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TWI893141B - Polarizing plate, polarizing plate with phase difference layer, and image display device - Google Patents

Polarizing plate, polarizing plate with phase difference layer, and image display device

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Publication number
TWI893141B
TWI893141B TW110122358A TW110122358A TWI893141B TW I893141 B TWI893141 B TW I893141B TW 110122358 A TW110122358 A TW 110122358A TW 110122358 A TW110122358 A TW 110122358A TW I893141 B TWI893141 B TW I893141B
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Prior art keywords
polarizer
resin
layer
protective layer
polarizing plate
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TW110122358A
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Chinese (zh)
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TW202208181A (en
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川綠一葵
三輪和哉
高永幸佑
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日商日東電工股份有限公司
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Publication of TWI893141B publication Critical patent/TWI893141B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Polarising Elements (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Materials Engineering (AREA)

Abstract

本發明提供一種雖為薄型卻抑制住加熱時之裂痕發生的偏光板。本發明偏光板具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層;該保護層係以具有10µm以下之厚度的樹脂膜構成。在一實施形態中,於令該偏光件之單體透射率為x%、且令該聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1)。在一實施形態中,於令該偏光件之單體透射率為x%、且令該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2)。在一實施形態中,該偏光件於令其單體透射率為x%、且令該聚乙烯醇系樹脂薄膜之定向函數為f時,滿足下述式(3)。在一實施形態中,該偏光件之穿刺強度為30gf/µm以上。 y<-0.011x+0.525     (1) z<-60x+2875         (2) f<-0.018x+1.11      (3)The present invention provides a polarizing plate that suppresses cracking during heating despite being thin. The polarizing plate of the present invention comprises a polarizer formed of a polyvinyl alcohol-based resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; the protective layer is formed of a resin film having a thickness of 10µm or less. In one embodiment, when the monomer transmittance of the polarizer is x% and the birefringence of the polyvinyl alcohol-based resin is y, the following equation (1) is satisfied. In one embodiment, when the monomer transmittance of the polarizer is x% and the in-plane phase difference of the polyvinyl alcohol-based resin film is znm, the following equation (2) is satisfied. In one embodiment, the polarizer satisfies the following formula (3) when its monomer transmittance is x% and the orientation function of the polyvinyl alcohol-based resin film is f. In one embodiment, the puncture strength of the polarizer is 30 gf/µm or more. y<-0.011x+0.525     (1) z<-60x+2875         (2) f<-0.018x+1.11      (3)

Description

偏光板、附相位差層之偏光板及影像顯示裝置Polarizing plate, polarizing plate with phase difference layer, and image display device

本發明涉及偏光板、附相位差層之偏光板及影像顯示裝置。The present invention relates to a polarizing plate, a polarizing plate with a phase difference layer, and an image display device.

近年來,以液晶顯示裝置及電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)為代表之影像顯示裝置急速普及。影像顯示裝置一般係使用包含偏光件與保護該偏光件之保護層的偏光板及相位差板。在實際應用上,廣泛使用偏光板與相位差板一體化而成的附相位差層之偏光板(例如專利文獻1)。而最近隨著對影像顯示裝置之薄型化的需求提高,對偏光板及附相位差層之偏光板之薄型化的需求亦高漲。In recent years, image display devices, typified by liquid crystal displays and electroluminescent (EL) displays (e.g., organic and inorganic EL displays), have rapidly gained popularity. Image display devices generally utilize a polarizing plate and a retardation plate, each comprising a polarizer and a protective layer to protect the polarizer. In practical applications, a polarizing plate with a retardation layer, in which the polarizing plate and retardation plate are integrated, is widely used (e.g., Patent Document 1). Recently, with the increasing demand for thinner image display devices, the demand for thinner polarizing plates and polarizing plates with a retardation layer has also increased.

作為將偏光板薄型化之方法,已提出有將保護層之厚度薄化及僅於偏光件之單側積層保護層。然而,該等方法無法充分保護偏光件,而有因加熱而易發生裂痕之問題。 先前技術文獻 專利文獻Methods for thinning polarizers have been proposed, including thinning the protective layer and laminating the protective layer only on one side of the polarizer. However, these methods fail to adequately protect the polarizer and are prone to cracking due to heat. Prior Art Patent

專利文獻1:日本專利特開2015-210474號公報Patent document 1: Japanese Patent Publication No. 2015-210474

發明欲解決之課題 本發明是為了解決上述以往之課題而成者,其主要目的在於提供一種即便非常薄卻抑制住加熱造成之裂痕發生的偏光板。Problems to be Solved by the Invention This invention was developed to address the aforementioned conventional problems. Its primary purpose is to provide a polarizing plate that, even when very thin, suppresses cracking caused by heating.

用以解決課題之手段 根據本發明之一面向提供一種偏光板,其具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層;該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1);該保護層係以具有10µm以下之厚度的樹脂膜構成。 y<-0.011x+0.525     (1) 根據本發明之一面向提供一種偏光板,其具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層;該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2);該保護層係以具有10µm以下之厚度的樹脂膜構成。 z<-60x+2875         (2) 根據本發明之一面向提供一種偏光板,其具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層;該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂之定向函數為f時,滿足下述式(3);該保護層係以具有10µm以下之厚度的樹脂膜構成。 f<-0.018x+1.11     (3)。 根據本發明之一面向提供一種偏光板,其具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層;該偏光件之穿刺強度為30gf/µm以上;該保護層係以具有10µm以下之厚度的樹脂膜構成。 在一實施形態中,上述樹脂膜包含選自環氧樹脂、(甲基)丙烯酸系樹脂、聚酯系樹脂及聚胺甲酸酯系樹脂中之至少1種樹脂。 在一實施形態中,上述樹脂膜係以環氧樹脂之光陽離子硬化物構成,且上述樹脂膜之軟化溫度為100℃以上。 在一實施形態中,上述樹脂膜係以環氧樹脂之有機溶劑溶液的塗佈膜之固化物構成,且上述樹脂膜之軟化溫度為100℃以上。 在一實施形態中,上述樹脂膜係以熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物構成,且上述樹脂膜之軟化溫度為100℃以上。 在一實施形態中,上述熱塑性(甲基)丙烯酸系樹脂具有選自於由內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元及馬來醯亞胺單元所構成群組中之至少1種。 在一實施形態中,上述保護層之碘吸附量為25重量%以下。 在一實施形態中,上述偏光件之厚度為10μm以下。 在一實施形態中,上述偏光板係捲繞成捲狀。 根據本發明之另一面向,包含上述偏光板與相位差層;且該相位差層係配置於上述偏光件之與配置有上述保護層之側的相反側。 在一實施形態中,上述相位差層係隔著黏著劑層積層於上述偏光板上。 在一實施形態中,上述相位差層之Re(550)為100nm~190nm,Re(450)/Re(550)為0.8以上且小於1,且上述相位差層之慢軸與上述偏光件之吸收軸形成之角度為40°~50°。 根據本發明之另一面向,提供一種影像顯示裝置,其具備上述上述偏光板或附相位差層之偏光板。Means for Solving the Problem According to one aspect of the present invention, a polarizing plate is provided, comprising a polarizer formed of a polyvinyl alcohol-based resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer. The polarizer satisfies the following equation (1) when its single-unit transmittance is x% and the birefringence of the polyvinyl alcohol-based resin is y. The protective layer is formed of a resin film having a thickness of 10µm or less. y<-0.011x+0.525     (1) According to one aspect of the present invention, a polarizing plate is provided, which comprises a polarizer composed of a polyvinyl alcohol resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; the polarizer satisfies the following formula (2) when its single body transmittance is x% and the in-plane phase difference of the polyvinyl alcohol resin film is znm; the protective layer is composed of a resin film having a thickness of 10µm or less. z<-60x+2875         (2) According to one aspect of the present invention, a polarizing plate is provided, which has a polarizer composed of a polyvinyl alcohol resin film containing a dichroic substance and a protective layer arranged on one side of the polarizer; the polarizer satisfies the following formula (3) when its monomer transmittance is x% and the orientation function of the polyvinyl alcohol resin is f; the protective layer is composed of a resin film having a thickness of less than 10µm. f<-0.018x+1.11      (3). According to one aspect of the present invention, a polarizing plate is provided, comprising a polarizer formed of a polyvinyl alcohol-based resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer. The polarizer has a puncture strength of 30 gf/µm or greater, and the protective layer is formed of a resin film having a thickness of 10 µm or less. In one embodiment, the resin film comprises at least one resin selected from epoxy resins, (meth)acrylic resins, polyester resins, and polyurethane resins. In one embodiment, the resin film is formed of a photoion-cured epoxy resin, and the softening temperature of the resin film is above 100°C. In one embodiment, the resin film is formed from a cured product obtained from an epoxy resin coating solution in an organic solvent, and the softening temperature of the resin film is 100°C or higher. In one embodiment, the resin film is formed from a cured product obtained from an organic solvent coating solution of a thermoplastic (meth)acrylic resin, and the softening temperature of the resin film is 100°C or higher. In one embodiment, the thermoplastic (meth)acrylic resin comprises at least one member selected from the group consisting of a lactone ring unit, a glutaric anhydride unit, a glutarimide unit, a maleic anhydride unit, and a maleimide unit. In one embodiment, the protective layer has an iodine adsorption amount of 25% by weight or less. In one embodiment, the polarizer has a thickness of 10 μm or less. In one embodiment, the polarizer is wound into a roll. According to another aspect of the present invention, the polarizer includes the polarizer and a retardation layer; the retardation layer is disposed on the side of the polarizer opposite to the side on which the protective layer is disposed. In one embodiment, the retardation layer is laminated on the polarizer via an adhesive layer. In one embodiment, the Re(550) of the retardation layer is 100 nm to 190 nm, the Re(450)/Re(550) ratio is greater than 0.8 and less than 1, and the angle formed between the slow axis of the retardation layer and the absorption axis of the polarizer is 40° to 50°. According to another aspect of the present invention, an image display device is provided, comprising the aforementioned polarizing plate or a polarizing plate with a retardation layer.

發明效果 根據本發明偏光板,藉由採用聚乙烯醇(PVA)系樹脂之定向狀態經控制的偏光件,則即便在使用極薄之樹脂膜作為保護層之情況下,仍可抑制加熱時之裂痕發生。又,所述偏光件可發揮實際使用上可容許之光學特性,故本發明之偏光板即便非常薄,仍可兼顧實際使用上可容許之光學特性與抑制加熱時之裂痕發生。Effects of the Invention: The polarizing plate of the present invention utilizes a polarizer with a controlled orientation of a polyvinyl alcohol (PVA) resin. This allows for the suppression of cracking during heating, even when using an extremely thin resin film as a protective layer. Furthermore, the polarizer exhibits optical properties acceptable for practical use. Therefore, even with its extremely thinness, the polarizing plate of the present invention can achieve both acceptable optical properties and the suppression of cracking during heating.

以下說明本發明之實施形態,惟本發明不受該等實施形態所限。又,各實施形態可適當組合。The following describes the embodiments of the present invention, but the present invention is not limited to these embodiments. Furthermore, the various embodiments can be appropriately combined.

(用語及符號之定義) 本說明書中之用語及符號之定義如下。 (1)折射率(nx、ny、nz) 「nx」為面內折射率達最大之方向(亦即慢軸方向)的折射率,「ny」為在面內與慢軸正交之方向(亦即快軸方向)的折射率,而「nz」為厚度方向的折射率。 (2)面內相位差(Re) 「Re(λ)」係於23℃下以波長λnm之光測定之面內相位差。例如,「Re(550)」係於23℃下以波長550nm之光測定之面內相位差。Re(λ)可於令層(薄膜)之厚度為d(nm)時,藉由式:Re(λ)=(nx-ny)×d求得。 (3)厚度方向之相位差(Rth) 「Rth(λ)」係於23℃下以波長λnm之光測定之厚度方向之相位差。例如,「Rth(550)」係於23℃下以波長550nm之光測定之厚度方向之相位差。Rth(λ)可於令層(薄膜)厚度為d(nm)時,藉由式:Rth(λ)=(nx-nz)×d求得。 (4)Nz係數 Nz係數可以Nz=Rth/Re求得。 (5)角度 本說明書中提及角度時,該角度包含相對於基準方向往順時針方向及逆時針方向兩者。因此,例如「45°」係指±45°。(Definition of terms and symbols) The definitions of terms and symbols in this specification are as follows. (1) Refractive index (nx, ny, nz) "nx" is the refractive index in the direction where the in-plane refractive index reaches the maximum (i.e., the slow axis direction), "ny" is the refractive index in the direction perpendicular to the slow axis (i.e., the fast axis direction), and "nz" is the refractive index in the thickness direction. (2) In-plane phase difference (Re) "Re(λ)" is the in-plane phase difference measured at 23°C using light of a wavelength of λnm. For example, "Re(550)" is the in-plane phase difference measured at 23°C using light of a wavelength of 550nm. Re(λ) can be obtained by the formula: Re(λ) = (nx-ny) × d when the thickness of the layer (thin film) is d(nm). (3) Retardation in the thickness direction (Rth) "Rth(λ)" is the retardation in the thickness direction measured at 23°C using light of wavelength λnm. For example, "Rth(550)" is the retardation in the thickness direction measured at 23°C using light of wavelength 550nm. Rth(λ) can be calculated by the formula: Rth(λ) = (nx - nz) × d when the thickness of the layer (film) is d (nm). (4) Nz coefficient The Nz coefficient can be calculated by Nz = Rth/Re. (5) Angle When angles are mentioned in this specification, the angles include both clockwise and counterclockwise directions relative to the reference direction. Therefore, for example, "45°" means ±45°.

A.偏光板 A-1.偏光板之概要 圖1係本發明一實施形態之偏光板的概略截面圖。圖式例之偏光板100具有偏光件10、配置於偏光件10之一側的第1保護層20、及配置於另一側的第2保護層30。偏光件10係以含二色性物質之聚乙烯醇系樹脂薄膜構成。第1保護層20係以具有10µm以下之厚度的樹脂膜構成。第2保護層30可因應目的而省略。又,雖無圖示,但可因應需要而於第1保護層20之與偏光件10相反之側設置硬塗層,且可於第1保護層20與偏光件10之間設置易接著層。A. Polarizing Plate A-1. Overview of Polarizing Plate Figure 1 is a schematic cross-sectional view of a polarizing plate according to one embodiment of the present invention. The illustrated polarizing plate 100 comprises a polarizer 10, a first protective layer 20 disposed on one side of the polarizer 10, and a second protective layer 30 disposed on the other side. The polarizer 10 is formed of a polyvinyl alcohol-based resin film containing a dichroic substance. The first protective layer 20 is formed of a resin film having a thickness of 10µm or less. The second protective layer 30 may be omitted depending on the intended purpose. Furthermore, although not shown, a hard coat layer may be provided on the side of the first protective layer 20 opposite the polarizer 10, and an adhesive layer may be provided between the first protective layer 20 and the polarizer 10, as needed.

在一實施形態中,偏光件10於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1)。在一實施形態中,偏光件10於令單體透射率為x%、且令構成該偏光件之該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2)。在一實施形態中,偏光件10於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂薄膜之定向函數為f時,滿足下述式(3)。在一實施形態中,偏光件之穿刺強度為30gf/µm以上。 y<-0.011x+0.525     (1) z<-60x+2875         (2) f<-0.018x+1.11      (3)In one embodiment, the polarizer 10 satisfies the following equation (1) when the single-body transmittance is x% and the birefringence of the polyvinyl alcohol resin constituting the polarizer is y. In one embodiment, the polarizer 10 satisfies the following equation (2) when the single-body transmittance is x% and the in-plane phase difference of the polyvinyl alcohol resin film constituting the polarizer is znm. In one embodiment, the polarizer 10 satisfies the following equation (3) when the single-body transmittance is x% and the orientation function of the polyvinyl alcohol resin film constituting the polarizer is f. In one embodiment, the puncture strength of the polarizer is greater than 30gf/µm. y<-0.011x+0.525  (1) z<-60x+2875   (2) f<-0.018x+1.11  (3)

偏光板100之總厚度例如為20µm以下,宜為15µm以下,更宜為12µm以下,又更宜為10µm以下。又,偏光板之總厚度例如為5µm以上。The total thickness of the polarizing plate 100 is, for example, 20 μm or less, preferably 15 μm or less, more preferably 12 μm or less, and even more preferably 10 μm or less. Furthermore, the total thickness of the polarizing plate is, for example, 5 μm or more.

構成偏光板之各層或光學薄膜可透過接著層貼合,亦可不透過接著層而密著形成。作為接著層可舉接著劑層、黏著劑層。本發明實施形態中,可適宜採用接著劑層。若為所述構成,便可使偏光板更薄型化。構成接著劑層之接著劑代表上可舉活性能量線硬化型接著劑(例如紫外線硬化型接著劑)。The layers or optical films that comprise the polarizing plate may be bonded together via a bonding layer or may be formed without a bonding layer. The bonding layer may include a bonding agent layer or an adhesive layer. In embodiments of the present invention, a bonding agent layer may be suitably employed. This configuration allows for a thinner polarizing plate. The bonding agent that comprises the bonding agent layer may typically be an active energy ray-curable bonding agent (e.g., a UV-curable bonding agent).

在本發明實施形態中偏光板之厚度可變得極薄。因此,可適宜應用於撓性之影像顯示裝置。較佳為影像顯示裝置具有彎曲的形狀(實質上為彎曲的顯示畫面),及/或可撓曲或可彎折。影像顯示裝置的具體例可舉液晶顯示裝置、電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)。當然,上述說明並不妨礙本發明偏光板應用於一般的影像顯示裝置。In embodiments of the present invention, the thickness of the polarizing plate can be made extremely thin. Therefore, it can be suitably applied to flexible image display devices. Preferably, the image display device has a curved shape (essentially a curved display screen) and/or is bendable or foldable. Specific examples of image display devices include liquid crystal display devices and electroluminescent (EL) display devices (e.g., organic EL display devices and inorganic EL display devices). Of course, the above description does not prevent the polarizing plate of the present invention from being applied to general image display devices.

上述偏光板放置於60℃及95%RH之環境下500小時後,單體透射率Ts之變化量ΔTs及偏光度P之變化量ΔP宜各自非常小。單體透射率Ts可使用例如紫外線可見光分光光度計(日本分光公司製,製品名「V7100」)來測定。偏光度P係從使用紫外線可見光分光光度計測定之單體透射率(Ts)、平行透射率(Tp)及正交透射率(Tc),利用下式來算出。 偏光度(P)(%)={(Tp-Tc)/(Tp+Tc)}1 /2 ×100 此外,上述Ts、Tp及Tc係以JIS Z 8701之2度視野(C光源)進行測定並進行視感度校正所得之Y值。又,Ts及P實質上為偏光件之特性。ΔTs及ΔP各自可由下述式求得。 ΔTs(%)=Ts500 -Ts0 ΔP(%)=P500 -P0 於此,Ts0 為放置前(初始)之單體透射率,Ts500 為放置後之單體透射率,P0 為放置前(初始)之偏光度,P500 為放置後之偏光度。ΔTs宜為3.0%以下,較宜為2.5%以下,更宜為2.0%以下,又更宜為1.5%以下。ΔP宜為-5.0%~0%,較宜為-3.0%~0%,更宜為-1.0%~0%,又更宜為-0.5%~0%。After the above-mentioned polarizing plate is placed in an environment of 60°C and 95% RH for 500 hours, the change ΔTs of the single transmittance Ts and the change ΔP of the polarization degree P should each be very small. The single transmittance Ts can be measured using, for example, an ultraviolet-visible spectrophotometer (manufactured by JASCO Corporation, product name "V7100"). The polarization degree P is calculated using the following formula from the single transmittance (Ts), parallel transmittance (Tp) and orthogonal transmittance (Tc) measured using an ultraviolet-visible spectrophotometer. Polarization degree (P) (%) = {(Tp-Tc)/(Tp+Tc)} 1 /2 ×100 In addition, the above-mentioned Ts, Tp and Tc are Y values obtained by measuring the 2-degree field of view (light source C) of JIS Z 8701 and performing visual sensitivity correction. Furthermore, Ts and P are essentially properties of the polarizer. ΔTs and ΔP can each be calculated using the following formulas: ΔTs(%) = Ts500 - Ts0 ΔP(%) = P500 - P0 ( where Ts0 is the initial transmittance before placement, Ts500 is the initial transmittance after placement, P0 is the polarization before placement (initial), and P500 is the polarization after placement. ΔTs is preferably 3.0% or less, more preferably 2.5% or less, more preferably 2.0% or less, and even more preferably 1.5% or less. ΔP is preferably -5.0% to 0%, more preferably -3.0% to 0%, more preferably -1.0% to 0%, and even more preferably -0.5% to 0%.

本發明偏光板可為單片狀亦可為長條狀。本說明書中所謂「長條狀」意指相對於寬度而言長度足夠長的細長形狀,例如包含相對於寬度而言長度為10倍以上、且宜為20倍以上之細長形狀。長條狀偏光板可捲繞成捲狀。The polarizing plate of the present invention can be in the form of a single sheet or a long strip. As used herein, "long strip" refers to a long, slender shape that is sufficiently long relative to its width. For example, this includes a long strip that is at least 10 times, and preferably at least 20 times, its width. Long strips of polarizing plates can be wound into a roll.

A-2.偏光件 上述偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1)。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2)。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂薄膜之定向函數為f時,滿足下述式(3)。在一實施形態中,偏光件之穿刺強度為30gf/µm以上。 y<-0.011x+0.525     (1) z<-60x+2875         (2) f<-0.018x+1.11      (3)A-2. Polarizer The polarizer is formed of a polyvinyl alcohol resin film containing a dichroic substance. In one embodiment, the polarizer satisfies the following equation (1) when the single-element transmittance is x% and the birefringence of the polyvinyl alcohol resin constituting the polarizer is y. In one embodiment, the polarizer satisfies the following equation (2) when the single-element transmittance is x% and the in-plane retardation of the polyvinyl alcohol resin film constituting the polarizer is znm. In one embodiment, the polarizer satisfies the following equation (3) when the single-element transmittance is x% and the orientation function of the polyvinyl alcohol resin film constituting the polarizer is f. In one embodiment, the puncture strength of the polarizer is 30 gf/µm or greater. y<-0.011x+0.525  (1) z<-60x+2875   (2) f<-0.018x+1.11  (3)

以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件中,PVA系樹脂之雙折射(以下表記為PVA之雙折射或PVA之Δn)、PVA系樹脂薄膜之面內相位差(以下表記為「PVA之面內相位差」)、PVA系樹脂之定向函數(以下表記為「PVA之定向函數」)及偏光件之穿刺強度,皆為與構成偏光件之PVA系樹脂之分子鏈的定向度相關之值。具體而言,PVA之雙折射、面內相位差及定向函數係隨著定向度之上升會變成大的值,而穿刺強度係隨著定向度之上升會降低。本發明所用偏光件(亦即滿足上述式(1)~(3)或穿刺強度之偏光件),其PVA系樹脂之分子鏈往吸收軸方向之定向較以往之偏光件更和緩,因此吸收軸方向之加熱收縮便被抑制。結果可獲得雖為極薄型卻抑制住加熱時之裂痕發生的偏光板。又,因所述偏光件之可撓性亦佳,故可獲得可撓性及抗彎折耐久性優異之偏光板,而宜可應用於彎曲的影像顯示裝置、較佳可應用於可彎折的影像顯示裝置、更佳可應用於可折疊的影像顯示裝置。以往,定向度低之偏光件難以獲得可容許之光學特性(代表上為單體透射率及偏光度),但本發明所用之偏光件可兼顧較以往更低之PVA系樹脂之定向度與可容許之光學特性。In polarizers made from polyvinyl alcohol (PVA) resin films containing dichroic substances, the birefringence of the PVA resin (hereinafter referred to as PVA birefringence or PVA Δn), the in-plane retardation of the PVA resin film (hereinafter referred to as "PVA in-plane retardation"), the orientation function of the PVA resin (hereinafter referred to as "PVA orientation function"), and the puncture strength of the polarizer are all values related to the degree of orientation of the molecular chains of the PVA resin constituting the polarizer. Specifically, the birefringence, in-plane retardation, and orientation function of PVA increase with increasing orientation, while the puncture strength decreases with increasing orientation. The polarizer used in the present invention (i.e., a polarizer satisfying the above formulas (1) to (3) or the puncture strength) has a PVA-based resin whose molecular chain is more gently oriented in the absorption axis direction than conventional polarizers, thereby suppressing thermal shrinkage in the absorption axis direction. As a result, a polarizing plate can be obtained that is extremely thin but suppresses cracking when heated. Furthermore, because the polarizer is also highly flexible, a polarizing plate with excellent flexibility and anti-bending durability can be obtained, and is preferably applicable to curved image display devices, more preferably to bendable image display devices, and even more preferably to foldable image display devices. In the past, polarizers with low orientation levels struggled to achieve acceptable optical properties (typically, single-element transmittance and polarization). However, the polarizer used in the present invention achieves both acceptable optical properties and a lower orientation level for PVA-based resins than previously possible.

上述偏光件宜滿足下述式(1a)及/或式(2a),較宜滿足下述式(1b)及/或式(2b)。 -0.004x+0.18<y<-0.011x+0.525  (1a) -0.003x+0.145<y<-0.011x+0.520  (1b) -40x+1800<z<-60x+2875  (2a) -30x+1450<z<-60x+2850  (2b)The polarizer preferably satisfies the following formula (1a) and/or formula (2a), and more preferably satisfies the following formula (1b) and/or formula (2b). -0.004x+0.18<y<-0.011x+0.525  (1a) -0.003x+0.145<y<-0.011x+0.520  (1b) -40x+1800<z<-60x+2875  (2a) -30x+1450<z<-60x+2850  (2b)

本說明書中,上述PVA之面內相位差係PVA系樹脂薄膜在23℃、波長1000nm下之面內相位差值。藉由將近紅外線區域設為測定波長,可排除偏光件中之碘的吸收的影響而可測定相位差。又,上述PVA之雙折射(面內雙折射)係將PVA之面內相位差除以偏光件之厚度(nm)所得之值。In this specification, the in-plane retardation of PVA is the in-plane retardation value of a PVA resin film at 23°C and a wavelength of 1000 nm. By setting the measurement wavelength in the near-infrared region, the influence of iodine absorption in the polarizer can be eliminated and the retardation can be measured. Furthermore, the birefringence (in-plane birefringence) of PVA is the value obtained by dividing the in-plane retardation of PVA by the thickness (nm) of the polarizer.

PVA之面內相位差係如下述進行評估。首先,以複數個波長850nm以上之波長測定相位差值,並進行測得之相位差值:R(λ)與波長:λ之繪圖,將其用最小平方法擬合至下述色邁耶爾(Sellmeier)公式。在此,A及B為擬合參數,係利用最小平方法決定之係數。 R(λ)=A+B/(λ2 -6002 ) 此時,該相位差值R(λ)可以下述方式分離無波長依存性之PVA的面內相位差(Rpva)與波長依存性強之碘的面內相位差值(Ri)。 Rpva=A Ri=B/(λ2 -6002 ) 根據該分離式,可算出PVA在波長λ=1000nm下之面內相位差(亦即Rpva)。此外,關於該PVA之面內相位差之評估方法,亦記載於日本專利第5932760號公報中,可因應需要參照。 又,將該相位差除以厚度,藉此可算出PVA之雙折射(Δn)。The in-plane retardation of PVA is evaluated as follows. First, the retardation values are measured at multiple wavelengths above 850 nm. The measured retardation values, R(λ), are plotted against the wavelength, λ, and then fitted to the following Sellmeier equation using the least squares method. Here, A and B are fitting parameters, coefficients determined using the least squares method. R(λ) = A + B / (λ 2 - 600 2 ) At this point, the retardation value R(λ) can be separated into the wavelength-independent in-plane retardation of PVA (Rpva) and the wavelength-dependent in-plane retardation of iodine (Ri) as follows: Rpva = A Ri = B / (λ 2 - 600 2 ) Based on this separation formula, the in-plane retardation of PVA at a wavelength of λ = 1000 nm (i.e., Rpva) can be calculated. Furthermore, the evaluation method for the in-plane phase difference of PVA is also described in Japanese Patent No. 5932760, which can be referred to as needed. Furthermore, the birefringence (Δn) of the PVA can be calculated by dividing the phase difference by the thickness.

用以測定上述PVA在波長1000nm下之面內相位差的市售裝置,可舉王子計測公司製之KOBRA-WR/IR系列、KOBRA-31X/IR系列等。Commercially available devices for measuring the in-plane retardation of the above-mentioned PVA at a wavelength of 1000 nm include the KOBRA-WR/IR series and KOBRA-31X/IR series manufactured by Oji Instruments.

本發明所用偏光件之定向函數(f)宜滿足下述式(3a),較宜滿足下述式(3b)。定向函數若過小,有無法獲得可容許之單體透射率及/或偏光度之情形。 -0.01x+0.50<f<-0.018x+1.11   (3a) -0.01x+0.57<f<-0.018x+1.1    (3b)The orientation function (f) of the polarizer used in the present invention preferably satisfies the following formula (3a), and more preferably satisfies the following formula (3b). If the orientation function is too small, it may be impossible to obtain an acceptable single-unit transmittance and/or polarization degree. -0.01x+0.50<f<-0.018x+1.11   (3a) -0.01x+0.57<f<-0.018x+1.1    (3b)

定向函數(f)例如係用傅立葉轉換紅外光譜光度計(FT-IR)並以偏光作為測定光,藉由衰減全反射分光(ATR:attenuated total reflection)測定來求得。具體而言,用以使偏光件密著之微晶係使用鍺,測定光之入射角設為45°入射,且令欲入射之經偏光的紅外線(測定光)為朝使鍺結晶之試樣密著的面平行振動之偏光(s偏光),並在將偏光件之延伸方向相對於測定光之偏光方向作平行及垂直配置之狀態下實施測定,然後使用所得吸光度光譜之2941cm-1 的強度,依下述式算出。在此,強度I係以3330cm-1 為參考波峰,而為2941cm-1 /3330cm-1 之值。另外,f=1時為完全定向,f=0時為無規。又,吾等認為2941cm-1 之波峰為起因於偏光件中之PVA主鏈(-CH2 -)所致之振動的吸收。 f=(3<cos2 θ>-1)/2 =(1-D)/[c(2D+1)] =-2×(1-D)/(2D+1) 惟, 以c=(3cos2 β-1)/2,2941cm-1 之振動時,β=90°。 θ:分子鏈相對於延伸方向之角度 β:躍遷偶極矩相對於分子鏈軸之角度 D=(I )/(I// )  (此時,PVA分子越定向,D越大) I :測定光之偏光方向與偏光件之延伸方向呈垂直時之吸收強度 I// :測定光之偏光方向與偏光件之延伸方向呈平行時之吸收強度The orientation function (f) is determined, for example, by attenuated total reflection (ATR) spectroscopy using a Fourier transform infrared spectrophotometer (FT-IR) with polarized light as the measurement light. Specifically, germanium is used as the microcrystal for bonding the polarizer, the measurement light is incident at an angle of 45°, and the incident polarized infrared light (measurement light) is polarized parallel to the plane of the germanium crystal sample that is bonding the sample (s-polarization). Measurements are performed with the polarizer extending in both parallel and perpendicular directions to the polarization direction of the measurement light. The intensity at 2941 cm -1 in the resulting absorbance spectrum is then used to calculate the orientation function according to the following formula. Here, intensity I is referenced to the peak at 3330 cm -1 and is calculated as 2941 cm -1 /3330 cm -1 . Furthermore, f = 1 indicates perfect alignment, while f = 0 indicates random alignment. Furthermore, we believe the peak at 2941 cm -1 is due to absorption from the vibration of the PVA main chain ( -CH2- ) in the polarizer. f = (3 < cos2θ > -1)/2 = (1-D)/[c(2D+1)] = -2 × (1-D)/(2D+1). However, with c = ( 3cos2β -1)/2, β = 90° for the vibration at 2941 cm- 1 . θ: The angle of the molecular chain relative to the extension direction β: The angle of the transition dipole moment relative to the molecular chain axis D = (I ) / (I // ) (At this time, the more oriented the PVA molecules are, the larger D is) I : The absorption intensity when the polarization direction of the measured light is perpendicular to the extension direction of the polarizer I // : The absorption intensity when the polarization direction of the measured light is parallel to the extension direction of the polarizer

偏光件之厚度宜為10µm以下,較宜為8µm以下。偏光件之厚度的下限例如可為1μm。偏光件之厚度在一實施形態中亦可為2µm~10µm,在另一實施形態中亦可為2µm~8µm。藉由使偏光件之厚度如所述般非常薄,可使熱收縮變得非常小。推測所述構成亦有助於抑制加熱造成之裂痕發生。The thickness of the polarizer is preferably 10µm or less, more preferably 8µm or less. The lower limit of the polarizer thickness can be, for example, 1µm. In one embodiment, the thickness of the polarizer can be 2µm to 10µm, and in another embodiment, it can be 2µm to 8µm. By making the polarizer very thin as described, thermal shrinkage can be minimized. This configuration is also believed to help suppress cracking caused by heating.

偏光件宜在波長380nm~780nm的任一波長下顯示吸收二色性。偏光件之單體透射率宜為40.0%以上,較宜為41.0%以上。單體透射率例如可為49.0%以下。偏光件之單體透射率在一實施形態中為40.0%~45.0%。偏光件之偏光度宜為99.0%以上,較宜為99.4%以上。偏光度例如可為99.999%以下。偏光件之偏光度在一實施形態中為99.0%~99.99%。本發明所用偏光件之一特徵在於:即便構成該偏光件之PVA系樹脂之定向度較以往更低,且具有如上述之面內相位差、雙折射及/或定向函數,仍可實現所述之實際使用上可容許之單體透射率及偏光度。吾等推測其係因後述之製造方法所致。此外,單體透射率代表上係使用紫外線可見光分光光度計來測定並進行視感度校正所得之Y值。偏光度代表上可基於使用紫外線可見光分光光度計測定並進行視感度校正所得之平行透射率Tp及正交透射率Tc,透過下述式來求得。 偏光度(%)={(Tp-Tc)/(Tp+Tc)}1 /2 ×100The polarizer preferably exhibits absorption dichroism at any wavelength between 380 nm and 780 nm. The single-unit transmittance of the polarizer is preferably 40.0% or greater, more preferably 41.0% or greater. The single-unit transmittance may, for example, be 49.0% or less. In one embodiment, the single-unit transmittance of the polarizer is 40.0% to 45.0%. The polarization degree of the polarizer is preferably 99.0% or greater, more preferably 99.4% or greater. The polarization degree may, for example, be 99.999% or less. In one embodiment, the polarization degree of the polarizer is 99.0% to 99.99%. One of the characteristics of the polarizer used in the present invention is that even if the orientation degree of the PVA-based resin constituting the polarizer is lower than before and has the in-plane phase difference, birefringence and/or orientation function as described above, the monomer transmittance and polarization degree that are allowable in practical use can still be achieved. We speculate that this is due to the manufacturing method described later. In addition, the monomer transmittance is represented by the Y value obtained by measuring and correcting the visual sensitivity using an ultraviolet-visible spectrophotometer. The polarization degree can be obtained by the following formula based on the parallel transmittance Tp and the orthogonal transmittance Tc obtained by measuring and correcting the visual sensitivity using an ultraviolet-visible spectrophotometer. Polarization degree (%) = {(Tp-Tc)/(Tp+Tc)} 1 /2 ×100

偏光件之穿刺強度例如為30gf/µm以上,且宜為35gf/µm以上,較宜為40gf/µm以上,更宜為45gf/µm以上,尤宜為50gf/µm以上。穿刺強度之上限例如可為80gf/μm。藉由將偏光件之穿刺強度設為所述範圍,可顯著抑制加熱時於偏光件發生裂痕及偏光件沿吸收軸方向裂開。結果可獲得撓曲性非常優異之偏光件(以結果而言為偏光板)。穿刺強度係表示以預定強度穿刺偏光件時之偏光件的抗破裂耐性。穿刺強度例如可以於壓縮試驗機裝設預定之針,並將該針以預定速度穿刺偏光件時偏光件破裂之強度(斷裂強度)來表示。此外,從單位可明顯知道,穿刺強度意指偏光件之每單位厚度(1µm)的穿刺強度。The puncture strength of the polarizer is, for example, 30 gf/µm or more, preferably 35 gf/µm or more, more preferably 40 gf/µm or more, more preferably 45 gf/µm or more, and particularly preferably 50 gf/µm or more. The upper limit of the puncture strength can be, for example, 80 gf/µm. By setting the puncture strength of the polarizer to the above range, cracks in the polarizer during heating and splitting of the polarizer along the absorption axis can be significantly suppressed. As a result, a polarizer (in other words, a polarizing plate) with very excellent flexibility can be obtained. The puncture strength indicates the polarizer's resistance to cracking when the polarizer is punctured with a predetermined strength. Puncture strength can be expressed, for example, as the strength (fracture strength) required to break a polarizer when a predetermined needle is installed in a compression tester and pierced at a predetermined speed. Furthermore, as is apparent from the unit, puncture strength refers to the strength per unit thickness (1µm) of the polarizer.

偏光件如上述係以含二色性物質之PVA系樹脂薄膜構成。宜為構成PVA系樹脂薄膜(實質上為偏光件)之PVA系樹脂包含經乙醯乙醯基改質之PVA系樹脂。若為所述構成,便可獲得具有所期望之穿刺強度的偏光件。當令PVA系樹脂整體為100重量%時,經乙醯乙醯基改質之PVA系樹脂之摻混量宜為5重量%~20重量%,較宜為8重量%~12重量%。摻混量若在所述範圍內,便可將穿刺強度設為更適宜之範圍。As described above, the polarizer is formed from a PVA-based resin film containing a dichroic substance. The PVA-based resin forming the PVA-based resin film (essentially the polarizer) preferably includes a PVA-based resin modified with an acetyl group. With this configuration, a polarizer having the desired puncture strength can be obtained. When the total weight of the PVA-based resin is 100%, the blending amount of the acetyl-based resin modified with an acetyl group is preferably 5% to 20% by weight, more preferably 8% to 12% by weight. When the blending amount is within this range, the puncture strength can be set to a more suitable range.

偏光件在代表上可使用兩層以上之積層體來製作。使用積層體獲得之偏光件的具體例,可舉出使用樹脂基材與經塗佈形成於該樹脂基材之PVA系樹脂層的積層體而獲得之偏光件。使用樹脂基材與經塗佈形成於該樹脂基材之PVA系樹脂層的積層體而獲得之偏光件,例如可以藉由以下方式來製作:將PVA系樹脂溶液塗佈於樹脂基材,並使其乾燥而於樹脂基材上形成PVA系樹脂層,而獲得樹脂基材與PVA系樹脂層的積層體;及,將該積層體延伸及染色而將PVA系樹脂層製成偏光件。本實施形態中,宜於樹脂基材之單側形成含鹵化物與聚乙烯醇系樹脂之聚乙烯醇系樹脂層。延伸在代表上包含使積層體浸漬於硼酸水溶液中並延伸。並且,延伸宜更包含下述步驟:在硼酸水溶液中延伸之前,在高溫(例如95℃以上)下將積層體進行空中延伸。本發明實施形態中,延伸之總倍率宜為3.0倍~4.5倍,與一般相較下顯著較小。即便為所述延伸之總倍率,藉由添加鹵化物及乾燥收縮處理之組合,可獲得具有可容許之光學特性之偏光件。並且,本發明實施形態中,空中輔助延伸之延伸倍率宜大於硼酸水中延伸之延伸倍率。藉由製成所述構成,即便延伸之總倍率小,仍可獲得具有可容許之光學特性之偏光件。並且,積層體宜供於一邊沿長邊方向輸送一邊進行加熱藉此使其於寬度方向收縮2%以上之乾燥收縮處理。在一實施形態中,偏光件之製造方法包含對積層體依序施行空中輔助延伸處理、染色處理、水中延伸處理與乾燥收縮處理。藉由導入輔助延伸,即使是在將PVA系樹脂塗佈於熱塑性樹脂上之情況下仍可提升PVA系樹脂之結晶性,而可達成高光學特性。又,同時事先提高PVA系樹脂之定向性,可防止在之後的染色步驟或延伸步驟中浸漬於水中時,PVA系樹脂之定向性降低或溶解等問題,而可達成高光學特性。並且,將PVA系樹脂層浸漬於液體中時,相較於PVA系樹脂層不含鹵化物之情況,更能抑制聚乙烯醇分子之定向紊亂及定向性之降低。藉此,可提升經由染色處理及水中延伸處理等將積層體浸漬於液體中來進行的處理步驟而得之偏光件的光學特性。並且,透過乾燥收縮處理使積層體於寬度方向收縮,可提升光學特性。所得樹脂基材/偏光件之積層體可直接使用(即,亦可將樹脂基材作為偏光件之保護層),亦可從樹脂基材/偏光件之積層體剝離樹脂基材並於該剝離面積層因應目的之任意適當的保護層後來使用。關於偏光件之製造方法的詳細內容將於A-3項詳細說明。Polarizers are typically manufactured using a laminate of two or more layers. A specific example of a polarizer using a laminate is a laminate comprising a resin substrate and a PVA-based resin layer coated on the resin substrate. A polarizer obtained by laminating a resin substrate and a PVA-based resin layer coated on the resin substrate can be produced, for example, by applying a PVA-based resin solution to the resin substrate and drying the solution to form the PVA-based resin layer on the resin substrate, thereby obtaining a laminate of the resin substrate and the PVA-based resin layer; and then stretching and dyeing the laminate to form the polarizer. In this embodiment, a polyvinyl alcohol-based resin layer containing a halogenated compound and a polyvinyl alcohol-based resin is preferably formed on one side of the resin substrate. Stretching typically includes immersing the laminate in an aqueous boric acid solution and then stretching it. Furthermore, the stretching preferably further includes the following step: stretching the laminate in the air at a high temperature (e.g., above 95°C) before stretching in the boric acid aqueous solution. In the embodiment of the present invention, the total stretching ratio is preferably 3.0 to 4.5 times, which is significantly smaller than the general ratio. Even with the total stretching ratio, a polarizer with acceptable optical properties can be obtained by combining the addition of halides and dry shrinkage treatment. Furthermore, in the embodiment of the present invention, the stretching ratio of the air-assisted stretching is preferably greater than the stretching ratio of the stretching in boric acid water. By making the above-mentioned structure, a polarizer with acceptable optical properties can be obtained even if the total stretching ratio is small. Furthermore, the laminate is preferably subjected to a drying and shrinking treatment in which the laminate is heated while being transported along its longitudinal direction, thereby shrinking the laminate by more than 2% in its width direction. In one embodiment, the method for manufacturing a polarizer comprises sequentially subjecting the laminate to an air-assisted stretching treatment, a dyeing treatment, an underwater stretching treatment, and a drying and shrinking treatment. By introducing the auxiliary stretching, the crystallinity of the PVA resin can be improved even when the PVA resin is coated on a thermoplastic resin, thereby achieving high optical properties. Furthermore, by simultaneously improving the orientation of the PVA resin in advance, problems such as a reduction in orientation or dissolution of the PVA resin when immersed in water during the subsequent dyeing or stretching steps can be prevented, thereby achieving high optical properties. Furthermore, immersing the PVA resin layer in a liquid can further suppress the orientational disorder of the polyvinyl alcohol molecules and the reduction of their orientation compared to a PVA resin layer without halides. This can improve the optical properties of polarizers produced through treatments such as dyeing and underwater stretching, where the laminate is immersed in a liquid. Furthermore, shrinking the laminate in the width direction during drying and shrinking can further enhance optical properties. The resulting resin substrate/polarizer laminate can be used directly (i.e., the resin substrate can also be used as a protective layer for the polarizer), or the resin substrate can be peeled off from the resin substrate/polarizer laminate and then used after applying any appropriate protective layer to the peeled area. Details of the polarizer manufacturing method are described in Section A-3.

A-3.偏光件之製造方法 本發明一實施形態之偏光件之製造方法包含以下步驟:於長條狀熱塑性樹脂基材之單側形成含鹵化物與聚乙烯醇系樹脂(PVA系樹脂)之聚乙烯醇系樹脂層(PVA系樹脂層),而製成積層體;及,對積層體依序施行空中輔助延伸處理、染色處理、水中延伸處理與乾燥收縮處理,該乾燥收縮處理係將積層體一邊沿長邊方向輸送一邊加熱,藉此使其於寬度方向收縮1%~10%。PVA系樹脂層中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。乾燥收縮處理宜使用加熱輥進行處理,且加熱輥之溫度宜為60℃~120℃。積層體進行乾燥收縮處理所得寬度方向之收縮率宜為1%~10%根據所述製造方法可獲得在上述A-2項所說明之偏光件。尤其是藉由下述方式可獲得具有優異光學特性(代表上為單體透射率及偏光度)之偏光件:製作包含含有鹵化物之PVA系樹脂層的積層體後,將上述積層體之延伸進行包含空中輔助延伸及水中延伸的多階段延伸,再將延伸後之積層體以加熱輥進行加熱。A-3. Polarizer Manufacturing Method A polarizer manufacturing method according to one embodiment of the present invention comprises the following steps: forming a polyvinyl alcohol resin layer (PVA resin layer) containing a halogenated compound and a polyvinyl alcohol resin (PVA resin) on one side of a long thermoplastic resin substrate to form a laminate; and sequentially subjecting the laminate to an air-assisted stretching treatment, a dyeing treatment, an underwater stretching treatment, and a drying and shrinking treatment. The drying and shrinking treatment involves heating the laminate while conveying it along its longitudinal direction, thereby shrinking it by 1% to 10% in its width direction. The halogenated compound content in the PVA resin layer is preferably 5 to 20 parts by weight per 100 parts by weight of the PVA resin. The drying and shrinking treatment is preferably performed using a heated roller, and the temperature of the heated roller is preferably 60°C to 120°C. The shrinkage rate of the laminate in the width direction after the drying and shrinking treatment is preferably 1% to 10%. The polarizer described in Section A-2 above can be obtained according to the above manufacturing method. In particular, a polarizer having excellent optical properties (represented by single-body transmittance and polarization degree) can be obtained by the following method: after manufacturing a laminate including a PVA-based resin layer containing a halogenated compound, the laminate is stretched through a multi-stage stretching process including air-assisted stretching and underwater stretching, and the stretched laminate is then heated using a heating roller.

A-3-1.積層體之製作 製作熱塑性樹脂基材與PVA系樹脂層之積層體的方法可採用任意適當之方法。宜將含鹵化物與PVA系樹脂之塗佈液塗佈於熱塑性樹脂基材之表面並乾燥,藉此於熱塑性樹脂基材上形成PVA系樹脂層。如上述,PVA系樹脂層中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。A-3-1. Laminated Product Preparation Any appropriate method can be used to prepare a laminate of a thermoplastic resin substrate and a PVA-based resin layer. Preferably, a coating liquid containing a halogenated compound and a PVA-based resin is applied to the surface of the thermoplastic resin substrate and dried to form the PVA-based resin layer on the thermoplastic resin substrate. As mentioned above, the halogenated compound content in the PVA-based resin layer is preferably 5 to 20 parts by weight per 100 parts by weight of the PVA-based resin.

塗佈液之塗佈方法可採用任意適當的方法。例如可舉出輥塗法、旋塗法、線棒塗佈法、浸塗法、模塗法、簾塗法、噴塗法、刮刀式塗佈法(缺角輪塗佈法等)等。上述塗佈液之塗佈、乾燥溫度宜為50℃以上。The coating liquid can be applied by any appropriate method. Examples include roll coating, spin coating, wire rod coating, dip coating, die coating, curtain coating, spray coating, and doctor blade coating (e.g., notched wheel coating). The application and drying temperature of the coating liquid should preferably be above 50°C.

PVA系樹脂層之厚度宜為2µm~30µm,更宜為2µm~20µm。藉由使延伸前之PVA系樹脂層之厚度如所述非常薄且如後述縮小總延伸倍率,可獲得即便定向函數非常小卻具有可容許之單體透射率及偏光度之偏光件。The thickness of the PVA resin layer is preferably 2µm to 30µm, more preferably 2µm to 20µm. By making the thickness of the PVA resin layer very thin before stretching as described above and reducing the total stretching ratio as described below, a polarizer can be obtained that has acceptable monomer transmittance and polarization degree even with a very small orientation function.

在形成PVA系樹脂層之前,可對熱塑性樹脂基材施行表面處理(例如電暈處理等),也可於熱塑性樹脂基材上形成易接著層。藉由進行所述處理,可提升熱塑性樹脂基材與PVA系樹脂層之密著性。Before forming the PVA resin layer, the thermoplastic resin substrate may be subjected to a surface treatment (e.g., corona treatment) or a bonding layer may be formed on the thermoplastic resin substrate. Such treatments can enhance the adhesion between the thermoplastic resin substrate and the PVA resin layer.

A-3-1-1.熱塑性樹脂基材 熱塑性樹脂基材可採用任意適當的熱塑性樹脂薄膜。關於熱塑性樹脂薄膜基材的詳細內容,例如記載於日本專利特開2012-73580號公報或日本專利第6470455號。本說明書中係援用該公報整體之記載作為參考。A-3-1-1. Thermoplastic Resin Substrate The thermoplastic resin substrate can be any suitable thermoplastic resin film. Details regarding thermoplastic resin film substrates are described, for example, in Japanese Patent Publication No. 2012-73580 or Japanese Patent No. 6470455. The entire disclosure of these publications is incorporated herein by reference.

A-3-1-2.塗佈液 塗佈液係如上述包含鹵化物與PVA系樹脂。上述塗佈液代表上係使上述鹵化物及上述PVA系樹脂溶解於溶劑而成之溶液。作為溶劑,可舉例如水、二甲基亞碸、二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮、各種甘醇類、三羥甲丙烷等多元醇類、伸乙二胺、二伸乙三胺等胺類。該等可單獨使用或可將二種以上組合來使用。該等中又以水為佳。溶液之PVA系樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於熱塑性樹脂基材之均勻的塗佈膜。塗佈液中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。A-3-1-2. Coating Liquid The coating liquid comprises the halogenated compound and the PVA-based resin as described above. The coating liquid is typically a solution of the halogenated compound and the PVA-based resin dissolved in a solvent. Examples of the solvent include water, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, various glycols, polyols such as trihydroxymethylpropane, and amines such as ethylenediamine and diethylenetriamine. These solvents may be used alone or in combination. Water is preferred. The PVA-based resin concentration in the solution is preferably 3 to 20 parts by weight per 100 parts by weight of the solvent. At this resin concentration, a uniform coating film can be formed that adheres closely to the thermoplastic resin substrate. The halogen content in the coating solution is preferably 5 to 20 parts by weight relative to 100 parts by weight of the PVA resin.

塗佈液中亦可摻混添加劑。添加劑可舉例如塑化劑、界面活性劑等。塑化劑可舉例如乙二醇或甘油等多元醇。界面活性劑可舉例如非離子界面活性劑。該等可為了更提升所得PVA系樹脂層的均勻性或染色性、延伸性而使用。Additives may also be added to the coating liquid. Examples of additives include plasticizers and surfactants. Plasticizers include polyols such as ethylene glycol and glycerin. Surfactants include non-ionic surfactants. These additives can be used to further enhance the uniformity, dyeability, and extensibility of the resulting PVA-based resin layer.

上述PVA系樹脂可採用任意適當的樹脂。可舉例如聚乙烯醇及乙烯-乙烯醇共聚物。聚乙烯醇可藉由將聚乙酸乙烯酯皂化而得。乙烯-乙烯醇共聚物可藉由將乙烯-乙酸乙烯酯共聚物皂化而獲得。PVA系樹脂之皂化度通常為85莫耳%~100莫耳%,宜為95.0莫耳%~99.95莫耳%,更宜為99.0莫耳%~99.93莫耳%。皂化度可依循JIS K 6726-1994而求得。藉由使用所述皂化度的PVA系樹脂,可獲得耐久性優異的偏光件。皂化度過高時,會有膠化之虞。如上述,PVA系樹脂宜包含經乙醯乙醯基改質之PVA系樹脂。Any suitable resin can be used as the above-mentioned PVA resin. Examples include polyvinyl alcohol and ethylene-vinyl alcohol copolymer. Polyvinyl alcohol can be obtained by saponifying polyvinyl acetate. Ethylene-vinyl alcohol copolymer can be obtained by saponifying ethylene-vinyl acetate copolymer. The saponification degree of PVA resin is generally 85 mol% to 100 mol%, preferably 95.0 mol% to 99.95 mol%, and more preferably 99.0 mol% to 99.93 mol%. The saponification degree can be determined in accordance with JIS K 6726-1994. By using a PVA resin having the above-mentioned saponification degree, a polarizer with excellent durability can be obtained. When the saponification degree is too high, there is a risk of gelling. As mentioned above, the PVA-based resin preferably includes a PVA-based resin modified with an acetyl group.

PVA系樹脂的平均聚合度可按目的適當選擇。平均聚合度通常為1000~10000,宜為1200~4500,更宜為1500~4300。此外,平均聚合度可依循JIS K 6726-1994而求得。The average degree of polymerization of PVA-based resins can be appropriately selected depending on the intended purpose. It is generally between 1,000 and 10,000, preferably between 1,200 and 4,500, and more preferably between 1,500 and 4,300. The average degree of polymerization can be determined in accordance with JIS K 6726-1994.

上述鹵化物可採用任意適當之鹵化物。可舉例如碘化物及氯化鈉。碘化物可舉例如碘化鉀、碘化鈉及碘化鋰。該等之中又以碘化鉀為佳。Any suitable halide may be used as the halide. Examples include iodide and sodium chloride. Examples of iodides include potassium iodide, sodium iodide, and lithium iodide. Among these, potassium iodide is preferred.

塗佈液中之鹵化物之量相對於PVA系樹脂100重量份宜為5重量份~20重量份,較佳為相對於PVA系樹脂100重量份為10重量份~15重量份。若鹵化物相對於PVA系樹脂100重量份之量大於20重量份,則有鹵化物溢出而最後獲得之偏光件變白濁之情形。The amount of halogenated compound in the coating solution should be 5 to 20 parts by weight, more preferably 10 to 15 parts by weight, relative to 100 parts by weight of the PVA resin. If the amount of halogenated compound exceeds 20 parts by weight, the halogenated compound may overflow, resulting in a cloudy, white polarizer.

一般而言,PVA系樹脂層經延伸,PVA樹脂層中之聚乙烯醇分子之定向性會變高,但若將延伸後之PVA系樹脂層浸漬於含水之液體中,則有聚乙烯醇分子之定向紊亂而定向性降低之情形。尤其是在對熱塑性樹脂基材與PVA系樹脂層之積層體進行硼酸水中延伸時,為了使熱塑性樹脂基材之延伸穩定而在相對較高溫度下將上述積層體在硼酸水中進行延伸時,上述定向度降低之傾向很明顯。舉例而言,PVA薄膜單體在硼酸水中之延伸一般係在60℃下進行,相對於此,A-PET(熱塑性樹脂基材)與PVA系樹脂層之積層體之延伸係在70℃前後之溫度的較高溫度下進行,此時,延伸初始之PVA的定向性會在藉由水中延伸而上升之前的階段便降低。對此,藉由製作含鹵化物之PVA系樹脂層與熱塑性樹脂基材之積層體,並將積層體於在硼酸水中進行延伸前在空氣中進行高溫延伸(輔助延伸),可促進輔助延伸後之積層體之PVA系樹脂層中的PVA系樹脂之結晶化。結果,在將PVA系樹脂層浸漬於液體中時,相較於PVA系樹脂層不含鹵化物之情況,更能抑制聚乙烯醇分子之定向紊亂及定向性降低。藉此,可提升經由染色處理及水中延伸處理等將積層體浸漬於液體中來進行的處理步驟而得之偏光件的光學特性。Generally speaking, after stretching a PVA resin layer, the orientation of the polyvinyl alcohol molecules within the PVA resin layer increases. However, if the stretched PVA resin layer is immersed in an aqueous solution, the orientation of the polyvinyl alcohol molecules may become disrupted, and this orientation may decrease. This tendency to decrease orientation is particularly pronounced when stretching a laminate of a thermoplastic resin substrate and a PVA resin layer in boric acid water at relatively high temperatures to stabilize the stretching of the thermoplastic resin substrate. For example, stretching of a PVA film monomer in boric acid water is typically performed at 60°C. In contrast, stretching of a laminate composed of an A-PET (thermoplastic resin substrate) and a PVA-based resin layer is performed at a higher temperature, around 70°C. At this temperature, the orientation of the PVA at the beginning of stretching decreases before it is elevated by stretching in water. To address this issue, by preparing a laminate composed of a halogenated PVA-based resin layer and a thermoplastic resin substrate and stretching the laminate at a high temperature in air (assisted stretching) before stretching in boric acid water, crystallization of the PVA-based resin in the PVA-based resin layer of the laminate after assisted stretching can be promoted. As a result, when the PVA resin layer is immersed in a liquid, the orientation disorder and reduction of the polyvinyl alcohol molecules are suppressed compared to the case where the PVA resin layer does not contain halides. This can improve the optical properties of polarizers produced through treatment steps such as dyeing and underwater stretching, where the laminate is immersed in a liquid.

A-3-2.空中輔助延伸處理 尤其為了獲得高光學特性,會選擇組合乾式延伸(輔助延伸)與硼酸水中延伸之2段延伸之方法。如2段延伸之方式,藉由導入輔助延伸,可一邊抑制熱塑性樹脂基材之結晶化一邊進行延伸。並且,在將PVA系樹脂塗佈於熱塑性樹脂基材上時,為了抑制熱塑性樹脂基材之玻璃轉移溫度之影響,必須使塗佈溫度比將PVA系樹脂塗佈於一般的金屬滾筒上之情況更低,結果會產生PVA系樹脂之結晶化相對變低而無法獲得充分光學特性之問題。對此,藉由導入輔助延伸,即使是在將PVA系樹脂塗佈於熱塑性樹脂上之情況下仍可提升PVA系樹脂之結晶性,而可達成高光學特性。又,同時事先提高PVA系樹脂之定向性,可防止在之後的染色步驟或延伸步驟中浸漬於水中時,PVA系樹脂之定向性降低或溶解等問題,而可達成高光學特性。A-3-2. Air-Assisted Stretching To achieve particularly high optical properties, a two-stage stretching method combining dry stretching (assisted stretching) and stretching in boric acid water is often used. In this two-stage stretching method, the introduction of the auxiliary stretching allows stretching to be performed while suppressing crystallization of the thermoplastic resin substrate. Furthermore, when coating PVA resin on a thermoplastic resin substrate, the coating temperature must be lower than when coating PVA resin on a conventional metal roller to minimize the effect of the thermoplastic resin substrate's glass transition temperature. This results in a relatively slow crystallization of the PVA resin, preventing the achievement of sufficient optical properties. By introducing assisted stretching, the crystallinity of the PVA resin can be enhanced even when it is coated on a thermoplastic resin, achieving high optical properties. Furthermore, by pre-enhancing the orientation of the PVA resin, problems such as loss of orientation or dissolution during subsequent dyeing or stretching steps can be avoided, thus achieving high optical properties.

空中輔助延伸之延伸方法可為固定端延伸(例如使用拉幅延伸機進行延伸之方法),亦可為自由端延伸(例如使積層體通過周速相異之輥間進行單軸延伸之方法)。為了獲得高光學特性,可積極採用自由端延伸。在一實施形態中,空中延伸處理包含加熱輥延伸步驟,該步驟係將上述積層體一邊沿其長邊方向輸送一邊利用加熱輥間之周速差進行延伸。空中延伸處理代表上包含區域(zone)延伸步驟與加熱輥延伸步驟。另,區域延伸步驟與加熱輥延伸步驟之順序無限定,可先進行區域延伸步驟,亦可先進行加熱輥延伸步驟。亦可省略區域延伸步驟。在一實施形態中,係依序進行區域延伸步驟及加熱輥延伸步驟。又,在另一實施形態中,係於拉幅延伸機中把持薄膜端部,並將拉幅機間之距離往行進方向擴大來延伸(拉幅機間距離的增幅即為延伸倍率)。此時,寬度方向(相對於行進方向為垂直方向)之拉幅機的距離係設定成可任意接近。宜可設定成相對於行進方向之延伸倍率來利用自由端延伸作接近。為自由端延伸時,係以寬度方向之收縮率=(1/延伸倍率)1/2 來計算。The stretching method for in-flight assisted stretching can be fixed-end stretching (for example, a method of stretching using a tenter stretching machine) or free-end stretching (for example, a method of uniaxially stretching the laminate by passing it between rollers with different circumferential speeds). In order to obtain high optical properties, free-end stretching can be actively adopted. In one embodiment, the in-flight stretching process includes a heating roller stretching step, which is to stretch the laminate while transporting it along its long side and utilizing the circumferential speed difference between the heating rollers. The in-flight stretching process typically includes a zone stretching step and a heating roller stretching step. In addition, the order of the zone stretching step and the heating roller stretching step is not limited, and the zone stretching step can be performed first, or the heating roller stretching step can be performed first. The regional stretching step can also be omitted. In one embodiment, the regional stretching step and the heated roller stretching step are performed sequentially. In another embodiment, the film ends are gripped in a tenter stretching machine, and the distance between the tenters is expanded in the direction of travel to stretch (the increase in the distance between the tenters is the stretching ratio). At this time, the distance between the tenters in the width direction (perpendicular to the direction of travel) is set so that they can be arbitrarily approached. It is preferable to set the stretching ratio relative to the direction of travel to use free-end stretching for approach. In the case of free-end stretching, the shrinkage ratio in the width direction is calculated as (1/stretching ratio) 1/2 .

空中輔助延伸可在一階段中進行亦可分多階段進行。分多階段進行時,延伸倍率為各階段之延伸倍率之積。空中輔助延伸中之延伸方向宜與水中延伸之延伸方向大致相同。Air-assisted stretching can be performed in a single stage or in multiple stages. When performed in multiple stages, the stretching ratio is the product of the stretching ratios in each stage. The stretching direction in air-assisted stretching should be substantially the same as the stretching direction in underwater stretching.

空中輔助延伸之延伸倍率宜為1.0倍~4.0倍,較宜為1.5倍~3.5倍,更宜為2.0倍~3.0倍。空中輔助延伸之延伸倍率若在所述範圍內,便可在與水中延伸組合時將延伸之總倍率設定為所期望之範圍,而可實現所期望之定向函數。結果可獲得加熱造成之裂痕發生經抑制的附相位差層之偏光板。並且,如上述,空中輔助延伸之延伸倍率宜大於硼酸水中延伸之延伸倍率。藉由製成所述構成,即便延伸之總倍率小,仍可獲得具有可容許之光學特性之偏光件。更詳細而言,空中輔助延伸之延伸倍率與水中延伸之延伸倍率的比(水中延伸/空中輔助延伸)宜為0.4~0.9,較宜為0.5~0.8。The stretching ratio of the air-assisted stretching is preferably 1.0 times to 4.0 times, more preferably 1.5 times to 3.5 times, and even more preferably 2.0 times to 3.0 times. If the stretching ratio of the air-assisted stretching is within the range, the total stretching ratio can be set to the desired range when combined with the underwater stretching, and the desired orientation function can be achieved. As a result, a polarizing plate with a phase difference layer in which cracks caused by heating are suppressed can be obtained. Moreover, as mentioned above, the stretching ratio of the air-assisted stretching is preferably greater than the stretching ratio of the stretching in boric acid water. By making the above-mentioned structure, even if the total stretching ratio is small, a polarizer with acceptable optical properties can still be obtained. More specifically, the ratio of the stretching ratio of the air-assisted stretching to the stretching ratio of the underwater stretching (underwater stretching/air-assisted stretching) is preferably 0.4-0.9, more preferably 0.5-0.8.

空中輔助延伸之延伸溫度可因應熱塑性樹脂基材之形成材料、延伸方式等設定成任意適當之值。延伸溫度宜為熱塑性樹脂基材之玻璃轉移溫度(Tg)以上,更宜為熱塑性樹脂基材之玻璃轉移溫度(Tg)+10℃以上,尤宜為Tg+15℃以上。另一方面,延伸溫度之上限宜為170℃。藉由在所述溫度下延伸可抑制PVA系樹脂之結晶化急速進展,而可抑制該結晶化所造成的不良情況(例如,因延伸而妨礙PVA系樹脂層之定向)。The stretching temperature for air-assisted stretching can be set to any appropriate value depending on the thermoplastic resin substrate's material, stretching method, and other factors. The stretching temperature is preferably above the thermoplastic resin substrate's glass transition temperature (Tg), more preferably above the thermoplastic resin substrate's glass transition temperature (Tg) + 10°C, and most preferably above Tg + 15°C. On the other hand, the upper limit of the stretching temperature is preferably 170°C. Stretching at this temperature suppresses the rapid crystallization of the PVA resin, thereby minimizing adverse effects caused by this crystallization (e.g., interference with orientation of the PVA resin layer due to stretching).

A-3-3.不溶解處理、染色處理及交聯處理 視需要,在空中輔助延伸處理之後且在水中延伸處理或染色處理之前,施行不溶解處理。上述不溶解處理代表上係將PVA系樹脂層浸漬於硼酸水溶液中來進行。上述染色處理代表上係以二色性物質(代表上為碘)將PVA系樹脂層染色來進行。視需要,在染色處理之後且在水中延伸處理之前,施行交聯處理。上述交聯處理代表上可藉由使PVA系樹脂層浸漬於硼酸水溶液中來進行。關於不溶解處理、染色處理及交聯處理的詳細內容,例如記載於日本專利特開2012-73580號公報(上述)。A-3-3. Insolubilization, Dyeing, and Crosslinking Treatments If necessary, an insolubilization treatment is performed after the air-assisted stretching treatment and before the underwater stretching treatment or dyeing treatment. The insolubilization treatment is typically performed by immersing the PVA resin layer in an aqueous boric acid solution. The dyeing treatment is typically performed by dyeing the PVA resin layer with a dichroic substance (typically iodine). If necessary, a crosslinking treatment is performed after the dyeing treatment and before the underwater stretching treatment. The crosslinking treatment can typically be performed by immersing the PVA resin layer in an aqueous boric acid solution. Details of the insolubilization treatment, dyeing treatment, and crosslinking treatment are described, for example, in Japanese Patent Publication No. 2012-73580 (cited above).

A-3-4.水中延伸處理 水中延伸處理係使積層體浸漬於延伸浴來進行。藉由水中延伸處理,可在比上述熱塑性樹脂基材或PVA系樹脂層之玻璃轉移溫度(代表上為80℃左右)更低的溫度下延伸,而可一邊抑制PVA系樹脂層結晶化一邊進行延伸。結果可製出具有優異光學特性之偏光件。A-3-4. Underwater Stretching Underwater stretching is performed by immersing the laminate in a stretching bath. This allows stretching at temperatures lower than the glass transition temperature (typically around 80°C) of the thermoplastic resin substrate or PVA resin layer, suppressing crystallization of the PVA resin layer. This results in a polarizer with excellent optical properties.

積層體之延伸方法可採用任意適當的方法。具體而言,可為固定端延伸,亦可為自由端延伸(例如使積層體通過周速相異之輥間進行單軸延伸的方法)。宜選擇自由端延伸。積層體之延伸可在一階段中進行亦可分多階段進行。分多階段進行時,延伸之總倍率為各階段之延伸倍率之積。The laminate can be stretched using any appropriate method. Specifically, it can be fixed-end stretching or free-end stretching (for example, a method in which the laminate passes between rollers with different circumferential speeds for uniaxial stretching). Free-end stretching is preferred. Stretching of the laminate can be performed in a single stage or in multiple stages. When stretching in multiple stages, the total stretching ratio is the product of the stretching ratios in each stage.

水中延伸宜使積層體浸漬於硼酸水溶液中來進行(硼酸水中延伸)。藉由使用硼酸水溶液作為延伸浴,可對PVA系樹脂層賦予得以承受延伸時施加之張力的剛性與不溶於水的耐水性。具體上,硼酸在水溶液中會生成四羥基硼酸陰離子而可藉由氫鍵與PVA系樹脂交聯。結果可賦予PVA系樹脂層剛性與耐水性,進行良好地延伸,從而製出具有優異光學特性之偏光件。Underwater stretching is preferably performed by immersing the laminate in an aqueous boric acid solution (boric acid underwater stretching). Using an aqueous boric acid solution as the stretching bath imparts the PVA resin layer with the rigidity required to withstand the tension applied during stretching, as well as water-insoluble resistance. Specifically, boric acid in aqueous solution forms tetrahydroxyboric acid anions, which crosslink with the PVA resin via hydrogen bonds. This imparts rigidity and water resistance to the PVA resin layer, allowing for excellent stretching and resulting in polarizers with superior optical properties.

上述硼酸水溶液宜使硼酸及/或硼酸鹽溶解於屬溶劑的水而獲得。硼酸濃度相對於水100重量份宜為1重量份~10重量份,較宜為2.5重量份~6重量份,尤宜為3重量份~5重量份。藉由將硼酸濃度設為1重量份以上,可有效抑制PVA系樹脂層之溶解,製造特性更高之偏光件。此外,除硼酸或硼酸鹽外,亦可使用將硼砂等之硼化合物、乙二醛、戊二醛等溶解於溶劑而得之水溶液。The boric acid aqueous solution is preferably obtained by dissolving boric acid and/or a boric acid salt in water as a solvent. The boric acid concentration is preferably 1 to 10 parts by weight, more preferably 2.5 to 6 parts by weight, and particularly preferably 3 to 5 parts by weight, per 100 parts by weight of water. Setting the boric acid concentration to 1 part by weight or higher effectively inhibits the dissolution of the PVA resin layer, resulting in the production of polarizers with higher performance. In addition to boric acid or a boric acid salt, aqueous solutions obtained by dissolving boron compounds such as borax, glyoxal, glutaraldehyde, etc. in a solvent may also be used.

宜於上述延伸浴(硼酸水溶液)中摻混碘化物。藉由摻混碘化物,可抑制已吸附於PVA系樹脂層之碘的溶出。碘化物之具體例如上述。碘化物之濃度相對於水100重量份宜為0.05重量份~15重量份,較宜為0.5重量份~8重量份。An iodide is preferably added to the stretching bath (boric acid aqueous solution). This addition can suppress the dissolution of iodine adsorbed in the PVA-based resin layer. Specific examples of the iodide are described above. The concentration of the iodide is preferably 0.05 to 15 parts by weight, more preferably 0.5 to 8 parts by weight, per 100 parts by weight of water.

延伸溫度(延伸浴之液溫)宜為40℃~85℃,較宜為60℃~75℃。若為所述溫度,便可抑制PVA系樹脂層溶解,同時又可高倍率地延伸。具體而言如上所述,以與形成PVA系樹脂層之關係來說,熱塑性樹脂基材之玻璃轉移溫度(Tg)以60℃以上為宜。此時,延伸溫度若低於40℃,則即使考慮以水將熱塑性樹脂基材塑化,也恐無法良好地延伸。另一方面,延伸浴之溫度愈高溫,PVA系樹脂層之溶解性就愈高,而恐無法獲得優異的光學特性。積層體浸漬於延伸浴之浸漬時間宜為15秒~5分鐘。The stretching temperature (liquid temperature of the stretching bath) is preferably 40°C to 85°C, more preferably 60°C to 75°C. At this temperature, the dissolution of the PVA-based resin layer can be suppressed, while at the same time, stretching at a high rate can be achieved. Specifically, as mentioned above, in relation to the formation of the PVA-based resin layer, the glass transition temperature (Tg) of the thermoplastic resin substrate is preferably above 60°C. At this time, if the stretching temperature is lower than 40°C, even if the thermoplastic resin substrate is plasticized with water, it may not be stretched well. On the other hand, the higher the temperature of the stretching bath, the higher the solubility of the PVA-based resin layer, and it may not be possible to obtain excellent optical properties. The immersion time of the laminate in the stretching bath is preferably 15 seconds to 5 minutes.

水中延伸進行之延伸倍率宜為1.0倍~2.2倍,較宜為1.1倍~2.0倍,更宜為1.1倍~1.8倍,又更宜為1.2倍~1.6倍。水中延伸之延伸倍率若在所述範圍內,便可將延伸之總倍率設定為所期望之範圍,而可實現所期望之雙折射、面內相位差及/或定向函數。結果可獲得加熱造成之裂痕發生經抑制的附相位差層之偏光板。延伸之總倍率(組合空中輔助延伸與水中延伸時之延伸倍率的合計)如上述,相對於積層體之原長宜為3.0倍~4.5倍,較宜為3.0倍~4.3倍,更宜為3.0倍~4.0倍。藉由適當組合對塗佈液添加鹵化物、調整空中輔助延伸及水中延伸之延伸倍率、及乾燥收縮處理,即便為所述延伸之總倍率,仍可獲得具有可容許之光學特性之偏光件。The stretching ratio for underwater stretching is preferably 1.0 to 2.2 times, more preferably 1.1 to 2.0 times, more preferably 1.1 to 1.8 times, and even more preferably 1.2 to 1.6 times. If the stretching ratio for underwater stretching is within the aforementioned range, the total stretching ratio can be set to the desired range, thereby achieving the desired birefringence, in-plane phase difference, and/or orientation function. As a result, a polarizing plate with a phase difference layer in which cracking caused by heating is suppressed can be obtained. As described above, the total stretching ratio (the sum of the stretching ratios for the air-assisted stretching and the underwater stretching) is preferably 3.0 to 4.5 times, more preferably 3.0 to 4.3 times, and even more preferably 3.0 to 4.0 times, relative to the original length of the laminate. By appropriately combining the addition of halides to the coating solution, adjusting the stretching ratios of the air-assisted stretching and underwater stretching, and performing a drying and shrinking treatment, a polarizer with acceptable optical properties can be obtained even at the aforementioned total stretching ratio.

A-3-5.乾燥收縮處理 上述乾燥收縮處理可透過將區域整體加熱所進行之區域加熱來進行,亦可透過將輸送輥加熱(所謂使用加熱輥)來進行(加熱輥乾燥方式)。較佳為使用這兩者。藉由使用加熱輥使其乾燥,可有效率地抑制積層體之加熱捲曲,而製造出外觀優異的偏光件。具體而言,藉由在使積層體沿附加熱輥之狀態下進行乾燥,可有效率地促進上述熱塑性樹脂基材之結晶化而增加結晶度,即使是在相對較低的乾燥溫度下,仍可良好增加熱塑性樹脂基材之結晶度。結果熱塑性樹脂基材之剛性增加而成為得以承受PVA系樹脂層因乾燥而收縮的狀態,從而捲曲受到抑制。又,藉由使用加熱輥,可在將積層體維持平坦狀態的同時進行乾燥,因此不只能抑制捲曲還能抑制起皺的發生。此時,積層體可透過乾燥收縮處理使其於寬度方向收縮,來提升光學特性。其係因可有效提升PVA及PVA/碘錯合物之定向性之故。積層體進行乾燥收縮處理所得寬度方向之收縮率宜為1%~10%,較宜為2%~8%,尤宜為4%~6%。A-3-5. Drying and Shrinking Treatment The drying and shrinking treatment can be performed by heating the entire area (zone heating) or by heating the transport rollers (so-called heated roller drying). Using both methods is preferred. Drying with heated rollers effectively suppresses heat-induced warping of the laminate, resulting in a polarizer with excellent appearance. Specifically, drying the laminate with the heated rollers effectively promotes crystallization of the thermoplastic resin matrix, increasing its crystallinity. Even at relatively low drying temperatures, the crystallinity of the thermoplastic resin matrix can be significantly increased. As a result, the rigidity of the thermoplastic resin substrate increases, making it capable of withstanding the shrinkage of the PVA-based resin layer due to drying, thereby suppressing curling. Furthermore, by using heated rollers, the laminate can be dried while maintaining a flat state, thereby suppressing not only curling but also wrinkling. In this case, the laminate shrinks in the width direction through the drying and shrinking treatment, thereby improving optical properties. This is because it effectively improves the orientation of the PVA and PVA/iodine complex. The shrinkage rate in the width direction of the laminate obtained by the drying and shrinking treatment is preferably 1% to 10%, more preferably 2% to 8%, and most preferably 4% to 6%.

圖2係顯示乾燥收縮處理之一例的概略圖。在乾燥收縮處理中,係利用已加熱至預定溫度的輸送輥R1~R6與導輥G1~G4來一邊輸送積層體50一邊使其乾燥。在圖式例中,係將輸送輥R1~R6配置成可交替連續加熱PVA樹脂層之面與熱塑性樹脂基材之面,但例如亦可將輸送輥R1~R6配置成僅連續加熱積層體50的其中一面(例如熱塑性樹脂基材面)。Figure 2 schematically illustrates an example of a drying and shrinking process. During the drying and shrinking process, conveyor rollers R1-R6 and guide rollers G1-G4, heated to predetermined temperatures, are used to convey the laminate 50 while drying it. In the illustrated example, the conveyor rollers R1-R6 are positioned to alternately and continuously heat the PVA resin layer and the thermoplastic resin substrate. However, the conveyor rollers R1-R6 can also be positioned to continuously heat only one side of the laminate 50 (e.g., the thermoplastic resin substrate).

藉由調整輸送輥之加熱溫度(加熱輥之溫度)、加熱輥之數量及與加熱輥的接觸時間等,可控制乾燥條件。加熱輥之溫度宜為60℃~120℃,更宜為65℃~100℃,尤宜為70℃~80℃。可在可良好地增加熱塑性樹脂之結晶度而良好地抑制捲曲的同時,製造出耐久性極優異的光學積層體。另,加熱輥之溫度可以接觸式溫度計來測定。在圖式例中設置有6個輸送輥,惟輸送輥若為複數個則無特別限制。輸送輥通常為2個~40個,宜設置4個~30個。積層體與加熱輥之接觸時間(總接觸時間)以1秒~300秒為宜,以1~20秒較佳,以1~10秒更佳。Drying conditions can be controlled by adjusting the heating temperature of the conveyor rollers (heating roller temperature), the number of heating rollers, and the contact time with the heating rollers. The temperature of the heating rollers is preferably 60°C to 120°C, more preferably 65°C to 100°C, and particularly preferably 70°C to 80°C. This can effectively increase the crystallinity of the thermoplastic resin and effectively suppress curling, while producing an optical laminate with excellent durability. The temperature of the heating rollers can also be measured with a contact thermometer. In the example shown, six conveyor rollers are provided, but there is no particular limitation if multiple conveyor rollers are provided. The number of conveyor rollers is generally 2 to 40, with 4 to 30 being preferred. The contact time (total contact time) between the laminate and the heating roller should preferably be 1 second to 300 seconds, more preferably 1 to 20 seconds, and even more preferably 1 to 10 seconds.

加熱輥可設置於加熱爐(例如烘箱)內,亦可設置於一般的製造產線(室溫環境下)。宜設置於具備送風機構的加熱爐內。藉由併用以加熱輥進行之乾燥與熱風乾燥,可抑制在加熱輥間急遽的溫度變化,而可容易控制寬度方向之收縮。熱風乾燥之溫度宜為30℃~100℃。且,熱風乾燥時間宜為1秒~300秒。熱風之風速宜為10m/s~30m/s左右。此外,該風速係在加熱爐內之風速,可以迷你扇葉型數位風速計來測定。The heating rollers can be installed in a heating furnace (such as an oven) or in a general manufacturing line (at room temperature). They are preferably installed in a heating furnace equipped with an air supply mechanism. By combining drying with the heating rollers and hot air drying, rapid temperature fluctuations between the rollers can be suppressed, making it easier to control shrinkage in the width direction. The hot air drying temperature should preferably be between 30°C and 100°C. Furthermore, the hot air drying time should preferably be between 1 second and 300 seconds. The hot air velocity should preferably be between 10m/s and 30m/s. Furthermore, this velocity is the velocity within the heating furnace and can be measured with a mini fan-type digital anemometer.

A-3-6.其他處理 宜在水中延伸處理之後且在乾燥收縮處理之前,施行洗淨處理。上述洗淨處理代表上可藉由使PVA系樹脂層浸漬於碘化鉀水溶液中來進行。A-3-6. Other Treatments After the water stretching treatment and before the drying and shrinking treatment, a cleaning treatment is preferably performed. This cleaning treatment can typically be performed by immersing the PVA resin layer in an aqueous potassium iodide solution.

A-4.第1保護層 上述第1保護層之厚度為10µm以下。藉由第1保護層之厚度為10µm以下,可有助於偏光板之薄型化。又,以往由追隨偏光件在加熱時之收縮來保護偏光件之觀點,係使用具有20µm以上之厚度的保護層。對此,本發明實施形態所用偏光件如同上述,PVA系樹脂之定向度較以往更低,結果因加熱造成之收縮小,故即便在使用厚度在10µm以下之保護層之情況下,仍可抑制加熱時之裂痕發生。A-4. First Protective Layer The thickness of the first protective layer is 10µm or less. A first protective layer thickness of 10µm or less contributes to a thinner polarizer. Conventionally, to protect the polarizer by tracking its shrinkage during heating, a protective layer with a thickness of 20µm or greater has been used. However, the polarizer used in the present embodiment, as described above, has a lower degree of orientation in the PVA-based resin than conventional polarizers. Consequently, shrinkage due to heating is minimized, and even with a protective layer thickness of 10µm or less, cracking during heating can be suppressed.

第1保護層之厚度宜為7µm以下,較宜為5µm以下,更宜為3µm以下。第1保護層之厚度例如為1µm以上。The thickness of the first protective layer is preferably 7µm or less, more preferably 5µm or less, and even more preferably 3µm or less. For example, the thickness of the first protective layer is 1µm or more.

第1保護層係以樹脂膜構成。形成樹脂膜之樹脂可按目的使用任意適當之樹脂。具體例可舉(甲基)丙烯酸系、三醋酸纖維素(TAC)等纖維素系樹脂、聚酯系、聚胺甲酸酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降莰烯系、聚烯烴系及乙酸酯系等熱塑性樹脂;(甲基)丙烯酸系、胺甲酸酯系、(甲基)丙烯酸胺甲酸酯系、環氧系、聚矽氧系等熱硬化型樹脂或活性能量線硬化型樹脂;矽氧烷系聚合物等玻璃質系聚合物。在一實施形態中,形成樹脂膜之樹脂可使用選自環氧樹脂、(甲基)丙烯酸系樹脂、聚酯系樹脂及胺甲酸酯系樹脂中之至少1種樹脂。The first protective layer is composed of a resin film. Any appropriate resin can be used as the resin forming the resin film, depending on the intended purpose. Specific examples include thermoplastic resins such as (meth)acrylic acid resins and cellulose triacetate (TAC); polyester resins, polyurethane resins, polyvinyl alcohol resins, polycarbonate resins, polyamide resins, polyimide resins, polyether sulfone resins, polysulfone resins, polystyrene resins, polynorbornene resins, polyolefin resins, and acetate resins; thermosetting resins or active energy ray-curing resins such as (meth)acrylic acid resins, urethane resins, (meth)acrylic urethane resins, epoxy resins, and polysilicone resins; and glassy polymers such as silicone polymers. In one embodiment, the resin forming the resin film may be at least one resin selected from epoxy resins, (meth)acrylic resins, polyester resins, and urethane resins.

構成第1保護層之樹脂膜例如可為熔融樹脂之成形物,可為將樹脂溶解或分散於水性溶劑或有機溶劑而得之樹脂溶液之塗佈膜的固化物,亦可為硬化型樹脂之硬化物(例如光陽離子硬化物)。The resin film constituting the first protective layer may be, for example, a molded product of a molten resin, a solidified product of a coating film of a resin solution obtained by dissolving or dispersing the resin in an aqueous solvent or an organic solvent, or a cured product of a curable resin (e.g., a photoion-cured product).

在一實施形態中,第1保護層係以選自於由以下所構成群組中之至少1種構成:熱塑性(甲基)丙烯酸系樹脂(以下,有時僅將(甲基)丙烯酸系樹脂稱為「丙烯酸系樹脂」)之有機溶劑溶液的塗佈膜之固化物、環氧樹脂之光陽離子硬化物及環氧樹脂之有機溶劑溶液的塗佈膜之固化物。於以下進行具體說明。In one embodiment, the first protective layer is composed of at least one selected from the group consisting of a cured product of a coating film of an organic solvent solution of a thermoplastic (meth)acrylic resin (hereinafter, (meth)acrylic resin may be simply referred to as "acrylic resin"), a photo-cured product of an epoxy resin, and a cured product of a coating film of an organic solvent solution of an epoxy resin. This is described in detail below.

A-4-1.熱塑性丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物 在一實施形態中,第1保護層係以熱塑性丙烯酸系樹脂之有機溶劑溶液之塗佈膜的固化物所構成。由加濕耐久性之觀點來看,本實施形態之第1保護層的軟化溫度宜為100℃以上,較宜為115℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。A-4-1. Cured Film of Thermoplastic Acrylic Resin in an Organic Solvent Solution In one embodiment, the first protective layer is formed from a cured film of a thermoplastic acrylic resin in an organic solvent solution. From the perspective of wet durability, the softening temperature of the first protective layer in this embodiment is preferably 100°C or higher, preferably 115°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. Furthermore, from the perspective of formability, the softening temperature is preferably 300°C or lower, preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

A-4-1-1.丙烯酸系樹脂 丙烯酸系樹脂之玻璃轉移溫度(Tg)宜為100℃以上。結果,第1保護層之軟化溫度亦幾乎成為100℃以上。丙烯酸系樹脂之Tg若在100℃以上,包含從所述樹脂所得之保護層的偏光板會成為不僅抗裂痕耐性優異,加濕耐久性亦優異者。丙烯酸系樹脂之Tg較宜為110℃以上,更宜為115℃以上,又更宜為120℃以上,尤宜為125℃以上。另一方面,丙烯酸系樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。丙烯酸系樹脂之Tg若在所述範圍內,成形性便佳。A-4-1-1. Acrylic Resin The glass transition temperature (Tg) of acrylic resins is preferably above 100°C. As a result, the softening temperature of the first protective layer is also approximately 100°C or above. When the Tg of an acrylic resin is above 100°C, a polarizing plate including a protective layer obtained from such a resin exhibits not only excellent crack resistance but also excellent durability under humidity. The Tg of acrylic resins is preferably above 110°C, more preferably above 115°C, even more preferably above 120°C, and particularly preferably above 125°C. On the other hand, the Tg of acrylic resins is preferably below 300°C, more preferably below 250°C, even more preferably below 200°C, and particularly preferably below 160°C. When the Tg of the acrylic resin is within the above range, the moldability is good.

丙烯酸系樹脂只要具有如上述之Tg,便可採用任意適當之丙烯酸系樹脂。丙烯酸系樹脂在代表上含有(甲基)丙烯酸烷基酯為主成分作為單體單元(重複單元)。本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。構成丙烯酸系樹脂之主骨架的(甲基)丙烯酸烷基酯,可例示直鏈狀或支鏈狀烷基之碳數1~18者。該等可單獨使用或可組合來使用。並且亦可藉由共聚而於丙烯酸系樹脂導入任意適當的共聚單體。源自(甲基)丙烯酸烷基酯之重複單元代表上由下述通式(1)所示:Any appropriate acrylic resin can be used as long as it has the Tg as described above. The acrylic resin typically contains (meth)acrylic acid alkyl ester as the main component as a monomer unit (repeating unit). In this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid. The (meth)acrylic acid alkyl ester constituting the main skeleton of the acrylic resin can be exemplified by a linear or branched alkyl group with 1 to 18 carbon atoms. These can be used alone or in combination. In addition, any appropriate copolymer monomer can be introduced into the acrylic resin by copolymerization. The repeating unit derived from the (meth)acrylic acid alkyl ester is represented by the following general formula (1):

[化學式1] [Chemical formula 1]

通式(1)中,R4 表示氫原子或甲基,R5 表示氫原子或可被取代之碳數1~6脂肪族或脂環式烴基。取代基可舉例如鹵素、羥基。(甲基)丙烯酸烷基酯之具體例可舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸氯甲酯、(甲基)丙烯酸2-氯乙酯、(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸2,3,4,5,6-五羥己酯、(甲基)丙烯酸2,3,4,5-四羥戊酯、2-(羥甲基)丙烯酸甲酯、2-(羥甲基)丙烯酸乙酯、2-(羥乙基)丙烯酸甲酯。通式(1)中,R5 宜為氫原子或甲基。因此,特別理想之(甲基)丙烯酸烷基酯為丙烯酸甲酯或甲基丙烯酸甲酯。In general formula (1), R4 represents a hydrogen atom or a methyl group, and R5 represents a hydrogen atom or an optionally substituted aliphatic or alicyclic hydrocarbon group having 1 to 6 carbon atoms. Examples of the substituent include halogens and hydroxyls. Specific examples of the alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl (meth)acrylate, tert-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, benzyl (meth)acrylate, dicyclopentyloxyethyl (meth)acrylate, dicyclopentyl (meth)acrylate, chloromethyl (meth)acrylate, 2-chloroethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2,3,4,5,6-pentahydroxyhexyl (meth)acrylate, 2,3,4,5-tetrahydroxypentyl (meth)acrylate, methyl 2-(hydroxymethyl)acrylate, ethyl 2-(hydroxymethyl)acrylate, and methyl 2-(hydroxyethyl)acrylate. In the general formula (1), R 5 is preferably a hydrogen atom or a methyl group. Therefore, the particularly preferred alkyl (meth)acrylate is methyl acrylate or methyl methacrylate.

丙烯酸系樹脂可僅包含有單一的(甲基)丙烯酸烷基酯單元,亦可包含有複數個上述通式(1)中之R4 及R5 互異的(甲基)丙烯酸烷基酯單元。The acrylic resin may contain only a single alkyl (meth)acrylate unit, or may contain a plurality of alkyl (meth)acrylate units in which R 4 and R 5 in the above general formula (1) are different from each other.

丙烯酸系樹脂中之(甲基)丙烯酸烷基酯單元的含有比率宜為50莫耳%~98莫耳%,較宜為55莫耳%~98莫耳%,更宜為60莫耳%~98莫耳%,尤宜為65莫耳%~98莫耳%,最宜為70莫耳%~97莫耳%。含有比率若少於50莫耳%,恐無法充分發揮源自(甲基)丙烯酸烷基酯單元所展現之效果(例如高耐熱性、高透明性)。上述含有比率若多於98莫耳%,恐有樹脂變脆弱而容易破裂,無法充分發揮高機械強度,使生產性變差之疑慮。The content of alkyl (meth)acrylate units in acrylic resins should preferably be 50 mol% to 98 mol%, more preferably 55 mol% to 98 mol%, even more preferably 60 mol% to 98 mol%, particularly preferably 65 mol% to 98 mol%, and most preferably 70 mol% to 97 mol%. A content below 50 mol% may not fully realize the benefits of the alkyl (meth)acrylate units (such as high heat resistance and high transparency). A content above 98 mol% may cause the resin to become brittle and easily cracked, preventing it from fully realizing its high mechanical strength, leading to reduced productivity.

丙烯酸系樹脂宜具有包含環結構之重複單元。包含環結構之重複單元可舉內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元、馬來醯亞胺(N-取代馬來醯亞胺)單元。包含環結構之重複單元可僅1種含於丙烯酸系樹脂之重複單元中,亦可2種以上含於其中。The acrylic resin preferably has repeating units containing a ring structure. Examples of repeating units containing a ring structure include lactone ring units, glutaric anhydride units, glutarimide units, maleic anhydride units, and maleimide (N-substituted maleimide) units. The acrylic resin may contain only one repeating unit containing a ring structure, or two or more repeating units containing a ring structure.

內酯環單元宜為下述通式(2)所示:The lactone ring unit is preferably represented by the following general formula (2):

[化學式2] 通式(2)中,R1 、R2 及R3 分別獨立表示氫原子或碳數1~20之有機殘基。此外,有機殘基亦可包含有氧原子。丙烯酸系樹脂中可僅包含有單一的內酯環單元,亦可包含有複數個上述通式(2)中之R1 、R2 及R3 互異的內酯環單元。具有內酯環單元之丙烯酸系樹脂已記載於例如日本專利特開2008-181078號公報中,而本說明書即援用該公報之記載作為參考。[Chemical formula 2] In general formula (2), R 1 , R 2 , and R 3 each independently represent a hydrogen atom or an organic residue having 1 to 20 carbon atoms. Furthermore, the organic residue may also contain an oxygen atom. The acrylic resin may contain only a single lactone ring unit, or may contain a plurality of lactone ring units in which R 1 , R 2 , and R 3 in the general formula (2) are different from each other. Acrylic resins containing lactone ring units are described, for example, in Japanese Patent Publication No. 2008-181078, and this specification incorporates the description of that publication by reference.

戊二醯亞胺單元宜為下述通式(3)所示:The glutarimide unit is preferably represented by the following general formula (3):

[化學式3] [Chemical formula 3]

通式(3)中,R11 及R12 分別獨立表示氫或碳數1~8烷基,R13 表示氫、碳數1~18烷基、碳數3~12環烷基或碳數6~10芳基。通式(3)中,宜為R11 及R12 分別獨立為氫或甲基,R13 為氫、甲基、丁基或環己基。較佳為R11 為甲基,R12 為氫,R13 為甲基。丙烯酸系樹脂中可僅包含有單一的戊二醯亞胺單元,亦可包含有複數個上述通式(3)中之R11 、R12 及R13 互異的戊二醯亞胺單元。具有戊二醯亞胺單元之丙烯酸系樹脂例如已記載於日本專利特開2006-309033號公報、日本專利特開2006-317560號公報、日本專利特開2006-328334號公報、日本專利特開2006-337491號公報、日本專利特開2006-337492號公報、日本專利特開2006-337493號公報、日本專利特開2006-337569號公報中,而本說明書即援用該公報之記載作為參考。此外,關於戊二酸酐單元,除了被上述通式(3)之R13 取代之氮原子變為氧原子之外,皆適用有關戊二醯亞胺單元之上述說明。In the general formula (3), R 11 and R 12 each independently represent hydrogen or an alkyl group having 1 to 8 carbon atoms, and R 13 represents hydrogen, an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an aryl group having 6 to 10 carbon atoms. In the general formula (3), preferably, R 11 and R 12 each independently represent hydrogen or a methyl group, and R 13 represents hydrogen, a methyl group, a butyl group, or a cyclohexyl group. More preferably, R 11 represents a methyl group, R 12 represents hydrogen, and R 13 represents a methyl group. The acrylic resin may contain only a single pentylimide unit, or may contain a plurality of pentylimide units in which R 11 , R 12 , and R 13 in the general formula (3) are different from each other. Acrylic resins having glutarimide units are described, for example, in Japanese Patent Application Laid-Open Nos. 2006-309033, 2006-317560, 2006-328334, 2006-337491, 2006-337492, 2006-337493, and 2006-337569, the disclosures of which are incorporated herein by reference. Regarding the glutaric anhydride units, the above description regarding the glutarimide units applies, except that the nitrogen atom substituted by R 13 in the above general formula (3) is replaced by an oxygen atom.

關於馬來酸酐單元及馬來醯亞胺(N-取代馬來醯亞胺)單元可由名稱特定出結構,因此省略具體說明。The structures of the maleic anhydride unit and the maleimide (N-substituted maleimide) unit can be identified by their names, and thus a detailed description thereof will be omitted.

丙烯酸系樹脂中包含環結構之重複單元的含有比率宜為1莫耳%~50莫耳%,較宜為10莫耳%~40莫耳%,更宜為20莫耳%~30莫耳%。含有比率過少時,會有Tg低於100℃之情形,而有所得保護層之耐熱性、耐溶劑性及表面硬度不充分之情形。含有比率過多時,有成形性及透明性不充分之情形。The content of repeating units containing a ring structure in acrylic resins is preferably 1 mol% to 50 mol%, more preferably 10 mol% to 40 mol%, and even more preferably 20 mol% to 30 mol%. If the content is too low, the Tg may be lower than 100°C, and the resulting protective layer may have insufficient heat resistance, solvent resistance, and surface hardness. If the content is too high, formability and transparency may be insufficient.

丙烯酸系樹脂亦可包含有(甲基)丙烯酸烷基酯單元及包含環結構之重複單元以外之重複單元。所述重複單元可舉源自可與構成上述單元之單體共聚之乙烯基系單體的重複單元(其他乙烯基系單體單元)。其他乙烯基系單體可舉例如:丙烯酸、甲基丙烯酸、巴豆酸、2-(羥甲基)丙烯酸、2-(羥乙基)丙烯酸、丙烯腈、甲基丙烯腈、乙基丙烯腈、烯丙基環氧丙基醚、馬來酸酐、伊康酸酐、N-甲基馬來醯亞胺、N-乙基馬來醯亞胺、N-環己基馬來醯亞胺、丙烯酸胺乙酯、丙烯酸丙基胺乙酯、甲基丙烯酸二甲基胺乙酯、甲基丙烯酸乙基胺丙酯、甲基丙烯酸環己基胺乙酯、N-乙烯基二乙胺、N-乙醯基乙烯基胺、烯丙基胺、甲基烯丙基胺、N-甲基烯丙基胺、2-異丙烯基-㗁唑啉、2-乙烯基-㗁唑啉、2-丙烯醯基-㗁唑啉、N-苯基馬來醯亞胺、甲基丙烯酸苯基胺乙酯、苯乙烯、α-甲基苯乙烯、對環氧丙基苯乙烯、對胺基苯乙烯、2-苯乙烯基-㗁唑啉等。該等可單獨使用亦可併用。其他乙烯基系單體單元之種類、數量、組合、含有比率等可按目的適當設定。The acrylic resin may also contain repeating units other than the (meth)acrylate unit and the repeating unit containing a ring structure. Examples of the repeating units include repeating units derived from vinyl monomers copolymerizable with the monomers constituting the above-mentioned units (other vinyl monomer units). Examples of other vinyl monomers include acrylic acid, methacrylic acid, crotonic acid, 2-(hydroxymethyl)acrylic acid, 2-(hydroxyethyl)acrylic acid, acrylonitrile, methacrylonitrile, ethacrylonitrile, allyl glycidyl ether, maleic anhydride, itaconic anhydride, N-methylmaleimide, N-ethylmaleimide, N-cyclohexylmaleimide, aminoethyl acrylate, propylaminoethyl acrylate, dimethylaminoethyl methacrylate, ethyl methacrylate, Examples of the vinyl monomers include propylamine, cyclohexylaminoethyl methacrylate, N-vinyldiethylamine, N-acetylvinamine, allylamine, methylallylamine, N-methylallylamine, 2-isopropenyl-oxazoline, 2-vinyl-oxazoline, 2-acryloyl-oxazoline, N-phenylmaleimide, phenylaminoethyl methacrylate, styrene, α-methylstyrene, p-epoxypropylstyrene, p-aminostyrene, and 2-phenylvinyl-oxazoline. These monomers may be used alone or in combination. The type, amount, combination, and content ratio of other vinyl monomer units may be appropriately determined according to the intended purpose.

丙烯酸系樹脂之重量平均分子量宜為1000~2000000,較宜為5000~1000000,更宜為10000~500000,尤宜為50000~500000,最宜為60000~150000。重量平均分子量例如可使用凝膠滲透層析法(GPC系統,Tosoh(東曹)公司製),以聚苯乙烯換算求得。此外,溶劑可使用四氫呋喃。The weight-average molecular weight of the acrylic resin is preferably 1,000-2,000,000, more preferably 5,000-1,000,000, more preferably 10,000-500,000, particularly preferably 50,000-500,000, and most preferably 60,000-150,000. The weight-average molecular weight can be determined, for example, by gel permeation chromatography (GPC system, manufactured by Tosoh Corporation) in terms of polystyrene. Tetrahydrofuran can be used as the solvent.

丙烯酸系樹脂可將上述單體單元適當組合來使用,並藉由任意適當之聚合方法來聚合。Acrylic resins can be used by appropriately combining the above-mentioned monomer units and polymerizing them by any appropriate polymerization method.

本發明實施形態中,亦可併用丙烯酸系樹脂與其他樹脂。亦即,可將構成丙烯酸系樹脂之單體成分與構成其他樹脂之單體成分共聚,並將該共聚物供於後述保護層之成形;亦可將丙烯酸系樹脂與其他樹脂之摻合物供於保護層之成形。其他樹脂可舉例如苯乙烯系樹脂、聚乙烯、聚丙烯、聚醯胺、聚伸苯硫醚、聚醚醚酮、聚酯、聚碸、聚伸苯醚、聚縮醛、聚醯亞胺、聚醚醯亞胺等熱塑性樹脂。併用之樹脂的種類及摻混量可按目的及對所得薄膜所期望之特性等來適當設定。例如苯乙烯系樹脂(宜為丙烯腈-苯乙烯共聚物)可作為相位差控制劑來併用。In the embodiment of the present invention, acrylic resins and other resins can also be used in combination. That is, the monomer components constituting the acrylic resin can be copolymerized with the monomer components constituting the other resins, and the copolymer can be used to form the protective layer described below; or a blend of the acrylic resin and other resins can be used to form the protective layer. Examples of other resins include thermoplastic resins such as styrene resins, polyethylene, polypropylene, polyamide, polyphenylene sulfide, polyetheretherketone, polyester, polysulfone, polyphenylene oxide, polyacetal, polyimide, and polyetherimide. The type and blending amount of the resins used in combination can be appropriately set according to the purpose and the desired properties of the resulting film. For example, a styrene resin (preferably an acrylonitrile-styrene copolymer) can be used as a phase difference control agent.

本實施形態之第1保護層中丙烯酸系樹脂之含量宜為50重量%~100重量%,較宜為60重量%~100重量%,更宜為70重量%~100重量%,尤宜為80重量%~100重量%。含量小於50重量%時,恐有無法充分反映丙烯酸系樹脂原本具有之高耐熱性、高透明性之虞。The acrylic resin content in the first protective layer of this embodiment is preferably 50% to 100% by weight, more preferably 60% to 100% by weight, further preferably 70% to 100% by weight, and particularly preferably 80% to 100% by weight. If the content is less than 50% by weight, the inherent high heat resistance and high transparency of the acrylic resin may not be fully realized.

本實施形態之第1保護層例如可藉由於偏光件表面塗佈丙烯酸系樹脂之有機溶劑溶液而形成塗佈膜,並使該塗佈膜固化來形成。The first protective layer of this embodiment can be formed by, for example, applying an organic solvent solution of acrylic resin on the surface of the polarizer to form a coating film and curing the coating film.

有機溶劑可使用可將丙烯酸系樹脂溶解或均勻分散之任意適當之有機溶劑。有機溶劑之具體例可舉乙酸乙酯、甲苯、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮。Any suitable organic solvent that can dissolve or uniformly disperse the acrylic resin can be used as the organic solvent. Specific examples of the organic solvent include ethyl acetate, toluene, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclopentanone, and cyclohexanone.

溶液之丙烯酸系樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The acrylic resin concentration in the solution is preferably 3 to 20 parts by weight relative to 100 parts by weight of the solvent. This concentration allows for a uniform coating film that adheres closely to the polarizer.

溶液可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上的塗佈膜之固化物會轉印至偏光件上。當塗佈於偏光件時,藉由使塗佈膜乾燥(固化),而於偏光件上直接形成第1保護層。較佳為溶液塗佈於偏光件上,而於偏光件上直接形成第1保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。溶液之塗佈方法可採用任意適當的方法。具體例可列舉輥塗法、旋塗法、線棒塗佈法、浸塗法、模塗法、簾塗法、噴塗法、刮刀塗佈法(缺角輪塗佈法等)。The solution can be applied to any appropriate substrate or to a polarizer. When applied to a substrate, the cured product of the coating film formed on the substrate is transferred to the polarizer. When applied to a polarizer, the first protective layer is formed directly on the polarizer by drying (curing) the coating film. It is preferred that the solution be applied to the polarizer to form the first protective layer directly on the polarizer. With the above-mentioned structure, the adhesive layer or the pressure-sensitive adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. Any appropriate method can be used for applying the solution. Specific examples include roller coating, spin coating, wire rod coating, dip coating, die coating, curtain coating, spray coating, and scraper coating (such as the notched wheel coating method).

藉由使溶液之塗佈膜乾燥(固化),可形成第1保護層。乾燥溫度宜為100℃以下,較宜為50℃~70℃。乾燥溫度若在所述範圍內,便可防止對偏光件造成不良影響。乾燥時間可按乾燥溫度變化。乾燥時間例如可為1分鐘~10分鐘。The first protective layer is formed by drying (curing) the applied solution. The drying temperature is preferably below 100°C, more preferably between 50°C and 70°C. A drying temperature within this range prevents adverse effects on the polarizer. The drying time varies depending on the drying temperature. For example, the drying time can be between 1 and 10 minutes.

A-4-2.環氧樹脂之光陽離子硬化物 在一實施形態中,第1保護層係以環氧樹脂之光陽離子硬化物構成。藉由使用所述保護層,可抑制裂痕發生,且可獲得優異之加濕耐久性。如上述,第1保護層為光陽離子硬化物,故保護層形成用組成物包含光陽離子聚合引發劑。光陽離子聚合引發劑係具有光酸產生劑之功能的感光劑,代表上可舉由陽離子部與陰離子部構成之離子性鎓鹽。在該鎓鹽中,陽離子部會吸收光,而陰離子部會成為酸的產生源。藉由從該光陽離子聚合引發劑產生之酸,進行環氧基之開環聚合。屬所得光陽離子硬化物之第1保護層之軟化溫度高,可降低碘吸附量。因此,可提供一種裂痕發生經抑制且具有優異加濕耐久性之偏光板。A-4-2. Photocurable Epoxy Resin In one embodiment, the first protective layer is formed from a photocurable epoxy resin. This protective layer suppresses cracking and achieves excellent moisture durability. As mentioned above, the first protective layer is a photocurable epoxy resin, so the protective layer-forming composition includes a photocatalytic polymerization initiator. A photocatalytic polymerization initiator is a photosensitive agent that functions as a photoacid generator, typically an ionic onium salt composed of a cationic portion and a cationic portion. In the onium salt, the cationic portion absorbs light, while the anionic portion becomes an acid generator. The acid generated from the photocationic polymerization initiator causes ring-opening polymerization of the epoxy groups. The resulting photocationic cured product has a high softening temperature of the first protective layer, which reduces iodine adsorption. This results in a polarizing plate with suppressed cracking and excellent durability under humidification.

由加濕耐久性之觀點來看,本實施形態之第1保護層的軟化溫度宜為100℃以上,較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。From the perspective of humidification durability, the softening temperature of the first protective layer of this embodiment is preferably 100°C or higher, more preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. From the perspective of formability, it is preferably 300°C or lower, more preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

A-4-2-1.環氧樹脂 環氧樹脂可使用任意適當之環氧樹脂,且可適宜使用具有芳香環或脂環之環氧樹脂。在本實施形態中,宜使用具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂。芳香族骨架可舉例如苯環、萘環、茀環等。環氧樹脂可僅使用1種亦可組合2種以上來使用。宜可使用具有聯苯骨架或雙酚骨架作為芳香族骨架之環氧樹脂或其氫化物。藉由使用所述環氧樹脂,可提供一種具有更優異之耐久性且撓曲性亦優異之偏光板。以下作為代表例,詳細說明具有聯苯骨架之環氧樹脂。A-4-2-1. Epoxy Resin Any suitable epoxy resin can be used, and epoxy resins having aromatic or aliphatic rings are particularly preferred. In this embodiment, an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton is preferably used. Examples of aromatic skeletons include benzene, naphthalene, and fluorene. The epoxy resin may be used singly or in combination of two or more. An epoxy resin having a biphenyl or bisphenol skeleton as the aromatic skeleton, or a hydrogenated epoxy resin thereof, is particularly preferred. The use of such epoxy resins provides a polarizing plate having superior durability and flexibility. The following is a detailed description of an epoxy resin having a biphenyl skeleton as a representative example.

在一實施形態中,具有聯苯骨架之環氧樹脂係包含以下結構之環氧樹脂。具有聯苯骨架之環氧樹脂可僅使用1種,亦可組合2種以上來使用。 [化學式4] (式中,R14 ~R21 分別獨立表示氫原子、碳數1~12之直鏈狀或支鏈狀之取代或非取代的烴基、或鹵素元素)。In one embodiment, the epoxy resin having a biphenyl skeleton includes an epoxy resin having the following structure. The epoxy resin having a biphenyl skeleton may be used alone or in combination of two or more. [Chemical Formula 4] (wherein, R 14 to R 21 independently represent a hydrogen atom, a linear or branched substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, or a halogen element).

R14 ~R21 分別獨立表示氫原子、碳數1~12之直鏈狀或支鏈狀之取代或非取代的烴基、或鹵素元素。碳數1~12之直鏈狀或支鏈狀之取代或非取代的烴基可舉例如:甲基、乙基、正丙基、異丙基、正丁基、二級丁基、三級丁基、正戊基、異戊基、新戊基、三級戊基、環戊基、正己基、異己基、環己基、正庚基、環庚基、甲基環己基、正辛基、環辛基、正壬基、3,3,5-三甲基環己基、正癸基、環癸基、正十一基、正十二基、環十二基、苯基、苄基、甲基苄基、二甲基苄基、三甲基苄基、萘基甲基、苯乙基、2-苯基異丙基等。碳數1~12之直鏈狀或支鏈狀之取代或非取代的烴基宜為甲基、乙基、正丙基、異丙基、正丁基等碳數1~4烷基。鹵素元素可舉氟及溴。R 14 to R 21 each independently represent a hydrogen atom, a linear or branched substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, or a halogen element. Examples of the linear or branched substituted or unsubstituted alkyl group having 1 to 12 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, dibutyl, tertiary butyl, n-pentyl, isopentyl, neopentyl, tertiary pentyl, cyclopentyl, n-hexyl, isohexyl, cyclohexyl, n-heptyl, cycloheptyl, methylcyclohexyl, n-octyl, cyclooctyl, n-nonyl, 3,3,5-trimethylcyclohexyl, n-decyl, cyclodecyl, n-undecyl, n-dodecyl, cyclododecyl, phenyl, benzyl, methylbenzyl, dimethylbenzyl, trimethylbenzyl, naphthylmethyl, phenethyl, and 2-phenylisopropyl. The linear or branched substituted or unsubstituted alkyl group with 1 to 12 carbon atoms is preferably an alkyl group with 1 to 4 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, or n-butyl. Halogen elements may include fluorine and bromine.

在一實施形態中,具有聯苯骨架之環氧樹脂為下式所示環氧樹脂。 [化學式5] (式中,R14 ~R21 如上述,n表示0~6之整數)。In one embodiment, the epoxy resin having a biphenyl skeleton is an epoxy resin represented by the following formula: [Chemical Formula 5] (wherein, R 14 to R 21 are as described above, and n represents an integer from 0 to 6).

在一實施形態中,具有聯苯骨架之環氧樹脂為僅具有聯苯骨架之環氧樹脂。藉由使用僅具有聯苯骨架之環氧樹脂,可更提升所得保護層之耐久性。In one embodiment, the epoxy resin having a biphenyl skeleton is an epoxy resin having only a biphenyl skeleton. By using an epoxy resin having only a biphenyl skeleton, the durability of the resulting protective layer can be further improved.

在一實施形態中,具有聯苯骨架之環氧樹脂亦可包含有聯苯骨架以外之化學結構。聯苯骨架以外之化學結構可舉例如雙酚骨架、脂環式結構、芳香族環結構等。在該實施形態中,聯苯骨架以外之化學結構的比率(莫耳比)宜少於聯苯骨架。In one embodiment, the epoxy resin having a biphenyl backbone may also contain chemical structures other than the biphenyl backbone. Examples of chemical structures other than the biphenyl backbone include a bisphenol backbone, an alicyclic structure, and an aromatic ring structure. In this embodiment, the ratio (molar ratio) of chemical structures other than the biphenyl backbone is preferably less than that of the biphenyl backbone.

具有聯苯骨架之環氧樹脂亦可使用市售物。市售物可舉例如Mitsubishi Chemical Co.製,商品名:jER YX4000、jER YX4000H、jER YL6121、jER YL664、jER YL6677、jER YL6810、jER YL7399等。Commercially available epoxy resins having a biphenyl skeleton may also be used. Examples of commercially available epoxy resins include those manufactured by Mitsubishi Chemical Co., under the trade names jER YX4000, jER YX4000H, jER YL6121, jER YL664, jER YL6677, jER YL6810, and jER YL7399.

上述環氧樹脂(光陽離子硬化後之環氧樹脂)宜為玻璃轉移溫度(Tg)在100℃以上。結果,保護層之軟化溫度亦幾乎成為100℃以上。環氧樹脂之Tg若為100℃以上,包含所得保護層之偏光板便容易成為耐久性優異者。環氧樹脂之Tg較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上。另一方面,環氧樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。環氧樹脂之Tg若在所述範圍內,成形性便可優異。The above-mentioned epoxy resin (epoxy resin after photoion curing) preferably has a glass transition temperature (Tg) of 100°C or higher. As a result, the softening temperature of the protective layer is also almost above 100°C. If the Tg of the epoxy resin is above 100°C, the polarizing plate including the obtained protective layer tends to have excellent durability. The Tg of the epoxy resin is preferably above 110°C, more preferably above 120°C, and particularly preferably above 125°C. On the other hand, the Tg of the epoxy resin is preferably below 300°C, more preferably below 250°C, more preferably below 200°C, and particularly preferably below 160°C. If the Tg of the epoxy resin is within the above range, the formability can be excellent.

上述環氧樹脂之環氧當量宜為100g/當量以上,較宜為150g/當量以上,更宜為200g/當量以上。又,環氧樹脂之環氧當量宜為3000g/當量以下,較宜為2500g/當量以下,更宜為2000g/當量以下。藉由環氧當量為上述範圍,可獲得更穩定的保護層(殘存單體少且已充分硬化之保護層)。另,在本說明書中,「環氧當量」意指「包含1當量環氧基之環氧樹脂的質量」,可依循JIS K7236進行測定。The epoxy equivalent weight of the epoxy resin is preferably 100 g/equivalent or greater, more preferably 150 g/equivalent or greater, and even more preferably 200 g/equivalent or greater. Furthermore, the epoxy equivalent weight of the epoxy resin is preferably 3000 g/equivalent or less, more preferably 2500 g/equivalent or less, and even more preferably 2000 g/equivalent or less. By keeping the epoxy equivalent weight within this range, a more stable protective layer (a fully cured protective layer with minimal residual monomers) can be obtained. In this specification, "epoxy equivalent weight" refers to "the mass of the epoxy resin containing one equivalent of epoxy groups" and can be measured in accordance with JIS K7236.

本實施形態中,亦可併用上述環氧樹脂與其他樹脂。即,亦可將上述環氧樹脂(例如具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂)與其他樹脂之摻合物供於保護層之成形。其他樹脂可舉例如苯乙烯系樹脂、聚乙烯、聚丙烯、聚醯胺、聚伸苯硫醚、聚醚醚酮、聚酯、聚碸、聚伸苯醚、聚縮醛、聚醯亞胺、聚醚醯亞胺等熱塑性樹脂、丙烯酸系樹脂及氧雜環丁烷系樹脂等硬化型樹脂。宜可使用丙烯酸系樹脂及氧雜環丁烷系樹脂。併用之樹脂的種類及摻混量可按目的及對所得薄膜所期望之特性等來適當設定。舉例而言,苯乙烯系樹脂可作為相位差控制劑來併用。In this embodiment, the above-mentioned epoxy resin can also be used in combination with other resins. That is, a blend of the above-mentioned epoxy resin (e.g., an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton) and other resins can also be used to form the protective layer. Other resins include thermoplastic resins such as styrene resins, polyethylene, polypropylene, polyamide, polyphenylene sulfide, polyetheretherketone, polyester, polysulfone, polyphenylene oxide, polyacetal, polyimide, and polyetherimide, as well as hardening resins such as acrylic resins and cyclohexane resins. Acrylic resins and cyclohexane resins are preferably used. The type and amount of the resin to be used can be appropriately determined according to the purpose and the desired properties of the resulting film. For example, a styrene-based resin can be used as a phase difference control agent.

丙烯酸系樹脂可使用任意適當之(甲基)丙烯酸系化合物。例如(甲基)丙烯酸系化合物可舉例如分子內具有一個(甲基)丙烯醯基之(甲基)丙烯酸系化合物(以下亦稱「單官能(甲基)丙烯酸系化合物」)、分子內具有二個以上(甲基)丙烯醯基之(甲基)丙烯酸系化合物(以下亦稱「多官能(甲基)丙烯酸系化合物」)。該等(甲基)丙烯酸系化合物可單獨使用,亦可組合2種以上來使用。關於該等丙烯酸系樹脂例如記載於日本專利特開2019-168500號公報中。本說明書中係援用該公報整體之記載作為參考。Any suitable (meth)acrylic compound can be used as the acrylic resin. Examples of the (meth)acrylic compound include a (meth)acrylic compound having one (meth)acrylic group in the molecule (hereinafter referred to as a "monofunctional (meth)acrylic compound") and a (meth)acrylic compound having two or more (meth)acrylic groups in the molecule (hereinafter referred to as a "polyfunctional (meth)acrylic compound"). These (meth)acrylic compounds can be used alone or in combination of two or more. These acrylic resins are described, for example, in Japanese Patent Publication No. 2019-168500. The entire disclosure of this publication is incorporated herein by reference.

氧雜環丁烷樹脂可使用分子內具有1個以上氧雜環丁烷基之任意適當的化合物。可舉例如:3-乙-3-羥甲基氧雜環丁烷、3-乙-3-(2-乙基己基氧基甲基)氧雜環丁烷、3-乙-3-(苯氧基甲基)氧雜環丁烷、3-乙-3-(環己基氧基甲基)氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯等分子內具有1個氧雜環丁烷基之氧雜環丁烷化合物;3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷、1,4-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]苯、4,4'-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]聯苯等分子內具有2個以上氧雜環丁烷基之氧雜環丁烷化合物等。該等氧雜環丁烷樹脂可僅使用1種亦可組合2種以上。Any suitable compound having one or more cyclohexyl groups in the molecule can be used as the cyclohexyloxybutane resin. Examples thereof include 3-ethyl-3-hydroxymethylcyclohexyloxybutane, 3-ethyl-3-(2-ethylhexyloxymethyl)cyclohexyloxybutane, 3-ethyl-3-(phenoxymethyl)cyclohexyloxybutane, 3-ethyl-3-(cyclohexyloxymethyl)cyclohexyloxybutane, 3-ethyl-3-(oxiranylmethoxy)cyclohexyloxybutane, and (meth)acrylate (3-ethylcyclohexyl-3-yl)methyl ester. Oxycyclobutane compounds containing one oxocyclobutane group; oxocyclobutane compounds containing two or more oxocyclobutane groups in the molecule, such as 3-ethyl-3{[(3-ethyloxocyclobutane-3-yl)methoxy]methyl}oxocyclobutane, 1,4-bis[(3-ethyl-3-oxocyclobutane)methoxymethyl]benzene, and 4,4'-bis[(3-ethyl-3-oxocyclobutane)methoxymethyl]biphenyl. These oxocyclobutane resins may be used alone or in combination of two or more.

氧雜環丁烷樹脂宜可使用3-乙-3-羥甲基氧雜環丁烷、1,4-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]苯、3-乙-3-(2-乙基己基氧基甲基)氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯、3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷等。該等氧雜環丁烷樹脂可輕易取得,且稀釋性(低黏度)、相溶性優異。Preferred cyclohexane resins include 3-ethyl-3-hydroxymethylcyclohexane, 1,4-bis[(3-ethyl-3-cyclohexane)methoxymethyl]benzene, 3-ethyl-3-(2-ethylhexyloxymethyl)cyclohexane, 3-ethyl-3-(oxiranylmethoxy)cyclohexane, (3-ethylcyclohexane-3-yl)methyl (meth)acrylate, and 3-ethyl-3{[(3-ethylcyclohexane-3-yl)methoxy]methyl}cyclohexane. These cyclohexane resins are readily available and have excellent diluting properties (low viscosity) and compatibility.

在一實施形態中,由相溶性或接著性之觀點來看,宜使用分子量500以下且在室溫(25℃)下呈液態的氧雜環丁烷樹脂。在一實施形態中,宜使用分子內含有2個以上氧雜環丁烷基之氧雜環丁烷化合物、分子內含有1個氧雜環丁烷基與1個(甲基)丙烯醯基或1個環氧基之氧雜環丁烷化合物,較宜使用3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯。藉由使用該等氧雜環丁烷樹脂可提升保護層之硬化性及耐久性。In one embodiment, from the perspective of compatibility and adhesion, an oxycyclobutane resin having a molecular weight of 500 or less and being liquid at room temperature (25°C) is preferably used. In one embodiment, an oxycyclobutane compound containing two or more oxycyclobutane groups in the molecule, or an oxycyclobutane compound containing one oxycyclobutane group and one (meth)acryloyl group or one epoxy group in the molecule is preferably used. 3-Ethyl-3-{[(3-ethyloxycyclobutane-3-yl)methoxy]methyl}oxycyclobutane, 3-Ethyl-3-(oxiranylmethoxy)oxycyclobutane, and (3-ethyloxycyclobutane-3-yl)methyl (meth)acrylate are more preferably used. By using these cyclohexane oxychloride resins, the hardening and durability of the protective layer can be improved.

氧雜環丁烷樹脂亦可使用市售物。具體上,可使用ARON OXETANE OXT-101、ARON OXETANE OXT-121、ARON OXETANE OXT-212、ARON OXETANE OXT-221(皆為東亞合成公司製)。宜可使用ARON OXETANE OXT-101及ARON OXETANE OXT-221。Commercially available oxycyclobutane resins can also be used. Specifically, ARON OXETANE OXT-101, ARON OXETANE OXT-121, ARON OXETANE OXT-212, and ARON OXETANE OXT-221 (all manufactured by Toagosei Co., Ltd.) can be used. Preferably, ARON OXETANE OXT-101 and ARON OXETANE OXT-221 can be used.

本實施形態之第1保護層中,上述環氧樹脂(例如具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂)之含量宜為50重量%~100重量%,較宜為60重量%~100重量%,更宜為70重量%~100重量%,尤宜為80重量%~100重量%。當含量小於50重量%時,恐無法獲得保護層之耐熱性及與偏光件之充分密著性。In the first protective layer of this embodiment, the content of the epoxy resin (e.g., an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton) is preferably 50% to 100% by weight, more preferably 60% to 100% by weight, more preferably 70% to 100% by weight, and particularly preferably 80% to 100% by weight. If the content is less than 50% by weight, the protective layer may not exhibit sufficient heat resistance and adhesion to the polarizer.

當併用具有聯苯骨架或雙酚骨架之環氧樹脂與氧雜環丁烷樹脂時,相對於環氧系樹脂與氧雜環丁烷樹脂之合計量100重量份,氧雜環丁烷樹脂之含量宜為1重量份~50重量份,較宜為5重量份~45重量份,更宜為10重量份~40重量份。藉由設為上述範圍,可提升硬化性,亦可提升保護層與偏光件之密著性。When using an epoxy resin with a biphenyl or bisphenol backbone and a cyclohexane oxybutane resin together, the cyclohexane oxybutane resin content is preferably 1 to 50 parts by weight, more preferably 5 to 45 parts by weight, and even more preferably 10 to 40 parts by weight, per 100 parts by weight of the epoxy resin and cyclohexane oxybutane resin combined. This range improves curability and enhances adhesion between the protective layer and the polarizer.

A-4-2-2.光陽離子聚合引發劑 光陽離子聚合引發劑係具有光酸產生劑之功能的感光劑,代表上可舉由陽離子部與陰離子部構成之離子性鎓鹽。在該鎓鹽中,陽離子部會吸收光,而陰離子部會成為酸的產生源。藉由從該光陽離子聚合引發劑產生之酸,進行環氧基之開環聚合。光陽離子聚合引發劑可使用可藉由紫外線等光照射使具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂硬化的任意適當之化合物。光陽離子聚合引發劑可僅使用1種,亦可組合2種以上來使用。A-4-2-2. Photocationic Polymerization Initiators Photocationic polymerization initiators are photosensitive agents that function as photoacid generators. Representative examples include ionic onium salts composed of a cationic portion and an anionic portion. In these onium salts, the cationic portion absorbs light, while the anionic portion serves as a source of acid. The acid generated by the photocationic polymerization initiator causes ring-opening polymerization of epoxy groups. Any suitable compound that can cure epoxy resins having at least one selected from the group consisting of aromatic skeletons and hydrogenated aromatic skeletons upon irradiation with light, such as ultraviolet light, can be used as the photocationic polymerization initiator. The photocatalytic polymerization initiator may be used alone or in combination of two or more.

光陽離子聚合引發劑可舉例如三苯基鋶六氟銻酸鹽、三苯基鋶六氟磷酸鹽、對(苯硫基)苯基二苯基鋶六氟銻酸鹽、對(苯硫基)苯基二苯基鋶六氟磷酸鹽、4-氯苯基二苯基鋶六氟磷酸鹽、4-氯苯基二苯基鋶六氟銻酸鹽、雙[4-(二苯基鋶基)苯基]硫醚雙六氟磷酸鹽、雙[4-(二苯基鋶基)苯基]硫醚雙六氟銻酸鹽、(2,4-環戊二烯-1-基)[(1-甲基乙基)苯]-Fe-六氟磷酸鹽、二苯基碘鎓六氟銻酸鹽等。宜使用三苯基鋶鹽系六氟銻酸鹽型之光陽離子聚合引發劑、二苯基碘鎓鹽系六氟銻酸鹽型之光陽離子聚合引發劑。Examples of the photocatalytic polymerization initiator include triphenylcorbium hexafluoroantimonylate, triphenylcorbium hexafluorophosphate, p-(phenylthio)phenyldiphenylcorbium hexafluoroantimonylate, p-(phenylthio)phenyldiphenylcorbium hexafluoroantimonylate, 4-chlorophenyldiphenylcorbium hexafluorophosphate, 4-chlorophenyldiphenylcorbium hexafluoroantimonylate, bis[4-(diphenylcorbyl)phenyl]sulfide bishexafluorophosphate, bis[4-(diphenylcorbyl)phenyl]sulfide bishexafluoroantimonylate, (2,4-cyclopentadien-1-yl)[(1-methylethyl)benzene]-Fe-hexafluorophosphate, and diphenyliodonium hexafluoroantimonylate. Preferred photocatalytic polymerization initiators are triphenylsulfonium hexafluoroantimonate salts and diphenyliodonium hexafluoroantimonate salts.

光陽離子聚合引發劑亦可使用市售物。市售物可舉三苯基鋶鹽系六氟銻酸鹽型之SP-170(ADEKA公司製)、CPI-101A(SAN-APRO公司製)、WPAG-1056(和光純藥工業公司製)、二苯基碘鎓鹽系六氟銻酸鹽型之WPI-116(和光純藥工業公司製)等。Commercially available photocatalytic polymerization initiators may also be used. Examples include triphenylstemium salt-based hexafluoroantimony type SP-170 (manufactured by ADEKA), CPI-101A (manufactured by SAN-APRO), WPAG-1056 (manufactured by Wako Junyaku Industries), and diphenyliodonium salt-based hexafluoroantimony type WPI-116 (manufactured by Wako Junyaku Industries).

相對於上述環氧樹脂(例如具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂)100重量份,光陽離子聚合引發劑之含量宜為0.1重量份~3重量份,較宜為0.25重量份~2重量份。當光陽離子聚合引發劑之含量小於0.1重量份時,有即便照射光(紫外線)仍未充分硬化之情形。The amount of the photocatalytic polymerization initiator is preferably 0.1 to 3 parts by weight, more preferably 0.25 to 2 parts by weight, per 100 parts by weight of the epoxy resin (e.g., an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton). If the amount of the photocatalytic polymerization initiator is less than 0.1 parts by weight, the resin may not be sufficiently cured even after exposure to light (ultraviolet light).

本實施形態之第1保護層例如可藉由塗佈包含上述環氧樹脂與光陽離子聚合引發劑之組成物而形成塗膜,並對該塗膜照射光(例如紫外線)而形成。The first protective layer of this embodiment can be formed, for example, by applying a composition comprising the above-mentioned epoxy resin and a photocatalytic polymerization initiator to form a coating film, and then irradiating the coating film with light (e.g., ultraviolet rays).

上述組成物中所含溶劑可使用可將環氧樹脂及硬化劑溶解或均勻分散之任意適當之溶劑。溶劑之具體例可舉乙酸乙酯、甲苯、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮。The solvent contained in the above composition can be any suitable solvent that can dissolve or uniformly disperse the epoxy resin and the hardener. Specific examples of the solvent include ethyl acetate, toluene, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclopentanone, and cyclohexanone.

上述組成物中之環氧樹脂濃度相對於溶劑100重量份宜為10重量份~30重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The epoxy resin concentration in the above composition is preferably 10 to 30 parts by weight relative to 100 parts by weight of the solvent. This resin concentration allows for a uniform coating film that adheres closely to the polarizer.

上述組成物可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上的塗佈膜之硬化物會轉印至偏光件上。當塗佈於偏光件時,例如藉由光照射使塗佈膜硬化,藉此於偏光件上直接形成第1保護層。宜為上述組成物塗佈於偏光件上,而於偏光件上直接形成第1保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。組成物之塗佈方法如上述。The above-mentioned composition can be applied to any appropriate substrate or to a polarizer. When applied to a substrate, the cured coating formed on the substrate is transferred to the polarizer. When applied to a polarizer, the coating is cured, for example, by irradiation with light, thereby forming a first protective layer directly on the polarizer. It is preferable to apply the above-mentioned composition to the polarizer and form the first protective layer directly on the polarizer. If the above-mentioned structure is adopted, the adhesive layer or the adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. The method of applying the composition is as described above.

藉由光照射使塗佈膜硬化時,可使用任意適當之光源以成為任意適當之照射量之方式對塗佈膜照射光(代表上為紫外線)。紫外線之光源例如可使用低壓水銀燈、高壓水銀燈、超高壓水銀燈、無電極燈、鹵素燈、碳弧燈、氙燈、金屬鹵素燈、化學燈、黑光燈、LED燈等。紫外線之照射量例如為2mJ/cm2 ~3000mJ/cm2 ,宜為10mJ/cm2 ~2000mJ/cm2 。具體上,在使用高壓水銀燈作為光源時,照射量通常係在5mJ/cm2 ~3000mJ/cm2 、宜在50mJ/cm2 ~2000mJ/cm2 之條件下進行。使用無電極燈作為光源時,照射量通常係在2mJ/cm2 ~2000mJ/cm2 、宜在10mJ/cm2 ~1000mJ/cm2 之條件下進行。When curing the coating by light irradiation, the coating can be irradiated with light (typically, ultraviolet light) using any appropriate light source at any appropriate irradiation dose. Examples of ultraviolet light sources include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, electrodeless lamps, halogen lamps, carbon arc lamps, xenon lamps, metal halogen lamps, chemical lamps, black light lamps, and LED lamps. The ultraviolet irradiation dose is, for example, 2 mJ/ cm² to 3000 mJ/ cm² , preferably 10 mJ/ cm² to 2000 mJ/ cm² . Specifically, when using a high-pressure mercury lamp as the light source, the irradiation dose is generally between 5mJ/ cm2 and 3000mJ/ cm2 , preferably between 50mJ/ cm2 and 2000mJ/ cm2 . When using an electrodeless lamp as the light source, the irradiation dose is generally between 2mJ/ cm2 and 2000mJ/ cm2 , preferably between 10mJ/ cm2 and 1000mJ/ cm2 .

照射時間可因應光源之種類、光源與塗佈面之距離、塗佈厚度及其他條件設定成任意適當之值。照射時間通常為數秒~數十秒,亦可為數分之1秒。光之照射可從任意適當之方向照射。由防止不均勻硬化之觀點下,宜從保護層形成用組成物之塗敷面側照射。The irradiation time can be set to any appropriate value depending on the type of light source, the distance between the light source and the coated surface, the coating thickness, and other conditions. Irradiation times typically range from several seconds to several tens of seconds, but can also be as short as a fraction of a second. Light can be applied from any appropriate direction. To prevent uneven curing, irradiation is preferably applied from the side of the coated surface of the protective layer-forming composition.

利用紫外線照射等光照射進行曝光後,為了使光反應進行之硬化結束,亦可進一步施行加熱處理。加熱處理可在任意適當之溫度及時間下進行。加熱溫度例如為80℃~250℃,宜為100℃~150℃。加熱時間例如為10秒~2小時,宜為5分鐘~1小時。After exposure to light such as ultraviolet radiation, a heat treatment may be further performed to complete the curing process of the photoreaction. The heat treatment may be performed at any appropriate temperature and for any appropriate time. The heating temperature is, for example, 80°C to 250°C, preferably 100°C to 150°C. The heating time is, for example, 10 seconds to 2 hours, preferably 5 minutes to 1 hour.

A-4-3.環氧樹脂之有機溶劑溶液的塗佈膜之固化物 在一實施形態中,第1保護層係以環氧樹脂之有機溶劑溶液的塗佈膜之固化物所構成。由加濕耐久性之觀點來看,本實施形態之第1保護層的軟化溫度宜為100℃以上,較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。A-4-3. Cured Film of an Epoxy Resin Organic Solvent Solution In one embodiment, the first protective layer is formed from a cured film of an epoxy resin organic solvent solution. From the perspective of wet durability, the softening temperature of the first protective layer in this embodiment is preferably 100°C or higher, preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. Furthermore, from the perspective of formability, the softening temperature is preferably 300°C or lower, preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

A-4-3-1.環氧樹脂 在本實施形態中,環氧樹脂宜玻璃轉移溫度(Tg)為100℃以上。結果,保護層之軟化溫度亦幾乎成為100℃以上。環氧樹脂之Tg若在100℃以上,包含由這種樹脂所得保護層的偏光板便容易成為耐久性優異者。環氧樹脂之Tg較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上。另一方面,環氧樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。環氧樹脂之Tg若在所述範圍內,成形性便可優異。A-4-3-1. Epoxy Resin In this embodiment, the epoxy resin preferably has a glass transition temperature (Tg) of 100°C or higher. As a result, the softening temperature of the protective layer is also approximately 100°C or higher. When the Tg of the epoxy resin is above 100°C, polarizing plates containing a protective layer made of such a resin tend to have excellent durability. The Tg of the epoxy resin is preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. On the other hand, the Tg of the epoxy resin is preferably 300°C or lower, more preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower. If the Tg of epoxy resin is within the above range, the moldability can be excellent.

環氧樹脂只要具有如上述之Tg,便可採用任意適當之環氧樹脂。環氧樹脂代表上係指分子結構內具有環氧基之樹脂。作為環氧樹脂宜可使用分子結構內具有芳香族環之環氧樹脂。藉由使用具有芳香族環之環氧樹脂,可獲得具有更高Tg之環氧樹脂。分子結構內具有芳香族環之環氧樹脂的芳香族環,可舉例如苯環、萘環、茀環等。環氧樹脂可僅使用1種亦可組合2種以上來使用。使用2種以上環氧樹脂時,亦可組合含芳香族環之環氧樹脂與不含芳香族環之環氧樹脂來使用。Any appropriate epoxy resin may be used as long as it has the Tg described above. Epoxy resins typically refer to resins having an epoxy group in their molecular structure. Preferred epoxy resins include those having an aromatic ring in their molecular structure. By using epoxy resins having an aromatic ring, an epoxy resin having a higher Tg can be obtained. Examples of aromatic rings in epoxy resins having an aromatic ring in their molecular structure include a benzene ring, a naphthalene ring, and a fluorene ring. Epoxy resins may be used alone or in combination of two or more. When using two or more epoxy resins, you can also use a combination of epoxy resins containing aromatic epoxy and epoxy resins that do not contain aromatic epoxy.

分子結構內具有芳香族環之環氧樹脂具體上可列舉:雙酚A二環氧丙基醚型環氧樹脂、雙酚F二環氧丙基醚型環氧樹脂、雙酚S二環氧丙基醚型環氧樹脂、間苯二酚二環氧丙基醚型環氧樹脂、氫醌二環氧丙基醚型環氧樹脂、對苯二甲酸二環氧丙基酯型環氧樹脂、雙苯氧基乙醇茀二環氧丙基醚型環氧樹脂、雙酚茀二環氧丙基醚型環氧樹脂、雙甲酚茀二環氧丙基醚型環氧樹脂等具有2個環氧基之環氧樹脂;酚醛型環氧樹脂、N,N,O-三環氧丙基-對或-間-胺基苯酚型環氧樹脂、N,N,O-三環氧丙基-4-胺基-間-或-5-胺基-鄰甲酚型環氧樹脂、1,1,1-(三環氧丙基氧基苯基)甲烷型環氧樹脂等具有3個環氧基之環氧樹脂;環氧丙基胺型環氧樹脂(例如二胺基二苯甲烷型、二胺基二苯基碸型、間茬二胺型)等具有4個環氧基之環氧樹脂等。又,亦可使用六氫酞酸酐型環氧樹脂、四氫酞酸酐型環氧樹脂、二體酸型環氧樹脂、對氧基苯甲酸型等環氧丙基酯型環氧樹脂。Epoxy resins with aromatic rings in their molecular structure can be specifically listed as: bisphenol A diglycidyl ether type epoxy resin, bisphenol F diglycidyl ether type epoxy resin, bisphenol S diglycidyl ether type epoxy resin, resorcinol diglycidyl ether type epoxy resin, Hydroquinone diglycidyl ether type epoxy resin, terephthalate diglycidyl ester type epoxy resin, diphenoxyethanol fluorene diglycidyl ether type epoxy resin, bisphenol fluorene diglycidyl ether type epoxy resin, biscresol fluorene diglycidyl ether type epoxy resin, etc. have two Epoxy resins containing epoxy groups; epoxy resins having three epoxy groups, such as phenolic epoxy resins, N,N,O-triglycyrrhizic-p- or -m-aminophenol epoxy resins, N,N,O-triglycyrrhizic-4-amino-m- or -5-amino-o-cresol epoxy resins, and 1,1,1-(triglycyrrhizic-propyloxyphenyl)methane epoxy resins; epoxy resins having four epoxy groups, such as glycyrrhizic-amine epoxy resins (e.g., diaminodiphenylmethane type, diaminodiphenylsulfonium type, and interrupted diamine type). Furthermore, hexahydrophthalic anhydride type epoxy resin, tetrahydrophthalic anhydride type epoxy resin, dialcic acid type epoxy resin, p-oxybenzoic acid type epoxy resin, or other glycidyl ester type epoxy resin can also be used.

環氧樹脂之重量平均分子量宜為1000~2000000,較宜為5000~1000000,更宜為10000~500000,尤宜為50000~500000,最宜為60000~150000。重量平均分子量例如可使用凝膠滲透層析法(GPC系統,Tosoh(東曹)公司製),以聚苯乙烯換算求得。此外,溶劑可使用四氫呋喃。The weight average molecular weight of the epoxy resin is preferably 1,000 to 2,000,000, more preferably 5,000 to 1,000,000, more preferably 10,000 to 500,000, particularly preferably 50,000 to 500,000, and most preferably 60,000 to 150,000. The weight average molecular weight can be determined, for example, by gel permeation chromatography (GPC system, manufactured by Tosoh Corporation) in terms of polystyrene. Tetrahydrofuran can be used as the solvent.

環氧樹脂之環氧當量宜為1000g/當量以上,較宜為3000g/當量以上,更宜為5000g/當量以上。又,環氧樹脂之環氧當量宜為30000g/當量以下,較宜為25000g/當量以下,更宜為20000g/當量以下。藉由令環氧當量為上述範圍,可獲得更穩定之保護層。另,在本說明書中,「環氧當量」意指「包含1當量環氧基之環氧樹脂的質量」,可依循JIS K7236進行測定。The epoxy equivalent weight of the epoxy resin is preferably 1000 g/equivalent or greater, more preferably 3000 g/equivalent or greater, and even more preferably 5000 g/equivalent or greater. Furthermore, the epoxy equivalent weight of the epoxy resin is preferably 30,000 g/equivalent or less, more preferably 25,000 g/equivalent or less, and even more preferably 20,000 g/equivalent or less. By keeping the epoxy equivalent weight within this range, a more stable protective layer can be obtained. In this specification, "epoxy equivalent weight" means "the mass of the epoxy resin containing one equivalent of epoxy groups" and can be measured in accordance with JIS K7236.

本實施形態中,亦可併用環氧樹脂與其他樹脂。即,亦可將環氧樹脂與其他樹脂之摻合物供於保護層之成形。其他樹脂可舉例如苯乙烯系樹脂、聚乙烯、聚丙烯、聚醯胺、聚伸苯硫醚、聚醚醚酮、聚酯、聚碸、聚伸苯醚、聚縮醛、聚醯亞胺、聚醚醯亞胺等熱塑性樹脂。併用之樹脂的種類及摻混量可按目的及對所得薄膜所期望之特性等來適當設定。舉例而言,苯乙烯系樹脂可作為相位差控制劑來併用。In this embodiment, epoxy resins can also be used in combination with other resins. That is, a blend of epoxy resins and other resins can also be used to form the protective layer. Other resins include thermoplastic resins such as styrene-based resins, polyethylene, polypropylene, polyamide, polyphenylene sulfide, polyetheretherketone, polyester, polysulfone, polyphenylene oxide, polyacetal, polyimide, and polyetherimide. The type and blending amount of the resin used in combination can be appropriately set according to the purpose and the desired properties of the resulting film. For example, a styrene-based resin can be used in combination as a phase difference control agent.

本實施形態之第1保護層中上述環氧樹脂之含量宜為50重量%~100重量%,較宜為60重量%~100重量%,更宜為70重量%~100重量%,尤宜為80重量%~100重量%。當含量小於50重量%時,恐無法獲得保護層之耐熱性及與偏光件之充分密著性。The epoxy resin content in the first protective layer of this embodiment is preferably 50% to 100% by weight, more preferably 60% to 100% by weight, more preferably 70% to 100% by weight, and even more preferably 80% to 100% by weight. If the content is less than 50% by weight, the protective layer may not provide adequate heat resistance and adhesion to the polarizer.

本實施形態之第1保護層例如可藉由塗佈包含上述環氧樹脂之有機溶劑溶液而形成塗膜,並使該塗膜固化而形成。有機溶劑溶液中之環氧樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The first protective layer of this embodiment can be formed, for example, by applying an organic solvent solution containing the aforementioned epoxy resin to form a coating film, and then curing the coating film. The epoxy resin concentration in the organic solvent solution is preferably 3 to 20 parts by weight per 100 parts by weight of the solvent. This resin concentration allows for a uniform coating film that adheres closely to the polarizer.

上述有機溶劑可使用可將環氧樹脂溶解或均勻分散之任意適當之溶劑。溶劑之具體例可舉乙酸乙酯、甲苯、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮。The organic solvent may be any suitable solvent that can dissolve or uniformly disperse the epoxy resin. Specific examples of the solvent include ethyl acetate, toluene, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclopentanone, and cyclohexanone.

溶液可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上的塗佈膜之固化物會轉印至偏光件上。當塗佈於偏光件時,藉由使塗佈膜乾燥(固化),而於偏光件上直接形成第1保護層。宜為溶液塗佈於偏光件上,而於偏光件上直接形成第1保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。溶液之塗佈方法如上述。The solution can be applied to any appropriate substrate or to a polarizer. When applied to a substrate, the cured product of the coating film formed on the substrate is transferred to the polarizer. When applied to a polarizer, the first protective layer is formed directly on the polarizer by drying (curing) the coating film. It is preferable to apply the solution to the polarizer and form the first protective layer directly on the polarizer. If the structure is as described above, the adhesive layer or the adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. The method of applying the solution is as described above.

藉由使溶液之塗佈膜乾燥(固化),可形成屬塗佈膜之固化物的保護層。乾燥溫度宜為100℃以下,較宜為50℃~70℃。乾燥溫度若在所述範圍內,便可防止對偏光件造成不良影響。乾燥時間可按乾燥溫度變化。乾燥時間例如可為1分鐘~10分鐘。By drying (curing) the solution coating, a protective layer is formed as a cured product of the coating. The drying temperature is preferably below 100°C, more preferably between 50°C and 70°C. A drying temperature within this range prevents adverse effects on the polarizer. The drying time varies depending on the drying temperature. For example, the drying time can be between 1 and 10 minutes.

A-4-4.保護層之構成及特性 在一實施形態中,第1保護層如上述,係以選自於由以下所構成群組中之至少1種構成:熱塑性丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物、環氧樹脂之光陽離子硬化物及環氧樹脂之有機溶劑溶液的塗佈膜之固化物。若為所述保護層,便可使其厚度較擠製成形薄膜薄上甚多。第1保護層之厚度如上述為10µm以下。又,雖理論上尚不明確,但這種保護層在薄膜成形時之收縮小於其他熱硬化性樹脂或活性能量線硬化性樹脂(例如紫外線硬化性樹脂)之硬化物,及不含殘存單體等,因此具有可抑制薄膜本身劣化且可抑制殘存單體等對偏光板(偏光件)造成不良影響的優點。並且,其吸濕性及透濕性小於水溶液或水分散體這類水系塗佈膜的固化物,因此具有加濕耐久性優異之優點。結果,可實現即便在加熱加濕環境下仍可維持光學特性之耐久性優異的偏光板。A-4-4. Composition and Properties of the Protective Layer In one embodiment, the first protective layer, as described above, is composed of at least one selected from the group consisting of a cured product obtained from a coating film of a thermoplastic acrylic resin in an organic solvent solution, a photocured epoxy resin, and a cured product obtained from a coating film of an organic solvent solution of an epoxy resin. This protective layer can be made significantly thinner than an extruded film. As described above, the thickness of the first protective layer is 10µm or less. Furthermore, although the theoretical reasons are still unclear, this protective layer shrinks less during film formation than cured products of other thermosetting resins or active energy ray-curing resins (such as UV-curing resins), and contains no residual monomers. This has the advantage of suppressing degradation of the film itself and preventing residual monomers from adversely affecting the polarizing plate (polarizer). Furthermore, its hygroscopicity and permeability are lower than those of cured products of aqueous coatings such as aqueous solutions or dispersions, resulting in excellent humidification resistance. As a result, a highly durable polarizing plate can be achieved, maintaining its optical properties even in heated and humidified environments.

第1保護層宜實質上在光學上具有各向同性。本說明書中,「實質上在光學上具有各向同性」意指面內相位差Re(550)為0nm~10nm,厚度方向之相位差Rth(550)為-20nm~+10nm。面內相位差Re(550)較宜為0nm~5nm,更宜為0nm~3nm,尤宜為0nm~2nm。厚度方向之相位差Rth(550)較宜為-5nm~5nm,更宜為-3nm~3nm,尤宜為-2nm~2nm。第1保護層之Re(550)及Rth(550)若在所述範圍內,在將包含該保護層之偏光板應用於影像顯示裝置時,便可防止對顯示特性帶來不良影響。The first protective layer is preferably substantially optically isotropic. In this specification, "substantially optically isotropic" means that the in-plane phase difference Re(550) is 0nm~10nm and the phase difference Rth(550) in the thickness direction is -20nm~+10nm. The in-plane phase difference Re(550) is preferably 0nm~5nm, more preferably 0nm~3nm, and particularly preferably 0nm~2nm. The phase difference Rth(550) in the thickness direction is preferably -5nm~5nm, more preferably -3nm~3nm, and particularly preferably -2nm~2nm. If the Re(550) and Rth(550) of the first protective layer are within the above ranges, when the polarizing plate including the protective layer is applied to an image display device, it is possible to prevent adverse effects on the display characteristics.

第1保護層在厚度3µm時在380nm下之透光率愈高愈佳。具體而言,光線透射率宜為85%以上,較宜為88%以上,更宜為90%以上。光線透射率若在所述範圍內,便可確保所期望之透明性。光線透射率例如可以依循ASTM-D-1003之方法來測定。The first protective layer preferably has a light transmittance of 3µm at 380nm. Specifically, the light transmittance is preferably 85% or higher, more preferably 88% or higher, and even more preferably 90% or higher. Light transmittance within this range ensures the desired transparency. Light transmittance can be measured, for example, according to ASTM D-1003.

第1保護層之霧度越低越佳。具體而言霧度宜為5%以下,較宜為3%以下,更宜為1.5%以下,尤宜為1%以下。霧度若為5%以下,便可賦予薄膜良好的透明感。並且,即便在使用於影像顯示裝置之視辨側偏光板之情況下,仍可良好視辨顯示內容。The lower the haze of the first protective layer, the better. Specifically, the haze is preferably below 5%, more preferably below 3%, even more preferably below 1.5%, and most preferably below 1%. A haze below 5% imparts excellent transparency to the film. Furthermore, even when used as a side-viewing polarizer in an image display device, the displayed content remains clearly visible.

第1保護層在厚度3µm時之YI宜為1.27以下,1.25以下較佳,1.23以下更佳,1.20以下尤佳。當YI大於1.3時,有光學上透明性不足之情形。另,YI例如可從使用高速積分球式分光透射率測定機(商品名DOT-3C:村上色彩技術研究所製)測定而得之色彩三刺激值(X,Y,Z),利用下式求出。 YI=[(1.28X-1.06Z)/Y]×100The YI of the first protective layer at a thickness of 3µm is preferably 1.27 or less, preferably 1.25 or less, more preferably 1.23 or less, and even more preferably 1.20 or less. A YI greater than 1.3 may result in insufficient optical transparency. Alternatively, the YI can be calculated using the following formula from the tristimulus values (X, Y, Z) measured using a high-speed integrating sphere spectroscopic transmittance meter (trade name DOT-3C, manufactured by Murakami Color Technology Laboratory): YI = [(1.28X - 1.06Z) / Y] × 100

第1保護層在厚度3μm時之b值(依亨特(Hunter)表色系統為準的色相尺度)宜小於1.5,且1.0以下較佳。當b值為1.5以上時,有出現非期望之色調之情形。另,b值例如可依以下方式獲得:將構成保護層之薄膜的試樣裁切成3cm見方,使用高速積分球式分光透射率測定機(商品名DOT-3C:村上色彩技術研究所製)測定色相,並依循亨特表色系統評估該色相。The b-value (a hue scale based on the Hunter colorimetric system) of the first protective layer at a thickness of 3 μm is preferably less than 1.5, and preferably less than 1.0. A b-value exceeding 1.5 may result in an undesirable color tone. The b-value can be obtained, for example, by cutting a sample of the film constituting the protective layer into a 3 cm square and measuring the hue using a high-speed integrating sphere spectroscopic transmittance meter (trade name DOT-3C, manufactured by Murakami Color Technology Laboratory) and evaluating the hue according to the Hunter colorimetric system.

第1保護層之碘吸附量宜為25重量%以下,較宜為10重量%以下,更宜為6.0重量%以下,尤宜為3.0重量%以下。碘吸附量越小越佳。碘吸附量若在所述範圍內,便可獲得具有更優異耐久性之偏光板。碘吸附量可以下述方法測定。 於基材(PET薄膜)形成保護層(厚度3µm),而獲得附保護層之PET薄膜。將所得附保護層之PET薄膜裁切成1cm×1cm(1cm2 )做成試料,採取到頂空小瓶(20mL容量)並秤量。接著,將裝有碘溶液1mL的螺口瓶(1.5mL容量)亦放入該頂空小瓶中並蓋緊。之後,將頂空小瓶放入65℃之乾燥機中加溫6小時,藉此使氣體狀態之I2 會吸附於試料上。之後,將試料採取到陶瓷舟皿並使用自動試料燃燒裝置使其燃燒,再將所產生之氣體採集至吸收液10mL中。收集後,將該吸收液以純水調製為15mL,並針對原液或適當稀釋後之液體進行IC定量分析。另,僅以PET薄膜進行相同測定時之碘吸附量幾乎為0。根據經IC定量分析所得碘重量與保護層單體之重量(「附保護層之PET薄膜之重量」-「PET薄膜之重量」),從以下式算出碘吸附量(重量%)。 碘吸附量(重量%)=IC定量分析所得碘重量/保護層單體之重量×100 分析例如可使用以下測定裝置。 [測定裝置] 自動試料燃燒裝置:Mitsubishi Chemical Analytech公司製,「AQF-2100H」 IC(陰離子):Thermo Fisher Scientific公司製,「ICS-3000」The iodine adsorption amount of the first protective layer is preferably 25 wt% or less, more preferably 10 wt% or less, more preferably 6.0 wt% or less, and particularly preferably 3.0 wt% or less. The smaller the iodine adsorption amount, the better. If the iodine adsorption amount is within the above range, a polarizing plate with better durability can be obtained. The iodine adsorption amount can be measured by the following method. A protective layer (thickness 3µm) is formed on a substrate (PET film) to obtain a PET film with a protective layer. The obtained PET film with a protective layer is cut into 1 cm×1 cm (1 cm2 ) to make a sample, which is taken into a topside vial (20 mL capacity) and weighed. Then, a screw-capped bottle (1.5 mL capacity) containing 1 mL of iodine solution is also placed in the topside vial and tightly capped. Afterwards, the empty vial was placed in a desiccator at 65°C and heated for 6 hours, so that the gaseous I2 would be adsorbed on the sample. Afterwards, the sample was collected into a ceramic boat and burned using an automatic sample combustion device, and the generated gas was collected into 10 mL of absorption liquid. After collection, the absorption liquid was adjusted to 15 mL with pure water, and IC quantitative analysis was performed on the original solution or the appropriately diluted liquid. In addition, the iodine adsorption amount when the same measurement was performed only on PET film was almost 0. Based on the iodine weight obtained by IC quantitative analysis and the weight of the protective layer monomer ("weight of PET film with protective layer" - "weight of PET film"), the iodine adsorption amount (weight %) was calculated using the following formula. Iodine adsorption amount (weight %) = iodine weight obtained by IC quantitative analysis / weight of protective layer monomer × 100. The following measuring devices can be used for analysis, for example. [Measuring device] Automatic sample combustion device: Mitsubishi Chemical Analytech, "AQF-2100H" IC (anion): Thermo Fisher Scientific, "ICS-3000"

第1保護層(例如塗佈膜之固化物或光陽離子硬化物)可按目的包含有任意適當之添加劑。添加劑之具體例可舉:紫外線吸收劑;調平劑;受阻酚系、磷系、硫系等抗氧化劑;耐光穩定劑、耐候穩定劑、熱穩定劑等穩定劑;玻璃纖維、碳纖維等補強材;近紅外線吸收劑;參(二溴化丙基)磷酸酯、三烯丙基磷酸酯、氧化銻等阻燃劑;陰離子系、陽離子系、非離子系界面活性劑等抗靜電劑;無機顏料、有機顏料、染料等著色劑;有機填料或無機填料;樹脂改質劑;有機填充劑或無機填充劑;塑化劑;滑劑;抗靜電劑;阻燃劑等。添加劑可於樹脂聚合時添加,亦可於保護層形成時添加。添加劑之種類、數量、組合、添加量等可按目的適當設定。The first protective layer (e.g., a cured product of a coating film or a photo-cured product) may contain any appropriate additives according to the purpose. Specific examples of additives include: UV absorbers; levelers; antioxidants such as hindered phenols, phosphorus, and sulfur; stabilizers such as light stabilizers, weather stabilizers, and heat stabilizers; reinforcing materials such as glass fiber and carbon fiber; near-infrared absorbers; tris(dibromopropyl) phosphate, triallyl phosphate, and the like. Flame retardants such as esters and antimony oxide; antistatic agents such as anionic, cationic, and nonionic surfactants; colorants such as inorganic pigments, organic pigments, and dyes; organic or inorganic fillers; resin modifiers; organic or inorganic fillers; plasticizers; lubricants; antistatic agents; and flame retardants. Additives can be added during resin polymerization or during the formation of the protective layer. The type, amount, combination, and dosage of additives can be appropriately determined based on the intended purpose.

A-5.第2保護層 在一實施形態中,第2保護層係以可作為偏光件之保護層使用之任意適當的薄膜形成。作為成為該薄膜之主成分的材料之具體例,可舉三醋酸纖維素(TAC)等之纖維素系樹脂、或聚酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降莰烯系、聚烯烴系、(甲基)丙烯酸系及乙酸酯系等之透明樹脂等。又,亦可舉(甲基)丙烯酸系、胺甲酸酯系、(甲基)丙烯酸胺甲酸酯系、環氧系、聚矽氧系等之熱硬化型樹脂或紫外線硬化型樹脂等。其他還可舉例如矽氧烷系聚合物等玻璃質系聚合物。本實施形態之第2保護層的厚度宜為5µm~80µm,較宜為5µm~40µm,更宜為5µm~25µm。A-5. Second Protective Layer In one embodiment, the second protective layer is formed from any suitable film that can be used as a protective layer for a polarizer. Specific examples of the material constituting the main component of this film include cellulose resins such as triacetate cellulose (TAC), or transparent resins such as polyesters, polyvinyl alcohols, polycarbonates, polyamides, polyimides, polyether sulfones, polysulfones, polystyrenes, polynorbornenes, polyolefins, (meth)acrylics, and acetates. Other examples include thermosetting or UV-curing resins such as (meth)acrylics, urethanes, (meth)acrylic urethanes, epoxies, and silicones. Other examples include glassy polymers such as silicone polymers. The thickness of the second protective layer in this embodiment is preferably 5µm to 80µm, more preferably 5µm to 40µm, and even more preferably 5µm to 25µm.

在另一實施形態中,第2保護層可為樹脂溶液之塗佈膜的固化物,亦可為硬化型樹脂之硬化物(例如光陽離子硬化物)。針對本實施形態之第2保護層,可適用與第1保護層相同之說明。In another embodiment, the second protective layer can be a cured product of a coating of a resin solution, or a cured product of a curable resin (e.g., a photo-curable product). The same description as for the first protective layer applies to the second protective layer of this embodiment.

A-6.其他層 保護層(代表上為第1保護層)之偏光件側亦可形成有易接著層。易接著層例如包含水系聚胺甲酸酯與㗁唑啉系交聯劑。藉由形成所述易接著層,可提升保護層與偏光件之密著性。又,保護層(代表上為第1保護層)之與偏光件相反之側亦可形成有硬塗層。此外,在形成硬塗層時,可以使保護層(例如塗佈膜之固化物)之厚度與硬塗層之厚度合計為10µm以下、宜為7µm以下、更宜為5µm以下之方式來形成硬塗層。硬塗層可形成於視辨側保護層之視辨側。當形成易接著層及硬塗層兩者時,代表上該等可分別形成於保護層之不同側。A-6. Other Layers A highly adhesive layer may be formed on the polarizer side of the protective layer (typically, the first protective layer). The adhesive layer may, for example, comprise a water-based polyurethane and an oxazoline-based crosslinker. Forming this adhesive layer improves the adhesion between the protective layer and the polarizer. Furthermore, a hard coat layer may be formed on the side of the protective layer (typically, the first protective layer) opposite the polarizer. The hard coat layer may be formed such that the combined thickness of the protective layer (e.g., a cured coating) and the hard coat layer is no greater than 10µm, preferably no greater than 7µm, and more preferably no greater than 5µm. The hard coat layer can be formed on the visible side of the protective layer. When both the easy-adhesion layer and the hard coat layer are formed, they can be formed on different sides of the protective layer.

B.附相位差層之偏光板 B-1.附相位差層之偏光板之整體構成 圖3係本發明一實施形態之附相位差層之偏光板的概略截面圖。本實施形態之附相位差層之偏光板200a具有偏光板100與相位差層110,該偏光板100具有偏光件10與配置於其一側之第1保護層20,而該相位差層110配置於偏光件10之與配置有第1保護層20之側的相反側。附相位差層之偏光板200a中,相位差層110亦可作為偏光件10之保護層發揮功能。相位差層110代表上係隔著接著層(未圖示)積層於偏光板100上。接著層為接著劑層或黏著劑層,而由重工性等觀點來看宜為黏著劑層(例如丙烯酸系黏著劑層)。雖未圖示,但偏光板100亦可因應需要於偏光件10之相位差層110側具有第2保護層。B. Polarizing Plate with Retardation Layer B-1. Overall Structure of Polarizing Plate with Retardation Layer Figure 3 is a schematic cross-sectional view of a polarizing plate with retardation layer according to one embodiment of the present invention. The polarizing plate with retardation layer 200a of this embodiment comprises a polarizing plate 100 and a retardation layer 110. The polarizing plate 100 comprises a polarizer 10 and a first protective layer 20 disposed on one side thereof. The retardation layer 110 is disposed on the side of the polarizer 10 opposite to the side on which the first protective layer 20 is disposed. In the polarizing plate with retardation layer 200a, the retardation layer 110 also functions as a protective layer for the polarizer 10. The phase shift layer 110 is typically laminated onto the polarizing plate 100 via a bonding layer (not shown). The bonding layer is a bonding agent layer or adhesive layer, and an adhesive layer (e.g., an acrylic adhesive layer) is preferred for workability. Although not shown, the polarizing plate 100 may also include a second protective layer on the phase shift layer 110 side of the polarizer 10 as needed.

如圖4所示,另一實施形態之附相位差層之偏光板200b中,亦可設有另一相位差層120以及/或者導電層或附導電層之各向同性基材130。另一相位差層120以及導電層或附導電層之各向同性基材130代表上可設於相位差層110之外側(與偏光板100相反之側)。另一相位差層120代表上折射率特性展現nz>nx=ny之關係。另一相位差層120以及導電層或附導電層之各向同性基材130代表上係自相位差層110側起依序設置。另一相位差層120以及導電層或附導電層之各向同性基材130代表上係可因應需要設置之任意層,亦可省略任一者或兩者。此外,為求方便,有時會將相位差層110稱為第1相位差層,且將另一相位差層120稱為第2相位差層。另外,在可設置導電層或附導電層之各向同性基材時,附相位差層之偏光板可應用於在影像顯示單元(例如有機EL單元)與偏光板間組入有觸控感測器的所謂內觸控面板型輸入顯示裝置。As shown in Figure 4 , another embodiment of a polarizing plate with a phase shift layer 200b may also include another phase shift layer 120 and/or a conductive layer or an isotropic substrate with a conductive layer 130. The phase shift layer 120 and the conductive layer or the isotropic substrate with a conductive layer 130 may be positioned outside the phase shift layer 110 (on the side opposite the polarizing plate 100). The phase shift layer 120 exhibits a refractive index characteristic that satisfies the relationship nz>nx=ny. The phase shift layer 120 and the conductive layer or the isotropic substrate with a conductive layer 130 are positioned sequentially, starting from the phase shift layer 110 side. The other phase difference layer 120 and the conductive layer or the isotropic substrate 130 with a conductive layer represent arbitrary layers that can be provided as needed, and either or both can be omitted. For convenience, the phase difference layer 110 is sometimes referred to as the first phase difference layer, and the other phase difference layer 120 is sometimes referred to as the second phase difference layer. Furthermore, when a conductive layer or an isotropic substrate with a conductive layer is provided, the polarizer with a phase difference layer can be used in a so-called touch-sensitive panel input display device, in which a touch sensor is integrated between an image display unit (e.g., an organic EL unit) and the polarizer.

本發明實施形態中,第1相位差層110的Re(550)宜為100nm~190nm,Re(450)/Re(550)宜為0.8以上且小於1。並且,代表上第1相位差層110之慢軸與偏光件10之吸收軸形成之角度為40°~50°。In the embodiment of the present invention, the Re(550) of the first retardation layer 110 is preferably 100 nm to 190 nm, and the Re(450)/Re(550) is preferably greater than 0.8 and less than 1. Furthermore, the angle formed between the slow axis of the first retardation layer 110 and the absorption axis of the polarizer 10 is typically 40° to 50°.

上述實施形態可適當組合,亦可於上述實施形態之構成要素中加入本業界中顯明的變更。例如亦可將在第2相位差層120的外側設置附導電層之各向同性基材130的構成替換為在光學上等效之構成(例如第2相位差層與導電層之積層體)。The above embodiments may be combined as appropriate, and modifications apparent in the industry may be incorporated into the components of the above embodiments. For example, the configuration of the isotropic substrate 130 with a conductive layer disposed outside the second retardation layer 120 may be replaced with an optically equivalent configuration (e.g., a laminate of the second retardation layer and the conductive layer).

本發明實施形態之附相位差層之偏光板亦可更包含有其他相位差層。其他相位差層之光學特性(例如折射率特性、面內相位差、Nz係數、光彈性係數)、厚度、配置位置等可按目的適當設定。The polarizing plate with a retardation layer of the present invention may further include other retardation layers. The optical properties (e.g., refractive index, in-plane retardation, Nz coefficient, photoelastic coefficient), thickness, and placement of the other retardation layers can be appropriately configured according to the intended purpose.

B-2.偏光板 偏光板100係A項記載之偏光板。B-2. Polarizing Plate Polarizing plate 100 is the polarizing plate described in section A.

B-3.第1相位差層 第1相位差層110可因應目的具有任意適當之光學特性及/或機械特性。第1相位差層代表上具有慢軸。在一實施形態中,第1相位差層之慢軸與偏光件10之吸收軸形成之角度θ如上述,為40°~50°,宜為42°~48°,更宜為約45°。角度θ若在所述範圍內,如後述藉由將第1相位差層做成λ/4板,可獲得具有非常優異圓偏光特性(結果為非常優異的抗反射特性)的附相位差層之偏光板。B-3. First Retardation Layer The first retardation layer 110 can have any appropriate optical and/or mechanical properties depending on the intended purpose. The first retardation layer typically has a slow axis. In one embodiment, the angle θ formed between the slow axis of the first retardation layer and the absorption axis of the polarizer 10 is, as described above, 40° to 50°, preferably 42° to 48°, and more preferably approximately 45°. If the angle θ is within this range, by forming the first retardation layer into a λ/4 plate, as described later, a polarizing plate with a retardation layer having excellent circular polarization properties (resulting in excellent anti-reflection properties) can be obtained.

第1相位差層宜折射率特性展現nx>ny≧nz之關係。第1相位差層代表上係為了賦予偏光板抗反射特性而設置,在一實施形態中可作為λ/4板發揮功能。此時,第1相位差層的面內相位差Re(550)宜為100nm~190nm,較宜為110nm~170nm,更宜為130nm~160nm。此外,在此「ny=nz」不只ny與nz完全相同之情況,還包含實質上相同之情況。因此,在不損及本發明效果之範圍下可有成為ny<nz之情形。The first phase difference layer preferably exhibits a refractive index characteristic that satisfies the relationship nx>ny≧nz. The first phase difference layer is typically provided to impart antireflection properties to the polarizing plate, and in one embodiment, it can function as a λ/4 plate. In this case, the in-plane phase difference Re(550) of the first phase difference layer is preferably 100nm to 190nm, more preferably 110nm to 170nm, and even more preferably 130nm to 160nm. Furthermore, "ny=nz" here encompasses not only the case where ny and nz are completely identical, but also the case where they are substantially identical. Therefore, a situation where ny<nz is possible without compromising the effects of the present invention.

第1相位差層的Nz係數宜為0.9~3,較宜為0.9~2.5,更宜為0.9~1.5,尤宜為0.9~1.3。藉由滿足所述關係,在將所得附相位差層之偏光板使用於影像顯示裝置時,可達成非常優異之反射色相。The Nz coefficient of the first retardation layer is preferably 0.9-3, more preferably 0.9-2.5, further preferably 0.9-1.5, and particularly preferably 0.9-1.3. By satisfying these conditions, the resulting polarizing plate with a retardation layer can achieve excellent reflected hue when used in an image display device.

第1相位差層可展現相位差值隨測定光之波長變大的逆分散波長特性,亦可展現相位差值隨測定光之波長變小的正波長分散特性,又可展現相位差值幾乎不隨測定光之波長變化的平坦的波長分散特性。在一實施形態中,第1相位差層展現逆分散波長特性。此時,相位差層之Re(450)/Re(550)宜為0.8以上且小於1,較宜為0.8以上且0.95以下。若為所述構成,便可實現非常優異的抗反射特性。The first phase difference layer can exhibit an inverse dispersion wavelength characteristic in which the phase difference value increases with the wavelength of the measurement light, a positive wavelength dispersion characteristic in which the phase difference value decreases with the wavelength of the measurement light, or a flat wavelength dispersion characteristic in which the phase difference value hardly changes with the wavelength of the measurement light. In one embodiment, the first phase difference layer exhibits an inverse dispersion wavelength characteristic. In this case, the Re(450)/Re(550) ratio of the phase difference layer is preferably 0.8 or more and less than 1, more preferably 0.8 or more and 0.95 or less. With such a configuration, very excellent anti-reflection properties can be achieved.

第1相位差層包含光彈性係數的絕對值宜為2×10-11 m2 /N以下、較宜為2.0×10-13 m2 /N~1.5×10-11 m2 /N、更宜為1.0×10-12 m2 /N~1.2×10-11 m2 /N之樹脂。光彈性係數的絕對值若在所述範圍內,加熱時產生收縮應力時便不易發生相位差變化。結果,可良好地防止所得影像顯示裝置的熱不均。The first retardation layer preferably comprises a resin having an absolute photoelastic coefficient of 2× 10-11 m2 /N or less, more preferably between 2.0× 10-13 m2 /N and 1.5 ×10-11 m2 /N, and even more preferably between 1.0× 10-12 m2 /N and 1.2 ×10-11 m2 /N. When the absolute photoelastic coefficient falls within this range, retardation changes due to shrinkage stress during heating are less likely to occur. As a result, thermal nonuniformity in the resulting image display device can be effectively prevented.

第1相位差層代表上係以樹脂薄膜的延伸薄膜構成。在一實施形態中,第1相位差層之厚度宜為70µm以下,較宜為45µm~60µm。第1相位差層的厚度若在所述範圍內,便可良好地抑制加熱時之捲曲,同時可良好地調整貼合時的捲曲。又,如後述,在第1相位差層以聚碳酸酯系樹脂薄膜構成之實施形態中,第1相位差層之厚度宜為40μm以下,較宜為10μm~40µm,更宜為20μm~30µm。第1相位差層藉由以具有所述厚度之聚碳酸酯系樹脂薄膜構成,可抑制捲曲發生,並可有助於提升抗彎折耐久性及反射色相。The first phase difference layer is typically formed of a stretched film of a resin film. In one embodiment, the thickness of the first phase difference layer is preferably 70µm or less, more preferably 45µm to 60µm. If the thickness of the first phase difference layer is within the above range, curling during heating can be effectively suppressed, and curling during bonding can be effectively adjusted. Furthermore, as described later, in an embodiment in which the first phase difference layer is formed of a polycarbonate resin film, the thickness of the first phase difference layer is preferably 40μm or less, more preferably 10μm to 40μm, and more preferably 20μm to 30μm. By being formed of a polycarbonate resin film having the above thickness, the first phase difference layer can suppress curling and help improve anti-bending durability and reflective hue.

第1相位差層可以可滿足上述特性之任意適當之樹脂薄膜構成。所述樹脂之代表例可舉聚碳酸酯系樹脂、聚酯碳酸酯系樹脂、聚酯系樹脂、聚乙烯縮醛系樹脂、聚芳酯系樹脂、環狀烯烴系樹脂、纖維素系樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚苯乙烯系樹脂、丙烯酸系樹脂。該等樹脂可單獨使用,亦可組合(例如摻合、共聚)來使用。第1相位差層以顯示逆分散波長特性之樹脂薄膜構成時,可適宜使用聚碳酸酯系樹脂或聚酯碳酸酯系樹脂(以下有時僅稱作聚碳酸酯系樹脂)。The first retardation layer can be formed from any suitable resin film that satisfies the aforementioned properties. Representative examples of such resins include polycarbonate resins, polyester carbonate resins, polyester resins, polyvinyl acetal resins, polyarylate resins, cycloolefin resins, cellulose resins, polyvinyl alcohol resins, polyamide resins, polyimide resins, polyether resins, polystyrene resins, and acrylic resins. These resins can be used alone or in combination (e.g., by blending or copolymerization). When the first retardation layer is formed of a resin film exhibiting reverse dispersion wavelength characteristics, a polycarbonate resin or a polyester carbonate resin (hereinafter sometimes simply referred to as a polycarbonate resin) can be suitably used.

只要可獲得本發明之效果,上述聚碳酸酯系樹脂便可使用任意適當之聚碳酸酯系樹脂。例如,聚碳酸酯系樹脂包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元及源自選自於由脂環式二醇、脂環式二甲醇、二、三或聚乙二醇、以及伸烷基二醇或螺甘油所構成群組中之至少1種二羥基化合物之結構單元。聚碳酸酯系樹脂宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元、源自脂環式二甲醇之結構單元以及/或是源自二、三或聚乙二醇之結構單元;更宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元與源自二、三或聚乙二醇之結構單元。聚碳酸酯系樹脂亦可因應需要包含有源自其他二羥基化合物之結構單元。此外,本發明可適宜使用之聚碳酸酯系樹脂的詳細內容例如記載於日本專利特開2014-10291號公報、日本專利特開2014-26266號公報、日本專利特開2015-212816號公報、日本專利特開2015-212817號公報、日本專利特開2015-212818號公報中,而本說明書即援用該記載作為參考。Any appropriate polycarbonate resin can be used as the polycarbonate resin as long as the effects of the present invention are achieved. For example, the polycarbonate resin comprises structural units derived from a fluorene-based dihydroxy compound, structural units derived from an isosorbide-based dihydroxy compound, and structural units derived from at least one dihydroxy compound selected from the group consisting of alicyclic diols, alicyclic dimethanols, di-, tri- or polyethylene glycols, and alkylene glycols or spiroglycerol. The polycarbonate resin preferably includes structural units derived from fluorene-based dihydroxy compounds, structural units derived from isosorbide-based dihydroxy compounds, structural units derived from alicyclic dimethanols, and/or structural units derived from di-, tri-, or polyethylene glycol. More preferably, the polycarbonate resin includes structural units derived from fluorene-based dihydroxy compounds, structural units derived from isosorbide-based dihydroxy compounds, and structural units derived from di-, tri-, or polyethylene glycol. The polycarbonate resin may also include structural units derived from other dihydroxy compounds as needed. In addition, the details of the polycarbonate resin that can be suitably used in the present invention are described in, for example, Japanese Patent Publication No. 2014-10291, Japanese Patent Publication No. 2014-26266, Japanese Patent Publication No. 2015-212816, Japanese Patent Publication No. 2015-212817, and Japanese Patent Publication No. 2015-212818, and these descriptions are incorporated herein by reference.

前述聚碳酸酯系樹脂的玻璃轉移溫度宜為110℃以上且150℃以下,較宜為120℃以上且140℃以下。玻璃轉移溫度若過低,耐熱性有變差之傾向,而有在薄膜成形後造成尺寸變化之可能性,或有降低所得有機EL面板之影像品質的情況。玻璃轉移溫度若過高,有薄膜成形時之成形穩定性變差之情況,或有損及薄膜之透明性之情況。此外,玻璃轉移溫度可依循JIS K 7121(1987)求得。The glass transition temperature of the polycarbonate resin is preferably 110°C to 150°C, more preferably 120°C to 140°C. If the glass transition temperature is too low, heat resistance tends to deteriorate, potentially causing dimensional changes after film formation, or reducing the image quality of the resulting organic EL panel. If the glass transition temperature is too high, film forming stability may deteriorate or the transparency of the film may be compromised. The glass transition temperature can be determined in accordance with JIS K 7121 (1987).

前述聚碳酸酯系樹脂的分子量可以比濃黏度表示。比濃黏度係用二氯甲烷作為溶劑,將聚碳酸酯濃度精密調製成0.6g/dL後,在溫度20.0℃±0.1℃下用烏氏黏度管進行測定。比濃黏度的下限通常宜為0.30dL/g,較宜為0.35dL/g以上。比濃黏度的上限通常宜為1.20dL/g,較宜為1.00dL/g,更宜為0.80dL/g。比濃黏度若小於前述下限值,則有產生成形品之機械強度變小之問題的情形。另一方面,比濃黏度若大於前述上限值,則進行成形時之流動性會降低,而有產生生產性或成形性降低之問題的情形。The molecular weight of the aforementioned polycarbonate resin can be expressed as its concentrated viscosity. This viscosity is measured using an Ooalloy viscometer at 20.0°C ± 0.1°C using methylene chloride as a solvent, after precisely adjusting the polycarbonate concentration to 0.6 g/dL. The lower limit of the concentrated viscosity is generally preferably 0.30 dL/g, and more preferably 0.35 dL/g or higher. The upper limit of the concentrated viscosity is generally preferably 1.20 dL/g, more preferably 1.00 dL/g, and even more preferably 0.80 dL/g. If the concentrated viscosity is below the aforementioned lower limit, the mechanical strength of the molded product may be reduced. On the other hand, if the specific viscosity exceeds the upper limit, the fluidity during molding may decrease, which may cause problems in productivity or moldability.

聚碳酸酯系樹脂薄膜亦可使用市售薄膜。市售品之具體例可舉帝人公司製之商品名「PURE-ACE WR-S」、「PURE-ACE WR-W」、「PURE-ACE WR-M」、日東電工公司製之商品名「NRF」。Commercially available polycarbonate resin films may also be used. Specific examples of commercially available products include "PURE-ACE WR-S," "PURE-ACE WR-W," and "PURE-ACE WR-M" manufactured by Teijin Co., Ltd., and "NRF" manufactured by Nitto Denko Co., Ltd.

第1相位差層例如可藉由將由上述聚碳酸酯系樹脂形成之薄膜延伸而得。由聚碳酸酯系樹脂形成薄膜之方法可採用任意適當之成形加工法。具體例可舉:壓縮成形法、轉注成形法、射出成形法、擠製成形法、吹氣成形法、粉末成形法、FRP成形法、澆鑄塗敷法(例如流延法)、砑光成形法、熱壓法等。而宜為擠製成形法或澆鑄塗敷法。其係因可提高所得薄膜之平滑性,從而可獲得良好的光學均一性。成形條件可因應使用之樹脂的組成或種類、對相位差層所期望之特性等來適當設定。此外,如上述,聚碳酸酯系樹脂在市面上販售有很多薄膜製品,故可將該市售薄膜直接供於延伸處理。The first phase difference layer can be obtained, for example, by stretching a film formed from the above-mentioned polycarbonate resin. The method of forming a film from a polycarbonate resin can adopt any appropriate molding method. Specific examples include: compression molding, transfer molding, injection molding, extrusion molding, blow molding, powder molding, FRP molding, casting and coating (such as casting), calendering molding, hot pressing, etc. Extrusion molding or casting and coating is preferred. This is because the smoothness of the obtained film can be improved, thereby obtaining good optical uniformity. The molding conditions can be appropriately set according to the composition or type of the resin used, the desired properties of the phase difference layer, etc. Furthermore, as mentioned above, polycarbonate resins are widely available in the market as film products, and thus these commercially available films can be directly subjected to the stretching process.

樹脂薄膜(未延伸薄膜)的厚度可因應第1相位差層所期望的厚度、所期望的光學特性、後述延伸條件等設定成任意適當之值。宜為50µm~300µm。The thickness of the resin film (unstretched film) can be set to any appropriate value depending on the desired thickness of the first retardation layer, the desired optical properties, the stretching conditions described below, etc. It is preferably 50µm to 300µm.

上述延伸可採用任意適當之延伸方法、延伸條件(例如延伸溫度、延伸倍率、延伸方向)。具體而言,可單獨使用自由端延伸、固定端延伸、自由端收縮、固定端收縮等各種延伸方法,亦可同時或逐次使用。關於延伸方向,亦可沿長度方向、寬度方向、厚度方向、斜向等各種方向或維度進行。延伸的溫度相對於樹脂薄膜的玻璃轉移溫度(Tg)宜為Tg-30℃~Tg+60℃,較宜為Tg-10℃~Tg+50℃。The above-mentioned stretching can adopt any appropriate stretching method and stretching conditions (such as stretching temperature, stretching ratio, stretching direction). Specifically, various stretching methods such as free end stretching, fixed end stretching, free end shrinking, fixed end shrinking, etc. can be used separately, or they can be used simultaneously or successively. Regarding the stretching direction, it can also be carried out along various directions or dimensions such as the length direction, width direction, thickness direction, and oblique direction. The stretching temperature is preferably Tg-30℃~Tg+60℃ relative to the glass transition temperature (Tg) of the resin film, and more preferably Tg-10℃~Tg+50℃.

藉由適當選擇上述延伸方法、延伸條件,可獲得具有上述所期望之光學特性(例如折射率特性、面內相位差、Nz係數)的相位差薄膜。By appropriately selecting the stretching method and stretching conditions, a retardation film having the desired optical properties (such as refractive index properties, in-plane retardation, and Nz coefficient) can be obtained.

在一實施形態中,相位差薄膜可藉由將樹脂薄膜進行單軸延伸或固定端單軸延伸來製作。固定端單軸延伸之具體例,可舉一邊使樹脂薄膜在長邊方向上移動,一邊往寬度方向(橫向)進行延伸之方法。延伸倍率宜為1.1倍~3.5倍。In one embodiment, the retardation film can be produced by uniaxially stretching a resin film or by fixed-end uniaxial stretching. A specific example of fixed-end uniaxial stretching is stretching the resin film in its widthwise (lateral) direction while moving it in its longitudinal direction. The stretching ratio is preferably 1.1x to 3.5x.

在另一實施形態中,相位差薄膜可藉由將長條狀樹脂薄膜往相對於長邊方向呈上述角度θ之方向連續進行斜向延伸來製作。藉由採用斜向延伸,可獲得相對於薄膜之長邊方向具有角度θ之定向角(於角度θ之方向上具有慢軸)的長條狀延伸薄膜,例如在與偏光件積層時,可進行捲對捲,從而可簡化製造步驟。此外,角度θ可為附相位差層之偏光板中偏光件之吸收軸與相位差層之慢軸形成之角度。角度θ如上述,宜為40°~50°,較宜為42°~48°,更宜為約45°。In another embodiment, the phase difference film can be produced by continuously stretching a long strip of resin film obliquely in the direction of the aforementioned angle θ relative to the long side direction. By adopting the oblique stretching, a long strip of stretched film having an orientation angle of angle θ relative to the long side direction of the film (having a slow axis in the direction of angle θ) can be obtained. For example, when laminating with a polarizer, a roll-to-roll process can be performed, thereby simplifying the manufacturing steps. In addition, the angle θ can be the angle formed by the absorption axis of the polarizer and the slow axis of the phase difference layer in the polarizing plate with the phase difference layer. As mentioned above, the angle θ is preferably 40°~50°, more preferably 42°~48°, and more preferably about 45°.

斜向延伸所用延伸機可舉拉幅式延伸機,其係例如對橫向及/或縱向附加左右相異之速度的輸送力或是拉伸力或拉抽力者。拉幅式延伸機有橫式單軸延伸機、同時雙軸延伸機等,只要可將長條狀樹脂薄膜連續地進行斜向延伸,便可使用任意適當的延伸機。The stretching machine used for oblique stretching can be a tenter-type stretching machine, which applies conveying forces, stretching forces, or pulling forces at different speeds in the transverse and/or longitudinal directions. Tenter-type stretching machines include transverse uniaxial stretching machines and simultaneous biaxial stretching machines. Any suitable stretching machine can be used as long as it can continuously and obliquely stretch a long strip of resin film.

藉由將上述延伸機中之左右速度分別適當控制,可獲得具有上述所期望之面內相位差且於上述所期望之方向上具有慢軸之相位差層(實質上為長條狀相位差薄膜)。By appropriately controlling the left and right speeds in the stretching machine, a phase difference layer (essentially a long strip of phase difference film) having the desired in-plane phase difference and a slow axis in the desired direction can be obtained.

上述薄膜的延伸溫度可因應對相位差層所期望之面內相位差值及厚度、所使用之樹脂的種類、所使用之薄膜的厚度、延伸倍率等變化。具體而言,延伸溫度宜為Tg-30℃~Tg+30℃,更宜為Tg-15℃~Tg+15℃,最宜為Tg-10℃~Tg+10℃。藉由以所述溫度延伸,可獲得具有適於本發明之特性的第1相位差層。此外,Tg係薄膜之構成材料的玻璃轉移溫度。The stretching temperature of the film can vary depending on the desired in-plane retardation value and thickness of the retardation layer, the type of resin used, the film thickness, the stretching ratio, and other factors. Specifically, the stretching temperature is preferably between Tg-30°C and Tg+30°C, more preferably between Tg-15°C and Tg+15°C, and most preferably between Tg-10°C and Tg+10°C. By stretching at these temperatures, a first retardation layer having properties suitable for the present invention can be obtained. Tg is the glass transition temperature of the film's constituent material.

B-4.第2相位差層 第2相位差層如上述,可為折射率特性展現nz>nx=ny之關係的所謂正C板(Positive C-plate)。藉由使用正C板作為第2相位差層,可良好地防止斜向之反射,而可使抗反射功能廣視角化。此時,第2相位差層的厚度方向的相位差Rth(550)宜為-50nm~-300nm,較宜為-70nm~-250nm,更宜為-90nm~-200nm,尤宜為-100nm~-180nm。在此,「nx=ny」不僅包含nx與ny嚴格上相等之情況,還包含nx與ny實質上相等之情況。即,第2相位差層的面內相位差Re(550)可小於10nm。B-4. Second Retardation Layer As described above, the second retardation layer can be a so-called positive C-plate, whose refractive index characteristics exhibit the relationship nz>nx=ny. Using a positive C-plate as the second retardation layer effectively prevents oblique reflections, thereby enhancing the anti-reflection function over a wide viewing angle. In this case, the thickness-direction retardation Rth(550) of the second retardation layer is preferably -50nm to -300nm, more preferably -70nm to -250nm, more preferably -90nm to -200nm, and most preferably -100nm to -180nm. Here, "nx=ny" includes not only the case where nx and ny are strictly equal, but also the case where nx and ny are substantially equal. That is, the in-plane retardation Re(550) of the second retardation layer can be smaller than 10 nm.

具有nz>nx=ny之折射率特性的第2相位差層可以任意適當之材料形成。第2相位差層宜由包含固定為垂面排列定向之液晶材料的薄膜構成。可使垂面排列定向的液晶材料(液晶化合物)可為液晶單體亦可為液晶聚合物。該液晶化合物及該相位差層之形成方法的具體例可舉日本專利特開2002-333642號公報中段落[0020]~[0028]記載之液晶化合物及該相位差層之形成方法。此時,第2相位差層之厚度宜為0.5μm~10µm,較宜為0.5μm~8µm,更宜為0.5μm~5µm。The second phase difference layer having the refractive index characteristic of nz>nx=ny can be formed of any appropriate material. The second phase difference layer is preferably composed of a thin film containing a liquid crystal material fixed in a homeotropic alignment. The liquid crystal material (liquid crystal compound) that can achieve homeotropic alignment can be a liquid crystal monomer or a liquid crystal polymer. Specific examples of the liquid crystal compound and the method for forming the phase difference layer include the liquid crystal compound and the method for forming the phase difference layer described in paragraphs [0020] to [0028] of Japanese Patent Gazette No. 2002-333642. At this time, the thickness of the second phase difference layer is preferably 0.5μm~10µm, more preferably 0.5μm~8µm, and even more preferably 0.5μm~5µm.

B-5.導電層或附導電層之各向同性基材 導電層可利用任意適當之成膜方法(例如真空蒸鍍法、濺鍍法、CVD法、離子鍍法、噴霧法等),將金屬氧化物膜成膜於任意適當之基材上來形成。金屬氧化物可舉例如氧化銦、氧化錫、氧化鋅、銦錫複合氧化物、錫銻複合氧化物、鋅鋁複合氧化物、銦鋅複合氧化物。其中宜為銦錫複合氧化物(ITO)。B-5. Conductive Layer or Isotropic Substrate with Conductive Layer The conductive layer can be formed by depositing a metal oxide film on any suitable substrate using any suitable film-forming method (e.g., vacuum evaporation, sputtering, CVD, ion plating, spraying, etc.). Examples of the metal oxide include indium oxide, tin oxide, zinc oxide, indium-tin composite oxide, tin-antimony composite oxide, zinc-aluminum composite oxide, and indium-zinc composite oxide. Indium-tin composite oxide (ITO) is particularly preferred.

當導電層包含金屬氧化物時,該導電層之厚度宜為50nm以下,較宜為35nm以下。導電層之厚度的下限宜為10nm。When the conductive layer comprises a metal oxide, the thickness of the conductive layer is preferably 50 nm or less, more preferably 35 nm or less. The lower limit of the thickness of the conductive layer is preferably 10 nm.

導電層可由上述基材轉印至第1相位差層(或若有第2相位差層存在則為第2相位差層)而以導電層單獨作為附相位差層之偏光板的構成層,亦可以導電層與基材之積層體(附導電層之基材)的形式積層於第1相位差層(或若有第2相位差層存在則為第2相位差層)。宜為上述基材在光學上為各向同性,因此導電層可作為附導電層之各向同性基材用於附相位差層之偏光板。The conductive layer can be transferred from the substrate to the first phase difference layer (or the second phase difference layer if a second phase difference layer is present), and the conductive layer can serve alone as a constituent layer of the polarizing plate with phase difference layer. Alternatively, the conductive layer and the substrate can be laminated onto the first phase difference layer (or the second phase difference layer if a second phase difference layer is present) in the form of a laminate (substrate with conductive layer). Preferably, the substrate is optically isotropic, so the conductive layer can serve as an isotropic substrate with a conductive layer for the polarizing plate with phase difference layer.

在光學上為各向同性的基材(各向同性基材)可採用任意適當之各向同性基材。構成各向同性基材之材料可舉例如以降莰烯系樹脂或烯烴系樹脂等不具有共軛系之樹脂為主骨架的材料、於丙烯酸系樹脂之主鏈中具有內酯環或戊二醯亞胺環等環狀結構的材料等。若使用所述材料,便可於形成各向同性基材時將伴隨分子鏈定向而展現之相位差抑制得較小。各向同性基材之厚度宜為50µm以下,較宜為35µm以下。各向同性基材之厚度的下限例如為20μm。Any suitable isotropic substrate can be used as the optically isotropic substrate. Examples of materials constituting the isotropic substrate include materials having a main skeleton composed of resins without a conjugated system, such as norbornene-based resins or olefin-based resins, and materials having a cyclic structure, such as a lactone ring or a glutarimido ring, in the main chain of an acrylic resin. Using such materials can minimize the phase difference exhibited by molecular chain orientation when forming the isotropic substrate. The thickness of the isotropic substrate is preferably 50µm or less, more preferably 35µm or less. The lower limit of the thickness of the isotropic substrate is, for example, 20µm.

上述導電層及/或上述附導電層之各向同性基材的導電層可因應需要進行圖案化。藉由圖案化可形成導通部與絕緣部。結果可形成電極。電極可作為用以感測對觸控面板之接觸的觸控感測電極發揮功能。圖案化方法可採用任意適當之方法。圖案化方法的具體例可舉濕式蝕刻法、網版印刷法。The conductive layer and/or the conductive layer of the isotropic substrate with the conductive layer can be patterned as needed. Patterning can form conductive and insulating portions. This results in electrodes, which can function as touch sensing electrodes for detecting contact with the touch panel. Any appropriate patterning method can be used. Specific examples include wet etching and screen printing.

C.影像顯示裝置 上述偏光板或附相位差層之偏光板可應用於影像顯示裝置。因此,本發明包含具備上述偏光板或附相位差層之偏光板的影像顯示裝置。影像顯示裝置的代表例可舉液晶顯示裝置、電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)。本發明實施形態之影像顯示裝置於其視辨側具備上述A項記載之偏光板或B項記載之附相位差層之偏光板。附相位差層之偏光板係以使相位差層成為影像顯示單元(例如液晶單元、有機EL單元、無機EL單元)側之方式(使偏光件成為視辨側)積層。在一實施形態中,影像顯示裝置具有彎曲的形狀(實質上為彎曲的顯示畫面),及/或可撓曲或彎折。在所述影像顯示裝置中,本發明附相位差層之偏光板的效果更顯著。C. Image Display Device The aforementioned polarizing plate or polarizing plate with a phase difference layer can be applied to an image display device. Therefore, the present invention includes an image display device having the aforementioned polarizing plate or polarizing plate with a phase difference layer. Representative examples of image display devices include liquid crystal display devices and electroluminescent (EL) display devices (e.g., organic EL display devices, inorganic EL display devices). The image display device of an embodiment of the present invention has the polarizing plate described in item A or the polarizing plate with a phase difference layer described in item B on its viewing side. The polarizing plate with a phase difference layer is laminated such that the phase difference layer is on the side of an image display unit (e.g., a liquid crystal unit, an organic EL unit, an inorganic EL unit) (such that the polarizer is on the viewing side). In one embodiment, the image display device has a curved shape (essentially a curved display screen) and/or is bendable or foldable. In such an image display device, the effect of the polarizing plate with a phase difference layer of the present invention is more significant.

實施例 以下,以實施例來具體說明本發明,惟本發明不受該等實施例所限。各特性之測定方法如以下所述。此外,只要無特別註記,實施例中之「份」及「%」即為重量基準。EXAMPLES The present invention is described below using examples, but the present invention is not limited to these examples. The measurement methods for various properties are described below. In addition, unless otherwise noted, "parts" and "%" in the examples are by weight.

(1)厚度 偏光件之厚度係使用干涉膜厚計(大塚電子公司製,製品名「MCPD-3000」)進行測定。厚度計算所用之計算波長範圍係在400nm~500nm下,且折射率設為1.53。又,保護層之厚度係使用干涉膜厚計(大塚電子公司製,製品名「MCPD-3000」),適當選擇計算波長範圍及折射率進行測定。易接著層之厚度係由掃描型電子顯微鏡(SEM)觀察求得。大於10μm的厚度係使用數位測微器(Anritsu公司製,產品名「KC-351C」)進行測定。 (2)PVA之定向函數 針對從實施例及比較例所用偏光件/熱塑性樹脂基材之積層體剝離去除樹脂基材後的偏光件(偏光件單體),對於與已剝離樹脂基材之面為相反側的面,使用傅立葉轉換紅外線分光光度計(FT-IR)(Perkin Elmer公司製,商品名:「Frontier」),並以經偏光之紅外線作為測定光,進行偏光件表面之衰減全反射分光(ATR:attenuated total reflection)測定。用以使偏光件密著之微晶係使用鍺,並將測定光之入射角設為45°入射。定向函數之算出依以下程序進行。欲使入射之經偏光的紅外線(測定光)係設為朝使鍺結晶之試樣密著的面平行振動的偏光(s偏光),並在將偏光件之延伸方向相對於測定光之偏光方向作垂直(⊥)及平行(//)配置的狀態下測定各個吸光度光譜。從所得吸光度光譜算出以(3330cm-1 強度)為參考之(2941cm-1 強度)I。I 係從將偏光件之延伸方向相對於測定光之偏光方向作垂直(⊥)配置時所得吸光度光譜而獲得的(2941cm-1 強度)/(3330cm-1 強度)。又,I// 係從將偏光件之延伸方向相對於測定光之偏光方向作平行(//)配置時所得吸光度光譜而獲得的(2941cm-1 強度)/(3330cm-1 強度)。於此,(2941cm-1 強度)係吸光度光譜底部之將2770cm-1 與2990cm-1 作為基線時之2941cm-1 的吸光度,(3330cm-1 強度)係將2990cm-1 與3650cm-1 作為基線時之3330cm-1 的吸光度。用所得I 及I// ,依式1算出定向函數f。另外,f=1時為完全定向,f=0時為無規。又,可謂2941cm-1 之波峰係起因於偏光件中之PVA主鏈(-CH2 -)之振動的吸收。又,可謂3330cm-1 之波峰係起因於PVA之羥基之振動的吸收。 (式1)f=(3<cos2 θ>-1)/2 =(1-D)/[c(2D+1)] 惟, 以c=(3cos2 β-1)/2,如上述使用2941cm-1 時,β=90°⇒f=-2×(1-D)/(2D+1)。 θ:分子鏈相對於延伸方向之角度 β:躍遷偶極矩相對於分子鏈軸之角度 D=(I )/(I// ) I :測定光之偏光方向與偏光件之延伸方向呈垂直時之吸收強度 I// :測定光之偏光方向與偏光件之延伸方向呈平行時之吸收強度 (3)PVA之面內相位差(Re) 針對從實施例及比較例中所得偏光件/熱塑性樹脂基材之積層體剝離去除了樹脂基材後的偏光件(偏光件單體),使用相位差測定裝置(王子計測機器公司製 製品名「KOBRA-31X100/IR」)評估在波長1000nm下之PVA的面內相位差(Rpva)(根據所說明之原理,係從在波長1000nm下之總面內相位差減去碘之面內相位差(Ri)所得之數值)。吸收端波長設為600nm。 (4)PVA之雙折射(Δn) 將上述(3)測定之PVA的面內相位差除以偏光件之厚度,藉此算出PVA之雙折射(Δn)。 (5)穿刺強度 從實施例及比較例所用偏光件/樹脂基材之積層體剝離偏光件,並載置於裝設有針之壓縮試驗機(KATO TECH CO., LTD.製,製品名「NDG5」針貫通力測定規格),在室溫(23℃±3℃)環境下,以穿刺速度0.33cm/秒穿刺,並將偏光件破裂時之強度作為斷裂強度(穿刺強度)。評估值係測定10個試料片之斷裂強度並使用其平均值。此外,針係使用前端徑1mmφ、0.5R者。針對要測定之偏光件,將具有直徑11mm之圓形開口部的夾具從偏光件兩面夾住固定後,對開口部之中央部穿刺針進行試驗。 (6)裂痕 將實施例及比較例中所得偏光板或附相位差層之偏光板裁切成100mm×100mm之尺寸。將裁切出之試樣以保護層成為外側之方式透過厚度15µm之丙烯酸系黏著劑層貼附於玻璃板(厚度1.1 mm)。將貼附於玻璃板之試樣放置於85℃之烘箱內120小時後,藉由目視以肉眼確認偏光件之吸收軸方向(MD方向)有無裂痕發生。使用3片附相位差層之偏光板進行該評估,而將即便有1片發生裂痕者評估為「有發生」,將3片全部未發生裂痕者評估為「無」。 (7)單體透射率及偏光度 針對從實施例及比較例中所得偏光件/熱塑性樹脂基材之積層體剝離去除樹脂基材後的偏光件(偏光件單體),使用紫外線可見光分光光度計(日本分光公司製「V-7100」)測定單體透射率Ts、平行透射率Tp、正交透射率Tc。該等Ts、Tp及Tc係以JIS Z8701之2度視野(C光源)進行測定並進行視感度校正所得之Y值。從所得Tp及Tc利用下述式求得偏光度P。 偏光度P(%)={(Tp-Tc)/(Tp+Tc)}1 /2 ×100 另,分光光度計亦可使用大塚電子公司製「LPF-200」等進行同等之測定,不論在使用何種分光光度計之情況下皆可確認有獲得同等的測定結果。 (8)加濕耐久性 從實施例及比較例所得偏光板或附相位差層之偏光板裁切出試驗片(50mm×50mm),該試驗片形成分別與垂直於偏光件之吸收軸方向之方向及吸收軸方向相對向之兩邊。以使保護層成為外側利用黏著劑將試驗片貼合於無鹼玻璃板,而製成試驗試樣,對該試驗試樣使用紫外線可見光分光光度計(日本分光公司製,製品名「V7100」),以與(7)相同方式測定單體透射率(Ts)、平行透射率(Tp)及正交透射率(Tc),求出偏光度(P)。此時,使測定光從保護層側入射。 接著,將該試驗試樣放置於60℃及95%RH之烘箱內500小時進行加熱加濕後(濕熱試驗),從濕熱試驗前之偏光度P0 及濕熱試驗後之偏光度P500 用下述式求出偏光度之變化量ΔP。 ΔP(%)=P500 -P0 從所得ΔP之結果按以下基準進行評估。 佳:ΔP為-5.0%~0% 不佳:ΔP小於-5.0%或發生褪色 (9)保護層之軟化溫度 依與各實施例及比較例之保護層之形成相同方式,而於比較例1製出之偏光件(總延伸倍率:5.5倍)之單面形成保護層(厚度:3µm)。針對所得偏光板[保護層/偏光件]之保護層表面進行局部熱分析(奈米TA測定),算出保護層之軟化溫度。測定裝置及測定條件如下述。 測定裝置:Hitachi High-Tech Science Co.製,製品名「AFM5300E//Nano-TA2」 測定模式:接觸模式 探針:AN2-200 測定面積:8µm□ 掃描 測定氣體環境:大氣壓 (10)碘吸附量 依與各實施例及比較例中之保護層之形成相同方式,於PET薄膜之單面形成保護層(厚度:3µm)。將所得附保護層之PET薄膜裁切成1cm×1cm(1cm2 )做成試料,採取到頂空小瓶(20mL容量)並秤量。接著,將裝有碘溶液1mL(碘濃度1重量%、碘化鉀濃度7重量%)的螺口瓶(1.5mL容量)亦放入該頂空小瓶中並蓋緊。之後,將頂空小瓶放入65℃之乾燥機中加溫6小時(藉此,氣體狀態之I2 會吸附於試料上)。之後,將試料採取到陶瓷舟皿並使用自動試料燃燒裝置使其燃燒,再將所產生之氣體採集至吸收液10mL中。收集後,將該吸收液以純水調製成15mL,並針對原液或適當稀釋後之液體進行IC定量分析。此外,僅以PET薄膜進行相同測定後之碘吸附量幾乎為0,故根據經IC定量分析所得碘重量與保護層單體之重量(「附保護層之PET薄膜之重量」-「PET薄膜之重量」),從以下式算出碘吸附量(重量%)。 碘吸附量(重量%)=IC定量分析所得碘重量/保護層單體之重量×100 又,測定裝置如下。 [測定裝置] 自動試料燃燒裝置:Mitsubishi Chemical Analytech公司製,「AQF-2100H」 IC(陰離子):Thermo Fisher Scientific公司製,「ICS-3000」(1) Thickness The thickness of the polarizer was measured using an interference film thickness meter (manufactured by Otsuka Electronics Co., Ltd., product name "MCPD-3000"). The wavelength range used for thickness calculation is 400nm~500nm, and the refractive index is set to 1.53. In addition, the thickness of the protective layer was measured using an interference film thickness meter (manufactured by Otsuka Electronics Co., Ltd., product name "MCPD-3000"), with the calculation wavelength range and refractive index appropriately selected. The thickness of the easy-to-bond layer was obtained by observation using a scanning electron microscope (SEM). Thicknesses greater than 10μm were measured using a digital micrometer (manufactured by Anritsu Co., Ltd., product name "KC-351C"). (2) Orientation Function of PVA: For the polarizer (polarizer unit) obtained by stripping the resin substrate from the polarizer/thermoplastic resin substrate laminate used in the Examples and Comparative Examples, attenuated total reflection (ATR) spectroscopy of the polarizer surface was performed using a Fourier transform infrared spectrophotometer (FT-IR) (manufactured by Perkin Elmer, trade name: "Frontier"), using polarized infrared light as the measurement light. Germanium was used as the microcrystal for adhering the polarizer, and the incident angle of the measurement light was set to 45°. The orientation function was calculated according to the following procedure. The incident polarized infrared light (measurement light) was set to oscillate parallel to the surface of the germanium crystal sample in close contact (s-polarization). Absorbance spectra were measured with the polarizer positioned perpendicular (⊥) and parallel (//) to the polarization direction of the measurement light. From the resulting absorbance spectra, the intensity at (2941 cm -1 ) was calculated, using the intensity at (3330 cm-1) as a reference. I⊥ is the ratio (2941 cm - 1)/(3330 cm - 1 ) obtained from the absorbance spectrum obtained when the polarizer was positioned perpendicular (⊥) to the polarization direction of the measurement light. Furthermore, I // is the (2941 cm -1 intensity) / (3330 cm -1 intensity) obtained from the absorbance spectrum obtained when the polarizer's extension direction is parallel (//) to the polarization direction of the measurement light. Here, (2941 cm -1 intensity) refers to the absorbance at 2941 cm -1 at the bottom of the absorbance spectrum, using 2770 cm -1 and 2990 cm -1 as baselines, and (3330 cm -1 intensity) refers to the absorbance at 3330 cm -1 using 2990 cm -1 and 3650 cm -1 as baselines. Using the obtained I and I // , the orientation function f is calculated according to Equation 1. f = 1 indicates perfect orientation, and f = 0 indicates random orientation. The peak at 2941 cm -1 can be attributed to the absorption of the PVA main chain ( -CH2- ) vibration in the polarizer. Furthermore, the peak at 3330 cm -1 can be attributed to the absorption of the hydroxyl group vibration in PVA. (Equation 1) f = (3 < cos2θ > -1)/2 = (1-D)/[c(2D+1)] However, using c = ( 3cos2β -1)/2, as in the case of 2941 cm -1 , β = 90° ⇒ f = -2 × (1-D)/(2D+1). θ: Angle of the molecular chain relative to the extension direction β: Angle of the transition dipole moment relative to the molecular chain axis D = (I ) / (I // ) I : Absorption intensity when the polarization direction of the measured light is perpendicular to the extension direction of the polarizer I // : Absorption intensity when the polarization direction of the measured light is parallel to the extension direction of the polarizer (3) In-plane phase difference (Re) of PVA The polarizer (polarizer unit) obtained by removing the resin substrate from the polarizer/thermoplastic resin laminate obtained in the embodiment and the comparative example was evaluated for the in-plane phase difference (Rpva) of PVA at a wavelength of 1000 nm using a phase difference measuring device (manufactured by Oji Scientific Instruments, Ltd., under the name "KOBRA-31X100/IR"). (According to the principle described, the value obtained by subtracting the in-plane phase difference (Ri) of iodine from the total in-plane phase difference at a wavelength of 1000 nm) was obtained. The absorption end wavelength was set to 600 nm. (4) Birefringence (Δn) of PVA The birefringence (Δn) of PVA was calculated by dividing the in-plane phase difference of PVA measured in (3) above by the thickness of the polarizer. (5) Puncture Strength The polarizer was peeled off from the polarizer/resin substrate laminate used in the Examples and Comparative Examples and placed on a compression tester equipped with a needle (manufactured by KATO TECH CO., LTD., product name "NDG5" needle penetration test specification). At room temperature (23°C ± 3°C), the polarizer was punctured at a puncture speed of 0.33 cm/s. The strength at which the polarizer broke was used as the fracture strength (puncture strength). The evaluation value was the fracture strength of 10 sample pieces and the average value was used. In addition, the needle used had a tip diameter of 1 mmφ and a 0.5R. For the polarizer to be measured, a clamp with a circular opening of 11 mm in diameter is clamped and fixed from both sides of the polarizer, and then a needle is inserted into the center of the opening for testing. (6) Cracks The polarizer or polarizer with a phase difference layer obtained in the embodiment and the comparative example is cut into a size of 100 mm × 100 mm. The cut sample is attached to a glass plate (thickness 1.1 mm) through an acrylic adhesive layer of 15 μm in thickness with the protective layer on the outside. The sample attached to the glass plate is placed in an oven at 85°C for 120 hours, and then visually checked to see if there are any cracks in the absorption axis direction (MD direction) of the polarizer. The evaluation was performed using three polarizing plates with phase difference layers. If even one of the plates had cracks, it was evaluated as "cracked", and if all three plates had no cracks, it was evaluated as "none". (7) Single body transmittance and polarization degree The single body transmittance Ts, parallel transmittance Tp, and orthogonal transmittance Tc of the polarizer (polarizer single body) obtained from the polarizer/thermoplastic resin substrate laminate obtained in the Examples and Comparative Examples after the resin substrate was removed were measured using an ultraviolet-visible spectrophotometer ("V-7100" manufactured by JASCO Corporation). These Ts, Tp, and Tc were measured using a 2-degree field of view (light source C) in accordance with JIS Z8701 and the Y values obtained by performing sensitivity correction. The polarization degree P was calculated from the obtained Tp and Tc using the following formula. Polarization degree P (%) = {(Tp-Tc)/(Tp+Tc)} 1 /2 × 100. A spectrophotometer such as "LPF-200" manufactured by Otsuka Electronics Co., Ltd. can also be used for equivalent measurements. Regardless of the spectrophotometer used, equivalent measurement results can be confirmed. (8) Wet durability: A test piece (50 mm × 50 mm) was cut out from the polarizing plate or the polarizing plate with a phase difference layer obtained in the Examples and Comparative Examples. The test piece was formed with two sides facing the direction perpendicular to the absorption axis of the polarizer and the absorption axis. The test piece was bonded to an alkali-free glass plate with the protective layer facing outward using an adhesive to prepare a test sample. The single transmittance (Ts), parallel transmittance (Tp) and orthogonal transmittance (Tc) of the test sample were measured in the same manner as in (7) using an ultraviolet-visible spectrophotometer (manufactured by JASCO Corporation, product name "V7100") to obtain the polarization degree (P). At this time, the measurement light was incident from the protective layer side. Next, the test sample was placed in an oven at 60°C and 95% RH for 500 hours for heating and humidification (wet heat test). The change in polarization degree ΔP was obtained from the polarization degree P 0 before the wet heat test and the polarization degree P 500 after the wet heat test using the following formula. ΔP (%) = P 500 -P 0 The obtained ΔP results were evaluated according to the following criteria. Good: ΔP is -5.0% to 0% Poor: ΔP is less than -5.0% or discoloration occurs (9) Softening temperature of protective layer A protective layer (thickness: 3µm) was formed on one side of the polarizer (total elongation ratio: 5.5 times) produced in Comparative Example 1 in the same manner as the formation of the protective layer in each embodiment and comparative example. Local thermal analysis (nano-TA measurement) was performed on the surface of the protective layer of the obtained polarizing plate [protective layer/polarizer] to calculate the softening temperature of the protective layer. The measuring apparatus and measuring conditions are as follows. Measuring device: Made by Hitachi High-Tech Science Co., product name "AFM5300E//Nano-TA2" Measuring mode: Contact mode Probe: AN2-200 Measuring area: 8µm□ Scanning measurement Gas environment: Atmospheric pressure (10) Iodine adsorption amount A protective layer (thickness: 3µm) was formed on one side of a PET film in the same manner as the protective layer in each embodiment and comparative example. The obtained PET film with a protective layer was cut into 1cm×1cm ( 1cm2 ) to prepare a sample, which was collected into a headspace vial (20mL capacity) and weighed. Next, place a screw-capped bottle (1.5 mL capacity) containing 1 mL of iodine solution (1% iodine concentration by weight, 7% potassium iodide concentration by weight) into the headspace vial and securely cap it. The headspace vial is then placed in a desiccator at 65°C for 6 hours (this allows the gaseous I₂ to adsorb onto the sample). The sample is then transferred to a ceramic boat and burned using an automatic sample combustion device. The resulting gas is then collected in 10 mL of absorption liquid. After collection, the absorption liquid is diluted to 15 mL with pure water, and IC quantitative analysis is performed on the original solution or a suitably diluted solution. In addition, the iodine adsorption amount after the same measurement was performed on the PET film alone was almost 0, so the iodine adsorption amount (weight %) was calculated from the following formula based on the iodine weight obtained by IC quantitative analysis and the weight of the protective layer monomer ("weight of the PET film with the protective layer" - "weight of the PET film"). Iodine adsorption amount (weight %) = iodine weight obtained by IC quantitative analysis / weight of the protective layer monomer × 100. In addition, the measuring device is as follows. [Measuring device] Automatic sample combustion device: "AQF-2100H" manufactured by Mitsubishi Chemical Analytech Co., Ltd. IC (anion): "ICS-3000" manufactured by Thermo Fisher Scientific Co., Ltd.

[實施例1-1] 1.偏光件/樹脂基材之積層體之製作 樹脂基材是使用長條狀且吸水率0.75%、Tg約75℃之非晶質間苯二甲酸共聚聚對苯二甲酸乙二酯薄膜(厚度:100µm)。並對樹脂基材之單面施行了電暈處理。 在以9:1混合聚乙烯醇(聚合度4200,皂化度99.2莫耳%)及乙醯乙醯基改質PVA(Mitsubishi Chemical Co.製,商品名「GOHSEFIMER Z410」)而成之PVA系樹脂100重量份中,添加碘化鉀13重量份,而調製出PVA水溶液(塗佈液)。 於樹脂基材之電暈處理面塗佈上述PVA水溶液並在60℃下乾燥,藉此形成厚度13μm之PVA系樹脂層,而製作出積層體。 將所得積層體於130℃之烘箱內在周速相異之輥間沿縱方向(長邊方向)進行自由端單軸延伸成2.4倍(空中輔助延伸處理)。 接著,使積層體浸漬於液溫40℃的不溶解浴(相對於水100重量份摻混4重量份之硼酸而得之硼酸水溶液)中30秒鐘(不溶解處理)。 接著,於液溫30℃的染色浴(相對於水100重量份,以1:7之重量比摻混碘與碘化鉀而得之碘水溶液)中調整濃度的同時使其浸漬於其中60秒鐘,以使最後所得偏光件的單體透射率(Ts)成為41.5%(染色處理)。 接著,使其浸漬於液溫40℃的交聯浴(相對於水100重量份摻混3重量份之碘化鉀並摻混5重量份之硼酸而獲得之硼酸水溶液)中30秒鐘(交聯處理)。 然後,一邊使積層體浸漬於液溫70℃的硼酸水溶液(硼酸濃度4.0重量%)中,一邊在周速相異的輥間沿縱方向(長邊方向)進行單軸延伸成1.46倍(水中延伸處理)(以結果而言,總延伸倍率為2.4×1.46=3.5倍)。 之後,使積層體浸漬於液溫20℃的洗淨浴(相對於水100重量份摻混4重量份之碘化鉀而得之水溶液)中(洗淨處理)。 之後,一邊在經保持於90℃之烘箱中乾燥,一邊使其接觸表面溫度經保持於75℃之SUS製加熱輥約2秒(乾燥收縮處理)。積層體進行乾燥收縮處理所得寬度方向之收縮率為2%。 依上述方式,於樹脂基材上形成了厚度6.7μm之偏光件,而製作出偏光件/樹脂基材之積層體。偏光件之單體透射率(初始單體透射率)Ts0 為41.5%,偏光度(初始偏光度)P0 為99.99%。[Example 1-1] 1. Preparation of a Polarizer/Resin Substrate Laminate: The resin substrate was a long, amorphous polyethylene terephthalate (PET) film (thickness: 100µm) with a water absorption of 0.75% and a Tg of approximately 75°C. One side of the resin substrate was subjected to a corona treatment. A PVA aqueous solution (coating solution) was prepared by adding 13 parts by weight of potassium iodide to 100 parts by weight of a PVA-based resin composed of a 9:1 mixture of polyvinyl alcohol (DP4200, saponification degree 99.2 mol%) and acetyl-modified PVA (manufactured by Mitsubishi Chemical Co., trade name "GOHSEFIMER Z410") . The PVA aqueous solution was applied to the corona-treated surface of the resin substrate and dried at 60°C to form a 13μm-thick PVA resin layer, producing a laminate. The resulting laminate was then subjected to free-end uniaxial stretching to 2.4 times its original length in the longitudinal direction (longitudinal direction) between rollers of varying circumferential speeds in an oven at 130°C (in-air assisted stretching). The laminate was then immersed in an insolubilization bath (a boric acid aqueous solution containing 4 parts by weight of boric acid per 100 parts by weight of water) at 40°C for 30 seconds (insolubilization treatment). Next, the polarizer was immersed in a dye bath (an aqueous iodine solution prepared by mixing iodine and potassium iodide at a weight ratio of 1:7 per 100 parts by weight of water) at a temperature of 30°C for 60 seconds, with the concentration adjusted to achieve a single-unit transmittance (Ts) of 41.5% (dyeing treatment). The polarizer was then immersed in a crosslinking bath (an aqueous boric acid solution prepared by mixing 3 parts by weight of potassium iodide and 5 parts by weight of boric acid per 100 parts by weight of water) at a temperature of 40°C for 30 seconds (crosslinking treatment). The laminate was then immersed in a boric acid aqueous solution (boric acid concentration 4.0% by weight) at a temperature of 70°C and uniaxially stretched in the longitudinal direction (longitudinal direction) between rollers of varying circumferential speeds (underwater stretching treatment). The total stretch ratio was 2.4 x 1.46 = 3.5. The laminate was then immersed in a cleaning bath (an aqueous solution of 4 parts by weight of potassium iodide per 100 parts by weight of water) at a temperature of 20°C (cleaning treatment). The laminate was then dried in an oven maintained at 90°C while contacting a SUS heating roller maintained at a surface temperature of 75°C for approximately 2 seconds (drying and shrinking treatment). The laminate was dried and shrunk to a widthwise shrinkage rate of 2%. Following the above method, a 6.7μm-thick polarizer was formed on a resin substrate, producing a polarizer/resin substrate laminate. The polarizer's single-unit transmittance (initial single-unit transmittance) Ts0 was 41.5%, and its polarization (initial polarization) P0 was 99.99%.

2.易接著層之形成 於所得積層體之偏光件面,將聚胺甲酸酯系水系分散樹脂(第一工業製藥公司製,製品名:SUPERFLEX SF210)塗佈成厚度成為0.1µm作為易接著層,而形成易接著層。2. Forming the Adhesive Layer On the polarizer side of the resulting laminate, a polyurethane aqueous dispersion resin (SUPERFLEX SF210, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) was applied to a thickness of 0.1µm to form an adhesive layer.

3.保護層之製作 將100%聚甲基丙烯酸甲酯之丙烯酸系樹脂(楠本化成公司製,製品名:B-728)20重量份溶解於甲基乙基酮80重量份中,而獲得丙烯酸系樹脂溶液(20%)。將該丙烯酸系樹脂溶液用線棒塗佈於上述所得積層體之易接著層表面,並將塗佈膜在60℃下乾燥5分鐘後,形成以塗佈膜的固化物的形式構成之保護層。保護層之厚度為3µm。接著,從所得積層體剝離樹脂基材,而獲得具有保護層(塗佈膜之固化物)/易接著層/偏光件之構成的偏光板。3. Preparation of the Protective Layer 20 parts by weight of a 100% polymethyl methacrylate acrylic resin (B-728, manufactured by Kusumoto Chemicals Co., Ltd.) was dissolved in 80 parts by weight of methyl ethyl ketone to obtain a 20% acrylic resin solution. This acrylic resin solution was applied to the adhesive layer surface of the laminate using a wire bar. The coated film was dried at 60°C for 5 minutes to form a protective layer composed of a cured product of the coated film. The protective layer had a thickness of 3µm. The resin substrate was then peeled from the laminate to obtain a polarizing plate consisting of a protective layer (cured product of the coated film), an adhesive layer, and a polarizer.

[實施例1-2] 令保護層厚度為2µm、及於保護層之與易接著層為相反側的面進一步形成硬塗層(厚度3µm),除此之外依與實施例1-1相同方式,而獲得具有硬塗層/保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。此外,硬塗層係藉由以下方式來形成:將二羥甲基-三環癸烷二丙烯酸酯(共榮社化學製,商品名:LIGHT ACRYLATE DCP-A)70重量份、丙烯酸異莰酯(共榮社化學製,商品名:LIGHT ACRYLATE IB-XA)20重量份、1,9-壬二醇二丙烯酸酯(共榮社化學製、商品名:LIGHT ACRYLATE 1.9NA-A)10重量份、進而光聚合引發劑(BASF公司製,商品名:IRGACURE 907)3重量份,使用適當之溶劑混合,並將所得塗敷液以使硬化後成為3µm之方式塗佈於保護層面上,接著使溶劑乾燥,並使用高壓水銀燈以累積光量成為300mJ/cm2 之方式在氮氣環境下照射紫外線來形成。[Example 1-2] A polarizing plate having a structure of hard coating layer/protective layer (cured product of coating film)/easy bonding layer/polarizer was obtained in the same manner as in Example 1-1, except that the protective layer had a thickness of 2 µm and a hard coating layer (thickness 3 µm) was further formed on the surface of the protective layer opposite to the easy bonding layer. The hard coating layer was formed by mixing 70 parts by weight of dihydroxymethyl-tricyclodecane diacrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE DCP-A), 20 parts by weight of isoborneol acrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE IB-XA), 10 parts by weight of 1,9-nonanediol diacrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE 1.9NA-A), and a photopolymerization initiator (produced by BASF, trade name: IRGACURE 907) by weight, mixed with an appropriate solvent, and the resulting coating liquid was applied to the protective layer in such a way that it would become 3µm after curing. The solvent was then dried and irradiated with ultraviolet light using a high-pressure mercury lamp in a nitrogen environment at a cumulative light intensity of 300mJ/ cm2 .

[實施例1-3] 使用具有內酯環單元之聚甲基丙烯酸甲酯的丙烯酸系樹脂(內酯環單元30莫耳%)來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂、且令保護層厚度為2µm、及於保護層之與易接著層為相反側的面進一步形成硬塗層(厚度3µm),除此之外依與實施例1-1相同方式,而獲得具有硬塗層/保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。此外,硬塗層之形成係依與實施例1-2相同方式進行。[Example 1-3] A polarizing plate having a hard coat/protective layer (cured product of the coating film)/easy-adhesive layer/polarizer structure was obtained in the same manner as in Example 1-1, except that a lactone ring unit-containing polymethyl methacrylate acrylic resin (lactone ring unit content: 30 mol%) was used instead of the 100% polymethyl methacrylate acrylic resin. The protective layer had a thickness of 2µm, and a hard coat layer (3µm thick) was further formed on the side of the protective layer opposite the adhesive layer. The hard coat layer was formed in the same manner as in Example 1-2.

[實施例1-4] 使用具有戊二醯亞胺環單元之聚甲基丙烯酸甲酯的丙烯酸系樹脂(戊二醯亞胺環單元4莫耳%)來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂、且令保護層厚度為2µm、及於保護層之與易接著層為相反側的面進一步形成硬塗層(厚度3µm),除此之外依與實施例1-1相同方式,而獲得具有硬塗層/保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。此外,硬塗層之形成係依與實施例1-2相同方式進行。[Example 1-4] A polarizing plate having a hard coat/protective layer (cured product of the coating film)/easy-adhesive layer/polarizer structure was obtained in the same manner as in Example 1-1, except that a polymethyl methacrylate acrylic resin containing glutarimido ring units (4 mol% of glutarimido ring units) was used instead of the 100% polymethyl methacrylate acrylic resin. The protective layer had a thickness of 2µm, and a hard coat (3µm thick) was further formed on the side of the protective layer opposite the adhesive layer. The hard coat was formed in the same manner as in Example 1-2.

[實施例1-5] 除了使用甲基丙烯酸甲酯/甲基丙烯酸丁酯(莫耳比80/20)之共聚物的丙烯酸系樹脂來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂外,依與實施例1-1相同方式,而獲得具有保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。[Example 1-5] A polarizing plate having a protective layer (cured product of the coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Example 1-1, except that an acrylic resin comprising a copolymer of methyl methacrylate and butyl methacrylate (molar ratio 80/20) was used instead of the 100% polymethyl methacrylate acrylic resin.

[實施例1-6] 使用甲基丙烯酸甲酯/甲基丙烯酸丁酯(莫耳比80/20)之共聚物的丙烯酸系樹脂來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂、且令保護層厚度為2µm、及於保護層之與易接著層為相反側的面進一步形成硬塗層(厚度3µm),除此之外依與實施例1-1相同方式,而獲得具有硬塗層/保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。此外,硬塗層之形成係依與實施例1-2相同方式進行。[Example 1-6] A polarizing plate having a hard coat/protective layer (cured coating film)/easy-adhesive layer/polarizer structure was obtained in the same manner as in Example 1-1, except that an acrylic resin comprising a copolymer of methyl methacrylate and butyl methacrylate (molar ratio 80/20) was used instead of the 100% polymethyl methacrylate acrylic resin, the protective layer having a thickness of 2µm, and a hard coat (3µm thick) formed on the side of the protective layer opposite the adhesive layer. The hard coat was formed in the same manner as in Example 1-2.

[實施例1-7] 除了使用甲基丙烯酸甲酯/丙烯酸乙酯(莫耳比55/45)之共聚物的丙烯酸系樹脂(楠本化成公司製,製品名「B-722」)來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂外,依與實施例1-1相同方式,而獲得具有保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。[Example 1-7] A polarizing plate having a protective layer (cured product of the coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Example 1-1, except that an acrylic resin comprising a copolymer of methyl methacrylate and ethyl acrylate (molar ratio 55/45) (manufactured by Kusumoto Chemicals, product name "B-722") was used instead of the 100% polymethyl methacrylate acrylic resin.

[實施例1-8] 除了使用甲基丙烯酸甲酯/甲基丙烯酸丁酯(莫耳比35/65)之共聚物的丙烯酸系樹脂(楠本化成公司製,製品名「B-734」)來取代100%聚甲基丙烯酸甲酯的丙烯酸系樹脂外,依與實施例1-1相同方式,而獲得具有保護層(塗佈膜的固化物)/易接著層/偏光件之構成的偏光板。[Example 1-8] A polarizing plate having a protective layer (cured product of the coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Example 1-1, except that an acrylic resin comprising a copolymer of methyl methacrylate and butyl methacrylate (molar ratio 35/65) (manufactured by Kusumoto Chemicals, product name "B-734") was used instead of the 100% polymethyl methacrylate acrylic resin.

[實施例2-1] 1.偏光件/樹脂基材之積層體之製作 依與實施例1-1相同方式,於樹脂基材上形成了厚度6.7μm之偏光件,而製作出偏光件/樹脂基材之積層體。 2.保護層之製作 將具有聯苯骨架之環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX4000)15份溶解於甲基乙基酮83.8份中,而獲得環氧樹脂溶液。於所得環氧樹脂溶液中添加光陽離子聚合引發劑(San-Apro Ltd.,商品名:CPI(註冊商標)-100P)1.2份,而獲得保護層形成組成物。使用線棒將所得保護層形成組成物直接(亦即不形成易接著層)塗佈於偏光件表面,並將塗佈膜在60℃下乾燥3分鐘。接著,使用高壓水銀燈以使累積光量為600mJ/cm2 之方式照射紫外線,形成保護層。保護層之厚度為3µm。接著,從所得積層體剝離樹脂基材,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-1] 1. Preparation of a Polarizer/Resin Substrate Laminate: A polarizer having a thickness of 6.7 μm was formed on a resin substrate in the same manner as in Example 1-1 to produce a polarizer/resin substrate laminate. 2. Preparation of a Protective Layer: 15 parts of an epoxy resin having a biphenyl skeleton (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX4000) were dissolved in 83.8 parts of methyl ethyl ketone to obtain an epoxy resin solution. 1.2 parts of a photocatalytic polymerization initiator (San-Apro Ltd., trade name: CPI (registered trademark)-100P) was added to the resulting epoxy resin solution to obtain a protective layer forming composition. The resulting protective layer-forming composition was applied directly (i.e., without forming an easy-adhesion layer) to the surface of the polarizer using a wire rod and dried at 60°C for 3 minutes. Next, the film was irradiated with UV light using a high-pressure mercury lamp at a cumulative dose of 600 mJ/ cm² to form a protective layer. The protective layer had a thickness of 3 µm. The resulting laminate was then peeled from the resin substrate to obtain a polarizing plate consisting of a protective layer (photoion-cured epoxy resin layer) and a polarizer.

[實施例2-2] 將具有聯苯骨架之環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX4000)15份與氧雜環丁烷樹脂(東亞合成公司製,商品名:ARON OXETANE(註冊商標) OXT-221)10重量份溶解於甲基乙基酮73份中,而獲得環氧樹脂溶液。於所得環氧樹脂溶液中添加光陽離子聚合引發劑(San-Apro Ltd.,商品名:CPI(註冊商標)-100P)2份,而獲得保護層形成組成物。使用該環氧樹脂溶液獲得保護層形成組成物、使用各種碘濃度之染色浴(碘與碘化鉀之重量比=1:7)、及將製作偏光件時之水中延伸的延伸倍率設為1.25倍(總延伸倍率:3.0倍),除此之外依與實施例2-1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-2] 15 parts of an epoxy resin having a biphenyl skeleton (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX4000) and 10 parts by weight of an oxycyclobutane resin (manufactured by Toagosei Co., Ltd., trade name: ARON OXETANE (registered trademark) OXT-221) were dissolved in 73 parts of methyl ethyl ketone to obtain an epoxy resin solution. To this epoxy resin solution, 2 parts of a photocatalytic polymerization initiator (manufactured by San-Apro Ltd., trade name: CPI (registered trademark)-100P) were added to obtain a protective layer-forming composition. Polarizing plates having a protective layer (photoion-cured epoxy resin layer)/polarizer configuration were obtained in the same manner as in Example 2-1, except that the epoxy resin solution was used to form a protective layer composition, dyeing baths of various iodine concentrations (weight ratio of iodine to potassium iodide = 1:7), and the stretching ratio during underwater stretching during polarizer production was set to 1.25 times (total stretching ratio: 3.0 times).

[實施例2-3] 使用各種碘濃度之染色浴(碘與碘化鉀之重量比=1:7)、及將製作偏光件時之水中延伸的延伸倍率設為1.46倍(總延伸倍率:3.5倍),除此之外依與實施例2-2相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-3] Polarizing plates with a protective layer (photoion-cured epoxy resin layer)/polarizer structure were obtained in the same manner as in Example 2-2, except that dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used and the underwater stretching magnification during polarizer production was set to 1.46x (total stretching magnification: 3.5x).

[實施例2-4] 使用各種碘濃度之染色浴(碘與碘化鉀之重量比=1:7)、及將製作偏光件時之水中延伸的延伸倍率設為1.67倍(總延伸倍率:4.0倍),除此之外依與實施例2-2相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-4] Polarizing plates with a protective layer (photoion-cured epoxy resin layer)/polarizer structure were obtained in the same manner as in Example 2-2, except that dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used and the underwater stretching magnification during polarizer production was set to 1.67x (total stretching magnification: 4.0x).

[實施例2-5] 使用各種碘濃度之染色浴(碘與碘化鉀之重量比=1:7)、及將製作偏光件時之水中延伸的延伸倍率設為1.88倍(總延伸倍率:4.5倍),除此之外依與實施例2-2相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-5] Polarizing plates with a protective layer (photoion-cured epoxy resin layer)/polarizer structure were obtained in the same manner as in Example 2-2, except that dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used and the underwater stretching magnification during polarizer production was set to 1.88x (total stretching magnification: 4.5x).

[實施例2-6] 使用雙酚型環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) 828)來取代具有聯苯骨架之環氧樹脂,除此之外依與實施例2-1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-6] A polarizing plate having a protective layer (photoion-curable epoxy resin layer)/polarizer structure was obtained in the same manner as in Example 2-1, except that a bisphenol-type epoxy resin (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) 828) was used instead of the epoxy resin having a biphenyl backbone.

[實施例2-7] 使用雙酚型環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) 828)來取代具有聯苯骨架之環氧樹脂,除此之外依與實施例2-3相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-7] A polarizing plate having a protective layer (photoion-curable epoxy resin layer)/polarizer structure was obtained in the same manner as in Example 2-3, except that a bisphenol-type epoxy resin (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) 828) was used instead of the epoxy resin having a biphenyl backbone.

[實施例2-8] 使用氫化雙酚型環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX8000)來取代具有聯苯骨架之環氧樹脂,除此之外依與實施例2-1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-8] A polarizing plate having a protective layer (photoion-cured epoxy layer of epoxy resin)/polarizer structure was obtained in the same manner as in Example 2-1, except that a hydrogenated bisphenol-based epoxy resin (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX8000) was used instead of the epoxy resin having a biphenyl backbone.

[實施例2-9] 使用氫化雙酚型環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX8000)來取代具有聯苯骨架之環氧樹脂,除此之外依與實施例2-3相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-9] A polarizing plate having a protective layer (photoion-cured epoxy resin layer)/polarizer structure was obtained in the same manner as in Example 2-3, except that a hydrogenated bisphenol-based epoxy resin (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX8000) was used instead of the epoxy resin having a biphenyl backbone.

[實施例2-10] 1.偏光板之製作 依與實施例2-3相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件之構成的偏光板。[Example 2-10] 1. Preparation of Polarizing Plate A polarizing plate consisting of a protective layer (photoion-cured epoxy resin layer) and a polarizer was obtained in the same manner as in Example 2-3.

2.第1相位差層之製作 使用由2台具備有攪拌葉片及控制成100℃之回流冷卻器的直立式反應器構成之批次聚合裝置進行聚合。饋入雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷29.60質量份(0.046mol)、異山梨醇(ISB)29.21質量份(0.200mol)、螺甘油(SPG)42.28質量份(0.139mol)、碳酸二苯酯(DPC)63.77質量份(0.298mol)及作為觸媒的乙酸鈣一水合物1.19×10-2 質量份(6.78×10-5 mol)。將反應器內進行減壓氮取代後,以加熱介質加溫,並於內部溫度達到100℃之時間點開始攪拌。於升溫開始40分鐘後使內部溫度達到220℃,控制維持該溫度的同時開始減壓,使在達到220℃後起以90分鐘使其成為13.3kPa。將隨聚合反應副生成之苯酚蒸氣導入100℃之回流冷卻器,使苯酚蒸氣中所含些許量單體成分返回反應器,並將未凝聚之苯酚蒸氣導入45℃的凝聚器中回收。將氮導入第1反應器暫時使其回復到大氣壓力後,將第1反應器內之經寡聚化的反應液移至第2反應器。接著,開始進行第2反應器內的升溫及減壓,並以50分鐘使內溫成為240℃、壓力成為0.2kPa。其後,進行聚合直到達到預定之攪拌動力。在達到預定動力之時間點將氮導入反應器中使壓力回復,並將所生成之聚酯碳酸酯系樹脂擠製至水中,裁切束狀物而得到丸粒。2. Preparation of the first phase difference layer: Polymerization was carried out using a batch polymerization apparatus consisting of two vertical reactors equipped with stirring blades and a reflux cooler controlled at 100°C. The reaction mixture consisted of 29.60 parts by mass (0.046 mol) of bis[9-(2-phenoxycarbonylethyl)fluoren-9-yl]methane, 29.21 parts by mass (0.200 mol) of isosorbide (ISB), 42.28 parts by mass (0.139 mol) of spiroglycerol (SPG), 63.77 parts by mass (0.298 mol) of diphenyl carbonate (DPC), and 1.19× 10⁻² parts by mass (6.78× 10⁻⁵ mol) of calcium acetate monohydrate as a catalyst. After the reactor was depressurized and purged with nitrogen, it was heated with a heating medium and stirred when the internal temperature reached 100°C. 40 minutes after the start of the temperature increase, the internal temperature reached 220°C. While maintaining this temperature, the pressure was reduced to 13.3 kPa over 90 minutes. Phenol vapor, a by-product of the polymerization reaction, was introduced into a 100°C reflux cooler to return a small amount of monomeric components contained in the phenol vapor to the reactor. Uncondensed phenol vapor was then recovered in a 45°C condenser. Nitrogen was introduced into the first reactor to temporarily return the pressure to atmospheric pressure. The oligomerized reaction solution in the first reactor was then transferred to the second reactor. Next, the temperature and pressure in the second reactor were raised and reduced, reaching an internal temperature of 240°C and a pressure of 0.2 kPa over 50 minutes. Polymerization was then continued until the predetermined stirring power was reached. At this point, nitrogen was introduced into the reactor to restore the pressure, and the resulting polyester carbonate resin was extruded into water. The resulting strands were then cut into pellets.

將所得聚酯碳酸酯系樹脂(丸粒)在80℃下真空乾燥5小時後,使用具備單軸擠製機(東芝機械公司製,缸筒設定溫度:250℃)、T型模(寬200mm,設定溫度:250℃)、冷卻輥(設定溫度:120~130℃)及捲取機之薄膜製膜裝置,製作出厚度130μm之長條狀樹脂薄膜。以可獲得預定之相位差之方式一邊調整所得長條狀樹脂薄膜一邊進行延伸,而獲得厚度48μm的相位差薄膜。延伸條件係沿寬度方向,延伸溫度為143℃,延伸倍率為2.8倍。所得相位差薄膜之Re(550)為141nm,Re(450)/Re(550)為0.86,且Nz係數為1.12。The resulting polyester carbonate resin pellets were vacuum-dried at 80°C for 5 hours. Then, a 130μm-thick long resin film was produced using a film-forming apparatus equipped with a uniaxial extruder (Toshiba Machine Co., Ltd., cylinder set temperature: 250°C), a T-die (200mm width, set temperature: 250°C), a cooling roll (set temperature: 120-130°C), and a winder. The resulting long resin film was then stretched while adjusting the film to achieve a predetermined retardation, resulting in a 48μm-thick retardation film. Stretching conditions were a widthwise stretching temperature of 143°C and a stretching ratio of 2.8x. The obtained retardation film had a Re(550) of 141 nm, a Re(450)/Re(550) of 0.86, and an Nz coefficient of 1.12.

3.第2相位差層 使用折射率特性滿足nz>nx=ny之關係且厚度方向之相位差Rth(550)為-135nm的相位差薄膜(大日本印刷股份公司製,「MCP-N」)作為第2相位差層。3. Second phase difference layer A phase difference film ("MCP-N" manufactured by Dai Nippon Printing Co., Ltd.) having a refractive index characteristic satisfying the relationship nz>nx=ny and a thickness direction phase difference Rth(550) of -135 nm was used as the second phase difference layer.

4.附相位差層之偏光板之製作 首先,於第1相位差層面透過紫外線硬化型接著劑貼合第2相位差層。接著,於上述偏光板之偏光件面透過厚度12µm之丙烯酸系黏著劑層貼合上述第1相位差層/第2相位差層之積層體的第1相位差層面。此時,係以第1相位差層之慢軸與偏光件之吸收軸呈45°之角度之方式貼合。依上述方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層/第1相位差層/第2相位差層之構成的附相位差層之偏光板。4. Preparation of a Polarizing Plate with a Retardation Layer First, a second retardation layer is bonded to the first retardation layer using a UV-curable adhesive. Next, the first retardation layer of the first/second retardation layer laminate is bonded to the polarizer surface of the polarizing plate using a 12µm-thick acrylic adhesive. During bonding, the slow axis of the first retardation layer forms a 45° angle with the absorption axis of the polarizer. This completes a polarizing plate with a retardation layer consisting of a protective layer (photoion-curable epoxy resin layer), polarizer, adhesive layer, first retardation layer, and second retardation layer.

[實施例3-1] 1.偏光件/樹脂基材之積層體之製作 依與實施例1-1相同方式,於樹脂基材上形成了厚度6.7μm之偏光件,而製作出偏光件/樹脂基材之積層體。 2.保護層之製作 將環氧樹脂1(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) 1256B40,重量平均分子量:40000,環氧當量:7350)20份溶解於甲基乙基酮80份中,而獲得環氧樹脂溶液(20%)。使用線棒將該環氧樹脂溶液塗佈於上述積層體的偏光件表面,並將塗佈膜在60℃下乾燥3分鐘,而形成以塗佈膜的固化物的形式構成之保護層。保護層之厚度為3µm。接著,從所得積層體剝離樹脂基材,而獲得具有保護層(環氧樹脂之塗佈膜的固化層)/偏光件之構成的偏光板。[Example 3-1] 1. Preparation of a Polarizer/Resin Substrate Laminate A polarizer with a thickness of 6.7 μm was formed on a resin substrate in the same manner as in Example 1-1 to produce a polarizer/resin substrate laminate. 2. Preparation of a Protective Layer 20 parts of epoxy resin 1 (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) 1256B40, weight-average molecular weight: 40,000, epoxy equivalent weight: 7,350) was dissolved in 80 parts of methyl ethyl ketone to obtain an epoxy resin solution (20%). The epoxy resin solution was applied to the polarizer surface of the laminate using a wire rod. The coated film was dried at 60°C for 3 minutes to form a protective layer consisting of a cured epoxy resin coating. The protective layer had a thickness of 3µm. The resin substrate was then peeled from the laminate to obtain a polarizing plate consisting of a protective layer (cured epoxy resin coating) and a polarizer.

[實施例3-2] 除了使用環氧樹脂2(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX6954BH30,重量平均分子量:36000,環氧當量:13000)來取代環氧樹脂1外,依與實施例3-1相同方式,而獲得具有保護層(環氧樹脂之塗佈膜的固化層)/偏光件之構成的偏光板。[Example 3-2] A polarizing plate having a protective layer (cured layer of epoxy resin coating)/polarizer configuration was obtained in the same manner as in Example 3-1, except that epoxy resin 2 (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX6954BH30, weight-average molecular weight: 36,000, epoxy equivalent weight: 13,000) was used instead of epoxy resin 1.

[實施例4] 未形成易接著層(亦即直接於偏光件形成保護層)、及使用水系聚酯系樹脂(日本合成化學公司製,製品名「POLYESTER WR905」),除此之外依與實施例1-1相同方式,而獲得具有保護層(塗佈膜的固化物)/偏光件之構成的偏光板。[Example 4] A polarizing plate having a protective layer (cured coating film)/polarizer configuration was obtained in the same manner as in Example 1-1, except that no adhesive layer was formed (i.e., the protective layer was formed directly on the polarizer) and a water-based polyester resin (manufactured by Nippon Gosei Kagaku Co., Ltd., product name "POLYESTER WR905") was used.

[實施例5] 未形成易接著層(亦即直接於偏光件形成保護層)、及使用水系聚胺甲酸酯系樹脂(第一工業製藥公司製,製品名「SUPERFLEX SF210」),除此之外依與實施例1-1相同方式,而獲得具有保護層(塗佈膜的固化物)/偏光件之構成的偏光板。[Example 5] A polarizing plate having a protective layer (cured coating)/polarizer configuration was obtained in the same manner as in Example 1-1, except that no easy-adhesion layer was formed (i.e., the protective layer was formed directly on the polarizer) and a water-based polyurethane resin (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., product name "SUPERFLEX SF210") was used.

[比較例1] 除了將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍)外,依與實施例1-1相同方式,而獲得具有保護層(塗佈膜之固化物)/易接著層/偏光件之構成的偏光板。[Comparative Example 1] A polarizing plate having a protective layer (cured product of the coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Example 1-1, except that the underwater stretching ratio during polarizer production was set to 2.29 times (total stretching ratio: 5.5 times).

[比較例2] 除了將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍)外,依與實施例1-2相同方式,而獲得具有硬塗層/保護層(塗佈膜之固化物)/易接著層/偏光件之構成的偏光板。[Comparative Example 2] A polarizing plate having a hard coat layer/protective layer (cured coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Examples 1-2, except that the underwater stretching ratio during polarizer production was set to 2.29 times (total stretching ratio: 5.5 times).

[比較例3] 使用各種碘濃度之染色浴(碘與碘化鉀之重量比=1:7)、及將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍),除此之外依與實施例2-3相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/易接著層/偏光件之構成的偏光板。[Comparative Example 3] Dyeing baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) and a polarizer stretching ratio of 2.29x (total stretching ratio: 5.5x) were used. A polarizing plate having a protective layer (photoion-curable epoxy resin layer), an easy-to-adhesive layer, and a polarizer structure was obtained in the same manner as in Examples 2-3.

[比較例4] 除了將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍)外,依與實施例2-10相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層/第1相位差層/第2相位差層之構成的附相位差層之偏光板。[Comparative Example 4] A polarizing plate with a retardation layer was obtained in the same manner as in Example 2-10, except that the underwater stretching ratio during polarizer production was set to 2.29 times (total stretching ratio: 5.5 times). The structure consisted of a protective layer (photoion-curable epoxy resin layer), a polarizer, an adhesive layer, a first retardation layer, and a second retardation layer.

[比較例5] 除了將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍)外,依與實施例1-7相同方式,而獲得具有保護層(塗佈膜之固化物)/易接著層/偏光件之構成的偏光板。[Comparative Example 5] A polarizing plate having a protective layer (cured product of the coating film)/easy-adhesion layer/polarizer structure was obtained in the same manner as in Examples 1-7, except that the underwater stretching ratio during polarizer production was set to 2.29 times (total stretching ratio: 5.5 times).

[比較例6] 將製作偏光件時之水中延伸的延伸倍率設為2.29倍(總延伸倍率:5.5倍)、及使用已對單面進行易接著處理之丙烯酸系樹脂薄膜(折射率:1.50,厚度:20µm)作為保護層,除此之外依與實施例1-1相同方式,而獲得具有保護層(丙烯酸系樹脂薄膜)/偏光件之構成的偏光板。丙烯酸系樹脂薄膜係透過紫外線硬化接著劑直接貼合於偏光件面。具體而言,是塗敷成硬化型接著劑之總厚度成為1.0μm,並使用輥軋機進行貼合。其後,從丙烯酸系樹脂薄膜側照射UV光線使接著劑硬化。[Comparative Example 6] A polarizing plate having a protective layer (acrylic film)/polarizer configuration was obtained in the same manner as in Example 1-1, except that the underwater stretching magnification during polarizer production was set to 2.29x (total stretch magnification: 5.5x) and an acrylic film (refractive index: 1.50, thickness: 20µm) with a single-side adhesive treatment was used as the protective layer. The acrylic film was directly bonded to the polarizer surface using a UV-curable adhesive. Specifically, a curable adhesive was applied to a total thickness of 1.0µm and bonded using a roller. UV light was then applied from the side of the acrylic film to cure the adhesive.

將評估結果顯示於表1~表3。 [表1] The evaluation results are shown in Tables 1 to 3. [Table 1]

[表2] [Table 2]

[表3] [Table 3]

如表1~3所示,使用PVA系樹脂之定向度控制在預定狀態之偏光件(以結果而言為具有預定範圍之穿刺強度的偏光件)之實施例之偏光板即便在保護層之厚度極小之情況下,仍有抑制住加熱時之裂痕。又,具有特定保護層之偏光板會展現優異之加濕耐久性。As shown in Tables 1-3, polarizing plates using a PVA-based resin polarizer with a predetermined orientation (thus, a polarizer with a predetermined puncture strength) exhibit minimal cracking during heating, even with a minimal protective layer thickness. Furthermore, polarizing plates with this specific protective layer exhibit excellent durability even when exposed to humidity.

又,於圖5~圖7分別顯示實施例及比較例所用偏光件(總延伸倍率為3.0、3.5、4.0、4.5或5.5倍之偏光件)之單體透射率與PVA之Δn、面內相位差或定向函數之關係。如圖5~圖7及表1~3所示,可知滿足式(1)、式(2)及/或式(3)之偏光件係顯示預定值以下之穿刺強度,且使用所述偏光件製出之偏光板即便在保護層之厚度極小之情況下,仍能抑制加熱時之裂痕。Furthermore, Figures 5 to 7 show the relationship between the single transmittance of the polarizers used in the Examples and Comparative Examples (polarizers with a total stretch ratio of 3.0, 3.5, 4.0, 4.5, or 5.5 times) and the Δn of the PVA, the in-plane retardation, or the orientation function. As shown in Figures 5 to 7 and Tables 1 to 3, it can be seen that polarizers that satisfy equations (1), (2), and/or (3) exhibit a puncture strength below a predetermined value, and polarizing plates made using such polarizers can suppress cracking during heating even when the protective layer thickness is extremely small.

產業上之可利用性 本發明偏光板可適合使用於影像顯示裝置。影像顯示裝置可舉例如:攜帶型資訊終端機(PDA)、智慧型手機、行動電話、時鐘、數位相機、可攜式遊戲機等攜帶型機器;電腦螢幕、筆記型電腦、複印機等OA機器;視訊攝影機、電視、微波爐等家庭用電氣機器;後照監測器、汽車導航系統用監測器、汽車音響等車載用機器;數位標牌、商業店鋪用資訊導覽用螢幕等展示機器;監視用螢幕等警報機器;看護用監測器、醫療用監測器等看護醫療機器。Industrial Applicability The polarizing plate of the present invention is suitable for use in image display devices. Examples of such devices include: portable devices such as PDAs, smartphones, mobile phones, clocks, digital cameras, and portable game consoles; office automation equipment such as computer monitors, laptops, and copiers; home appliances such as video cameras, televisions, and microwaves; in-vehicle devices such as rearview cameras, car navigation systems, and car stereos; display devices such as digital signage and store information guide screens; alarm devices such as surveillance screens; and nursing and medical devices such as monitors and medical devices.

10:偏光件 20:第1保護層 30:第2保護層 50:積層體 100:偏光板 110:相位差層、第1相位差層 120:另一相位差層、第2相位差層 130:導電層、附導電層之各向同性基材 200a,200b:附相位差層之偏光板 G1~G4:導輥 R1~R6:輸送輥10: Polarizer 20: First protective layer 30: Second protective layer 50: Laminated body 100: Polarizer 110: Retardation layer, first retardation layer 120: Second retardation layer, second retardation layer 130: Conductive layer, isotropic substrate with conductive layer 200a, 200b: Polarizer with retardation layer G1-G4: Guide rollers R1-R6: Transport rollers

圖1係本發明一實施形態之偏光板的概略截面圖。 圖2係顯示偏光件之製作中使用加熱輥之乾燥收縮處理之一例的概略圖。 圖3係本發明一實施形態之附相位差層之偏光板的概略截面圖。 圖4係本發明一實施形態之附相位差層之偏光板的概略截面圖。 圖5係顯示實施例及比較例所用之偏光件的單體透射率與PVA系樹脂之雙折射之關係的圖。 圖6係顯示實施例及比較例所用之偏光件的單體透射率與PVA系樹脂薄膜之面內相位差之關係的圖。 圖7係顯示實施例及比較例所用之偏光件的單體透射率與PVA系樹脂之定向函數之關係的圖。Figure 1 is a schematic cross-sectional view of a polarizing plate according to an embodiment of the present invention. Figure 2 is a schematic view showing an example of a drying and shrinking process using heated rollers in the production of polarizers. Figure 3 is a schematic cross-sectional view of a polarizing plate with a retardation layer according to an embodiment of the present invention. Figure 4 is a schematic cross-sectional view of a polarizing plate with a retardation layer according to an embodiment of the present invention. Figure 5 is a graph showing the relationship between the single-unit transmittance of polarizers used in Examples and Comparative Examples and the birefringence of PVA-based resins. Figure 6 is a graph showing the relationship between the single-unit transmittance of polarizers used in Examples and Comparative Examples and the in-plane retardation of PVA-based resin films. FIG7 is a graph showing the relationship between the monomer transmittance of the polarizer used in the embodiment and the comparative example and the orientation function of the PVA-based resin.

10:偏光件 10:Polarizer

20:第1保護層 20: First protective layer

30:第2保護層 30: Second protective layer

100:偏光板 100:Polarizing plate

Claims (11)

一種偏光板,具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層; 該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1); y<-0.011x+0.525     (1) 該聚乙烯醇系樹脂之雙折射係將聚乙烯醇系樹脂於波長1000nm下之面內相位差除以偏光件之厚度所得之值; 該偏光件之單體透射率為40.0%以上,且偏光度為99.0%以上; 該偏光件之厚度為10µm以下; 該保護層係以具有1µm以上且3µm以下之厚度的樹脂膜構成; 該樹脂膜係以環氧樹脂之光陽離子硬化物、環氧樹脂之有機溶劑溶液的塗佈膜之固化物或熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物構成; 該樹脂膜之軟化溫度為100℃以上。 A polarizing plate comprises a polarizer formed of a polyvinyl alcohol resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; The polarizer satisfies the following formula (1) when its single body transmittance is x% and the birefringence of the polyvinyl alcohol resin is y; y<-0.011x+0.525     (1) The birefringence of the polyvinyl alcohol resin is a value obtained by dividing the in-plane phase difference of the polyvinyl alcohol resin at a wavelength of 1000 nm by the thickness of the polarizer; The single body transmittance of the polarizer is 40.0% or more and the polarization degree is 99.0% or more; The thickness of the polarizer is 10µm or less; The protective layer is formed of a resin film having a thickness of 1µm or more and 3µm or less; The resin film is composed of a photo-cured epoxy resin, a cured epoxy resin coating film obtained from an organic solvent solution, or a cured thermoplastic (meth)acrylic resin coating film obtained from an organic solvent solution. The resin film has a softening temperature of 100°C or higher. 一種偏光板,具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層; 該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂薄膜於波長1000nm下之面內相位差為znm時,滿足下述式(2); z<-60x+2875         (2) 該偏光件之單體透射率為40.0%以上,且偏光度為99.0%以上; 該偏光件之厚度為10µm以下; 該保護層係以具有1µm以上且3µm以下之厚度的樹脂膜構成; 該樹脂膜係以環氧樹脂之光陽離子硬化物、環氧樹脂之有機溶劑溶液的塗佈膜之固化物或熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物構成; 該樹脂膜之軟化溫度為100℃以上。 A polarizing plate comprises a polarizer formed of a polyvinyl alcohol resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; When the polarizer has a single-body transmittance of x% and an in-plane phase difference of the polyvinyl alcohol resin film at a wavelength of 1000 nm of znm, the polarizer satisfies the following formula (2); z<-60x+2875         (2) The single-body transmittance of the polarizer is 40.0% or more, and the polarization degree is 99.0% or more; The thickness of the polarizer is 10µm or less; The protective layer is formed of a resin film having a thickness of 1µm or more and 3µm or less; The resin film is composed of a photo-cured epoxy resin, a cured epoxy resin coating film obtained from an organic solvent solution, or a cured thermoplastic (meth)acrylic resin coating film obtained from an organic solvent solution. The resin film has a softening temperature of 100°C or higher. 一種偏光板,具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層; 該偏光件在令其單體透射率為x%、且令該聚乙烯醇系樹脂之定向函數為f時,滿足下述式(3); f<-0.018x+1.11     (3) 該偏光件之單體透射率為40.0%以上,且偏光度為99.0%以上; 該偏光件之厚度為10µm以下; 該保護層係以具有1µm以上且3µm以下之厚度的樹脂膜構成; 該樹脂膜係以環氧樹脂之光陽離子硬化物、環氧樹脂之有機溶劑溶液的塗佈膜之固化物或熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物構成; 該樹脂膜之軟化溫度為100℃以上。 A polarizing plate comprises a polarizer formed of a polyvinyl alcohol-based resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; The polarizer satisfies the following formula (3) when its single body transmittance is x% and the orientation function of the polyvinyl alcohol-based resin is f; f<-0.018x+1.11     (3) The single body transmittance of the polarizer is 40.0% or more and the polarization degree is 99.0% or more; The thickness of the polarizer is 10µm or less; The protective layer is formed of a resin film having a thickness of 1µm or more and 3µm or less; The resin film is composed of a photo-cured epoxy resin, a cured epoxy resin coating film obtained from an organic solvent solution, or a cured thermoplastic (meth)acrylic resin coating film obtained from an organic solvent solution. The resin film has a softening temperature of 100°C or higher. 一種偏光板,具有以含二色性物質之聚乙烯醇系樹脂薄膜構成之偏光件與配置於該偏光件之一側的保護層; 該偏光件之穿刺強度為30gf/µm以上; 該偏光件之穿刺強度係指,將前端徑1mmφ、0.5R之針以0.33cm/秒之速度穿刺該偏光件時該偏光件會發生破裂之強度; 該偏光件之單體透射率為40.0%以上,且偏光度為99.0%以上; 該偏光件之厚度為10µm以下; 該保護層係以具有1µm以上且3µm以下之厚度的樹脂膜構成; 該樹脂膜係以環氧樹脂之光陽離子硬化物、環氧樹脂之有機溶劑溶液的塗佈膜之固化物或熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液的塗佈膜之固化物構成; 該樹脂膜之軟化溫度為100℃以上。 A polarizing plate comprising a polarizer formed of a polyvinyl alcohol-based resin film containing a dichroic substance and a protective layer disposed on one side of the polarizer; The polarizer has a puncture strength of 30 gf/µm or greater; The puncture strength of the polarizer is defined as the strength at which the polarizer breaks when a needle with a tip diameter of 1 mmφ and 0.5 R is pierced through the polarizer at a speed of 0.33 cm/sec; The polarizer has a single-element transmittance of 40.0% or greater and a degree of polarization of 99.0% or greater; The polarizer has a thickness of 10 µm or less; The protective layer is formed of a resin film having a thickness of 1 µm or greater and 3 µm or less; The resin film is composed of a photo-cured epoxy resin, a cured epoxy resin coating film obtained from an organic solvent solution, or a cured thermoplastic (meth)acrylic resin coating film obtained from an organic solvent solution. The resin film has a softening temperature of 100°C or higher. 如請求項1至4中任一項之偏光板,其中前述熱塑性(甲基)丙烯酸系樹脂具有選自於由內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元及馬來醯亞胺單元所構成群組中之至少1種。The polarizing plate of any one of claims 1 to 4, wherein the thermoplastic (meth)acrylic resin comprises at least one selected from the group consisting of a lactone ring unit, a glutaric anhydride unit, a glutarimide unit, a maleic anhydride unit, and a maleimide unit. 如請求項1至4中任一項之偏光板,其中前述保護層之碘吸附量為25重量%以下,且該碘吸附量係使用以具有3µm厚度之方式形成於PET薄膜之前述保護層來測定的碘吸附量。A polarizing plate according to any one of claims 1 to 4, wherein the iodine adsorption amount of the protective layer is less than 25 wt %, and the iodine adsorption amount is measured using the protective layer formed on a PET film with a thickness of 3 μm. 如請求項1至4中任一項之偏光板,其係捲繞成捲狀。The polarizing plate of any one of claims 1 to 4, wherein the polarizing plate is wound into a roll. 一種附相位差層之偏光板,包含如請求項1至7中任一項之偏光板與相位差層;且 該相位差層係配置於前述偏光件之與配置有前述保護層之側的相反側。 A polarizing plate with a phase difference layer, comprising the polarizing plate according to any one of claims 1 to 7 and a phase difference layer; wherein the phase difference layer is disposed on the side of the polarizer opposite to the side on which the protective layer is disposed. 如請求項8之附相位差層之偏光板,其中前述相位差層係隔著黏著劑層積層於前述偏光板上。The polarizing plate with a phase difference layer as claimed in claim 8, wherein the phase difference layer is laminated on the polarizing plate via an adhesive layer. 如請求項8或9之附相位差層之偏光板,其中前述相位差層之Re(550)為100nm~190nm,Re(450)/Re(550)為0.8以上且小於1;且 前述相位差層之慢軸與前述偏光件之吸收軸形成之角度為40°~50°。 The polarizing plate with a phase difference layer as claimed in claim 8 or 9, wherein the Re(550) of the phase difference layer is 100 nm to 190 nm, and the Re(450)/Re(550) is greater than 0.8 and less than 1; and the angle formed by the slow axis of the phase difference layer and the absorption axis of the polarizer is 40° to 50°. 一種影像顯示裝置,具備如請求項1至7中任一項之偏光板或如請求項8至10中任一項之附相位差層之偏光板。An image display device comprises the polarizing plate of any one of claims 1 to 7 or the polarizing plate with a phase difference layer of any one of claims 8 to 10.
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