TWI869755B - Automatic film tearing device - Google Patents
Automatic film tearing device Download PDFInfo
- Publication number
- TWI869755B TWI869755B TW112100832A TW112100832A TWI869755B TW I869755 B TWI869755 B TW I869755B TW 112100832 A TW112100832 A TW 112100832A TW 112100832 A TW112100832 A TW 112100832A TW I869755 B TWI869755 B TW I869755B
- Authority
- TW
- Taiwan
- Prior art keywords
- platform
- air
- unit
- conveying
- floating
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 139
- 230000001681 protective effect Effects 0.000 claims abstract description 70
- 230000003287 optical effect Effects 0.000 claims abstract description 69
- 230000004048 modification Effects 0.000 claims abstract description 52
- 238000012986 modification Methods 0.000 claims abstract description 52
- 239000000853 adhesive Substances 0.000 claims description 21
- 230000001070 adhesive effect Effects 0.000 claims description 21
- 238000006073 displacement reaction Methods 0.000 claims 3
- 239000012528 membrane Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 89
- 238000005188 flotation Methods 0.000 description 20
- 230000032258 transport Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 206010010071 Coma Diseases 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920006113 non-polar polymer Polymers 0.000 description 2
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
Images
Landscapes
- Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本發明係與光學基板的撕膜裝置有關,特別是指一種自動撕膜裝置。The present invention relates to a film-tearing device for optical substrates, and in particular to an automatic film-tearing device.
一般為了提高光學基板的性能或改變光波傳輸特性,通常需要在光學基板的表面沉積薄膜,然而,該光學基板在進行表面沉積薄膜前,為了避免該光學基板的上下表面受到灰塵或汙染物的附著,因此在光學基板的上下表面設有保護膜,當該光學基板在進行表面沉積薄膜時,才將保護膜撕離。Generally, in order to improve the performance of an optical substrate or change the light wave transmission characteristics, it is usually necessary to deposit a thin film on the surface of the optical substrate. However, before the thin film is deposited on the surface of the optical substrate, in order to prevent the upper and lower surfaces of the optical substrate from being attached by dust or pollutants, a protective film is provided on the upper and lower surfaces of the optical substrate. When the thin film is deposited on the surface of the optical substrate, the protective film is torn off.
習知光學基板鍍膜前的撕膜方式係以人工方式完成,此種撕膜方式除了耗時、費工之外,更會在撕膜的過程中而汙染該光學基板的表面,進而降低光學基板後續的鍍膜品質,因此,目前即以自動化方式進行撕摸的作業,惟目前在撕模的過程中,是當待撕除的光學基板通過一撕模單元時,藉由撕模單元的膠帶黏附於該光學基板的保護膜表面,利用膠帶之黏著力將保護膜由基板本體上撕起,然而,該光學基板上的保護膜大多為塑料薄膜(如聚烴薄膜),而屬於一種非極性聚合物(non-polar polymer),因此保護膜表面張力較低,導致撕模單元的膠帶無法黏合於該保護膜而將其撕離,凸顯出撕模良率低的缺陷。It is known that the film peeling method before the optical substrate is coated is completed manually. This film peeling method is not only time-consuming and labor-intensive, but also will contaminate the surface of the optical substrate during the film peeling process, thereby reducing the subsequent coating quality of the optical substrate. Therefore, the film peeling operation is currently performed in an automated manner. However, in the current film peeling process, when the optical substrate to be peeled off passes through a film peeling unit, the adhesive tape of the film peeling unit adheres to the surface of the protective film of the optical substrate, and the protective film is torn off from the substrate body by the adhesive force of the adhesive tape. However, the protective film on the optical substrate is mostly a plastic film (such as a polyester film), which is a non-polar polymer (non-polar polymer). polymer), so the surface tension of the protective film is relatively low, causing the adhesive tape of the mold tearing unit to be unable to adhere to the protective film and tear it off, highlighting the defect of low mold tearing yield.
本發明的目的係在於提供一種自動撕膜裝置,主要提升撕膜良率。The purpose of the present invention is to provide an automatic film tearing device, mainly to improve the film tearing yield.
為達前述目的,本發明係一種自動撕膜裝置,適用於自動對一光學基板進行撕膜,該光學基板具有一基板本體、一設於該基板本體上表面的第一保護膜及一設於該基板本體下表面的第二保護膜,該自動撕膜裝置包含:To achieve the above-mentioned purpose, the present invention is an automatic film-tearing device, which is suitable for automatically tearing a film on an optical substrate. The optical substrate has a substrate body, a first protective film disposed on the upper surface of the substrate body, and a second protective film disposed on the lower surface of the substrate body. The automatic film-tearing device comprises:
一升降單元,具有一升降平台,該升降平台供該光學基板設置並能夠在一改質位置及一輸送位置之間升降;一表面改質單元,設在該升降單元一側且對應該改質位置,當該升降平台在該改質位置時,該表面改質單元對該光學基板產生一改質介質;一輸送平台,設在該表面改質單元下方並對應該輸送位置,該輸送平台具有一鄰接該升降單元的第一輸送端及一相反於該第一輸送端的第二輸送端,當該升降平台在該輸送位置時,該輸送平台將該光學基板由第一輸送端輸送至第二輸送端;以及一撕膜單元,鄰接在該輸送平台的第二輸送端,並供該光學基板通過,用以將該光學基板的第一保護膜及第二保護膜撕離於該基板本體。A lifting unit having a lifting platform, the lifting platform is provided for the optical substrate to be set and can be lifted and lowered between a modification position and a conveying position; a surface modification unit is provided at one side of the lifting unit and corresponds to the modification position, when the lifting platform is at the modification position, the surface modification unit generates a modification medium for the optical substrate; a conveying platform is provided below the surface modification unit and corresponds to the conveying position, the conveying platform has a first conveying end adjacent to the lifting unit and a second conveying end opposite to the first conveying end, when the lifting platform is at the conveying position, the conveying platform conveys the optical substrate from the first conveying end to the second conveying end; and a film tearing unit, adjacent to the second conveying end of the conveying platform and for the optical substrate to pass through, for tearing the first protective film and the second protective film of the optical substrate off the substrate body.
本發明功效在於:藉由該升降單元搭配表面改質單元的設計,使得該光學基板在改質位置時,透過該表面改質單元所產生的改質介質改變該第一保護膜及第二保護膜的表面性質,讓該光學基板藉由該輸送平台輸送至撕膜單元時,得以增加該撕膜單元與該第一保護膜及第二保護膜之間的黏著力,藉以提升該第一保護膜及第二保護膜撕離於該基板本體的良率。The effect of the present invention is that: by designing the lifting unit in combination with the surface modification unit, when the optical substrate is in the modification position, the surface properties of the first protective film and the second protective film are changed through the modification medium generated by the surface modification unit, so that when the optical substrate is transported to the film tearing unit via the transport platform, the adhesion between the film tearing unit and the first protective film and the second protective film can be increased, thereby improving the yield of tearing the first protective film and the second protective film off the substrate body.
較佳地,其中該表面改質單元所產生的改質介質為電漿。Preferably, the modified medium generated by the surface modification unit is plasma.
較佳地,其中該輸送平台係由複數輸送滾輪所組成。Preferably, the conveying platform is composed of a plurality of conveying rollers.
較佳地,其中該撕膜單元具有一第一滾輪組、一位於該第一滾輪組下方的第二滾輪組、一循環作動地繞設在該第一滾輪組且具有一第一黏著部的第一撕貼帶、及一循環作動地繞設在該第二滾輪組且具有一第二黏著部的第二撕貼帶,當該光學基板通過該第一滾輪組及第二滾輪組之間時,該第一撕貼帶的第一黏著部黏著於該光學基板的第一保護膜,並將該第一保護膜撕離於該基板本體,該第二撕貼帶的第二黏著部黏著於該光學基板的第二保護膜,並將該第二保護膜撕離於該基板本體。Preferably, the film tearing unit has a first roller set, a second roller set below the first roller set, a first tearing tape cyclically arranged around the first roller set and having a first adhesive portion, and a second tearing tape cyclically arranged around the second roller set and having a second adhesive portion. When the optical substrate passes between the first roller set and the second roller set, the first adhesive portion of the first tearing tape adheres to the first protective film of the optical substrate and tears the first protective film off the substrate body, and the second adhesive portion of the second tearing tape adheres to the second protective film of the optical substrate and tears the second protective film off the substrate body.
較佳地,其中還包含一鄰接該撕膜單元的中繼平台,該中繼平台供該基板本體設置。Preferably, it further comprises a relay platform adjacent to the film tearing unit, and the substrate body is placed on the relay platform.
較佳地,其中還包含一鄰接該中繼平台的氣浮平台、一設於該中繼平台及氣浮平台上方的移送單元、及一位於該氣浮平台與該移送單元之間的推動單元,該氣浮平台供該基板本體設置,並具有一鄰接該中繼平台的第一氣浮端、及一反向於該第一氣浮端的第二氣浮端,該移送單元用以將該中繼平台上的基板本體移至該氣浮平台的第一氣浮端,該推動單元用以將該第一氣浮端上的基板本體朝第二氣浮端方向推動。Preferably, it also includes an air-floating platform adjacent to the relay platform, a transfer unit disposed above the relay platform and the air-floating platform, and a pushing unit disposed between the air-floating platform and the transfer unit. The air-floating platform is provided for the substrate body to be disposed thereon, and has a first air-floating end adjacent to the relay platform, and a second air-floating end opposite to the first air-floating end. The transfer unit is used to move the substrate body on the relay platform to the first air-floating end of the air-floating platform, and the pushing unit is used to push the substrate body on the first air-floating end toward the second air-floating end.
較佳地,其中該氣浮平台具有一氣浮台面,該氣浮台面具有複數個氣孔。Preferably, the air-floating platform has an air-floating table surface, and the air-floating table surface has a plurality of air holes.
較佳地,其中該移送單元包含一設置在該中繼平台與氣浮平台上方的移送導軌、及一設在該移送導軌的夾持模組,該夾持模組具有一能夠往復位移地設在該移送導軌的夾持本體、及一能夠上下位移地設在該夾持本體且用以夾持或釋放該基板本體的夾臂。Preferably, the transfer unit includes a transfer rail disposed above the relay platform and the air-floating platform, and a clamping module disposed on the transfer rail, wherein the clamping module has a clamping body that can be reciprocated and disposed on the transfer rail, and a clamping arm that can be displaced up and down and disposed on the clamping body and is used to clamp or release the substrate body.
較佳地,其中該推動單元包含一設置在該氣浮平台上方的推動導軌、及一能夠往復位移地設在該推動導軌的推抵件,該推抵件具有一用以推抵該基板本體的推動部。Preferably, the pushing unit includes a pushing guide rail disposed above the air-floating platform, and a pushing member disposed on the pushing guide rail capable of reciprocating movement, wherein the pushing member has a pushing portion for pushing against the substrate body.
較佳地,其中還包含一鄰接該氣浮平台第二氣浮端的基板匣,用以承接該推動單元朝第二氣浮端方向推動的基板本體。Preferably, it further comprises a substrate box adjacent to the second air-floating end of the air-floating platform, for receiving the substrate body pushed toward the second air-floating end by the pushing unit.
請參閱圖1A至圖2B所示,本發明實施例所提供一種自動撕膜裝置,適用於自動對一光學基板10進行撕膜,該光學基板10具有一基板本體11、一設於該基板本體10上表面的第一保護膜12及一設於該基板本體10下表面的第二保護膜13,該自動撕膜裝置主要是由一升降單元20、一表面改質單元30、一輸送平台40、一撕膜單元50、一中繼平台60、一氣浮平台70、一移送單元80、一推動單元90及一基板匣A,其中:1A to 2B, an automatic film-tearing device provided by an embodiment of the present invention is suitable for automatically tearing a film from an
該升降單元20,具有一升降座體21及一能夠升降地設在該升降座體21的升降平台22,該升降平台22供該光學基板10設置並能夠在一改質位置(如圖1A)及一輸送位置(如圖1B)之間升降。The
該表面改質單元30,設在該升降單元20一側且對應該改質位置,當該升降平台22在該改質位置時,該表面改質單元30對該光學基板10產生一改質介質31,透過該改質介質31作用於該基板本體10的第一保護膜12及第二保護膜13上,以改變該第一保護膜12及第二保護膜13的表面性質,使該第一保護膜12及第二保護膜13的表面具有更高的附著性;本實施例中該表面改質單元30為一電暈機,使得該表面改質單元30所產生的改質介質31為電漿,進而對該基板本體10的第一保護膜12及第二保護膜13進行電暈處理的表面改質作業;該表面改質單元30不以為電暈機為限。The
該輸送平台40,設在該表面改質單元30下方並對應該輸送位置,該輸送平台40具有一鄰接該升降單元20的第一輸送端41及一相反於該第一輸送端41的第二輸送端42,當該升降平台22在該輸送位置時,該輸送平台40將改質後的該光學基板10由第一輸送端41輸送至第二輸送端42;本實施例中,該輸送平台40係由複數輸送滾輪43呈同一方向滾動地設置在一輸送座44上所組成,且當該升降平台22由改質位置下降至輸送位置時,該升降平台22上的光學基板10則碰觸到該輸送平台40的第一支輸送滾輪43,藉以將改質後的該光學基板10由第一輸送端41輸送至第二輸送端42。The
該撕膜單元50,鄰接在該輸送平台40的第二輸送端42,並供改質後的該光學基板10通過,用以將該光學基板10的第一保護膜12及第二保護膜13撕離於該基板本體11;本實施例中,該撕膜單元50具有一第一滾輪組51、一位於該第一滾輪組51下方的第二滾輪組52、一循環作動地繞設在該第一滾輪組51且具有一第一黏著部531(例如黏膠)的第一撕貼帶53、及一循環作動地繞設在該第二滾輪組52且具有一第二黏著部541(例如黏膠)的第二撕貼帶54,當該光學基板10通過該第一滾輪組51及第二滾輪組52之間時,該第一撕貼帶53的第一黏著部531黏著於改質後的該光學基板10的第一保護膜12,並將該第一保護膜12撕離於該基板本體11,該第二撕貼帶54的第二黏著部541黏著於改質後的該光學基板10的第二保護膜13,並將該第二保護膜13撕離於該基板本體11。The film-
該中繼平台60,鄰接該撕膜單元50,並用以承接由該撕膜單元50撕膜後的該基板本體11,讓該基板本體得以穩固地設置在該中繼平台60。The
配合參閱圖6及圖7所示,該氣浮平台70,鄰接該中繼平台60並供該基板本體11設置,該氣浮平台70具有一氣浮台面71,該氣浮台面71具有一鄰接該中繼平台60的第一氣浮端711、一反向於該第一氣浮端711的第二氣浮端712、及複數個氣孔713,各該氣孔713輸出有氣體。6 and 7 , the
配合參閱圖6及圖7所示,該移送單元80,設於該中繼平台60及氣浮平台70上方,並用以將該中繼平台60上的基板本體11移至該氣浮平台70的第一氣浮端711,其移送狀態參考圖3至圖5所示;本實施例中,該移送單元80包含一設置在該中繼平台60與氣浮平台70上方的移送導軌81、及一設在該移送導軌81的夾持模組82,該夾持模組82具有一能夠往復位移地設在該移送導軌81的夾持本體821、及一能夠上下位移地設在該夾持本體821且用以夾持或釋放該基板本體11的夾臂822。6 and 7 , the
配合參閱圖6及圖7所示,該推動單元90,位於該氣浮平台70與該移送單元80之間,並用以將該第一氣浮端711上的基板本體11朝第二氣浮端712方向推動;本實施例中,該推動單元90包含一設置在該氣浮平台70上方的推動導軌91、及一能夠往復位移地設在該推動導軌91的推抵件92,該推抵件92具有一用以推抵該基板本體11的推動部921。6 and 7 , the pushing
該基板匣A,鄰接該氣浮平台70第二氣浮端712,用以承接該推動單元90朝第二氣浮端712方向推動的基板本體11。The substrate box A is adjacent to the second air-floating
以上所述即為本發明實施例各主要構件說明。至於本發明的作動方式及功效說明如下:The above is a description of the main components of the embodiment of the present invention. The operation mode and effect of the present invention are described as follows:
參閱圖1A及圖1B所示,當該升降單元20的升降平台22上設有待撕膜的光學基板10,且該升降平台22在該改質位置時,控制該表面改質單元30對該光學基板10產生改質介質31,透過該改質介質31作用於該基板本體10的第一保護膜12及第二保護膜13上,以改變該第一保護膜12及第二保護膜13的表面性質,使該第一保護膜12及第二保護膜13的表面具有更高的附著性。Referring to Figures 1A and 1B, when the
參閱圖2A所示,隨後控制該升降平台22下降至該輸送位置,使該升降平台22上的光學基板10碰觸到該輸送平台40的第一支輸送滾輪43,藉以將改質後的該光學基板10由第一輸送端41輸送至第二輸送端42。參閱圖2B所示,緊接著,該輸送平台40將該光學基板10輸送至該撕膜單元50,在該光學基板10進入該撕膜單元50的第一滾輪組51與第二滾輪組52之間時,該第一撕貼帶53的第一黏著部531黏固在該光學基板10的第一保護膜12、及該第二撕貼帶54的第二黏著部541黏固在該光學基板10的第二保護膜13,同時該第一撕貼帶53與第一保護膜12之間、以及該第二撕貼帶54與第二保護膜13之間分別受該第一滾輪組51與第二滾輪組52壓抵而得以相互黏固呈一體。隨後透過相反方向循環的第一撕貼帶53與第二撕貼帶54將該光學基板10的第一保護膜12及第二保護膜13撕離於基板本體11。Referring to FIG. 2A , the
參閱圖3所示,當通過該撕膜單元50的基板本體11置於該中繼平台60後,控制該移送單元80的夾持本體821位於該基板本體11上方,並控制該夾臂822向下位移而夾持住該基板本體11。3 , after the
參閱圖4至圖6所示,隨後控制該夾臂822上移、夾持本體821右移、及夾臂822下移,進而將該基板本體11置於該氣浮平台70的第一氣浮端711。4 to 6 , the clamping
參閱圖6及圖7所示,緊接著控制該推動單元90的推抵件92向右位移,使該推抵件92的推動部921推抵該基板本體11,進而將該基板本體11由該氣浮平台70的第一氣浮端711往第二氣浮端712方向位移,最後使該基板本體11進入該基板匣A內,以便進行後續的鍍膜作業。6 and 7 , the
值得說明的是,當該推抵件92在推動該基板本體11的同時,可控制該氣浮平台70的氣浮台面71輸出有氣體,使該基板本體11氣浮於該氣浮台面71,藉以避免該基板本體11在被推抵的過程中與該氣浮平台71相互摩擦而受損。It is worth noting that when the
由上述可知,藉由該升降單元20搭配表面改質單元30的設計,使得該光學基板10在改質位置時,透過該表面改質單元30所產生的改質介質改變該第一保護膜12及第二保護膜13的表面性質,讓該光學基板10藉由該輸送平台40輸送至撕膜單元50時,得以增加該第一撕貼帶53的第一黏著部531與該第一保護膜12之間的黏著力、以及增加該第二撕貼帶54的第二黏著部541與該第二保護膜13之間的黏著力,讓該撕膜單元50確實能將該第一保護膜12及第二保護膜13撕離於該基板本體11,以提升撕膜良率。As can be seen from the above, by means of the design of the lifting
另一方面,藉由升降單元20搭配表面改質單元30、輸送平台40、撕膜單元50、中繼平台60、氣浮平台70、移送單元80、及推動單元90的設計,得以實現光學基板10自動撕膜的作業,尤其在撕膜的過程中,光學基板10的表面確實不與其他的物品接觸,進而將光學基板10表面可能受到的傷害降至最低,有效避免在自動撕膜的過程中造成光學基板10的受損,藉以提升後續的鍍膜品質及良率。On the other hand, by combining the lifting
10:光學基板 11:基板本體 12:第一保護膜 13:第二保護膜 20:升降單元 21:升降座體 22:升降平台 30:表面改質單元 31:改質介質 40:輸送平台 41:第一輸送端 42:第二輸送端 43:輸送滾輪 44:輸送座 50:撕膜單元 51:第一滾輪組 52:第二滾輪組 53:第一撕貼帶 531:第一黏著部 54:第二撕貼帶 541:第二黏著部 60:中繼平台 70:氣浮平台 71:氣浮台面 711:第一氣浮端 712:第二氣浮端 713:氣孔 80:移送單元 81:移送導軌 82:夾持模組 821:夾持本體 822:夾臂 90:推動單元 91:推動導軌 92:推抵件 921:推動部 A:基板匣 10: Optical substrate 11: Substrate body 12: First protective film 13: Second protective film 20: Lifting unit 21: Lifting seat 22: Lifting platform 30: Surface modification unit 31: Modified medium 40: Conveying platform 41: First conveying end 42: Second conveying end 43: Conveying roller 44: Conveying seat 50: Film peeling unit 51: First roller set 52: Second roller set 53: First peeling tape 531: First adhesive part 54: Second peeling tape 541: Second adhesive part 60: Relay platform 70: Air floating platform 71: Air floating table 711: First air floating end 712: Second air floating end 713: Air hole 80: Transfer unit 81: Transfer rail 82: Clamping module 821: Clamping body 822: Clamping arm 90: Pushing unit 91: Pushing rail 92: Pushing member 921: Pushing part A: Substrate box
圖1A是本發明實施例的示意圖,顯示升降平台在改質位置且表面改質單元對保護膜產生一改質介質的狀態; 圖1B是圖1A的局部放大圖; 圖2A是本發明實施例的示意圖,顯示升降平台在輸送位置且撕膜單元將光學基板撕膜的狀態; 圖2B是圖2A的局部放大圖; 圖3是本發明實施例的示意圖,顯示移送單元夾持基板本體的狀態; 圖4是本發明實施例的示意圖,顯示移送單元將基板本體夾離於中繼平台的狀態; 圖5是本發明實施例的示意圖,顯示移送單元將基板本體夾置於氣浮平台的狀態; 圖6是本發明實施例的示意圖,顯示移送單元復位及推動單元作動的狀態;以及 圖7是本發明實施例的示意圖,顯示推動單元將基板本體推至收納架的狀態。 FIG1A is a schematic diagram of an embodiment of the present invention, showing the state where the lifting platform is in the modification position and the surface modification unit generates a modification medium for the protective film; FIG1B is a partial enlarged view of FIG1A; FIG2A is a schematic diagram of an embodiment of the present invention, showing the state where the lifting platform is in the transport position and the film tearing unit tears the film of the optical substrate; FIG2B is a partial enlarged view of FIG2A; FIG3 is a schematic diagram of an embodiment of the present invention, showing the state where the transfer unit clamps the substrate body; FIG4 is a schematic diagram of an embodiment of the present invention, showing the state where the transfer unit clamps the substrate body from the relay platform; FIG5 is a schematic diagram of an embodiment of the present invention, showing the state where the transfer unit clamps the substrate body on the air flotation platform; FIG6 is a schematic diagram of an embodiment of the present invention, showing the state of the transfer unit resetting and the push unit actuating; and FIG7 is a schematic diagram of an embodiment of the present invention, showing the state of the push unit pushing the substrate body to the storage rack.
10:光學基板 10: Optical substrate
20:升降單元 20: Lifting unit
21:升降座體 21: Lifting seat
22:升降平台 22: Lifting platform
30:表面改質單元 30: Surface modification unit
31:改質介質 31: Modified medium
40:輸送平台 40: Transport platform
41:第一輸送端 41: First transport end
42:第二輸送端 42: Second transmission end
43:輸送滾輪 43:Conveyor roller
44:輸送座 44:Transport seat
50:撕膜單元 50: Film tearing unit
51:第一滾輪組 51: First roller set
52:第二滾輪組 52: Second roller set
53:第一撕貼帶 53: First tear off the tape
54:第二撕貼帶 54: Second tear off the tape
60:中繼平台 60: Relay platform
70:氣浮平台 70: Air floating platform
71:氣浮台面 71: Air-floating countertop
80:移送單元 80:Transfer unit
81:移送導軌 81:Transfer rail
82:夾持模組 82: Clamping module
821:夾持本體 821: Clamping body
822:夾臂 822: Clamping arms
90:推動單元 90: Propulsion unit
91:推動導軌 91: Push rails
92:推抵件 92: Push piece
921:推動部 921: Promotion Department
A:基板匣 A: Substrate box
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112100832A TWI869755B (en) | 2023-01-09 | 2023-01-09 | Automatic film tearing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112100832A TWI869755B (en) | 2023-01-09 | 2023-01-09 | Automatic film tearing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202429595A TW202429595A (en) | 2024-07-16 |
| TWI869755B true TWI869755B (en) | 2025-01-11 |
Family
ID=92928815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW112100832A TWI869755B (en) | 2023-01-09 | 2023-01-09 | Automatic film tearing device |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI869755B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI898912B (en) * | 2024-11-04 | 2025-09-21 | 志聖工業股份有限公司 | Film peeler |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM493228U (en) * | 2014-05-05 | 2015-01-01 | Schmid Automation Asia Co Ltd | Automatic film peeling apparatus |
| CN109625497A (en) * | 2018-12-24 | 2019-04-16 | 珠海研深科技有限公司 | A kind of dyestripping equipment and its working method based on shoveling film mechanism |
-
2023
- 2023-01-09 TW TW112100832A patent/TWI869755B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM493228U (en) * | 2014-05-05 | 2015-01-01 | Schmid Automation Asia Co Ltd | Automatic film peeling apparatus |
| CN109625497A (en) * | 2018-12-24 | 2019-04-16 | 珠海研深科技有限公司 | A kind of dyestripping equipment and its working method based on shoveling film mechanism |
Non-Patent Citations (1)
| Title |
|---|
| 本案自述先前技術 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202429595A (en) | 2024-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100540431C (en) | Film peeling method and apparatus | |
| CN101197254B (en) | Method for laminating substrate and apparatus using the method | |
| JP4524241B2 (en) | Thin plate film sticking apparatus and sticking method | |
| JPS60169148A (en) | Method and apparatus for conveying substrate | |
| US7967048B2 (en) | Transferring device and transferring method | |
| JP2017202896A (en) | Film peeling device | |
| TWI869755B (en) | Automatic film tearing device | |
| TWI584404B (en) | Substrate transfer method and substrate transfer device | |
| JP2001233452A (en) | Constant point carrying device for thin plate | |
| JPH01156480A (en) | Thin film-peeling equipment | |
| KR101330148B1 (en) | Panel cutting device and panel cutting method using the same | |
| JP5260124B2 (en) | Processing equipment | |
| JP2002151528A (en) | Die bonding sheet sticking apparatus and die bonding sheet sticking method | |
| KR20180118556A (en) | Apparatus and method for manufacturing flexible device | |
| JP2006264831A (en) | Film peeling method and film peeling apparatus | |
| JP2004241685A (en) | Pellet conveying device, pellet bonding method and pellet bonding device | |
| CN110556328A (en) | Adhesive tape peeling method and adhesive tape peeling device | |
| JP2000233867A (en) | Film peeling device | |
| JP6211828B2 (en) | Sheet sticking device and sticking method | |
| JP2009029525A (en) | Film peeling device | |
| US20070137773A1 (en) | Die bonding apparatus and method of operating the same | |
| TWI864863B (en) | Double-side vacuum film lamination apparatus and double-side vacuum film lamination method | |
| TWI886294B (en) | Tape Attachment Device | |
| US20070113969A1 (en) | Optical disk laminating method and optical disk laminating device | |
| TWI723925B (en) | Film stripping apparatus |