and the second detection device 40A are respectively mounted on the base 255A of the support arm 25A of the support unit 20A. In this way, the first detection device 30A and the second detection device 40A can slide back and forth according to the extension direction of the first slide rail assembly 251A of the support arm 25A of the support unit 20A, or The second slide rail assembly 253A of the support arm 25A of the carrier unit 20A can be reciprocated and slid in the extending direction of the rail. The first detection device 30A includes a camera module 31A and a first detection polarizer 33A mounted on the camera module 31A. The camera module 31A and the first detection polarizer 33A are both electrically connected and electrically controlled by the microprocessor unit 10A. The camera module 31A and the first detection polarizer 33A are substantially perpendicular and correspond to the direction of the platform slide assembly 23A of the carrier unit 20A. Preferably, the first detection polarizer 33A is arranged in front of the lens of the camera module 31A; and the second detection device 40A includes a camera module 41A and a second detection polarizer 43A arranged in the camera module 41A, and The camera module 41A and the second detection polarizer 43A are both electrically connected and electrically controlled by the microprocessor unit 10A. The camera module 41A and the second detection polarizer 43A are basically arranged at a predetermined tilt angle that is the same as the direction of the stage slide assembly 23A of the supporting unit 20A. Preferably, the second detection polarizer 43A is assembled in front of the lens of the camera module 41A. It is worth mentioning that the camera module 31A of the first detection device 30A and the camera module 41A of the second detection device 40A are basically an industrial camera (its model includes but is not limited to MBS2041POE [5m 5472 x 3648 pixels, 5.5fps], GigE [6M black and white 1/1.8"/5m 3072 x 2048 pixels], etc.) and an industrial camera lens (models including but not limited to FA lenses [LM12FC24M] and 1X telecentric lenses). The aforementioned technical features are readily apparent to those skilled in the art after considering the preferred embodiments of the present invention, and may simply involve simple substitutions and variations in model, quantity, or size. Therefore, they are not intended to limit the technical features claimed by the present invention and should be noted in advance.

以上為本發明較佳實施例所揭露之玻璃基板檢測系統1A及其各子構件的技術特徵,其後將繼續揭露若藉由該玻璃基板檢測系統1A並用以檢測未經穿孔製程後之玻璃基板2A(Pre-TGV,Through Glass Via)及其所欲達成之功效乃在於: The above describes the technical features of the glass substrate inspection system 1A and its various subcomponents disclosed in a preferred embodiment of the present invention. The following describes how the glass substrate inspection system 1A is used to inspect glass substrates 2A that have not undergone a through-glass via (TGV) process, and the desired effects achieved:

其一,請一併參閱圖1至圖4,首先,當該玻璃基板檢測系統1A欲進行檢測動作前,此時,藉由該玻璃基板檢測系統1A之微處理單元10A係先行產生一個初始訊號並以電性各別傳輸至該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置40A的技術特徵,如此一來,將使該承載單元20A之載台滑軌組23A得以依據該初始訊號將該載台21A推進運行至遠離該支撐臂25A的一個預定水平初始位置,亦將使該承載單元20A之支撐臂25A的該第一滑軌組251A得以依據該初始訊號一併將該第二滑軌組253A、該基座255A、該第一檢測裝置30A及該第二檢測裝置40A抬升運行至遠離該載台滑軌組23A的一個預定垂直初始位置,進而讓檢測人員在進行檢測前得以達到機構初步復歸之功效。 First, please refer to Figures 1 to 4. First, before the glass substrate detection system 1A is about to perform a detection operation, the microprocessor 10A of the glass substrate detection system 1A first generates an initial signal and transmits it electrically to the carrier unit 20A, the first detection device 30A, and the second detection device 40A. In this way, the carrier slide rail assembly 23A of the carrier unit 20A can push the carrier 21A according to the initial signal. When the first rail assembly 251A of the support arm 25A of the carrier unit 20A moves to a predetermined horizontal initial position away from the support arm 25A, the first rail assembly 251A of the support arm 25A will, based on the initial signal, simultaneously lift the second rail assembly 253A, the base 255A, the first detection device 30A, and the second detection device 40A to a predetermined vertical initial position away from the carrier rail assembly 23A. This allows the inspector to achieve a preliminary reset of the mechanism before conducting an inspection.

其二,請一併參閱圖1至圖5,接著,當該未經穿孔製程前之玻璃基板2A(Pre-TGV,Through Glass Via)被穩定地放置在該承載單元20A之載台21A的頂部212A之該等凸垣214A上時,此時,藉由該玻璃基板檢測系統1A之微處理單元10A產生一個待測訊號並以電性各別傳輸至該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置 40A的技術特徵,如此一來,使該承載單元20A之載台滑軌組23A得以依據該待測訊號將該載台21A、該載台21A內所嵌設的該背光模組215A與該背光模組偏光板216A以及被放置在該載台21A之該等凸垣214A上的該玻璃基板2A等構件皆自該預定水平初始位置穩定地滑移運行至靠近該支撐臂25A下方的一個預定待測位置,同時,亦將使該承載單元20A之支撐臂25A的該第一滑軌組251A得以依據該待測訊號一併將該第二滑軌組253A、該基座255A、該第一檢測裝置30A以及該第二檢測裝置40A自該預定垂直初始位置下降運行至距離被放置在該載台21A之該等凸垣214A上的該玻璃基板2A的一個預定待測高度,較佳地,使該第一檢測裝置30A之攝像模組31A的攝像鏡頭前的該第一檢測偏光板33A與該玻璃基板2A的垂直待測預定距離係介於10mm至220mm之間,使該第二檢測裝置40A之攝像模組41A的攝像鏡頭前的該第二檢測偏光板43A與該玻璃基板2A的待測預定距離係介於10mm至220mm之間,進而讓該玻璃基板檢測系統1A整體達到檢測前機構對位校準之功效。 Secondly, please refer to Figures 1 to 5 together. Next, when the pre-TGV (Through Glass Via) glass substrate 2A is stably placed on the ridges 214A of the top 212A of the carrier 21A of the carrier unit 20A, the microprocessor 10A of the glass substrate inspection system 1A generates a test signal and electrically transmits it to the carrier unit 20A, the first inspection device 30A, and the second inspection device 40A. This allows the carrier rail assembly 20A of the carrier unit 20A to be tested. 3A can slide the carrier 21A, the backlight module 215A and the backlight module polarizer 216A embedded in the carrier 21A, and the glass substrate 2A placed on the ridges 214A of the carrier 21A steadily from the predetermined horizontal initial position to a predetermined position to be tested near the bottom of the support arm 25A according to the test signal. At the same time, the support arm 25A of the carrier unit 20A will also be The first slide rail assembly 251A can simultaneously lower the second slide rail assembly 253A, the base 255A, the first detection device 30A, and the second detection device 40A from the predetermined vertical initial position to a predetermined height to be measured from the glass substrate 2A placed on the ridges 214A of the carrier 21A according to the signal to be measured. Preferably, the camera lens of the camera module 31A of the first detection device 30A is The predetermined vertical distance between the first detection polarizer 33A in front of the camera lens and the glass substrate 2A is between 10 mm and 220 mm. This also ensures that the predetermined vertical distance between the second detection polarizer 43A in front of the camera lens of the second detection device 40A and the glass substrate 2A is between 10 mm and 220 mm. This allows the entire glass substrate inspection system 1A to achieve pre-inspection alignment.

其三,請一併參閱圖1至圖7,而當該玻璃基板檢測系統1A之微處理單元10A產生一個玻璃基板檢測訊號並以電性各別傳輸至該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置40A時,該承載單元20A之支撐臂25A的該第一滑軌組251A、該第二滑軌組253A係皆依據該玻璃基板檢測訊號再次地將該第一檢測裝置30A進行運動,直至該第一檢測裝置30A之攝像模組31A的攝像鏡頭與組設在該攝像鏡頭前之第一檢測偏光板33A、該第二檢測裝置40A之攝像模組41A的攝像 鏡頭與組設在該攝像鏡頭前之第二檢測偏光板43A各別與該玻璃基板2A的垂直檢測距離係介於30mm至200mm之間,其中,該第二檢測裝置40A之攝像模組41A的攝像鏡頭與組設在該攝像鏡頭前之第二檢測偏光板43A係與該玻璃基板2A二者之間係形成一個預定檢測角度係介於20度至70度之間,此時,該第一檢測裝置30A之攝像模組31A的攝像鏡頭與該第二檢測裝置40A之攝像模組41A的攝像鏡頭係各別將該玻璃基板2A上的複數個預穿孔圖像數據(於本實施例中,該數據基本上係由文字、圖像、多媒體視頻或其組合等所構成)電性傳輸至該微處理單元10A中,使該微處理單元10A係藉由一併執行該預穿孔真圓度演算邏輯11A與該單位面積預穿孔檢測運算邏輯15A的技術特徵,如此一來,係使該微處理單元10A之單位面積預穿孔檢測運算邏輯15A得依據經該第一檢測裝置30A之攝像模組31A、該第一檢測偏光板33A與該第二檢測裝置40A之攝像模組41A、該第二檢測偏光板43A所各自攝取自該玻璃基板2A上該等複數個未經穿孔製程的圖像數據進行邏輯運算後,進而產生一個單位面積內未經穿孔製程之預穿孔判別資訊(包含但不限於該玻璃基板2A上之任一預穿孔經雷射改質製程後的相關資訊)並藉由電性連接於外部的一個顯示裝置予以顯示,即如圖7所示,該玻璃基板2A上的局部預穿孔2r、2s及2t中,經該玻璃基板檢測系統1A之微處理單元10A執行該預穿孔真圓度演算邏輯11A與該單位面積預穿孔檢測運算邏輯15A後可獲悉其後相關判別資訊:(a)該預穿孔2r判定為預穿孔製程成立;(b)該預穿孔2s、2t判定為預穿孔製程未成立。綜前所述,係進而讓該玻璃 基板檢測系統1A除了能有別於先前技術中所提之檢測方式,即大幅提昇未經穿孔製程之玻璃基板之後續製程可靠度之外,若一旦發現如該預穿孔2s、2t並未完成特殊製程之預貫穿現象時,將能有效地讓檢測人員實質檢測出進而達到良率提升之顯著功效。 Third, please refer to Figures 1 to 7 together. When the microprocessor 10A of the glass substrate detection system 1A generates a glass substrate detection signal and transmits it electrically to the carrier unit 20A, the first detection device 30A, and the second detection device 40A, the first slide rail assembly 251A and the second slide rail assembly 253A of the support arm 25A of the carrier unit 20A both move the first detection device 30A again according to the glass substrate detection signal until the camera lens of the camera module 31A of the first detection device 30A and the first detection polarizer 33A arranged in front of the camera lens and the camera lens of the camera module 41A of the second detection device 40A are aligned. The vertical detection distance between the lens and the second detection polarizer 43A assembled in front of the lens and the glass substrate 2A is between 30mm and 200mm. The lens of the camera module 41A of the second detection device 40A and the second detection polarizer 43A assembled in front of the lens form a predetermined detection angle between 20 degrees and 70 degrees with the glass substrate 2A. At this time, the camera module 31A of the first detection device 30A and the camera module 41A of the second detection device 40A respectively capture a plurality of pre-punched image data on the glass substrate 2A (in this embodiment, the data is basically The above is composed of text, images, multimedia videos or their combination) and is electrically transmitted to the microprocessor 10A, so that the microprocessor 10A executes the technical features of the pre-punching true roundness calculation logic 11A and the unit area pre-punching detection calculation logic 15A at the same time. In this way, the unit of the microprocessor 10A is The area pre-perforation detection operation logic 15A may be based on the image data of the plurality of non-perforated image data on the glass substrate 2A captured by the camera module 31A of the first detection device 30A, the first detection polarizer 33A and the camera module 41A of the second detection device 40A, and the second detection polarizer 43A. After the calculation, pre-hole discrimination information for a unit area that has not undergone a perforation process is generated (including but not limited to relevant information of any pre-hole on the glass substrate 2A after the laser modification process) and displayed by a display device electrically connected to an external device. As shown in FIG7 , for the local pre-holes 2r, 2s, and 2t on the glass substrate 2A, the microprocessor 10A of the glass substrate inspection system 1A executes the pre-hole true roundness calculation logic 11A and the unit area pre-hole detection operation logic 15A to obtain the following relevant discrimination information: (a) the pre-hole 2r is determined to have been successfully processed; and (b) the pre-holes 2s and 2t are determined to have been unsuccessful. In summary, the glass substrate inspection system 1A not only significantly improves the reliability of subsequent processes for glass substrates that have not undergone perforation processing, unlike previous inspection methods, but also effectively enables inspection personnel to detect if pre-perforation 2s or 2t, for example, has not completed a specific process, thereby significantly improving yield.

其四,請一併參閱圖1至圖6,最後,當該玻璃基板檢測系統1A完成前述該等檢測動作後,此時,藉由該玻璃基板檢測系統1A之微處理單元10A係先行產生一個復歸訊號並以電性各別傳輸至該承載單元20A、該第一檢測裝置30A以及該第二檢測裝置40A的技術特徵,如此一來,將使該承載單元20A之載台滑軌組23A得以依據該復歸訊號將該載台21A再次推進運行至遠離該支撐臂25A的該預定水平初始位置,亦將使該承載單元20A之支撐臂25A的該第一滑軌組251A得以依據該復歸訊號一併將該第二滑軌組253A、該基座255A、該第一檢測裝置30A以及該第二檢測裝置40A抬升運行至遠離該載台滑軌組23A的該預定垂直初始位置,進而讓檢測人員在進行檢測動作後得以復歸機構之功效。 Fourthly, please refer to FIG. 1 to FIG. 6 . Finally, when the glass substrate detection system 1A completes the aforementioned detection operations, the microprocessor 10A of the glass substrate detection system 1A first generates a reset signal and transmits it electrically to the carrier unit 20A, the first detection device 30A, and the second detection device 40A. In this way, the carrier slide rail assembly 23A of the carrier unit 20A can move the carrier 21 according to the reset signal. A is pushed forward again to the predetermined horizontal initial position away from the support arm 25A. This also causes the first rail assembly 251A of the support arm 25A of the carrier unit 20A to simultaneously lift the second rail assembly 253A, the base 255A, the first detection device 30A, and the second detection device 40A to the predetermined vertical initial position away from the carrier rail assembly 23A based on the reset signal. This allows the inspector to reset the mechanism after performing the inspection.

1A:玻璃基板檢測系統 1A: Glass Substrate Inspection System

10A:微處理單元 10A: Microprocessor Unit

11A:預穿孔真圓度演算邏輯 11A: Pre-punched roundness calculation logic

15A:單位面積預穿孔檢測運算邏輯 15A: Unit Area Pre-Punch Detection Logic

20A:承載單元 20A: Carrier unit

30A:第一檢測裝置 30A: First detection device

40A:第二檢測裝置 40A: Second detection device

50A:電源供應模組 50A: Power supply module

Claims (10)

一種玻璃基板檢測系統,其包含:一微處理單元(10A)、一承載單元(20A)、一第一檢測裝置(30A)以及一第二檢測裝置(40A);其中,該微處理單元(10A)、該第一檢測裝置(30A)以及該第二檢測裝置(40A)係各別組設在該承載單元(20A),且該承載單元(20A)係設有一背光模組(215A)以及一匹配該背光模組(215A)的背光模組偏光板(216A);其中,該微處理單元(10A)係各別電性連接且各別電性控制該承載單元(20A)、該第一檢測裝置(30A)以及該第二檢測裝置(40A),使該第一檢測裝置(30A)以及該第二檢測裝置(40A)係各別對應於被放置在該承載單元(20A)上的一待測物;其中,該微處理單元(10A)係具有一預穿孔真圓度演算邏輯(11A)以及一單位面積預穿孔檢測運算邏輯(15A),該單位面積預穿孔檢測運算邏輯(15A)係用以結合運算該預穿孔真圓度演算邏輯(11A)並用以分析運算被放置在該承載單元(20A)上之待測物所產生的影像辨識後並產生一單位面積內未經穿孔製程之預穿孔判別資訊。A glass substrate detection system comprises: a microprocessing unit (10A), a carrier unit (20A), a first detection device (30A) and a second detection device (40A); wherein the microprocessing unit (10A), the first detection device (30A) and the second detection device (40A) are respectively assembled in the carrier unit (20A), and the carrier unit (20A) is provided with a backlight module (215A) and a backlight module polarizing plate (216A) matching the backlight module (215A); wherein the microprocessing unit (10A) is respectively electrically connected to and electrically controls the carrier unit (20A), the first detection device (30A) and the second detection device (40A); 0A) and the second detection device (40A), so that the first detection device (30A) and the second detection device (40A) respectively correspond to an object to be detected placed on the carrier unit (20A); wherein the microprocessor unit (10A) has a pre-punching true roundness calculation logic (11A) and a unit area pre-punching detection operation logic (15A), and the unit area pre-punching detection operation logic (15A) is used to combine and calculate the pre-punching true roundness calculation logic (11A) and to analyze and calculate the image recognition generated by the object to be detected placed on the carrier unit (20A) and generate pre-punching identification information within a unit area that has not undergone a punching process. 如請求項1所述之玻璃基板檢測系統,其中,該承載單元(20A)係包含一呈板形體的載台(21A)、一載台滑軌組(23A)以及一大致上呈垂直且鄰近於該載台滑軌組(23A)的支撐臂(25A),而該載台(21A)樞設在該載台滑軌組(23A)上,使被放置載該載台(21A)上的該待測物係可依據該載台滑軌組(23A)的軌道方向呈往復滑移運動。A glass substrate inspection system as described in claim 1, wherein the supporting unit (20A) includes a plate-shaped carrier (21A), a carrier slide assembly (23A), and a support arm (25A) that is substantially vertical and adjacent to the carrier slide assembly (23A), and the carrier (21A) is pivoted on the carrier slide assembly (23A) so that the object to be inspected placed on the carrier (21A) can slide back and forth according to the track direction of the carrier slide assembly (23A). 如請求項2所述之玻璃基板檢測系統,其中,該承載單元(20A)之載台(21A)係具有一頂部(212A)以及一相對應於該頂部(212A)的底部(213A);其中,該載台(21A)之頂部(212A)係設有複數間隔設置的凸垣(214A),使該待測物得以被承載在該等凸垣(214A)上,該載台(21A)之底部(213A)係用以樞設在該載台滑軌組(23A)上,使被放置載該載台(21A)上的該待測物係可依據該載台滑軌組(23A)的軌道方向呈往復滑移運動。A glass substrate inspection system as described in claim 2, wherein the carrier (21A) of the supporting unit (20A) has a top (212A) and a bottom (213A) corresponding to the top (212A); wherein the top (212A) of the carrier (21A) is provided with a plurality of spaced-apart protrusions (214A) so that the object to be tested can be carried on the protrusions (214A); and the bottom (213A) of the carrier (21A) is used to pivot on the carrier slide assembly (23A) so that the object to be tested placed on the carrier (21A) can slide back and forth according to the track direction of the carrier slide assembly (23A). 如請求項3所述之玻璃基板檢測系統,其中,該承載單元(20A)之支撐臂(25A)係包含一第一滑軌組(251A)、一第二滑軌組(253A)以及一基座(255A),該第一滑軌組(251A)係組設在該支撐臂(25A)對應於該載台滑軌組(23A)的同一側,該第二滑軌組(253A)係樞設在該第一滑軌組(251A)上,且該第二滑軌組(253A)的滑軌延伸方向係與該第一滑軌組(251A)呈交叉設置,該基座(255A)係樞設在該第二滑軌組(253A);其中, 該第二滑軌組(253A)及該基座(255A)係可依據該第一滑軌組(251A)的軌道延伸方向呈往復滑移運動。The glass substrate inspection system as described in claim 3, wherein the support arm (25A) of the supporting unit (20A) includes a first slide rail group (251A), a second slide rail group (253A) and a base (255A), the first slide rail group (251A) is arranged on the same side of the support arm (25A) as the carrier slide rail group (23A), the second slide rail group (253A) is pivotally mounted on the first slide rail group (251A), and the slide rail extension direction of the second slide rail group (253A) is arranged crosswise with the first slide rail group (251A), and the base (255A) is pivotally mounted on the second slide rail group (253A); wherein, The second slide rail assembly (253A) and the base (255A) can perform reciprocating sliding motion according to the track extension direction of the first slide rail assembly (251A). 如請求項4所述之玻璃基板檢測系統,其中,該第一檢測裝置(30A)與該第二檢測裝置(40A)係各別裝設在該承載單元(20A)之支撐臂(25A)的該基座(255A)上。A glass substrate inspection system as described in claim 4, wherein the first inspection device (30A) and the second inspection device (40A) are respectively installed on the base (255A) of the supporting arm (25A) of the supporting unit (20A). 如請求項2所述之玻璃基板檢測系統,其中,該承載單元(20A)之支撐臂(25A)係包含一第一滑軌組(251A)、一第二滑軌組(253A)以及一基座(255A),該第一滑軌組(251A)係組設在該支撐臂(25A)對應於該載台滑軌組(23A)的同一側,該第二滑軌組(253A)係樞設在該第一滑軌組(251A)上,且該第二滑軌組(253A)的滑軌延伸方向係與該第一滑軌組(251A)呈交叉設置,該基座(255A)係樞設在該第二滑軌組(253A);其中, 該第二滑軌組(253A)及該基座(255A)係可依據該第一滑軌組(251A)的軌道延伸方向呈往復滑移運動。A glass substrate inspection system as described in claim 2, wherein the support arm (25A) of the supporting unit (20A) comprises a first slide rail group (251A), a second slide rail group (253A) and a base (255A), wherein the first slide rail group (251A) is arranged on the same side of the support arm (25A) as the carrier slide rail group (23A), the second slide rail group (253A) is pivotally mounted on the first slide rail group (251A), and the slide rail extension direction of the second slide rail group (253A) is arranged crosswise with the first slide rail group (251A), and the base (255A) is pivotally mounted on the second slide rail group (253A); wherein, The second slide rail assembly (253A) and the base (255A) can perform reciprocating sliding motion according to the track extension direction of the first slide rail assembly (251A). 如請求項6所述之玻璃基板檢測系統,其中,該第一檢測裝置(30A)與該第二檢測裝置(40A)係各別裝設在該承載單元(20A)之支撐臂(25A)的該基座(255A)上。A glass substrate inspection system as described in claim 6, wherein the first inspection device (30A) and the second inspection device (40A) are respectively installed on the base (255A) of the supporting arm (25A) of the supporting unit (20A). 如請求項1至7其中任何一項所述之玻璃基板檢測系統,其中,經該微處理單元(10A)之單位面積預穿孔檢測運算邏輯(15A)結合運算該預穿孔真圓度演算邏輯(11A)所產生之單位面積內未經穿孔製程的預穿孔判別資訊係包含任一預穿孔經雷射改質製程後的預穿孔狀態。A glass substrate inspection system as described in any one of claims 1 to 7, wherein the pre-punching discrimination information within a unit area that has not undergone a punching process, generated by the unit area pre-punching detection logic (15A) of the microprocessor unit (10A) in combination with the pre-punching true roundness calculation logic (11A), includes the pre-punching state of any pre-punching after a laser modification process. 如請求項1至7其中任何一項所述之玻璃基板檢測系統,其中,該第一檢測裝置(30A)係包含一攝像模組(31A)以及組設在該攝像模組(31A)前的一第一檢測偏光板(33A),係皆受該微處理單元(10A)的電性連接與電性控制,而該攝像模組(31A)與該第一檢測偏光板(33A)係垂直且對應於被放置在該承載單元(20A)上的該待測物。A glass substrate inspection system as described in any one of claims 1 to 7, wherein the first inspection device (30A) includes a camera module (31A) and a first detection polarizer (33A) arranged in front of the camera module (31A), both of which are electrically connected to and electrically controlled by the microprocessor unit (10A), and the camera module (31A) and the first detection polarizer (33A) are perpendicular and correspond to the object to be inspected placed on the supporting unit (20A). 如請求項1至7其中任何一項所述之玻璃基板檢測系統,其中,該第二檢測裝置(40A)係包含一攝像模組(41A)以及組設在該攝像模組(41A)前的一第二檢測偏光板(43A),皆受該微處理單元(10A)的電性連接與電性控制,該攝像模組(41A)與該第二檢測偏光板(43A)與被放置在該承載單元(20A)上的該待測物皆朝同方向的一預定傾斜角度設置。A glass substrate inspection system as described in any one of claims 1 to 7, wherein the second inspection device (40A) includes a camera module (41A) and a second detection polarizer (43A) arranged in front of the camera module (41A), both of which are electrically connected and electrically controlled by the microprocessor unit (10A), and the camera module (41A), the second detection polarizer (43A) and the object to be inspected placed on the supporting unit (20A) are all arranged at a predetermined tilt angle in the same direction.
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US20150030230A1 (en) * 2013-07-26 2015-01-29 Hoya Corporation Substrate inspection method, substrate manufacturing method and substrate inspection device
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CN116936390A (en) * 2023-06-13 2023-10-24 深圳市圭华智能科技有限公司 Wafer-level glass through hole TGV detection and process parameter optimization method
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US20150030230A1 (en) * 2013-07-26 2015-01-29 Hoya Corporation Substrate inspection method, substrate manufacturing method and substrate inspection device
US10794679B2 (en) * 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
CN115485093A (en) * 2020-04-30 2022-12-16 株式会社尼康 Machining system
TWI876119B (en) * 2021-01-28 2025-03-11 台灣積體電路製造股份有限公司 Integrated circuit device manufacturing method and system
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