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TWI891861B - Polarizing plate, polarizing plate with phase difference layer, and image display device including the polarizing plate or the polarizing plate with phase difference layer - Google Patents

Polarizing plate, polarizing plate with phase difference layer, and image display device including the polarizing plate or the polarizing plate with phase difference layer

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Publication number
TWI891861B
TWI891861B TW110127551A TW110127551A TWI891861B TW I891861 B TWI891861 B TW I891861B TW 110127551 A TW110127551 A TW 110127551A TW 110127551 A TW110127551 A TW 110127551A TW I891861 B TWI891861 B TW I891861B
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Taiwan
Prior art keywords
polarizer
polarizing plate
resin
phase difference
stretching
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TW110127551A
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Chinese (zh)
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TW202208899A (en
Inventor
高永幸佑
上条卓史
近野洋
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日商日東電工股份有限公司
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Publication of TW202208899A publication Critical patent/TW202208899A/en
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Publication of TWI891861B publication Critical patent/TWI891861B/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/8791Arrangements for improving contrast, e.g. preventing reflection of ambient light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本發明提供一種雖為極薄型卻已抑制住在異形加工部發生裂痕之偏光板。本發明偏光板具有偏光件與配置於偏光件之至少一側的保護層,且具有矩形以外之異形。保護層係以具有10µm以下之厚度的樹脂膜構成。偏光件係以含二色性物質之PVA系樹脂薄膜構成。在一實施形態中,偏光件於令單體透射率為x%、且令PVA系樹脂之雙折射為y時,滿足下述式(1)。在另一實施形態中,偏光件於令單體透射率為x%、且令PVA系樹脂薄膜之面內相位差為znm時,滿足下述式(2)。在又另一實施形態中,偏光件於令單體透射率為x%、且令PVA系樹脂薄膜之定向函數為f時,滿足下述式(3)。在又另一實施形態中,偏光件之穿刺強度為30gf/µm以上。 y<-0.011x+0.525     (1) z<-60x+2875        (2) f<-0.018x+1.11        (3)The present invention provides a polarizing plate that is extremely thin but suppresses cracks in irregularly shaped processed parts. The polarizing plate of the present invention has a polarizer and a protective layer arranged on at least one side of the polarizer, and has an irregular shape other than a rectangle. The protective layer is composed of a resin film having a thickness of less than 10µm. The polarizer is composed of a PVA resin film containing a dichroic substance. In one embodiment, the polarizer satisfies the following formula (1) when the single body transmittance is x% and the birefringence of the PVA resin is y. In another embodiment, the polarizer satisfies the following formula (2) when the single body transmittance is x% and the in-plane phase difference of the PVA resin film is znm. In yet another embodiment, the polarizer satisfies the following formula (3) when the monomer transmittance is x% and the orientation function of the PVA resin film is f. In yet another embodiment, the puncture strength of the polarizer is 30 gf/µm or more. y<-0.011x+0.525     (1) z<-60x+2875        (2) f<-0.018x+1.11        (3)

Description

偏光板、附相位差層之偏光板、以及包含該偏光板或該附相位差層之偏光板的影像顯示裝置Polarizing plate, polarizing plate with phase difference layer, and image display device including the polarizing plate or the polarizing plate with phase difference layer

本發明涉及偏光板、附相位差層之偏光板、以及包含該偏光板或該附相位差層之偏光板的影像顯示裝置。The present invention relates to a polarizing plate, a polarizing plate with a phase difference layer, and an image display device including the polarizing plate or the polarizing plate with a phase difference layer.

發明背景 近年來,以液晶顯示裝置及電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)為代表之影像顯示裝置急速普及。由於影像顯示裝置之影像形成方式,而於影像顯示裝置之至少一側配置有偏光板。近年來,隨著對影像顯示裝置薄型化之需求提高,對偏光板之薄型化需求亦高漲。然而,近年有時會期望將偏光板加工成矩形以外之形狀(異形加工:例如形成缺口及/或貫通孔)。但卻有於薄型偏光板之異形加工部容易發生裂痕之問題。 先前技術文獻 專利文獻Background of the Invention In recent years, image display devices, typified by liquid crystal displays and electroluminescent (EL) displays (e.g., organic EL displays and inorganic EL displays), have rapidly gained popularity. Due to the image formation method of image display devices, a polarizing plate is disposed on at least one side of the image display device. In recent years, with the increasing demand for thinner image display devices, the demand for thinner polarizing plates has also increased. However, in recent years, there has been a desire to process polarizing plates into shapes other than rectangular (special-shaped processing: for example, forming notches and/or through-holes). However, there is a problem that cracks are easily generated in the special-shaped processed portions of thin polarizing plates. Prior Art Patent

專利文獻1:日本專利特開2001-343521號公報Patent document 1: Japanese Patent Publication No. 2001-343521

發明欲解決之課題 本發明係為了解決上述以往之課題而成者,其主要目的在於提供一種雖為極薄型卻已抑制住在異形加工部發生裂痕之偏光板。Problems to be Solved by the Invention This invention was developed to address the aforementioned conventional problems. Its primary purpose is to provide an extremely thin polarizing plate that suppresses cracking in irregularly shaped processed areas.

用以解決課題之手段 本發明一實施形態之偏光板具有偏光件與配置於該偏光件之至少一側的保護層,且具有矩形以外之異形。該保護層係以具有10µm以下之厚度的樹脂膜構成。該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1): y<-0.011x+0.525        (1)。 本發明另一實施形態之偏光板具有偏光件與配置於該偏光件之至少一側的保護層,且具有矩形以外之異形。該保護層係以具有10µm以下之厚度的樹脂膜構成。該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2): z<-60x+2875        (2)。 本發明又另一實施形態之偏光板具有偏光件與配置於該偏光件之至少一側的保護層,且具有矩形以外之異形。該保護層係以具有10µm以下之厚度的樹脂膜構成。該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂之定向函數為f時,滿足下述式(3): f<-0.018x+1.11    (3)。 本發明又另一實施形態之偏光板具有偏光件與配置於該偏光件之至少一側的保護層,且具有矩形以外之異形。該保護層係以具有10µm以下之厚度的樹脂膜構成。該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且偏光件之穿刺強度為30gf/µm以上。 在一實施形態中,上述偏光件之厚度為10µm以下。 在一實施形態中,上述偏光件之單體透射率為40.0%以上,且偏光度為99.0%以上。 在一實施形態中,上述異形係選自於由下述所構成之群組:貫通孔、V字缺口、U字缺口、俯視時呈近似船形之形狀的凹部、俯視時呈矩形之凹部、俯視時呈近似浴缸形狀之R形狀的凹部及該等之組合。 在一實施形態中,上述U字缺口之曲率半徑為5mm以下。 在一實施形態中,上述樹脂膜包含選自環氧樹脂及(甲基)丙烯酸系樹脂中之至少1種樹脂。 在一實施形態中,上述樹脂膜係以環氧樹脂之光陽離子硬化物構成,且該樹脂膜之軟化溫度為100℃以上。 在一實施形態中,上述樹脂膜係以環氧樹脂之有機溶劑溶液之塗佈膜的固化物構成,且該樹脂膜之軟化溫度為100℃以上。 在一實施形態中,上述樹脂膜係以熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液之塗佈膜的固化物構成,且該樹脂膜之軟化溫度為100℃以上。在一實施形態中,上述熱塑性(甲基)丙烯酸系樹脂具有選自於由內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元及馬來醯亞胺單元所構成群組中之至少1種。 根據本發明另一面向提供一種附相位差層之偏光板。該附相位差層之偏光板包含上述偏光板與相位差層;且該相位差層係配置於上述偏光件之與配置有上述保護層之側相反之側。 在一實施形態中,上述相位差層之Re(550)為100nm~190nm,Re(450)/Re(550)為0.8以上且小於1,且該相位差層的慢軸與上述偏光件的吸收軸形成之角度為40°~50°。 在一實施形態中,上述相位差層係透過黏著劑層積層於上述偏光板上。 根據本發明又另一面向提供一種影像顯示裝置。該影像顯示裝置包含上述偏光板或上述附相位差層之偏光板。Means for solving the problem A polarizing plate in one embodiment of the present invention has a polarizer and a protective layer disposed on at least one side of the polarizer, and has an irregular shape other than a rectangle. The protective layer is composed of a resin film having a thickness of 10µm or less. The polarizer is composed of a polyvinyl alcohol-based resin film containing a dichroic substance, and when the single body transmittance is x% and the birefringence of the polyvinyl alcohol-based resin is y, the following formula (1) is satisfied: y<-0.011x+0.525        (1). A polarizing plate in another embodiment of the present invention has a polarizer and a protective layer disposed on at least one side of the polarizer, and has an irregular shape other than a rectangle. The protective layer is composed of a resin film having a thickness of 10µm or less. The polarizer is composed of a polyvinyl alcohol resin film containing a dichroic substance, and when the monomer transmittance is x% and the in-plane phase difference of the polyvinyl alcohol resin film is znm, the following formula (2) is satisfied: z<-60x+2875        (2). In another embodiment of the present invention, a polarizing plate has a polarizer and a protective layer arranged on at least one side of the polarizer, and has an irregular shape other than a rectangle. The protective layer is composed of a resin film having a thickness of less than 10µm. The polarizer is composed of a polyvinyl alcohol resin film containing a dichroic substance, and when the monomer transmittance is x% and the orientation function of the polyvinyl alcohol resin is f, the following formula (3) is satisfied: f<-0.018x+1.11    (3). Yet another embodiment of the present invention provides a polarizing plate having a shape other than rectangular and a protective layer disposed on at least one side of the polarizer. The protective layer is formed from a resin film having a thickness of 10 µm or less. The polarizer is formed from a polyvinyl alcohol-based resin film containing a dichroic substance, and the polarizer has a puncture strength of 30 gf/µm or greater. In one embodiment, the polarizer has a thickness of 10 µm or less. In one embodiment, the polarizer has a single-element transmittance of 40.0% or greater and a degree of polarization of 99.0% or greater. In one embodiment, the irregular shape is selected from the group consisting of a through hole, a V-shaped notch, a U-shaped notch, a recess having a shape similar to a boat when viewed from above, a rectangular notch when viewed from above, an R-shaped notch having a shape similar to a bathtub when viewed from above, and combinations thereof. In one embodiment, the radius of curvature of the U-shaped notch is 5 mm or less. In one embodiment, the resin film comprises at least one resin selected from epoxy resins and (meth)acrylic resins. In one embodiment, the resin film is formed from a photo-cured epoxy resin, and the softening temperature of the resin film is above 100°C. In one embodiment, the resin film is formed from a cured product of a coating film of an epoxy resin in an organic solvent solution, and the softening temperature of the resin film is above 100°C. In another embodiment, the resin film is formed from a cured product of a coating film of a thermoplastic (meth)acrylic resin in an organic solvent solution, and the softening temperature of the resin film is above 100°C. In one embodiment, the thermoplastic (meth)acrylic resin comprises at least one member selected from the group consisting of a lactone ring unit, a glutaric anhydride unit, a glutarimide unit, a maleic anhydride unit, and a maleimide unit. According to another aspect of the present invention, a polarizing plate with a retardation layer is provided. The polarizing plate with a phase difference layer comprises the aforementioned polarizing plate and a phase difference layer; the phase difference layer is disposed on the side of the polarizer opposite to the side on which the protective layer is disposed. In one embodiment, the Re(550) of the phase difference layer is 100 nm to 190 nm, the Re(450)/Re(550) is greater than 0.8 and less than 1, and the angle formed between the slow axis of the phase difference layer and the absorption axis of the polarizer is 40° to 50°. In one embodiment, the phase difference layer is laminated on the polarizing plate via an adhesive layer. According to another aspect of the present invention, an image display device is provided. The image display device comprises the aforementioned polarizing plate or the polarizing plate with a phase difference layer.

發明效果 根據本發明實施形態,藉由對具有異形(異形加工部)之偏光板控制偏光件之聚乙烯醇(PVA)系樹脂之定向狀態,可實現一種雖為極薄型卻已抑制住在異形加工部發生裂痕之偏光板。又,所述偏光件(以結果而言為偏光板)可發揮實際使用上可容許之光學特性。Effects of the Invention According to embodiments of the present invention, by controlling the orientation of the polyvinyl alcohol (PVA)-based resin in the polarizer of a polarizing plate having an irregular shape (an irregularly shaped portion), a polarizing plate can be realized that is extremely thin while suppressing cracking in the irregularly shaped portion. Furthermore, the polarizer (and, consequently, the polarizing plate) exhibits optical properties acceptable for practical use.

以下說明本發明之實施形態,惟本發明不受該等實施形態所限。The following describes the embodiments of the present invention, but the present invention is not limited to these embodiments.

A.偏光板 A-1.偏光板之整體構成 圖1係本發明一實施形態之偏光板的概略截面圖。圖式例之偏光板100具有偏光件10與配置於偏光件10之一側的保護層20。亦可因應目的於偏光件10之與保護層20相反之側設置另一保護層(未圖示)。保護層20係以具有10µm以下之厚度的樹脂膜構成。偏光板可作為影像顯示裝置之視辨側偏光板來使用,亦可作為背面側偏光板來使用。偏光板代表上可作為視辨側偏光板使用。此時,保護層20可配置於視辨側(與影像顯示單元相反之側)。A. Polarizing Plate A-1. Overall Structure of the Polarizing Plate Figure 1 is a schematic cross-sectional view of a polarizing plate according to one embodiment of the present invention. The illustrated polarizing plate 100 comprises a polarizer 10 and a protective layer 20 disposed on one side of the polarizer 10. Depending on the intended purpose, a further protective layer (not shown) may be provided on the side of the polarizer 10 opposite the protective layer 20. The protective layer 20 is formed of a resin film having a thickness of less than 10µm. The polarizing plate can be used as either a viewing-side polarizing plate or a back-side polarizing plate for an image display device. Typically, the polarizing plate is used as a viewing-side polarizing plate. In this case, the protective layer 20 is disposed on the viewing side (the side opposite the image display unit).

本發明實施形態之偏光板具有矩形以外之異形。本說明書中「具有矩形以外之異形」係指偏光板之俯視形狀具有矩形以外之形狀。異形代表上係經異形加工之異形加工部。因此,「具有矩形以外之異形的偏光板」(以下有時稱為「異形偏光板」)不僅包含異形偏光板整體(即,用來規定偏光板之俯視形狀的外緣)為矩形以外之情況,還包含在自矩形偏光板之外緣往內退離之部分形成有異形加工部之情況。以偏光板來說,在所述異形加工部容易發生裂痕,但根據本發明實施形態,可顯著抑制所述裂痕。更詳細如下述。以一般(亦即非異形)偏光板(實質上為偏光件)來說,裂痕大多情況下係沿著偏光件之吸收軸(延伸方向)發生。另一方面,在異形加工部中可能會發生L字裂痕(相對於吸收軸呈斜向之裂痕)。根據本發明實施形態,如後述,藉由使偏光件之PVA系樹脂之分子鏈往吸收軸方向之定向較以往之偏光件更和緩,不僅可顯著抑制一般之裂痕,還可顯著抑制所述L字裂痕。The polarizing plate of the embodiment of the present invention has an irregular shape other than a rectangle. In this specification, "having an irregular shape other than a rectangle" means that the top view shape of the polarizing plate has a shape other than a rectangle. The irregular shape represents an irregularly processed portion. Therefore, "a polarizing plate having an irregular shape other than a rectangle" (hereinafter sometimes referred to as "irregularly processed polarizing plate") not only includes the case where the entire irregularly shaped polarizing plate (i.e., the outer edge used to define the top view shape of the polarizing plate) is other than a rectangle, but also includes the case where an irregularly shaped processed portion is formed on the portion that is retreated inward from the outer edge of the rectangular polarizing plate. In the case of a polarizing plate, cracks are easily generated in the irregularly shaped processed portion, but according to the embodiment of the present invention, the cracks can be significantly suppressed. More details are as follows. In a typical (i.e., non-irregular) polarizing plate (essentially, a polarizer), cracks typically occur along the polarizer's absorption axis (extending direction). However, irregularly processed portions can develop L-shaped cracks (cracks that are diagonal to the absorption axis). According to embodiments of the present invention, as described below, by aligning the molecular chains of the polarizer's PVA resin more gently along the absorption axis than in conventional polarizers, not only typical cracks but also L-shaped cracks can be significantly suppressed.

異形(異形加工部)例如如圖2及圖3所示,可舉將隅部去角成R形狀者、貫通孔、於俯視時呈凹部之切削加工部。凹部之代表例可舉近似船形之形狀、矩形、近似浴缸形狀之R形狀、V字缺口、U字缺口。異形(異形加工部)之另一例如圖4及圖5所示,可舉與汽車之儀表盤對應之形狀。該形狀係外緣形成沿著儀表針之旋轉方向的圓弧狀,且包含外緣形成往面方向內側凸之V字形狀(包含R形狀)之部位。當然,異形(異形加工部)之形狀不限於圖式例。例如,貫通孔之形狀除圖式例之大致圓形外,還可因應目的採用任意適當之形狀(例如橢圓形、三角形、四角形、五角形、六角形、八角形)。且,貫通孔可因應目的設於任意適當之位置。貫通孔可如圖3所示設於矩形偏光板之長邊方向端部的大致中央部,可設於長邊方向端部之預定位置,亦可設於偏光板之隅部;雖未圖示,但可設於矩形偏光板之短邊方向端部;亦可如圖4或圖5所示,設於異形偏光板之中央部。如圖3所示,亦可設置複數個貫通孔。並且可視目的適當組合圖式例之形狀。例如,可於圖2之異形偏光板之任意位置形成貫通孔;亦可於圖4或圖5之異形偏光板之外緣的任意適當位置形成V字缺口及/或U字缺口。所述異形偏光板可適宜用於汽車儀表盤、智慧型手機、平板型PC或智慧手錶等影像顯示裝置。此外,例如異形包含R形狀時,其曲率半徑例如為0.2mm以上,且例如為1mm以上,又例如為2mm以上。另一方面,曲率半徑例如為10mm以下,且例如為5mm以下。又例如,異形為U字缺口時,其曲率半徑(U字部分之曲率半徑)例如為5mm以下,又例如為1mm~4mm,又例如為2mm~3mm。Examples of irregular shapes (irregularly shaped processed parts) include those with chamfered corners into R-shapes, through holes, and cut parts that are concave when viewed from above, as shown in Figures 2 and 3. Representative examples of concave parts include shapes similar to a boat shape, a rectangle, an R-shape similar to a bathtub shape, a V-shaped notch, and a U-shaped notch. Another example of an irregular shape (irregularly shaped processed part) is a shape corresponding to a car instrument panel, as shown in Figures 4 and 5. This shape has an outer edge that forms an arc along the direction of rotation of the instrument needle, and includes a portion where the outer edge forms a V-shape (including an R-shape) that bulges inward in the surface direction. Of course, the shape of the irregular shape (irregularly shaped processed part) is not limited to the examples shown in the figures. For example, in addition to the roughly circular shape shown in the diagram, the through hole can also be any appropriate shape (e.g., elliptical, triangular, quadrilateral, pentagonal, hexagonal, or octagonal) depending on the purpose. Furthermore, the through hole can be located at any appropriate position depending on the purpose. As shown in FIG3 , the through hole can be located approximately in the center of the end portion in the long direction of the rectangular polarizing plate, or can be located at a predetermined position in the long direction of the end portion, or can be located at a corner of the polarizing plate. Although not shown, it can be located at the end portion in the short direction of the rectangular polarizing plate. It can also be located in the center of an irregularly shaped polarizing plate as shown in FIG4 or FIG5 . As shown in FIG3 , multiple through holes can also be provided. Furthermore, the shapes shown in the diagram can be appropriately combined depending on the purpose. For example, a through hole can be formed at any position of the irregular polarizing plate in FIG. 2 ; a V-shaped notch and/or a U-shaped notch can also be formed at any appropriate position on the outer edge of the irregular polarizing plate in FIG. 4 or FIG. 5 . The irregular polarizing plate can be suitably used in image display devices such as automobile dashboards, smart phones, tablet PCs, or smart watches. In addition, for example, when the irregular shape includes an R shape, its curvature radius is, for example, greater than 0.2 mm, and for example, greater than 1 mm, and for example, greater than 2 mm. On the other hand, the curvature radius is, for example, less than 10 mm, and for example, less than 5 mm. For another example, when the irregular shape is a U-shaped notch, its curvature radius (the curvature radius of the U-shaped portion) is, for example, less than 5 mm, and for example, 1 mm to 4 mm, and for example, 2 mm to 3 mm.

異形(異形加工部)可藉由任意適當之方法形成。形成方法之具體例可舉藉由端銑刀進行之切削、利用湯姆遜刀等沖裁刀進行之沖裁、利用雷射光照射進行之切斷。該等方法亦可組合。The irregular shape (irregularly shaped processed portion) can be formed by any appropriate method. Specific examples of the forming method include cutting with an end mill, punching with a punch such as a Thompson cutter, and cutting with laser irradiation. These methods may also be combined.

A-2.偏光件 偏光件係以含二色性物質之PVA系樹脂薄膜構成。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂之雙折射為y時,滿足下述式(1)。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2)。在一實施形態中,偏光件於令單體透射率為x%、且令構成該偏光件之聚乙烯醇系樹脂薄膜之定向函數為f時,滿足下述式(3)。在一實施形態中,偏光件之穿刺強度為30gf/µm以上。 y<-0.011x+0.525     (1) z<-60x+2875         (2) f<-0.018x+1.11      (3)A-2. Polarizer The polarizer is formed of a PVA resin film containing a dichroic substance. In one embodiment, the polarizer satisfies the following equation (1) when the single-element transmittance is x% and the birefringence of the polyvinyl alcohol resin constituting the polarizer is y. In one embodiment, the polarizer satisfies the following equation (2) when the single-element transmittance is x% and the in-plane phase difference of the polyvinyl alcohol resin film constituting the polarizer is znm. In one embodiment, the polarizer satisfies the following equation (3) when the single-element transmittance is x% and the orientation function of the polyvinyl alcohol resin film constituting the polarizer is f. In one embodiment, the puncture strength of the polarizer is 30 gf/µm or greater. y<-0.011x+0.525  (1) z<-60x+2875   (2) f<-0.018x+1.11  (3)

上述偏光件之PVA系樹脂之雙折射(以下表記為PVA之雙折射或PVA之Δn)、PVA系樹脂薄膜之面內相位差(以下表記為「PVA之面內相位差」)、PVA系樹脂之定向函數(以下表記為「PVA之定向函數」)及偏光件之穿刺強度,皆為與構成偏光件之PVA系樹脂之分子鏈的定向度相關之值。具體而言,PVA之雙折射、面內相位差及定向函數可隨著定向度之上升而變成大的值,穿刺強度則可隨著定向度之上升而降低。本發明實施形態之偏光件(亦即滿足上述式(1)~(3)或穿刺強度之偏光件),其PVA系樹脂之分子鏈往吸收軸方向之定向較以往之偏光件更和緩,因此吸收軸方向之加熱收縮便被抑制。結果,所述偏光件(以結果而言為偏光板)雖為極薄型,卻可抑制在異形加工部發生裂痕。又,因所述偏光件(以結果而言為偏光板)之可撓性及彎折耐久性亦佳,故宜可應用於彎曲的影像顯示裝置、較佳可應用於可彎折的影像顯示裝置、更佳可應用於可折疊的影像顯示裝置。以往,定向度低之偏光件難以獲得可容許之光學特性(代表上為單體透射率及偏光度),但本發明實施形態所用之偏光件可兼顧較以往更低之PVA系樹脂之定向度與可容許之光學特性。The birefringence of the PVA resin in the polarizer (hereinafter referred to as PVA birefringence or PVA Δn), the in-plane retardation of the PVA resin film (hereinafter referred to as "PVA in-plane retardation"), the orientation function of the PVA resin (hereinafter referred to as "PVA orientation function"), and the puncture strength of the polarizer are all values related to the degree of orientation of the molecular chains of the PVA resin constituting the polarizer. Specifically, the birefringence, in-plane retardation, and orientation function of PVA increase with increasing orientation, while the puncture strength decreases with increasing orientation. In the polarizer of the embodiment of the present invention (i.e., a polarizer satisfying the above formulas (1) to (3) or the puncture strength), the molecular chain of the PVA-based resin is more gently oriented in the absorption axis direction than in conventional polarizers, thereby suppressing thermal shrinkage in the absorption axis direction. As a result, although the polarizer (or, in other words, a polarizing plate) is extremely thin, cracks can be suppressed in the irregularly processed portion. In addition, because the polarizer (or, in other words, a polarizing plate) has excellent flexibility and bending durability, it is suitable for application in a curved image display device, more preferably in a bendable image display device, and even more preferably in a foldable image display device. In the past, polarizers with low orientation levels struggled to achieve acceptable optical properties (typically, single-element transmittance and polarization). However, the polarizers used in the embodiments of the present invention can achieve both a lower orientation level of PVA-based resin and acceptable optical properties.

偏光件宜滿足下述式(1a)及/或式(2a),較宜滿足下述式(1b)及/或式(2b)。 -0.004x+0.18<y<-0.011x+0.525  (1a) -0.003x+0.145<y<-0.011x+0.520  (1b) -40x+1800<z<-60x+2875  (2a) -30x+1450<z<-60x+2850  (2b)The polarizer preferably satisfies the following formula (1a) and/or formula (2a), and more preferably satisfies the following formula (1b) and/or formula (2b). -0.004x+0.18<y<-0.011x+0.525  (1a) -0.003x+0.145<y<-0.011x+0.520  (1b) -40x+1800<z<-60x+2875  (2a) -30x+1450<z<-60x+2850  (2b)

本說明書中,上述PVA之面內相位差係PVA系樹脂薄膜在23℃、波長1000nm下之面內相位差值。藉由將近紅外線區域設為測定波長,可排除偏光件中之碘吸收的影響,從而可測定相位差。又,上述PVA之雙折射(面內雙折射)係將PVA之面內相位差除以偏光件之厚度所得之值。In this specification, the in-plane retardation of PVA is the in-plane retardation value of the PVA resin film at 23°C and a wavelength of 1000 nm. By setting the measurement wavelength in the near-infrared region, the influence of iodine absorption in the polarizer is eliminated, thus enabling retardation measurement. Furthermore, the birefringence (in-plane birefringence) of PVA is the value obtained by dividing the in-plane retardation of PVA by the thickness of the polarizer.

PVA之面內相位差係如下述進行評估。首先,以複數個波長850nm以上之波長測定相位差值,並將測定之相位差值:R(λ)與波長:λ進行繪圖,將其用最小平方法擬合至下述色邁耶爾(Sellmeier)公式。在此,A及B為擬合參數,係利用最小平方法決定之係數。 R(λ)=A+B/(λ2 -6002 ) 此時,該相位差值R(λ)可以下述方式分離成無波長依存性之PVA的面內相位差(Rpva)與波長依存性強之碘的面內相位差值(Ri)。 Rpva=A Ri=B/(λ2 -6002 ) 根據該分離式,可算出PVA在波長λ=1000nm下之面內相位差(亦即Rpva)。此外,關於該PVA之面內相位差之評估方法,亦記載於日本專利第5932760號公報中,可因應需要參照。 又,將該相位差除以厚度,藉此可算出PVA之雙折射(Δn)。The in-plane retardation of PVA is evaluated as follows. First, the retardation values are measured at multiple wavelengths above 850 nm. The measured retardation values, R(λ), are plotted against the wavelength, λ, and then fitted to the following Sellmeier equation using the least squares method. Here, A and B are fitting parameters, coefficients determined using the least squares method. R(λ) = A + B / (λ 2 - 600 2 ) At this point, the retardation value R(λ) can be separated as follows into the in-plane retardation of PVA (Rpva), which has no wavelength dependence, and the in-plane retardation value of iodine (Ri), which has a strong wavelength dependence. Rpva = A Ri = B / (λ 2 - 600 2 ) Based on this separation formula, the in-plane retardation of PVA at a wavelength of λ = 1000 nm (i.e., Rpva) can be calculated. Furthermore, the evaluation method for the in-plane phase difference of PVA is also described in Japanese Patent No. 5932760, which can be referred to as needed. Furthermore, the birefringence (Δn) of the PVA can be calculated by dividing the phase difference by the thickness.

用以測定上述PVA在波長1000nm下之面內相位差的市售裝置,可舉王子計測公司製之KOBRA-WR/IR系列、KOBRA-31X/IR系列等。Commercially available devices for measuring the in-plane retardation of the above-mentioned PVA at a wavelength of 1000 nm include the KOBRA-WR/IR series and KOBRA-31X/IR series manufactured by Oji Instruments.

偏光件之定向函數(f)宜滿足下述式(3a),較宜滿足下述式(3b)。定向函數若過小,有無法獲得可容許之單體透射率及/或偏光度之情形。 -0.01x+0.50<f<-0.018x+1.11   (3a) -0.01x+0.57<f<-0.018x+1.1    (3b)The orientation function (f) of the polarizer should preferably satisfy the following formula (3a), and more preferably satisfy the following formula (3b). If the orientation function is too small, it may be impossible to obtain an acceptable single-element transmittance and/or polarization degree. -0.01x+0.50<f<-0.018x+1.11   (3a) -0.01x+0.57<f<-0.018x+1.1    (3b)

定向函數(f)例如係用傅立葉轉換紅外光譜光度計(FT-IR)並以偏光作為測定光,藉由衰減全反射分光(ATR:attenuated total reflection)測定來求得。具體而言,用以使偏光件密著之微晶係使用鍺,測定光之入射角設為45°入射,且令欲入射之經偏光的紅外線(測定光)為平行於使鍺結晶試樣密著的面而振動之偏光(s偏光),並在將偏光件之延伸方向相對於測定光之偏光方向作平行及垂直配置之狀態下實施測定,然後使用所得吸光度光譜之2941cm-1 的強度,依下述式算出。在此,強度I係以3330cm-1 為參考波峰,而為2941cm-1 /3330cm-1 之值。另外,f=1時為完全定向,f=0時為無規。又,吾等認為2941cm-1 之波峰為起因於偏光件中之PVA主鏈(-CH2 -)振動的吸收。 f=(3<cos2 θ>-1)/2 =(1-D)/[c(2D+1)] =-2×(1-D)/(2D+1) 惟, 當c=(3cos2 β-1)/2且為2941cm-1 之振動時,β=90°。 θ:分子鏈相對於延伸方向之角度 β:躍遷偶極矩相對於分子鏈軸之角度 D=(I )/(I// )  (此時,PVA分子越定向,D越大) I :測定光之偏光方向與偏光件之延伸方向呈垂直時之吸收強度 I// :測定光之偏光方向與偏光件之延伸方向呈平行時之吸收強度The orientation function (f) is determined, for example, by attenuated total reflection (ATR) spectroscopy using a Fourier transform infrared spectrophotometer (FT-IR) with polarized light as the measurement light. Specifically, the microcrystals used to bond the polarizer are germanium, the measurement light is incident at an angle of 45°, and the incident polarized infrared light (measurement light) is polarized parallel to the surface of the germanium crystal sample to be bonded (s-polarized light). Measurements are performed with the polarizer extending in both parallel and perpendicular directions to the polarization direction of the measurement light. The intensity at 2941 cm -1 in the resulting absorbance spectrum is then used to calculate the orientation function according to the following formula. Here, intensity I is referenced to the peak at 3330 cm -1 and is calculated as 2941 cm -1 /3330 cm -1 . Furthermore, f = 1 indicates perfect alignment, while f = 0 indicates random alignment. Furthermore, we believe the peak at 2941 cm -1 is due to absorption from the ( -CH2- ) vibration of the PVA main chain in the polarizer. f = (3 < cos2θ > -1)/2 = (1-D)/[c(2D+1)] = -2 × (1-D)/(2D+1). However, when c = ( 3cos2β -1)/2 and the vibration at 2941 cm -1 is β = 90°. θ: The angle of the molecular chain relative to the extension direction β: The angle of the transition dipole moment relative to the molecular chain axis D = (I ) / (I // ) (At this time, the more oriented the PVA molecules are, the larger D is) I : The absorption intensity when the polarization direction of the measured light is perpendicular to the extension direction of the polarizer I // : The absorption intensity when the polarization direction of the measured light is parallel to the extension direction of the polarizer

偏光件之厚度宜為10µm以下,較宜為8µm以下。偏光件之厚度的下限例如可為1µm。偏光件之厚度在一實施形態中亦可為2µm~10µm,在另一實施形態中亦可為2µm~8µm。藉由使偏光件之厚度如所述般非常薄,可使熱收縮變得非常小。推測所述構成亦有助於抑制偏光板在異形加工部發生裂痕。The thickness of the polarizer is preferably 10µm or less, more preferably 8µm or less. The lower limit of the polarizer thickness can be, for example, 1µm. In one embodiment, the thickness of the polarizer can be 2µm to 10µm, and in another embodiment, it can be 2µm to 8µm. By making the polarizer very thin as described, thermal shrinkage can be minimized. This configuration is also believed to help prevent cracking in irregularly shaped areas of the polarizer.

偏光件宜在波長380nm~780nm之任一波長下顯示吸收二色性。偏光件之單體透射率宜為40.0%以上,較宜為41.0%以上。單體透射率之上限例如可為49.0%。偏光件之單體透射率在一實施形態中為40.0%~45.0%。偏光件之偏光度宜為99.0%以上,較宜為99.4%以上。偏光度之上限例如可為99.999%。偏光件之偏光度在一實施形態中為99.0%~99.9%。本發明實施形態之偏光件之一特徵在於:即便構成該偏光件之PVA系樹脂之定向度較以往更低,且具有如上述之面內相位差、雙折射及/或定向函數,仍可實現所述之實際使用上可容許之單體透射率及偏光度。吾等推測其係因後述之製造方法所致。此外,單體透射率代表上係使用紫外線可見光分光光度計來測定並進行視感度校正所得之Y值。偏光度代表上可基於使用紫外線可見光分光光度計測定並進行視感度校正所得之平行透射率Tp及正交透射率Tc,透過下述式來求得。 偏光度(%)={(Tp-Tc)/(Tp+Tc)}1 /2 ×100The polarizer preferably exhibits absorption dichroism at any wavelength between 380 nm and 780 nm. The single-element transmittance of the polarizer is preferably 40.0% or greater, more preferably 41.0% or greater. The upper limit of the single-element transmittance may be, for example, 49.0%. In one embodiment, the single-element transmittance of the polarizer is 40.0% to 45.0%. The polarization degree of the polarizer is preferably 99.0% or greater, more preferably 99.4% or greater. The upper limit of the polarization degree may be, for example, 99.999%. In one embodiment, the polarization degree of the polarizer is 99.0% to 99.9%. One of the characteristics of the polarizer of the embodiment of the present invention is that even if the orientation degree of the PVA-based resin constituting the polarizer is lower than before and has the in-plane phase difference, birefringence and/or orientation function as described above, the monomer transmittance and polarization degree that are allowable in practical use can still be achieved. We speculate that this is due to the manufacturing method described later. In addition, the monomer transmittance is represented by the Y value obtained by measuring and correcting the visual sensitivity using an ultraviolet-visible spectrophotometer. The polarization degree can be obtained by the following formula based on the parallel transmittance Tp and the orthogonal transmittance Tc obtained by measuring and correcting the visual sensitivity using an ultraviolet-visible spectrophotometer. Polarization degree (%) = {(Tp-Tc)/(Tp+Tc)} 1 /2 ×100

偏光件之穿刺強度例如為30gf/µm以上,且宜為35gf/µm以上,較宜為40gf/µm以上,更宜為45gf/µm以上,尤宜為50gf/µm以上。穿刺強度之上限例如可為80gf/µm。藉由將偏光件之穿刺強度設為所述範圍,可顯著抑制在異形加工部發生裂痕及偏光件沿吸收軸方向裂開。結果可獲得撓曲性非常優異之偏光件(以結果而言為偏光板)。穿刺強度係表示以預定強度穿刺偏光件時偏光件的抗破裂耐性。穿刺強度例如可以下述強度來表示:於壓縮試驗機裝設預定之針並將該針以預定速度向偏光件穿刺時偏光件破裂之強度(斷裂強度)。此外,從單位可明顯知道,穿刺強度意指偏光件之每單位厚度(1µm)的穿刺強度。The puncture strength of the polarizer is, for example, 30 gf/µm or more, preferably 35 gf/µm or more, more preferably 40 gf/µm or more, more preferably 45 gf/µm or more, and particularly preferably 50 gf/µm or more. The upper limit of the puncture strength can be, for example, 80 gf/µm. By setting the puncture strength of the polarizer to the above range, the occurrence of cracks in the irregularly processed portion and the splitting of the polarizer along the absorption axis can be significantly suppressed. As a result, a polarizer (in other words, a polarizing plate) with very excellent flexibility can be obtained. The puncture strength indicates the polarizer's resistance to cracking when the polarizer is punctured with a predetermined strength. Puncture strength can be expressed, for example, as the strength required to break a polarizer when a predetermined needle is inserted into the polarizer at a predetermined speed in a compression tester (breaking strength). Furthermore, as is apparent from the unit, puncture strength refers to the puncture strength per unit thickness (1µm) of the polarizer.

偏光件如上述係以含二色性物質之PVA系樹脂薄膜構成。宜為構成PVA系樹脂薄膜(實質上為偏光件)之PVA系樹脂包含經乙醯乙醯基改質之PVA系樹脂。若為所述構成,便可獲得具有所期望之穿刺強度的偏光件。當令PVA系樹脂整體為100重量%時,經乙醯乙醯基改質之PVA系樹脂之摻混量宜為5重量%~20重量%,較宜為8重量%~12重量%。摻混量若在所述範圍內,便可將穿刺強度設為更適宜之範圍。As described above, the polarizer is formed from a PVA-based resin film containing a dichroic substance. The PVA-based resin forming the PVA-based resin film (essentially the polarizer) preferably includes a PVA-based resin modified with an acetyl group. With this configuration, a polarizer having the desired puncture strength can be obtained. When the total weight of the PVA-based resin is 100%, the blending amount of the acetyl-based resin modified with an acetyl group is preferably 5% to 20% by weight, more preferably 8% to 12% by weight. When the blending amount is within this range, the puncture strength can be set to a more suitable range.

偏光件在代表上可使用兩層以上之積層體來製作。使用積層體獲得之偏光件的具體例,可舉出使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層的積層體而獲得之偏光件。使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體而得之偏光件,例如可藉由以下步驟來製作:將PVA系樹脂溶液塗佈於樹脂基材並使其乾燥,於樹脂基材上形成PVA系樹脂層,而獲得樹脂基材與PVA系樹脂層之積層體;及,將該積層體延伸及染色,以將PVA系樹脂層製成偏光件。本實施形態中,宜於樹脂基材之單側形成含鹵化物與聚乙烯醇系樹脂之聚乙烯醇系樹脂層。延伸在代表上包含使積層體浸漬於硼酸水溶液中來延伸。並且,延伸宜更包含下述步驟:在硼酸水溶液中延伸之前,在高溫(例如95℃以上)下將積層體進行空中延伸。本發明實施形態中,延伸之總倍率宜為3.0倍~4.5倍,與一般相較下顯著較小。即便為所述延伸之總倍率,藉由添加鹵化物及乾燥收縮處理之組合,可獲得具有可容許之光學特性之偏光件。並且,本發明實施形態中,空中輔助延伸之延伸倍率宜大於硼酸水中延伸之延伸倍率。藉由製成所述構成,即便延伸之總倍率小,仍可獲得具有可容許之光學特性之偏光件。並且,積層體宜供於一邊沿長邊方向輸送一邊進行加熱藉此使其於寬度方向收縮2%以上之乾燥收縮處理。在一實施形態中,偏光件之製造方法包含對積層體依序施行空中輔助延伸處理、染色處理、水中延伸處理及乾燥收縮處理。藉由導入輔助延伸,即使是在將PVA系樹脂塗佈於熱塑性樹脂上之情況下仍可提升PVA系樹脂之結晶性,而可達成高光學特性。又,同時事先提高PVA系樹脂之定向性,可防止在之後的染色步驟或延伸步驟中浸漬於水中時,PVA系樹脂之定向性降低或溶解等問題,而可達成高光學特性。並且,將PVA系樹脂層浸漬於液體中時,相較於PVA系樹脂層不含鹵化物之情況,更能抑制聚乙烯醇分子之定向紊亂及定向性之降低。藉此,可提升經由染色處理及水中延伸處理等將積層體浸漬於液體中來進行的處理步驟而得之偏光件的光學特性。並且,透過乾燥收縮處理使積層體於寬度方向收縮,可提升光學特性。所得樹脂基材/偏光件之積層體可直接使用(即,亦可將樹脂基材作為偏光件之保護層),亦可從樹脂基材/偏光件之積層體剝離樹脂基材並於該剝離面積層因應目的之任意適當的保護層後來使用。關於偏光件之製造方法的詳細內容將於A-3項說明。Polarizers are typically manufactured using a laminate of two or more layers. A specific example of a polarizer using a laminate is a laminate comprising a resin substrate and a PVA-based resin layer coated on the resin substrate. A polarizer formed using a laminate comprising a resin substrate and a PVA-based resin layer coated on the resin substrate can be produced, for example, by the following steps: applying a PVA-based resin solution to the resin substrate and drying it to form a PVA-based resin layer on the resin substrate to obtain a laminate of the resin substrate and the PVA-based resin layer; and stretching and dyeing the laminate to form the polarizer. In this embodiment, a polyvinyl alcohol-based resin layer containing a halogenated compound and a polyvinyl alcohol-based resin is preferably formed on one side of the resin substrate. Stretching typically includes immersing the laminate in an aqueous boric acid solution. Furthermore, the stretching preferably further includes the following step: stretching the laminate in the air at a high temperature (e.g., above 95°C) before stretching in the boric acid aqueous solution. In the embodiment of the present invention, the total stretching ratio is preferably 3.0 to 4.5 times, which is significantly smaller than the general ratio. Even with the total stretching ratio, a polarizer with acceptable optical properties can be obtained by combining the addition of halides and dry shrinkage treatment. Furthermore, in the embodiment of the present invention, the stretching ratio of the air-assisted stretching is preferably greater than the stretching ratio of the stretching in boric acid water. By making the above-mentioned structure, a polarizer with acceptable optical properties can be obtained even if the total stretching ratio is small. Furthermore, the laminate is preferably subjected to a drying and shrinking treatment in which the laminate is heated while being transported along its longitudinal direction, thereby shrinking the laminate by more than 2% in its width direction. In one embodiment, the method for manufacturing a polarizer comprises sequentially subjecting the laminate to an air-assisted stretching treatment, a dyeing treatment, an underwater stretching treatment, and a drying and shrinking treatment. By introducing the auxiliary stretching, the crystallinity of the PVA resin can be improved even when the PVA resin is coated on a thermoplastic resin, thereby achieving high optical properties. Furthermore, by simultaneously improving the orientation of the PVA resin in advance, problems such as a reduction in orientation or dissolution of the PVA resin when immersed in water during the subsequent dyeing or stretching steps can be prevented, thereby achieving high optical properties. Furthermore, immersing the PVA resin layer in a liquid can further suppress the orientational disorder of the polyvinyl alcohol molecules and the reduction of their orientation compared to a PVA resin layer without halides. This can improve the optical properties of polarizers produced through treatments such as dyeing and underwater stretching, where the laminate is immersed in a liquid. Furthermore, shrinking the laminate in the width direction during drying and shrinking can further enhance optical properties. The resulting resin substrate/polarizer laminate can be used directly (i.e., the resin substrate can also be used as a protective layer for the polarizer), or the resin substrate can be peeled off from the resin substrate/polarizer laminate and then used after applying any appropriate protective layer to the peeled-off area. Details of the polarizer manufacturing method are described in Section A-3.

A-3.偏光件之製造方法 上述偏光件之製造方法宜包含以下步驟:於長條狀熱塑性樹脂基材之單側形成含鹵化物與聚乙烯醇系樹脂(PVA系樹脂)之聚乙烯醇系樹脂層(PVA系樹脂層),而製成積層體;及,對積層體依序施行空中輔助延伸處理、染色處理、水中延伸處理及乾燥收縮處理,該乾燥收縮處理係將積層體一邊沿長邊方向輸送一邊加熱,藉此使其於寬度方向收縮2%以上。PVA系樹脂層中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。乾燥收縮處理宜使用加熱輥進行處理,且加熱輥之溫度宜為60℃~120℃。積層體在乾燥收縮處理下之寬度方向之收縮率宜為2%以上。並且,空中輔助延伸之延伸倍率宜大於水中延伸之延伸倍率。根據所述製造方法可獲得在上述A-2項所說明之偏光件。尤其是藉由下述方式可獲得具有優異光學特性(代表上為單體透射率及偏光度)之偏光件:製作包含含有鹵化物之PVA系樹脂層的積層體後,將上述積層體之延伸進行包含空中輔助延伸及水中延伸的多階段延伸,再將延伸後之積層體以加熱輥進行加熱使其於寬度方向收縮2%以上。A-3. Polarizer Manufacturing Method The polarizer manufacturing method preferably includes the following steps: forming a polyvinyl alcohol resin layer (PVA resin layer) containing a halogenated compound and a polyvinyl alcohol resin (PVA resin) on one side of a long thermoplastic resin substrate to form a laminate; and sequentially subjecting the laminate to an air-assisted stretching treatment, a dyeing treatment, an underwater stretching treatment, and a drying and shrinking treatment. The drying and shrinking treatment involves heating the laminate while conveying it longitudinally, thereby shrinking it by at least 2% in the width direction. The halogenated compound content in the PVA resin layer is preferably 5 to 20 parts by weight per 100 parts by weight of the PVA resin. The drying and shrinking treatment is preferably performed using heated rollers at a temperature of 60°C to 120°C. The shrinkage rate of the laminate in the width direction during the drying and shrinking treatment is preferably no less than 2%. Furthermore, the stretching ratio during the air-assisted stretching is preferably greater than the stretching ratio during the underwater stretching. The polarizer described in Section A-2 above can be obtained using the aforementioned manufacturing method. In particular, a polarizer with excellent optical properties (represented by single-unit transmittance and polarization degree) can be obtained by the following method: after producing a laminate including a PVA-based resin layer containing a halogenated compound, the laminate is stretched through a multi-stage stretching process including air-assisted stretching and underwater stretching, and the stretched laminate is then heated with a heating roller to shrink it by more than 2% in the width direction.

A-3-1.積層體之製作 製作熱塑性樹脂基材與PVA系樹脂層之積層體的方法可採用任意適當之方法。宜將含鹵化物與PVA系樹脂之塗佈液塗佈於熱塑性樹脂基材之表面並乾燥,藉此於熱塑性樹脂基材上形成PVA系樹脂層。如上述,PVA系樹脂層中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。A-3-1. Laminated Product Preparation Any appropriate method can be used to prepare a laminate of a thermoplastic resin substrate and a PVA-based resin layer. A coating solution containing a halogenated compound and a PVA-based resin is preferably applied to the surface of the thermoplastic resin substrate and dried to form the PVA-based resin layer on the thermoplastic resin substrate. As mentioned above, the halogenated compound content in the PVA-based resin layer is preferably 5 to 20 parts by weight per 100 parts by weight of the PVA-based resin.

塗佈液之塗佈方法可採用任意適當的方法。例如可舉出輥塗法、旋塗法、線棒塗佈法、浸塗法、模塗法、簾塗法、噴塗法、刮刀式塗佈法(缺角輪塗佈法等)等。上述塗佈液之塗佈、乾燥溫度宜為50℃以上。The coating liquid can be applied by any appropriate method. Examples include roll coating, spin coating, wire rod coating, dip coating, die coating, curtain coating, spray coating, and doctor blade coating (e.g., notched wheel coating). The application and drying temperature of the coating liquid should preferably be above 50°C.

PVA系樹脂層之厚度宜為2µm~30µm,更宜為2µm~20µm。藉由使延伸前之PVA系樹脂層之厚度如所述般非常薄且如後述縮小延伸之總倍率,可獲得即便PVA系樹脂之定向度較以往更低卻具有可容許之單體透射率及偏光度之偏光件。The thickness of the PVA resin layer is preferably 2µm to 30µm, more preferably 2µm to 20µm. By making the thickness of the PVA resin layer very thin before stretching as described above and reducing the total stretching ratio as described below, a polarizer with acceptable monomer transmittance and polarization degree can be obtained even though the PVA resin has a lower degree of orientation than conventional polarizers.

在形成PVA系樹脂層之前,可對熱塑性樹脂基材施行表面處理(例如電暈處理等),也可於熱塑性樹脂基材上形成易接著層。藉由進行所述處理,可提升熱塑性樹脂基材與PVA系樹脂層之密著性。Before forming the PVA resin layer, the thermoplastic resin substrate may be subjected to a surface treatment (e.g., corona treatment) or a bonding layer may be formed on the thermoplastic resin substrate. Such treatments can enhance the adhesion between the thermoplastic resin substrate and the PVA resin layer.

A-3-1-1.熱塑性樹脂基材 熱塑性樹脂基材可採用任意適當的熱塑性樹脂薄膜。關於熱塑性樹脂薄膜基材的詳細內容,例如記載於日本專利特開2012-73580號公報中。本說明書中係援用該公報整體之記載作為參考。A-3-1-1. Thermoplastic Resin Substrate The thermoplastic resin substrate can be any suitable thermoplastic resin film. Details regarding thermoplastic resin film substrates are described, for example, in Japanese Patent Publication No. 2012-73580. This publication is incorporated herein by reference in its entirety.

A-3-1-2.塗佈液 塗佈液係如上述包含鹵化物與PVA系樹脂。上述塗佈液代表上係使上述鹵化物及上述PVA系樹脂溶解於溶劑而成之溶液。作為溶劑,可舉例如水、二甲基亞碸、二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮、各種甘醇類、三羥甲丙烷等多元醇類、伸乙二胺、二伸乙三胺等胺類。該等可單獨使用或可組合二種以上來使用。該等中又以水為佳。溶液之PVA系樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於熱塑性樹脂基材之均勻的塗佈膜。塗佈液中之鹵化物之含量相對於PVA系樹脂100重量份宜為5重量份~20重量份。A-3-1-2. Coating Liquid The coating liquid comprises the halogenated compound and the PVA-based resin as described above. The coating liquid is typically a solution of the halogenated compound and the PVA-based resin dissolved in a solvent. Examples of the solvent include water, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, various glycols, polyols such as trihydroxymethylpropane, and amines such as ethylenediamine and diethylenetriamine. These solvents may be used alone or in combination. Water is preferred. The PVA-based resin concentration in the solution is preferably 3 to 20 parts by weight per 100 parts by weight of the solvent. At this resin concentration, a uniform coating film can be formed that adheres closely to the thermoplastic resin substrate. The halogen content in the coating solution is preferably 5 to 20 parts by weight relative to 100 parts by weight of the PVA resin.

塗佈液中亦可摻混添加劑。添加劑可舉例如塑化劑、界面活性劑等。塑化劑可舉例如乙二醇或甘油等多元醇。界面活性劑可舉例如非離子界面活性劑。該等可為了更提升所得PVA系樹脂層的均勻性或染色性、延伸性而使用。Additives may also be added to the coating liquid. Examples of additives include plasticizers and surfactants. Plasticizers include polyols such as ethylene glycol and glycerin. Surfactants include non-ionic surfactants. These additives can be used to further enhance the uniformity, dyeability, and extensibility of the resulting PVA-based resin layer.

上述PVA系樹脂可採用任意適當的樹脂。可舉例如聚乙烯醇及乙烯-乙烯醇共聚物。聚乙烯醇可藉由將聚乙酸乙烯酯皂化而得。乙烯-乙烯醇共聚物可藉由將乙烯-乙酸乙烯酯共聚物皂化而得。PVA系樹脂之皂化度通常為85莫耳%~100莫耳%,宜為95.0莫耳%~99.95莫耳%,更宜為99.0莫耳%~99.93莫耳%。皂化度可依循JIS K 6726-1994而求得。藉由使用所述皂化度之PVA系樹脂,可獲得耐久性優異之偏光件。皂化度過高時,會有膠化之虞。如上述,PVA系樹脂宜包含經乙醯乙醯基改質之PVA系樹脂。The above-mentioned PVA resin can adopt any appropriate resin. For example, polyvinyl alcohol and ethylene-vinyl alcohol copolymer can be mentioned. Polyvinyl alcohol can be obtained by saponifying polyvinyl acetate. Ethylene-vinyl alcohol copolymer can be obtained by saponifying ethylene-vinyl acetate copolymer. The saponification degree of PVA resin is generally 85 mol%~100 mol%, preferably 95.0 mol%~99.95 mol%, and more preferably 99.0 mol%~99.93 mol%. The saponification degree can be obtained in accordance with JIS K 6726-1994. By using a PVA resin with the above-mentioned saponification degree, a polarizer with excellent durability can be obtained. When the saponification degree is too high, there is a risk of gelling. As mentioned above, the PVA resin preferably includes a PVA resin modified with an acetyl group.

PVA系樹脂的平均聚合度可按目的適當選擇。平均聚合度通常為1000~10000,宜為1200~4500,更宜為1500~4300。此外,平均聚合度可依循JIS K 6726-1994而求得。The average degree of polymerization of PVA-based resins can be appropriately selected depending on the intended purpose. It is generally between 1,000 and 10,000, preferably between 1,200 and 4,500, and more preferably between 1,500 and 4,300. The average degree of polymerization can be determined in accordance with JIS K 6726-1994.

上述鹵化物可採用任意適當之鹵化物。可舉例如碘化物及氯化鈉。碘化物可舉例如碘化鉀、碘化鈉及碘化鋰。該等之中又以碘化鉀為佳。Any suitable halide may be used as the halide. Examples include iodide and sodium chloride. Examples of iodides include potassium iodide, sodium iodide, and lithium iodide. Among these, potassium iodide is preferred.

塗佈液中之鹵化物之量相對於PVA系樹脂100重量份宜為5重量份~20重量份,較佳為相對於PVA系樹脂100重量份為10重量份~15重量份。若鹵化物之量相對於PVA系樹脂100重量份為大於20重量份,則會有鹵化物溢出而使最後所得偏光件變白濁之情形。The amount of halogenated compound in the coating solution should be 5 to 20 parts by weight, more preferably 10 to 15 parts by weight, relative to 100 parts by weight of the PVA resin. If the amount of halogenated compound exceeds 20 parts by weight, the halogenated compound may overflow, resulting in a cloudy white appearance in the resulting polarizer.

一般而言,PVA系樹脂層經延伸,PVA樹脂層中之聚乙烯醇分子之定向性會變高,但若將延伸後之PVA系樹脂層浸漬於含水之液體中,則有聚乙烯醇分子之定向紊亂而定向性降低之情形。尤其是在對熱塑性樹脂基材與PVA系樹脂層之積層體進行硼酸水中延伸時,為了使熱塑性樹脂基材之延伸穩定而在相對較高溫度下將上述積層體在硼酸水中進行延伸時,上述定向度降低之傾向很明顯。舉例而言,PVA薄膜單體在硼酸水中之延伸一般係在60℃下進行,相對於此,A-PET(熱塑性樹脂基材)與PVA系樹脂層之積層體之延伸係在70℃前後之溫度的較高溫度下進行,此時,延伸初始之PVA的定向性會在藉由水中延伸而上升之前的階段便降低。對此,藉由製作含鹵化物之PVA系樹脂層與熱塑性樹脂基材之積層體,並將積層體於在硼酸水中進行延伸前在空氣中進行高溫延伸(輔助延伸),可促進輔助延伸後之積層體之PVA系樹脂層中的PVA系樹脂之結晶化。結果,在將PVA系樹脂層浸漬於液體中時,相較於PVA系樹脂層不含鹵化物之情況,更能抑制聚乙烯醇分子之定向紊亂及定向性降低。藉此,可提升經由染色處理及水中延伸處理等將積層體浸漬於液體中來進行的處理步驟而得之偏光件的光學特性。Generally speaking, after stretching a PVA resin layer, the orientation of the polyvinyl alcohol molecules within the PVA resin layer increases. However, if the stretched PVA resin layer is immersed in an aqueous solution, the orientation of the polyvinyl alcohol molecules may become disrupted, and this orientation may decrease. This tendency to decrease orientation is particularly pronounced when stretching a laminate of a thermoplastic resin substrate and a PVA resin layer in boric acid water at relatively high temperatures to stabilize the stretching of the thermoplastic resin substrate. For example, stretching of a PVA film monomer in boric acid water is typically performed at 60°C. In contrast, stretching of a laminate composed of an A-PET (thermoplastic resin substrate) and a PVA-based resin layer is performed at a higher temperature, around 70°C. At this temperature, the orientation of the PVA at the beginning of stretching decreases before it is elevated by stretching in water. To address this issue, by preparing a laminate composed of a halogenated PVA-based resin layer and a thermoplastic resin substrate and stretching the laminate at a high temperature in air (assisted stretching) before stretching in boric acid water, crystallization of the PVA-based resin in the PVA-based resin layer of the laminate after assisted stretching can be promoted. As a result, when the PVA resin layer is immersed in a liquid, the orientation disorder and reduction of the polyvinyl alcohol molecules are suppressed compared to the case where the PVA resin layer does not contain halides. This can improve the optical properties of polarizers produced through treatment steps such as dyeing and underwater stretching, where the laminate is immersed in a liquid.

A-3-2.空中輔助延伸處理 尤其為了獲得高光學特性,會選擇組合乾式延伸(輔助延伸)與硼酸水中延伸之2段延伸之方法。如2段延伸之方式,藉由導入輔助延伸,可一邊抑制熱塑性樹脂基材之結晶化一邊進行延伸。並且,在將PVA系樹脂塗佈於熱塑性樹脂基材上時,為了抑制熱塑性樹脂基材之玻璃轉移溫度之影響,必須使塗佈溫度比將PVA系樹脂塗佈於一般的金屬滾筒上之情況更低,結果會發生PVA系樹脂之結晶化相對變低而無法獲得充分光學特性之問題。對此,藉由導入輔助延伸,即使是在將PVA系樹脂塗佈於熱塑性樹脂上之情況下仍可提升PVA系樹脂之結晶性,而可達成高光學特性。又,同時事先提高PVA系樹脂之定向性,可防止在之後的染色步驟或延伸步驟中浸漬於水中時,PVA系樹脂之定向性降低或溶解等問題,而可達成高光學特性。A-3-2. Air-Assisted Stretching In particular, to achieve high optical properties, a two-stage stretching method combining dry stretching (assisted stretching) and stretching in boric acid water is often used. In this two-stage stretching method, the introduction of the auxiliary stretching allows stretching to be performed while suppressing crystallization of the thermoplastic resin substrate. Furthermore, when coating PVA resin on a thermoplastic resin substrate, the coating temperature must be lower than when coating PVA resin on a conventional metal roller to minimize the effect of the thermoplastic resin substrate's glass transition temperature. This results in a relatively slow crystallization of the PVA resin, preventing the achievement of sufficient optical properties. By introducing assisted stretching, the crystallinity of the PVA resin can be enhanced even when it is coated on a thermoplastic resin, achieving high optical properties. Furthermore, by pre-enhancing the orientation of the PVA resin, problems such as loss of orientation or dissolution during subsequent dyeing or stretching steps can be avoided, thus achieving high optical properties.

空中輔助延伸之延伸方法可為固定端延伸(例如使用拉幅延伸機進行延伸之方法),亦可為自由端延伸(例如使積層體通過周速相異之輥間進行單軸延伸之方法),惟為了獲得高光學特性,可積極採用自由端延伸。在一實施形態中,空中延伸處理包含加熱輥延伸步驟,該步驟係將上述積層體一邊沿其長邊方向輸送一邊利用加熱輥間之周速差進行延伸。空中延伸處理代表上包含區域(zone)延伸步驟與加熱輥延伸步驟。此外,區域延伸步驟與加熱輥延伸步驟之順序無限定,可先進行區域延伸步驟,亦可先進行加熱輥延伸步驟。亦可省略區域延伸步驟。在一實施形態中,係依序進行區域延伸步驟及加熱輥延伸步驟。又,在另一實施形態中,係於拉幅延伸機中把持薄膜端部,並將拉幅機間之距離往行進方向擴大來延伸(拉幅機間距離的增幅即為延伸倍率)。此時,寬度方向(相對於行進方向為垂直方向)之拉幅機的距離係設定成可任意接近。宜可設定成相對於行進方向之延伸倍率來利用自由端延伸作接近。為自由端延伸時,係以寬度方向之收縮率=(1/延伸倍率)1/2 來計算。The stretching method for in-flight assisted stretching can be fixed-end stretching (e.g., stretching using a tenter stretching machine) or free-end stretching (e.g., uniaxial stretching by passing the laminate between rollers with different circumferential speeds). However, to achieve high optical properties, free-end stretching is preferred. In one embodiment, the in-flight stretching process includes a heated roller stretching step, in which the laminate is stretched while being transported along its longitudinal direction using the circumferential speed difference between the heated rollers. The in-flight stretching process typically includes a zone stretching step and a heated roller stretching step. Furthermore, the order of the zone stretching step and the heated roller stretching step is not limited; the zone stretching step may be performed first, or the heated roller stretching step may be performed first. The regional stretching step can also be omitted. In one embodiment, the regional stretching step and the heated roller stretching step are performed sequentially. In another embodiment, the film ends are gripped in a tenter stretching machine, and the distance between the tenters is expanded in the direction of travel to stretch (the increase in the distance between the tenters is the stretching ratio). At this time, the distance between the tenters in the width direction (perpendicular to the direction of travel) is set so that they can be arbitrarily approached. It is preferable to set the stretching ratio relative to the direction of travel to use free-end stretching for approach. In the case of free-end stretching, the shrinkage ratio in the width direction is calculated as (1/stretching ratio) 1/2 .

空中輔助延伸可在一階段中進行亦可分多階段進行。分多階段進行時,延伸倍率為各階段之延伸倍率之積。空中輔助延伸中之延伸方向宜與水中延伸之延伸方向大致相同。Air-assisted stretching can be performed in a single stage or in multiple stages. When performed in multiple stages, the stretching ratio is the product of the stretching ratios in each stage. The stretching direction in air-assisted stretching should be substantially the same as the stretching direction in underwater stretching.

空中輔助延伸之延伸倍率宜為1.0倍~4.0倍,較宜為1.5倍~3.5倍,更宜為2.0倍~3.0倍。空中輔助延伸之延伸倍率若在所述範圍內,便可在與水中延伸組合時將延伸之總倍率設定為所期望之範圍,而可實現所期望之雙折射、面內相位差及/或定向函數。結果,可獲得已抑制住在異形加工部發生裂痕之偏光件(以結果而言為偏光板)。並且,如上述,空中輔助延伸之延伸倍率宜大於水中延伸之延伸倍率。藉由製成所述構成,即便延伸之總倍率小,仍可獲得具有可容許之光學特性之偏光件。更詳細而言,空中輔助延伸之延伸倍率與水中延伸之延伸倍率的比(水中延伸/空中輔助延伸)宜為0.4~0.9,較宜為0.5~0.8。The stretching ratio of the air-assisted stretching is preferably 1.0 times to 4.0 times, more preferably 1.5 times to 3.5 times, and even more preferably 2.0 times to 3.0 times. If the stretching ratio of the air-assisted stretching is within the range, the total stretching ratio can be set to the desired range when combined with the underwater stretching, and the desired birefringence, in-plane phase difference and/or orientation function can be achieved. As a result, a polarizer (in other words, a polarizing plate) can be obtained in which cracks in the irregularly processed portion are suppressed. Moreover, as mentioned above, the stretching ratio of the air-assisted stretching is preferably greater than the stretching ratio of the underwater stretching. By making the above-mentioned structure, a polarizer with acceptable optical characteristics can be obtained even if the total stretching ratio is small. More specifically, the ratio of the stretching ratio of the air-assisted stretching to the stretching ratio of the underwater stretching (underwater stretching/air-assisted stretching) is preferably 0.4-0.9, more preferably 0.5-0.8.

空中輔助延伸之延伸溫度可因應熱塑性樹脂基材之形成材料、延伸方式等設定成任意適當之值。延伸溫度宜為熱塑性樹脂基材之玻璃轉移溫度(Tg)以上,更宜為熱塑性樹脂基材之玻璃轉移溫度(Tg)+10℃以上,尤宜為Tg+15℃以上。另一方面,延伸溫度之上限宜為170℃。藉由在所述溫度下延伸可抑制PVA系樹脂之結晶化急速進展,而可抑制該結晶化所造成的不良情況(例如,因延伸而妨礙PVA系樹脂層之定向)。The stretching temperature for air-assisted stretching can be set to any appropriate value depending on the thermoplastic resin substrate's material, stretching method, and other factors. The stretching temperature is preferably above the thermoplastic resin substrate's glass transition temperature (Tg), more preferably above the thermoplastic resin substrate's glass transition temperature (Tg) + 10°C, and most preferably above Tg + 15°C. On the other hand, the upper limit of the stretching temperature is preferably 170°C. Stretching at this temperature suppresses the rapid crystallization of the PVA resin, thereby minimizing adverse effects caused by this crystallization (e.g., interference with orientation of the PVA resin layer due to stretching).

A-3-3.不溶解處理、染色處理及交聯處理 視需要,在空中輔助延伸處理之後且在水中延伸處理或染色處理之前,施行不溶解處理。上述不溶解處理代表上係將PVA系樹脂層浸漬於硼酸水溶液中來進行。上述染色處理代表上係以二色性物質(代表上為碘)將PVA系樹脂層染色來進行。視需要,在染色處理之後且在水中延伸處理之前,施行交聯處理。上述交聯處理代表上可藉由使PVA系樹脂層浸漬於硼酸水溶液中來進行。關於不溶解處理、染色處理及交聯處理的詳細內容,例如記載於日本專利特開2012-73580號公報中。A-3-3. Insolubilization, Dyeing, and Crosslinking Treatments If necessary, an insolubilization treatment is performed after the air-assisted stretching treatment and before the underwater stretching treatment or dyeing treatment. The insolubilization treatment is typically performed by immersing the PVA resin layer in an aqueous boric acid solution. The dyeing treatment is typically performed by dyeing the PVA resin layer with a dichroic substance (typically iodine). If necessary, a crosslinking treatment is performed after the dyeing treatment and before the underwater stretching treatment. The crosslinking treatment can typically be performed by immersing the PVA resin layer in an aqueous boric acid solution. Details of the insolubilization treatment, dyeing treatment, and crosslinking treatment are described, for example, in Japanese Patent Publication No. 2012-73580.

A-3-4.水中延伸處理 水中延伸處理係使積層體浸漬於延伸浴來進行。藉由水中延伸處理,可在比上述熱塑性樹脂基材或PVA系樹脂層之玻璃轉移溫度(代表上為80℃左右)更低的溫度下延伸,而可一邊抑制PVA系樹脂層結晶化一邊進行延伸。結果可製出具有優異光學特性之偏光件。A-3-4. Underwater Stretching Underwater stretching is performed by immersing the laminate in a stretching bath. This allows stretching at temperatures lower than the glass transition temperature (typically around 80°C) of the thermoplastic resin substrate or PVA resin layer, suppressing crystallization of the PVA resin layer. This results in a polarizer with excellent optical properties.

積層體之延伸方法可採用任意適當的方法。具體而言,可為固定端延伸,亦可為自由端延伸(例如使積層體通過周速相異之輥間進行單軸延伸的方法)。宜選擇自由端延伸。積層體之延伸可在一階段中進行亦可分多階段進行。分多階段進行時,延伸之總倍率為各階段之延伸倍率之積。The laminate can be stretched using any appropriate method. Specifically, it can be fixed-end stretching or free-end stretching (for example, a method in which the laminate passes between rollers with different circumferential speeds for uniaxial stretching). Free-end stretching is preferred. Stretching of the laminate can be performed in a single stage or in multiple stages. When stretching in multiple stages, the total stretching ratio is the product of the stretching ratios in each stage.

水中延伸宜使積層體浸漬於硼酸水溶液中來進行(硼酸水中延伸)。藉由使用硼酸水溶液作為延伸浴,可對PVA系樹脂層賦予得以承受延伸時施加之張力的剛性與不溶於水的耐水性。具體上,硼酸在水溶液中會生成四羥基硼酸陰離子而可藉由氫鍵與PVA系樹脂交聯。結果可賦予PVA系樹脂層剛性與耐水性,進行良好地延伸,從而製出具有優異光學特性之偏光件。Underwater stretching is preferably performed by immersing the laminate in an aqueous boric acid solution (boric acid underwater stretching). Using an aqueous boric acid solution as the stretching bath imparts the PVA resin layer with the rigidity required to withstand the tension applied during stretching, as well as water-insoluble resistance. Specifically, boric acid in aqueous solution forms tetrahydroxyboric acid anions, which crosslink with the PVA resin via hydrogen bonds. This imparts rigidity and water resistance to the PVA resin layer, allowing for excellent stretching and resulting in polarizers with superior optical properties.

上述硼酸水溶液宜使硼酸及/或硼酸鹽溶解於屬溶劑的水而獲得。硼酸濃度相對於水100重量份宜為1重量份~10重量份,較宜為2.5重量份~6重量份,尤宜為3重量份~5重量份。藉由將硼酸濃度設為1重量份以上,可有效抑制PVA系樹脂層之溶解,製造更高特性之偏光件。此外,除硼酸或硼酸鹽外,亦可使用將硼砂等之硼化合物、乙二醛、戊二醛等溶解於溶劑而得之水溶液。The boric acid aqueous solution is preferably obtained by dissolving boric acid and/or a boric acid salt in water as a solvent. The boric acid concentration is preferably 1 to 10 parts by weight, more preferably 2.5 to 6 parts by weight, and particularly preferably 3 to 5 parts by weight, per 100 parts by weight of water. Setting the boric acid concentration to 1 part by weight or higher effectively inhibits the dissolution of the PVA resin layer, resulting in the production of polarizers with higher performance. In addition to boric acid or a boric acid salt, aqueous solutions obtained by dissolving boron compounds such as borax, glyoxal, glutaraldehyde, etc. in a solvent may also be used.

宜於上述延伸浴(硼酸水溶液)中摻混碘化物。藉由摻混碘化物,可抑制已吸附於PVA系樹脂層之碘的溶出。碘化物之具體例如上述。碘化物之濃度相對於水100重量份宜為0.05重量份~15重量份,較宜為0.5重量份~8重量份。An iodide is preferably added to the stretching bath (boric acid aqueous solution). This addition can suppress the dissolution of iodine adsorbed in the PVA-based resin layer. Specific examples of the iodide are described above. The concentration of the iodide is preferably 0.05 to 15 parts by weight, more preferably 0.5 to 8 parts by weight, per 100 parts by weight of water.

延伸溫度(延伸浴之液溫)宜為40℃~85℃,較宜為60℃~75℃。若為所述溫度,便可抑制PVA系樹脂層溶解,同時又可高倍率地延伸。具體而言如上所述,以與形成PVA系樹脂層之關係來說,熱塑性樹脂基材之玻璃轉移溫度(Tg)以60℃以上為宜。此時,延伸溫度若低於40℃,則即使考慮以水將熱塑性樹脂基材塑化,也恐無法良好地延伸。另一方面,延伸浴之溫度愈高溫,PVA系樹脂層之溶解性就愈高,而恐無法獲得優異的光學特性。積層體浸漬於延伸浴之浸漬時間宜為15秒~5分鐘。The stretching temperature (liquid temperature of the stretching bath) is preferably 40°C to 85°C, more preferably 60°C to 75°C. At this temperature, the dissolution of the PVA-based resin layer can be suppressed, while at the same time, stretching at a high rate can be achieved. Specifically, as mentioned above, in relation to the formation of the PVA-based resin layer, the glass transition temperature (Tg) of the thermoplastic resin substrate is preferably above 60°C. At this time, if the stretching temperature is lower than 40°C, even if the thermoplastic resin substrate is plasticized with water, it may not be stretched well. On the other hand, the higher the temperature of the stretching bath, the higher the solubility of the PVA-based resin layer, and excellent optical properties may not be obtained. The immersion time of the laminate in the stretching bath is preferably 15 seconds to 5 minutes.

水中延伸進行之延伸倍率宜為1.0倍~2.2倍,較宜為1.1倍~2.0倍,更宜為1.1倍~1.8倍,又更宜為1.2倍~1.6倍。水中延伸之延伸倍率若在所述範圍內,便可將延伸之總倍率設定為所期望之範圍,而可實現所期望之雙折射、面內相位差及/或定向函數。結果,可獲得已抑制住在異形加工部發生裂痕之偏光件(以結果而言為偏光板)。延伸之總倍率(組合空中輔助延伸與水中延伸時之延伸倍率的合計)如上述,相對於積層體之原長宜為3.0倍~4.5倍,較宜為3.0倍~4.3倍,更宜為3.0倍~4.0倍。藉由適當組合對塗佈液添加鹵化物、調整空中輔助延伸及水中延伸之延伸倍率、及乾燥收縮處理,即便為所述延伸之總倍率,仍可獲得具有可容許之光學特性之偏光件。The stretching ratio for underwater stretching is preferably 1.0 to 2.2 times, more preferably 1.1 to 2.0 times, more preferably 1.1 to 1.8 times, and even more preferably 1.2 to 1.6 times. If the stretching ratio for underwater stretching is within the aforementioned range, the total stretching ratio can be set to the desired range, thereby achieving the desired birefringence, in-plane phase difference, and/or orientation function. As a result, a polarizer (or, in other words, a polarizing plate) can be obtained in which cracks in the irregularly processed portion are suppressed. As described above, the total stretching ratio (the sum of the stretching ratios for the combined air-assisted stretching and underwater stretching) is preferably 3.0 to 4.5 times, more preferably 3.0 to 4.3 times, and even more preferably 3.0 to 4.0 times, relative to the original length of the laminate. By appropriately combining the addition of halides to the coating solution, adjusting the stretching ratios of the air-assisted stretching and underwater stretching, and performing a drying and shrinking treatment, a polarizer with acceptable optical properties can be obtained even at the aforementioned total stretching ratio.

A-3-5.乾燥收縮處理 上述乾燥收縮處理可透過將區域整體加熱所進行之區域加熱來進行,亦可透過將輸送輥加熱(所謂使用加熱輥)來進行(加熱輥乾燥方式)。較佳為使用這兩者。藉由使用加熱輥使其乾燥,可有效率地抑制積層體之加熱捲曲,而製造出外觀優異的偏光件。具體而言,藉由在使積層體巡經加熱輥之狀態下進行乾燥,可有效率地促進上述熱塑性樹脂基材之結晶化而增加結晶度,即使是在相對較低的乾燥溫度下,仍可良好增加熱塑性樹脂基材之結晶度。結果熱塑性樹脂基材之剛性增加而成為得以承受PVA系樹脂層因乾燥而收縮的狀態,從而捲曲受到抑制。又,藉由使用加熱輥,可在將積層體維持平坦狀態的同時進行乾燥,因此不只能抑制捲曲還能抑制起皺的發生。此時,積層體可透過乾燥收縮處理使其於寬度方向收縮,來提升光學特性。其係因可有效提升PVA及PVA/碘錯合物之定向性之故。積層體在乾燥收縮處理下之寬度方向之收縮率宜為1%~10%,較宜為2%~8%,尤宜為2%~6%。A-3-5. Drying and Shrinking Treatment The drying and shrinking treatment can be performed by heating the entire area (zone heating) or by heating the transport rollers (so-called heating roller drying). Using both methods is preferred. Using heating rollers for drying effectively suppresses heat warping of the laminate, resulting in a polarizer with excellent appearance. Specifically, drying while the laminate passes over heating rollers effectively promotes crystallization of the thermoplastic resin matrix, increasing its crystallinity. Even at relatively low drying temperatures, this can significantly improve the crystallinity of the thermoplastic resin matrix. As a result, the rigidity of the thermoplastic resin substrate increases, allowing it to withstand the shrinkage of the PVA-based resin layer due to drying, thereby suppressing curling. Furthermore, by using heated rollers, the laminate can be dried while maintaining a flat state, thereby suppressing not only curling but also wrinkling. In this case, the laminate shrinks in the width direction through the drying and shrinking treatment, improving optical properties. This is because it effectively improves the orientation of the PVA and PVA/iodine complex. The widthwise shrinkage rate of the laminate during the drying and shrinking treatment is preferably 1% to 10%, more preferably 2% to 8%, and most preferably 2% to 6%.

圖6係顯示乾燥收縮處理之一例的概略圖。在乾燥收縮處理中,係利用已加熱至預定溫度的輸送輥R1~R6與導輥G1~G4來一邊輸送積層體200一邊使其乾燥。在圖式例中,係將輸送輥R1~R6配置成可交替連續加熱PVA樹脂層之面與熱塑性樹脂基材之面,但例如亦可將輸送輥R1~R6配置成僅連續加熱積層體200的其中一面(例如熱塑性樹脂基材面)。Figure 6 schematically illustrates an example of a drying and shrinking process. During the drying and shrinking process, conveyor rollers R1-R6 and guide rollers G1-G4, heated to predetermined temperatures, are used to convey the laminate 200 while drying it. In the illustrated example, the conveyor rollers R1-R6 are positioned to alternately and continuously heat the PVA resin layer and the thermoplastic resin substrate. However, the conveyor rollers R1-R6 can also be positioned to continuously heat only one side of the laminate 200 (e.g., the thermoplastic resin substrate).

藉由調整輸送輥之加熱溫度(加熱輥之溫度)、加熱輥之數量及與加熱輥的接觸時間等,可控制乾燥條件。加熱輥之溫度宜為60℃~120℃,更宜為65℃~100℃,尤宜為70℃~80℃。可在可良好地增加熱塑性樹脂之結晶度而良好地抑制捲曲的同時,製造出耐久性極優異的光學積層體。此外,加熱輥之溫度可以接觸式溫度計來測定。在圖式例中設置有6個輸送輥,惟輸送輥若為複數個則無特別限制。輸送輥通常為2個~40個,宜設置4個~30個。積層體與加熱輥之接觸時間(總接觸時間)以1秒~300秒為宜,以1~20秒較佳,以1~10秒更佳。Drying conditions can be controlled by adjusting the heating temperature of the conveyor rollers (heating roller temperature), the number of heating rollers, and the contact time with the heating rollers. The temperature of the heating rollers is preferably 60°C to 120°C, more preferably 65°C to 100°C, and particularly preferably 70°C to 80°C. This can effectively increase the crystallinity of the thermoplastic resin and effectively suppress curling, while producing an optical laminate with excellent durability. In addition, the temperature of the heating rollers can be measured with a contact thermometer. In the example shown in the figure, six conveyor rollers are provided, but there is no particular limitation if multiple conveyor rollers are provided. The number of conveyor rollers is generally 2 to 40, with 4 to 30 being preferred. The contact time (total contact time) between the laminate and the heating roller should preferably be 1 second to 300 seconds, more preferably 1 to 20 seconds, and even more preferably 1 to 10 seconds.

加熱輥可設置於加熱爐(例如烘箱)內,亦可設置於一般的製造產線(室溫環境下)。宜設置於具備送風機構的加熱爐內。藉由併用以加熱輥進行之乾燥與熱風乾燥,可抑制在加熱輥間急遽的溫度變化,而可容易控制寬度方向之收縮。熱風乾燥之溫度宜為30℃~100℃。且,熱風乾燥時間宜為1秒~300秒。熱風之風速宜為10m/s~30m/s左右。此外,該風速係在加熱爐內之風速,可以迷你扇葉型數位風速計來測定。The heating rollers can be installed in a heating furnace (such as an oven) or in a general manufacturing line (at room temperature). They are preferably installed in a heating furnace equipped with an air supply mechanism. By combining drying with the heating rollers and hot air drying, rapid temperature fluctuations between the rollers can be suppressed, making it easier to control shrinkage in the width direction. The hot air drying temperature should preferably be between 30°C and 100°C. Furthermore, the hot air drying time should preferably be between 1 second and 300 seconds. The hot air velocity should preferably be between 10m/s and 30m/s. Furthermore, this velocity is the velocity within the heating furnace and can be measured with a mini fan-type digital anemometer.

A-3-6.其他處理 宜在水中延伸處理之後且在乾燥收縮處理之前,施行洗淨處理。上述洗淨處理代表上可藉由使PVA系樹脂層浸漬於碘化鉀水溶液中來進行。A-3-6. Other Treatments After the water stretching treatment and before the drying and shrinking treatment, a cleaning treatment is preferably performed. This cleaning treatment can typically be performed by immersing the PVA resin layer in an aqueous potassium iodide solution.

A-4.保護層 保護層之厚度為10µm以下。藉由保護層之厚度為10µm以下,可有助於偏光板之薄型化。又,以往由追隨偏光件在加熱時之收縮來保護偏光件之觀點,係使用具有20µm以上之厚度的保護層。對此,本發明實施形態所用偏光件如同上述,PVA系樹脂之定向度較以往更低,結果加熱造成之收縮就小,故即便在使用厚度在10µm以下之保護層之情況下,仍可抑制加熱時發生裂痕。並且,所述偏光件亦有助於抑制在異形加工部之裂痕。A-4. Protective Layer The protective layer has a thickness of 10µm or less. A protective layer thickness of 10µm or less contributes to thinning the polarizer. Conventionally, to protect the polarizer by tracking its shrinkage during heating, a protective layer with a thickness of 20µm or greater has been used. However, the polarizer used in the present embodiment, as described above, has a lower degree of orientation of the PVA resin than conventional polarizers. Consequently, shrinkage due to heating is minimized. Therefore, even with a protective layer thickness of 10µm or less, cracking during heating can be suppressed. Furthermore, this polarizer helps suppress cracking in irregularly shaped areas.

保護層之厚度宜為7µm以下,較宜為5µm以下,更宜為3µm以下。保護層之厚度例如為1µm以上。The thickness of the protective layer is preferably 7µm or less, more preferably 5µm or less, and even more preferably 3µm or less. The thickness of the protective layer is, for example, 1µm or more.

保護層係以樹脂膜構成。形成樹脂膜之樹脂可按目的使用任意適當之樹脂。具體例可舉(甲基)丙烯酸系、三醋酸纖維素(TAC)等纖維素系樹脂、聚酯系、聚胺甲酸酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降莰烯系、聚烯烴系及乙酸酯系等熱塑性樹脂;(甲基)丙烯酸系、胺甲酸酯系、(甲基)丙烯酸胺甲酸酯系、環氧系、聚矽氧系等熱硬化型樹脂或活性能量線硬化型樹脂;矽氧烷系聚合物等玻璃質系聚合物。在一實施形態中,形成樹脂膜之樹脂可舉環氧樹脂、(甲基)丙烯酸系樹脂。該等可單獨使用,也可組合使用。The protective layer is composed of a resin film. Any appropriate resin can be used as the resin forming the resin film, depending on the intended purpose. Specific examples include cellulose resins such as (meth)acrylic acid and cellulose triacetate (TAC); thermoplastic resins such as polyesters, polyurethanes, polyvinyl alcohols, polycarbonates, polyamides, polyimides, polyether sulfones, polysulfones, polystyrenes, polynorbornenes, polyolefins, and acetates; thermosetting resins or active energy ray-curing resins such as (meth)acrylic acid, urethanes, (meth)acrylic urethanes, epoxies, and silicones; and glassy polymers such as silicone polymers. In one embodiment, the resin forming the resin film can be epoxy resin or (meth) acrylic resin. These resins can be used alone or in combination.

構成保護層之樹脂膜例如可為熔融樹脂之成形物,可為將樹脂溶解或分散於水性溶劑或有機溶劑中而得之樹脂溶液之塗佈膜的固化物,亦可為硬化型樹脂之硬化物(例如光陽離子硬化物)。The resin film constituting the protective layer may be, for example, a molded product of a molten resin, a solidified product of a coating film of a resin solution obtained by dissolving or dispersing the resin in an aqueous solvent or an organic solvent, or a cured product of a curable resin (e.g., a photoion-cured product).

在一實施形態中,保護層可為熱塑性(甲基)丙烯酸系樹脂(以下,有時僅將(甲基)丙烯酸系樹脂稱為「丙烯酸系樹脂」)之有機溶劑溶液之塗佈膜的固化物、環氧樹脂之光陽離子硬化物或環氧樹脂之有機溶劑溶液之塗佈膜的固化物。於以下進行具體說明。In one embodiment, the protective layer can be a cured product of a coating film of a thermoplastic (meth)acrylic resin (hereinafter, (meth)acrylic resin may be simply referred to as "acrylic resin") in an organic solvent solution, a photo-cured epoxy resin, or a cured product of an epoxy resin in an organic solvent solution. Details are described below.

A-4-1.熱塑性丙烯酸系樹脂之有機溶劑溶液之塗佈膜的固化物 在一實施形態中,保護層係以熱塑性丙烯酸系樹脂之有機溶劑溶液之塗佈膜的固化物構成。由加濕耐久性之觀點來看,本實施形態之保護層的軟化溫度宜為100℃以上,較宜為115℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。A-4-1. Cured Film of a Thermoplastic Acrylic Resin Organic Solvent Solution In one embodiment, the protective layer is formed from a cured film of a thermoplastic acrylic resin organic solvent solution. From the perspective of wet durability, the softening temperature of the protective layer in this embodiment is preferably 100°C or higher, preferably 115°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. Furthermore, from the perspective of formability, the softening temperature is preferably 300°C or lower, preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

丙烯酸系樹脂之玻璃轉移溫度(Tg)宜為100℃以上。結果,保護層之軟化溫度亦幾乎成為100℃以上。丙烯酸系樹脂之Tg若在100℃以上,包含從所述樹脂所得之保護層的偏光板會成為不僅抗裂痕耐性優異、加濕耐久性亦優異者。丙烯酸系樹脂之Tg較宜為110℃以上,更宜為115℃以上,又更宜為120℃以上,尤宜為125℃以上。另一方面,丙烯酸系樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。丙烯酸系樹脂之Tg若在所述範圍內,成形性便佳。The glass transition temperature (Tg) of acrylic resin is preferably above 100°C. As a result, the softening temperature of the protective layer is also almost above 100°C. If the Tg of acrylic resin is above 100°C, the polarizing plate including the protective layer obtained from the resin will not only have excellent crack resistance but also excellent durability under humidity. The Tg of acrylic resin is preferably above 110°C, more preferably above 115°C, even more preferably above 120°C, and particularly preferably above 125°C. On the other hand, the Tg of acrylic resin is preferably below 300°C, more preferably below 250°C, more preferably below 200°C, and particularly preferably below 160°C. If the Tg of acrylic resin is within the above range, the moldability is excellent.

丙烯酸系樹脂只要具有如上述之Tg,便可採用任意適當之丙烯酸系樹脂。丙烯酸系樹脂在代表上含有(甲基)丙烯酸烷基酯為主成分作為單體單元(重複單元)。本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。構成丙烯酸系樹脂之主骨架的(甲基)丙烯酸烷基酯,可例示直鏈狀或支鏈狀烷基之碳數1~18者。該等可單獨使用或可組合來使用。並且亦可藉由共聚而於丙烯酸系樹脂導入任意適當的共聚單體。藉由適當設定(甲基)丙烯酸烷基酯之種類、數量、組合及摻混比、共聚單體之種類、數量、組合及摻混比、以及聚合條件等,可獲得可形成所期望之保護層的丙烯酸系樹脂。Any suitable acrylic resin can be used as long as it has the Tg described above. Typically, the acrylic resin contains an alkyl (meth)acrylate as the main component as a monomer unit (repeating unit). In this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid. Examples of the alkyl (meth)acrylate constituting the main skeleton of the acrylic resin include linear or branched alkyl groups having 1 to 18 carbon atoms. These can be used alone or in combination. Furthermore, any suitable comonomer can be introduced into the acrylic resin by copolymerization. By appropriately setting the type, amount, combination, and blending ratio of the alkyl (meth)acrylate, the type, amount, combination, and blending ratio of the comonomer, and polymerization conditions, an acrylic resin capable of forming a desired protective layer can be obtained.

丙烯酸系樹脂宜具有包含環結構之重複單元。包含環結構之重複單元可舉內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元、馬來醯亞胺(N-取代馬來醯亞胺)單元。包含環結構之重複單元可僅1種含於丙烯酸系樹脂之重複單元中,亦可2種以上含於其中。具有內酯環單元之丙烯酸系樹脂記載於例如日本專利特開2008-181078號公報中。具有戊二醯亞胺單元之丙烯酸系樹脂例如記載於日本專利特開2006-309033號公報、日本專利特開2006-317560號公報、日本專利特開2006-328334號公報、日本專利特開2006-337491號公報、日本專利特開2006-337492號公報、日本專利特開2006-337493號公報、日本專利特開2006-337569號公報中。本說明書即援用該等公報之記載作為參考。The acrylic resin preferably has repeating units containing a ring structure. Examples of repeating units containing a ring structure include lactone ring units, glutaric anhydride units, glutarimide units, maleic anhydride units, and maleimide (N-substituted maleimide) units. The acrylic resin may contain only one repeating unit containing a ring structure, or two or more repeating units. Acrylic resins containing lactone ring units are described, for example, in Japanese Patent Publication No. 2008-181078. Acrylic resins having glutarimido units are described, for example, in Japanese Patent Application Publication Nos. 2006-309033, 2006-317560, 2006-328334, 2006-337491, 2006-337492, 2006-337493, and 2006-337569. The disclosures of these publications are incorporated herein by reference.

丙烯酸系樹脂中包含環結構之重複單元的含有比率宜為1莫耳%~50莫耳%,較宜為10莫耳%~40莫耳%,更宜為20莫耳%~30莫耳%。含有比率過少時,會有Tg低於100℃之情形,而有所得保護層之耐熱性、耐溶劑性及表面硬度不充分之情形。含有比率過多時,有成形性及透明性不充分之情形。The content of repeating units containing a ring structure in acrylic resins is preferably 1 mol% to 50 mol%, more preferably 10 mol% to 40 mol%, and even more preferably 20 mol% to 30 mol%. If the content is too low, the Tg may be lower than 100°C, and the resulting protective layer may have insufficient heat resistance, solvent resistance, and surface hardness. If the content is too high, formability and transparency may be insufficient.

本發明實施形態中,亦可併用丙烯酸系樹脂與其他樹脂。亦即,可將構成丙烯酸系樹脂之單體成分與構成其他樹脂之單體成分共聚,並將該共聚物供於後述保護層之成形;亦可將丙烯酸系樹脂與其他樹脂之摻合物供於保護層之成形。In embodiments of the present invention, acrylic resins may be used in combination with other resins. Specifically, the monomer components of the acrylic resin may be copolymerized with the monomer components of the other resins, and the copolymer may be used to form the protective layer described below. Alternatively, a blend of the acrylic resin and the other resin may be used to form the protective layer.

本實施形態之保護層例如可藉由於偏光件表面塗佈丙烯酸系樹脂之有機溶劑溶液而形成塗佈膜,並使該塗佈膜固化來形成。The protective layer of this embodiment can be formed by, for example, applying an organic solvent solution of acrylic resin on the surface of the polarizer to form a coating film, and curing the coating film.

有機溶劑可使用可將丙烯酸系樹脂溶解或均勻分散之任意適當之有機溶劑。有機溶劑之具體例可舉乙酸乙酯、甲苯、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮。Any suitable organic solvent that can dissolve or uniformly disperse the acrylic resin can be used as the organic solvent. Specific examples of the organic solvent include ethyl acetate, toluene, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclopentanone, and cyclohexanone.

溶液之丙烯酸系樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The acrylic resin concentration in the solution is preferably 3 to 20 parts by weight relative to 100 parts by weight of the solvent. This concentration allows for a uniform coating film that adheres closely to the polarizer.

溶液可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上之塗佈膜的固化物會轉印至偏光件上。當塗佈於偏光件時,藉由使塗佈膜乾燥(固化),而於偏光件上直接形成保護層。較佳為溶液塗佈於偏光件上,而於偏光件上直接形成保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。溶液之塗佈方法可採用任意適當的方法。具體例可列舉輥塗法、旋塗法、線棒塗佈法、浸塗法、模塗法、簾塗法、噴塗法、刮刀塗佈法(缺角輪塗佈法等)。The solution can be applied to any appropriate substrate or to a polarizer. When applied to a substrate, the cured product of the coating film formed on the substrate is transferred to the polarizer. When applied to a polarizer, a protective layer is formed directly on the polarizer by drying (curing) the coating film. It is preferred that the solution be applied to the polarizer to form a protective layer directly on the polarizer. With the above-mentioned structure, the adhesive layer or the pressure-sensitive adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. Any appropriate method can be used for applying the solution. Specific examples include roller coating, spin coating, wire rod coating, dip coating, die coating, curtain coating, spray coating, and scraper coating (such as the notched wheel coating method).

藉由使溶液之塗佈膜乾燥(固化),可形成保護層。乾燥溫度宜為100℃以下,較宜為50℃~70℃。乾燥溫度若在所述範圍內,便可防止對偏光件造成不良影響。乾燥時間可按乾燥溫度變化。乾燥時間例如可為1分鐘~10分鐘。The protective layer is formed by drying (curing) the applied solution. The drying temperature is preferably below 100°C, more preferably between 50°C and 70°C. A drying temperature within this range prevents adverse effects on the polarizer. The drying time varies depending on the drying temperature. For example, the drying time can be between 1 and 10 minutes.

A-4-2.環氧樹脂之光陽離子硬化物 在一實施形態中,保護層係以環氧樹脂之光陽離子硬化物構成。藉由使用所述保護層,可抑制裂痕發生,且可獲得優異之加濕耐久性。如上述,保護層為光陽離子硬化物,故保護層形成用組成物包含光陽離子聚合引發劑。光陽離子聚合引發劑係具有光酸產生劑之功能的感光劑,代表上可舉由陽離子部與陰離子部構成之離子性鎓鹽。在該鎓鹽中,陽離子部會吸收光,而陰離子部會成為酸的產生源。藉由從該光陽離子聚合引發劑產生之酸,進行環氧基之開環聚合。屬所得光陽離子硬化物的保護層之軟化溫度高,可降低碘吸附量。因此,可提供一種已抑制住裂痕發生且具有優異加濕耐久性之偏光板。A-4-2. Photocurable Epoxy Resin In one embodiment, the protective layer is formed from a photocurable epoxy resin. This protective layer suppresses cracking and achieves excellent moisture durability. As mentioned above, the protective layer is a photocurable epoxy resin, so the protective layer-forming composition includes a photocatalytic polymerization initiator. A photocatalytic polymerization initiator is a photosensitive agent that functions as a photoacid generator, typically an ionic onium salt composed of a cationic portion and a cationic portion. In the onium salt, the cationic portion absorbs light, while the anionic portion becomes an acid generator. The acid generated from the photocationic polymerization initiator causes ring-opening polymerization of the epoxy groups. The resulting photocationic cured product has a high softening temperature on the protective layer, which reduces iodine adsorption. This provides a polarizing plate with suppressed cracking and excellent durability under humidification.

由加濕耐久性之觀點來看,本實施形態之保護層的軟化溫度宜為100℃以上,較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。From the perspective of humidification durability, the softening temperature of the protective layer of this embodiment is preferably 100°C or higher, more preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. From the perspective of formability, it is preferably 300°C or lower, more preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

A-4-2-1.環氧樹脂 環氧樹脂可使用任意適當之環氧樹脂,且可適宜使用具有芳香環或脂環之環氧樹脂。在本實施形態中,宜使用具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂。芳香族骨架可舉例如苯環、萘環、茀環等。環氧樹脂可僅使用1種亦可組合2種以上來使用。宜可使用具有聯苯骨架或雙酚骨架作為芳香族骨架之環氧樹脂或其氫化物。藉由使用所述環氧樹脂,可提供一種具有更優異之耐久性且撓曲性亦優異之偏光板。A-4-2-1. Epoxy Resin Any suitable epoxy resin can be used, and epoxy resins having aromatic or aliphatic rings are particularly preferred. In this embodiment, an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton is preferably used. Examples of aromatic skeletons include benzene, naphthalene, and fluorene. The epoxy resin may be used singly or in combination of two or more. An epoxy resin having a biphenyl or bisphenol skeleton as the aromatic skeleton, or a hydrogenated epoxy resin thereof, is particularly preferred. The use of such epoxy resins provides a polarizing plate having superior durability and flexibility.

在一實施形態中,具有聯苯骨架之環氧樹脂係包含以下結構之環氧樹脂。具有聯苯骨架之環氧樹脂可僅使用1種,亦可組合2種以上來使用。 [化學式1] (式中,R14 ~R21 分別獨立表示氫原子、碳數1~12之直鏈狀或支鏈狀之取代或非取代的烴基、或鹵素元素)。In one embodiment, the epoxy resin having a biphenyl skeleton includes an epoxy resin having the following structure. The epoxy resin having a biphenyl skeleton may be used alone or in combination of two or more. [Chemical Formula 1] (wherein, R 14 to R 21 independently represent a hydrogen atom, a linear or branched substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, or a halogen element).

在一實施形態中,具有聯苯骨架之環氧樹脂為下式所示環氧樹脂。 [化學式2] (式中,R14 ~R21 如上述,n表示0~6之整數)。In one embodiment, the epoxy resin having a biphenyl skeleton is an epoxy resin represented by the following formula: [Chemical Formula 2] (wherein, R 14 to R 21 are as described above, and n represents an integer from 0 to 6).

在一實施形態中,具有聯苯骨架之環氧樹脂為僅具有聯苯骨架之環氧樹脂。藉由使用僅具有聯苯骨架之環氧樹脂,可更提升所得保護層之耐久性。在另一實施形態中,具有聯苯骨架之環氧樹脂亦可包含有聯苯骨架以外之化學結構。聯苯骨架以外之化學結構可舉例如雙酚骨架、脂環式結構、芳香族環結構等。此時,聯苯骨架以外之化學結構的比率(莫耳比)宜少於聯苯骨架。In one embodiment, the epoxy resin having a biphenyl skeleton is an epoxy resin having only a biphenyl skeleton. By using an epoxy resin having only a biphenyl skeleton, the durability of the resulting protective layer can be further improved. In another embodiment, the epoxy resin having a biphenyl skeleton may also contain chemical structures other than the biphenyl skeleton. Examples of chemical structures other than the biphenyl skeleton include a bisphenol skeleton, an alicyclic structure, and an aromatic ring structure. In this case, the ratio (molar ratio) of chemical structures other than the biphenyl skeleton is preferably less than that of the biphenyl skeleton.

上述環氧樹脂(光陽離子硬化後之環氧樹脂)宜為玻璃轉移溫度(Tg)在100℃以上。結果,保護層之軟化溫度亦幾乎成為100℃以上。環氧樹脂之Tg若為100℃以上,包含所得保護層之偏光板便容易成為耐久性優異者。環氧樹脂之Tg較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上。另一方面,環氧樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。環氧樹脂之Tg若在所述範圍內,成形性便可優異。The above-mentioned epoxy resin (epoxy resin after photoion curing) preferably has a glass transition temperature (Tg) of 100°C or higher. As a result, the softening temperature of the protective layer is also almost above 100°C. If the Tg of the epoxy resin is above 100°C, the polarizing plate including the obtained protective layer tends to have excellent durability. The Tg of the epoxy resin is preferably above 110°C, more preferably above 120°C, and particularly preferably above 125°C. On the other hand, the Tg of the epoxy resin is preferably below 300°C, more preferably below 250°C, more preferably below 200°C, and particularly preferably below 160°C. If the Tg of the epoxy resin is within the above range, the formability can be excellent.

上述環氧樹脂之環氧當量宜為100g/當量以上,較宜為150g/當量以上,更宜為200g/當量以上。又,環氧樹脂之環氧當量宜為3000g/當量以下,較宜為2500g/當量以下,更宜為2000g/當量以下。藉由環氧當量為上述範圍,可獲得更穩定的保護層(殘存單體少且已充分硬化之保護層)。此外,在本說明書中,「環氧當量」意指「包含1當量環氧基之環氧樹脂的質量」,可依循JIS K 7236測定。The epoxy equivalent weight of the epoxy resin is preferably 100 g/equivalent or greater, more preferably 150 g/equivalent or greater, and even more preferably 200 g/equivalent or greater. Furthermore, the epoxy equivalent weight of the epoxy resin is preferably 3000 g/equivalent or less, more preferably 2500 g/equivalent or less, and even more preferably 2000 g/equivalent or less. An epoxy equivalent weight within this range provides a more stable protective layer (one that contains minimal residual monomers and is fully cured). In this specification, "epoxy equivalent weight" refers to the mass of the epoxy resin containing one equivalent of epoxy groups and can be measured in accordance with JIS K 7236.

本實施形態中,亦可併用上述環氧樹脂與其他樹脂。即,亦可將上述環氧樹脂(例如具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂)與其他樹脂之摻合物供於保護層之成形。其他樹脂可舉例如丙烯酸系樹脂、氧雜環丁烷系樹脂。In this embodiment, the epoxy resin described above can be used in combination with other resins. Specifically, a blend of the epoxy resin described above (e.g., an epoxy resin having at least one selected from the group consisting of an aromatic skeleton and a hydrogenated aromatic skeleton) and other resins can be used to form the protective layer. Examples of other resins include acrylic resins and cyclohexane resins.

丙烯酸系樹脂可使用任意適當之(甲基)丙烯酸系化合物。例如(甲基)丙烯酸系化合物可舉例如分子內具有一個(甲基)丙烯醯基之(甲基)丙烯酸系化合物(以下亦稱「單官能(甲基)丙烯酸系化合物」)、分子內具有二個以上(甲基)丙烯醯基之(甲基)丙烯酸系化合物(以下亦稱「多官能(甲基)丙烯酸系化合物」)。該等(甲基)丙烯酸系化合物可單獨使用,亦可組合2種以上來使用。關於該等丙烯酸系樹脂例如記載於日本專利特開2019-168500號公報中。本說明書中係援用該公報整體之記載作為參考。Any suitable (meth)acrylic compound can be used as the acrylic resin. Examples of the (meth)acrylic compound include a (meth)acrylic compound having one (meth)acrylic group in the molecule (hereinafter referred to as a "monofunctional (meth)acrylic compound") and a (meth)acrylic compound having two or more (meth)acrylic groups in the molecule (hereinafter referred to as a "polyfunctional (meth)acrylic compound"). These (meth)acrylic compounds can be used alone or in combination of two or more. These acrylic resins are described, for example, in Japanese Patent Publication No. 2019-168500. The entire disclosure of this publication is incorporated herein by reference.

氧雜環丁烷樹脂可使用分子內具有1個以上氧雜環丁烷基之任意適當的化合物。可舉例如:3-乙-3-羥甲基氧雜環丁烷、3-乙-3-(2-乙基己基氧基甲基)氧雜環丁烷、3-乙-3-(苯氧基甲基)氧雜環丁烷、3-乙-3-(環己基氧基甲基)氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯等分子內具有1個氧雜環丁烷基之氧雜環丁烷化合物;3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷、1,4-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]苯、4,4'-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]聯苯等分子內具有2個以上氧雜環丁烷基之氧雜環丁烷化合物等。該等氧雜環丁烷樹脂可僅使用1種亦可組合2種以上。氧雜環丁烷樹脂宜可使用3-乙-3-羥甲基氧雜環丁烷、1,4-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]苯、3-乙-3-(2-乙基己基氧基甲基)氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯、3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷等。該等氧雜環丁烷樹脂可輕易取得,且稀釋性(低黏度)、相溶性優異。Any suitable compound having one or more cyclohexyl groups in the molecule can be used as the cyclohexyloxybutane resin. Examples thereof include 3-ethyl-3-hydroxymethylcyclohexyloxybutane, 3-ethyl-3-(2-ethylhexyloxymethyl)cyclohexyloxybutane, 3-ethyl-3-(phenoxymethyl)cyclohexyloxybutane, 3-ethyl-3-(cyclohexyloxymethyl)cyclohexyloxybutane, 3-ethyl-3-(oxiranylmethoxy)cyclohexyloxybutane, and (meth)acrylate (3-ethylcyclohexyl-3-yl)methyl ester. Oxycyclobutane compounds containing one oxocyclobutane group; oxocyclobutane compounds containing two or more oxocyclobutane groups in the molecule, such as 3-ethyl-3{[(3-ethyloxocyclobutane-3-yl)methoxy]methyl}oxocyclobutane, 1,4-bis[(3-ethyl-3-oxocyclobutane)methoxymethyl]benzene, and 4,4'-bis[(3-ethyl-3-oxocyclobutane)methoxymethyl]biphenyl. These oxocyclobutane resins may be used alone or in combination of two or more. Preferred cyclohexane resins include 3-ethyl-3-hydroxymethylcyclohexane, 1,4-bis[(3-ethyl-3-cyclohexane)methoxymethyl]benzene, 3-ethyl-3-(2-ethylhexyloxymethyl)cyclohexane, 3-ethyl-3-(oxiranylmethoxy)cyclohexane, (3-ethylcyclohexane-3-yl)methyl (meth)acrylate, and 3-ethyl-3{[(3-ethylcyclohexane-3-yl)methoxy]methyl}cyclohexane. These cyclohexane resins are readily available and have excellent diluting properties (low viscosity) and compatibility.

在一實施形態中,由相溶性或接著性之觀點來看,宜使用分子量500以下且在室溫(25℃)下呈液態的氧雜環丁烷樹脂。在一實施形態中,宜使用分子內含有2個以上氧雜環丁烷基之氧雜環丁烷化合物、分子內含有1個氧雜環丁烷基與1個(甲基)丙烯醯基或1個環氧基之氧雜環丁烷化合物,較宜使用3-乙-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷、3-乙-3-(環氧乙烷基甲氧基)氧雜環丁烷、(甲基)丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯。藉由使用該等氧雜環丁烷樹脂可提升保護層之硬化性及耐久性。In one embodiment, from the perspective of compatibility and adhesion, an oxycyclobutane resin having a molecular weight of 500 or less and being liquid at room temperature (25°C) is preferably used. In one embodiment, an oxycyclobutane compound containing two or more oxycyclobutane groups in the molecule, or an oxycyclobutane compound containing one oxycyclobutane group and one (meth)acryloyl group or one epoxy group in the molecule is preferably used. 3-Ethyl-3-{[(3-ethyloxycyclobutane-3-yl)methoxy]methyl}oxycyclobutane, 3-Ethyl-3-(oxiranylmethoxy)oxycyclobutane, and (3-ethyloxycyclobutane-3-yl)methyl (meth)acrylate are more preferably used. By using these cyclohexane oxychloride resins, the hardening and durability of the protective layer can be improved.

A-4-2-2.光陽離子聚合引發劑 光陽離子聚合引發劑係具有光酸產生劑之功能的感光劑,代表上可舉由陽離子部與陰離子部構成之離子性鎓鹽。在該鎓鹽中,陽離子部會吸收光,而陰離子部會成為酸的產生源。藉由從該光陽離子聚合引發劑產生之酸,進行環氧基之開環聚合。光陽離子聚合引發劑可使用可藉由紫外線等光照射使具有選自於由芳香族骨架及經氫化之芳香族骨架所構成群組中之至少1種的環氧樹脂硬化的任意適當之化合物。光陽離子聚合引發劑可僅使用1種,亦可組合2種以上來使用。A-4-2-2. Photocationic Polymerization Initiators Photocationic polymerization initiators are photosensitive agents that function as photoacid generators. Representative examples include ionic onium salts composed of a cationic portion and an anionic portion. In these onium salts, the cationic portion absorbs light, while the anionic portion serves as a source of acid. The acid generated by the photocationic polymerization initiator causes ring-opening polymerization of epoxy groups. Any suitable compound that can cure epoxy resins having at least one selected from the group consisting of aromatic skeletons and hydrogenated aromatic skeletons upon irradiation with light, such as ultraviolet light, can be used as the photocationic polymerization initiator. The photocatalytic polymerization initiator may be used alone or in combination of two or more.

光陽離子聚合引發劑可舉例如三苯基鋶六氟銻酸鹽、三苯基鋶六氟磷酸鹽、對(苯硫基)苯基二苯基鋶六氟銻酸鹽、對(苯硫基)苯基二苯基鋶六氟磷酸鹽、4-氯苯基二苯基鋶六氟磷酸鹽、4-氯苯基二苯基鋶六氟銻酸鹽、雙[4-(二苯基鋶基)苯基]硫醚雙六氟磷酸鹽、雙[4-(二苯基鋶基)苯基]硫醚雙六氟銻酸鹽、(2,4-環戊二烯-1-基)[(1-甲基乙基)苯]-Fe-六氟磷酸鹽、二苯基碘鎓六氟銻酸鹽等。宜使用三苯基鋶鹽系六氟銻酸鹽型之光陽離子聚合引發劑、二苯基碘鎓鹽系六氟銻酸鹽型之光陽離子聚合引發劑。Examples of the photocatalytic polymerization initiator include triphenylcorbium hexafluoroantimonylate, triphenylcorbium hexafluorophosphate, p-(phenylthio)phenyldiphenylcorbium hexafluoroantimonylate, p-(phenylthio)phenyldiphenylcorbium hexafluoroantimonylate, 4-chlorophenyldiphenylcorbium hexafluorophosphate, 4-chlorophenyldiphenylcorbium hexafluoroantimonylate, bis[4-(diphenylcorbyl)phenyl]sulfide bishexafluorophosphate, bis[4-(diphenylcorbyl)phenyl]sulfide bishexafluoroantimonylate, (2,4-cyclopentadien-1-yl)[(1-methylethyl)benzene]-Fe-hexafluorophosphate, and diphenyliodonium hexafluoroantimonylate. Preferred photocatalytic polymerization initiators are triphenylsulfonium hexafluoroantimonate salts and diphenyliodonium hexafluoroantimonate salts.

本實施形態之保護層例如可藉由塗佈包含上述環氧樹脂與光陽離子聚合引發劑之組成物而形成塗膜,並對該塗膜照射光(例如紫外線)而形成。The protective layer of this embodiment can be formed, for example, by applying a composition comprising the above-mentioned epoxy resin and a photocatalytic polymerization initiator to form a coating film, and then irradiating the coating film with light (e.g., ultraviolet rays).

上述組成物中之環氧樹脂濃度相對於溶劑100重量份宜為10重量份~30重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The epoxy resin concentration in the above composition is preferably 10 to 30 parts by weight relative to 100 parts by weight of the solvent. This resin concentration allows for a uniform coating film that adheres closely to the polarizer.

上述組成物可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上的塗佈膜之硬化物會轉印至偏光件上。當塗佈於偏光件時,例如藉由光照射使塗佈膜硬化,藉此於偏光件上直接形成保護層。宜為上述組成物塗佈於偏光件上,而於偏光件上直接形成保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。組成物之塗佈方法如上述。The above-mentioned composition can be applied to any appropriate substrate or to a polarizer. When applied to a substrate, the cured coating formed on the substrate is transferred to the polarizer. When applied to a polarizer, the coating is cured, for example, by irradiation with light, thereby forming a protective layer directly on the polarizer. It is preferable to apply the above-mentioned composition to the polarizer and form a protective layer directly on the polarizer. If the above-mentioned structure is adopted, the adhesive layer or the adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. The method of applying the composition is as described above.

塗佈膜之硬化可藉由使用任意適當之光源以達到任意適當照射量之方式照射光(代表上為紫外線)來進行。光照射後,為了使光反應進行之硬化結束,亦可進一步施行加熱處理。加熱處理可在任意適當之溫度及時間下進行。The coating film can be cured by irradiating it with light (typically ultraviolet light) using any suitable light source to achieve any suitable irradiation dose. After irradiation, a heat treatment may be applied to complete the curing process by the photoreaction. The heat treatment may be performed at any suitable temperature and for any suitable time.

A-4-3.環氧樹脂之有機溶劑溶液之塗佈膜的固化物 在一實施形態中,保護層係以環氧樹脂之有機溶劑溶液之塗佈膜的固化物構成。由加濕耐久性之觀點來看,本實施形態之保護層的軟化溫度宜為100℃以上,較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上;又,由成形性之觀點來看,宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。A-4-3. Cured Film of an Epoxy Resin Organic Solvent Solution In one embodiment, the protective layer is formed from a cured film of an epoxy resin organic solvent solution. From the perspective of wet durability, the softening temperature of the protective layer in this embodiment is preferably 100°C or higher, preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. Furthermore, from the perspective of formability, the softening temperature is preferably 300°C or lower, preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower.

A-4-3-1.環氧樹脂 在本實施形態中,環氧樹脂宜玻璃轉移溫度(Tg)為100℃以上。結果,保護層之軟化溫度亦幾乎成為100℃以上。環氧樹脂之Tg若在100℃以上,包含由所述樹脂所得保護層的偏光板便容易成為耐久性優異者。環氧樹脂之Tg較宜為110℃以上,更宜為120℃以上,尤宜為125℃以上。另一方面,環氧樹脂之Tg宜為300℃以下,較宜為250℃以下,更宜為200℃以下,尤宜為160℃以下。環氧樹脂之Tg若在所述範圍內,成形性便可優異。A-4-3-1. Epoxy Resin In this embodiment, the epoxy resin preferably has a glass transition temperature (Tg) of 100°C or higher. As a result, the softening temperature of the protective layer is also approximately 100°C or higher. When the Tg of the epoxy resin is 100°C or higher, the polarizing plate including the protective layer obtained from the resin tends to have excellent durability. The Tg of the epoxy resin is preferably 110°C or higher, more preferably 120°C or higher, and particularly preferably 125°C or higher. On the other hand, the Tg of the epoxy resin is preferably 300°C or lower, more preferably 250°C or lower, more preferably 200°C or lower, and particularly preferably 160°C or lower. If the Tg of epoxy resin is within the above range, the moldability can be excellent.

環氧樹脂只要具有如上述之Tg,便可採用任意適當之環氧樹脂。環氧樹脂代表上係指分子結構內具有環氧基之樹脂。作為環氧樹脂宜可使用分子結構內具有芳香族環之環氧樹脂。藉由使用具有芳香族環之環氧樹脂,可獲得具有更高Tg之環氧樹脂。分子結構內具有芳香族環之環氧樹脂的芳香族環,可舉例如苯環、萘環、茀環等。環氧樹脂可僅使用1種亦可組合2種以上來使用。使用2種以上環氧樹脂時,亦可組合含芳香族環之環氧樹脂與不含芳香族環之環氧樹脂來使用。Any appropriate epoxy resin may be used as long as it has the Tg described above. Epoxy resins typically refer to resins having an epoxy group in their molecular structure. Preferred epoxy resins include those having an aromatic ring in their molecular structure. By using epoxy resins having an aromatic ring, an epoxy resin having a higher Tg can be obtained. Examples of aromatic rings in epoxy resins having an aromatic ring in their molecular structure include a benzene ring, a naphthalene ring, and a fluorene ring. Epoxy resins may be used alone or in combination of two or more. When using two or more epoxy resins, you can also use a combination of epoxy resins containing aromatic epoxy and epoxy resins that do not contain aromatic epoxy.

分子結構內具有芳香族環之環氧樹脂具體上可列舉:雙酚A二環氧丙基醚型環氧樹脂、雙酚F二環氧丙基醚型環氧樹脂、雙酚S二環氧丙基醚型環氧樹脂、間苯二酚二環氧丙基醚型環氧樹脂、氫醌二環氧丙基醚型環氧樹脂、對苯二甲酸二環氧丙基酯型環氧樹脂、雙苯氧基乙醇茀二環氧丙基醚型環氧樹脂、雙酚茀二環氧丙基醚型環氧樹脂、雙甲酚茀二環氧丙基醚型環氧樹脂等具有2個環氧基之環氧樹脂;酚醛型環氧樹脂、N,N,O-三環氧丙基-對或-間-胺基苯酚型環氧樹脂、N,N,O-三環氧丙基-4-胺基-間-或-5-胺基-鄰甲酚型環氧樹脂、1,1,1-(三環氧丙基氧基苯基)甲烷型環氧樹脂等具有3個環氧基之環氧樹脂;環氧丙基胺型環氧樹脂(例如二胺基二苯甲烷型、二胺基二苯基碸型、間茬二胺型)等具有4個環氧基之環氧樹脂等。又,亦可使用六氫酞酸酐型環氧樹脂、四氫酞酸酐型環氧樹脂、二體酸型環氧樹脂、對氧基苯甲酸型等環氧丙基酯型環氧樹脂。Epoxy resins with aromatic rings in their molecular structure can be specifically listed as: bisphenol A diglycidyl ether type epoxy resin, bisphenol F diglycidyl ether type epoxy resin, bisphenol S diglycidyl ether type epoxy resin, resorcinol diglycidyl ether type epoxy resin, Hydroquinone diglycidyl ether type epoxy resin, terephthalate diglycidyl ester type epoxy resin, diphenoxyethanol fluorene diglycidyl ether type epoxy resin, bisphenol fluorene diglycidyl ether type epoxy resin, biscresol fluorene diglycidyl ether type epoxy resin, etc. have two Epoxy resins containing epoxy groups; epoxy resins having three epoxy groups, such as phenolic epoxy resins, N,N,O-triglycyrrhizic-p- or -m-aminophenol epoxy resins, N,N,O-triglycyrrhizic-4-amino-m- or -5-amino-o-cresol epoxy resins, and 1,1,1-(triglycyrrhizic-propyloxyphenyl)methane epoxy resins; epoxy resins having four epoxy groups, such as glycyrrhizic-amine epoxy resins (e.g., diaminodiphenylmethane type, diaminodiphenylsulfonium type, and interrupted diamine type). Furthermore, hexahydrophthalic anhydride type epoxy resin, tetrahydrophthalic anhydride type epoxy resin, dialcic acid type epoxy resin, p-oxybenzoic acid type epoxy resin, or other glycidyl ester type epoxy resin can also be used.

環氧樹脂之環氧當量宜為1000g/當量以上,較宜為3000g/當量以上,更宜為5000g/當量以上。又,環氧樹脂之環氧當量宜為30000g/當量以下,較宜為25000g/當量以下,更宜為20000g/當量以下。藉由令環氧當量為上述範圍,可獲得更穩定之保護層。此外,在本說明書中,「環氧當量」意指「包含1當量環氧基之環氧樹脂的質量」,可依循JIS K 7236測定。The epoxy equivalent weight of the epoxy resin is preferably 1000 g/equivalent or greater, more preferably 3000 g/equivalent or greater, and even more preferably 5000 g/equivalent or greater. Furthermore, the epoxy equivalent weight of the epoxy resin is preferably 30,000 g/equivalent or less, more preferably 25,000 g/equivalent or less, and even more preferably 20,000 g/equivalent or less. By keeping the epoxy equivalent weight within this range, a more stable protective layer can be obtained. In this specification, "epoxy equivalent weight" means "the mass of the epoxy resin containing one equivalent of epoxy groups" and can be measured in accordance with JIS K 7236.

本實施形態中,亦可併用環氧樹脂與其他樹脂。即,亦可將環氧樹脂與其他樹脂之摻合物供於保護層之成形。其他樹脂可按目的適當選擇。In this embodiment, epoxy resin and other resins may be used in combination. That is, a blend of epoxy resin and other resins may be used to form the protective layer. The other resin may be appropriately selected according to the intended purpose.

本實施形態之保護層例如可藉由塗佈包含上述環氧樹脂之有機溶劑溶液而形成塗膜,並使該塗膜固化而形成。有機溶劑溶液中之環氧樹脂濃度相對於溶劑100重量份宜為3重量份~20重量份。若為所述樹脂濃度,便可形成密著於偏光件且均勻的塗佈膜。The protective layer of this embodiment can be formed, for example, by applying an organic solvent solution containing the aforementioned epoxy resin to form a coating film, and then curing the coating film. The epoxy resin concentration in the organic solvent solution is preferably 3 to 20 parts by weight per 100 parts by weight of the solvent. This resin concentration allows for a uniform coating film that adheres closely to the polarizer.

上述有機溶劑可使用可將環氧樹脂溶解或均勻分散之任意適當之溶劑。溶劑之具體例可舉乙酸乙酯、甲苯、甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環戊酮、環己酮。The organic solvent may be any suitable solvent that can dissolve or uniformly disperse the epoxy resin. Specific examples of the solvent include ethyl acetate, toluene, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclopentanone, and cyclohexanone.

溶液可塗佈於任意適當之基材上,亦可塗佈於偏光件上。當塗佈於基材時,形成於基材上之塗佈膜的固化物會轉印至偏光件上。當塗佈於偏光件時,藉由使塗佈膜乾燥(固化),而於偏光件上直接形成保護層。較佳為溶液塗佈於偏光件上,而於偏光件上直接形成保護層。若為所述構成,便可省略轉印所需之接著劑層或黏著劑層,故可使偏光板更薄。溶液之塗佈方法如上述。The solution can be applied to any suitable substrate or to a polarizer. When applied to a substrate, the cured product of the coating film formed on the substrate is transferred to the polarizer. When applied to a polarizer, a protective layer is formed directly on the polarizer by drying (curing) the coating film. It is preferred that the solution be applied to the polarizer to form a protective layer directly on the polarizer. If the structure is as described above, the adhesive layer or the adhesive layer required for transfer can be omitted, so the polarizer can be made thinner. The method of applying the solution is as described above.

藉由使溶液之塗佈膜乾燥(固化),可形成屬塗佈膜之固化物的保護層。乾燥溫度宜為100℃以下,較宜為50℃~70℃。乾燥溫度若在所述範圍內,便可防止對偏光件造成不良影響。乾燥時間可因應乾燥溫度變化。乾燥時間例如可為1分鐘~10分鐘。By drying (curing) the solution coating, a protective layer is formed as a cured product of the coating. The drying temperature is preferably below 100°C, more preferably between 50°C and 70°C. Within this range, adverse effects on the polarizer can be prevented. The drying time can vary depending on the drying temperature. For example, the drying time can be between 1 and 10 minutes.

B.附相位差層之偏光板 B-1.附相位差層之偏光板之整體構成 圖7係本發明一實施形態之附相位差層之偏光板的概略截面圖。圖式例之附相位差層之偏光板200包含上述A項記載之偏光板100與相位差層120。因此,附相位差層之偏光板200具有與偏光板100相同之異形。附相位差層之偏光板200中,相位差層120亦可作為偏光件10之保護層發揮功能。相位差層120代表上係透過接著層(未圖示)積層於偏光板100(圖式例中為偏光件10)。接著層為接著劑層或黏著劑層,而由重工性等觀點來看宜為黏著劑層(例如丙烯酸系黏著劑層)。雖未示於圖式中,但附相位差層之偏光板亦可因應需求在偏光件10之相位差層120側具有另一保護層(未圖示)。又,附相位差層之偏光板亦可因應需求於相位差層120之與偏光板100相反之側具有另一相位差層(未圖示)。另一相位差層代表上為折射率特性展現nz>nx=ny之關係的所謂正C板。B. Polarizing Plate with Phase Difference Layer B-1. Overall Structure of Polarizing Plate with Phase Difference Layer Figure 7 is a schematic cross-sectional view of a polarizing plate with phase difference layer according to one embodiment of the present invention. The polarizing plate with phase difference layer 200 shown in the illustrated example comprises the polarizing plate 100 described in Section A above and a phase difference layer 120. Therefore, the polarizing plate with phase difference layer 200 has the same shape as the polarizing plate 100. In the polarizing plate with phase difference layer 200, the phase difference layer 120 also functions as a protective layer for the polarizer 10. The phase difference layer 120 is typically laminated onto the polarizing plate 100 (in the illustrated example, the polarizer 10) via a bonding layer (not shown). The bonding layer is a bonding agent layer or an adhesive layer, and from the perspective of workability, an adhesive layer (e.g., an acrylic adhesive layer) is preferably used. Although not shown in the figure, the polarizing plate with a phase difference layer may also have another protective layer (not shown) on the phase difference layer 120 side of the polarizer 10 as needed. Furthermore, the polarizing plate with a phase difference layer may also have another phase difference layer (not shown) on the side of the phase difference layer 120 opposite the polarizing plate 100 as needed. The other phase difference layer is typically a so-called positive C plate, whose refractive index characteristics exhibit the relationship nz>nx=ny.

相位差層120之Re(550)宜為100nm~190nm,Re(450)/Re(550)宜為0.8以上且小於1。並且,相位差層120的慢軸與偏光件10的吸收軸形成之角度宜為40°~50°。The Re(550) of the phase difference layer 120 is preferably 100 nm to 190 nm, and the Re(450)/Re(550) is preferably greater than 0.8 and less than 1. In addition, the angle formed by the slow axis of the phase difference layer 120 and the absorption axis of the polarizer 10 is preferably 40° to 50°.

B-2.相位差層 相位差層120可因應目的具有任意適當之光學特性及/或機械特性。相位差層代表上具有慢軸。在一實施形態中,相位差層的慢軸與偏光件10的吸收軸形成之角度θ如上述宜為40°~50°,較宜為42°~48°,更宜為約45°。角度θ若在所述範圍內,如後述藉由將相位差層做成λ/4板,可獲得具有非常優異圓偏光特性(以結果而言為非常優異的抗反射特性)的附相位差層之偏光板。B-2. Phase Difference Layer The phase difference layer 120 can have any appropriate optical and/or mechanical properties depending on the intended purpose. The phase difference layer typically has a slow axis. In one embodiment, the angle θ formed between the slow axis of the phase difference layer and the absorption axis of the polarizer 10 is preferably 40° to 50°, more preferably 42° to 48°, and even more preferably approximately 45°, as described above. If the angle θ is within this range, by forming the phase difference layer into a λ/4 plate, as described later, a polarizing plate with a phase difference layer having excellent circular polarization properties (and consequently, excellent anti-reflection properties) can be obtained.

相位差層較佳為折射率特性展現nx>ny≧nz之關係。相位差層代表上係為了賦予偏光板抗反射特性而設置,在一實施形態中可作為λ/4板發揮功能。此時,相位差層之面內相位差Re(550)宜為100nm~190nm,較宜為110nm~170nm,更宜為130nm~160nm。此外,在此「ny=nz」不只ny與nz完全相同之情況,還包含實質上相同之情況。因此,在不損及本發明效果之範圍下可有成為ny<nz之情形。The phase difference layer preferably exhibits a refractive index characteristic exhibiting the relationship nx>ny≧nz. The phase difference layer is typically provided to impart antireflection properties to the polarizing plate, and in one embodiment, it can function as a λ/4 plate. In this case, the in-plane phase difference Re(550) of the phase difference layer is preferably 100nm-190nm, more preferably 110nm-170nm, and even more preferably 130nm-160nm. Furthermore, "ny=nz" here encompasses not only the case where ny and nz are exactly the same, but also the case where they are substantially the same. Therefore, a situation where ny<nz is possible without compromising the effects of the present invention.

相位差層之Nz係數宜為0.9~3,較宜為0.9~2.5,更宜為0.9~1.5,尤宜為0.9~1.3。藉由滿足所述關係,在將所得附相位差層之偏光板使用於影像顯示裝置時,可達成非常優異之反射色相。The Nz coefficient of the retardation layer is preferably 0.9-3, more preferably 0.9-2.5, even more preferably 0.9-1.5, and most preferably 0.9-1.3. By satisfying this relationship, the resulting polarizing plate with a retardation layer can achieve excellent reflected hue when used in an image display device.

相位差層可展現相位差值隨測定光之波長變大的逆色散波長特性,亦可展現相位差值隨測定光之波長變小的正波長色散特性,又可展現相位差值幾乎不隨測定光之波長變化的平坦的波長色散特性。在一實施形態中,相位差層展現逆色散波長特性。此時,相位差層之Re(450)/Re(550)宜為0.8以上且小於1,較宜為0.8以上且0.95以下。若為所述構成,便可實現非常優異的抗反射特性。The phase difference layer can exhibit an inverse dispersion wavelength characteristic in which the phase difference value increases with the wavelength of the measured light, a positive wavelength dispersion characteristic in which the phase difference value decreases with the wavelength of the measured light, or a flat wavelength dispersion characteristic in which the phase difference value hardly changes with the wavelength of the measured light. In one embodiment, the phase difference layer exhibits an inverse dispersion wavelength characteristic. In this case, the Re(450)/Re(550) ratio of the phase difference layer is preferably greater than 0.8 and less than 1, and more preferably greater than 0.8 and less than 0.95. With such a configuration, very excellent anti-reflection properties can be achieved.

相位差層包含光彈性係數的絕對值宜為2×10-11 m2 /N以下、較宜為2.0×10-13 m2 /N~1.5×10-11 m2 /N、更宜為1.0×10-12 m2 /N~1.2×10-11 m2 /N之樹脂。光彈性係數的絕對值若在所述範圍內,加熱時產生收縮應力時便不易發生相位差變化。結果,可良好地防止所得影像顯示裝置的熱不均。The retardation layer preferably comprises a resin having an absolute photoelastic coefficient of 2× 10-11 m2 /N or less, more preferably 2.0× 10-13 m2/ N to 1.5 ×10-11 m2 /N, and even more preferably 1.0× 10-12 m2 /N to 1.2× 10-11 m2 /N. When the absolute photoelastic coefficient falls within this range, retardation changes due to shrinkage stress during heating are less likely to occur. As a result, thermal nonuniformity in the resulting image display device can be effectively prevented.

相位差層代表上係以樹脂薄膜之延伸薄膜構成。在一實施形態中,相位差層之厚度宜為70µm以下,較宜為45µm~60µm。相位差層之厚度若在所述範圍內,便可良好地抑制加熱時之捲曲,同時可良好地調整貼合時之捲曲。又,如後述,在相位差層以聚碳酸酯系樹脂薄膜構成之實施形態中,相位差層之厚度宜為40µm以下,較宜為10µm~40µm,更宜為20µm~30µm。相位差層藉由以具有所述厚度之聚碳酸酯系樹脂薄膜構成,可抑制捲曲發生,並可有助於提升抗彎折耐久性及反射色相。The phase difference layer is typically formed of a stretched film of a resin film. In one embodiment, the thickness of the phase difference layer is preferably 70µm or less, more preferably 45µm to 60µm. If the thickness of the phase difference layer is within the aforementioned range, curling during heating can be effectively suppressed, and curling during bonding can be effectively adjusted. Furthermore, as described later, in an embodiment in which the phase difference layer is formed of a polycarbonate resin film, the thickness of the phase difference layer is preferably 40µm or less, more preferably 10µm to 40µm, and more preferably 20µm to 30µm. By forming the phase difference layer with a polycarbonate resin film having the aforementioned thickness, curling can be suppressed and the anti-bending durability and reflective hue can be improved.

相位差層可以可滿足上述特性之任意適當之樹脂薄膜構成。所述樹脂之代表例可舉聚碳酸酯系樹脂、聚酯碳酸酯系樹脂、聚酯系樹脂、聚乙烯縮醛系樹脂、聚芳酯系樹脂、環狀烯烴系樹脂、纖維素系樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚苯乙烯系樹脂、丙烯酸系樹脂。該等樹脂可單獨使用,亦可組合(例如摻合、共聚)來使用。相位差層以顯示逆色散波長特性之樹脂薄膜構成時,可適宜使用聚碳酸酯系樹脂或聚酯碳酸酯系樹脂(以下有時僅稱作聚碳酸酯系樹脂)。The phase difference layer can be formed from any suitable resin film that satisfies the above-mentioned properties. Representative examples of such resins include polycarbonate resins, polyester carbonate resins, polyester resins, polyvinyl acetal resins, polyarylate resins, cycloolefin resins, cellulose resins, polyvinyl alcohol resins, polyamide resins, polyimide resins, polyether resins, polystyrene resins, and acrylic resins. These resins can be used alone or in combination (e.g., by blending or copolymerization). When the phase difference layer is formed of a resin film exhibiting reverse dispersion wavelength characteristics, a polycarbonate resin or a polyester carbonate resin (hereinafter sometimes simply referred to as a polycarbonate resin) can be suitably used.

只要可獲得本發明之效果,上述聚碳酸酯系樹脂便可使用任意適當之聚碳酸酯系樹脂。例如,聚碳酸酯系樹脂包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元及源自選自於由脂環式二醇、脂環式二甲醇、二、三或聚乙二醇、以及伸烷基二醇或螺甘油所構成群組中之至少1種二羥基化合物之結構單元。聚碳酸酯系樹脂宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元、源自脂環式二甲醇之結構單元以及/或是源自二、三或聚乙二醇之結構單元;更宜包含源自茀系二羥基化合物之結構單元、源自異山梨醇系二羥基化合物之結構單元與源自二、三或聚乙二醇之結構單元。聚碳酸酯系樹脂亦可因應需要包含有源自其他二羥基化合物之結構單元。此外,本發明可適宜使用之聚碳酸酯系樹脂的詳細內容例如記載於日本專利特開2014-10291號公報、日本專利特開2014-26266號公報、日本專利特開2015-212816號公報、日本專利特開2015-212817號公報、日本專利特開2015-212818號公報中,而本說明書即援用該記載作為參考。Any appropriate polycarbonate resin can be used as the polycarbonate resin as long as the effects of the present invention are achieved. For example, the polycarbonate resin comprises structural units derived from a fluorene-based dihydroxy compound, structural units derived from an isosorbide-based dihydroxy compound, and structural units derived from at least one dihydroxy compound selected from the group consisting of alicyclic diols, alicyclic dimethanols, di-, tri- or polyethylene glycols, and alkylene glycols or spiroglycerol. The polycarbonate resin preferably includes structural units derived from fluorene-based dihydroxy compounds, structural units derived from isosorbide-based dihydroxy compounds, structural units derived from alicyclic dimethanols, and/or structural units derived from di-, tri-, or polyethylene glycol. More preferably, the polycarbonate resin includes structural units derived from fluorene-based dihydroxy compounds, structural units derived from isosorbide-based dihydroxy compounds, and structural units derived from di-, tri-, or polyethylene glycol. The polycarbonate resin may also include structural units derived from other dihydroxy compounds as needed. In addition, the details of the polycarbonate resin that can be suitably used in the present invention are described in, for example, Japanese Patent Publication No. 2014-10291, Japanese Patent Publication No. 2014-26266, Japanese Patent Publication No. 2015-212816, Japanese Patent Publication No. 2015-212817, and Japanese Patent Publication No. 2015-212818, and these descriptions are incorporated herein by reference.

前述聚碳酸酯系樹脂的玻璃轉移溫度宜為110℃以上且150℃以下,較宜為120℃以上且140℃以下。玻璃轉移溫度若過低,耐熱性有變差之傾向,而有在薄膜成形後造成尺寸變化之可能性,或有降低所得有機EL面板之影像品質的情況。玻璃轉移溫度若過高,有薄膜成形時之成形穩定性變差之情況,或有損及薄膜之透明性之情況。此外,玻璃轉移溫度可依循JIS K 7121(1987)求得。The glass transition temperature of the polycarbonate resin is preferably 110°C to 150°C, more preferably 120°C to 140°C. If the glass transition temperature is too low, heat resistance tends to deteriorate, potentially causing dimensional changes after film formation, or reducing the image quality of the resulting organic EL panel. If the glass transition temperature is too high, film forming stability may deteriorate or the transparency of the film may be compromised. The glass transition temperature can be determined in accordance with JIS K 7121 (1987).

前述聚碳酸酯系樹脂的分子量可以比濃黏度表示。比濃黏度係用二氯甲烷作為溶劑,將聚碳酸酯濃度精密調製成0.6g/dL後,在溫度20.0℃±0.1℃下用烏氏黏度管進行測定。比濃黏度的下限通常宜為0.30dL/g,較宜為0.35dL/g以上。比濃黏度的上限通常宜為1.20dL/g,較宜為1.00dL/g,更宜為0.80dL/g。比濃黏度若小於前述下限值,則有發生成形品之機械強度變小之問題的情形。另一方面,比濃黏度若大於前述上限值,則進行成形時之流動性會降低,而有發生生產性或成形性降低之問題的情形。The molecular weight of the aforementioned polycarbonate resin can be expressed as its concentrated viscosity. This viscosity is measured using an Oodel viscometer at 20.0°C ± 0.1°C using methylene chloride as a solvent, after precisely adjusting the polycarbonate concentration to 0.6 g/dL. The lower limit of the concentrated viscosity is generally preferably 0.30 dL/g, preferably 0.35 dL/g or higher. The upper limit of the concentrated viscosity is generally preferably 1.20 dL/g, preferably 1.00 dL/g, and more preferably 0.80 dL/g. If the concentrated viscosity is below the lower limit, the mechanical strength of the molded product may decrease. On the other hand, if the specific viscosity exceeds the upper limit, the fluidity during molding may decrease, which may lead to problems with productivity or moldability.

聚碳酸酯系樹脂薄膜亦可使用市售薄膜。市售品之具體例可舉帝人公司製之商品名「PURE-ACE WR-S」、「PURE-ACE WR-W」、「PURE-ACE WR-M」、日東電工公司製之商品名「NRF」。Commercially available polycarbonate resin films may also be used. Specific examples of commercially available products include "PURE-ACE WR-S," "PURE-ACE WR-W," and "PURE-ACE WR-M" manufactured by Teijin Co., Ltd., and "NRF" manufactured by Nitto Denko Co., Ltd.

相位差層例如可藉由將由上述聚碳酸酯系樹脂形成之薄膜延伸而得。由聚碳酸酯系樹脂形成薄膜之方法可採用任意適當之成形加工法。具體例可舉:壓縮成形法、轉注成形法、射出成形法、擠製成形法、吹氣成形法、粉末成形法、FRP成形法、澆鑄塗敷法(例如流延法)、砑光成形法、熱壓法等。宜為擠製成形法或澆鑄塗敷法。其係因可提高所得薄膜之平滑性,從而可獲得良好的光學均勻性。成形條件可因應使用樹脂之組成或種類、對相位差層所期望之特性等適當設定。此外,如上述,聚碳酸酯系樹脂在市面上販售有很多薄膜製品,故可將該市售薄膜直接供於延伸處理。The phase difference layer can be obtained, for example, by stretching a film formed from the above-mentioned polycarbonate resin. The method of forming a film from a polycarbonate resin can adopt any appropriate molding method. Specific examples include: compression molding, transfer molding, injection molding, extrusion molding, blow molding, powder molding, FRP molding, casting and coating (such as casting), calendering molding, hot pressing, etc. Extrusion molding or casting and coating is preferred. This is because the smoothness of the obtained film can be improved, thereby obtaining good optical uniformity. The molding conditions can be appropriately set according to the composition or type of the resin used, the desired properties of the phase difference layer, etc. Furthermore, as mentioned above, many polycarbonate resin films are commercially available, so these commercially available films can be directly subjected to the stretching process.

樹脂薄膜(未延伸薄膜)的厚度可因應相位差層所期望之厚度、所期望之光學特性、後述延伸條件等設定成任意適當之值。宜為50µm~300µm。The thickness of the resin film (unstretched film) can be set to any appropriate value depending on the desired thickness of the phase difference layer, the desired optical properties, the stretching conditions described below, etc. It is preferably 50µm to 300µm.

上述延伸可採用任意適當之延伸方法、延伸條件(例如延伸溫度、延伸倍率、延伸方向)。具體而言,可單獨使用自由端延伸、固定端延伸、自由端收縮、固定端收縮等各種延伸方法,亦可同步或逐次使用。關於延伸方向,亦可沿長度方向、寬度方向、厚度方向、斜向等各種方向或維度進行。延伸的溫度相對於樹脂薄膜的玻璃轉移溫度(Tg)宜為Tg-30℃~Tg+60℃,較宜為Tg-10℃~Tg+50℃。The above-mentioned stretching can adopt any appropriate stretching method and stretching conditions (such as stretching temperature, stretching ratio, stretching direction). Specifically, various stretching methods such as free end stretching, fixed end stretching, free end shrinking, fixed end shrinking, etc. can be used separately, or they can be used simultaneously or successively. Regarding the stretching direction, it can also be carried out along various directions or dimensions such as the length direction, width direction, thickness direction, and oblique direction. The stretching temperature is preferably Tg-30℃~Tg+60℃ relative to the glass transition temperature (Tg) of the resin film, and more preferably Tg-10℃~Tg+50℃.

藉由適當選擇上述延伸方法、延伸條件,可獲得具有上述所期望之光學特性(例如折射率特性、面內相位差、Nz係數)的相位差薄膜。By appropriately selecting the stretching method and stretching conditions, a retardation film having the desired optical properties (such as refractive index properties, in-plane retardation, and Nz coefficient) can be obtained.

在一實施形態中,相位差薄膜可藉由將樹脂薄膜進行單軸延伸或固定端單軸延伸來製作。固定端單軸延伸之具體例,可舉一邊使樹脂薄膜在長邊方向上移動,一邊往寬度方向(橫向)進行延伸之方法。延伸倍率宜為1.1倍~3.5倍。In one embodiment, the retardation film can be produced by uniaxially stretching a resin film or by fixed-end uniaxial stretching. A specific example of fixed-end uniaxial stretching is stretching the resin film in its widthwise (lateral) direction while moving it in its longitudinal direction. The stretching ratio is preferably 1.1x to 3.5x.

在另一實施形態中,相位差薄膜可藉由將長條狀樹脂薄膜往相對於長邊方向呈上述角度θ之方向連續進行斜向延伸來製作。藉由採用斜向延伸,可獲得相對於薄膜之長邊方向具有角度θ之定向角(於角度θ之方向上具有慢軸)的長條狀延伸薄膜,例如在與偏光件積層時,可進行捲對捲,從而可簡化製造步驟。此外,角度θ可為附相位差層之偏光板中偏光件的吸收軸與相位差層的慢軸形成之角度。角度θ如上述,宜為40°~50°,較宜為42°~48°,更宜為約45°。In another embodiment, the phase difference film can be produced by continuously stretching a long strip of resin film obliquely in the direction of the aforementioned angle θ relative to the long side direction. By adopting the oblique stretching, a long strip of stretched film having an orientation angle of angle θ relative to the long side direction of the film (having a slow axis in the direction of angle θ) can be obtained. For example, when laminating with a polarizer, a roll-to-roll process can be performed, thereby simplifying the manufacturing steps. In addition, the angle θ can be the angle formed by the absorption axis of the polarizer in the polarizing plate with a phase difference layer and the slow axis of the phase difference layer. As mentioned above, the angle θ is preferably 40°~50°, more preferably 42°~48°, and more preferably about 45°.

斜向延伸所用延伸機可舉拉幅式延伸機,其係例如可對橫向及/或縱向附加左右相異之速度的輸送力或是拉伸力或拉抽力者。拉幅式延伸機有橫式單軸延伸機、同步雙軸延伸機等,只要可將長條狀樹脂薄膜連續地進行斜向延伸,便可使用任意適當的延伸機。The stretching machine used for diagonal stretching can be a tenter-type stretching machine, which, for example, applies conveying forces, stretching forces, or pulling forces at different speeds in the transverse and/or longitudinal directions. Tenter-type stretching machines include transverse single-axis stretching machines and synchronous dual-axis stretching machines. Any suitable stretching machine can be used as long as it can continuously diagonally stretch a long strip of resin film.

藉由分別適當控制上述延伸機中之左右速度,可獲得具有上述所期望之面內相位差且於上述所期望之方向上具有慢軸之相位差層(實質上為長條狀相位差薄膜)。By appropriately controlling the left and right speeds in the stretching machine, a phase difference layer (essentially a long strip of phase difference film) having the desired in-plane phase difference and a slow axis in the desired direction can be obtained.

上述薄膜的延伸溫度可因應對相位差層所期望之面內相位差值及厚度、所使用之樹脂的種類、所使用之薄膜的厚度、延伸倍率等變化。具體而言,延伸溫度宜為Tg-30℃~Tg+30℃,更宜為Tg-15℃~Tg+15℃,最宜為Tg-10℃~Tg+10℃。藉由以所述溫度延伸,本發明中可獲得具有適當特性之相位差層。此外,Tg係薄膜之構成材料的玻璃轉移溫度。The stretching temperature of the film can vary depending on the desired in-plane retardation value and thickness of the retardation layer, the type of resin used, the film thickness, the stretching ratio, and other factors. Specifically, the stretching temperature is preferably between Tg-30°C and Tg+30°C, more preferably between Tg-15°C and Tg+15°C, and most preferably between Tg-10°C and Tg+10°C. By stretching at these temperatures, a retardation layer with suitable properties can be obtained in the present invention. Tg is the glass transition temperature of the film's constituent material.

C.影像顯示裝置 上述偏光板或附相位差層之偏光板可應用於影像顯示裝置。因此,本發明實施形態包含含有所述偏光板或附相位差層之偏光板的影像顯示裝置。影像顯示裝置的代表例可舉液晶顯示裝置、電致發光(EL)顯示裝置(例如有機EL顯示裝置、無機EL顯示裝置)。本發明實施形態之影像顯示裝置於其視辨側具備上述A項記載之偏光板或B項記載之附相位差層之偏光板。附相位差層之偏光板係以使相位差層成為影像顯示單元(例如液晶單元、有機EL單元、無機EL單元)側之方式(使偏光件成為視辨側)積層。影像顯示裝置宜具有矩形以外之異形。在所述影像顯示裝置中,本發明實施形態所帶來之效果很顯著。具有異形之影像顯示裝置之具體例可舉如汽車儀表盤、智慧型手機、平板型PC、智慧型手錶。C. Image Display Device The aforementioned polarizing plate or polarizing plate with a phase difference layer can be applied to an image display device. Therefore, embodiments of the present invention include an image display device including the aforementioned polarizing plate or polarizing plate with a phase difference layer. Representative examples of image display devices include liquid crystal display devices and electroluminescent (EL) display devices (e.g., organic EL display devices, inorganic EL display devices). The image display device of an embodiment of the present invention includes the polarizing plate described in item A or the polarizing plate with a phase difference layer described in item B on its viewing side. The polarizing plate with a phase difference layer is laminated such that the phase difference layer is on the side of an image display unit (e.g., a liquid crystal unit, an organic EL unit, an inorganic EL unit) (such that the polarizer is on the viewing side). The image display device preferably has a shape other than rectangular. In the aforementioned image display device, the effects brought about by the embodiment of the present invention are very significant. Specific examples of image display devices with different shapes include car dashboards, smart phones, tablet PCs, and smart watches.

實施例 以下,以實施例來具體說明本發明,惟本發明不受該等實施例所限。各特性之測定方法如以下所述。此外,只要無特別註記,實施例及比較例中之「份」及「%」即為重量基準。EXAMPLES The present invention is described below in detail using examples, but the present invention is not limited to these examples. The measurement methods for various properties are described below. In addition, unless otherwise noted, "parts" and "%" in the examples and comparative examples are by weight.

(1)厚度 使用干涉膜厚計(大塚電子公司製,製品名「MCPD-3000」)進行測定。厚度計算所用之計算波長範圍係在400nm~500nm,且折射率設為1.53。 (2)PVA之面內相位差(Re) 針對從實施例及比較例中所得偏光件/熱塑性樹脂基材之積層體剝離去除樹脂基材後的偏光件(偏光件單體),使用相位差測定裝置(王子計測機器公司製 製品名「KOBRA-31X100/IR」)評估PVA在波長1000nm下之的面內相位差(Rpva)(根據所說明之原理,係在波長1000nm下之總面內相位差減去碘之面內相位差(Ri)後之數值)。吸收端波長設為600nm。 (3)PVA之雙折射(Δn) 將上述(2)測定之PVA的面內相位差除以偏光件之厚度,藉此算出PVA之雙折射(Δn)。 (4)單體透射率及偏光度 針對從實施例及比較例中所得偏光件/熱塑性樹脂基材之積層體剝離去除樹脂基材後的偏光件(偏光件單體),使用紫外線可見光分光光度計(日本分光公司製「V-7100」)測定單體透射率Ts、平行透射率Tp、正交透射率Tc。該等Ts、Tp及Tc係以JIS Z 8701之2度視野(C光源)進行測定並進行視感度校正所得之Y值。從所得Tp及Tc利用下述式求得偏光度P。 偏光度P(%)={(Tp-Tc)/(Tp+Tc)}1 /2 ×100 此外,分光光度計亦可使用大塚電子公司製「LPF-200」等進行同等之測定,不論在使用何種分光光度計之情況下皆可確認有獲得同等的測定結果。 (5)穿刺強度(每單位厚度之斷裂強度) 從實施例及比較例所得偏光件/熱塑性樹脂基材之積層體剝離偏光件,並載置於裝設有針之壓縮試驗機(KATO TECH CO., LTD.製,製品名「NDG5」針貫通力測定規格),在室溫(23℃±3℃)環境下,以穿刺速度0.33cm/秒穿刺,並將偏光件破裂時之強度作為斷裂強度。評估值係測定10個試料片之斷裂強度並採用其平均值。此外,針係使用前端徑1mmφ、0.5R者。針對要測定之偏光件,使用具有直徑11mm之圓形開口部的治具從偏光件兩面夾住固定後,使針向開口部之中央部穿刺來進行試驗。 (6)PVA之定向函數 針對從實施例及比較例中所得偏光件/熱塑性樹脂基材之積層體剝離去除樹脂基材後的偏光件(偏光件單體),對與已剝離樹脂基材之面為相反側的面,使用傅立葉轉換紅外線分光光度計(FT-IR)(Perkin Elmer公司製,商品名:「Frontier」),以經偏光之紅外線作為測定光,進行偏光件表面之衰減全反射分光(ATR:attenuated total reflection)測定。用以使偏光件密著之微晶係使用鍺,並將測定光之入射角設為45°入射。定向函數之計算依以下程序進行。欲使入射之經偏光的紅外線(測定光)係設為平行於使鍺結晶試樣密著之面而振動的偏光(s偏光),並在將偏光件之延伸方向相對於測定光之偏光方向作垂直(⊥)及平行(//)配置的狀態下測定各個吸光度光譜。從所得吸光度光譜算出以(3330cm-1 強度)為參考之(2941cm-1 強度)I。I 係從將偏光件之延伸方向相對於測定光之偏光方向作垂直(⊥)配置時所得吸光度光譜而獲得的(2941cm-1 強度)/(3330cm-1 強度)。又,I// 係從將偏光件之延伸方向相對於測定光之偏光方向作平行(//)配置時所得吸光度光譜而獲得的(2941cm-1 強度)/(3330cm-1 強度)。於此,(2941cm-1 強度)係吸光度光譜底部之將2770cm-1 與2990cm-1 作為基線時之2941cm-1 的吸光度,(3330cm-1 強度)係將2990cm-1 與3650cm-1 作為基線時之3330cm-1 的吸光度。用所得I 及I// ,依式1算出定向函數f。此外,f=1時為完全定向,f=0時為無規。又,可謂2941cm-1 之波峰係起因於偏光件中之PVA主鏈(-CH2 -)振動的吸收。又,可謂3330cm-1 之波峰係起因於PVA之羥基振動的吸收。 (式1)f=(3<cos2 θ>-1)/2 =(1-D)/[c(2D+1)] 惟, 當c=(3cos2 β-1)/2且如上述使用2941cm-1 時,β=90°⇒y=-2×(1-D)/(2D+1)。 θ:分子鏈相對於延伸方向之角度 β:躍遷偶極矩相對於分子鏈軸之角度 D=(I )/(I// ) I :測定光之偏光方向與偏光件之延伸方向呈垂直時之吸收強度 I// :測定光之偏光方向與偏光件之延伸方向呈平行時之吸收強度 (7)裂痕發生率 於實施例及比較例所得偏光板(或附相位差層之偏光板)之保護層表面暫時黏著表面保護薄膜。接著,於該偏光板(或附相位差層之偏光板)之黏著劑層暫時黏著分離件。將該積層體裁切成約130mm×約70mm。此時係以偏光件之吸收軸成為短邊方向之方式進行裁切。於裁切出之積層體之短邊中央部形成寬度5mm、深度(凹部長度)6.85mm、曲率半徑2.5mm之U字缺口。U字缺口係藉由端銑刀加工形成。端銑刀之外徑為4mm、進給速度為500mm/分鐘、旋轉數為35000rpm、切削量及切削次數為粗削0.2mm/次、精削0.1mm/次之合計2次。從形成有U字缺口之積層體剝離分離件,並透過丙烯酸系黏著劑層貼附於玻璃板(厚度1.1mm)。最後,剝離表面保護薄膜,而獲得具有保護層/偏光件/黏著劑層/玻璃板(或保護層/偏光件/黏著劑層/相位差層/黏著劑層/玻璃板)之構成的試驗試樣。將該試驗試樣供於熱震試驗,該熱震試驗係將於-40℃下維持30分鐘後在85℃下維持30分鐘之操作反覆300個循環,然後,以肉眼確認試驗後有無L字裂痕發生。使用3片偏光板(或附相位差層之偏光板)進行該評估,評估有發生裂痕(實質上為L字裂痕)之偏光板(或附相位差層之偏光板)的數量。(1) The thickness was measured using an interferometer film thickness meter (manufactured by Otsuka Electronics Co., Ltd., product name "MCPD-3000"). The wavelength range used for thickness calculation was 400nm~500nm, and the refractive index was set to 1.53. (2) In-plane phase difference (Re) of PVA The in-plane phase difference (Rpva) of PVA at a wavelength of 1000nm was evaluated using a phase difference measuring device (manufactured by Oji Scientific Instruments, Ltd., product name "KOBRA-31X100/IR") for the polarizer (polarizer single body) obtained by peeling off the resin substrate from the polarizer/thermoplastic resin substrate laminate obtained in the embodiment and the comparative example (according to the principle described, the value is the value obtained by subtracting the in-plane phase difference (Ri) of iodine from the total in-plane phase difference at a wavelength of 1000nm). The absorption end wavelength is set to 600 nm. (3) Birefringence (Δn) of PVA The birefringence (Δn) of PVA is calculated by dividing the in-plane phase difference of PVA measured in (2) above by the thickness of the polarizer. (4) Single body transmittance and polarization degree The single body transmittance Ts, parallel transmittance Tp, and orthogonal transmittance Tc of the polarizer (polarizer single body) obtained from the polarizer/thermoplastic resin substrate laminate obtained in the embodiment and the comparative example after the resin substrate is removed are measured using an ultraviolet-visible spectrophotometer ("V-7100" manufactured by JASCO Corporation). These Ts, Tp, and Tc are the Y values obtained by measuring the 2-degree field of view (light source C) of JIS Z 8701 and performing visual sensitivity correction. The polarization degree P is calculated from the obtained Tp and Tc using the following formula: Polarization degree P (%) = {(Tp - Tc) / (Tp + Tc)} 1 /2 × 100. Equivalent measurements can be performed using a spectrophotometer such as the "LPF-200" manufactured by Otsuka Electronics Co., Ltd. Equivalent results can be obtained regardless of the spectrophotometer used. (5) Puncture strength (fracture strength per unit thickness) The polarizer was peeled off from the polarizer/thermoplastic resin substrate laminate obtained in the Examples and Comparative Examples and placed on a compression tester equipped with a needle (manufactured by KATO TECH CO., LTD., product name "NDG5" needle penetration test specification). At room temperature (23°C ± 3°C), the polarizer was punctured at a puncture speed of 0.33 cm/s. The strength at which the polarizer broke was taken as the fracture strength. The evaluation value was the fracture strength of 10 test pieces and the average value was adopted. In addition, the needle used had a tip diameter of 1 mmφ and a radius of 0.5. The polarizer to be measured was fixed from both sides of the polarizer using a jig with a circular opening of 11 mm in diameter, and then the needle was pierced into the center of the opening to conduct the test. (6) Orientation function of PVA The polarizer (polarizer unit) obtained from the polarizer/thermoplastic resin substrate laminate obtained in the Examples and Comparative Examples was stripped of the resin substrate. The surface of the polarizer was measured by attenuated total reflection (ATR) using a Fourier transform infrared spectrophotometer (FT-IR) (manufactured by Perkin Elmer, trade name: "Frontier") with polarized infrared light as the measurement light. The microcrystals used to bond the polarizer are made of germanium, and the incident angle of the measurement light is set at 45°. The orientation function is calculated according to the following procedure. The incident polarized infrared light (measurement light) is set to vibrate parallel to the surface of the germanium crystal sample to bond it (s-polarization). The absorbance spectra are measured with the polarizer extended perpendicular (⊥) and parallel (//) to the polarization direction of the measurement light. From the resulting absorbance spectra, the intensity (2941 cm -1 ) is calculated, with the intensity (3330 cm - 1) serving as a reference. I represents the (2941 cm -1 intensity) / (3330 cm -1 intensity) obtained from the absorbance spectrum when the polarizer is positioned perpendicular (⊥) to the polarization direction of the measurement light. Furthermore, I // represents the (2941 cm - 1 intensity) / (3330 cm -1 intensity) obtained from the absorbance spectrum when the polarizer is positioned parallel (//) to the polarization direction of the measurement light. Here, (2941 cm -1 intensity) represents the absorbance at 2941 cm-1 at the bottom of the absorbance spectrum, using 2770 cm -1 and 2990 cm -1 as baselines, and (3330 cm -1 intensity) represents the absorbance at 3330 cm- 1 , using 2990 cm -1 and 3650 cm - 1 as baselines. Using the obtained I and I // , the orientation function f is calculated according to Equation 1. Note that f = 1 indicates complete orientation, and f = 0 indicates random orientation. Furthermore, the peak at 2941 cm -1 can be considered to be due to the absorption of the (-CH 2 -) vibration of the PVA main chain in the polarizer. Furthermore, the peak at 3330 cm -1 can be considered to be due to the absorption of the hydroxyl vibration of PVA. (Equation 1) f = (3 < cos 2 θ > -1)/2 = (1 - D)/[c(2D + 1)] However, when c = (3 cos 2 β - 1)/2 and 2941 cm -1 is used as described above, β = 90° ⇒ y = -2 × (1 - D)/(2D + 1). θ: Angle of the molecular chain relative to the extension direction β: Angle of the transition dipole moment relative to the molecular chain axis D = (I ) / (I // ) I : Absorption intensity when the polarization direction of the measured light is perpendicular to the extension direction of the polarizer I // : Absorption intensity when the polarization direction of the measured light is parallel to the extension direction of the polarizer (7) Crack Occurrence Rate A surface protection film was temporarily adhered to the protective layer surface of the polarizing plate (or polarizing plate with a phase difference layer) obtained in the embodiment and the comparative example. Then, a separator was temporarily adhered to the adhesive layer of the polarizing plate (or polarizing plate with a phase difference layer). The laminate was cut into approximately 130 mm × approximately 70 mm. At this time, the polarizer is cut so that the absorption axis becomes the short side direction. A U-shaped notch with a width of 5mm, a depth (recess length) of 6.85mm, and a curvature radius of 2.5mm is formed in the center of the short side of the cut laminate. The U-shaped notch is formed by end milling. The outer diameter of the end mill is 4mm, the feed speed is 500mm/minute, the number of rotations is 35000rpm, the cutting amount and the number of cutting times are 0.2mm/time for rough cutting and 0.1mm/time for fine cutting, totaling 2 times. The separation piece is peeled off from the laminate with the U-shaped notch formed and attached to a glass plate (thickness 1.1mm) through an acrylic adhesive layer. Finally, the surface protective film is peeled off to obtain a test sample consisting of a protective layer/polarizer/adhesive layer/glass plate (or protective layer/polarizer/adhesive layer/retardation layer/adhesive layer/glass plate). This sample is subjected to a thermal shock test, which involves 300 cycles of maintaining the sample at -40°C for 30 minutes followed by maintaining the sample at 85°C for 30 minutes. The sample is then visually inspected for the presence of L-shaped cracks after the test. This evaluation is performed using three polarizing plates (or polarizing plates with retardation layers), and the number of polarizing plates (or polarizing plates with retardation layers) that exhibit cracks (substantially L-shaped cracks) is evaluated.

[實施例1] 1.偏光件之製作 熱塑性樹脂基材是使用長條狀且吸水率0.75%、Tg約75℃之非晶質間苯二甲酸共聚聚對苯二甲酸乙二酯薄膜(厚度:100µm)。並對樹脂基材之單面施行電暈處理(處理條件:55W・min/m2 )。 在以9:1混合聚乙烯醇(聚合度4200,皂化度99.2莫耳%)及乙醯乙醯基改質PVA(日本合成化學工業公司製,商品名「GOHSEFIMER Z410」)而成之PVA系樹脂100重量份中,添加碘化鉀13重量份,而調製出PVA水溶液(塗佈液)。 於樹脂基材之電暈處理面塗佈上述PVA水溶液並在60℃下乾燥,藉此形成厚度13µm之PVA系樹脂層,而製作出積層體。 將所得積層體於130℃之烘箱內在周速相異之輥間沿縱向(長邊方向)進行自由端單軸延伸成2.4倍(空中輔助延伸處理)。 接著,使積層體浸漬於液溫40℃的不溶解浴(相對於水100重量份摻混4重量份之硼酸而得之硼酸水溶液)中30秒鐘(不溶解處理)。 接著,於液溫30℃的染色浴(相對於水100重量份,以1:7之重量比摻混碘與碘化鉀而得之碘水溶液)中調整濃度的同時使其浸漬於其中60秒鐘,以使最後所得偏光件的單體透射率(Ts)成為40.5%(染色處理)。 接著,使其浸漬於液溫40℃的交聯浴(相對於水100重量份摻混3重量份之碘化鉀並摻混5重量份之硼酸而得之硼酸水溶液)中30秒鐘(交聯處理)。 然後,使積層體一邊浸漬於液溫62℃的硼酸水溶液(硼酸濃度4.0重量%,碘化鉀5.0重量%)中,一邊在周速相異的輥間沿縱向(長邊方向)進行單軸延伸以使延伸之總倍率達3.0倍(水中延伸處理:水中延伸處理之延伸倍率為1.25倍)。 之後,使積層體浸漬於液溫20℃的洗淨浴(相對於水100重量份摻混4重量份之碘化鉀而得之水溶液)中(洗淨處理)。 之後,一邊在維持於90℃之烘箱中乾燥,一邊使其接觸表面溫度維持於75℃之SUS製加熱輥約2秒鐘(乾燥收縮處理)。積層體在乾燥收縮處理下之寬度方向之收縮率為2%。 經由以上程序,於樹脂基材上形成了厚度7.4µm之偏光件。[Example 1] 1. Preparation of Polarizers: A long, amorphous polyethylene terephthalate (PET) film (thickness: 100µm) with a water absorption of 0.75% and a Tg of approximately 75°C was used as the thermoplastic resin substrate. One side of the resin substrate was subjected to a corona treatment (treatment conditions: 55W min/ ). A PVA aqueous solution (coating solution) was prepared by adding 13 parts by weight of potassium iodide to 100 parts by weight of a PVA resin composed of a 9:1 mixture of polyvinyl alcohol (DP4200, saponification degree 99.2 mol%) and acetyl-modified PVA (manufactured by Nippon Gosei Kagaku Kogyo Co., Ltd., trade name "GOHSEFIMER Z410"). The PVA aqueous solution was applied to the corona-treated surface of the resin substrate and dried at 60°C to form a 13µm-thick PVA resin layer, creating a laminate. The resulting laminate was then subjected to free-end uniaxial stretching to 2.4 times its original length in the longitudinal direction (longitudinal direction) between rollers of varying circumferential speeds in an oven at 130°C (in-air assisted stretching). The laminate was then immersed in an insolubilization bath (a boric acid aqueous solution containing 4 parts by weight of boric acid per 100 parts by weight of water) at 40°C for 30 seconds (insolubilization treatment). Next, the polarizer was immersed in a dye bath (an aqueous iodine solution prepared by mixing iodine and potassium iodide at a weight ratio of 1:7 per 100 parts by weight of water) at a temperature of 30°C for 60 seconds, with the concentration adjusted to achieve a single-unit transmittance (Ts) of 40.5% (dyeing treatment). The polarizer was then immersed in a crosslinking bath (an aqueous boric acid solution prepared by mixing 3 parts by weight of potassium iodide and 5 parts by weight of boric acid per 100 parts by weight of water) at a temperature of 40°C for 30 seconds (crosslinking treatment). The laminate was then immersed in a boric acid aqueous solution (boric acid concentration 4.0 wt%, potassium iodide 5.0 wt%) at a temperature of 62°C and uniaxially stretched in the longitudinal direction (longitudinal direction) between rolls of varying circumferential speeds to a total stretching ratio of 3.0x (in-water stretching: the stretching ratio for the in-water stretching treatment was 1.25x). The laminate was then immersed in a cleaning bath (an aqueous solution of 4 parts by weight of potassium iodide per 100 parts by weight of water) at a temperature of 20°C (cleaning treatment). The laminate was then dried in an oven maintained at 90°C while contacting a SUS heating roll maintained at a surface temperature of 75°C for approximately 2 seconds (drying and shrinking treatment). The shrinkage rate of the laminate in the width direction during the drying and shrinking process was 2%. Through the above process, a polarizer with a thickness of 7.4µm was formed on the resin substrate.

2.偏光板之製作 將具有聯苯骨架之環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX4000)15份與氧雜環丁烷樹脂(東亞合成公司製,商品名:ARON OXETANE(註冊商標) OXT-221)10重量份溶解於甲基乙基酮73份中,而獲得環氧樹脂溶液。於所得環氧樹脂溶液中添加光陽離子聚合引發劑(San-Apro Ltd.製,商品名:CPI(註冊商標)-100P)2份,而獲得保護層形成組成物。使用線棒將所得保護層形成組成物直接(亦即不形成易接著層)塗佈於上述1.所得樹脂基材/偏光件之積層體的偏光件表面,並將塗佈膜在60℃下乾燥3分鐘。接著,使用高壓水銀燈以使累積光量為600mJ/cm2 之方式照射紫外線,形成保護層。保護層之厚度為3µm。接著,剝離樹脂基材,並於剝離面設置丙烯酸系黏著劑層(厚度15µm)。依上述方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成之偏光板。2. Polarizing Plate Preparation: 15 parts of a biphenyl-skeletal epoxy resin (Mitsubishi Chemical Co., trade name: jER (registered trademark) YX4000) and 10 parts by weight of an oxycyclobutane resin (Toagosei Co., trade name: ARON OXETANE (registered trademark) OXT-221) were dissolved in 73 parts of methyl ethyl ketone to obtain an epoxy resin solution. Two parts of a photocatalytic polymerization initiator (San-Apro Ltd., trade name: CPI (registered trademark)-100P) were added to the resulting epoxy resin solution to obtain a protective layer-forming composition. The resulting protective layer-forming composition is applied directly (i.e., without forming an easy-adhesion layer) to the polarizer surface of the resin substrate/polarizer laminate obtained in step 1 above using a wire rod, and the coated film is dried at 60°C for 3 minutes. Next, a high-pressure mercury lamp is used to irradiate the film with ultraviolet light at a cumulative light intensity of 600mJ/ cm2 to form a protective layer. The thickness of the protective layer is 3µm. Next, the resin substrate is peeled off, and an acrylic adhesive layer (15µm thick) is provided on the peeled surface. In this manner, a polarizing plate having a structure of protective layer (photoion-cured layer of epoxy resin)/polarizer/adhesive layer is obtained.

[實施例2~4] 除了使用碘濃度不同之染色浴(碘與碘化鉀之重量比=1:7)外,依與實施例1相同方式而於樹脂基材上形成了偏光件(厚度:7.4µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Examples 2-4] A polarizer (thickness: 7.4µm) was formed on a resin substrate in the same manner as in Example 1, except that dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used. The following procedures were similar to those in Example 1 to produce a polarizing plate consisting of a protective layer (photoion-curable epoxy resin layer), a polarizer, and an adhesive layer.

[實施例5] 將水中延伸之延伸倍率設為1.46倍(以結果而言,將延伸之總倍率設為3.5倍),除此之外依與實施例1相同方式而於樹脂基材上形成了偏光件(厚度:6.7µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Example 5] A polarizer (thickness: 6.7µm) was formed on a resin substrate in the same manner as in Example 1, except that the underwater stretching magnification was set to 1.46x (resulting in a total stretching magnification of 3.5x). The following procedures were repeated in the same manner as in Example 1 to obtain a polarizing plate having a protective layer (photoion-cured epoxy resin layer), polarizer, and adhesive layer.

[實施例6-1] 除了使用碘濃度不同之染色浴(碘與碘化鉀之重量比=1:7)外,依與實施例5相同方式而於樹脂基材上形成了偏光件(厚度:6.7µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Example 6-1] A polarizer (thickness: 6.7µm) was formed on a resin substrate in the same manner as in Example 5, except that a dye bath with different iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) was used. The following procedures were similar to those in Example 1, resulting in a polarizing plate comprising a protective layer (photoion-curable epoxy resin layer), a polarizer, and an adhesive layer.

[實施例6-2] 依與實施例6-1相同方式而獲得樹脂基材/偏光件(厚度:6.7µm)之積層體。另一方面,將環氧樹脂(Mitsubishi Chemical Co.製,商品名:jER(註冊商標) YX6954BH30,重量平均分子量:36000,環氧當量:13000)20份溶解於甲基乙基酮80份中,而獲得環氧樹脂溶液(20%)。使用線棒將該環氧樹脂溶液塗佈於上述積層體的偏光件表面,並將塗佈膜在60℃下乾燥3分鐘,而形成以塗佈膜的固化物的形式構成之保護層。保護層之厚度為3µm。接著,剝離樹脂基材,並於剝離面設置與實施例1相同之丙烯酸系黏著劑層。依上述方式,而獲得具有保護層(環氧樹脂之塗佈膜的固化層)/偏光件/黏著劑層之構成的偏光板。[Example 6-2] A resin substrate/polarizer laminate (thickness: 6.7µm) was obtained in the same manner as in Example 6-1. Separately, 20 parts of an epoxy resin (manufactured by Mitsubishi Chemical Co., trade name: jER (registered trademark) YX6954BH30, weight-average molecular weight: 36,000, epoxy equivalent: 13,000) was dissolved in 80 parts of methyl ethyl ketone to obtain an epoxy resin solution (20%). This epoxy resin solution was applied to the polarizer surface of the laminate using a wire bar. The coated film was dried at 60°C for 3 minutes to form a protective layer consisting of a cured product of the coated film. The protective layer had a thickness of 3µm. Next, the resin substrate is peeled off, and an acrylic adhesive layer similar to that in Example 1 is applied to the peeled surface. In this manner, a polarizing plate having a structure of protective layer (cured layer of epoxy resin coating film)/polarizer/adhesive layer is obtained.

[實施例6-3] 依與實施例6-1相同方式而獲得樹脂基材/偏光件(厚度:6.7µm)之積層體。於所得積層體之偏光件面,將聚胺甲酸酯系水系分散樹脂(第一工業製藥公司製,製品名:SUPERFLEX SF210)塗佈成厚度成為0.1µm作為易接著層,而形成易接著層。另一方面,,將100%聚甲基丙烯酸甲酯之丙烯酸系樹脂(楠本化成公司製,製品名:B-728)20重量份溶解於甲基乙基酮80重量份中,而獲得丙烯酸系樹脂溶液(20%)。將該丙烯酸系樹脂溶液用線棒塗佈於易接著層表面,並在60℃下將塗佈膜乾燥5分鐘後,形成以塗佈膜的固化物的形式構成之保護層。保護層之厚度為2µm。並於保護層之與易接著層為相反側的面進一步形成硬塗層(厚度3µm)。硬塗層(HC)係藉由以下方式來形成:將二羥甲基-三環癸烷二丙烯酸酯(共榮社化學製,商品名:LIGHT ACRYLATE DCP-A)70重量份、丙烯酸異莰酯(共榮社化學製,商品名:LIGHT ACRYLATE IB-XA)20重量份、1,9-壬二醇二丙烯酸酯(共榮社化學製、商品名:LIGHT ACRYLATE 1.9NA-A)10重量份、進而光聚合引發劑(BASF公司製,商品名:IRGACURE 907)3重量份,使用適當之溶劑混合,並將所得塗敷液以使硬化後成為3µm之方式塗佈於保護層面上,接著使溶劑乾燥,並使用高壓水銀燈以累積光量成為300mJ/cm2 之方式在氮氣環境下照射紫外線來形成。最後,剝離樹脂基材,並於剝離面設置與實施例1相同之丙烯酸系黏著劑層。依上述方式,而獲得具有HC層/保護層(丙烯酸樹脂之塗佈膜的固化層)/易接著層/偏光件/黏著劑層之構成的偏光板。[Example 6-3] A resin substrate/polarizer (thickness: 6.7µm) laminate was obtained in the same manner as in Example 6-1. A polyurethane aqueous dispersion resin (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., product name: SUPERFLEX SF210) was applied to a thickness of 0.1µm on the polarizer surface of the laminate to form an easy-adhesion layer. Separately, an acrylic resin solution (20%) was prepared by dissolving 20 parts by weight of a 100% polymethyl methacrylate acrylic resin (manufactured by Kusumoto Chemicals Co., Ltd., product name: B-728) in 80 parts by weight of methyl ethyl ketone. The acrylic resin solution was applied to the adhesive layer using a wire bar. The coating was dried at 60°C for 5 minutes to form a protective layer consisting of a cured product of the coating. The protective layer had a thickness of 2µm. A hard coat layer (3µm thick) was further formed on the side of the protective layer opposite the adhesive layer. The hard coat (HC) was formed by mixing 70 parts by weight of dihydroxymethyl-tricyclodecane diacrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE DCP-A), 20 parts by weight of isoborneol acrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE IB-XA), 10 parts by weight of 1,9-nonanediol diacrylate (produced by Kyoei Chemicals, trade name: LIGHT ACRYLATE 1.9NA-A), and a photopolymerization initiator (produced by BASF, trade name: IRGACURE 907) by weight, mixed with an appropriate solvent, and the resulting coating liquid was applied to the protective layer surface to a thickness of 3µm after curing. The solvent was then dried and irradiated with UV light using a high-pressure mercury lamp in a nitrogen atmosphere at a cumulative radiation dose of 300mJ/ cm² . Finally, the resin substrate was peeled off, and an acrylic adhesive layer similar to that in Example 1 was applied to the peeled surface. Following this procedure, a polarizing plate having a structure consisting of an HC layer/protective layer (cured layer of acrylic resin coating film)/easy-adhesion layer/polarizer/adhesive layer was obtained.

[實施例7~8] 除了使用碘濃度不同之染色浴(碘與碘化鉀之重量比=1:7)外,依與實施例5相同方式而於樹脂基材上形成了偏光件(厚度:6.7µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Examples 7-8] A polarizer (thickness: 6.7µm) was formed on a resin substrate in the same manner as in Example 5, except that dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used. The following procedures were similar to those in Example 1, resulting in a polarizing plate comprising a protective layer (photoion-curable epoxy resin layer), a polarizer, and an adhesive layer.

[實施例9~12] 將水中延伸之延伸倍率設為1.67倍(以結果而言,將延伸之總倍率設為4.0倍)、及使用碘濃度相異之染色浴(碘與碘化鉀之重量比=1:7),除此之外依與實施例1相同方式而於樹脂基材上形成了偏光件(厚度:6.2µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Examples 9-12] A polarizer (thickness: 6.2µm) was formed on a resin substrate in the same manner as in Example 1, except that the underwater stretching ratio was set to 1.67x (resulting in a total stretching ratio of 4.0x) and dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7). The following procedures were followed in the same manner as in Example 1 to produce a polarizing plate having a protective layer (photoion-curable epoxy resin layer), polarizer, and adhesive layer.

[實施例13~16] 將水中延伸之延伸倍率設為1.88倍(以結果而言,將延伸之總倍率設為4.5倍)、及使用碘濃度相異之染色浴(碘與碘化鉀之重量比=1:7),除此之外依與實施例1相同方式而於樹脂基材上形成了偏光件(厚度:6.0µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Examples 13-16] A polarizer (thickness: 6.0µm) was formed on a resin substrate in the same manner as in Example 1, except that the underwater stretching ratio was set to 1.88 (resulting in a total stretching ratio of 4.5), and dye baths with varying iodine concentrations (weight ratio of iodine to potassium iodide = 1:7). The following procedures were similar to those in Example 1 to produce a polarizing plate having a protective layer (photoion-curable epoxy resin layer), polarizer, and adhesive layer.

[比較例1] 將水中延伸之延伸倍率設為2.29倍(以結果而言,將延伸之總倍率設為5.5倍),除此之外依與實施例1相同方式而於樹脂基材上形成了偏光件(厚度:5.5µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Comparative Example 1] A polarizer (5.5µm thick) was formed on a resin substrate in the same manner as in Example 1, except that the underwater stretching magnification was set to 2.29x (resulting in a total stretching magnification of 5.5x). The following procedures were repeated in the same manner as in Example 1 to obtain a polarizing plate having a protective layer (photoion-curable epoxy resin layer), polarizer, and adhesive layer.

[比較例2-1] 除了使用碘濃度不同之染色浴(碘與碘化鉀之重量比=1:7)外,依與比較例1相同方式而於樹脂基材上形成了偏光件(厚度:5.5µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Comparative Example 2-1] A polarizer (thickness: 5.5µm) was formed on a resin substrate in the same manner as in Comparative Example 1, except that a dye bath with a different iodine concentration (weight ratio of iodine to potassium iodide = 1:7) was used. The following procedures were similar to those in Example 1, resulting in a polarizing plate consisting of a protective layer (photoion-curable epoxy resin layer), a polarizer, and an adhesive layer.

[比較例2-2] 使用與實施例6-2相同環氧樹脂溶液來形成保護層,除此之外依與比較例2-1相同方式而獲得具有保護層(環氧樹脂之塗佈膜的固化層)/偏光件/黏著劑層之構成的偏光板。Comparative Example 2-2 A polarizing plate having a protective layer (cured epoxy resin coating layer)/polarizer/adhesive layer structure was obtained in the same manner as in Comparative Example 2-1, except that the protective layer was formed using the same epoxy resin solution as in Example 6-2.

[比較例2-3] 使用與實施例6-3相同丙烯酸樹脂溶液來形成保護層,除此之外依與比較例2-1相同方式而獲得具有保護層(丙烯酸樹脂之塗佈膜的固化層)/偏光件/黏著劑層之構成的偏光板。Comparative Example 2-3 A polarizing plate having a protective layer (cured layer of acrylic resin coating)/polarizer/adhesive layer structure was obtained in the same manner as in Comparative Example 2-1, except that the protective layer was formed using the same acrylic resin solution as in Example 6-3.

[比較例3~4] 除了使用碘濃度不同之染色浴(碘與碘化鉀之重量比=1:7)外,依與比較例1相同方式而於樹脂基材上形成了偏光件(厚度:5.5µm)。以下程序係依與實施例1相同方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層之構成的偏光板。[Comparative Examples 3-4] A polarizer (thickness: 5.5µm) was formed on a resin substrate in the same manner as in Comparative Example 1, except that dye baths with different iodine concentrations (weight ratio of iodine to potassium iodide = 1:7) were used. The following procedures were similar to those in Example 1, resulting in a polarizing plate consisting of a protective layer (photoion-curable epoxy resin layer), a polarizer, and an adhesive layer.

[實施例17] 1.構成相位差層之相位差薄膜之製作 使用由2台具備有攪拌葉片及控制成100℃之回流冷卻器的直立式反應器構成之批次聚合裝置進行聚合。饋入雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷29.60質量份(0.046mol)、異山梨醇(ISB)29.21質量份(0.200mol)、螺甘油(SPG)42.28質量份(0.139mol)、碳酸二苯酯(DPC)63.77質量份(0.298mol)及作為觸媒的乙酸鈣一水合物1.19×10-2 質量份(6.78×10-5 mol)。將反應器內進行減壓氮取代後,以加熱介質加溫,並於內部溫度達到100℃之時間點開始攪拌。於升溫開始40分鐘後使內部溫度達到220℃,控制維持該溫度的同時開始減壓,在達到220℃後以90分鐘使其成為13.3kPa。將隨聚合反應副生成之苯酚蒸氣導入100℃之回流冷卻器,使苯酚蒸氣中所含些許量單體成分返回反應器,並將未凝聚之苯酚蒸氣導入45℃的凝聚器中回收。將氮導入第1反應器暫時使其回復到大氣壓力後,將第1反應器內之經寡聚化的反應液移至第2反應器。接著,開始進行第2反應器內的升溫及減壓,並以50分鐘使內溫成為240℃、壓力成為0.2kPa。其後,進行聚合直到達到預定之攪拌功率。在達到預定功率之時間點將氮導入反應器中使壓力回復,並將所生成之聚酯碳酸酯系樹脂擠出至水中,裁切束狀物而獲得丸粒。[Example 17] 1. Preparation of a Retardation Film Constituting a Retardation Layer: Polymerization was carried out using a batch polymerization apparatus consisting of two vertical reactors equipped with stirring blades and a reflux cooler controlled at 100°C. The reaction mixture consisted of 29.60 parts by mass (0.046 mol) of bis[9-(2-phenoxycarbonylethyl)fluoren-9-yl]methane, 29.21 parts by mass (0.200 mol) of isosorbide (ISB), 42.28 parts by mass (0.139 mol) of spiroglycerol (SPG), 63.77 parts by mass (0.298 mol) of diphenyl carbonate (DPC), and 1.19× 10⁻² parts by mass (6.78× 10⁻⁵ mol) of calcium acetate monohydrate as a catalyst. After the reactor was depressurized and purged with nitrogen, it was heated with a heating medium and stirred when the internal temperature reached 100°C. 40 minutes after the start of the temperature increase, the internal temperature was brought to 220°C. While maintaining this temperature, the pressure was reduced to 13.3 kPa over 90 minutes after reaching 220°C. Phenol vapor, a by-product of the polymerization reaction, was introduced into a 100°C reflux cooler to return a small amount of monomeric components contained in the phenol vapor to the reactor. Uncondensed phenol vapor was then recovered in a 45°C condenser. Nitrogen was introduced into the first reactor to temporarily return it to atmospheric pressure. The oligomerized reaction solution in the first reactor was then transferred to the second reactor. Next, the temperature and pressure in the second reactor were raised and reduced, reaching an internal temperature of 240°C and a pressure of 0.2 kPa over 50 minutes. Polymerization was then continued until the predetermined stirring power was reached. At this point, nitrogen was introduced into the reactor to restore the pressure, and the resulting polyester carbonate resin was extruded into water. The resulting strands were then cut into pellets.

將所得聚酯碳酸酯系樹脂(丸粒)在80℃下真空乾燥5小時後,使用具備單軸擠製機(東芝機械公司製,缸筒設定溫度:250℃)、T型模(寬200mm,設定溫度:250℃)、冷卻輥(設定溫度:120~130℃)及捲取機之薄膜製膜裝置,製作出厚度130µm之長條狀樹脂薄膜。以可獲得預定相位差之方式一邊調整所得長條狀樹脂薄膜一邊進行延伸,而獲得厚度48µm的相位差薄膜。延伸條件係沿寬度方向,延伸溫度為143℃,延伸倍率為2.8倍。所得相位差薄膜之Re(550)為141nm,Re(450)/Re(550)為0.86,且Nz係數為1.12。The resulting polyester carbonate resin pellets were vacuum-dried at 80°C for 5 hours. Then, a 130µm thick strip of resin film was produced using a film-forming apparatus equipped with a uniaxial extruder (Toshiba Machine Co., Ltd., cylinder set temperature: 250°C), a T-die (200mm width, set temperature: 250°C), a cooling roll (set temperature: 120-130°C), and a winder. The resulting strip of resin film was then stretched while adjusting to achieve a predetermined retardation, resulting in a 48µm thick retardation film. Stretching conditions were: a widthwise stretching temperature of 143°C and a stretching ratio of 2.8x. The obtained retardation film had a Re(550) of 141 nm, a Re(450)/Re(550) of 0.86, and an Nz coefficient of 1.12.

2.附相位差層之偏光板之製作 依與實施例6-1相同方式而獲得樹脂基材/偏光件(厚度:6.7µm)之積層體。於積層體之偏光件表面依與實施例1相同方式形成保護層(環氧樹脂之光陽離子硬化層)。接著,剝離樹脂基材,並於剝離面透過厚度5µm之丙烯酸系黏著劑層貼合上述所得相位差薄膜(相位差層)。此時,係以相位差層的慢軸與偏光件的吸收軸呈45°之角度之方式貼合。最後,於相位差層表面設置與實施例1相同之丙烯酸系黏著劑層。依上述方式,而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層/相位差層/黏著劑層之構成的附相位差層之偏光板。2. Preparation of a Polarizing Plate with a Retardation Layer A resin substrate/polarizer (thickness: 6.7µm) laminate was obtained in the same manner as in Example 6-1. A protective layer (photoion-cured epoxy resin layer) was formed on the polarizer surface of the laminate in the same manner as in Example 1. Next, the resin substrate was peeled off, and the resulting retardation film (retardation layer) was bonded to the peeled surface via a 5µm-thick acrylic adhesive layer. The slow axis of the retardation layer was bonded at a 45° angle to the absorption axis of the polarizer. Finally, an acrylic adhesive layer similar to that in Example 1 was applied to the surface of the retardation layer. According to the above method, a polarizing plate with a phase difference layer is obtained, which has a structure of protective layer (photoion curing layer of epoxy resin)/polarizer/adhesive layer/phase difference layer/adhesive layer.

[比較例5] 依與比較例2-1相同方式而獲得樹脂基材/偏光件(厚度:5.5µm)之積層體。除了使用該積層體外,依與實施例17相同方式而獲得具有保護層(環氧樹脂之光陽離子硬化層)/偏光件/黏著劑層/相位差層/黏著劑層之構成的附相位差層之偏光板。[Comparative Example 5] A resin substrate/polarizer (thickness: 5.5µm) laminate was obtained in the same manner as in Comparative Example 2-1. A polarizing plate with a retardation layer was obtained in the same manner as in Example 17, except that this laminate was used, and the structure of the polarizing plate was: protective layer (photoion-cured epoxy resin layer), polarizer, adhesive layer, retardation layer, and adhesive layer.

將實施例及比較例所得偏光板或附相位差層之偏光板供於上述(2)~(7)之評估。將結果列於表1。The polarizing plates or polarizing plates with phase difference layers obtained in the Examples and Comparative Examples were subjected to the evaluations (2) to (7) above. The results are listed in Table 1.

[表1] [Table 1]

由表1明顯可知,實施例之偏光板及附相位差層之偏光板已抑制住在異形加工部(U字缺口部分)之裂痕發生。As is apparent from Table 1, the polarizing plate and the polarizing plate with a phase difference layer of the embodiment have suppressed the occurrence of cracks in the irregularly shaped processed portion (U-shaped notch portion).

又,於圖8~圖10分別顯示實施例及比較例所得偏光件之單體透射率與PVA之Δn、面內相位差或定向函數的關係。如圖8及圖10所示,可知即便雙折射、面內相位差或定向函數為相同程度(以結果而言,定向度為相同程度),在單體透射率高時,仍容易在異形加工部發生裂痕。例如在圖8中觀看Δn為35(×10-3 )附近時,單體透射率若大於約44.2%則會變得不滿足式(1),結果就如比較例4所示會發生裂痕。因此,可知為了有效抑制在異形加工部發生裂痕,不僅PVA系樹脂之定向度,單體透射率(以結果而言為二色性物質之吸附量)之調整亦很重要。又,可知滿足式(1)、式(2)及/或式(3)之偏光件係已適當進行該等之調整者,而可適當抑制在異形加工部發生裂痕。In addition, Figures 8 to 10 show the relationship between the monomer transmittance of the polarizer obtained in the embodiment and the comparative example and the Δn of PVA, the in-plane phase difference or the orientation function. As shown in Figures 8 and 10, it can be seen that even if the birefringence, in-plane phase difference or orientation function are of the same degree (in terms of the same degree of orientation), when the monomer transmittance is high, cracks are still likely to occur in the irregularly processed part. For example, when Δn is around 35 (× 10-3 ) in Figure 8, if the monomer transmittance is greater than about 44.2%, it will become unsatisfactory to equation (1), and as a result, cracks will occur as shown in Comparative Example 4. Therefore, it can be seen that in order to effectively suppress the occurrence of cracks in the irregularly processed part, it is important to adjust not only the orientation degree of the PVA resin but also the monomer transmittance (in terms of the adsorption amount of the dichroic substance). Furthermore, it can be seen that the polarizer that satisfies formula (1), formula (2) and/or formula (3) has been properly adjusted and can appropriately suppress the occurrence of cracks in the irregularly processed part.

產業上之可利用性 本發明偏光板可用於影像顯示裝置,尤其可適宜用於汽車儀表盤、智慧型手機、平板型PC、智慧型手錶等具有異形之影像顯示裝置。Industrial Applicability The polarizing plate of this invention can be used in image display devices, particularly those with irregular shapes, such as automotive dashboards, smartphones, tablet PCs, and smart watches.

10:偏光件 20:保護層 100:偏光板 120:相位差層 200:附相位差層之偏光板(積層體) G1~G4:導輥 R1~R6:輸送輥10: Polarizer 20: Protective layer 100: Polarizer 120: Retardation layer 200: Polarizer with retardation layer (laminated structure) G1-G4: Guide rollers R1-R6: Transport rollers

圖1係本發明一實施形態之偏光板的概略截面圖。 圖2係說明本發明實施形態之偏光板的異形或異形加工部之一例的概略俯視圖。 圖3係說明本發明實施形態之偏光板的異形或異形加工部之變形例的概略俯視圖。 圖4係說明本發明實施形態之偏光板的異形或異形加工部之其他變形例的概略俯視圖。 圖5係說明本發明實施形態之偏光板的異形或異形加工部之其他變形例的概略俯視圖。 圖6係概略圖,其顯示可用於本發明實施形態之偏光板的偏光件之製造方法中,利用加熱輥之乾燥收縮處理之一例。 圖7係本發明一實施形態之附相位差層之偏光板的概略截面圖。 圖8係顯示實施例及比較例所製作之偏光件之單體透射率與PVA系樹脂之雙折射之關係的圖表。 圖9係顯示實施例及比較例所製作之偏光件之單體透射率與PVA系樹脂薄膜之面內相位差之關係的圖表。 圖10係顯示實施例及比較例所製作之偏光件之單體透射率與PVA系樹脂之定向函數之關係的圖表。Figure 1 is a schematic cross-sectional view of a polarizing plate according to one embodiment of the present invention. Figure 2 is a schematic top view illustrating an example of a non-uniform shape or a non-uniformly processed portion of a polarizing plate according to an embodiment of the present invention. Figure 3 is a schematic top view illustrating a modified example of a non-uniform shape or a non-uniformly processed portion of a polarizing plate according to an embodiment of the present invention. Figure 4 is a schematic top view illustrating another modified example of a non-uniform shape or a non-uniformly processed portion of a polarizing plate according to an embodiment of the present invention. Figure 5 is a schematic top view illustrating another modified example of a non-uniform shape or a non-uniformly processed portion of a polarizing plate according to an embodiment of the present invention. Figure 6 is a schematic diagram illustrating an example of a drying and shrinking process using heated rollers in a method for manufacturing a polarizing element that can be used in a polarizing plate according to an embodiment of the present invention. Figure 7 is a schematic cross-sectional view of a polarizing plate with a retardation layer according to an embodiment of the present invention. Figure 8 is a graph showing the relationship between the single-unit transmittance of polarizers produced in the Examples and Comparative Examples and the birefringence of the PVA-based resin. Figure 9 is a graph showing the relationship between the single-unit transmittance of polarizers produced in the Examples and Comparative Examples and the in-plane retardation of the PVA-based resin film. Figure 10 is a graph showing the relationship between the single-unit transmittance of polarizers produced in the Examples and Comparative Examples and the orientation function of the PVA-based resin.

Claims (15)

一種偏光板,具有偏光件與配置於該偏光件之至少一側的保護層; 該偏光板具有矩形以外之異形; 該保護層係以具有10µm以下之厚度的樹脂膜構成; 該偏光件之單體透射率為40.0%以上,且該偏光件之偏光度為99.0%以上; 該偏光件之穿刺強度為30gf/µm以上; 該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂薄膜之雙折射為y時,滿足下述式(1): y<-0.011x+0.525     (1)。 A polarizing plate having a polarizer and a protective layer disposed on at least one side of the polarizer; the polarizer has an irregular shape other than a rectangle; the protective layer is formed of a resin film having a thickness of 10µm or less; the polarizer has a single-element transmittance of 40.0% or more and a polarization degree of 99.0% or more; the polarizer has a puncture strength of 30gf/µm or more; the polarizer is formed of a polyvinyl alcohol-based resin film containing a dichroic substance, and when the single-element transmittance is x% and the birefringence of the polyvinyl alcohol-based resin film is y, the following formula (1) is satisfied: y<-0.011x+0.525     (1). 如請求項1之偏光板,其中該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂薄膜之面內相位差為znm時,滿足下述式(2): z<-60x+2875        (2)。 As claimed in claim 1, the polarizing plate, wherein the polarizer is composed of a polyvinyl alcohol resin film containing a dichroic substance, and when the monomer transmittance is x% and the in-plane phase difference of the polyvinyl alcohol resin film is znm, satisfies the following formula (2): z<-60x+2875        (2). 如請求項1之偏光板,其中該偏光件係以含二色性物質之聚乙烯醇系樹脂薄膜構成,且於令單體透射率為x%、令該聚乙烯醇系樹脂薄膜之定向函數為f時,滿足下述式(3): f<-0.018x+1.11    (3)。 As claimed in claim 1, the polarizing plate is composed of a polyvinyl alcohol resin film containing a dichroic substance, and when the monomer transmittance is x% and the orientation function of the polyvinyl alcohol resin film is f, the following formula (3) is satisfied: f<-0.018x+1.11    (3). 如請求項1至3中任一項之偏光板,其中前述偏光件之厚度為10µm以下。A polarizing plate as claimed in any one of claims 1 to 3, wherein the thickness of the polarizer is less than 10µm. 如請求項1至3中任一項之偏光板,其中前述異形係選自於由下述所構成之群組:貫通孔、V字缺口、U字缺口、俯視時呈近似船形之形狀的凹部、俯視時呈矩形之凹部、俯視時呈近似浴缸形狀之R形狀的凹部及該等之組合。A polarizing plate as claimed in any one of claims 1 to 3, wherein the aforementioned irregular shape is selected from the group consisting of: a through hole, a V-notch, a U-notch, a recess having a shape approximately boat-shaped when viewed from above, a rectangular recess having a shape approximately bathtub-shaped when viewed from above, an R-shaped recess having a shape approximately bathtub-shaped when viewed from above, and a combination thereof. 如請求項5之偏光板,其中前述U字缺口之曲率半徑為5mm以下。The polarizing plate of claim 5, wherein the radius of curvature of the U-shaped notch is less than 5 mm. 如請求項1至3中任一項之偏光板,其中前述樹脂膜包含選自環氧樹脂及(甲基)丙烯酸系樹脂中之至少1種樹脂。The polarizing plate according to any one of claims 1 to 3, wherein the resin film comprises at least one resin selected from epoxy resins and (meth)acrylic resins. 如請求項1至3中任一項之偏光板,其中前述樹脂膜係以環氧樹脂之光陽離子硬化物構成,且該樹脂膜之軟化溫度為100℃以上。In the polarizing plate of any one of claims 1 to 3, the resin film is composed of a photo-cured epoxy resin, and the softening temperature of the resin film is above 100°C. 如請求項1至3中任一項之偏光板,其中前述樹脂膜係以環氧樹脂之有機溶劑溶液之塗佈膜的固化物構成,且該樹脂膜之軟化溫度為100℃以上。In the polarizing plate of any one of claims 1 to 3, the resin film is formed by curing a coating film of an organic solvent solution of an epoxy resin, and the softening temperature of the resin film is above 100°C. 如請求項1至3中任一項之偏光板,其中前述樹脂膜係以熱塑性(甲基)丙烯酸系樹脂之有機溶劑溶液之塗佈膜的固化物構成,且該樹脂膜之軟化溫度為100℃以上。In the polarizing plate of any one of claims 1 to 3, the resin film is formed by curing a coating film of an organic solvent solution of a thermoplastic (meth)acrylic resin, and the softening temperature of the resin film is above 100°C. 如請求項10之偏光板,其中前述熱塑性(甲基)丙烯酸系樹脂具有選自於由內酯環單元、戊二酸酐單元、戊二醯亞胺單元、馬來酸酐單元及馬來醯亞胺單元所構成群組中之至少1種。The polarizing plate of claim 10, wherein the thermoplastic (meth) acrylic resin comprises at least one selected from the group consisting of a lactone ring unit, a glutaric anhydride unit, a glutarimide unit, a maleic anhydride unit, and a maleimide unit. 一種附相位差層之偏光板,包含如請求項1至11中任一項之偏光板與相位差層;且 該相位差層係配置於前述偏光件之與配置有前述保護層之側相反之側。 A polarizing plate with a phase difference layer, comprising the polarizing plate of any one of claims 1 to 11 and a phase difference layer; wherein the phase difference layer is disposed on the side of the polarizer opposite to the side on which the protective layer is disposed. 如請求項12之附相位差層之偏光板,其中前述相位差層之Re(550)為100nm~190nm,Re(450)/Re(550)為0.8以上且小於1;且 該相位差層的慢軸與前述偏光件的吸收軸形成之角度為40°~50°。 The polarizing plate with a phase difference layer as claimed in claim 12, wherein the Re(550) of the phase difference layer is 100 nm to 190 nm, and the Re(450)/Re(550) is greater than 0.8 and less than 1; and the angle formed by the slow axis of the phase difference layer and the absorption axis of the polarizer is 40° to 50°. 如請求項12或13之附相位差層之偏光板,其中前述相位差層係透過黏著劑層積層於前述偏光板上。The polarizing plate with a phase difference layer according to claim 12 or 13, wherein the phase difference layer is laminated on the polarizing plate via an adhesive layer. 一種影像顯示裝置,具備如請求項1至11中任一項之偏光板或如請求項12至14中任一項之附相位差層之偏光板。An image display device comprises the polarizing plate of any one of claims 1 to 11 or the polarizing plate with a phase difference layer of any one of claims 12 to 14.
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