TWI880821B - Via detection device and method for tgv (through glass via) substrate - Google Patents
Via detection device and method for tgv (through glass via) substrate Download PDFInfo
- Publication number
- TWI880821B TWI880821B TW113127128A TW113127128A TWI880821B TW I880821 B TWI880821 B TW I880821B TW 113127128 A TW113127128 A TW 113127128A TW 113127128 A TW113127128 A TW 113127128A TW I880821 B TWI880821 B TW I880821B
- Authority
- TW
- Taiwan
- Prior art keywords
- glass substrate
- collimated light
- perforation
- light beam
- depth
- Prior art date
Links
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
一種TGV玻璃基板的穿孔檢測裝置,其設置於玻璃基板之上的第一景深相機及第一準直光源正對玻璃基板的上表面,其設置於玻璃基板之下的第二景深相機及第二準直光源正對玻璃基板的下表面,其分光稜鏡組設置於玻璃基板的上表面與第一準直光源之間,且分光稜鏡組的一側設有第三景深相機。第一準直光源與第二準直光源分別發射第一準直光束與第二準直光束至玻璃基板,第一至第三景深相機分別用於取得第一至第三影像,且TGV玻璃基板的穿孔檢測裝置的微控制器單元用於根據第一至第三影像獲得玻璃基板之至少一玻璃基板穿孔的至少一檢測結果。A TGV glass substrate perforation detection device, wherein a first depth of field camera and a first collimated light source disposed on the glass substrate face the upper surface of the glass substrate, a second depth of field camera and a second collimated light source disposed below the glass substrate face the lower surface of the glass substrate, a spectroscopic prism assembly is disposed between the upper surface of the glass substrate and the first collimated light source, and a third depth of field camera is disposed on one side of the spectroscopic prism assembly. The first collimated light source and the second collimated light source emit a first collimated light beam and a second collimated light beam to the glass substrate, respectively, the first to third depth of field cameras are used to obtain first to third images, respectively, and a microcontroller unit of the TGV glass substrate perforation detection device is used to obtain at least one detection result of at least one glass substrate perforation of the glass substrate according to the first to third images.
Description
一種TGV(Through Glass Via,稱為玻璃基板穿孔)玻璃基板的穿孔檢測裝置與方法,特別是指一種採用位於玻璃基板之上下方的兩景深相機及兩準直光源來獲得玻璃基板穿孔之檢測結果的TGV玻璃基板的穿孔檢測裝置與方法。A TGV (Through Glass Via) glass substrate perforation detection device and method, particularly a TGV glass substrate perforation detection device and method that uses two depth of field cameras and two collimated light sources located above and below the glass substrate to obtain the detection result of the glass substrate perforation.
以往的二維(2D)晶片封裝技術已經無法滿足現在對晶片之速度、效能與輕薄化的需求,因此,二點五維(2.5D)與三維(3D)晶片封裝技術也被提出。二點五維與三維晶片封裝技術需要使用具有穿孔的中介板,來電性連接不同的晶片,以往都是以具有矽基板穿孔(Through Silicon Via,TSV)的矽基板(註:具有TSV的矽基板又稱為TSV矽基板)作為中介板,但是,矽是一種Ⅳ-A族的半導體材料,故周圍的載流子在電場或磁場作用下,會因為能夠自由移動而對鄰近的電路或信號產生影響,即可能會嚴重影響晶片性能。然而,玻璃材料沒有自由移動的電荷、介電性能優良且熱膨脹係數(CTE)與矽接近,因此,具有玻璃基板穿孔(Through Glass Via,TGV)的玻璃基板(註:具有TGV的玻璃基板又稱為TGV玻璃基板)被提出來,以取代矽基板來作為中介板。The previous two-dimensional (2D) chip packaging technology can no longer meet the current demand for chip speed, performance and thinness, so two-and-a-half-dimensional (2.5D) and three-dimensional (3D) chip packaging technologies have also been proposed. The two-and-a-half-dimensional (2.5D) and three-dimensional (3D) chip packaging technologies require the use of an interposer with perforations to electrically connect different chips. In the past, silicon substrates with through silicon vias (TSV) (Note: silicon substrates with TSV are also called TSV silicon substrates) were used as interposers. However, silicon is a semiconductor material of the IV-A group, so the surrounding carriers can move freely under the action of electric or magnetic fields and affect the adjacent circuits or signals, which may seriously affect the performance of the chip. However, glass materials do not have freely moving charges, have excellent dielectric properties, and have a coefficient of thermal expansion (CTE) close to that of silicon. Therefore, a glass substrate with through glass vias (TGV) (Note: a glass substrate with TGV is also called a TGV glass substrate) is proposed to replace the silicon substrate as an interposer.
具有玻璃基板穿孔的玻璃基板的製造方式是先在玻璃基板上要形成玻璃基板穿孔的預定位置先照射雷射進行改質,接著使用浸潤蝕刻在預定位置上來形成玻璃基板穿孔。請參照圖1與圖2,圖1是對具有玻璃基板穿孔的玻璃基板進行俯視的平面示意圖,以及圖2是對圖1之剖面進行側視的立體示意圖,其中圖2的剖面為圖1沿著剖面線AA的剖面。玻璃基板1具有多個玻璃基板穿孔12貫穿玻璃基板1的上表面10與下表面12,每一個玻璃基板穿孔12在上表面10具有上開口121並在下表面11具有下開口123,以及在上表面10與下表面11之間具有腰身,腰身形成了穿孔122。上開口121與下開口123分別具有開口尺徑Rt與Rb,且腰身的穿孔122形成了穿孔尺徑Rm。The manufacturing method of the glass substrate with glass substrate through-holes is to first irradiate the predetermined position of the glass substrate where the glass substrate through-holes are to be formed with laser for modification, and then use immersion etching to form the glass substrate through-holes at the predetermined position. Please refer to Figures 1 and 2, Figure 1 is a plan view schematically showing the glass substrate with glass substrate through-holes from above, and Figure 2 is a three-dimensional schematic view of the cross-section of Figure 1 from the side, wherein the cross-section of Figure 2 is the cross-section of Figure 1 along the section line AA. The glass substrate 1 has a plurality of glass substrate through-holes 12 penetrating the upper surface 10 and the lower surface 12 of the glass substrate 1, each of the glass substrate through-holes 12 has an upper opening 121 on the upper surface 10 and a lower opening 123 on the lower surface 11, and has a waist between the upper surface 10 and the lower surface 11, and the waist forms a through-hole 122. The upper opening 121 and the lower opening 123 have opening diameters Rt and Rb respectively, and the waist through hole 122 forms a through hole diameter Rm.
開口尺徑Rt、Rb、穿孔尺徑Rm等參數資訊是必須要被檢測的,以藉此評估玻璃基板1是否符合需求。目前現有技術的其中一種做法是使用X光來檢測,但使用X光檢測的檢測速度太慢(甚至比用顯微鏡檢查還慢),不符合生產效益。目前現有技術的另一種做法是使用顯微鏡來檢測,但使用顯微鏡來檢查仍是非常耗費時間,難以符合經濟效益。現有技術還有另一種作法是,先將玻璃基板穿孔12填滿無損可塑材料後,將無損可塑材料取出,便能夠量測上述資訊,但是此種作法需要填滿無損可塑材料,除了成本與檢測時間的問題外,可能還有無損可塑材料殘留於玻璃基板穿孔12中的問題。有鑑於此,仍有需要提出一種新穎的玻璃基板穿孔檢測技術來避免上述的技術問題。The opening diameters Rt, Rb, and the perforation diameter Rm and other parameter information must be tested to evaluate whether the glass substrate 1 meets the requirements. One of the existing technologies is to use X-rays for testing, but the speed of X-ray testing is too slow (even slower than using a microscope), which is not in line with production efficiency. Another existing technology is to use a microscope for testing, but using a microscope for testing is still very time-consuming and difficult to meet economic benefits. Another method in the prior art is to first fill the glass substrate through-hole 12 with a non-destructive plastic material and then take out the non-destructive plastic material to measure the above information. However, this method requires filling the glass substrate through-hole 12 with a non-destructive plastic material. In addition to the cost and detection time issues, there may also be a problem that the non-destructive plastic material remains in the glass substrate through-hole 12. In view of this, there is still a need to propose a novel glass substrate through-hole detection technology to avoid the above technical problems.
根據上述任一目的,本發明提供一種TGV玻璃基板的穿孔檢測裝置,TGV玻璃基板的穿孔檢測裝置包括第一景深相機、第一準直光源、第二景深相機、第二準直光源以及微控制器單元。第一景深相機及第一準直光源設置於具有至少一玻璃基板穿孔的玻璃基板之上,並正對玻璃基板的上表面。第二景深相機及第二準直光源設置於玻璃基板之下,並正對玻璃基板的下表面。微控制器單元電性連接第一景深相機、第一準直光源、第二景深相機及第二準直光源。第一準直光源與第二準直光源分別發射第一準直光束與第二準直光束至玻璃基板,第一準直光束的光波段相同或不同於第二準直光束的光波段,第一景深相機與第二景深相機分別用於取得第一影像與第二影像,且微控制器單元用於根據第一影像與第二影像獲得至少一玻璃基板穿孔的至少一檢測結果。According to any of the above purposes, the present invention provides a TGV glass substrate perforation detection device, the TGV glass substrate perforation detection device comprising a first depth of field camera, a first collimated light source, a second depth of field camera, a second collimated light source and a microcontroller unit. The first depth of field camera and the first collimated light source are arranged on a glass substrate having at least one glass substrate perforation, and face the upper surface of the glass substrate. The second depth of field camera and the second collimated light source are arranged under the glass substrate, and face the lower surface of the glass substrate. The microcontroller unit is electrically connected to the first depth of field camera, the first collimated light source, the second depth of field camera and the second collimated light source. The first collimated light source and the second collimated light source respectively emit a first collimated light beam and a second collimated light beam to the glass substrate, the light band of the first collimated light beam is the same as or different from the light band of the second collimated light beam, the first depth of field camera and the second depth of field camera are respectively used to obtain a first image and a second image, and the microcontroller unit is used to obtain at least one detection result of at least one glass substrate perforation according to the first image and the second image.
根據上述任一目的,本發明提供一種TGV玻璃基板的穿孔檢測裝置,TGV玻璃基板的穿孔檢測裝置包括第一景深相機、第一準直光源、第二景深相機、第二準直光源、分光稜鏡組、第三景深相機以及微控制器單元。第一景深相機及第一準直光源設置於具有至少一玻璃基板穿孔的玻璃基板之上,並正對玻璃基板的上表面。第二景深相機及第二準直光源設置於玻璃基板之下,並正對玻璃基板的下表面。微控制器單元電性連接第一景深相機、第一準直光源、第二景深相機、第二準直光源與第三景深相機。分光稜鏡模組設置於玻璃基板的上表面與第一準直光源之間。第三景深相機設置於分光稜鏡模組的一側。第一準直光源與第二準直光源分別發射第一準直光束與第二準直光束至玻璃基板,分光稜鏡模組用於射向玻璃基板的第一準直光束、被玻璃基板反射的第一準直光束及穿透玻璃基板的第二準光束分光,穿透玻璃基板穿孔的第二準直光束在分光後的一部分、射向玻璃基板的第一準直光束在分光後的一部分及被玻璃基板反射的第一準直光束在分光後的一部分被第三景深相機接收,穿透玻璃基板穿孔的第二準直光束在分光後的另一部分及被玻璃基板反射的第一準直光束在分光後的另一部分被第一景深相機接收,射向玻璃基板的第一準直光束在分光後的另一部分照射至玻璃基板,第一準直光束的光波段不同或相同於第二準直光束的光波段,第一景深相機、第二景深相機與第三景深相機分別用於取得第一影像、第二影像與第三影像,且微控制器單元用於根據第一影像、第二影像與第三影像獲得至少一玻璃基板穿孔的至少一檢測結果。According to any of the above purposes, the present invention provides a perforation detection device for a TGV glass substrate, the perforation detection device for a TGV glass substrate comprising a first depth of field camera, a first collimated light source, a second depth of field camera, a second collimated light source, a spectroscopic prism assembly, a third depth of field camera and a microcontroller unit. The first depth of field camera and the first collimated light source are arranged on a glass substrate having at least one glass substrate perforation, and face the upper surface of the glass substrate. The second depth of field camera and the second collimated light source are arranged under the glass substrate, and face the lower surface of the glass substrate. The microcontroller unit is electrically connected to the first depth of field camera, the first collimated light source, the second depth of field camera, the second collimated light source and the third depth of field camera. The spectroscopic prism module is arranged between the upper surface of the glass substrate and the first collimated light source. The third depth of field camera is arranged on one side of the spectroscopic prism module. The first collimated light source and the second collimated light source respectively emit a first collimated light beam and a second collimated light beam to the glass substrate. The beam splitting prism module is used to split the first collimated light beam directed to the glass substrate, the first collimated light beam reflected by the glass substrate, and the second collimated light beam penetrating the glass substrate. A portion of the second collimated light beam penetrating the hole of the glass substrate after the beam splitting, a portion of the first collimated light beam directed to the glass substrate after the beam splitting, and a portion of the first collimated light beam reflected by the glass substrate after the beam splitting are received by the third depth-of-field camera. The second collimated light beam penetrating the hole of the glass substrate after the beam splitting Another part of the first collimated light beam after the light is reflected by the glass substrate and another part of the first collimated light beam after the light is split is received by the first depth-of-field camera, and another part of the first collimated light beam after the light is split is irradiated onto the glass substrate, and the light band of the first collimated light beam is different from or the same as the light band of the second collimated light beam. The first depth-of-field camera, the second depth-of-field camera and the third depth-of-field camera are respectively used to obtain a first image, a second image and a third image, and the microcontroller unit is used to obtain at least one detection result of at least one glass substrate perforation according to the first image, the second image and the third image.
基於上述目的,本發明還提供一種TGV玻璃基板穿孔的穿孔檢測方法,TGV玻璃基板穿孔的穿孔檢測方法執行於TGV玻璃基板的穿孔檢測裝置中,TGV玻璃基板的穿孔檢測裝置包括第一景深相機、第一準直光源、第二景深相機及第二準直光源,其中第一景深相機及第一準直光源設置於具有至少一玻璃基板穿孔的玻璃基板之上,並正對玻璃基板的上表面,第二景深相機及第二準直光源設置於玻璃基板之下,並正對玻璃基板的下表面,且穿孔檢測方法包括以下步驟:使用TGV玻璃基板的穿孔檢測裝置之微控制器單元控制第一景深相機、第一準直光源、第二景深相機及第二準直光源,使得第一準直光源與第二準直光源分別發射第一準直光束與第二準直光束至玻璃基板,並使得第一景深相機與第二景深相機分別用於取得第一影像與第二影像,其中第一準直光束的光波段相同或不同於第二準直光束的光波段;以及使用TGV玻璃基板的穿孔檢測裝置之微控制器單元根據第一影像與第二影像獲得至少一玻璃基板穿孔的至少一檢測結果。Based on the above purpose, the present invention also provides a TGV glass substrate perforation detection method, the TGV glass substrate perforation detection method is executed in a TGV glass substrate perforation detection device, the TGV glass substrate perforation detection device includes a first depth of field camera, a first collimated light source, a second depth of field camera and a second collimated light source, wherein the first depth of field camera and the first collimated light source are arranged on a glass substrate having at least one glass substrate perforation and facing the upper surface of the glass substrate, the second depth of field camera and the second collimated light source are arranged under the glass substrate and facing the lower surface of the glass substrate, and the perforation detection method includes the following steps :The microcontroller unit of the perforation detection device using TGV glass substrate controls a first depth of field camera, a first collimated light source, a second depth of field camera and a second collimated light source, so that the first collimated light source and the second collimated light source respectively emit a first collimated light beam and a second collimated light beam to the glass substrate, and the first depth of field camera and the second depth of field camera are respectively used to obtain a first image and a second image, wherein the light band of the first collimated light beam is the same as or different from the light band of the second collimated light beam; and the microcontroller unit of the perforation detection device using TGV glass substrate obtains at least one detection result of perforation of at least one glass substrate according to the first image and the second image.
綜上所述,本發明提供一種光學且無須填充無損可塑材料的TGV玻璃基板的穿孔檢測裝置與方法,除了可以減少檢測時間及成本外,更可以避免破壞玻璃基板。In summary, the present invention provides an optical TGV glass substrate perforation detection device and method that does not require filling with non-destructive plastic material, which can not only reduce the detection time and cost, but also avoid damaging the glass substrate.
為利貴審查員瞭解本發明之技術特徵、內容與優點及其所能達成之功效,茲將本發明配合附圖,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的權利範圍,合先敘明。In order to help the examiner understand the technical features, contents and advantages of the present invention and the effects that can be achieved, the present invention is described in detail as follows with the accompanying drawings and in the form of embodiments. The drawings used therein are only for illustration and auxiliary description, and may not be the true proportions and precise configurations after the implementation of the present invention. Therefore, it should not be interpreted based on the proportions and configurations of the attached drawings to limit the scope of rights of the present invention in actual implementation.
請參考圖3與圖4,圖3是本發明實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的俯視平面示意圖,以及圖4是本發明實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的側視剖面示意圖,其中圖4的玻璃基板1的剖面圖是以圖3的剖面線BB進行剖面而得到之剖面。TGV玻璃基板的穿孔檢測裝置包括第一景深相機211、第一準直光源212、第二景深相機221、第二準直光源222以及微控制器單元23,其中第一景深相機211與第一準直光源212可以整合成一個第一遠心鏡取像模組(telecentric camera)21來實現,以及第二景深相機221與第二準直光源222可以整合成一個第二遠心鏡取像模組22來實現,但本發明不以此為限制。Please refer to Figures 3 and 4, Figure 3 is a top view schematic diagram of the TGV glass substrate perforation detection device of the embodiment of the present invention detecting a glass substrate, and Figure 4 is a side view schematic diagram of the TGV glass substrate perforation detection device of the embodiment of the present invention detecting a glass substrate, wherein the cross-sectional view of the glass substrate 1 in Figure 4 is a cross-sectional view obtained by cutting along the section line BB in Figure 3. The perforation detection device for the TGV glass substrate includes a first depth of field camera 211, a first collimated light source 212, a second depth of field camera 221, a second collimated light source 222, and a microcontroller unit 23, wherein the first depth of field camera 211 and the first collimated light source 212 can be integrated into a first telecentric lens imaging module (telecentric camera) 21 for implementation, and the second depth of field camera 221 and the second collimated light source 222 can be integrated into a second telecentric lens imaging module 22 for implementation, but the present invention is not limited thereto.
第一景深相機211及第一準直光源212設置於具有至少一玻璃基板穿孔12的玻璃基板1之上,並正對玻璃基板1的上表面10,此處的第一景深相機211及第一準直光源212正對玻璃基板1的上表面10是指第一景深相機211的取像端及第一準直光源212的發射端兩者的延伸方向垂直於玻璃基板1的上表面10。第二景深相機221及第二準直光源222設置於玻璃基板1之下,並正對玻璃基板1的下表面11,此處的第二景深相機221及第二準直光源222正對玻璃基板1的下表面11是指第二景深相機221的取像端及第二準直光源222的發射端兩者的延伸方向垂直於玻璃基板1的下表面11。The first depth-of-field camera 211 and the first collimated light source 212 are disposed on the glass substrate 1 having at least one glass substrate through-hole 12, and face the upper surface 10 of the glass substrate 1. Here, the first depth-of-field camera 211 and the first collimated light source 212 face the upper surface 10 of the glass substrate 1, which means that the extending directions of the imaging end of the first depth-of-field camera 211 and the emitting end of the first collimated light source 212 are perpendicular to the upper surface 10 of the glass substrate 1. The second depth-of-field camera 221 and the second collimated light source 222 are disposed under the glass substrate 1, and face the lower surface 11 of the glass substrate 1. Here, the second depth-of-field camera 221 and the second collimated light source 222 face the lower surface 11 of the glass substrate 1, which means that the extending directions of the imaging end of the second depth-of-field camera 221 and the emitting end of the second collimated light source 222 are perpendicular to the lower surface 11 of the glass substrate 1.
微控制器單元23電性連接第一景深相機211、第一準直光源212、第二景深相機221及第二準直光源222,且第一景深相機211、第一準直光源212、第二景深相機221及第二準直光源222受控於微控制器單元23。微控制器單元23控制第一準直光源212與第二準直光源222分別發射第一準直光束L1與第二準直光束L2至玻璃基板1,其中第一準直光束L1的光波段不同或相同於第二準直光束L2的光波段,第一準直光束L1的光波段不同或相同於第二準直光束L2的光波段的意思也代表著,第一準直光束L1的光束顏色不同相同於於第二準直光束L2的光束顏色。舉例來說,第一準直光束L1的光束顏色與第二準直光束L2的光束顏色的每一者選自紅色、綠色、藍色與白色的一者。附帶說明的是,第一準直光束L1與第二準直光束L2的準直度關聯於玻璃基板穿孔12的深度,也就是玻璃基板1的厚度。第一景深相機211與第二景深相機221依據實際使用情況可以是黑白或彩色相機。The microcontroller unit 23 is electrically connected to the first depth-of-field camera 211, the first collimated light source 212, the second depth-of-field camera 221, and the second collimated light source 222, and the first depth-of-field camera 211, the first collimated light source 212, the second depth-of-field camera 221, and the second collimated light source 222 are controlled by the microcontroller unit 23. The microcontroller unit 23 controls the first collimated light source 212 and the second collimated light source 222 to emit the first collimated light beam L1 and the second collimated light beam L2 to the glass substrate 1, respectively, wherein the light band of the first collimated light beam L1 is different from or the same as the light band of the second collimated light beam L2. The light band of the first collimated light beam L1 is different from or the same as the light band of the second collimated light beam L2, which means that the light beam color of the first collimated light beam L1 is different from or the same as the light beam color of the second collimated light beam L2. For example, each of the beam colors of the first collimated light beam L1 and the second collimated light beam L2 is selected from one of red, green, blue and white. It should be noted that the collimation of the first collimated light beam L1 and the second collimated light beam L2 is related to the depth of the glass substrate through hole 12, that is, the thickness of the glass substrate 1. The first depth of field camera 211 and the second depth of field camera 221 can be black and white or color cameras according to actual use.
第一準直光束L1與第二準直光束L2照射玻璃基板1後,分別產生了第二感測光束與第一感測光束給第一景深相機211與第二景深相機221,以使得第一景深相機211與第二景深相機221據此取得第一影像與第二影像。接著,微控制器單元23用於根據第一影像與第二影像獲得至少一玻璃基板穿孔12的至少一檢測結果。附帶說明的是,第一景深相機211與第二景深相機221的最大判別深度關聯於玻璃基板穿孔12的深度,也就是玻璃基板1的厚度。After the first collimated light beam L1 and the second collimated light beam L2 irradiate the glass substrate 1, the second sensing light beam and the first sensing light beam are generated respectively to the first depth of field camera 211 and the second depth of field camera 221, so that the first depth of field camera 211 and the second depth of field camera 221 obtain the first image and the second image accordingly. Then, the microcontroller unit 23 is used to obtain at least one detection result of at least one glass substrate through hole 12 according to the first image and the second image. It is to be noted that the maximum discrimination depth of the first depth of field camera 211 and the second depth of field camera 221 is related to the depth of the glass substrate through hole 12, that is, the thickness of the glass substrate 1.
進一步地,參照圖3、4與圖7,檢測結果包括玻璃基板穿孔12的上開口121與下開口123的上、下開口尺徑Rt、Rb(可以藉此判讀是否有孔徑異常)、開口座標、開口真圓度(可以藉此判讀是否有真圓度異常)、裂痕檢測結果、髒汙檢測結果、點傷檢測結果、刮傷檢測結果、雜質檢測結果與崩邊檢測結果、玻璃基板穿孔12的穿孔尺徑Rm、玻璃基板穿孔12的孔塞檢測結果(可以藉此判讀是否有孔塞異常)與上下開口錯開量(可以藉此判讀是否有偏移異常)的至少一者。Further, referring to FIGS. 3, 4 and 7, the detection results include at least one of the upper and lower opening sizes Rt and Rb of the upper opening 121 and the lower opening 123 of the glass substrate through hole 12 (which can be used to determine whether there is an aperture abnormality), opening coordinates, opening true roundness (which can be used to determine whether there is a true roundness abnormality), crack detection results, dirt detection results, spot detection results, scratch detection results, impurity detection results and edge collapse detection results, the hole size Rm of the glass substrate through hole 12, the hole plug detection result of the glass substrate through hole 12 (which can be used to determine whether there is a hole plug abnormality) and the upper and lower opening misalignment (which can be used to determine whether there is an offset abnormality).
請接著參照圖5,圖5是本發明實施例的第一景深相機及第一準直光源以第一遠心鏡取像模組實現的示意圖。第一遠心鏡取像模組21包括光接收鏡頭模組213、遠心鏡頭模組214及成像模組215,第一遠心鏡取像模組21的外形呈現為T字形,其中成像模組215設置於第一遠心鏡取像模組21的頂端,光接收鏡頭模組213設置於第一遠心鏡取像模組21的側端,遠心鏡頭模組214設置於第一遠心鏡取像模組21的底端,光接收鏡頭模組213接收初始光源的光束L0,遠心鏡頭模組214用於發出第一準直光束L1以及接收第一感測光束L2'(由第二準直光束L2照射玻璃基板1所產生),以及成像模組215用於根據第一感測光束L2'產生第一影像。Please refer to FIG. 5, which is a schematic diagram of the first depth of field camera and the first collimated light source of the embodiment of the present invention implemented with the first telecentric lens imaging module. The first telecentric lens imaging module 21 includes a light receiving lens module 213, a telecentric lens module 214 and an imaging module 215. The first telecentric lens imaging module 21 is T-shaped, wherein the imaging module 215 is arranged at the top of the first telecentric lens imaging module 21, the light receiving lens module 213 is arranged at the side of the first telecentric lens imaging module 21, and the telecentric lens module 214 is arranged at the side of the first telecentric lens imaging module 21. 4 is arranged at the bottom end of the first telecentric lens imaging module 21, the light receiving lens module 213 receives the light beam L0 of the initial light source, the telecentric lens module 214 is used to emit the first collimated light beam L1 and receive the first sensing light beam L2' (generated by the second collimated light beam L2 irradiating the glass substrate 1), and the imaging module 215 is used to generate a first image according to the first sensing light beam L2'.
再者,類似於圖5,圖4的第二遠心鏡取像模組22包括另一光接收鏡頭模組、另一遠心鏡頭模組及另一成像模組,第二遠心鏡取像模組22的外形呈現為T字形,其中另一成像模組設置於第二遠心鏡取像模組22的頂端,另一光接收鏡頭模組設置於第二遠心鏡取像模組22的側端,另一遠心鏡頭模組設置於第二遠心鏡取像模組22的底端,另一光接收鏡頭模組接收另一初始光源的光束,另一遠心鏡頭模組用於發出第二準直光束L2以及接收第二感測光束(由第一準直光束L1照射玻璃基板1所產生),以及另一成像模組用於根據第二感測光束產生第二影像。Furthermore, similar to FIG. 5 , the second telecentric lens imaging module 22 of FIG. 4 includes another light receiving lens module, another telecentric lens module and another imaging module. The second telecentric lens imaging module 22 has a T-shaped appearance, wherein the other imaging module is disposed at the top of the second telecentric lens imaging module 22, and the other light receiving lens module is disposed at the side of the second telecentric lens imaging module 22. , another telecentric lens module is arranged at the bottom end of the second telecentric lens imaging module 22, another light receiving lens module receives the light beam of another initial light source, another telecentric lens module is used to emit a second collimated light beam L2 and receive a second sensing light beam (generated by the first collimated light beam L1 irradiating the glass substrate 1), and another imaging module is used to generate a second image according to the second sensing light beam.
請參照圖6,圖6是本發明實施例的第一影像與第二影像的示意圖,其中圖6左側為第一影像,圖6右側為第二影像。第一影像呈現玻璃基板1的至少一玻璃基板穿孔12的上開口121、腰身的穿孔122及上開口121附近的玻璃基板1的部分上表面10之影像,其中穿孔的顏色為第二準直光束L2的光束顏色,上開口121至穿孔122的顏色為黑色,以及上開口121附近的玻璃基板1的部分上表面10的顏色為第一準直光束L1的光束顏色與第二準直光束L2的光束顏色的混色。Please refer to FIG6 , which is a schematic diagram of a first image and a second image of an embodiment of the present invention, wherein the left side of FIG6 is the first image, and the right side of FIG6 is the second image. The first image presents an upper opening 121 of at least one glass substrate through hole 12 of the glass substrate 1, a through hole 122 of the waist, and an image of a portion of the upper surface 10 of the glass substrate 1 near the upper opening 121, wherein the color of the through hole is the beam color of the second collimated light beam L2, the color from the upper opening 121 to the through hole 122 is black, and the color of a portion of the upper surface 10 of the glass substrate 1 near the upper opening 121 is a mixture of the beam color of the first collimated light beam L1 and the beam color of the second collimated light beam L2.
第二影像呈現玻璃基板1的至少一玻璃基板穿孔12的下開口123、腰身的穿孔122及下開口123附近的玻璃基板1的部分下表面11之影像,其中穿孔122的顏色為第一準直光束L1的光束顏色,下開口123至穿孔122的顏色為黑色,以及下開口123附近的玻璃基板1的部分下表面11的顏色為第一準直光束L1的光束顏色與第二準直光束L2的光束顏色的混色。The second image presents the image of the lower opening 123 of at least one glass substrate through hole 12 of the glass substrate 1, the through hole 122 of the waist, and the portion of the lower surface 11 of the glass substrate 1 near the lower opening 123, wherein the color of the through hole 122 is the beam color of the first collimated light beam L1, the color from the lower opening 123 to the through hole 122 is black, and the color of the portion of the lower surface 11 of the glass substrate 1 near the lower opening 123 is a mixture of the beam color of the first collimated light beam L1 and the beam color of the second collimated light beam L2.
進一步地,TGV玻璃基板的穿孔檢測裝置更包括主架體(圖未示)及玻璃基板承載結構(圖未示)。玻璃基板承載結構設置於主架體中,用於接觸玻璃基板1的至少一部份(例如四個角落,但不以此為限制),以承載玻璃基板1。另外,請參照圖8A至圖8C,圖8A是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的立體示意圖,圖8B是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的正視示意圖,以及圖8C是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的側視示意圖。除了主架體(圖未示)及玻璃基板承載結構(圖未示)之外,TGV玻璃基板的穿孔檢測裝置更包括了用於承載與固定第一遠心鏡取像模組21及第二遠心鏡取像模組22的基座結構24,其中基座結構24包括共同基座240與第一基座241a與第二基座241b,且第一基座241a與第二基座241b設置於共同基座240的兩相對側,並分別用於承載與固定第一遠心鏡取像模組21及第二遠心鏡取像模組22。Furthermore, the perforation detection device for TGV glass substrate further includes a main frame (not shown) and a glass substrate supporting structure (not shown). The glass substrate supporting structure is disposed in the main frame and is used to contact at least a portion (e.g., four corners, but not limited thereto) of the glass substrate 1 to support the glass substrate 1. In addition, please refer to FIGS. 8A to 8C, FIG. 8A is a three-dimensional schematic diagram of a partial structure of the perforation detection device for TGV glass substrate of an embodiment of the present invention, FIG. 8B is a front view schematic diagram of a partial structure of the perforation detection device for TGV glass substrate of an embodiment of the present invention, and FIG. 8C is a side view schematic diagram of a partial structure of the perforation detection device for TGV glass substrate of an embodiment of the present invention. In addition to the main frame (not shown) and the glass substrate supporting structure (not shown), the TGV glass substrate perforation detection device further includes a base structure 24 for supporting and fixing the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22, wherein the base structure 24 includes a common base 240 and a first base 241a and a second base 241b, and the first base 241a and the second base 241b are arranged on two opposite sides of the common base 240, and are respectively used to support and fix the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22.
在一個實施例中,如果玻璃基板1尺寸不大,第一遠心鏡取像模組21及第二遠心鏡取像模組22可以不用移動即可以取得完整玻璃基板1的第一影像與第二影像,則共同基座240是固定於主架體中,玻璃基板承載結構也是固定於主架體中,且玻璃基板1不會相對於第一遠心鏡取像模組21及第二遠心鏡取像模組22移動。如果玻璃基板1尺寸太大,第一遠心鏡取像模組21及第二遠心鏡取像模組22必須移動才可以取得完整玻璃基板1的第一影像與第二影像,則需要設計成玻璃基板1能夠相對於第一遠心鏡取像模組21及第二遠心鏡取像模組22移動,此時可以是設計成共同基座240是固定於主架體中,而玻璃基板承載結構是可動地設置於主架體中,或者是設計成共同基座240是可動地設置於主架體中,而玻璃基板承載結構是固定於主架體中。進一步地,TGV玻璃基板的穿孔檢測裝置還包括傳動機構,用於連接與移動共同基座240或玻璃基板承載結構的一者,以使玻璃基板1能夠相對於第一遠心鏡取像模組21及第二遠心鏡取像模組22移動。In one embodiment, if the size of the glass substrate 1 is not large, the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22 can obtain the first image and the second image of the complete glass substrate 1 without moving, then the common base 240 is fixed in the main frame, the glass substrate supporting structure is also fixed in the main frame, and the glass substrate 1 will not move relative to the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22. If the size of the glass substrate 1 is too large, the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22 must be moved to obtain the first image and the second image of the complete glass substrate 1. In this case, it is necessary to design the glass substrate 1 to be able to move relative to the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22. In this case, the common base 240 can be designed to be fixed in the main frame, and the glass substrate supporting structure can be movably arranged in the main frame, or the common base 240 can be designed to be movably arranged in the main frame, and the glass substrate supporting structure can be fixed in the main frame. Furthermore, the TGV glass substrate perforation detection device further includes a transmission mechanism for connecting and moving the common base 240 or one of the glass substrate supporting structures, so that the glass substrate 1 can move relative to the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22.
除此之外,第一基座241a與第二基座241b的每一者包括了調整結構,調整結構例如但不限定是調整墊片、調整螺絲、調整軸承或其他調整部件,第一基座241a與第二基座241b的調整結構可以分別用於調整第一遠心鏡取像模組21及第二遠心鏡取像模組22的偏移,偏移可以例如是X軸跟Y軸的偏移,也可能是X軸、Y軸跟Z軸的偏移,總而言之,本發明不以調整結構的實現方式為限制。另外,由上可知,於本發明中,在第一遠心鏡取像模組21及第二遠心鏡取像模組22需要相對於玻璃基板1的移動的情況下,第一遠心鏡取像模組21及第二遠心鏡取像模組22相對於玻璃基板1的移動是被設計成共同連動的移動,其優點在於一但調整偏移調整好之後,不會像第一遠心鏡取像模組21及第二遠心鏡取像模組22有因為單獨移動導致偏移而得重新調整之情況,因此可以增加量測精準度,或者是減少調整偏移的時間與人力成本等。In addition, each of the first base 241a and the second base 241b includes an adjustment structure, such as but not limited to an adjustment gasket, an adjustment screw, an adjustment bearing or other adjustment components. The adjustment structure of the first base 241a and the second base 241b can be used to adjust the offset of the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22, respectively. The offset can be, for example, the offset of the X-axis and the Y-axis, or it can be the offset of the X-axis, the Y-axis and the Z-axis. In short, the present invention is not limited to the implementation method of the adjustment structure. In addition, it can be seen from the above that in the present invention, when the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22 need to move relative to the glass substrate 1, the movement of the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22 relative to the glass substrate 1 is designed to be a jointly linked movement. The advantage is that once the offset is adjusted, there is no need to readjust the offset caused by the first telecentric lens imaging module 21 and the second telecentric lens imaging module 22 due to a single movement. Therefore, the measurement accuracy can be increased, or the time and labor cost of adjusting the offset can be reduced.
再者,依照上述內容,本發明還提供一種TGV玻璃基板的穿孔檢測方法,TGV玻璃基板的穿孔檢測方法執行於TGV玻璃基板的穿孔檢測裝置中,穿孔檢測裝置包括第一景深相機、第一準直光源、第二景深相機及第二準直光源,第一景深相機及第一準直光源設置於具有至少一玻璃基板穿孔的玻璃基板之上,並正對玻璃基板的上表面,第二景深相機及第二準直光源設置於玻璃基板之下,並正對玻璃基板的下表面,以及穿孔檢測方法且包括以下步驟:使用TGV玻璃基板的穿孔檢測裝置之微控制器單元控制第一景深相機、第一準直光源、第二景深相機及第二準直光源,使得第一準直光源與第二準直光源分別發射第一準直光束與第二準直光束至玻璃基板,並使得第一景深相機與第二景深相機分別用於取得第一影像與第二影像,其中第一準直光束的光束顏色不同於第二準直光束的光束顏色;以及使用TGV玻璃基板的穿孔檢測裝置之微控制器單元根據第一影像與第二影像獲得至少一玻璃基板穿孔的至少一檢測結果。另外,當玻璃基板尺寸較大,第一遠心鏡取像模組及第二遠心鏡取像模組必須移動才可以取得完整玻璃基板的第一影像與第二影像時,上述穿孔檢測方法更包括:使TGV玻璃基板的穿孔檢測裝置之第一景深相機、第一準直光源、第二景深相機及第二準直光源與玻璃基板產生相對移動(即第一景深相機、第一準直光源、第二景深相機及第二準直光源共同移動,但玻璃基板不動;或者,第一景深相機、第一準直光源、第二景深相機及第二準直光源不動,但玻璃基板移動)。Furthermore, according to the above content, the present invention also provides a TGV glass substrate perforation detection method, the TGV glass substrate perforation detection method is performed in a TGV glass substrate perforation detection device, the perforation detection device includes a first depth of field camera, a first collimated light source, a second depth of field camera and a second collimated light source, the first depth of field camera and the first collimated light source are arranged on a glass substrate having at least one glass substrate perforation and facing the upper surface of the glass substrate, the second depth of field camera and the second collimated light source are arranged under the glass substrate and facing the lower surface of the glass substrate, and the perforation detection method includes the following steps: using a T The microcontroller unit of the perforation detection device for the GV glass substrate controls the first depth of field camera, the first collimated light source, the second depth of field camera and the second collimated light source, so that the first collimated light source and the second collimated light source respectively emit a first collimated light beam and a second collimated light beam to the glass substrate, and the first depth of field camera and the second depth of field camera are respectively used to obtain a first image and a second image, wherein the beam color of the first collimated light beam is different from the beam color of the second collimated light beam; and the microcontroller unit of the perforation detection device for the TGV glass substrate obtains at least one detection result of the perforation of at least one glass substrate according to the first image and the second image. In addition, when the size of the glass substrate is relatively large, the first telecentric lens imaging module and the second telecentric lens imaging module must be moved to obtain the first image and the second image of the complete glass substrate, and the above-mentioned perforation detection method further includes: making the first depth of field camera, the first collimated light source, the second depth of field camera and the second collimated light source of the perforation detection device of the TGV glass substrate move relative to the glass substrate (that is, the first depth of field camera, the first collimated light source, the second depth of field camera and the second collimated light source move together, but the glass substrate does not move; or, the first depth of field camera, the first collimated light source, the second depth of field camera and the second collimated light source do not move, but the glass substrate moves).
請參照圖9,圖9是本發明另一實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的側視剖面示意圖。不同於圖4的實施例,於此實施例中,穿孔檢測裝置更包括配置於玻璃基板1的上表面10與第一遠心鏡取像模組21的分光稜鏡模組25與位於分光稜鏡模組25之一側(例如右側)的第三遠心鏡取像模組26。第三遠心鏡取像模組26包括第三景深相機261及第三準直光源262,但第三準直光源262在此禁能,即不發出第三準直光束,而第三景深相機261則電性連接微控制器單元23。第二準直光束L2會準直地穿透玻璃基板1,其中第二準直光束穿透穿孔122及上開口121(若上開口尺徑Rt大於等於下開口尺徑Rb)之外的玻璃基板1的部分,或者第二準直光束穿透穿孔122及下開口123(若上開口尺徑Rt小於下開口尺徑Rb)之外的玻璃基板1的部分,分光稜鏡模組25用於穿透玻璃基板1之第二準直光束L2做分光,也用於將射向玻璃基板1的第一準直光束L1及被玻璃基板1反射的第一準直光束L1做分光。Please refer to FIG. 9 , which is a side cross-sectional schematic diagram of another embodiment of the present invention of the perforation detection device for TGV glass substrates detecting a glass substrate. Different from the embodiment of FIG. 4 , in this embodiment, the perforation detection device further includes a spectroscopic prism module 25 disposed on the upper surface 10 of the glass substrate 1 and the first telecentric imaging module 21, and a third telecentric imaging module 26 located on one side (e.g., the right side) of the spectroscopic prism module 25. The third telecentric imaging module 26 includes a third depth of field camera 261 and a third collimated light source 262, but the third collimated light source 262 is disabled here, that is, it does not emit a third collimated light beam, and the third depth of field camera 261 is electrically connected to the microcontroller unit 23. The second collimated light beam L2 will penetrate the glass substrate 1 in a collimated manner, wherein the second collimated light beam penetrates the portion of the glass substrate 1 outside the through hole 122 and the upper opening 121 (if the upper opening size Rt is greater than or equal to the lower opening size Rb), or the second collimated light beam penetrates the portion of the glass substrate 1 outside the through hole 122 and the lower opening 123 (if the upper opening size Rt is smaller than the lower opening size Rb). The beam splitting prism module 25 is used to split the second collimated light beam L2 that penetrates the glass substrate 1, and is also used to split the first collimated light beam L1 that is emitted to the glass substrate 1 and the first collimated light beam L1 that is reflected by the glass substrate 1.
穿透玻璃基板1之第二準直光束L2被分光後的一部份、射向玻璃基板1的第一準直光束L1被分光後的一部份及被玻璃基板1反射的第一準直光束L1被分光後的一部份被第三景深相機261接收,並形成第三影像。穿透玻璃基板1之第二準直光束L2被分光後的另一部份及被玻璃基板1反射的第一準直光束L1被分光後的另一部被第一景深相機211,並形成第一影像。因此,相較於第一影像,第三影像的亮度或比較大,以及比較偏向第一準直光束L1的光束顏色。射向玻璃基板1的第一準直光束L1被分光後的另一部分部分穿透玻璃基板1及部分被玻璃基板1反射。因此,第二景深相機221接收了穿透玻璃基板1的第一準直光束L1及被玻璃基板1所反射的第二準直光束L2,並形成第二影像。A portion of the second collimated light beam L2 that penetrates the glass substrate 1, a portion of the first collimated light beam L1 that is emitted toward the glass substrate 1, and a portion of the first collimated light beam L1 that is reflected by the glass substrate 1 are received by the third depth-of-field camera 261 to form a third image. Another portion of the second collimated light beam L2 that penetrates the glass substrate 1 and another portion of the first collimated light beam L1 that is reflected by the glass substrate 1 are received by the first depth-of-field camera 211 to form a first image. Therefore, compared with the first image, the brightness of the third image may be relatively large, and the color of the beam is relatively biased toward the first collimated light beam L1. Another portion of the first collimated light beam L1 that is emitted toward the glass substrate 1 partially penetrates the glass substrate 1 and is partially reflected by the glass substrate 1. Therefore, the second depth-of-field camera 221 receives the first collimated light beam L1 that penetrates the glass substrate 1 and the second collimated light beam L2 that is reflected by the glass substrate 1 to form a second image.
在這個實施例中,透過了第一影像、第二影像與第三影像來更精準地取得玻璃基板穿孔12的檢測結果。再者,在這個實施例中,可以讓第一準直光束L1的光束顏色與第二準直光束L2的光束顏色彼此相同或不相同,例如,第一準直光束L1的光束顏色與第二準直光束L2的光束顏色的每一者選自白色、紅色、綠色與藍色的一者。另外,依據實際情況,第一景深相機211、第二景深相機221與第三景深相機261可以是彩色或黑白相機。In this embodiment, the first image, the second image, and the third image are used to more accurately obtain the detection result of the glass substrate through hole 12. Furthermore, in this embodiment, the beam color of the first collimated light beam L1 and the beam color of the second collimated light beam L2 can be the same or different from each other. For example, each of the beam color of the first collimated light beam L1 and the beam color of the second collimated light beam L2 is selected from one of white, red, green, and blue. In addition, according to actual conditions, the first depth of field camera 211, the second depth of field camera 221, and the third depth of field camera 261 can be color or black and white cameras.
綜上所述,本發明提供一種光學且無須填充無損可塑材料的TGV玻璃基板的穿孔檢測裝置與方法,其可以檢測的項目包括玻璃基板穿孔的上開口與下開口的開口尺徑、開口座標、開口真圓度、裂痕檢測結果、雜質檢測結果與崩邊檢測結果、玻璃基板穿孔的穿孔尺徑、玻璃基板穿孔的孔塞檢測結果與上下開口錯開量的至少一者。再者,本發明的TGV玻璃基板的穿孔檢測裝置與方法除了可以減少檢測時間及成本外,更可以避免破壞玻璃基板。In summary, the present invention provides an optical TGV glass substrate perforation detection device and method that does not require filling with non-destructive plastic material. The items that can be detected include the opening size of the upper opening and the lower opening of the glass substrate perforation, the opening coordinates, the opening roundness, the crack detection result, the impurity detection result and the edge collapse detection result, the perforation size of the glass substrate perforation, the hole plug detection result of the glass substrate perforation and at least one of the upper and lower opening misalignment. Furthermore, the TGV glass substrate perforation detection device and method of the present invention can not only reduce the detection time and cost, but also avoid damaging the glass substrate.
以上所述之實施例僅係為說明本發明之技術思想及特點,其目的在使熟習此項技藝之人士能夠瞭解本發明之內容並據以實施,當不能以之限定本發明之專利範圍,即大凡依本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本發明之專利範圍內。The embodiments described above are only for illustrating the technical ideas and features of the present invention, and their purpose is to enable people familiar with this technology to understand the content of the present invention and implement it accordingly. They cannot be used to limit the patent scope of the present invention. In other words, all equivalent changes or modifications made according to the spirit disclosed by the present invention should still be included in the patent scope of the present invention.
1: 玻璃基板 10:上表面 11:下表面 12:玻璃基板穿孔 121:上開口 122:穿孔 123:下開口 21:第一遠心鏡取像模組 211:第一景深相機 212:第一準直光源 213:光接收鏡頭模組 214:遠心鏡頭模組 215:成像模組 22:第二遠心鏡取像模組 221:第二景深相機 222:第二準直光源 23:微控制器單元 24:基座結構 240:共同基座 241a:第一基座 241b:第二基座 25:分光稜鏡模組 26:第二遠心鏡取像模組 261:第三景深相機 262:第三準直光源 Rt:上開口尺徑 Rb:下開口尺徑 Rm:穿孔尺徑 AA、BB:剖面線 L0:光束 L1:第一準直光束 L2:第二準直光束 L2':第一感測光束 1: Glass substrate 10: Upper surface 11: Lower surface 12: Glass substrate perforation 121: Upper opening 122: Perforation 123: Lower opening 21: First telecentric lens imaging module 211: First depth of field camera 212: First collimated light source 213: Light receiving lens module 214: Telecentric lens module 215: Imaging module 22: Second telecentric lens imaging module 221: Second depth of field camera 222: Second collimated light source 23: Microcontroller unit 24: Base structure 240: Common base 241a: First base 241b: Second base 25: Spectral prism module 26: Second telecentric imaging module 261: Third depth of field camera 262: Third collimated light source Rt: Upper opening diameter Rb: Lower opening diameter Rm: Perforation diameter AA, BB: Section line L0: Light beam L1: First collimated light beam L2: Second collimated light beam L2': First sensing light beam
提供的附圖是用以使本發明所屬技術領域具有通常知識者可以進一步理解本發明,並且被併入與構成本發明之說明書的一部分,附圖示出了本發明的示範實施例,並且用以與本發明之說明書一起用於解釋本發明的原理,其並非用於限制本發明。本發明附圖的簡單說明如下: 圖1是對具有玻璃基板穿孔的玻璃基板進行俯視的平面示意圖; 圖2是對圖1之剖面進行側視的立體示意圖; 圖3是本發明實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的俯視平面示意圖; 圖4是本發明實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的側視剖面示意圖; 圖5是本發明實施例的第一景深相機及第一準直光源以第一遠心鏡取像模組實現的示意圖; 圖6是本發明實施例的第一影像與第二影像的示意圖; 圖7是本發明實施例之TGV玻璃基板的穿孔檢測裝置可以檢測的瑕疵類型; 圖8A是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的立體示意圖; 圖8B是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的正視示意圖; 圖8C是本發明實施例之TGV玻璃基板的穿孔檢測裝置的部分結構的側視示意圖;以及 圖9是本發明另一實施例的TGV玻璃基板的穿孔檢測裝置對玻璃基板檢測的側視剖面示意圖。 The accompanying drawings are provided to enable those having ordinary knowledge in the technical field to which the present invention belongs to further understand the present invention, and are incorporated into and constitute a part of the specification of the present invention. The accompanying drawings show exemplary embodiments of the present invention and are used together with the specification of the present invention to explain the principles of the present invention, and are not used to limit the present invention. A brief description of the attached drawings of the present invention is as follows: Figure 1 is a schematic plan view of a glass substrate having a glass substrate perforation; Figure 2 is a schematic three-dimensional view of a side view of the cross section of Figure 1; Figure 3 is a schematic plan view of a glass substrate detected by a perforation detection device for a TGV glass substrate according to an embodiment of the present invention; Figure 4 is a schematic side cross-sectional view of a glass substrate detected by a perforation detection device for a TGV glass substrate according to an embodiment of the present invention; Figure 5 is a schematic diagram of the first depth of field camera and the first collimated light source of the embodiment of the present invention implemented by a first telecentric lens imaging module; Figure 6 is a schematic diagram of the first image and the second image of the embodiment of the present invention; Figure 7 is a diagram of the types of defects that can be detected by the perforation detection device for a TGV glass substrate according to an embodiment of the present invention; FIG8A is a three-dimensional schematic diagram of a partial structure of a perforation detection device for a TGV glass substrate according to an embodiment of the present invention; FIG8B is a front view schematic diagram of a partial structure of a perforation detection device for a TGV glass substrate according to an embodiment of the present invention; FIG8C is a side view schematic diagram of a partial structure of a perforation detection device for a TGV glass substrate according to an embodiment of the present invention; and FIG9 is a side view cross-sectional schematic diagram of a perforation detection device for a TGV glass substrate detecting a glass substrate according to another embodiment of the present invention.
1:玻璃基板 1: Glass substrate
10:上表面 10: Upper surface
11:下表面 11: Lower surface
12:玻璃基板穿孔 12: Perforation of glass substrate
121:上開口 121: Upper opening
122:穿孔 122:Piercing
123:下開口 123: Lower opening
21:第一遠心鏡取像模組 21: First telecentric lens imaging module
211:第一景深相機 211: The first depth of field camera
212:第一準直光源 212: First collimated light source
22:第二遠心鏡取像模組 22: Second telecentric lens imaging module
221:第二景深相機 221: Second Depth of Field Camera
222:第二準直光源 222: Second collimated light source
23:微控制器單元 23: Microcontroller unit
25:分光稜鏡模組 25: Spectroscopic prism module
26:第二遠心鏡取像模組 26: Second telecentric lens imaging module
261:第三景深相機 261: The third depth of field camera
262:第三準直光源 262: The third collimated light source
Rt:上開口尺徑 Rt: Upper opening diameter
Rb:下開口尺徑 Rb: Bottom opening diameter
Rm:穿孔尺徑 Rm: Punch diameter
L1:第一準直光束 L1: first collimated beam
L2:第二準直光束 L2: Second collimated beam
Claims (13)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113127128A TWI880821B (en) | 2024-07-19 | 2024-07-19 | Via detection device and method for tgv (through glass via) substrate |
| CN202411138046.XA CN120445032A (en) | 2024-02-06 | 2024-08-19 | TGV glass substrate perforation detection device and method |
| JP2024137488A JP2025121362A (en) | 2024-02-06 | 2024-08-19 | TGV glass substrate through-via detection device and detection method |
| US18/812,128 US20250251352A1 (en) | 2024-02-06 | 2024-08-22 | Via detection device and method for through glass via substrate |
| KR1020240115414A KR20250122383A (en) | 2024-02-06 | 2024-08-27 | Via detection device and method for through glass via substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW113127128A TWI880821B (en) | 2024-07-19 | 2024-07-19 | Via detection device and method for tgv (through glass via) substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI880821B true TWI880821B (en) | 2025-04-11 |
| TW202605312A TW202605312A (en) | 2026-02-01 |
Family
ID=96141843
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113127128A TWI880821B (en) | 2024-02-06 | 2024-07-19 | Via detection device and method for tgv (through glass via) substrate |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI880821B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201243272A (en) * | 2011-04-13 | 2012-11-01 | Snu Precision Co Ltd | Interferometric system for measuring TSV and method using the same |
| TWM497782U (en) * | 2014-07-22 | 2015-03-21 | Synpower Co Ltd | Image inspection system |
| CN104517938A (en) * | 2013-10-04 | 2015-04-15 | 爱思开海力士有限公司 | Semiconductor device having test unit, electronic apparatus and method for testing semiconductor device |
| WO2022059515A1 (en) * | 2020-09-16 | 2022-03-24 | ソニーグループ株式会社 | Solid-state imaging device and recognition system |
| TW202217289A (en) * | 2020-06-03 | 2022-05-01 | 美商康寧公司 | Apparatus and method for inspecting laser defect inside of transparent material |
| WO2024101204A1 (en) * | 2022-11-10 | 2024-05-16 | ソニーセミコンダクタソリューションズ株式会社 | Light detection device and multilayer substrate |
-
2024
- 2024-07-19 TW TW113127128A patent/TWI880821B/en active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201243272A (en) * | 2011-04-13 | 2012-11-01 | Snu Precision Co Ltd | Interferometric system for measuring TSV and method using the same |
| CN104517938A (en) * | 2013-10-04 | 2015-04-15 | 爱思开海力士有限公司 | Semiconductor device having test unit, electronic apparatus and method for testing semiconductor device |
| TWM497782U (en) * | 2014-07-22 | 2015-03-21 | Synpower Co Ltd | Image inspection system |
| TW202217289A (en) * | 2020-06-03 | 2022-05-01 | 美商康寧公司 | Apparatus and method for inspecting laser defect inside of transparent material |
| WO2022059515A1 (en) * | 2020-09-16 | 2022-03-24 | ソニーグループ株式会社 | Solid-state imaging device and recognition system |
| WO2024101204A1 (en) * | 2022-11-10 | 2024-05-16 | ソニーセミコンダクタソリューションズ株式会社 | Light detection device and multilayer substrate |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101186464B1 (en) | Interferometric system for measuring tsv and method using the same | |
| CN100585615C (en) | Detection Systems | |
| TW202121609A (en) | High-precision bond head positioning method and apparatus | |
| JP2006090740A (en) | Wiring board inspection method, wiring board manufacturing method, and wiring board inspection apparatus | |
| WO2021073310A1 (en) | Method and apparatus for three-dimensional on-line monitoring of warpage deformation and defect of encapsulation module | |
| TWI879236B (en) | Apparatus and method for wafer bonding alignment and detection | |
| TWI880821B (en) | Via detection device and method for tgv (through glass via) substrate | |
| JP6684992B2 (en) | Projection inspection device and bump inspection device | |
| CN118243702A (en) | Method and device for detecting damage of laser hole making to wall | |
| JP2011191285A (en) | Method for measurement of stepped structure in light transmissive material | |
| TWI892551B (en) | Via detection device and method for tgv (through glass via) substrate | |
| US20150168132A1 (en) | Method and system for use in optical measurements in deep three-dimensional structures | |
| JP7692304B2 (en) | Machining device and vibration detection method | |
| TW200928286A (en) | Measurement method for laser vias on flip chip substrate and system thereof | |
| TWI735548B (en) | Detection device and detection method | |
| US20040099710A1 (en) | Optical ball height measurement of ball grid arrays | |
| US20250251352A1 (en) | Via detection device and method for through glass via substrate | |
| TWI865375B (en) | Via waist depth detection device and method for through glass via (tgv) substrate | |
| CN113764298B (en) | Substrate defect detection device and substrate defect detection method | |
| CN212620593U (en) | Integrated PCB line width and line distance measuring device and system | |
| JP2007285953A (en) | Depth measuring device | |
| JP2006343100A (en) | Silicon substrate processing method and defective portion identification method for observing defective portion of semiconductor device | |
| TWI906109B (en) | System and method for detecting high aspect ratio micropores using optical frequency doubling technology | |
| JP3312395B2 (en) | Inspection method of wire bonding | |
| JP2024114993A (en) | Mounting board and mounting method |